JPH06130617A - Photosensitive material processing bath - Google Patents

Abstract

PURPOSE:To provide the multi-chamber processing bath for processing the photosensitive material without mixing processing solutions. CONSTITUTION:This processing bath 2 is vertically provided with the plural processing chambers 8a-8e connected through the passages 14 of the photosensitive material S with each other adjacent chamber so as to pass the photosensitive material S, is tightly sealed. The lower processing chamber 8c is provided with means 24, 26, 28, and 30 for controlling the level of the processing solution so as to cause a gaseous layer 18 to exist above the level. The processing chamber 8b above the gaseous layer 18 is filled with the processing solution and the chamber 8c is filled with the other processing solution and the photosensitive material S is sent downward through the passage 14 between the chambers 8b and 8c to operate the next processing, thus permitting the processing solution in the chamber 8c not to mix with that in the chamber 8b and the photosensitive material S to be well processed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing tank for processing a silver halide photographic light-sensitive material by immersing it in a processing liquid filled in a plurality of processing chambers which are communicated with each other through a light-sensitive material transport path. .

[0002]

2. Description of the Related Art Generally, for dipping a silver halide photographic light-sensitive material, a processing tank containing a large amount of processing liquid is used for uniform processing. By storing a large amount of processing liquid in the processing tank and processing the photosensitive material, the processing liquid is favorably exchanged on the film surface of the photosensitive material, but since a large amount of processing liquid is used in this type of processing tank, As a result, the processing device becomes larger.

On the other hand, a slit type processing tank has been proposed as an apparatus for processing a photosensitive material with a small amount of processing liquid (Japanese Patent Laid-Open Nos. 61-77851 and 63-1311).
38, 63-216050, etc.). In this treatment tank, the contact area (openness) between air and the treatment liquid is small, and oxygen and carbon dioxide in the air are prevented from entering the liquid to prevent deterioration of the treatment liquid. Further, since the amount of the tank liquid is small, when the replenishing liquid is replenished at the time of processing the photosensitive material, the ratio of the replenishing liquid to the processing liquid is high, and the deterioration of the processing liquid during the dispersal processing can be prevented.

Further, a multi-chamber processing device has been proposed as a processing device for processing with a small processing liquid and different functions (JP-A-1-267648 and JP-A-2-13054).
No. 8, No. 2-240651, etc.). As the multi-chamber processing device, there is a device in which a large number of processing chambers are communicated with each other through a cross-sectional slit portion, and the cross-sectional slit portion is provided with a seal member or the like for blocking the flow of the processing liquid. When the material is not being processed, the processing liquid does not move between the chambers. In a device configured such that the sealing member elastically contacts the photosensitive material when the photosensitive material passes through the slit section, a processing liquid is prevented from moving even when the photosensitive material passes through, and a film on the photosensitive material is formed. Can be destroyed.

Further, in order to perform the rinsing process by the multi-chamber processing apparatus, rinsing water is made to flow little by little between a plurality of processing chambers from the downstream side to the upstream side in the photosensitive material conveying direction, It is desirable to be in a so-called multi-stage countercurrent state. According to the above configuration, when the seal member elastically contacts the photosensitive material, a slight gap is generated at both ends of the photosensitive material, and the liquid can move only when the seal member elastically contacts the photosensitive material. .

As a seal structure in which the photosensitive material and the processing solution can be moved between the communicating processing chambers, the tip end portions of a pair of cantilevered elastic blades are elastically brought into contact with each other or the cantilevered one piece is supported. There is a configuration in which the tip portion of the elastic blade is elastically brought into contact with the facing wall surface. According to such a configuration,
By conveying the photosensitive material against the elastic force of the elastic blade, the photosensitive material can proceed while contacting the blade, and at this time, the processing liquid is discharged from the gap corresponding to the thickness of the photosensitive material generated at the widthwise ends of the photosensitive material. Can also move.

[0007]

In the case of a multi-step process such as a water washing process, the countercurrent state is set when the process liquid moves between the adjacent process chambers in the multi-chamber process tank having the above-mentioned configuration. This is preferable because it is possible, but when the adjacent processing chambers are filled with different processing liquids in a multi-chamber processing tank for processing, it is necessary to reliably prevent contamination of the processing liquids.

For example, in the case where the developing treatment and the bleaching treatment are carried out in the adjacent processing chambers, it does not matter much if the developing solution is mixed in the bleaching solution, but conversely, the bleaching solution is mixed in the developing solution. Should definitely be avoided. This is because if the bleaching solution is mixed in the developing solution, the function of the developing solution is not deteriorated, but the developing function is hardly exhibited and the developing solution cannot be used. Therefore, considering that the components of the processing solution drop due to the effect of gravity, if a bleaching processing chamber is provided below the development processing chamber and the photosensitive material is conveyed downward, the bleaching solution will be generated even if both processing chambers are adjacent. It was thought that it would not be mixed in the developer.

However, in practice, if a seal member is provided to seal the photosensitive material between the two processing chambers,
It has been found that the bleaching solution is mixed in the developing solution irrespective of gravity, only by temporarily contacting the white developing solution and the bleaching solution. Therefore, it has been found that the multi-chamber processing tank having the above-mentioned configuration is not sufficient to perform the processing by the different processing solutions such as the developing processing and the bleaching processing in the adjacent processing chambers.

An object of the present invention is to solve the above-mentioned conventional problems, and to provide a photosensitive material processing tank in which the processing liquid is not mixed from the processing chamber on the downstream side in the conveying direction of the photosensitive material to the processing chamber on the upstream side. It is in.

[0011]

The above object of the present invention is achieved by the following constitution. (1) In a multi-chamber processing tank in which a plurality of processing chambers communicating with each other through a photosensitive material transport path are vertically stacked, and a photosensitive material passage between adjacent processing chambers is liquid-tightly sealed so that a photosensitive material can pass therethrough,
A photosensitive material processing tank comprising means for adjusting the liquid level in the lower processing chamber so that a gas layer is formed above the processing liquid level in the lower processing chamber of at least one set of adjacent processing chambers.

(2) In the treatment tank of (1), the means for adjusting the liquid level is a liquid level detecting means, a draining means for maintaining the liquid level, and a pressurizing means. And a photosensitive material processing tank.

(3) In the processing tank of the above (1), a plurality of processing chambers are filled with a processing liquid for the next step of development, and a replenisher is replenished to the uppermost processing chamber of the processing chambers; And a means for discharging a processing liquid from a processing chamber below the replenishment processing chamber, and the photosensitive material processing tank is configured to convey the photosensitive material upward between the processing chambers for processing.

(4) Using the processing tank according to any one of (1) to (3), the processing chamber above the gas layer is filled with any one of a developing solution, a fixing solution, a washing solution and a rinsing solution. Then, the lower processing chamber is filled with another processing solution, and the photosensitive material is conveyed downward between the processing chambers for processing.

(5) In the processing tank according to any one of (1) to (3), a plurality of processing chambers filled with any one of a developing solution, a fixing solution, a washing solution and a rinsing solution are continuous. A photosensitive material processing tank.

(6) Using the processing tank according to any one of (1) to (3), a fixing solution, a bleaching solution, a bleach-fixing solution, a washing solution and a rinsing solution are provided in the processing chamber above the gas layer. A method of processing a photosensitive material, characterized in that any one of them is filled, a lower processing chamber is filled with another processing liquid, and the photosensitive material is conveyed upward between the processing chambers for processing.

(7) In the processing tank described in any one of (1) to (3), a plurality of processing chambers filled with any one of a developing solution, a fixing solution, a washing solution and a rinsing solution are continuous. A photosensitive material processing tank.

[0018]

By providing the gas layer between the adjacent processing chambers, the processing liquid in the processing chamber below the gas layer does not mix into the processing chamber above the gas layer due to the action of gravity. Therefore, in the structure in which the photosensitive material is conveyed downward in the gas layer, the processing chamber above the gas layer is filled with the processing liquid that must avoid contamination, and the processing chamber below the gas layer can allow contamination. It is only necessary to fill the processing liquid and carry the photosensitive material into each processing chamber for processing. In this way, by filling the different treatment liquids with the gas layer as the boundary,
The contamination of the processing liquid can be surely prevented, the performance of the processing liquid can be prevented from unintentionally deteriorating, and the maintenance becomes easy.

The gas used is preferably one that does not react with each treatment liquid, and an inert gas such as nitrogen is particularly preferable, but it may be air. The thickness of the gas layer is 2 to
10 mm is preferable, and 5-10 mm is particularly preferable.

In the processing chamber above the gas layer in the direction in which the photosensitive material is conveyed, even if the processing liquid in the processing chamber is mixed into the processing chamber therebelow, the performance of the processing liquid below is not adversely affected. It is preferable that the treatment liquid is filled. On the contrary, it is preferable that the processing chamber below the gas layer is filled with a processing liquid having a property that performance degradation does not pose a problem even if the processing liquid is mixed from the processing chamber above it.

When the treatment liquid above the gas layer and the treatment liquid below the gas layer are listed as a combination of the treatment liquids suitable for the above relationship, the treatment liquid having the developing ability, the treatment liquid having the fixing ability, the washing water and the fixing ability are listed. There is a combination of treatment liquids such as The specific combination of the processing solution above the gas layer and the processing solution below is the color developing solution and bleach-fixing solution when processing a color photosensitive material, the color developing solution and fixing solution when processing a black-and-white photosensitive material. Are a black-and-white developing solution and a bleaching solution, and a bleaching solution and a fixing solution.

For example, in the structure in which the upper processing chamber of the gas layer is filled with the developing solution and the lower processing chamber is filled with the fixing liquid, and the photosensitive material is conveyed downward in the processing tank arranged in this way to process the image, Although the developer is slightly mixed in the fixer,
The fixing solution is surely prevented from being mixed into the developing solution.
Therefore, there is no expiry of the developing solution, and there is no cause of performance deterioration other than the fatigue of the developing solution due to the processing of the photosensitive material and the aging, and the replenishing amount of the developing replenishing solution can be reduced accordingly, which is also advantageous in terms of cost. .

The means for adjusting the liquid surface level are, for example, a liquid surface sensor for detecting the liquid surface below the gas layer, and a liquid discharging means (for discharging the processing liquid when the liquid surface is above a set level). (Pump, valve, etc.), and compressed gas supply means (pump, compressor, pressure chamber, etc.) for constantly generating a predetermined pressure in the gas layer on the processing liquid. The pressure of the gas layer is
In the passage of the photosensitive material above the processing chamber, the processing liquid is constantly pushed up so that the processing liquid does not drop from a slight gap that may occur in the vicinity of the seal member during processing of the photosensitive material. Even if a gap is created near the seal member provided between the processing chambers, the surface tension can prevent the processing liquid from falling, but by increasing the pressure of the gas layer below it, the processing liquid can be reliably prevented from falling. To be done.

The portion where the gas layer is provided is preferably a portion which serves as a boundary between two processing chambers filled with different processing liquids in order to prevent contamination of different processing liquids. Further, if an air layer is formed above the bleach-fix solution, the bleach-fix solution is constantly in contact with oxygen in the air to increase the activity,
A small amount of replenisher is required.

In the adjacent processing chamber filled with the same type of processing liquid, the processing liquid component in the upper processing chamber moves to the lower processing chamber through the photosensitive material passage due to gravity, thereby forming a concentration gradient. Therefore, the replenisher is replenished to the uppermost processing chamber of the multi-chamber processing tank filled with the same type of processing liquid so as to overflow from the lowermost processing chamber (the processing chamber immediately after the single-chamber processing bath), and the photosensitive material is removed. It is preferable to carry the multi-stage countercurrent treatment by conveying it upward.

The multi-stage countercurrent treatment is effective in the washing treatment for the purpose of removing unnecessary components of the prebath adhering to the emulsion surface of the light-sensitive material and unnecessary components of the prebath in the emulsion film. For this reason, the processing performed by filling the multi-chamber processing tank with the same kind of processing liquid is particularly effective when the photosensitive material is subjected to a predetermined processing and then the cleaning processing is temporarily performed.

Even at such a boundary between adjacent processing chambers filled with the same type of processing liquid, it is preferable to provide a gas layer between the processing chambers. The reason for this is that in the cleaning process, the photosensitive material is more efficiently cleaned when it is contacted with the gas temporarily to cut off the liquid on the surface than when it is always contacted with the processing liquid. Therefore, by providing the gas layer between the adjacent processing chambers for performing the cleaning process, there is an effect that the cleaning can be performed quickly and satisfactorily.

The cleaning process here is a process for removing unnecessary components adhering to or impregnating the photosensitive material,
Specifically, there are washing treatment and rinsing treatment. Further, the cleaning process in the sense of removing unnecessary components also includes a fixing process in which a desilvering process, which is a washing out action of silver, is widely performed, and the present invention is also effective in a fixing process performed in a multistage cascade. In a broader sense, all post-development processes are cleaning processes to remove some substances, so bleaching and bleach-fixing processes should be performed with a gas layer between adjacent processing chambers in a multi-chamber multi-chamber processing tank. Even if it is provided, the same effect can be obtained.

[0029]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the accompanying drawings. However, the present invention is not limited to this embodiment, and any modifications can be made based on the technical idea of the present invention.

FIG. 1 is a sectional view of a processing tank 2 which is a first embodiment of the present invention. The processing tank 2 shown in FIG. 1 is for performing color development processing of exposed color paper.
The development processing and the bleach-fixing processing are performed.

The processing tank 2 includes a plurality of processing chambers 8a to 8a each having a vertical partition wall 4 extending in the vertical direction and a horizontal partition wall 6 extending in the horizontal direction.
It is divided into e. A slit-shaped photosensitive material passage 14 is formed in the horizontal partition wall 6, and the lower end of the vertical partition wall 4 is located at a predetermined height from the bottom of the processing tank. Through each processing room 8a
It is designed to be conveyed between ~ 8e. A seal member 16 made of an elastic blade is provided in the passage 14 to liquid-tightly seal the passage 14 except when the photosensitive material is passing.

The processing bath 2 includes a first processing chamber 8a, a second processing chamber 8b, a third processing chamber 8c, and a third processing chamber 8c, which are arranged in this order from the upstream side in the photosensitive material transport direction.
A fourth processing chamber 8d and a fifth processing chamber 8e are provided, and the first processing chamber 8a and the second processing chamber 8b are filled with a color developing solution. In addition, the third processing chamber 8c, the fourth processing chamber 8d and the fifth processing chamber 8d
The processing chamber 8e is filled with a bleach-fixing solution. The gas layer 18, which is a feature of the present invention, is formed in the third processing chamber 8c and the fourth processing chamber 8d filled with the bleach-fixing solution. The volume of each processing chamber is preferably about 20 to 3000 ml.

A replenishment pipe 20 for replenishing the development replenisher is provided in the first processing chamber 8a, and a replenishment pipe 22 for replenishing the bleach-fixing solution is provided in the fifth processing chamber 8e. The developer in the first processing chamber 8a adheres to the photosensitive material S by the action of gravity from a gap generated in the vicinity of the seal member 16 when the photosensitive material S passes through the passage 14, and a part of the developer is subjected to the second processing. It flows into the chamber 8b. A part of the developer in the second processing chamber 8b drops from the similarly generated gap and flows into the third processing chamber 8c. Therefore, the first processing chamber 8a and the second processing chamber 8
The developing solution with b has a concentration gradient with higher performance between the developing solution and the upstream side in the photosensitive material conveying direction, so that the developing process is performed in multiple stages.

On the other hand, the bleach-fix solution in the fifth processing chamber 8e is
When the photosensitive material S passes through the passage 14, the sealing member 16
Due to the action of gravity, a part of the gap is generated in the vicinity of and falls into the fourth processing chamber 8d and flows in. Further, the bleach-fixing solution in the fourth processing chamber 8d flows into the third processing chamber 8c by the action of gravity from the gap similarly generated. Therefore, the third to fifth processing chambers 8
The bleach-fixing solutions of c to 8e have a density gradient with higher performance in the downstream of the photosensitive material conveying direction, and the bleach-fixing processing is also performed in multiple stages.

Although the third processing chamber 8c was initially filled with the bleach-fixing solution, the developer dropped with the processing of the light-sensitive material S and was mixed with the bleach-fixing solution, so that the bleach-fixing solution was contaminated. . However, since the third processing chamber 8c is the first step of the bleach-fixing processing step, and the bleach-fixing processing is subsequently performed in the fourth processing chamber 8d and the fifth processing chamber 8e as the first step of the bleach-fixing processing. Even if the bleach-fix solution in the third processing chamber 8c is somewhat contaminated, there is no big problem.

Next, regarding the configuration of the liquid level adjustment for setting the lower limit of the gas layer, which is an essential part of the present invention, the third processing chamber 8
An example will be described with reference to c. The liquid level sensor 2 is used to adjust the liquid level.
4, a drainage valve 26 as a drainage means, and a pressure chamber 28 as a compressed gas supply means for feeding a compressed gas onto the liquid surface.
And an air supply valve 30 and a drive control means (CPU etc.) 32 for controlling each of these operations. Pressure chamber 28
Compressed gas is appropriately supplied by a compressor (not shown) to maintain a constant high pressure state.

The liquid level sensor 24 issues a detection signal when the liquid level rises above a set liquid level, and the control means 32
Supply a detection signal to. The control means 32 is the drain valve 26.
And an activation signal is supplied to the air supply valve 30 to control these operations. That is, when the liquid level in the third processing chamber 8c rises due to the inflow of the same or different processing liquid from the other processing chamber, and the liquid level sensor 24 detects this, the control means 32.
Opens the drain valve 26 to partially discharge the bleach-fixing solution, and also opens the air supply valve 30 to supply compressed gas on the liquid surface to form the gas layer 18 at a predetermined height. The pressure in the gas layer may be detected by a pressure gauge and maintained at a constant value, but when the treatment liquid is filled up to a predetermined level above a set level without using the pressure gauge, The pressure may be set so that the liquid level is pushed down to the set level.

Similarly, a liquid level sensor 34, an air supply valve 36, and a compression chamber 38 are provided for the fourth processing chamber 8d, and these are connected to the control device 32. The processing liquid in the fourth processing chamber 8d is discharged through the third processing chamber 8c, and the drain valve 26 is also used for discharging the liquid. Then, the control device 32 controls the operation of the drainage valve 26 and the air supply valve 36 based on the detection signal from the liquid level sensor 34 to adjust the liquid level of the fourth processing chamber 8d to adjust the gas to a predetermined height. The layer 19 is formed.

The bleach-fixing solution in the third processing chamber 8c and the fourth
Since there is a head difference between the bleach-fix solution in the processing chamber 8d,
The pressure of the gas layer 18 is set higher than the pressure of the second gas layer 19, so that the third processing chamber 8c and the fourth processing chamber 8d can maintain proper liquid level. For example, the pressure of each of the first gas layer 18 and the second gas layer 19 is 1.0.
It is preferably about 01 to 1.5 atm.

FIG. 2 is an enlarged view of portions a and b in FIG. Since there is a head difference between the liquid surface of the third processing chamber 8c and the liquid surface of the fourth processing chamber 8d, the atmospheric pressure P1 at the portion a is larger than the atmospheric pressure P2 at the portion b. Here, the pair of seal members 16 provided in the passage 14 are made of an elastic material, and are cantilevered so that the leading end portions thereof elastically contact with each other in the direction of the photosensitive material transport direction. The pressure P1 acts in the direction in which the two come in close contact with each other. Of course, the sealing member 16 alone exerts the sealing function, but at the portion a, the close contact of the sealing member 16 is improved due to the action of the atmospheric pressure in the gas layer 18, so that the sealing function is enhanced. It is also possible to prevent the developer from leaking through between the seal members 16.

The seal member 16 is similarly supported in the portion b, but the air pressure of the gas layer 19 acts in the direction of releasing the close contact of the seal member 16 contrary to the portion a, and the space between the seal members 16 is released. The liquid mobility of is increased. However, since it is preferable that a predetermined amount of liquid is moved in the portion b in order to cause a countercurrent state, the pressure P2 and the weight of the bleach-fixing liquid in the fifth processing chamber 8e are appropriately adjusted to adjust the position. Although a certain amount of bleach-fix solution can be moved, the bleach-fix solution does not leak more than necessary.

The photosensitive material S is immersed in a developing solution in the first processing chamber 8a and the second processing chamber 8b for development processing, and then the third processing chamber 8a.
After passing through the gas layer 18 in the processing chamber 8c, the third processing chamber 8c
It is immersed in a bleach-fixing solution and the bleach-fixing process is started. The main component is adhered to the photosensitive material S discharged from the second processing chamber 8b, and the main component is directly attached to the third processing chamber 8c.
Mixed in. Further, a part of the developer in the second processing chamber 8b falls into the third processing chamber 8c through the gap formed in the vicinity of the seal member 16 as the photosensitive material S passes. However, in a general processing apparatus, as in the case where the developing solution is brought into the bleach-fixing solution by the light-sensitive material S, even if a small amount of the developing solution is mixed due to dropping from the passage 14, there is no serious problem.

On the other hand, if the bleach-fixing solution is mixed in the developing solution, the developing performance will be lost immediately, so this should be absolutely avoided. By filling the second processing chamber 8b with the developing solution and filling the third processing chamber 8c with the bleach-fixing solution through the gas layer 18, mixing of the bleach-fixing solution into the developing solution is against gravity. Therefore, this is not possible, and the developing solution does not lose its performance due to the bleach-fixing solution being mixed into the developing solution.

Further, since the photosensitive material S temporarily moves in the gas, the processing liquid adhering to the photosensitive material S becomes droplets due to the surface tension while passing through the gas layers 18 and 19. As a result, the liquid It also has the effect of improving sharpness. Therefore,
In the first gas layer 8a, the liquid running out of the developing solution becomes good and the development progress can be stopped immediately, and in the second gas layer 8b, the liquid running out of the bleach-fixing solution becomes good, and then the high function in the fifth processing chamber 8e is achieved. The final bleach-fixing treatment with the bleach-fixing solution of is carried out quickly and satisfactorily.

In the above embodiment, the first and second processing chambers 8 are
a and 8b are filled with a developing solution, and the third to fifth processing chambers 8c to 8 are
Although e is filled with a bleach-fixing solution for processing, the processing solution may be changed and filled as described below.

For example, when the third to fifth processing chambers 8c to 8e are filled with the liquid having the cleaning function, the uppermost processing chamber 8e is replenished with the replenishing liquid, and the photosensitive material S is on the right side of the vertical partition wall 4 at this time. When transported upward, the processing chamber 8e at the top is
The processing solution sequentially flows into each of the processing chambers 8d and 8c therebelow. In addition to the fact that the processing liquid flows in a cascade state from above (downstream in the transport direction) to downward (upstream in the transport direction), and the components fall due to the effect of gravity, the cleanliness becomes higher in the processing chamber above. Therefore, the photosensitive material S is efficiently washed.

Therefore, the photosensitive material S is formed on the right side of the vertical partition wall 4.
If the liquid is conveyed upward, the processing liquid in the upstream processing direction becomes a liquid with a thicker processing liquid component, and conversely, the processing liquid in the downstream processing liquid becomes a liquid with a weaker component. The cleaning efficiency is good. Further, particularly when the cleaning process is performed, rather than the photosensitive material S being in constant contact with the processing liquid,
Temporary contact with gas is preferable because the treatment liquid is once removed from the film surface, and it is preferable to provide a gas layer between adjacent treatment tanks.

The cleaning here may be temporary cleaning between specific treatments, or cleaning in the final step before drying. Further, the cleaning liquid has a cleaning function in a broad sense, and examples thereof include a liquid having a bleaching ability, a liquid having a fixing ability, a rinse liquid, and washing water.

The processing liquid above the gas layer 18 on the side where the light-sensitive material S is conveyed downward may be any of a developing liquid, a fixing liquid, a washing liquid, and a rinsing liquid. It is preferable to fill a plurality of processing chambers. Further, the processing liquid above the air layer 19 on the side where the photosensitive material S is conveyed upward may be any of a bleaching solution, a bleach-fixing solution, a washing solution, and a rinsing solution. It is preferable to fill a plurality of processing chambers.

When the light-sensitive material S is processed, the processing tank having the above-mentioned constitution can be used for each step of development, bleach-fixing, bleaching, fixing, washing, rinsing, stabilization, etc. Even if only the tank for carrying out at least two processing steps is configured as described above, it is effective. In particular, it is preferably applied in a treatment process in which it is desired to prevent the mixture of different treatment liquids.

Next, a second embodiment of the present invention will be described. FIG. 3 is a sectional view of a processing tank according to the second embodiment of the present invention. This embodiment is different from the above-mentioned first embodiment in that
This is the position where the gas layer is provided. In the processing tank 2 of the second embodiment, the gas layer 18 is provided only in the third processing chamber 8c, which is the lowermost chamber, and the liquid level provided for the fourth processing chamber 8d. Sensor 3
4 and the air supply valve 36 are omitted.

Even if the gas layer 18 is provided only in the third processing chamber 8c, the backflow is prevented by the gas layer 18, and the bleach-fixing solution in the third processing chamber 8c is above the second processing chamber 8c.
It is possible to prevent the developer from expiring without being mixed in b.
Further, since the gas layer 18 is also provided between the fourth processing chamber 8d and the fourth processing chamber 8d, the bleach-fixing solution in the third processing chamber 8c will not be mixed in the fourth processing chamber 8d even if the processing liquid is of the same kind. , The concentration gradient of the bleach-fix solution between the third processing chamber 8c and the fourth processing chamber 8d is kept good.

In the second embodiment, a common gas layer 18 is provided between the processing chambers filled with different types of processing liquids and between the processing chambers filled with the same type of processing liquids. It can be formed by the valve 26, the air supply valve 30, and the pressure chamber 28.

When the photosensitive material S is conveyed downward, the processing liquid above the gas layer 18 is a developing liquid, a fixing liquid,
It may be either a washing liquid or a rinse liquid, and each processing liquid is preferably filled in a plurality of processing chambers 8a and 8b. Further, as the processing liquid above the gas layer 18 on the side where the photosensitive material S is conveyed upward, a bleaching solution, a bleach-fixing solution,
It may be either a washing liquid or a rinse liquid, and each processing liquid is preferably filled in a plurality of processing chambers 8d and 8e.

[0055]

According to the present invention, since the liquid level is adjusted so that the gas layer exists on the processing liquid level in the processing chamber below the at least one pair of adjacent processing tanks, it is above the gas layer. The processing liquid in the processing chamber does not come into contact with the processing liquid in the processing chamber below, and the processing liquid in the processing chamber below does not mix into the processing liquid in the processing chamber above. Therefore, it is possible to process the photosensitive material by filling different types of processing liquids that must be reliably prevented from mixing in the upper processing chamber and the lower processing chamber. For example, the upper processing chamber can be filled with the developing solution. However, even if the bleaching solution is filled in the lower processing chamber to process the photographic material, the photographic material can be satisfactorily processed without causing any problems due to mixing of the processing solutions.

[Brief description of drawings]

FIG. 1 is a sectional view of a photosensitive material processing tank according to a first embodiment of the present invention.

FIG. 2 is an enlarged view of portions a and b of FIG.

FIG. 3 is a sectional view of a photosensitive material processing tank according to a second embodiment of the present invention.

[Explanation of symbols]

 S Photosensitive material 2 Processing tank 4 Vertical partition wall 6 Horizontal partition wall 8a, 8b, 8c, 8d, 8e Processing chamber 12 Conveying roller 14 Passage 16 Sealing member 18, 19 Gas layer 20, 22 Replenishing pipe 24, 34 Liquid level sensor 26 Draining liquid Valve 28, 38 Pressure chamber 30, 36 Air supply valve 32 Control device

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[Procedure amendment]

[Submission date] December 21, 1992

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0006

[Correction method] Change

[Correction content]

As a seal structure in which the photosensitive material and the processing solution can be moved between the communicating processing chambers, the tip end portions of a pair of cantilevered elastic blades are elastically brought into contact with each other or the cantilevered one piece is supported. There is a configuration in which the tip portion of the elastic blade is elastically brought into contact with the opposite wall surface (Japanese Patent Laid-Open No. 4-243258).
No. 4-243259). With such a configuration, the photosensitive material can be advanced while being in contact with the blade by conveying the photosensitive material against the elastic force of the elastic blade. The processing liquid can also move from the gap corresponding to the material thickness.

[Procedure Amendment 2]

[Document name to be amended] Statement

[Correction target item name] 0009

[Correction method] Change

[Correction content]

However, in practice, if a seal member is provided to seal the photosensitive material between the two processing chambers,
It was found that the bleaching solution was mixed into the developing solution irrespective of the gravity, because the white developing solution was temporarily in contact with the bleaching solution having a higher specific gravity than that . Therefore, it has been found that the multi-chamber processing tank having the above-mentioned configuration is not sufficient to perform the processing by the different processing solutions such as the developing processing and the bleaching processing in the adjacent processing chambers.

[Procedure 3]

[Document name to be amended] Statement

[Correction target item name] 0019

[Correction method] Change

[Correction content]

The gas used is preferably one that does not react with each treatment liquid, and an inert gas such as nitrogen is particularly preferable, but it may be air. Furthermore, if necessary, the ratio
Heavy gases such as carbon dioxide, argon, xeno
It may be krypton gas. The thickness of the gas layer is 2 to
10 mm is preferable, and 5-10 mm is particularly preferable. Well
In addition, the liquid at the top of the blade is replaced with the air at the bottom during processing.
However, in order to reduce this, a magnet is attached to the blade tip.
It may be incorporated to improve the blade adhesion. More needed
The magnetic force may be controlled accordingly.

Claims (7)

[Claims] 1. A multi-chamber processing tank in which a plurality of processing chambers communicating with each other through a photosensitive material conveying path are vertically stacked and a photosensitive material passage between adjacent processing chambers is liquid-tightly sealed so that a photosensitive material can pass therethrough. A photosensitive material processing tank comprising means for adjusting the liquid level in the lower processing chamber so that a gas layer is formed above the processing liquid in the lower processing chamber of at least one set of adjacent processing chambers. 2. The processing tank according to claim 1, wherein the means for adjusting the liquid surface level is a liquid surface detecting means, a liquid discharging means for maintaining the liquid surface, and a pressurizing means. Photosensitive material processing tank. 3. The processing tank according to claim 1, wherein a plurality of processing chambers are filled with a processing liquid for the next step of development, and the uppermost processing chamber of the processing chambers is replenished with a replenishing liquid; And means for discharging the processing liquid from the processing chamber below the chamber,
A photosensitive material processing tank, which conveys the photosensitive material upward between the processing chambers for processing. 4. The processing tank according to claim 1, wherein a developing solution, a fixing solution, and a developing solution are provided in a processing chamber above the gas layer.
A photosensitive material characterized in that it is filled with either a washing liquid or a rinse liquid, the lower processing chamber is filled with another processing liquid, and the photosensitive material is conveyed downward between the processing chambers for processing. Processing method. 5. The processing tank according to claim 1, wherein a plurality of processing chambers filled with a developing solution, a fixing solution, a washing solution, or a rinsing solution are continuous. Photosensitive material processing tank. 6. The processing bath according to claim 1, wherein a fixing solution, a bleaching solution, and a fixing solution are provided in a processing chamber above the gas layer.
A bleach-fixing solution, a washing solution, or a rinsing solution is filled, the lower processing chamber is filled with another processing liquid, and the photosensitive material is conveyed upward between the processing chambers for processing. And a method for processing a photosensitive material. 7. The processing tank according to claim 1, wherein a plurality of processing chambers filled with a developing solution, a fixing solution, a washing solution, or a rinsing solution are continuous. Photosensitive material processing tank.