JPH0581409B2 - - Google Patents
Info
- Publication number
- JPH0581409B2 JPH0581409B2 JP3467189A JP3467189A JPH0581409B2 JP H0581409 B2 JPH0581409 B2 JP H0581409B2 JP 3467189 A JP3467189 A JP 3467189A JP 3467189 A JP3467189 A JP 3467189A JP H0581409 B2 JPH0581409 B2 JP H0581409B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- viscosity liquid
- varnish
- low viscosity
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 claims description 157
- 239000000463 material Substances 0.000 claims description 120
- 239000002966 varnish Substances 0.000 claims description 105
- 238000003860 storage Methods 0.000 claims description 64
- 238000010438 heat treatment Methods 0.000 claims description 38
- 230000007246 mechanism Effects 0.000 claims description 29
- 238000005470 impregnation Methods 0.000 claims description 25
- 239000002904 solvent Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000002657 fibrous material Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 description 31
- 239000000835 fiber Substances 0.000 description 15
- 238000001704 evaporation Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 230000005494 condensation Effects 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000004745 nonwoven fabric Substances 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- 229920006231 aramid fiber Polymers 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- 230000003204 osmotic effect Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Reinforced Plastic Materials (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、例えば電気絶縁板、化粧板等の積層
板の製造に使用される紙、布等の繊維質材からな
るシート状の基材にワニスを含浸させるための方
法及び装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a sheet-like base material made of a fibrous material such as paper or cloth used for manufacturing laminates such as electrical insulating boards and decorative boards. The present invention relates to a method and apparatus for impregnating water with varnish.
一般に、繊維質材からなるシート状の基材にワ
ニスを含浸させる場合、ワニスが基材の繊維内部
にまで含浸され、各部のワニス量分布がむらなく
均一であることが重要であり、且つ基材中に残存
する気泡を可及的に少なくすることが望ましい。
Generally, when impregnating a sheet-like base material made of fibrous material with varnish, it is important that the varnish is impregnated into the inside of the fibers of the base material and that the amount of varnish is evenly distributed in each part. It is desirable to reduce the number of air bubbles remaining in the material as much as possible.
従来の含浸方法では、一般に、基材をこれに予
備含浸用の通常ワニスを予備含浸させた上で、タ
イミングロールを経てワニス槽に導いて、通常ワ
ニスを含浸させるようにしているのが普通であ
る。 In conventional impregnation methods, the substrate is generally pre-impregnated with an ordinary varnish for pre-impregnation, and then guided through a timing roll to a varnish tank where it is impregnated with an ordinary varnish. be.
ところが、このような含浸方法では、基材の内
部にまでワニスを均一且つ充分に含浸させること
が困難であり、ワニスを含浸させるに長時間を要
するといつた問題があつた。しかも、基材中に残
存する気泡を充分に少なくすることが困難であ
る。かかる問題は、特に高粘度のワニスを使用し
た場合に顕著となる。 However, with such an impregnation method, it is difficult to uniformly and sufficiently impregnate the inside of the base material with the varnish, and there are problems in that it takes a long time to impregnate the base material with the varnish. Moreover, it is difficult to sufficiently reduce the number of bubbles remaining in the base material. This problem becomes particularly noticeable when a high viscosity varnish is used.
そこで、近時、上記した予備含浸用の通常ワニ
スに代えて溶剤若しくは溶剤を多量に含む稀薄な
ワニス(以下「予備含浸液」という)を貯溜した
予備含浸槽と通常ワニスを貯溜した本含浸槽とを
並置して、基材をガイドロールにより予備含浸
槽、本含浸槽を順次通過せしめるようにすること
が行われている。 Therefore, in recent years, instead of the normal varnish for preliminary impregnation mentioned above, a preliminary impregnation tank that stores a solvent or a dilute varnish containing a large amount of solvent (hereinafter referred to as "preliminary impregnation liquid") and a main impregnation tank that stores a normal varnish. It has been practiced to arrange these in parallel and allow the base material to pass through the preliminary impregnation tank and the main impregnation tank sequentially using guide rolls.
かかる含浸方法によれば、基材が予備含浸液中
を通過せしめられる間に、基材中の空気が予備含
浸液と置換させて排除されるから、基材を、これ
に含浸された予備含浸液を蒸発させつつワニス中
にもたらすと、ワニスを効率良く含浸させ得ると
共に、気泡の減少を図ることができる。 According to this impregnation method, while the substrate is passed through the pre-impregnating liquid, the air in the substrate is replaced with the pre-impregnating liquid and removed, so that the pre-impregnating liquid impregnated in the substrate is removed. When the liquid is introduced into the varnish while being evaporated, the varnish can be impregnated efficiently and bubbles can be reduced.
しかしながら、予備含浸液中からワニス中への
移行段階において、基材が空気に触れると共に両
槽間のガイドロールによる圧縮作用を受けること
から、基材中の空気の排除が充分に行われず、ワ
ニス含浸性、ボイドレス効果を余り期待できな
い。
However, in the transition stage from the pre-impregnating liquid to the varnish, the base material is exposed to air and is compressed by the guide rolls between the two tanks, so air in the base material is not removed sufficiently and the varnish is Impregnating properties and voidless effects cannot be expected.
すなわち、基材が上記ガイドロールに至ると、
基材を構成する繊維束に接触面圧力が作用して、
繊維束は開繊することになり、繊維束内の毛管力
により保持されている予備含浸液の液相が破壊さ
れる。そして、このガイドロールを通過した時点
で繊維束の圧縮は解除されるが、この解圧作用に
よつて開繊された繊維束は再形成される。このよ
うに、繊維束における含浸液相の破壊と開繊され
た繊維束の再形成とが空気中で行なわれることか
ら、予備含浸液中からワニス中への移行段階にお
いて基材には空気が再侵入する虞れがある。 That is, when the base material reaches the guide roll,
Contact surface pressure acts on the fiber bundles that make up the base material,
The fiber bundle is opened, and the liquid phase of the pre-impregnation liquid held by capillary forces within the fiber bundle is destroyed. The compression of the fiber bundle is released when it passes through this guide roll, but the opened fiber bundle is reformed by this decompression action. As described above, since the destruction of the impregnating liquid phase in the fiber bundle and the reformation of the opened fiber bundle take place in the air, air is present in the base material during the transition stage from the pre-impregnating liquid to the varnish. There is a risk of re-invasion.
本発明は、かかる点に鑑みてなされたもので、
基材におけるワニス含浸性、ボイドレス効果を大
幅に向上させ得るワニス含浸方法とこれを好適に
実施しうるワニス含浸装置とを提供することを目
的とするものである。 The present invention has been made in view of these points,
The object of the present invention is to provide a varnish impregnation method that can significantly improve the varnish impregnation properties and void-free effect in a base material, and a varnish impregnation apparatus that can suitably carry out the method.
この課題を解決した本発明のワニス含浸方法
は、溶剤等の低粘性液を貯溜せる低粘性液貯溜領
域とワニスを貯溜せるワニス貯溜領域との間に、
両貯溜領域にその液面で液封された状態で連通す
る密閉状の熱サイホン領域を設けて、繊維質材か
らなるシート状の基材を低粘性液貯溜領域、熱サ
イホン領域、ワニス貯溜領域を順次通過させるよ
うにし、熱サイホン領域において、基材を加熱し
てこれに含浸された低粘性液を蒸発させると共に
基材の出口側に貯溜せる低粘性液を蒸発させ、且
つ熱サイホン領域で発生した低粘性液蒸気を基材
の出口側から少なくとも基材の加熱部側へと流動
させるようにしたものである。
The varnish impregnation method of the present invention solves this problem by providing a varnish impregnation method between a low viscosity liquid storage area where a low viscosity liquid such as a solvent can be stored and a varnish storage area where varnish can be stored.
A sealed thermosiphon region is provided in both reservoir regions, which communicate with each other while being sealed with liquid at the liquid level, and a sheet-like base material made of a fibrous material is used as a low-viscosity liquid reservoir region, a thermosyphon region, and a varnish reservoir region. In the thermosyphon region, the base material is heated to evaporate the low viscosity liquid impregnated therein, and the low viscosity liquid stored on the outlet side of the base material is evaporated. The generated low-viscosity liquid vapor is made to flow from the outlet side of the base material to at least the heating section side of the base material.
一方、かかる方法を実施するための本発明のワ
ニス含浸装置は、溶剤等の低粘性液を貯溜した低
粘性液貯溜槽と、ワニスを貯溜したワニス貯溜槽
と、各貯溜槽内の液面下において開口する筒状の
基材入口部及び基材出口部を備えた密閉状の熱サ
イホン室と、繊維質材からなるシート状の基材を
低粘性液貯溜槽から基材入口部を経て熱サイホン
室に導き更に基材出口部からワニス貯溜槽に導く
基材走行ガイド機構と、熱サイホン室内において
基材を加熱して、これに含浸された低粘性液を蒸
発させる基材加熱機構と、基材出口部に低粘性液
貯溜部及び低粘性液加熱器を備えており、低粘性
液貯溜部の低粘性液を加熱蒸発させると共に熱サ
イホン室内で発生する低粘性液蒸気を基材出口部
側から少なくとも基材加熱機構側へと流動させる
蒸気流動機構と、を具備するものである。 On the other hand, the varnish impregnation apparatus of the present invention for carrying out such a method includes a low viscosity liquid storage tank storing a low viscosity liquid such as a solvent, a varnish storage tank storing varnish, and a liquid level below the liquid level in each storage tank. A closed thermosiphon chamber is equipped with a cylindrical base material inlet and a base material outlet that open at a base material running guide mechanism that guides the base material into the siphon chamber and further leads the base material from the base material outlet to the varnish storage tank; a base material heating mechanism that heats the base material in the thermosiphon chamber and evaporates the low viscosity liquid impregnated therein; The base material outlet section is equipped with a low viscosity liquid storage section and a low viscosity liquid heater, which heats and evaporates the low viscosity liquid in the low viscosity liquid reservoir section, and also directs the low viscosity liquid vapor generated in the thermosiphon chamber to the base material outlet section. The steam flow mechanism includes a steam flow mechanism that causes the steam to flow from the side toward at least the base material heating mechanism side.
基材が低粘性液貯溜槽内を通過する間におい
て、基材中の空気が低粘性液と置換されて排除さ
れる。
While the substrate passes through the low viscosity liquid reservoir, the air in the substrate is replaced with the low viscosity liquid and removed.
そして、低粘性液を含浸された基材は、引き続
き、基材入口部から熱サイホン室内にもたらされ
て基材加熱機構により加熱される。かかる基材の
加熱により、これに含浸された低粘性液は蒸発分
離される。 The base material impregnated with the low viscosity liquid is then brought into the thermosyphon chamber from the base material inlet and heated by the base material heating mechanism. By heating the base material, the low viscosity liquid impregnated therein is evaporated and separated.
このとき、熱サイホン室内は蒸気流動機構及び
基材加熱機構により発生せしめられた低粘性液蒸
気で充満されており、且つその蒸気は蒸気流動機
構により基材出口部側から少なくとも基材加熱機
構側へと流動せしめられることから、少なくとも
基材加熱機構から基材出口部に至る基材通過領域
部分は、空気を含まない低粘性液飽和蒸気雰囲気
に保持されることになる。 At this time, the thermosyphon chamber is filled with low-viscosity liquid vapor generated by the vapor flow mechanism and the substrate heating mechanism, and the vapor is transferred from the substrate outlet side to at least the substrate heating mechanism side by the vapor flow mechanism. As a result, at least the substrate passage area from the substrate heating mechanism to the substrate outlet is maintained in a low-viscosity liquid-saturated vapor atmosphere that does not contain air.
したがつて、基材は低粘性液の飽和蒸気のみを
含む状態で、熱サイホン室からワニス貯溜槽内に
もたらされることになる。すなわち、低粘性液貯
溜領域からワニス貯溜領域への移行段階において
基材に空気が侵入することがなく、ワニス領域に
は空気を含浸しない基材がもたらされることにな
る。しかも、基材の進行に伴つてワニス貯溜領域
に侵入する低粘性液は極く僅かとなる。 The substrate will therefore be brought from the thermosyphon chamber into the varnish reservoir containing only saturated vapor of a low viscosity liquid. That is, no air enters the substrate during the transition stage from the low viscosity liquid storage area to the varnish storage area, resulting in a substrate that is not impregnated with air in the varnish area. Furthermore, as the substrate advances, very little of the low-viscosity liquid enters the varnish storage area.
その結果、基材がワニス貯溜領域にもたらされ
ると、基材へのワニス含浸が良好に行なわれ、基
材には空気を含まない状態でワニスが均一且つ充
分に含浸せしめられることになる。 As a result, when the substrate is brought into the varnish storage area, the substrate is well impregnated with varnish, and the substrate is evenly and thoroughly impregnated with varnish in an air-free manner.
以下、本発明の構成を第1図に示す実施例に基
づいて具体的に説明する。
Hereinafter, the configuration of the present invention will be specifically explained based on the embodiment shown in FIG.
第1図に示すワニス含浸装置において、1は基
材、2は低粘性液貯溜槽、3はワニス貯溜槽、4
は熱サイホン室、5は基材加熱機構、6は蒸気流
動機構、7は基材走行ガイド機構である。 In the varnish impregnation apparatus shown in FIG. 1, 1 is a base material, 2 is a low viscosity liquid storage tank, 3 is a varnish storage tank, and 4
5 is a thermosyphon chamber, 5 is a base material heating mechanism, 6 is a steam flow mechanism, and 7 is a base material traveling guide mechanism.
基材1は繊維質材からなるシート状のもので、
合成、天然の有機、有機繊維からなる織布、不織
布、例えば紙、ガラス繊維布、ガラス繊維不織
布、カーボン繊維布、カーボン繊維不織布、アラ
ミド繊維布、アラミド繊維不織布等が使用され
る。 The base material 1 is a sheet-like material made of fibrous material,
Woven fabrics and nonwoven fabrics made of synthetic, natural, and organic fibers, such as paper, glass fiber fabric, glass fiber nonwoven fabric, carbon fiber fabric, carbon fiber nonwoven fabric, aramid fiber fabric, aramid fiber nonwoven fabric, and the like are used.
低粘性液貯溜槽2は溶剤等の低粘性液12を所
定量貯溜した上面開放状のものであり、ワニス貯
溜槽3はワニス13を所定量貯溜した上面開放状
のものである。各貯溜槽2,3の側壁には溢流堰
2a,3a及び溢流溜2b,3bが設けられてい
て、各貯溜槽2,3における液面高さを一定に保
持するように工夫してある。なお、溢流溜2b,
3bの液は、図示しない返戻手段により貯溜槽
2,3に返戻されるようになつている。また、低
粘性液12及びワニス13は、夫々、図示しない
温度制御装置により所定温度に保持されている。 The low viscosity liquid storage tank 2 has an open top and stores a predetermined amount of a low viscosity liquid 12 such as a solvent, and the varnish storage tank 3 has an open top and stores a predetermined amount of varnish 13. Overflow weirs 2a, 3a and overflow basins 2b, 3b are provided on the side walls of each storage tank 2, 3, and are designed to keep the liquid level in each storage tank 2, 3 constant. be. In addition, the overflow basin 2b,
The liquid 3b is returned to the storage tanks 2 and 3 by a return means (not shown). Further, the low viscosity liquid 12 and the varnish 13 are each maintained at a predetermined temperature by a temperature control device (not shown).
ところで、低粘性液12としては、基材1に対
して充分な濡れ性を有するものが使用される。具
体的には、ワニス13より低粘度であり且つ
100cP以下の粘度の溶剤等を使用するが、含浸さ
せようとするワニスに配合された溶剤と同質のも
のを使用しておくことが好ましい。また、ワニス
13としては、一般に熱硬化性樹脂ワニスが使用
されるが、その他、熱可塑性樹脂、天然樹脂等の
ワニスや無溶剤の液状合成樹脂、液状天然樹脂等
も使用される。 By the way, as the low viscosity liquid 12, one having sufficient wettability to the base material 1 is used. Specifically, it has a lower viscosity than Varnish 13 and
A solvent with a viscosity of 100 cP or less is used, but it is preferable to use a solvent of the same quality as the solvent blended into the varnish to be impregnated. Further, as the varnish 13, a thermosetting resin varnish is generally used, but other varnishes such as thermoplastic resins, natural resins, solvent-free liquid synthetic resins, liquid natural resins, etc. can also be used.
熱サイホン室4は両貯溜槽2,3間の上方部位
に配設された密閉状のもので、底壁部から垂下す
る筒状の基材入口部4a及び基材出口部4bを備
えた逆U字状の略サイホン管形状に構成されてい
る。基材入口部4a及び基材出口部4bは、夫々
低粘性液貯溜槽2における低粘性液貯溜領域2′
及びワニス貯溜槽3におけるワニス貯溜領域3′
の液面12′,13′下において開口されている。
したがつて、基材入口部4a内及び基材出口部4
b内には低粘性液溜12a及びワニス溜13aが
形成されて、熱サイホン室4内を液封により密閉
された熱サイホン領域4′に形成している。また、
この実施例では、基材入口部4a及び基材出口部
4bを含む熱サイホン室4の周壁4cをジヤケツ
ト構造に構成して、その内部に適宜の加熱媒体を
供給、流動させることによつて、周壁4cを低粘
性液12の沸点以上に加熱、保温し、装置起動時
に熱サイホン室4内の圧力が低粘性液12の飽和
蒸気圧に迅速に達するように、つまり迅速な立上
りが可能となるように図ると共に、低粘性液蒸気
が周壁4c内面に凝縮付着するのを防止すべく図
つている。勿論、周壁4cにおけるジヤケツトの
外壁は断熱材で構成されている。 The thermosyphon chamber 4 is a sealed type disposed above the storage tanks 2 and 3, and has a cylindrical base material inlet part 4a and a base material outlet part 4b hanging from the bottom wall. It is configured in a U-shaped approximately siphon tube shape. The base material inlet part 4a and the base material outlet part 4b are the low viscosity liquid storage area 2' in the low viscosity liquid storage tank 2, respectively.
and varnish storage area 3' in varnish storage tank 3
It is opened below the liquid level 12', 13'.
Therefore, inside the base material inlet part 4a and the base material outlet part 4
A low-viscosity liquid reservoir 12a and a varnish reservoir 13a are formed in the thermosiphon chamber 4, forming a thermosiphon region 4' sealed by a liquid seal. Also,
In this embodiment, the peripheral wall 4c of the thermosyphon chamber 4 including the base material inlet part 4a and the base material outlet part 4b is constructed into a jacket structure, and an appropriate heating medium is supplied and made to flow therein. The peripheral wall 4c is heated and kept warm above the boiling point of the low viscosity liquid 12, so that the pressure within the thermosyphon chamber 4 quickly reaches the saturated vapor pressure of the low viscosity liquid 12 when the device is started, that is, a rapid rise is possible. In addition, it is intended to prevent low viscosity liquid vapor from condensing and adhering to the inner surface of the peripheral wall 4c. Of course, the outer wall of the jacket in the peripheral wall 4c is made of a heat insulating material.
基材加熱機構5は、熱サイホン室4内に加熱ロ
ール5aを基材1の回行に追従すべく回転自在に
設けてなる。この加熱ロール5aは、熱サイホン
室4内の熱サイホン領域4′において基材1を低
粘性液12の沸点以上に加熱して、これに含浸せ
る低粘性液12を蒸発させるものである。ところ
で、加熱ロール5aによる基材加熱温度は図示し
ない温度制御装置により制御されようになつてい
るが、その蒸発能力は、基材1に含浸されて熱サ
イホン室4内に持込まれる最大量の低粘性液12
を蒸発させ得るに充分なものとされている。な
お、加熱ロール5aは基材1の通過方向に回転駆
動させるようにしておいてもよい。この場合、ロ
ール周速も基材1の走行速度に一致させておくこ
とはいうまでもない。 The substrate heating mechanism 5 includes a heating roll 5 a rotatably provided in the thermosiphon chamber 4 to follow the movement of the substrate 1 . This heating roll 5a heats the base material 1 to a temperature higher than the boiling point of the low-viscosity liquid 12 in the thermosyphon region 4' in the thermosyphon chamber 4, and evaporates the low-viscosity liquid 12 impregnated therein. By the way, the heating temperature of the base material by the heating roll 5a is controlled by a temperature control device (not shown), but its evaporation capacity is determined by the maximum amount of evaporation that is impregnated into the base material 1 and brought into the thermosyphon chamber 4. Viscous liquid 12
is said to be sufficient to evaporate the Note that the heating roll 5a may be driven to rotate in the direction in which the base material 1 passes. In this case, it goes without saying that the circumferential speed of the roll should also match the traveling speed of the base material 1.
蒸気流動機構6は、基材出口部4bに低粘性液
貯溜部8及び低粘性液加熱器9を設けると共に、
低粘性液溜12aに自己制御加熱器10を配置し
てなる。低粘性液貯溜部8は基材出口部4aの下
端部に形成されており、低粘性液貯溜槽2に連通
8aさせることによつて、低粘性液貯溜槽2内の
低粘性液12aが所定量貯溜されている。この低
粘性液貯溜部8の液面は、該部8の低粘性液蒸発
に拘らず、低粘性液貯溜槽2の液面12′に一致
せしめられる。低粘性液加熱器9は、低粘性液貯
溜部8を囲繞するジヤケツト構造壁で構成されて
いて、その内部に適宜の加熱媒体を供給、流動さ
せることによつて、低粘性液貯溜部8の低粘性液
12を加熱蒸発させるものである。この低粘性液
加熱器9におけるジヤケツト壁は、低粘性液貯溜
部8及びワニス溜13aに接する部分を除いて断
熱材で構成されており、その熱がワニス溜13a
周辺のワニス13に伝わらないように工夫してあ
る。なお、この実施例では、低粘性液加熱器9を
熱サイホン室4の周壁4cに連通する一連のジヤ
ケツト構造壁に構成してある。自己制御加熱器1
0は例えば内部に加熱媒体を供給、流動させる伝
熱コイルで構成されたもので、低粘性液溜12a
の低粘性液12を加熱蒸発させる。この自己制御
加熱器10は、その蒸発能力を低粘性液加熱器9
よりも小さくしたものであるが、低粘性液溜12
aにおいて上下方向に延びる低粘性液加熱面10
aを有していて、熱サイホン室4内の蒸気圧力の
変動に応じて蒸発能力を自己制御しうるように構
成されている。すなわち、熱サイホン室4内の蒸
気圧力が下降、上昇すると、これに伴つて低粘性
液溜12aの液面(及びワニス溜13aの液面)
が上昇、下降して、加熱面10aと低粘性液12
との接触面積したがつて蒸発能力が自動的に増減
調整されるようになつている。また、熱サイホン
室4には抽気管11が接続されていて、熱サイホ
ン室4内の空気排除を行ないうるように工夫して
ある。この抽気管11は気液分離器11aを介し
て低粘性液貯溜槽2に導かれており、抽気により
排出される低粘性液蒸気を低粘性液貯溜槽2に凝
縮回収しうるように工夫してある。 The vapor flow mechanism 6 is provided with a low viscosity liquid storage section 8 and a low viscosity liquid heater 9 at the base material outlet section 4b, and
A self-control heater 10 is arranged in a low viscosity liquid reservoir 12a. The low viscosity liquid storage part 8 is formed at the lower end of the base material outlet part 4a, and by communicating with the low viscosity liquid storage tank 2, the low viscosity liquid 12a in the low viscosity liquid storage tank 2 can be A fixed amount is stored. The liquid level of this low viscosity liquid storage section 8 is made to match the liquid level 12' of the low viscosity liquid storage tank 2, regardless of the evaporation of the low viscosity liquid in this section 8. The low viscosity liquid heater 9 is composed of a jacket structure wall surrounding the low viscosity liquid storage section 8, and by supplying and flowing an appropriate heating medium into the inside thereof, the low viscosity liquid storage section 8 is heated. The low viscosity liquid 12 is heated and evaporated. The jacket wall of this low viscosity liquid heater 9 is made of a heat insulating material except for the parts that contact the low viscosity liquid reservoir 8 and the varnish reservoir 13a, and the heat is transferred to the varnish reservoir 13a.
It has been devised so that it does not spread to the surrounding varnish 13. In this embodiment, the low viscosity liquid heater 9 is configured as a series of jacket structure walls communicating with the peripheral wall 4c of the thermosiphon chamber 4. Self-controlled heater 1
0 is composed of, for example, a heat transfer coil that supplies and flows a heating medium inside, and is a low viscosity liquid reservoir 12a.
The low viscosity liquid 12 is heated and evaporated. This self-regulating heater 10 uses its evaporation capacity as a low viscosity liquid heater 9.
Although it is smaller than the low viscosity liquid reservoir 12
A low viscosity liquid heating surface 10 extending vertically at a
a, and is configured to be able to self-control its evaporation capacity in response to fluctuations in steam pressure within the thermosyphon chamber 4. That is, as the steam pressure in the thermosiphon chamber 4 decreases or increases, the liquid level in the low-viscosity liquid reservoir 12a (and the liquid level in the varnish reservoir 13a) decreases accordingly.
rises and falls, heating surface 10a and low viscosity liquid 12
Accordingly, the evaporation capacity is automatically adjusted to increase or decrease according to the contact area. Further, an air bleed pipe 11 is connected to the thermosyphon chamber 4, so that the air inside the thermosyphon chamber 4 can be removed. This bleed pipe 11 is led to a low viscosity liquid storage tank 2 via a gas-liquid separator 11a, and is designed so that the low viscosity liquid vapor discharged by the bleed air can be condensed and recovered in the low viscosity liquid storage tank 2. There is.
基材走行ガイド機構7は、少なくとも各貯溜槽
2,3内に配設した適当数のガイドロール7a
…,7b…からなり、基材1が基材供給源から低
粘性液貯溜槽2内の低粘性液貯溜領域2′に至り、
基材入口部4aから熱サイホン室4内の熱サイホ
ン領域4′に至り、加熱ロール5aを通過して基
材出口部4bからワニス貯溜槽3内のワニス貯溜
領域3′に至り、ワニス貯溜槽3上のワニス含浸
量調整機構14を通過せしめられるようにガイド
するものである。なお、各貯溜領域2′,3′に配
設されているガイドロール7a…,7b…の一部
は、基材1にその幅方向への伸展力を付与しうる
エキスパンダ式のものに構成されていて、基材1
の進行方向に対して直角方向の、低粘性液貯溜領
域2′における空気と低粘性液との置換及びワニ
ス貯溜領域3′におけるワニス含浸を、夫々促進
させるように図つている。また、ワニス含浸量調
整機構14はスクイズロール又はスクイズバーか
らなるもので、ワニス貯溜槽3を経過した基材1
をスクイズして、そのワニス含浸量を調整する。 The substrate traveling guide mechanism 7 includes at least an appropriate number of guide rolls 7a disposed in each of the storage tanks 2 and 3.
..., 7b..., the base material 1 reaches the low viscosity liquid storage area 2' in the low viscosity liquid storage tank 2 from the base material supply source,
The base material inlet part 4a reaches the thermosyphon region 4' in the thermosiphon chamber 4, passes through the heating roll 5a, and reaches the varnish storage region 3' in the varnish storage tank 3 from the base material outlet part 4b, and the varnish storage tank 3 so that it passes through the varnish impregnation amount adjustment mechanism 14 on the top. Note that some of the guide rolls 7a..., 7b... disposed in each of the storage areas 2', 3' are configured as expander type rolls that can apply stretching force to the base material 1 in its width direction. base material 1
Displacement of air and low viscosity liquid in the low viscosity liquid storage area 2' and varnish impregnation in the varnish storage area 3' in the direction perpendicular to the direction of movement of the varnish storage area 3' are promoted. Further, the varnish impregnation amount adjustment mechanism 14 is composed of a squeeze roll or a squeeze bar, and the varnish impregnation amount adjustment mechanism 14 is composed of a squeeze roll or a squeeze bar.
Squeeze to adjust the amount of varnish impregnated.
なお、熱サイホン室4内には、加熱ロール5a
からワニス溜13aに至る基材通過経路に沿つて
基材1を囲繞する筒状等の加熱壁(又は断熱壁)
15が配設されていて、この間において基材1を
低粘性液蒸気の凝縮温度以上に加熱、保温しうる
ように工夫している。 Note that a heating roll 5a is provided in the thermosyphon chamber 4.
A cylindrical heating wall (or heat insulating wall) that surrounds the base material 1 along the base material passage path from the varnish reservoir 13a to the varnish reservoir 13a.
15, and the base material 1 is heated and kept warm to a temperature higher than the condensation temperature of the low-viscosity liquid vapor during this time.
次に、以上のように構成されたワニス含浸装置
を用いて、本発明の方法を具体的に説明する。 Next, the method of the present invention will be specifically explained using the varnish impregnation apparatus configured as described above.
まず、熱サイホン室4内の空気を抽気管11に
より排除すると共に、低粘性液貯溜部8及び低粘
性液溜12aの低粘性液12を加熱器9,10に
より加熱蒸発させて、熱サイホン室4内を低粘性
液蒸気で充満させる。 First, the air in the thermosiphon chamber 4 is removed by the air bleed pipe 11, and the low viscosity liquid 12 in the low viscosity liquid reservoir 8 and the low viscosity liquid reservoir 12a is heated and evaporated by the heaters 9 and 10, and 4 is filled with low viscosity liquid vapor.
しかる後、基材1を走行させると、基材1は基
材供給源から低粘性液貯溜槽2内にもたらされ
て、低粘性液12中に浸漬され、基材1中の空気
が低粘性液12と置換される。 Thereafter, when the substrate 1 is run, the substrate 1 is brought from the substrate supply source into the low viscosity liquid reservoir 2 and is immersed in the low viscosity liquid 12, so that the air in the substrate 1 becomes low. It is replaced with viscous liquid 12.
このとき、基材1が低粘性液貯溜槽2の液面1
2′に至ると、低粘性液12が毛細管現象により
基材1を構成する繊維束に浸透し、同時に、その
浸透力によつて繊維束中の空気は抽出される。か
かる浸透作用は、繊維束における浸透抵抗のため
或る段階で停止する。つまり、浸透作用の停止
は、基材1の走行速度つまり繊維束の低粘性液1
2への侵入速度が浸透速度より大きい場合は液面
12′上で生じ、逆の場合は液面12′下で生じ
る。 At this time, the base material 1 is at the liquid level 1 of the low viscosity liquid storage tank 2.
2', the low-viscosity liquid 12 penetrates into the fiber bundle constituting the base material 1 by capillary action, and at the same time, the air in the fiber bundle is extracted by its penetrating power. Such osmotic action stops at some stage due to osmotic resistance in the fiber bundle. In other words, the stopping of the permeation action is determined by the traveling speed of the base material 1, that is, the low viscosity liquid 1 of the fiber bundle.
If the rate of entry into 2 is greater than the rate of penetration, it will occur above the liquid level 12', and vice versa, it will occur below the liquid level 12'.
したがつて、基材1が低粘性液貯溜領域2′を
通過する間に、エキスパンダ式ガイドロール7a
による作用を受けることとも相俟つて、繊維束中
の空気はすべて低粘性液12と置換されて排除さ
れることになる。 Therefore, while the base material 1 passes through the low viscosity liquid storage area 2', the expander type guide roll 7a
Coupled with this, all the air in the fiber bundle is replaced with the low viscosity liquid 12 and eliminated.
そして、低粘性液12を含浸された基材1は、
基材入口部4aから熱サイホン室4内にもたらさ
れ、加熱ロール5aにより加熱されて、基材1に
含浸されている低粘性液12が蒸発除去される。 The base material 1 impregnated with the low viscosity liquid 12 is
The low viscosity liquid 12 impregnated into the base material 1 is evaporated and removed by being brought into the thermosyphon chamber 4 from the base material inlet portion 4a and heated by the heating roll 5a.
このとき、熱サイホン室4内で発生する低粘性
液蒸気は、蒸気圧力の上昇に伴つて自己制御加熱
器10による蒸発量が減少することとも相俟つて
第1図に示す如き、基材出口部4b側から基材加
熱部5a側へと、更には基材入口部4a側へと流
動せしめられることになり、少なくとも基材加熱
部5aからワニス溜13aに至る基材通過領域部
分は、空気が存在しない低粘性液飽和蒸気雰囲気
に保持される。また、基材1はその進行速度で低
粘性液12を基材加熱部5aへ供給し続けること
から、基材1は熱サイホンとしてのウイツクの役
割を果たすことになる。また、熱サイホン室4内
で発生する低粘性液蒸気は、抽気管11による抽
気操作若しくは低粘性液溜12aでの凝縮作用に
より低粘性液貯溜領域2′に凝縮回収される。 At this time, the low viscosity liquid vapor generated in the thermosiphon chamber 4 is caused to reach the base material outlet as shown in FIG. The air flows from the part 4b side to the base material heating part 5a side and further to the base material inlet part 4a side, and at least the part of the base material passage area from the base material heating part 5a to the varnish reservoir 13a is free of air. is maintained in a saturated vapor atmosphere with low viscosity liquid absent. In addition, since the base material 1 continues to supply the low viscosity liquid 12 to the base material heating section 5a at its advancing speed, the base material 1 plays the role of a thermosyphon. Further, the low-viscosity liquid vapor generated in the thermosyphon chamber 4 is condensed and recovered in the low-viscosity liquid storage area 2' by the bleed operation using the air bleed pipe 11 or the condensation action in the low-viscosity liquid reservoir 12a.
そして、加熱ロール5aを経過した基材1は、
引き続き基材出口部4bからワニス溜13aを通
過してワニス貯溜領域3′にもたらされる。 The base material 1 that has passed through the heating roll 5a is
Subsequently, it passes through the varnish reservoir 13a from the base material outlet portion 4b and is brought to the varnish reservoir region 3'.
このとき、基材1及びその周辺は加熱壁15及
び加熱器9により低粘性液蒸気の凝縮温度以上に
加熱、保温されているから、加熱ロール5aから
ワニス溜13aに至る基材通過領域部分は完全な
低粘性液蒸気雰囲気に保持されることになり、こ
の基材通過領域部分における低粘性液蒸気が凝縮
されて、基材面に付着したり或いはワニス溜13
aに侵入したりすることがない。 At this time, since the base material 1 and its surroundings are heated and kept warm by the heating wall 15 and the heater 9 to a temperature higher than the condensation temperature of the low-viscosity liquid vapor, the base material passage area from the heating roll 5a to the varnish reservoir 13a is A complete low-viscosity liquid-vapor atmosphere is maintained, and the low-viscosity liquid-vapor in the base material passage area is condensed and attached to the base material surface or varnish reservoir 13.
There is no possibility of intrusion into a.
ところで、ワニス温度は一般に低粘性液の飽和
蒸気温度よりも低いため、基材1がワニス13中
に進入する際、これに含まれている低粘性液蒸気
が凝縮されることになる。 Incidentally, since the varnish temperature is generally lower than the saturated vapor temperature of a low-viscosity liquid, when the base material 1 enters the varnish 13, the low-viscosity liquid vapor contained therein will be condensed.
しかし、ワニス溜13aの液面部分が加熱器9
により低粘性液12の沸点以上に加熱されている
ことから、上記した如くワニス溜13aに進入す
る際に生じる凝縮液は再蒸発されて、ワニス13
中には殆ど侵入しない。 However, the liquid level of the varnish reservoir 13a is
Since the low viscosity liquid 12 is heated to a temperature higher than the boiling point of the low viscosity liquid 12, the condensed liquid generated when entering the varnish reservoir 13a as described above is re-evaporated and the varnish 13
It hardly ever gets inside.
これらのことから、基材1の進入に伴つて低粘
性液12がワニス13中に侵入する虞れは殆どな
く、ワニス13が稀釈化される心配はない。 For these reasons, there is almost no risk that the low-viscosity liquid 12 will enter the varnish 13 as the base material 1 enters, and there is no fear that the varnish 13 will be diluted.
このようにしてワニス貯溜領域3′にもたらさ
れた基材1は、該領域3′を通過する間にワニス
13を含浸される。 The substrate 1 thus brought into the varnish storage area 3' is impregnated with varnish 13 while passing through this area 3'.
このとき、基材1には空気が含有されていない
ため、エキスパンダ式ガイドロール7bによる作
用を受けることとも相俟つて、その繊維内部にま
でワニス13が均一且つ充分に含浸せしめられる
ことになる。その結果、ボイドレスの極めて高品
質のプリプレグを得ることができる。 At this time, since the base material 1 does not contain air, the varnish 13 is evenly and sufficiently impregnated into the fibers thereof, together with the action of the expander type guide rolls 7b. . As a result, a void-free prepreg of extremely high quality can be obtained.
ところで、本発明は上記実施例に限定されるも
のではなく、その基本原理を逸脱しない範囲内に
おいて種々の変更、改良が可能である。 By the way, the present invention is not limited to the above embodiments, and various changes and improvements can be made without departing from its basic principles.
例えば、蒸気流動機構6において、第2図に示
す如く、基材入口部4a側に制御加熱器10に代
えて冷却コイル等の冷却器16を設けてもよい。
熱サイホン室4内で発生する低粘性液蒸気は冷却
器16により凝縮されて、低粘性液溜12aに回
収され、その結果、上記した低粘性液蒸気の流動
を生じる。なお、この場合、前記抽気管11は、
特に必要とない。また基材入口部4a側には、第
3図に示す如く、前記加熱器11及び冷却器16
の何れも設けないようにすることもできる。 For example, in the vapor flow mechanism 6, as shown in FIG. 2, a cooler 16 such as a cooling coil may be provided on the base material inlet portion 4a side instead of the control heater 10.
The low viscosity liquid vapor generated in the thermosyphon chamber 4 is condensed by the cooler 16 and collected into the low viscosity liquid reservoir 12a, resulting in the flow of the above-described low viscosity liquid vapor. In this case, the air bleed pipe 11 is
Not particularly necessary. Also, on the side of the base material inlet 4a, as shown in FIG. 3, the heater 11 and the cooler 16 are provided.
It is also possible to provide neither of these.
また、第3図に示す如く、低粘性液貯溜槽2の
上面を、基材1の導入口2dを有する蓋体2cで
閉塞し、導入口2dに冷却コイル等の冷却機構1
7を配設するようにしておいてもよい。このよう
にすれば、低粘性液12の放散を確実に防止し
て、環境汚染や低粘性液の損失を防止することが
できると共に、引火性のものであつても低粘性液
12として安全に使用できる。かかる構成は、ワ
ニス貯溜槽3についても適用することが可能であ
る。 Further, as shown in FIG. 3, the upper surface of the low-viscosity liquid storage tank 2 is closed with a lid 2c having an inlet 2d for the base material 1, and a cooling mechanism such as a cooling coil is connected to the inlet 2d.
7 may be arranged. In this way, it is possible to reliably prevent the low viscosity liquid 12 from dispersing, thereby preventing environmental pollution and loss of the low viscosity liquid, and even if it is flammable, it can be safely used as the low viscosity liquid 12. Can be used. Such a configuration can also be applied to the varnish storage tank 3.
また、第4図に示す如く、基材出口部4bに低
粘性液回収部18を設けて、これを低粘性液貯溜
部8に連通8aさせておくようにしてもよい。こ
の場合、低粘性液回収部18に冷却器16を配設
して、低粘性液蒸気を低粘性液回収部18に凝縮
回収するようにする。 Further, as shown in FIG. 4, a low viscosity liquid recovery section 18 may be provided at the base material outlet section 4b and communicated with the low viscosity liquid storage section 8 a. In this case, the cooler 16 is disposed in the low viscosity liquid recovery section 18 so that the low viscosity liquid vapor is condensed and recovered in the low viscosity liquid recovery section 18 .
また、ワニス溜13aを加熱することによりワ
ニス13中の溶剤等が蒸発し、これが熱サイホン
室4内に侵入する虞れのある場合には、ワニス1
3中に浸漬する基材出口部4b部分における基材
通路を基材1が通過しうる範囲内において可及的
に狭くして、ワニス貯溜領域3′と熱サイホン領
域4′との境界面積つまり基材出口部4b内にお
けるワニス表面積を小さくしておけばよい。この
ようにしておけば、ワニス溜13aの加熱による
ワニス13中の溶剤等の蒸発を可及的に防止でき
ると共に、その蒸発の熱サイホン室4への侵入を
基材1の進行により可及的に防止できる。しか
も、ワニス溜13aの液面での低粘性液蒸気の凝
縮も可及的に防止できる。 In addition, if there is a risk that the solvent etc. in the varnish 13 will evaporate by heating the varnish reservoir 13a and enter the thermosyphon chamber 4, the varnish 1
By making the substrate passageway at the substrate exit portion 4b portion immersed in the substrate 3 as narrow as possible within the range through which the substrate 1 can pass, the boundary area between the varnish storage region 3' and the thermosyphon region 4', that is, The varnish surface area within the base material outlet portion 4b may be made small. By doing this, the evaporation of the solvent, etc. in the varnish 13 due to heating of the varnish reservoir 13a can be prevented as much as possible, and the invasion of the evaporation into the thermosyphon chamber 4 can be prevented as much as possible by advancing the base material 1. can be prevented. Furthermore, condensation of low-viscosity liquid vapor on the liquid surface of the varnish reservoir 13a can be prevented as much as possible.
さらに、熱サイホン室4の周壁、例えば基材出
口部4bの周壁に低粘性液蒸気を吹き込むノズル
を設けておいてもよい。このようにすれば、前記
した熱サイホン室4の周壁4cによる加熱作用と
相俟つて、装置起動時における迅速な立上りを更
に図ることができる。 Furthermore, a nozzle for blowing low-viscosity liquid vapor may be provided on the peripheral wall of the thermosyphon chamber 4, for example, on the peripheral wall of the base material outlet section 4b. In this way, in combination with the heating effect of the peripheral wall 4c of the thermosiphon chamber 4, it is possible to achieve a more rapid start-up at the time of starting the apparatus.
以上の説明から容易に理解されるように、本発
明によれば、基材にワニスを均一且つ充分に短時
間で含浸させることができ、しかも基材中の気泡
も皆無とすることができる。かかる効果は、高粘
度のワニスを含浸させる場合に著しい。
As can be easily understood from the above description, according to the present invention, a base material can be impregnated with varnish uniformly and in a sufficiently short time, and there can be no air bubbles in the base material. This effect is significant when impregnating high viscosity varnishes.
第1図は本発明に係るワニス含浸装置の一実施
例を示す縦断側面図、第2図〜第4図は夫々その
変形例を示す第1図相当の縦断側面図である。
1……基材、2……低粘性液貯溜槽、2′……
低粘性液貯溜領域、3……ワニス貯溜槽、3′…
…ワニス貯溜領域、4……熱サイホン室、4′…
…熱サイホン領域、4a……熱サイホン領域と低
粘性液貯溜領域との連通部である基材入口部、4
b……熱サイホン領域とワニス貯溜領域との連通
部である基材出口部、5……基材加熱機構、5a
……加熱ロール、6……蒸気流動機構、7……基
材走行ガイド機構、7a,7b……ガイドロー
ル、8……低粘性液貯溜部、9……低粘性液加熱
器。
FIG. 1 is a longitudinal sectional side view showing one embodiment of the varnish impregnating apparatus according to the present invention, and FIGS. 2 to 4 are longitudinal sectional side views corresponding to FIG. 1 showing modifications thereof. 1...Base material, 2...Low viscosity liquid storage tank, 2'...
Low viscosity liquid storage area, 3...varnish storage tank, 3'...
...Varnish storage area, 4...Thermosyphon chamber, 4'...
...thermosyphon region, 4a...base material inlet portion, which is a communication part between the thermosiphon region and the low viscosity liquid storage region, 4
b...Base material outlet part which is a communication part between the thermosiphon region and the varnish storage region, 5...Base material heating mechanism, 5a
. . . Heating roll, 6 . . . Steam flow mechanism, 7 . . . Base material traveling guide mechanism, 7a, 7b .
Claims (1)
域とワニスを貯溜せるワニス貯溜領域との間に、
両貯溜領域にその液面で液封された状態で連通す
る密閉状の熱サイホン領域を設けて、繊維質材か
らなるシート状の基材を低粘性液貯溜領域、熱サ
イホン領域、ワニス貯溜領域を順次通過させるよ
うにし、熱サイホン領域において、基材を加熱し
てこれに含浸された低粘性液を蒸発させると共に
基材の出口側に貯溜せる低粘性液を蒸発させ、且
つ熱サイホン領域で発生した低粘性液蒸気を基材
の出口側から少なくとも基材の加熱部側へと流動
させるようにしたことを特徴とするワニス含浸方
法。 2 溶剤等の低粘性液を貯溜した低粘性液貯溜槽
と、ワニスを貯溜したワニス貯溜槽と、各貯溜槽
内の液面下において開口する筒状の基材入口部及
び基材出口部を備えた密閉状の熱サイホン室と、
繊維質材からなるシート状の基材を低粘性液貯溜
槽から基材入口部を経て熱サイホン室に導き更に
基材出口部からワニス貯溜槽に導く基材走行ガイ
ド機構と、熱サイホン室内において基材を加熱し
て、これに含浸された低粘性液を蒸発させる基材
加熱機構と、基材出口部に低粘性液貯溜部及び低
粘性液加熱器を備えており、低粘性液貯溜部の低
粘性液を加熱蒸発させる共に熱サイホン室内で発
生する低粘性液蒸気を基材出口部側から少なくと
も基材加熱機構側へと流動させる蒸気流動機構
と、を具備することを特徴とするワニス含浸装
置。[Claims] 1. Between a low viscosity liquid storage area where a low viscosity liquid such as a solvent can be stored and a varnish storage area where varnish can be stored,
A sealed thermosiphon region is provided in both reservoir regions, which communicate with each other while being sealed with liquid at the liquid level, and a sheet-like base material made of a fibrous material is used as a low-viscosity liquid reservoir region, a thermosyphon region, and a varnish reservoir region. In the thermosyphon region, the base material is heated to evaporate the low viscosity liquid impregnated therein, and the low viscosity liquid stored on the outlet side of the base material is evaporated. A varnish impregnation method characterized in that the generated low-viscosity liquid vapor is made to flow from the outlet side of the base material to at least the heating part side of the base material. 2 A low viscosity liquid storage tank that stores low viscosity liquid such as a solvent, a varnish storage tank that stores varnish, and a cylindrical base material inlet and base material outlet that open below the liquid level in each storage tank. A sealed thermosiphon chamber equipped with
A base material traveling guide mechanism that guides a sheet-like base material made of a fibrous material from a low-viscosity liquid storage tank through a base material inlet to a thermosyphon chamber, and further guides the base material from a base material outlet to a varnish storage tank; It is equipped with a base material heating mechanism that heats the base material and evaporates the low viscosity liquid impregnated into the base material, and a low viscosity liquid reservoir and a low viscosity liquid heater at the base material outlet. A varnish characterized by comprising: a vapor flow mechanism that heats and evaporates the low viscosity liquid and causes the low viscosity liquid vapor generated in the thermosiphon chamber to flow from the base material outlet side to at least the base material heating mechanism side. Impregnation equipment.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1034671A JPH02214614A (en) | 1989-02-14 | 1989-02-14 | Method and equipment for varnishing |
KR1019890014226A KR930001712B1 (en) | 1988-11-18 | 1989-10-04 | Varnish impregnation method and apparatus |
US07/430,329 US5056457A (en) | 1988-11-18 | 1989-11-02 | Varnish impregnation method and apparatus |
DE68915401T DE68915401T2 (en) | 1988-11-18 | 1989-11-15 | Method and device for impregnation with varnish. |
EP89420444A EP0369907B1 (en) | 1988-11-18 | 1989-11-15 | A varnish impregnation method and apparatus |
US07/738,953 US5137756A (en) | 1988-11-18 | 1991-08-01 | Varnish impregnation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1034671A JPH02214614A (en) | 1989-02-14 | 1989-02-14 | Method and equipment for varnishing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02214614A JPH02214614A (en) | 1990-08-27 |
JPH0581409B2 true JPH0581409B2 (en) | 1993-11-12 |
Family
ID=12420893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1034671A Granted JPH02214614A (en) | 1988-11-18 | 1989-02-14 | Method and equipment for varnishing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02214614A (en) |
-
1989
- 1989-02-14 JP JP1034671A patent/JPH02214614A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH02214614A (en) | 1990-08-27 |
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