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JPH0588299U - Petri dish - Google Patents

Petri dish

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Publication number
JPH0588299U
JPH0588299U JP2882492U JP2882492U JPH0588299U JP H0588299 U JPH0588299 U JP H0588299U JP 2882492 U JP2882492 U JP 2882492U JP 2882492 U JP2882492 U JP 2882492U JP H0588299 U JPH0588299 U JP H0588299U
Authority
JP
Japan
Prior art keywords
petri dish
silicon oxide
deposited
injection molding
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2882492U
Other languages
Japanese (ja)
Other versions
JP2588712Y2 (en
Inventor
岳人 富田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Inc filed Critical Toppan Inc
Priority to JP1992028824U priority Critical patent/JP2588712Y2/en
Publication of JPH0588299U publication Critical patent/JPH0588299U/en
Application granted granted Critical
Publication of JP2588712Y2 publication Critical patent/JP2588712Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】微生物や細胞の培養に適合するようにプラスチ
ック製のシャーレ内面に親水性を付与する。 【構成】プラスチック製のシャーレに於いて、底部の内
面に酸化ケイ素を表面に蒸着したプラスチックフィルム
層をインサート射出成形法によって貼設する。
(57) [Summary] [Purpose] To impart hydrophilicity to the inner surface of a plastic petri dish so that it can be used for culturing microorganisms and cells. [Structure] In a plastic petri dish, a plastic film layer having silicon oxide vapor-deposited on the inner surface of the bottom is attached by an insert injection molding method.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、微生物や細胞の培養に適するプラスチック製のシャーレに関するも のである。 The present invention relates to a plastic petri dish suitable for culturing microorganisms and cells.

【0002】[0002]

【従来の技術】[Prior Art]

従来のプラスチック製のシャーレは、その内面の表面張力が30〜40dyn e/cm程度と疎水性なため、水性試料や培地をはじく性質があり、使用に際し ては、本来必要である量よりさらに余分な水性試料や培地の滴下が必要となった 。この問題を解決するために、実開昭62−35628号公報に親水性のポリビ ニルアルコール系樹脂と疎水性合成樹脂との積層シートをポリビニルアルコール 系樹脂層を内面に絞り成形したシャーレが開示されており、また、実開昭60− 55400号公報には、プラスチック容器の培養面に石英をコーティングして親 水性にする方法が開示されている。 The conventional plastic petri dish has a property that it repels aqueous samples and culture medium because the inner surface has a surface tension of about 30-40 dyne / cm, which is hydrophobic. It was necessary to add fresh aqueous samples and medium. In order to solve this problem, Japanese Utility Model Publication No. 62-35628 discloses a petri dish in which a laminated sheet of a hydrophilic polyvinyl alcohol resin and a hydrophobic synthetic resin is formed by drawing a polyvinyl alcohol resin layer on the inner surface. Further, Japanese Utility Model Laid-Open No. 60-55400 discloses a method of coating quartz on the culture surface of a plastic container to make it hydrophilic.

【0003】[0003]

【考案が解決しようとする課題】[Problems to be solved by the device]

しかしながら、前述の実開昭62−35628号公報による方法は、内面のポ リビニルアルコールが使用時に加水分解を起こして培養面の表面状態が不安定に なることがあった。また、実開昭60−55400号公報による方法は、後工程 でコーティングして親水性を付与するものであり、実用面での品質の安定化に問 題があった。本考案者は、ガラスの表面が水性試料や培地に対しての濡れが良好 なことに着目し、また、シャーレの成形上に於ける取扱い易さも考慮して、酸化 ケイ素を表面に蒸着したプラスチックフィルムの利用を思い付いた。本考案は、 その酸化ケイ素蒸着プラスチックフィルムを用いて、上述の培養面の使用時の不 安定さや後処理の必要性をなくし、表面が親水性で安定なプラスチック製のシャ ーレを提供するものである。 However, in the method described in Japanese Utility Model Laid-Open No. 62-35628, there is a case where the polyvinyl alcohol on the inner surface causes hydrolysis during use and the surface state of the culture surface becomes unstable. Further, the method according to Japanese Utility Model Laid-Open No. 60-55400 has a problem in that the quality is stabilized in practical use since it is coated in a later step to impart hydrophilicity. The inventors of the present invention focused on the fact that the surface of the glass was well wetted by an aqueous sample or a culture medium, and in consideration of the ease of handling when forming a petri dish, the plastic on which silicon oxide was deposited was deposited. I came up with the idea of using a film. The present invention uses the silicon oxide vapor-deposited plastic film to eliminate the above-mentioned instability during use of the culture surface and the need for post-treatment, and to provide a stable plastic dish with a hydrophilic surface. Is.

【0004】[0004]

【課題を解決するための手段】 本考案は、図1及び図2に示したように、プラスチック製のシャーレにおいて 、底部の内面に、酸化ケイ素蒸着層(130)を形成したプラスチックフィルム (120)層をインサート射出成形法によって貼設したことを特徴とするシャー レ(100)である。Means for Solving the Problems The present invention, as shown in FIGS. 1 and 2, is a plastic petri dish and a plastic film (120) having a silicon oxide deposition layer (130) formed on the inner surface of the bottom. The petri dish (100) is characterized in that layers are attached by an insert injection molding method.

【0005】 上述の蒸着する酸化ケイ素とは、通常Six y (x=1又は2,y=0〜3 )の化学式で示されものであり、真空蒸着、スパッタリング、イオンプレーティ ングなどによって蒸着され、その蒸着膜の厚みは、少なくとも100Å以上のも のが好ましい。The above-described vapor-deposited silicon oxide is usually represented by a chemical formula of Si x O y (x = 1 or 2, y = 0 to 3), and is formed by vacuum vapor deposition, sputtering, ion plating, or the like. The thickness of the vapor-deposited film is preferably at least 100 Å or more.

【0006】 また、酸化ケイ素を蒸着するプラスチックフィルムの材質は、シャーレ本体の 熱可塑性樹脂と射出成形時に熱融着が可能な熱可塑性樹脂が一般的には用いられ るものである。熱融着しない材質のプラスチックフィルムを使用した場合には、 シャーレ本体の熱可塑性樹脂と射出成形時に熱接着する接着層を酸化珪素を蒸着 するプラスチックフィルムの裏面に前以て設けて置くものである。Further, as the material of the plastic film on which silicon oxide is vapor-deposited, the thermoplastic resin of the petri dish main body and the thermoplastic resin capable of heat fusion during injection molding are generally used. When a plastic film that is not heat-sealed is used, an adhesive layer that thermally adheres to the thermoplastic resin of the petri dish body during injection molding is placed in advance on the back surface of the plastic film on which silicon oxide is deposited. ..

【0007】 酸化ケイ素を表面に蒸着したプラスチックフィルム(120)層をインサート 射出成形法によって貼設する方法は、図2(a)に示したように、射出成形用金 型の雄型(210)のシャーレの底部内面に相当する部位に、酸化ケイ素を蒸着 したプラスチックフィルムの酸化ケイ素蒸着面を真空吸引や静電気などを利用し て金型表面に固定し、次に、図2(b)に示したように、型締めした射出成形用 金型(200)の成形品が形成される雄型と雌型の間の空間であるキャビティ( 240)内に、射出成形装置(300)によって、溶融した熱可塑性樹脂(35 0)を雌型に設けられたゲート(230)から射出して、シャーレ本体を成形と 同時にシャーレの底部内面に酸化ケイ素を蒸着したプラスチックフィルム層を貼 設するものである。成形されたシャーレ(100)は、図2(c)に示したよう に、型開きして射出成形用金型から排出される。As shown in FIG. 2 (a), the method of depositing a plastic film (120) layer having silicon oxide vapor-deposited on it by insert injection molding is a male mold (210) of an injection molding die. At the site corresponding to the inner surface of the bottom of the petri dish, the silicon oxide vapor-deposited surface of the plastic film on which silicon oxide was vapor-deposited was fixed to the mold surface using vacuum suction or static electricity, and then shown in Figure 2 (b). As described above, it is melted by the injection molding device (300) into the cavity (240) which is the space between the male mold and the female mold in which the molded product of the injection-molded mold (200) that has been clamped is formed. A thermoplastic resin (350) is injected from a gate (230) provided in a female mold to mold a petri dish body, and at the same time, a plastic film layer deposited with silicon oxide is attached to the bottom inner surface of the petri dish. To do. As shown in FIG. 2C, the molded petri dish (100) is opened and discharged from the injection molding die.

【0008】 また、シャーレ本体の材質には、ポリスチレン、ポリプロピレン、ポリカーボ ネート、ポリエステルなどの熱可塑性樹脂が使用される。Further, as the material of the petri dish body, a thermoplastic resin such as polystyrene, polypropylene, polycarbonate or polyester is used.

【0009】[0009]

【作用】[Action]

本考案のシャーレは、微生物や細胞の培養に必要な水性試料や培地と接触する シャーレの底部内面の培養面が酸化ケイ素の蒸着面になっているため、親水性で 水性試料や培地との濡れが良く培養に良好な雰囲気を作り出すことが出来る。 The petri dish of the present invention comes into contact with an aqueous sample or medium necessary for culturing microorganisms or cells.Since the culture surface of the bottom inner surface of the petri dish is a silicon oxide deposition surface, it is hydrophilic and wets with the aqueous sample and medium. It is good and can create a good atmosphere for culture.

【0010】[0010]

【実施例】【Example】

図1は、本実施例のシャーレの断面図であり、図2は、そのシャーレをインサ ート射出成形する状態を工程別に示した金型の断面図である。次に、実施例を図 を用いて説明する。 FIG. 1 is a cross-sectional view of a petri dish of the present embodiment, and FIG. 2 is a cross-sectional view of a die showing the state of insert injection molding of the petri dish by steps. Next, an embodiment will be described with reference to the drawings.

【0011】 まず、16μm厚のポリエステルフィルム(材質:ポリエチレンテレフタレー ト)の片面に、真空蒸着で酸化ケイ素を800Åの厚みで蒸着して蒸着フィルム を作製した。作製した蒸着フィルムは、シャーレの底部内面の形状に合わせて切 断した。First, on one surface of a 16 μm thick polyester film (material: polyethylene terephthalate), silicon oxide was vapor-deposited to a thickness of 800 Å by vacuum vapor deposition to prepare a vapor deposition film. The produced vapor deposition film was cut according to the shape of the inner surface of the bottom of the petri dish.

【0012】 次に、図2(a)に示したように、射出成形機に取り付けたシャーレの射出成 形用金型の型開き時に、雄型(210)のシャーレの底部内面に相当する部位に 前述の蒸着フィルムの蒸着面を金型表面に真空吸引によって吸着固定した。そし て、図2(b)に示したように、型締め後、射出成形装置(300)によって、 金型の雄型と雌型(220)とにより形成されるキャビティ(240)内に、溶 融したポリエチレンテレフタレート(350)を雌型に設けられたゲート(23 0)より射出して、シャーレ本体を成形すると同時に底部内面に酸化ケイ素の蒸 着層(130)を有するプラスチックフィルム(120)を蒸着面を上に熱接着 して貼設した。成形された本実施例のシャーレ(100)は、図2(c)に示し たように、射出成形用金型を型開きして取り出した。Next, as shown in FIG. 2A, a portion corresponding to the inner surface of the bottom of the petri dish of the male die (210) when the die for injection molding of the petri dish attached to the injection molding machine is opened. Then, the vapor deposition surface of the vapor deposition film was adsorbed and fixed on the surface of the mold by vacuum suction. Then, as shown in FIG. 2 (b), after the mold is clamped, it is melted by an injection molding device (300) into a cavity (240) formed by a male mold and a female mold (220). Molten polyethylene terephthalate (350) is injected from a gate (230) provided in a female mold to mold the petri dish body and at the same time, a plastic film (120) having a vapor deposition layer (130) of silicon oxide on the inner surface of the bottom is formed. The vapor-deposited surface was heat-bonded and stuck. The molded petri dish (100) of this example was taken out by opening the mold for injection molding, as shown in FIG. 2 (c).

【0013】 次に、作製した本実施例のシャーレを評価した。シャーレの底部内面の酸化ケ イ素蒸着面の表面張力は、84dyne/cmであり、水性試料や培地に対して 良好な濡れを示すことが確認された。さらに、本実施例のシャーレを用いて、実 際に、細胞の培養を行ったところ、本実施例のシャーレは、表面状態が非常に安 定しており、細胞の培養に良好な雰囲気を作り出した。Next, the prepared petri dish of this example was evaluated. The surface tension of the silicon oxide vapor-deposited surface on the inner surface of the bottom of the dish was 84 dyne / cm, and it was confirmed that the wet sample was well wetted with the aqueous sample and the medium. Furthermore, when the cells were actually cultivated using the petri dish of this Example, the petri dish of this Example had a very stable surface state, and created a good atmosphere for culturing the cells. It was

【0014】 なお、本考案者が測定した酸化ケイ素の蒸着膜厚と濡れの度合いを示す表面張 力との関係を図3に示す。FIG. 3 shows the relationship between the deposition thickness of silicon oxide measured by the present inventor and the surface tension indicating the degree of wetting.

【0015】 本実施例では、酸化ケイ素の蒸着膜厚が800Åの蒸着フィルムを使用したが 、図3の測定結果から見ると、酸化ケイ素の蒸着膜厚が100Åの表面張力は7 5dyne/cmであり、実用上に於いては、表面張力が75dyne/cm以 上であれば問題がないので、酸化ケイ素の蒸着膜厚が100Å以上であれば水性 試料や培地に対して充分な濡れを有すると判断された。In this example, a vapor deposition film having a vapor deposition film thickness of silicon oxide of 800 Å was used. However, from the measurement results of FIG. 3, the surface tension of a vapor deposition film thickness of silicon oxide of 100 Å is 75 dyne / cm. In practice, if the surface tension is 75 dyne / cm or more, there is no problem. If the vapor-deposited film thickness of silicon oxide is 100 Å or more, it is considered that the sample or medium has sufficient wetting. Judged

【0016】[0016]

【考案の効果】[Effect of the device]

本考案のシャーレは、培養面が酸化ケイ素の蒸着層であり、親水性で濡れが良 く微生物や細胞の培養に良好な雰囲気を作り出し、表面状態が安定なため微生物 や細胞と反応する恐れがない。また、シャーレを親水性にするための後処理が不 要であり、さらに、滅菌処理が容易で保管上の管理が簡単である。 The petri dish of the present invention has a vapor-deposited layer of silicon oxide on the culturing surface, which is hydrophilic and wets well to create a good atmosphere for culturing microorganisms and cells, and the stable surface condition may cause reactions with microorganisms and cells. Absent. In addition, post-treatment for making the petri dish hydrophilic is unnecessary, and furthermore, sterilization treatment is easy and storage management is easy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案のシャーレの断面図である。FIG. 1 is a cross-sectional view of a petri dish of the present invention.

【図2】本考案のシャーレをインサート射出成形する状
態を工程別に示す金型の断面図である。
FIG. 2 is a cross-sectional view of a mold showing a process of insert injection molding of a petri dish of the present invention in each process.

【図3】酸化ケイ素の蒸着膜厚と表面張力との関係を示
すグラフである。
FIG. 3 is a graph showing the relationship between the film thickness of vapor-deposited silicon oxide and the surface tension.

【符号の説明】 100……シャーレ 110……シャーレ本体 120……プラスチックフィルム 130……酸化ケイ素蒸着層 200……射出成形用金型 210……雄型 220……雌型 230……ゲート 240……キャビティ 300……射出成形装置 350……溶融樹脂[Explanation of Codes] 100 ... Petri dish 110 ... Petri dish main body 120 ... Plastic film 130 ... Silicon oxide vapor deposition layer 200 ... Injection mold 210 ... Male 220 ... Female 230 ... Gate 240 ... … Cavity 300 …… Injection molding machine 350 …… Melted resin

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】プラスチック製のシャーレにおいて、底部
の内面に酸化ケイ素を表面に蒸着したプラスチックフィ
ルム層をインサート射出成形法によって貼設したことを
特徴とするシャーレ。
1. A petri dish made of plastic, characterized in that a plastic film layer having silicon oxide vapor-deposited on the inner surface of the bottom is stuck by an insert injection molding method.
JP1992028824U 1992-04-30 1992-04-30 Petri dish Expired - Fee Related JP2588712Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1992028824U JP2588712Y2 (en) 1992-04-30 1992-04-30 Petri dish

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1992028824U JP2588712Y2 (en) 1992-04-30 1992-04-30 Petri dish

Publications (2)

Publication Number Publication Date
JPH0588299U true JPH0588299U (en) 1993-12-03
JP2588712Y2 JP2588712Y2 (en) 1999-01-13

Family

ID=12259147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1992028824U Expired - Fee Related JP2588712Y2 (en) 1992-04-30 1992-04-30 Petri dish

Country Status (1)

Country Link
JP (1) JP2588712Y2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013069490A1 (en) * 2011-11-08 2013-05-16 大日本印刷株式会社 Method for producing cell culture vessel
JP2013107218A (en) * 2011-11-17 2013-06-06 Dainippon Printing Co Ltd Method for manufacturing cell culture container
JP2013106531A (en) * 2011-11-17 2013-06-06 Dainippon Printing Co Ltd Method for manufacturing cell culturing vessel
JP2013116066A (en) * 2011-12-02 2013-06-13 Dainippon Printing Co Ltd Cell culture container having functional film and method for producing the same
JP2015087743A (en) * 2013-07-12 2015-05-07 キヤノン株式会社 Method of manufacturing development container, developer container, development device, process cartridge, and image formation device
JP2015146807A (en) * 2008-10-14 2015-08-20 株式会社セルシード Temperature-responsive cell culture equipment and method for producing the same
JP2017176047A (en) * 2016-03-30 2017-10-05 大日本印刷株式会社 Methods of manufacturing containers
KR20180028060A (en) * 2013-07-12 2018-03-15 캐논 가부시끼가이샤 Method of manufacturing developer container, method of manufacturing developing apparatus, method of manufacturing process cartridge, and method of manufacturing image forming apparatus
US9989888B2 (en) 2013-07-12 2018-06-05 Canon Kabushiki Kaisha Method of manufacturing developer container

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015146807A (en) * 2008-10-14 2015-08-20 株式会社セルシード Temperature-responsive cell culture equipment and method for producing the same
WO2013069490A1 (en) * 2011-11-08 2013-05-16 大日本印刷株式会社 Method for producing cell culture vessel
JP2013099278A (en) * 2011-11-08 2013-05-23 Dainippon Printing Co Ltd Method for manufacturing cell culture vessel
US9587219B2 (en) 2011-11-08 2017-03-07 Dai Nippon Printing Co., Ltd. Method for producing cell culture vessel
JP2013107218A (en) * 2011-11-17 2013-06-06 Dainippon Printing Co Ltd Method for manufacturing cell culture container
JP2013106531A (en) * 2011-11-17 2013-06-06 Dainippon Printing Co Ltd Method for manufacturing cell culturing vessel
JP2013116066A (en) * 2011-12-02 2013-06-13 Dainippon Printing Co Ltd Cell culture container having functional film and method for producing the same
JP2015087743A (en) * 2013-07-12 2015-05-07 キヤノン株式会社 Method of manufacturing development container, developer container, development device, process cartridge, and image formation device
KR20180028060A (en) * 2013-07-12 2018-03-15 캐논 가부시끼가이샤 Method of manufacturing developer container, method of manufacturing developing apparatus, method of manufacturing process cartridge, and method of manufacturing image forming apparatus
US9989888B2 (en) 2013-07-12 2018-06-05 Canon Kabushiki Kaisha Method of manufacturing developer container
US10802419B2 (en) 2013-07-12 2020-10-13 Canon Kabushiki Kaisha Method of manufacturing developer container, developer container, developing apparatus, process cartridge, and image forming apparatus
JP2017176047A (en) * 2016-03-30 2017-10-05 大日本印刷株式会社 Methods of manufacturing containers

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