JPH0616440A - Method for correcting defect on surface of transparent plate - Google Patents
Method for correcting defect on surface of transparent plateInfo
- Publication number
- JPH0616440A JPH0616440A JP4173339A JP17333992A JPH0616440A JP H0616440 A JPH0616440 A JP H0616440A JP 4173339 A JP4173339 A JP 4173339A JP 17333992 A JP17333992 A JP 17333992A JP H0616440 A JPH0616440 A JP H0616440A
- Authority
- JP
- Japan
- Prior art keywords
- transparent plate
- excimer laser
- defect
- laser beam
- arf excimer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/3568—Modifying rugosity
- B23K26/3576—Diminishing rugosity, e.g. grinding; Polishing; Smoothing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/02—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a discontinuous way
- C03B29/025—Glass sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、ガラス等の透明材料か
らなる板表面を、透光性を損なうことなく欠陥修正する
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for correcting defects on a plate surface made of a transparent material such as glass without impairing the light transmitting property.
【0002】[0002]
【従来の技術】液晶表示装置等に使用されるガラス板等
の透明板表面に生じた傷等の欠陥は、例えば、研磨粉を
含んだ研磨液をつけたグラインダー等を回転させつつ透
明板表面に接触させて機械的に研磨することにより修正
される。2. Description of the Related Art Defects such as scratches on the surface of a transparent plate such as a glass plate used in a liquid crystal display device are, for example, the surface of the transparent plate while rotating a grinder or the like containing a polishing liquid containing polishing powder. It is corrected by contacting with and mechanically polishing.
【0003】[0003]
【発明が解決しようとする課題】しかし、このような機
械的な研磨による欠陥修正方法では、非常に時間がかか
るだけでなく、ガラスが削られて生じたガラス粉末や研
磨粉が飛び散り、表示装置内にこれら飛散物が入って不
良の原因となったり、また作業環境が悪くなるという問
題がある。さらに、透明板にLSIが実装されている場
合には、透明板表面とグラインダーとの摩擦の際に生じ
る振動、あるいは静電気等により、実装されたLSIが
破壊される恐れがある。However, such a method of correcting defects by mechanical polishing not only takes a very long time, but also glass powder or polishing powder generated by shaving the glass scatters to cause a display device. There is a problem in that these scattered substances enter the inside to cause a defect, and the working environment deteriorates. Further, when the LSI is mounted on the transparent plate, the mounted LSI may be destroyed by vibration or static electricity generated when the surface of the transparent plate and the grinder rub.
【0004】本発明は、上記欠点を解決しようとするも
のであり、研磨粉を使用した研磨によることなく、短時
間で透明板表面の欠陥を透光性を損なうことなく修正す
る方法を提供することを目的とする。The present invention is intended to solve the above-mentioned drawbacks, and provides a method for correcting defects on the surface of a transparent plate in a short time without polishing by using polishing powder and without impairing translucency. The purpose is to
【0005】[0005]
【課題を解決するための手段】本発明の研磨方法は、透
明板表面に形成された凹状欠陥部分にArFエキシマレ
ーザビームを照射して、該欠陥部分を平滑化し、そのこ
とにより上記目的が達成される。In the polishing method of the present invention, a concave defect portion formed on the surface of a transparent plate is irradiated with an ArF excimer laser beam to smooth the defective portion, thereby achieving the above object. To be done.
【0006】[0006]
【作用】ArFエキシマレーザは、紫外領域の光を発生
することができ、この紫外光が照射されることにより透
明板を形成する材料の原子間結合が断ち切られ、照射さ
れた部分が削られてほぼ平らな面となり、透明板表面の
欠陥が透光性を損なうことなく修正される。The ArF excimer laser can generate light in the ultraviolet region, and by irradiation with this ultraviolet light, the interatomic bond of the material forming the transparent plate is cut off, and the irradiated portion is scraped. The surface becomes almost flat, and the defects on the transparent plate surface are corrected without impairing the translucency.
【0007】[0007]
【実施例】以下、本発明を図面を参照して説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings.
【0008】本発明の方法は、図1に示すように、ガラ
ス板表面2に、傷4が形成されている場合に、この傷4
上からArFエキシマレーザビーム6を照射する。In the method of the present invention, as shown in FIG. 1, when a scratch 4 is formed on the glass plate surface 2, the scratch 4 is formed.
The ArF excimer laser beam 6 is irradiated from above.
【0009】傷4にArFエキシマレーザビーム6を照
射すると、傷4は、その全体が削られて深くなるのでは
なく、その上部3から徐々に削られていき、ついには図
2に示すように傷4の底部1とガラス板表面2とがなだ
らかに連続する平滑な面となる。時間は数十秒程度で非
常に短時間であり、かつ加工面の透光性が損われること
なくガラス板表面2を研磨することができる。When the scratches 4 are irradiated with the ArF excimer laser beam 6, the scratches 4 are gradually scraped from the upper part 3 of the scratches 4 instead of being deepened by being scraped as a whole, and finally, as shown in FIG. The bottom 1 of the scratch 4 and the surface 2 of the glass plate are smooth and smooth surfaces. The time is about several tens of seconds, which is a very short time, and the glass plate surface 2 can be polished without impairing the translucency of the processed surface.
【0010】エキシマレーザは、紫外領域のレーザビー
ムを発生することが可能であり、そのレーザビームによ
って被加工物の原子の間の結合を断ち切ることにより熱
発生を伴わずに被加工物の表面を加工することができ
る。ガラスなどの透明材料を加工する場合には、レーザ
ビームの波長によってはガラスを透過して原子間結合を
断ち切れないため、レーザビームがその材料表面で吸収
される波長を選択する必要がある。エキシマレーザの波
長は使用するガスの種類により発振波長が異なるが、図
3に示すように、ArFエキシマレーザを用いて平坦な
ガラス板表面22を切削加工すると、削られた加工部の
底面21はほぼ平らになり、透光性は損なわれない。The excimer laser is capable of generating a laser beam in the ultraviolet region, and the laser beam breaks the bonds between atoms of the workpiece, so that the surface of the workpiece can be irradiated without heat generation. It can be processed. When processing a transparent material such as glass, it is necessary to select a wavelength at which the laser beam is absorbed on the surface of the material, because the laser beam cannot pass through the glass and break the interatomic bond depending on the wavelength of the laser beam. The wavelength of the excimer laser varies depending on the type of gas used, but as shown in FIG. 3, when a flat glass plate surface 22 is cut using an ArF excimer laser, the bottom surface 21 of the cut portion is It becomes almost flat and the translucency is not impaired.
【0011】透明材料に吸収される波長のレーザビーム
を発生するエキシマレーザとしてはKrFエキシマレー
ザがあるが、KrFエキシマレーザを用いて平坦なガラ
ス板表面32を切削加工すると、図4に示すように、削
られた加工部の底面31は激しい凹凸が形成されるた
め、透光性が損なわれてしまう。There is a KrF excimer laser as an excimer laser that generates a laser beam having a wavelength absorbed by a transparent material. When a flat glass plate surface 32 is cut using the KrF excimer laser, as shown in FIG. Since the roughened bottom surface 31 of the machined portion is formed, translucency is impaired.
【0012】なお、ArFエキシマレーザビームを照射
してガラス板表面の欠陥を修正する際には、欠陥を含む
広い領域にArFエキシマレーザビーム6をあてること
により、図3に示すようなエッジ23が形成されること
が防止されて、ガラス板の欠陥が良好に修正される。When the defects on the surface of the glass plate are repaired by irradiating the ArF excimer laser beam, the edge 23 as shown in FIG. It is prevented from forming and defects in the glass sheet are well corrected.
【0013】欠陥修正時には、ガラスが削られると微量
の飛散物が生じるが、研磨粉を用いて研磨する場合に比
較すると大幅に減少する。飛散物が加工部に付着するこ
とを防ぐには、レーザビーム照射部以外をマスキングす
ればよい。At the time of defect correction, a small amount of scattered substances are generated when the glass is shaved, but it is greatly reduced as compared with the case of polishing with polishing powder. In order to prevent the scattered matter from adhering to the processed portion, it suffices to mask other than the laser beam irradiation portion.
【0014】[0014]
【発明の効果】本発明では、ArFエキシマレーザを用
い、加工面をなめらかな面とすることができるので、透
明板の透光性を損なうことなく欠陥修正することができ
る。According to the present invention, since the processed surface can be made smooth by using the ArF excimer laser, the defect can be repaired without impairing the transparency of the transparent plate.
【0015】レーザビーム照射によって研削されるの
で、加工面に摩擦が生じることがない。よって、震動、
静電気等が生じないため、透明板にLSIが実装されて
いる場合でも、LSIが破壊される恐れがない。Since it is ground by laser beam irradiation, no friction occurs on the processed surface. So the quake,
Since no static electricity or the like is generated, even if the LSI is mounted on the transparent plate, there is no fear of destroying the LSI.
【0016】さらに、研磨時に若干の飛散物が生じるも
のの研磨粉を用いた従来の方法と比べて大幅に減少する
ので、クリーンな状態で作業を行うことができる。Further, although some scattered substances are generated during polishing, the amount is greatly reduced as compared with the conventional method using abrasive powder, so that the work can be performed in a clean state.
【0017】また、数十秒程度の短時間で欠陥修正する
ことができるので、作業の簡略化、時間短縮を図ること
ができる。Further, since the defect can be repaired in a short time of about several tens of seconds, the work can be simplified and the time can be shortened.
【図1】ガラス板表面にArFエキシマレーザを照射す
る様子を示す模式図。FIG. 1 is a schematic view showing how a surface of a glass plate is irradiated with ArF excimer laser.
【図2】欠陥修正後のガラス板の断面図。FIG. 2 is a cross-sectional view of a glass plate after defect correction.
【図3】ArFエキシマレーザを用いて削ったガラス板
の断面図。FIG. 3 is a cross-sectional view of a glass plate scraped using an ArF excimer laser.
【図4】KrFエキシマレーザを用いて削ったガラス板
の断面図。FIG. 4 is a cross-sectional view of a glass plate scraped using a KrF excimer laser.
【符号の説明】 2 ガラス板表面 4 傷 6 ArFエキシマレーザビーム[Explanation of symbols] 2 glass plate surface 4 scratches 6 ArF excimer laser beam
Claims (1)
rFエキシマレーザビームを照射して、該欠陥部分を平
滑化する透明板表面の欠陥修正方法。1. A is formed in a concave defect portion formed on the surface of a transparent plate.
A defect repair method for irradiating an rF excimer laser beam to smooth the defective portion.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4173339A JP2786377B2 (en) | 1992-06-30 | 1992-06-30 | How to repair defects on the transparent plate surface |
US08/064,275 US5514850A (en) | 1992-06-30 | 1993-05-19 | Defect compensation method for smoothing a surface of a transparent plate with an ArF excimer laser beam |
DE69312814T DE69312814T2 (en) | 1992-06-30 | 1993-05-20 | Error compensation method for smoothing a surface of a transparent plate |
EP93303943A EP0577260B1 (en) | 1992-06-30 | 1993-05-20 | A defect compensation method for smoothing a surface of a transparent plate |
KR1019930009035A KR970005523B1 (en) | 1992-06-30 | 1993-05-22 | How to fix defects on the surface of the transparent plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4173339A JP2786377B2 (en) | 1992-06-30 | 1992-06-30 | How to repair defects on the transparent plate surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0616440A true JPH0616440A (en) | 1994-01-25 |
JP2786377B2 JP2786377B2 (en) | 1998-08-13 |
Family
ID=15958597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4173339A Expired - Fee Related JP2786377B2 (en) | 1992-06-30 | 1992-06-30 | How to repair defects on the transparent plate surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2786377B2 (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6877341B1 (en) * | 2001-01-26 | 2005-04-12 | The Trustees Of Columbia University In The City Of New York | Method for controlled surface scratch removal and glass resurfacing |
WO2006112415A1 (en) * | 2005-04-15 | 2006-10-26 | Asahi Glass Company, Limited | Method for reducing diameter of bubble existing inside of glass plate |
JP2007284270A (en) * | 2006-04-13 | 2007-11-01 | Asahi Glass Co Ltd | Method for correcting flaw part on the surface of glass plate |
US7473151B2 (en) | 2002-08-26 | 2009-01-06 | Hitachi, Ltd. | Method for manufacturing a substrate for a flat panel display including forming grooves in a surface |
JP2009023885A (en) * | 2007-07-20 | 2009-02-05 | Asahi Glass Co Ltd | Repairing method of part of surface scar on surface of glass substrate by laser irradiation |
WO2009060875A1 (en) * | 2007-11-08 | 2009-05-14 | Asahi Glass Co., Ltd. | Glass plate manufacturing method |
JP2009221095A (en) * | 2008-02-19 | 2009-10-01 | Asahi Glass Co Ltd | Optical component for extreme ultraviolet lithography (euvl) and smoothing method thereof |
JP2010189228A (en) * | 2009-02-19 | 2010-09-02 | Asahi Glass Co Ltd | Method of smoothening surface of glass substrate |
WO2011033234A1 (en) * | 2009-09-18 | 2011-03-24 | Commissariat A L'energie Atomique | Method for the corrective treatment of a defect on the surface of an optical component for a power laser |
US8665395B2 (en) | 2010-04-23 | 2014-03-04 | Samsung Display Co., Ltd. | Liquid crystal display device and method of manufacturing the same |
EP3321240A1 (en) * | 2016-11-10 | 2018-05-16 | Goodrich Corporation | Surface finishing for glass components using a laser |
US20230022346A1 (en) * | 2021-07-20 | 2023-01-26 | Samsung Display Co., Ltd. | Method of repairing glass for display device |
Citations (4)
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---|---|---|---|---|
JPS5622657A (en) * | 1979-07-26 | 1981-03-03 | Fujitsu Ltd | Treatment of glass surface |
JPS5983950A (en) * | 1982-11-02 | 1984-05-15 | Nec Corp | Preparation of glass substrate |
JPS5988332A (en) * | 1982-11-08 | 1984-05-22 | Fujitsu Ltd | How to recycle photo mask substrates |
JPH02102142A (en) * | 1988-10-07 | 1990-04-13 | Sony Corp | Regeneration of jig made of quartz |
-
1992
- 1992-06-30 JP JP4173339A patent/JP2786377B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5622657A (en) * | 1979-07-26 | 1981-03-03 | Fujitsu Ltd | Treatment of glass surface |
JPS5983950A (en) * | 1982-11-02 | 1984-05-15 | Nec Corp | Preparation of glass substrate |
JPS5988332A (en) * | 1982-11-08 | 1984-05-22 | Fujitsu Ltd | How to recycle photo mask substrates |
JPH02102142A (en) * | 1988-10-07 | 1990-04-13 | Sony Corp | Regeneration of jig made of quartz |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6877341B1 (en) * | 2001-01-26 | 2005-04-12 | The Trustees Of Columbia University In The City Of New York | Method for controlled surface scratch removal and glass resurfacing |
US7473151B2 (en) | 2002-08-26 | 2009-01-06 | Hitachi, Ltd. | Method for manufacturing a substrate for a flat panel display including forming grooves in a surface |
WO2006112415A1 (en) * | 2005-04-15 | 2006-10-26 | Asahi Glass Company, Limited | Method for reducing diameter of bubble existing inside of glass plate |
JP4998265B2 (en) * | 2005-04-15 | 2012-08-15 | 旭硝子株式会社 | Method of reducing the diameter of bubbles existing inside a glass plate |
KR100910952B1 (en) * | 2005-04-15 | 2009-08-05 | 아사히 가라스 가부시키가이샤 | Method for reducing diameter of bubble existing inside of glass plate |
US8225627B2 (en) | 2005-04-15 | 2012-07-24 | Asahi Glass Company, Limited | Method for reducing diameter of bubble existing in a glass plate |
JP4577258B2 (en) * | 2006-04-13 | 2010-11-10 | 旭硝子株式会社 | How to correct scratches on the glass plate surface |
JP2007284270A (en) * | 2006-04-13 | 2007-11-01 | Asahi Glass Co Ltd | Method for correcting flaw part on the surface of glass plate |
JP2009023885A (en) * | 2007-07-20 | 2009-02-05 | Asahi Glass Co Ltd | Repairing method of part of surface scar on surface of glass substrate by laser irradiation |
WO2009060875A1 (en) * | 2007-11-08 | 2009-05-14 | Asahi Glass Co., Ltd. | Glass plate manufacturing method |
JP5347969B2 (en) * | 2007-11-08 | 2013-11-20 | 旭硝子株式会社 | Manufacturing method of glass plate |
JP2009221095A (en) * | 2008-02-19 | 2009-10-01 | Asahi Glass Co Ltd | Optical component for extreme ultraviolet lithography (euvl) and smoothing method thereof |
JP2010189228A (en) * | 2009-02-19 | 2010-09-02 | Asahi Glass Co Ltd | Method of smoothening surface of glass substrate |
WO2011033234A1 (en) * | 2009-09-18 | 2011-03-24 | Commissariat A L'energie Atomique | Method for the corrective treatment of a defect on the surface of an optical component for a power laser |
FR2950339A1 (en) * | 2009-09-18 | 2011-03-25 | Commissariat Energie Atomique | METHOD FOR THE CORRECTIVE TREATMENT OF A DEFECT ON THE SURFACE OF AN OPTICAL COMPONENT FOR POWER LASER |
US8665395B2 (en) | 2010-04-23 | 2014-03-04 | Samsung Display Co., Ltd. | Liquid crystal display device and method of manufacturing the same |
EP3321240A1 (en) * | 2016-11-10 | 2018-05-16 | Goodrich Corporation | Surface finishing for glass components using a laser |
JP2018104268A (en) * | 2016-11-10 | 2018-07-05 | グッドリッチ コーポレイション | Surface finishing for glass components using laser |
US20230022346A1 (en) * | 2021-07-20 | 2023-01-26 | Samsung Display Co., Ltd. | Method of repairing glass for display device |
Also Published As
Publication number | Publication date |
---|---|
JP2786377B2 (en) | 1998-08-13 |
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