JPH06105235B2 - Humidity detection element - Google Patents
Humidity detection elementInfo
- Publication number
- JPH06105235B2 JPH06105235B2 JP20406086A JP20406086A JPH06105235B2 JP H06105235 B2 JPH06105235 B2 JP H06105235B2 JP 20406086 A JP20406086 A JP 20406086A JP 20406086 A JP20406086 A JP 20406086A JP H06105235 B2 JPH06105235 B2 JP H06105235B2
- Authority
- JP
- Japan
- Prior art keywords
- humidity
- moisture
- capacitance
- film
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) この発明は、静電容量値の変化により雰囲気の相対湿度
を検知する湿度検知素子に関するものである。TECHNICAL FIELD The present invention relates to a humidity detecting element for detecting the relative humidity of an atmosphere based on a change in electrostatic capacitance value.
(従来の技術と問題点) 感湿素子は使用される材料と、その動作原理より大きく
2種に分類出来る。その一つは、金属酸化物等の焼結体
を用いた多孔質セラミックス等の湿度に対して電気伝導
度が変化する事を利用した電気抵抗変化型である。これ
らの材料に於ては、感湿素子が使用される環境は、湿度
の外,ガス,油等を含む場合が多いので抵抗値が使用期
間と共に高くなり所謂経時変化によって、性能の劣化を
起し易い。劣化した素子の性能を回復するためには、加
熱クリーニングを施す方式があるが、この方式では、ヒ
ータ及び制御回路が必要である。(Prior Art and Problems) Moisture-sensitive elements can be roughly classified into two types according to the materials used and the operating principles thereof. One of them is an electric resistance change type that utilizes the fact that the electric conductivity changes with humidity of porous ceramics using a sintered body of metal oxide or the like. In these materials, the environment in which the humidity sensitive element is used often contains humidity, gas, oil, etc., so the resistance value increases with the period of use, causing deterioration of performance due to so-called aging. Easy to do. In order to recover the performance of the deteriorated element, there is a method of performing heating cleaning, but this method requires a heater and a control circuit.
他の一つは、静電容量変化型で、感湿材中の水分量によ
り誘電率が変化し容量が変化することを利用したもので
ある。感湿材料としては有機高分子フィルム,金属酸化
物膜,酸化アルミニウム膜等が掲げられる。現在までに
発表されているこれらの材料に於ては感湿特性面で、相
対湿度に対する静電容量の変化が、必ずしも直線的に変
化せず、低湿度或いは高湿度の領域で直接よりずれるも
のも多い。又、同じ湿度の状態に於ても、周囲温度が変
化すると、静電容量の値も変化する所謂温度依存性を持
つものも多い。このため感湿素子出力を信号処理する場
合、回路構成が複雑になるのを避けられない。その他一
般に高分子膜を用いるものでは高温での使用には耐えら
れないという欠点もある。The other is a capacitance change type, which utilizes the fact that the permittivity changes and the capacitance changes depending on the amount of water in the moisture sensitive material. Examples of moisture sensitive materials include organic polymer films, metal oxide films, aluminum oxide films and the like. In these materials that have been announced so far, the change in capacitance with respect to relative humidity does not necessarily change linearly in terms of moisture sensitivity characteristics, and it shifts directly in the low or high humidity region. There are also many. Further, even in the same humidity condition, when the ambient temperature changes, the capacitance value also changes in many cases, which is so-called temperature dependency. Therefore, when the humidity sensitive element output is subjected to signal processing, it is inevitable that the circuit configuration becomes complicated. In addition, in general, the one using a polymer film has a drawback that it cannot withstand use at high temperature.
本発明は従来技術の問題点を解決するためになされたも
のでその目的とするところは、感湿素子の耐薬品性,耐
ガス性を向上させると共に相対湿度の変化に対して静電
容量が直線的に変化し、温度依存性が無く、しかも製造
工程の少ない信頼性のある湿度検知素子を提供すること
にある。The present invention has been made to solve the problems of the prior art, and its object is to improve the chemical resistance and gas resistance of the humidity sensitive element and to improve the capacitance with respect to changes in relative humidity. An object of the present invention is to provide a reliable humidity detecting element that changes linearly, has no temperature dependence, and has a small number of manufacturing steps.
(問題点を解決するための手段) 前述の問題点を解決するためには感湿膜の選択が重要で
ある。一般にポリイミド樹脂は耐熱性,耐溶剤性,耐寒
性に優れその他の電気特性においても、特に比誘電率が
温度の変化に致してもほぼ一定で、しかも体積抵抗率も
高い等の優れた点を持っていることは周知の事実であ
る。又、ポリイミド樹脂の種類によっては数%の吸水率
を示すものもある。これらの総合利点よりポリイミド樹
脂を感湿膜として使用することは適当である。(Means for Solving Problems) In order to solve the above problems, selection of the moisture sensitive film is important. Generally, polyimide resin has excellent heat resistance, solvent resistance, cold resistance, and other electrical characteristics, in particular, its relative permittivity is almost constant even when the temperature changes, and its volume resistivity is high. It is a well-known fact to have. Some polyimide resins have a water absorption rate of several percent. It is appropriate to use the polyimide resin as the moisture sensitive film because of these comprehensive advantages.
ポリイミド樹脂を用いた容量型感湿素子として発表され
ている文献には例えば、公開特許公報,昭55−66749号
および昭60−166854号等がある。特開昭55−66749号の
場合は金属基板に接着層を設けその上にポリイミド層を
形成し、更に水分透過可能な金の薄膜より成っている。
この場合には上部金電極が異物等の接触により破損を受
け易く、素子の特性変化に繋がる。次に特開昭60−1668
54号の場合には、ガラス基板上に櫛形のタンタル金属層
を設け、この金属の表面を酸化して電気絶縁層とし、そ
の上にポリイミド層を形成後、ポリイミド層の一部をエ
ッチングして除去した部分に上部の櫛形金属電極を蒸着
し熱処理を施すという複雑な工程を必要とする。さらに
その構造上上部金属が露出しているために感湿素子の劣
化の原因になる。これらの欠点を解決するために、発明
者等は基板にシリコン半導体ウエハーを採択した。この
理由はシリコン自体を剛性基板と下部電極に兼用出来る
からである。従って特に下部電極層を設ける必要がなく
製造工程の簡略化に繋がる。尚シリコン基板上に感湿素
子を形成すれば、これと同一基板上に感湿素子の出力信
号処理機能を持つ回路素子および温度検知素子も集積化
でき、更に応用範囲が広がることも期待出来るからであ
る。Documents that have been published as capacitive moisture-sensitive elements using a polyimide resin include, for example, published patent publications, Sho 55-66749 and Sho 60-166854. In the case of JP-A-55-66749, an adhesive layer is provided on a metal substrate, a polyimide layer is formed on the adhesive layer, and a gold thin film permeable to water is further formed.
In this case, the upper gold electrode is easily damaged by contact with foreign matter or the like, which leads to a change in device characteristics. Next, JP-A-60-1668
In the case of No. 54, a comb-shaped tantalum metal layer is provided on a glass substrate, the surface of this metal is oxidized to form an electrical insulating layer, and a polyimide layer is formed on it, and then a part of the polyimide layer is etched. A complicated process of vapor-depositing an upper comb-shaped metal electrode on the removed portion and performing heat treatment is required. Further, the upper metal is exposed due to its structure, which causes deterioration of the humidity sensitive element. In order to solve these drawbacks, the inventors have adopted a silicon semiconductor wafer as a substrate. The reason for this is that silicon itself can be used as both the rigid substrate and the lower electrode. Therefore, it is not necessary to provide a lower electrode layer, which leads to simplification of the manufacturing process. If a moisture sensitive element is formed on a silicon substrate, it is possible to integrate a circuit element having the output signal processing function of the moisture sensitive element and a temperature detecting element on the same substrate, and it is expected that the range of application will be further expanded. Is.
更に、この発明での湿度検知素子は上部に水分透過可能
な薄いポリイミド保護膜層を備えているので、機械的な
接触や塵埃等よりも保護できより信頼性の高い感湿素子
となる。Further, since the humidity detecting element according to the present invention is provided with the thin moisture-permeable polyimide protective film layer on the upper portion thereof, the humidity detecting element can be protected from mechanical contact and dust, and is a highly reliable moisture sensitive element.
(実施例) 以下に実施例を示すことで、この発明を説明するが、こ
れによりこの発明を限定するものではない。(Examples) The present invention will be described by showing examples below, but the present invention is not limited thereby.
第1図及び第2図に実施例による感湿素子の構造図を示
す。FIG. 1 and FIG. 2 show structural diagrams of the moisture sensitive element according to the embodiment.
先ず表面研摩された抵抗率10Ω・cm以下のP型又はN型
のシリコン・ウエハー2の裏面にP型の場合はアルミニ
ウム,N型の場合には金を全面真空蒸着した後に、真空中
で熱処理を施し、オーミック接触電極1を形成する。First, after vacuum-depositing aluminum on the back surface of a P-type or N-type silicon wafer 2 having a resistivity of 10 Ω · cm or less, which is surface-polished, in the case of P-type and gold in the case of N-type, heat treatment in vacuum. Then, the ohmic contact electrode 1 is formed.
次にシリコン・ウエハー2を十分脱脂洗浄の後、ポリイ
ミド樹脂を適当な粘度に調整し、スピンナーを用いて塗
布し、ポリイミド樹脂メーカー指定の温度と時間でポリ
イミド感湿膜3の硬化を行なう。この膜厚が厚い場合に
は感湿特性の感度が悪くなる。又薄い場合には膜自体の
抵抗値が低くなり、静電容量と並列に構成される抵抗値
が下がり、信号処理上の不都合を来す。一般に1.0〜5.0
μmの厚さが適当である。Next, after the silicon wafer 2 is thoroughly degreased and cleaned, the polyimide resin is adjusted to an appropriate viscosity and applied using a spinner, and the polyimide moisture sensitive film 3 is cured at the temperature and time specified by the polyimide resin manufacturer. When this film thickness is thick, the sensitivity of the moisture sensitivity characteristic becomes poor. When the film is thin, the resistance value of the film itself becomes low, and the resistance value formed in parallel with the capacitance decreases, which causes inconvenience in signal processing. Generally 1.0-5.0
A thickness of μm is suitable.
次に上部電極4を形成する。この上部電極を形成する工
程に於て、電極の形状により2通りの方法がある。その
一つは検知素子の周辺部を遮蔽するメタル・マスクを通
して金を全面に蒸着する方法で、この場合、金属膜を通
して水分の透過性を持たせるために、その膜厚は500Å
前後に限定される。他の方法は櫛形の様に金属が蒸着さ
れない部分を持ったメタル・マスクを使用して形成する
方法である。この場合には空間の部分より水分の透過が
あるために、金属は金以外の金属でも良く、厚さも可成
り厚く(1000Å以上)てもよい。Next, the upper electrode 4 is formed. In the process of forming the upper electrode, there are two methods depending on the shape of the electrode. One is a method of depositing gold on the entire surface through a metal mask that shields the periphery of the sensing element. In this case, the film thickness is 500 Å in order to make water permeability through the metal film.
Limited to the front and back. Another method is to use a metal mask having a portion where metal is not vapor-deposited like a comb shape. In this case, the metal may be a metal other than gold, and the thickness thereof may be considerably thick (1000 Å or more), because moisture may permeate through the space.
次の工程は保護膜5としてポリイミドを1μm以下の厚
さに全面コートし熱処理を施こす。上部電極取出し用の
穴6を保護膜5に形成する。この方法はフオト・レジス
トを用いた一般のフオト・エッチング法でもよい。In the next step, the protective film 5 is entirely coated with polyimide to a thickness of 1 μm or less and heat-treated. A hole 6 for taking out the upper electrode is formed in the protective film 5. This method may be a general photo-etching method using a photo resist.
次にスクライバーを用いて個々に分割して完成する。Next, it is completed by dividing it into individual pieces using a scriber.
(発明の効果) 第3図に相対湿度の変化に対する静電容量の変化を測定
した感湿特性を示す。この図の様に感湿特性は完全に直
線的に変化する。又温度特性では20℃,30℃,40℃に周囲
温度を変化させた場合にもほとんど感湿特性に変化はな
く温度依存性はない。ヒステリシス現象も観測されなか
った。又湿度応答も保護膜があるにもかかわらず、吸
湿,脱湿共に30秒以内で実用上問題はない。以上のよう
に本発明の湿度検知素子は従来品の問題点をほぼ解決し
た湿度検知素子である。(Effects of the Invention) FIG. 3 shows the humidity-sensing characteristics obtained by measuring the change in capacitance with respect to the change in relative humidity. As shown in this figure, the moisture sensitivity characteristic changes completely linearly. As for the temperature characteristics, even if the ambient temperature was changed to 20 ℃, 30 ℃, and 40 ℃, there was almost no change in the humidity sensitivity characteristics and there was no temperature dependence. No hysteresis phenomenon was observed either. Despite the protective film, the humidity response is within 30 seconds for both moisture absorption and dehumidification, and there is no practical problem. As described above, the humidity detecting element of the present invention is a humidity detecting element that has substantially solved the problems of conventional products.
第1図は本発明に係る湿度検知素子の上面図、第2図は
第1図のA−A間の断面図、第3図は本発明の一実施例
による感湿特性を示すグラフである。 1……オーミック接触電極、2……シリコン・ウエハー 3……ポリイミド感湿膜、4……上部電極 5……保護膜、6……上部電極取出し用の穴FIG. 1 is a top view of a humidity detecting element according to the present invention, FIG. 2 is a cross-sectional view taken along the line AA in FIG. 1, and FIG. 3 is a graph showing a moisture sensitivity characteristic according to an embodiment of the present invention. . 1 ... Ohmic contact electrode, 2 ... Silicon wafer, 3 ... Polyimide moisture sensitive film, 4 ... Upper electrode, 5 ... Protective film, 6 ... Hole for taking out upper electrode
Claims (1)
極用の金属薄膜,保護用のポリイミド膜を順次堆積し、
前記半導体基板と金属薄膜とで感湿材のポリイミド膜を
挾んで静電容量を形成し、その間の容量が湿度によって
変化することを検出する静電容量型の湿度検知素子。1. A polyimide film of a moisture sensitive material, a metal thin film for electrodes, and a protective polyimide film are sequentially deposited on a semiconductor substrate,
A capacitance-type humidity detection element that sandwiches a polyimide film, which is a moisture-sensitive material, between the semiconductor substrate and the metal thin film to form a capacitance, and detects that the capacitance therebetween changes depending on humidity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20406086A JPH06105235B2 (en) | 1986-08-29 | 1986-08-29 | Humidity detection element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20406086A JPH06105235B2 (en) | 1986-08-29 | 1986-08-29 | Humidity detection element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6358249A JPS6358249A (en) | 1988-03-14 |
JPH06105235B2 true JPH06105235B2 (en) | 1994-12-21 |
Family
ID=16484088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20406086A Expired - Lifetime JPH06105235B2 (en) | 1986-08-29 | 1986-08-29 | Humidity detection element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06105235B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6445565B1 (en) | 2001-02-15 | 2002-09-03 | Denso Corporation | Capacitive moisture sensor and fabrication method for capacitive moisture sensor |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02140653A (en) * | 1988-11-21 | 1990-05-30 | Kurabe:Kk | Humidity detecting element |
US6580600B2 (en) | 2001-02-20 | 2003-06-17 | Nippon Soken, Inc. | Capacitance type humidity sensor and manufacturing method of the same |
JP2003270189A (en) * | 2002-03-20 | 2003-09-25 | Denso Corp | Capacitive humidity sensor |
MY147700A (en) * | 2008-09-10 | 2013-01-15 | Mimos Berhad | Improved capacitive sensor and method for making the same |
JP2011080833A (en) * | 2009-10-06 | 2011-04-21 | Alps Electric Co Ltd | Humidity detection sensor |
CN115201284A (en) * | 2022-05-27 | 2022-10-18 | 广州奥松电子股份有限公司 | Capacitive humidity sensor and preparation method thereof |
-
1986
- 1986-08-29 JP JP20406086A patent/JPH06105235B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6445565B1 (en) | 2001-02-15 | 2002-09-03 | Denso Corporation | Capacitive moisture sensor and fabrication method for capacitive moisture sensor |
Also Published As
Publication number | Publication date |
---|---|
JPS6358249A (en) | 1988-03-14 |
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Legal Events
Date | Code | Title | Description |
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EXPY | Cancellation because of completion of term |