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JPH06131700A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH06131700A
JPH06131700A JP4281562A JP28156292A JPH06131700A JP H06131700 A JPH06131700 A JP H06131700A JP 4281562 A JP4281562 A JP 4281562A JP 28156292 A JP28156292 A JP 28156292A JP H06131700 A JPH06131700 A JP H06131700A
Authority
JP
Japan
Prior art keywords
recording medium
optical recording
group
reflective layer
amorphous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4281562A
Other languages
Japanese (ja)
Inventor
Hiroyuki Nagao
博幸 長尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Mitsubishi Plastics Inc
Original Assignee
Mitsubishi Kasei Corp
Mitsubishi Plastics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Mitsubishi Plastics Inc filed Critical Mitsubishi Kasei Corp
Priority to JP4281562A priority Critical patent/JPH06131700A/en
Publication of JPH06131700A publication Critical patent/JPH06131700A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 腐蝕、亀裂、剥離等が生じない、反射層の耐
久性が向上した光記録媒体を提供することにある。 【構成】 Au,Ag,Cu,Alからなる第1グルー
プ、Mg,W,Pd,Ti,Zr,V,Nb,Ta,C
r,Moからなる第2グループ、B,Si,S,P,C
からなる第3グループの各グループに含まれる少なくと
も一つの元素から構成される非晶質の反射層を備えたこ
とを特徴とする光記録媒体、および高反射率を有する第
1の元素群、酸化被膜を形成する第2の元素群、前記第
1の元素群と前記第2の元素群とから構成される合金を
非晶質とする第3の元素群の各元素群に含まれる少なく
とも一つの元素から構成される非晶質の反射層を備えた
ことを特徴とする光記録媒体。 【効果】 本発明の光記録媒体は長期信頼性に優れる。
(57) [Summary] [Object] To provide an optical recording medium in which corrosion, cracking, peeling and the like do not occur and in which the durability of the reflective layer is improved. [Structure] First group consisting of Au, Ag, Cu, Al, Mg, W, Pd, Ti, Zr, V, Nb, Ta, C
Second group consisting of r and Mo, B, Si, S, P and C
An optical recording medium comprising an amorphous reflective layer composed of at least one element contained in each of the third group consisting of At least one element contained in each of the second element group forming the coating film and the third element group which makes the alloy composed of the first element group and the second element group amorphous An optical recording medium comprising an amorphous reflective layer composed of an element. The optical recording medium of the present invention has excellent long-term reliability.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は非晶質の反射層を備えた
光記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording medium having an amorphous reflective layer.

【0002】[0002]

【従来の技術】従来の光記録媒体としては、例えば図1
に示すような構造のものが知られている。図1におい
て、1は透光性を有するドーナツ板状の基板である。こ
の基板1の上には有機系色素等からなる光吸収層2が形
成されている。光吸収層2は、基板1を透過して照射さ
れたレーザ光を吸収して発熱し、溶融,蒸発,昇華,変
形または変性し、該光吸収層2や基板1の表面にピット
を形成する作用を有する層である。この光吸収層2の上
には、金,銀,銅等の結晶質の反射層3が形成されてい
る。反射層3の厚さは、通常500〜2000Å程度で
ある。さらに、この反射層3の上には、反射層3等を保
護するための保護層4が形成されている。
2. Description of the Related Art As a conventional optical recording medium, for example, FIG.
A structure as shown in is known. In FIG. 1, reference numeral 1 denotes a translucent donut plate-shaped substrate. A light absorbing layer 2 made of an organic dye or the like is formed on the substrate 1. The light absorption layer 2 absorbs the laser light emitted through the substrate 1 and is irradiated with heat to melt, vaporize, sublimate, deform or modify the light absorption layer 2 and form a pit on the surface of the substrate 1. It is a layer having an action. On the light absorption layer 2, a crystalline reflection layer 3 made of gold, silver, copper or the like is formed. The thickness of the reflective layer 3 is usually about 500 to 2000Å. Further, a protective layer 4 for protecting the reflective layer 3 and the like is formed on the reflective layer 3.

【0003】上記光記録媒体は既存のコンパクトディス
クに用いられるプレーヤにより再生できることが望まれ
ている。このため、反射層の反射率は65%以上である
ことが実用上要求されている。
It is desired that the above optical recording medium can be reproduced by a player used for an existing compact disc. Therefore, it is practically required that the reflectance of the reflective layer is 65% or more.

【0004】[0004]

【発明が解決しようとする課題】上記金,銀,銅等から
なる結晶質の反射層を用いた従来の光記録媒体は、長期
間使用していると、反射層3が基板1から剥離したり、
あるいは、反射層3に腐蝕が発生する。また、レーザー
で記録した際に発生する数百℃の熱によって、記録部の
反射層3に亀裂や剥離が生じ易い。このため、信号読み
取りの指標であるエラーレートが増加し、ジッターが著
しく悪化するという問題があった。
In the conventional optical recording medium using the crystalline reflective layer made of gold, silver, copper or the like, the reflective layer 3 is peeled off from the substrate 1 after long-term use. Or
Alternatively, the reflective layer 3 is corroded. Further, heat of several hundred degrees Celsius generated when recording with a laser easily causes cracks or peeling in the reflective layer 3 in the recording portion. For this reason, there is a problem that the error rate, which is an index of signal reading, increases, and the jitter remarkably deteriorates.

【0005】本発明の目的は腐食、亀裂、剥離等が生じ
ない、反射層の耐久性が向上した光記録媒体を提供する
ことにある。
An object of the present invention is to provide an optical recording medium in which corrosion, cracking, peeling, etc. do not occur and the durability of the reflecting layer is improved.

【0006】[0006]

【課題を解決するための手段】本発明の要旨は、Au,
Ag,Cu,Alからなる第1グループ、Mg,W,P
d,Ti,Zr,V,Nb,Ta,Cr,Moからなる
第2グループ、B,Si,S,P,Cからなる第3グル
ープの各グループに含まれる少なくとも一つの元素から
構成される非晶質の反射層を備えたことを特徴とする光
記録媒体である。
SUMMARY OF THE INVENTION The gist of the present invention is Au,
First group consisting of Ag, Cu, Al, Mg, W, P
d, Ti, Zr, V, Nb, Ta, Cr, Mo, a second group, and B, Si, S, P, C, a third group each containing at least one element An optical recording medium comprising a crystalline reflection layer.

【0007】また本発明の要旨は、高反射率を有する第
1の元素群、酸化被膜を形成する第2の元素群、前記第
1の元素群と前記第2の元素群とから構成される合金を
非晶質とする第3の元素群の各元素群に含まれる少なく
とも一つの元素から構成される非晶質の反射層を備えた
ことを特徴とする光記録媒体である。
Further, the gist of the present invention is composed of a first element group having a high reflectance, a second element group forming an oxide film, the first element group and the second element group. An optical recording medium comprising an amorphous reflective layer composed of at least one element contained in each element group of the third element group which makes the alloy amorphous.

【0008】上記各グループまたは各金属群を用いて、
高周波マグネトロンスパッタ法、DCマグネトロンスパ
ッタ法、イオンプレーティング法、クラスターイオンビ
ーム法等により基板上に5〜500nmの反射層を形成
する。
Using each of the above groups or each of the metal groups,
A reflection layer having a thickness of 5 to 500 nm is formed on the substrate by a high frequency magnetron sputtering method, a DC magnetron sputtering method, an ion plating method, a cluster ion beam method or the like.

【0009】この時、形成される反射層を非晶質となる
ような条件を選択する。例えば、前記反射層の積層方法
を、窒素ガスの流量が1〜500sccmである窒素雰
囲気中で行う。あるいは、基板を十分に冷却して低温に
保った状態でその上に速い堆積速度で成膜する。さらに
は、非晶質となりやすい合金組成を選択するなどの条件
である。
At this time, conditions are selected such that the formed reflective layer is amorphous. For example, the method for laminating the reflective layer is performed in a nitrogen atmosphere in which the flow rate of nitrogen gas is 1 to 500 sccm. Alternatively, while the substrate is sufficiently cooled and kept at a low temperature, a film is formed thereon with a high deposition rate. Furthermore, there are conditions such as selecting an alloy composition that tends to be amorphous.

【0010】さらに、Fe,Ni,Coから選ばれた少
なくとも1種の元素を含む第4の金属元素や、Ge,
Y,As,Be,Sn,Bi,Sc,Hf,Sb,S
e,Mn,Tc等から選ばれた少なくとも1種の元素を
含む第5の金属元素を、添加することによって腐食、亀
裂、剥離等を改良した非晶質の反射層を得ることができ
る。
Further, a fourth metal element containing at least one element selected from Fe, Ni and Co, Ge,
Y, As, Be, Sn, Bi, Sc, Hf, Sb, S
By adding the fifth metal element containing at least one element selected from e, Mn, Tc, etc., it is possible to obtain an amorphous reflective layer with improved corrosion, cracking, peeling and the like.

【0011】[0011]

【作用】本発明の作用については明らかではないが、以
下のように推測される。
The function of the present invention is not clear, but it is presumed as follows.

【0012】Au,Ag,Cu,Alからなる第1グル
ープは高反射率を有する金属であり、追記型記録媒体に
入射された光を反射する性質を持つ。Mg,W,Pd,
Ti,Zr,V,Nb,Ta,Cr,Moからなる第2
グループは酸化被膜を形成する性質を持つ。B,Si,
S,P,Cからなる第3グループは第1グループおよび
第2グループからなる合金を非晶質の合金にしやすい性
質を持つ。
The first group consisting of Au, Ag, Cu and Al is a metal having a high reflectance and has a property of reflecting the light incident on the write-once recording medium. Mg, W, Pd,
2nd consisting of Ti, Zr, V, Nb, Ta, Cr, Mo
The group has the property of forming an oxide film. B, Si,
The third group consisting of S, P and C has a property that the alloys consisting of the first group and the second group are likely to be amorphous alloys.

【0013】酸化被膜は化学的に安定であり反射層の腐
蝕を防止する。さらに、非晶質の合金は結晶金属の特性
である結晶粒界、転移、積層欠陥を含まないため、結晶
合金に対して耐蝕性に優れている。また、非晶質の合金
は内部応力も少ないため、密着性が向上し、剥離しにく
い。
The oxide film is chemically stable and prevents corrosion of the reflective layer. Furthermore, since the amorphous alloy does not include crystal grain boundaries, dislocations, and stacking faults, which are the characteristics of crystalline metals, they are excellent in corrosion resistance with respect to crystalline alloys. In addition, since the amorphous alloy has a small internal stress, the adhesiveness is improved and the peeling is difficult.

【0014】[0014]

【実施例】以下、実施例を説明するが、本発明はこれに
限定されるものではない。
EXAMPLES Examples will be described below, but the present invention is not limited thereto.

【0015】本発明に係る光記録媒体は、図1に示した
光記録媒体と基本的に同一構造を有しているので、実施
例の説明に図1を利用することする。
Since the optical recording medium according to the present invention has basically the same structure as the optical recording medium shown in FIG. 1, FIG. 1 will be used for the description of the embodiment.

【0016】(実施例1)ポリカーボネート製の基板1
上に、シアニン系有機色素をスピンコート法により塗布
し、記録層(光吸収層2)とした。さらに、99.99
%Agターゲット上に、Cr−Co−B−P−Wの焼結
チップを置いた複合ターゲットを用いて、窒素流量が1
00sccmである窒素雰囲気中で、スパッタ法により
膜厚150nmの非晶質の反射層3を形成した。前記非
晶質の反射層3の上に紫外線硬化性樹脂をスピンコート
し、これに紫外線を照射して硬化させ、厚さ約8μmの
保護層4を形成した。
(Example 1) Polycarbonate substrate 1
A cyanine-based organic dye was applied onto the above by a spin coating method to form a recording layer (light absorbing layer 2). Furthermore, 99.99
Using a composite target in which a Cr-Co-B-P-W sintered tip was placed on the% Ag target, the nitrogen flow rate was 1.
An amorphous reflective layer 3 having a film thickness of 150 nm was formed by a sputtering method in a nitrogen atmosphere of 00 sccm. An ultraviolet curable resin was spin-coated on the amorphous reflective layer 3 and was irradiated with ultraviolet rays to be cured to form a protective layer 4 having a thickness of about 8 μm.

【0017】上記方法によって得られた光記録媒体を、
85℃、85%RH雰囲気中に200時間投入したとこ
ろ、反射層3の剥離等の外観上異常は認められなかっ
た。
The optical recording medium obtained by the above method is
When placed in an atmosphere of 85 ° C. and 85% RH for 200 hours, no abnormality in appearance such as peeling of the reflective layer 3 was observed.

【0018】また、波長780nmの半導体レーザーを
線速1.2m/sec、記録パワー6.0mWで照射
し、EFM信号を得られた光記録媒体に記録した。そし
て、前記光記録媒体を市販のCDプレーヤ(Aurex
XR−V73,再生光の波長780nm)で再生し
て、エラーレート、ジッターを測定したところ、その値
は1cps、20nsecであり、良好な再生信号を得
ることができた。
A semiconductor laser having a wavelength of 780 nm was irradiated at a linear velocity of 1.2 m / sec and a recording power of 6.0 mW to record an EFM signal on the obtained optical recording medium. A commercially available CD player (Aurex) is used as the optical recording medium.
When the error rate and the jitter were measured by reproducing at XR-V73, the wavelength of the reproduction light was 780 nm), the values were 1 cps and 20 nsec, and a good reproduction signal could be obtained.

【0019】また、スライドガラス基板上の非晶質の反
射層3を、60℃の10wt%NaCl水溶液に5時間
浸漬し、780nmの半導体レーザーで反射率の変化を
測定したところ、浸漬前と浸漬後で変化はなかった。
The amorphous reflective layer 3 on the slide glass substrate was dipped in a 10 wt% NaCl aqueous solution at 60 ° C. for 5 hours and the change in reflectance was measured with a semiconductor laser of 780 nm. It didn't change later.

【0020】(実施例2)実施例1と同様にして記録層
(光吸収層2)を形成した基板1上に、Au−Ti−B
−Si−Niの焼結ターゲットを用いて、窒素流量が2
00sccmである窒素雰囲気中で、高周波マグネトロ
ンスパッタ法により膜厚100nmの非晶質の反射層3
を有する光記録媒体を製造した。
(Example 2) Au-Ti-B was formed on the substrate 1 on which the recording layer (light absorbing layer 2) was formed in the same manner as in Example 1.
-Si-Ni sintering target is used and nitrogen flow rate is 2
Amorphous reflective layer 3 having a film thickness of 100 nm formed by a high frequency magnetron sputtering method in a nitrogen atmosphere of 00 sccm.
An optical recording medium having

【0021】これを、実施例1と同様な方法で反射層3
の外観異常、エラーレート、ジッターの測定、反射率の
変化の測定を行ったところ、異常はみとめられなかっ
た。
The reflective layer 3 was formed in the same manner as in Example 1.
Abnormalities in appearance, error rate, jitter, and changes in reflectance were measured and no abnormality was found.

【0022】(実施例3)実施例1と同様にして記録層
(光吸収層2)を形成した基板1上に、Ag−Mg−W
−B−Siの焼結ターゲットを用いて、窒素流量が30
sccmである窒素雰囲気中で、イオンビーム法により
膜厚200nmの非晶質の反射層3を形成した。
(Example 3) Ag-Mg-W was formed on the substrate 1 on which the recording layer (light absorbing layer 2) was formed in the same manner as in Example 1.
Using a B-Si sintered target, the nitrogen flow rate is 30.
In a nitrogen atmosphere of sccm, an amorphous reflective layer 3 having a film thickness of 200 nm was formed by an ion beam method.

【0023】これを、実施例1と同様な方法で反射層3
の外観異常、エラーレート、ジッターの測定、反射率の
変化の測定を行ったところ、異常はみとめられなかっ
た。
Then, the reflective layer 3 was formed in the same manner as in Example 1.
Abnormalities in appearance, error rate, jitter, and changes in reflectance were measured and no abnormality was found.

【0024】(実施例4)実施例1と同様にして記録層
(光吸収層2)を形成した基板1上に、Ag−Cu−C
r−B−Wの焼結ターゲットを用いて、窒素流量が30
0sccmである窒素雰囲気中で、イオンビーム法によ
り膜厚100nmの非晶質の反射層3を形成した。
(Example 4) Ag-Cu-C was formed on the substrate 1 on which the recording layer (light absorbing layer 2) was formed in the same manner as in Example 1.
Using the r-B-W sintered target, the nitrogen flow rate is 30.
An amorphous reflection layer 3 having a film thickness of 100 nm was formed by an ion beam method in a nitrogen atmosphere of 0 sccm.

【0025】これを、実施例1と同様な方法で反射層3
の外観異常、エラーレート、ジッターの測定、反射率の
変化の測定を行ったところ、異常はみとめられなかっ
た。
The reflective layer 3 was formed in the same manner as in Example 1.
Abnormalities in appearance, error rate, jitter, and changes in reflectance were measured and no abnormality was found.

【0026】(実施例5)実施例1と同様にして記録層
(光吸収層2)を形成した基板1上に、Ag−Mg−W
−Si−Sの合金ターゲットを用いて、窒素流量が50
sccmである窒素雰囲気中で、スパッタ法により膜厚
100nmの非晶質の反射層3を形成した。
(Example 5) Ag-Mg-W was formed on the substrate 1 on which the recording layer (light absorbing layer 2) was formed in the same manner as in Example 1.
-Si-S alloy target was used and the nitrogen flow rate was 50.
In a nitrogen atmosphere of sccm, a 100 nm-thick amorphous reflective layer 3 was formed by a sputtering method.

【0027】これを、実施例1と同様な方法で反射層3
の外観異常、エラーレート、ジッターの測定、反射率の
変化の測定を行ったところ、異常はみとめられなかっ
た。
The same procedure as in Example 1 was applied to this to form the reflection layer 3
Abnormalities in appearance, error rate, jitter, and changes in reflectance were measured and no abnormality was found.

【0028】尚、実施例1〜5に示した以外の、第2お
よび第3のグループの元素を用いても、実施例1〜5と
同様の結果が得られている。
Even when the elements of the second and third groups other than those shown in Examples 1 to 5 were used, the same results as in Examples 1 to 5 were obtained.

【0029】(比較例1)ポリカーボネート製ディスク
基板1上に、シアニン系有機色素をスピンコート法によ
り塗布し、記録層(光吸収層2)とした。さらに、9
9.99%Agターゲット用いたスパッタリング法によ
り膜厚150nmの反射層3を形成した。前記非晶質の
反射層3の上に紫外線硬化性樹脂をスピンコートし、こ
れに紫外線を照射して硬化させ、厚さ約8μmの保護層
4を形成した。
(Comparative Example 1) A cyanine organic dye was applied onto a polycarbonate disc substrate 1 by a spin coating method to form a recording layer (light absorbing layer 2). Furthermore, 9
The reflective layer 3 having a film thickness of 150 nm was formed by a sputtering method using a 9.99% Ag target. An ultraviolet curable resin was spin-coated on the amorphous reflective layer 3 and irradiated with ultraviolet rays to be cured to form a protective layer 4 having a thickness of about 8 μm.

【0030】上記方法によって得られた光記録媒体を、
85℃、85%RH、雰囲気中に200時間投入したと
ころ、外観上ピンホールの発生が多数認められた。
The optical recording medium obtained by the above method is
When placed in an atmosphere at 85 ° C. and 85% RH for 200 hours, many pinholes were visually observed.

【0031】また、波長780nmの半導体レーザーを
線速1.2m/sec、記録パワー6.0mWで照射
し、EFM信号を得られた光記録媒体に記録した。そし
て、前記光記録媒体を市販のCDプレーヤ(Aurex
XR−V73,再生光の波長780nm)で再生し
て、エラーレート、ジッターを測定したところ、その値
は200cps、30nsecであり、ノイズの多い不
良な再生信号が得られた。
Further, a semiconductor laser having a wavelength of 780 nm was irradiated at a linear velocity of 1.2 m / sec and a recording power of 6.0 mW, and an EFM signal was recorded on the obtained optical recording medium. A commercially available CD player (Aurex) is used as the optical recording medium.
When the error rate and the jitter were measured by reproducing with XR-V73, the wavelength of the reproducing light was 780 nm), the values were 200 cps and 30 nsec, and a defective reproducing signal with a lot of noise was obtained.

【0032】一方、上記のスパッタリング時、チャンバ
ー内にスライドガラスを投入して反射層を形成し、反射
層の構造をX線回折法により測定したところ結晶構造を
示した。
On the other hand, at the time of the above-mentioned sputtering, a slide glass was put into the chamber to form a reflection layer, and the structure of the reflection layer was measured by an X-ray diffraction method to show a crystal structure.

【0033】以上示したように本発明の光記録媒体の非
晶質の反射層は、高反射率を有するAu,Ag,Cu,
Alからなる元素群、酸化被膜を形成することができる
Mg,W,Pd,Ti,Zr,V,Nb,Ta,Cr,
Moからなる元素群、前記二つの元素群から構成される
合金を非晶質とすることができるB,Si,S,P,C
からなる元素群の各元素群に含まれる少なくとも一つの
元素から構成されるので、腐蝕、亀裂、剥離等が生じる
ことがなく、耐久性が向上している。
As described above, the amorphous reflective layer of the optical recording medium of the present invention has a high reflectance of Au, Ag, Cu,
Element group consisting of Al, Mg, W, Pd, Ti, Zr, V, Nb, Ta, Cr, which can form an oxide film,
B, Si, S, P, C capable of making the element group composed of Mo and the alloy composed of the two element groups amorphous
Since it is composed of at least one element contained in each element group of the element group consisting of, the corrosion resistance, cracks, peeling, etc. do not occur and the durability is improved.

【0034】[0034]

【発明の効果】以上説明したように、本発明の光記録媒
体は耐久性が向上し、長期信頼性に優れたものである。
As described above, the optical recording medium of the present invention has improved durability and excellent long-term reliability.

【図面の簡単な説明】[Brief description of drawings]

【図1】光記録媒体の構造の一例を示す一部を切欠いた
概略斜視図である。
FIG. 1 is a partially cutaway schematic perspective view showing an example of the structure of an optical recording medium.

【符号の説明】[Explanation of symbols]

1 基板 2 光吸収層 3 反射層 4 保護層 1 substrate 2 light absorption layer 3 reflection layer 4 protective layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 Au,Ag,Cu,Alからなる第1グ
ループ、Mg,W,Pd,Ti,Zr,V,Nb,T
a,Cr,Moからなる第2グループ、B,Si,S,
P,Cからなる第3グループの各グループに含まれる少
なくとも一つの元素から構成される非晶質の反射層を備
えたことを特徴とする光記録媒体。
1. A first group of Au, Ag, Cu, Al, Mg, W, Pd, Ti, Zr, V, Nb, T.
a, Cr, Mo second group, B, Si, S,
An optical recording medium comprising an amorphous reflective layer composed of at least one element included in each of the third group consisting of P and C.
【請求項2】 高反射率を有する第1の元素群、酸化被
膜を形成する第2の元素群、前記第1の元素群と前記第
2の元素群とから構成される合金を非晶質とする第3の
元素群の各元素群に含まれる少なくとも一つの元素から
構成される非晶質の反射層を備えたことを特徴とする光
記録媒体。
2. Amorphous alloy composed of a first element group having a high reflectance, a second element group forming an oxide film, and the first element group and the second element group. An optical recording medium comprising an amorphous reflective layer composed of at least one element included in each element group of the third element group.
JP4281562A 1992-10-20 1992-10-20 Optical recording medium Pending JPH06131700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4281562A JPH06131700A (en) 1992-10-20 1992-10-20 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4281562A JPH06131700A (en) 1992-10-20 1992-10-20 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH06131700A true JPH06131700A (en) 1994-05-13

Family

ID=17640920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4281562A Pending JPH06131700A (en) 1992-10-20 1992-10-20 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH06131700A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001008145A1 (en) * 1999-07-22 2001-02-01 Sony Corporation Optical recording medium, optical recording method, optical reproducing method, optical recording device, optical reproducing device, and optical recording/reproducing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001008145A1 (en) * 1999-07-22 2001-02-01 Sony Corporation Optical recording medium, optical recording method, optical reproducing method, optical recording device, optical reproducing device, and optical recording/reproducing device
US6788635B1 (en) 1999-07-22 2004-09-07 Sony Corporation Optical recording medium, optical recording method, optical reproducing method, optical recording device, optical reproducing device, and optical recording/reproducing device

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