JPH0613257Y2 - Horizontal vapor phase growth equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a horizontal vapor deposition apparatus for forming a thin film on a surface of a substrate, and more particularly to improvement of means for transporting the substrate.

[Conventional technology]

As shown in FIG. 3, in the conventional horizontal vapor phase growth apparatus 1, a reaction chamber 2 for performing vapor phase growth on a substrate P and a front chamber 3 for exchanging the substrates P are connected via a gate valve 4. In addition, the substrate transfer device 5 is connected to the front chamber 3, and the lifting device 6 is connected to the substrate transfer device 5.

The substrate transfer device 5 transfers the substrate P in the horizontal direction between the reaction chamber 2 and the front chamber 3, and the front chamber 3 is provided with a bendable flexible tube 7 such as a bellows tube or a flexible tube. And the guide tube 8 that is continuously installed, and the substrate mounting portion 9 at the end portion on the reaction chamber 2 side.
And a ring-shaped external magnet having an inner magnet 10 at the other end and moving horizontally in the guide cylinder 8, and a guide rod 11 loosely fitted to the outer periphery of the guide cylinder 8. 12
And a horizontal drive mechanism 13 for moving the same in the horizontal direction. The horizontal drive mechanism 13 is supported by flat plate end plates 14a and 14b fixed to both ends of the guide tube 8, and is continuously connected to a guide shaft 15 having a threaded portion on the outer periphery thereof and a belt 16 therethrough. It is composed of a motor 17 and a guide member 18 having one end screwed to the guide shaft 15 and the other end connected to the external magnet 12. The motor 17 rotates the guide shaft 15 to rotate the guide member 18. The guide member 18 that transmits the force and receives the rotational force moves in the horizontal direction while being restricted in rotation at the connecting portion with the external magnet 12, whereby the external magnet 1
Internal magnet 1 in which 2 moves horizontally and is magnetically coupled to this
The guide rod 11 is moved in the horizontal direction through the movement of 0.

The elevating device 6 elevates and lowers the entire substrate transfer device 5 with respect to the front chamber 3 fixed to the floor. The elevating device 6 includes an elevating part 19 and an elevating drive part 20 for elevating the elevating part 19. The upper end of the portion 19 is formed in a flat plate shape, and the conveying motor 17 and the end plates 14a, 14b at both ends of the guide cylinder 8 are connected to the flat plate portion via appropriate connecting members 21, 22. .

In order to perform the vapor phase growth in the horizontal vapor phase growth apparatus 1 configured as described above, first, the substrate transfer apparatus 5 is operated to operate the guide rod 1.
The substrate mounting portion 9 of No. 1 is retracted into the front chamber 3, and in this state, the unprocessed substrate P is placed on the substrate mounting portion 9 from the opening / closing door 23 of the front chamber 3.
After mounting the substrate, the elevating device 6 is operated to move the substrate transfer device 5 upward, and in this state, the substrate mounting part 9 is advanced to the holding table 25 provided in the flow channel 24 in the reaction chamber 2, The substrate transfer device 5 is lowered at the position of the holding table 25 to set the substrate P on the holding table 25. Next, the substrate platform 9 is moved back to the front chamber 3, the gate valve 4 is closed, the RF coil 26 is energized to keep the substrate P at a predetermined temperature via the holder 25, and the gas is introduced from the gas introduction pipe 27. Vapor growth is carried out by introducing a phase growth gas. The vapor growth gas that has passed through the substrate P is discharged from the gas discharge pipe 28.

When the vapor phase growth is completed in the reaction chamber 2, the gate valve 4 is opened to advance the substrate placing part 9 to the lower side of the substrate P, and the substrate transfer device 5 is raised to place the substrate P on the substrate placing part 9. Back into the front chamber 3, the processed substrate P is taken out to the outside in the front chamber 3, a new unprocessed substrate P is set on the substrate platform 9, and vapor phase growth is performed again in the same manner as described above. carry out.

It should be noted that the substrate P is not only transported by the substrate alone, but also by a type in which a flat tray is set on the holding table 25 and the substrate is placed on the tray and transported.

[Problems to be solved by the device]

However, in the conventional horizontal vapor phase growth apparatus 1, the substrate placing unit 9 is raised and lowered by raising and lowering the entire substrate transfer apparatus 5,
Since the substrate P is attached to and detached from the holding table 25 by this, the flexible tube 7 connecting the guide tube 8 and the front chamber 3 is largely deformed as shown in FIG. 4 and receives a large load. Moreover, the flexible tube 7 is severely deteriorated each time the substrate transfer device 5 is moved up and down, and the airtightness is impaired in a short time, which is dangerous. That is, when the gate valve 4 is opened to retract the substrate P after vapor phase growth into the front chamber 3, the extremely toxic vapor phase growth gas in the reaction chamber 2 flows into the front chamber 3 accordingly. This is because the flexible tube 7 leaks from the damaged portion. Therefore, the flexible tube 7
Must be replaced before it is damaged, but in the conventional device as described above, since the flexible tube 7 is severely deteriorated, complicated replacement is required and maintenance work is troublesome. In addition, since vapor phase growth cannot be performed during maintenance work, productivity was adversely affected.

Therefore, an object of the present invention is to provide a horizontal vapor deposition apparatus capable of extending the life by reducing the load on the flexible tube 7.

[Means for Solving the Problems]

In order to achieve the above-mentioned object, the present invention is configured to raise and lower the substrate mounting part by tilting the substrate transfer device, which is characterized in that the substrate is transferred between the reaction chamber and the front chamber. In a horizontal vapor phase growth apparatus having a substrate transfer device that has a substrate mounting portion at the tip of the inside of a guide cylinder connected to the antechamber and a horizontally moving guide rod, a guide for the substrate transfer device is provided. The tube and the front chamber are connected by a flexible tube, and the front end side of the substrate transfer device is rotatably connected to a connecting member standing on the front chamber or the floor near the flexible tube, The rear end side of the substrate transfer device is supported so as to be able to move up and down, and the substrate transfer device can be tilted in the vertical direction with the connecting portion with the connecting member standing on the front chamber or the floor as a fulcrum.

〔Example〕

The first embodiment of the horizontal vapor phase growth apparatus according to the present invention will be described below.
A description will be given with reference to FIGS.

FIG. 1 is a cross-sectional side view of the device of this embodiment, showing a flexible tube 7
3 is a side view showing a part of the elevating device 40 and the horizontal drive mechanism 13 in the vicinity of. Further, FIG. 2 is a cross-sectional plan view in the vicinity of the connecting portion between the front chamber 3 and the substrate transfer device 5. In the figure, the same components as those in FIG. 3 are designated by the same reference numerals and detailed description thereof will be omitted.

In the apparatus of this embodiment, the connecting member 3 formed of short pipes having different diameters from the front chamber 3 and the front chamber side end plate 14a of the substrate transfer device 5 is used.
0 and 31 are provided so as to surround the flexible tube 7 and form an intersecting portion so as to project, and support pins 32 and 32 are inserted into the intersecting portion from two positions in the horizontal direction so that both connecting members 30, 31 is connected so as to be rotatable in the vertical direction, and the rear end side end plate 14b of the substrate transfer device 5 is supported by a lifting device 40 so as to be lifted and lowered. The elevating device 40 is similar to the elevating device of the conventional device, and includes an elevating part 41 and an elevating drive part 42 for elevating the elevating part 41. The elevating part 41 has the rear end side plate 1
It abuts on or is connected to the lower end of 4b.

In the apparatus of the present embodiment configured as described above, when the elevating device 40 is operated to lower the rear end side of the substrate transfer device 5, the substrate transfer device 5 uses the support pins 32, 32 of the connecting portion as a fulcrum. It tilts clockwise and the guide rod 1
1 also tilts clockwise, and the substrate platform 9 rises. Further, when the rear end side of the substrate transfer device 5 is raised, the substrate placing portion 9 is lowered, contrary to the above. In this way, the apparatus of this embodiment raises and lowers the substrate mounting portion 9 by tilting the substrate transfer apparatus 5, and vapor phase growth on the substrate can be carried out in the same manner as the conventional apparatus.

As described above, the apparatus according to the present embodiment is configured such that the substrate placing unit 9 is moved up and down by the tilting of the substrate transfer apparatus 5 to attach and detach the substrate 9 to and from the holding table 25. The amount of displacement can be significantly reduced. For example, when the substrate mounting portion 9 is moved up and down by 20 mm, the flexible tube 7 is also moved up and down by 20 mm in the conventional apparatus, but in the apparatus of the present embodiment, for example, the indicator pin 32 and the end portion of the flexible tube 7 on the guide tube 8 side are provided. The distance of 3
0 mm, the distance between the support pin 32 and the substrate rest 9 is 700 mm
Then, the displacement amount at the end portion of the flexible tube 7 on the guide cylinder 8 side is a slight amount of 1 mm or less. Therefore, the load that the flexible tube 7 receives is drastically reduced, and its life can be greatly extended.

A slight up-and-down force is also generated in the transfer motor 17 as the substrate transfer device 5 tilts, but since the displacement amount is small as described above, it can be absorbed by the belt 16, and the transfer motor 17 is fixed. There is almost no problem even if installed. Alternatively, the transfer motor 17 can be suspended from the substrate transfer device 5 by an appropriate supporting means.

In this embodiment, short pipes are projected from the front chamber 3 and the substrate transfer device 5 to form the connecting members 30 and 31, respectively.
Although the support pin 32, 32 is inserted in the horizontal direction at the intersection of 31 to form the rotatable connecting portion, a plate-like material may be used as the connecting material. For example, plate-like objects may be provided so as to project from both the front chamber 3 and the substrate transfer device 5 on both sides of the flexible tube 7, and they may intersect with each other, and the support pins may be inserted into the intersecting portions.
Further, at this time, if there is sufficient strength, the connecting portion may be formed by one supporting pin. Further, in the board transfer device 5, the connection material that is erected on the floor is crossed with the connection material that projects from the board transfer device 5 side, and the support pin is inserted in the intersecting portion from the horizontal direction so that the connection material is rotatable. It can also be a department. In this case, all the connecting portions are formed near the flexible tube 7. Further, although the various connecting portions are formed by inserting the support pins (attachment in a state where the support pins are free), the support pins may be fixed to only one of the two connecting members. May form a support pin on the connecting member itself.

Further, the horizontal drive mechanism 13 of the substrate transfer device 5 is not limited to the above embodiment, and for example, the external magnet 12 may be configured to be moved forward or backward from the rear end side of the substrate transfer device 5 to the front chamber 3 side. Good, the inner magnet 10 and the outer magnet 12
Instead of using, the end of the rod-shaped body that penetrates the rear end of the guide cylinder 8 in an airtight and slidable manner may be connected to the guide rod 11, and the rod-shaped body may be moved forward and backward.

[Effect of device]

As described above, in the horizontal vapor phase growth apparatus of the present invention, the substrate transfer device is rotatably connected to the connecting member standing in the front chamber or floor near the flexible tube, and the substrate transfer device is connected to the substrate transfer device. Since the substrate mounting part is vertically tilted to lift and lower the substrate mounting part to and from the holding table, it is possible to reduce the amount of displacement of the flexible tube associated with the mounting and removal of the substrate to and from the holding table. The load that the pipe receives can be reduced and the life can be extended. Therefore, the number of times the apparatus is stopped due to the replacement of the flexible tube is reduced, so that the maintenance work can be reduced and the productivity can be improved.

Furthermore, since the amount of displacement of the flexible tube is smaller than in the conventional case, the flexible tube can be made shorter than in the conventional case, which makes it possible to make the entire vapor phase growth apparatus compact and replace the substrate in the front chamber in a shorter time. It can be carried out. That is, when the substrate after vapor phase growth is returned to the front chamber as described above, the vapor phase growth gas also flows from the reaction chamber into the front chamber, so before the substrate replacement work, the front chamber is evacuated to dry gas. Introduce. In this case, since the space between the guide rod and the guide cylinder is also evacuated, if the flexible tube is short, the time required for vacuum evacuation is shortened, and eventually the time required for exchanging the substrate in the front chamber is also shortened.

[Brief description of drawings]

FIGS. 1 and 2 show an embodiment of the present invention. FIG. 1 is a sectional side view of a horizontal vapor phase growth apparatus, FIG. 2 is a sectional plan view of an essential part, and FIGS. FIG. 1 shows a conventional horizontal vapor phase growth apparatus. FIG. 3 is a sectional side view and FIG. 4 is a sectional side view of a main part. 2 ... Reaction chamber, 3 ... Front chamber, 5 ... Substrate transfer device, 7 ...
... Flexible tube, 8 ... Guide tube, 9 ... Substrate mounting part, 11 ...
… Guide rods, 25 …… Holders, 30,31 …… Couplings,
32 ... Support pin, 40 ... Lifting device, P ... Board

Claims (1)

[Scope of utility model registration request] 1. A method of transporting a substrate between a reaction chamber in which vapor phase growth is performed on a substrate and a front chamber in which the substrate is exchanged, and the inside of a guide cylinder connected to the front chamber is placed at the front end portion of the substrate. In a horizontal vapor phase growth apparatus having a substrate transfer device having a guide portion that moves horizontally in a horizontal direction, the guide tube of the substrate transfer device and the front chamber are connected by a flexible tube, and the flexible tube The front end side of the substrate transfer device is rotatably connected to the front chamber or a connecting member erected on the floor, and the rear end side of the substrate transfer device is supported so as to be able to move up and down. Alternatively, the horizontal vapor phase growth apparatus is characterized in that the substrate transfer device can be tilted in a vertical direction with a connecting portion with a connecting member standing on the floor as a fulcrum.