JPH0559142A - Production of organic ferromagnetic substance - Google Patents
Production of organic ferromagnetic substanceInfo
- Publication number
- JPH0559142A JPH0559142A JP3244487A JP24448791A JPH0559142A JP H0559142 A JPH0559142 A JP H0559142A JP 3244487 A JP3244487 A JP 3244487A JP 24448791 A JP24448791 A JP 24448791A JP H0559142 A JPH0559142 A JP H0559142A
- Authority
- JP
- Japan
- Prior art keywords
- organic
- polymer
- group
- alkali metal
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000005294 ferromagnetic effect Effects 0.000 title abstract description 9
- 239000000126 substance Substances 0.000 title abstract description 4
- -1 silane compound Chemical class 0.000 claims abstract description 35
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 27
- 229920000642 polymer Polymers 0.000 claims abstract description 27
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 25
- 229910000077 silane Inorganic materials 0.000 claims abstract description 16
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 12
- 125000005843 halogen group Chemical group 0.000 claims abstract description 12
- 239000003302 ferromagnetic material Substances 0.000 claims description 9
- 229910052744 lithium Inorganic materials 0.000 claims description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 abstract description 5
- 230000001747 exhibiting effect Effects 0.000 abstract description 3
- 230000005307 ferromagnetism Effects 0.000 abstract description 3
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 abstract 1
- 229910052722 tritium Inorganic materials 0.000 abstract 1
- 150000003254 radicals Chemical class 0.000 description 19
- 239000002904 solvent Substances 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 12
- 150000001491 aromatic compounds Chemical class 0.000 description 11
- 125000001424 substituent group Chemical group 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002243 precursor Substances 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 150000003384 small molecules Chemical class 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- 230000005291 magnetic effect Effects 0.000 description 5
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 229910021536 Zeolite Inorganic materials 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 230000005389 magnetism Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 4
- 239000010457 zeolite Substances 0.000 description 4
- DPZNOMCNRMUKPS-UHFFFAOYSA-N 1,3-Dimethoxybenzene Chemical compound COC1=CC=CC(OC)=C1 DPZNOMCNRMUKPS-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000004440 column chromatography Methods 0.000 description 3
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CLFRCXCBWIQVRN-UHFFFAOYSA-N 2,5-dihydroxybenzaldehyde Chemical compound OC1=CC=C(O)C(C=O)=C1 CLFRCXCBWIQVRN-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000005011 alkyl ether group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- HEVMDQBCAHEHDY-UHFFFAOYSA-N (Dimethoxymethyl)benzene Chemical compound COC(OC)C1=CC=CC=C1 HEVMDQBCAHEHDY-UHFFFAOYSA-N 0.000 description 1
- MKGFYMKFBCWNCP-UHFFFAOYSA-N 1,3-diethoxybenzene Chemical compound CCOC1=CC=CC(OCC)=C1 MKGFYMKFBCWNCP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- SGWZVZZVXOJRAQ-UHFFFAOYSA-N 2,6-Dimethyl-1,4-benzenediol Chemical compound CC1=CC(O)=CC(C)=C1O SGWZVZZVXOJRAQ-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- FMMWHPNWAFZXNH-UHFFFAOYSA-N Benz[a]pyrene Chemical compound C1=C2C3=CC=CC=C3C=C(C=C3)C2=C2C3=CC=CC2=C1 FMMWHPNWAFZXNH-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KCMZYCFSSYXEQR-UHFFFAOYSA-N CCCC[K] Chemical compound CCCC[K] KCMZYCFSSYXEQR-UHFFFAOYSA-N 0.000 description 1
- IRDQNLLVRXMERV-UHFFFAOYSA-N CCCC[Na] Chemical compound CCCC[Na] IRDQNLLVRXMERV-UHFFFAOYSA-N 0.000 description 1
- ZCUFTCUMEDALHC-UHFFFAOYSA-N CC[K] Chemical compound CC[K] ZCUFTCUMEDALHC-UHFFFAOYSA-N 0.000 description 1
- NTZRDKVFLPLTPU-UHFFFAOYSA-N CC[Na] Chemical compound CC[Na] NTZRDKVFLPLTPU-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- CPNOVDWZRIYWQV-UHFFFAOYSA-N [Li]CCCCCCCC Chemical compound [Li]CCCCCCCC CPNOVDWZRIYWQV-UHFFFAOYSA-N 0.000 description 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- IZALUMVGBVKPJD-UHFFFAOYSA-N benzene-1,3-dicarbaldehyde Chemical compound O=CC1=CC=CC(C=O)=C1 IZALUMVGBVKPJD-UHFFFAOYSA-N 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KBAZUXSLKGQRJF-UHFFFAOYSA-N chloro-dimethyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)F KBAZUXSLKGQRJF-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 125000004914 dipropylamino group Chemical group C(CC)N(CCC)* 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- BTZNPZMHENLISZ-UHFFFAOYSA-N fluoromethanesulfonic acid Chemical compound OS(=O)(=O)CF BTZNPZMHENLISZ-UHFFFAOYSA-N 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000001641 gel filtration chromatography Methods 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- KDEZIUOWTXJEJK-UHFFFAOYSA-N heptacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC6=CC7=CC=CC=C7C=C6C=C5C=C4C=C3C=C21 KDEZIUOWTXJEJK-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- QSQIGGCOCHABAP-UHFFFAOYSA-N hexacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC6=CC=CC=C6C=C5C=C4C=C3C=C21 QSQIGGCOCHABAP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002467 indacenes Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- CETVQRFGPOGIQJ-UHFFFAOYSA-N lithium;hexane Chemical compound [Li+].CCCCC[CH2-] CETVQRFGPOGIQJ-UHFFFAOYSA-N 0.000 description 1
- XBEREOHJDYAKDA-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].CC[CH2-] XBEREOHJDYAKDA-UHFFFAOYSA-N 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000001979 organolithium group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- KSMWLICLECSXMI-UHFFFAOYSA-N sodium;benzene Chemical compound [Na+].C1=CC=[C-]C=C1 KSMWLICLECSXMI-UHFFFAOYSA-N 0.000 description 1
- SYXYWTXQFUUWLP-UHFFFAOYSA-N sodium;butan-1-olate Chemical compound [Na+].CCCC[O-] SYXYWTXQFUUWLP-UHFFFAOYSA-N 0.000 description 1
- RCOSUMRTSQULBK-UHFFFAOYSA-N sodium;propan-1-olate Chemical compound [Na+].CCC[O-] RCOSUMRTSQULBK-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/42—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of organic or organo-metallic materials, e.g. graphene
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Hard Magnetic Materials (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気記録材料や光磁気
材料、磁性トナー用材料などとして使用できる有機強磁
性体の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an organic ferromagnet which can be used as a magnetic recording material, a magneto-optical material, a magnetic toner material and the like.
【0002】[0002]
【従来の技術および発明が解決しようとする課題】近
年、無機磁性材料に代えて、加工性等の点で優れる有機
磁性材料が種々報告されている。例えば、トリアリール
メタン構造を有するオリゴマーのメチン炭素部位の水素
原子をリチウムで置換し、ヨウ素と反応させることによ
り、ポリラジカルが生成することが報告されている(J.
Am. Chem. Soc. 1990, 112, 5889-5890)。2. Description of the Related Art In recent years, various organic magnetic materials having excellent workability have been reported in place of inorganic magnetic materials. For example, it has been reported that a polyradical is generated by substituting a hydrogen atom at a methine carbon site of an oligomer having a triarylmethane structure with lithium and reacting with iodine (J.
Am. Chem. Soc. 1990, 112, 5889-5890).
【0003】この方法では、ヨウ素との反応によりヨウ
化リチウムが生成するものの、一電子酸化で反応を停止
することが極めて困難である。そのため、二電子酸化反
応が生じ、メチン部位にカチオンが生成すると共にヨウ
素アニオンも生成し、ラジカル生成効率が小さい。In this method, lithium iodide is produced by the reaction with iodine, but it is extremely difficult to stop the reaction by one-electron oxidation. Therefore, a two-electron oxidation reaction occurs, a cation is generated at the methine site and an iodine anion is also generated, and the radical generation efficiency is low.
【0004】従って、本発明の目的は、ラジカル濃度が
高く、強磁性を発現する有機強磁性体を製造できる有機
強磁性体の製造方法を提供することにある。Therefore, it is an object of the present invention to provide a method for producing an organic ferromagnet which has a high radical concentration and is capable of producing ferromagnetism.
【0005】[0005]
【発明の構成】本発明者は、鋭意検討の結果、メチン炭
素に結合した水素原子をアルカリ金属で置換し、ハロシ
ラン類と反応させることにより、ポリラジカルが効率よ
く生成することを見いだし、本発明を完成した。As a result of intensive studies, the present inventor found that a polyradical is efficiently produced by substituting a hydrogen atom bonded to a methine carbon with an alkali metal and reacting it with a halosilane. Was completed.
【0006】すなわち、本発明は、トリアリールメタン
構造を有し、メチン炭素にアルカリ金属が置換したポリ
マーと、ハロゲン原子を有するシラン類とを反応させる
有機強磁性体の製造方法を提供する。That is, the present invention provides a method for producing an organic ferromagnetic material in which a polymer having a triarylmethane structure and having a methine carbon substituted with an alkali metal is reacted with a silane having a halogen atom.
【0007】本発明において使用するポリマーはトリア
リールメタン構造を有し、メチン炭素にはアルカリ金属
が置換している。このポリマーは、有機強磁性前駆体と
して機能し、例えば、下記一般式で表される構造単位を
含んでいる。The polymer used in the present invention has a triarylmethane structure, and the methine carbon is substituted with an alkali metal. This polymer functions as an organic ferromagnetic precursor and contains, for example, a structural unit represented by the following general formula.
【0008】[0008]
【化1】 (式中、Ar1 は置換基で置換されていてもよい二価の
芳香族基、Ar2 は置換基で置換されていてもよい一価
の芳香族基を示し、Mはアルカリ金属を示す。nは正の
整数を示す) 前記一般式で表される構造単位の割合は、有機強磁性前
駆体中25〜100%、好ましくは50%以上である。
上記一般式で表される構造単位において芳香族基Ar1
とAr2 は同一又は異なっていてもよい。[Chemical 1] (In the formula, Ar1 represents a divalent aromatic group which may be substituted with a substituent, Ar2 represents a monovalent aromatic group which may be substituted with a substituent, and M represents an alkali metal. Represents a positive integer) The proportion of the structural unit represented by the general formula is 25 to 100%, preferably 50% or more in the organic ferromagnetic precursor.
In the structural unit represented by the above general formula, an aromatic group Ar1
And Ar2 may be the same or different.
【0009】芳香族基Ar1 及びAr2 を構成する芳香
族化合物としては、ベンゼン、ナフタレン、アズレン、
インダセン、アセナフチレン、アントラセン、フェナン
トレン、トリフェニレン、ピレン、クリセン、ナフタセ
ン、ベンゾフェナントレン、ペリレン、ベンゾピレン、
ヘキサセン、ヘプタセンなどの単環又は縮合多環式炭化
水素;イソキノリン、キノリン、カルバゾール、アクリ
ジン、フェナジンなどの、窒素原子、硫黄原子や酸素原
子などをヘテロ原子として含むヘテロ環を有する芳香族
炭化水素などが例示される。As the aromatic compounds constituting the aromatic groups Ar1 and Ar2, benzene, naphthalene, azulene,
Indacene, acenaphthylene, anthracene, phenanthrene, triphenylene, pyrene, chrysene, naphthacene, benzophenanthrene, perylene, benzopyrene,
Monocyclic or condensed polycyclic hydrocarbons such as hexacene and heptacene; aromatic hydrocarbons having a heterocycle containing nitrogen atom, sulfur atom, oxygen atom and the like as a hetero atom such as isoquinoline, quinoline, carbazole, acridine and phenazine Is exemplified.
【0010】また、芳香族基Ar1 及びAr2 の置換基
としては、メチル、エチル、プロピル、イソプロピル、
ブチル、ペンチル、ヘキシル基などの炭素数1〜6の低
級アルキル基;ヒドロキシ基;メトキシ、エトキシ、プ
ロポキシ、イソプロポキシ、ブトキシ、ペンチルオキ
シ、ヘキシルオキシ基などの炭素数1〜6の低級アルコ
キシ基;ジメチルアミノ、ジエチルアミノ、ジプロピル
アミノ基などの炭素数1〜6のアルキル基を有するジア
ルキルアミノ基などが例示される。これらの置換基は、
芳香族基の種類に応じて1個以上置換できる。The substituents on the aromatic groups Ar1 and Ar2 include methyl, ethyl, propyl, isopropyl,
A lower alkyl group having 1 to 6 carbon atoms such as butyl, pentyl, hexyl group; a hydroxy group; a lower alkoxy group having 1 to 6 carbon atoms such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, pentyloxy, hexyloxy group; Examples thereof include dialkylamino groups having an alkyl group having 1 to 6 carbon atoms such as dimethylamino, diethylamino and dipropylamino groups. These substituents are
One or more may be substituted depending on the type of aromatic group.
【0011】これらの置換基のうち電子供与性基、例え
ば、低級アルキル基、ヒドロキシ基、低級アルコキシ基
などが好ましい。電子供与性基は、メチン基と結合した
芳香族基の共役位置、例えば、2−位、4−位、6−位
に置換しているのが好ましい。 アルカリ金属Mとして
は、例えば、リチウム、ナトリウム、カリウムなどが挙
げられる。好ましいアルカリ金属にはリチウムが含まれ
る。Of these substituents, an electron-donating group such as a lower alkyl group, a hydroxy group or a lower alkoxy group is preferable. The electron-donating group is preferably substituted at the conjugated position of the aromatic group bonded to the methine group, for example, at the 2-position, 4-position and 6-position. Examples of the alkali metal M include lithium, sodium, potassium and the like. Preferred alkali metals include lithium.
【0012】有機強磁性前駆体において、上記一般式で
表される構造単位の繰返し単位nは5以上であるのが好
ましい。nが4以下である場合には、モビリティの大き
な低分子化合物により、生成したラジカルの安定性が損
われ易い。有機強磁性前駆体は、可溶可融の範囲で分子
量が大きい程好ましい。好ましい繰返し単位nは、5〜
100程度である。有機強磁性前駆体の数平均分子量
は、一般式で表される構造単位により異なるので一義的
に決定できないが、ゲルパーミエーションクロマトグラ
フィーによるポリスチレン換算で、700以上、好まし
くは1000〜20000程度である。なお、n=5〜
10程度の有機強磁性前駆体は、初期縮合物であるB−
ステージのポリマーとなる。このB−ステージのポリマ
ーは、通常軟化点30〜120℃程度を示す。In the organic ferromagnetic precursor, the repeating unit n of the structural unit represented by the above general formula is preferably 5 or more. When n is 4 or less, the stability of the generated radicals is likely to be impaired by the low-molecular weight compound having large mobility. It is preferable that the organic ferromagnetic precursor has a large molecular weight in the range of being soluble and fusible. The preferred repeating unit n is 5 to
It is about 100. The number average molecular weight of the organic ferromagnetic precursor cannot be uniquely determined because it depends on the structural unit represented by the general formula, but is 700 or more, preferably about 1000 to 20000 in terms of polystyrene by gel permeation chromatography. .. In addition, n = 5
An organic ferromagnetic precursor of about 10 is B- which is an initial condensate.
It becomes the stage polymer. The B-stage polymer usually has a softening point of about 30 to 120 ° C.
【0013】前記一般式で表される構造単位を有するポ
リマーの製造方法は特に制限されないが、例えば、置換
基を有していてもよい芳香族化合物と、少なくとも1個
のホルミル基を有する芳香族アルデヒド化合物とを、酸
触媒の存在下で縮合させ、得られたトリアリールメタン
構造を有する生成物と有機アルカリ金属とを反応させ、
メチン炭素に結合した水素原子をアルカリ金属で置換す
ることにより得ることができる。The method for producing the polymer having the structural unit represented by the above general formula is not particularly limited. For example, an aromatic compound which may have a substituent and an aromatic compound which has at least one formyl group. An aldehyde compound is condensed in the presence of an acid catalyst, and the obtained product having a triarylmethane structure is reacted with an organic alkali metal,
It can be obtained by replacing the hydrogen atom bonded to the methine carbon with an alkali metal.
【0014】前記芳香族化合物の置換基としては、例え
ば、ヒドロキシ基、炭素数1〜6の低級アルコキシ基、
炭素数1〜6の低級アルキル基、炭素数1〜6の低級ア
ルキル基を有するジアルキルアミノ基などが例示でき
る。As the substituent of the aromatic compound, for example, a hydroxy group, a lower alkoxy group having 1 to 6 carbon atoms,
Examples thereof include a lower alkyl group having 1 to 6 carbon atoms and a dialkylamino group having a lower alkyl group having 1 to 6 carbon atoms.
【0015】芳香族化合物としては、例えば、前記芳香
族基Ar1 及びAr2 を構成する芳香族化合物、フェノ
ール、レゾルシノール、ヒドロキノン、ピロガロール、
クレゾール、メトキシベンゼン、エトキシベンゼン、m
−ジメトキシベンゼン、m−ジエトキシベンゼン、4−
メトキシフェノール、4−ヒドロキシ−2,6−ジメチ
ルフェノール、ナフトールなどの単環又は縮合多環式炭
化水素が例示される。これらの芳香族化合物は少なくと
も一種使用できる。Examples of the aromatic compound include aromatic compounds constituting the aromatic groups Ar1 and Ar2, phenol, resorcinol, hydroquinone, pyrogallol,
Cresol, methoxybenzene, ethoxybenzene, m
-Dimethoxybenzene, m-diethoxybenzene, 4-
Examples are monocyclic or condensed polycyclic hydrocarbons such as methoxyphenol, 4-hydroxy-2,6-dimethylphenol, and naphthol. At least one of these aromatic compounds can be used.
【0016】ホルミル基を有する芳香族アルデヒド化合
物は、前記と同様の置換基やアルキルアミノ基を有して
いてもよい。このような芳香族アルデヒド化合物として
は、例えば、ベンズアルデヒド、テレフタルアルデヒ
ド、イソフタルアルデヒド、p−ヒドロキシベンズアル
デヒド、サリチルアルデヒド、p−メトキシベンズアル
デヒド、2,5−ジヒドロキシベンズアルデヒド、2,
5−ジメトキシベンズアルデヒド、p−N,N−ジメチ
ルアミノベンズアルデヒド、ピレンアルデヒド、ベンズ
アルデヒドジメチルアセタールなどが例示される。これ
らの芳香族アルデヒド化合物は少なくとも一種使用でき
る。The aromatic aldehyde compound having a formyl group may have the same substituent or alkylamino group as described above. Examples of such aromatic aldehyde compounds include benzaldehyde, terephthalaldehyde, isophthalaldehyde, p-hydroxybenzaldehyde, salicylaldehyde, p-methoxybenzaldehyde, 2,5-dihydroxybenzaldehyde, 2,
Examples thereof include 5-dimethoxybenzaldehyde, p-N, N-dimethylaminobenzaldehyde, pyrene aldehyde, benzaldehyde dimethyl acetal and the like. At least one of these aromatic aldehyde compounds can be used.
【0017】なお、ヒドロキシル基及びホルミル基を有
する芳香族アルデヒド化合物、例えば、p−ヒドロキシ
ベンズアルデヒド、サリチルアルデヒドを用いる場合に
は、自己縮合性を有するので、前記置換基を有していて
もよい芳香族化合物は、必ずしも必要ではない。When an aromatic aldehyde compound having a hydroxyl group and a formyl group, such as p-hydroxybenzaldehyde or salicylaldehyde, is used, since it has self-condensation, it may have the above-mentioned substituent. Group compounds are not necessary.
【0018】芳香族アルデヒド化合物は、置換基を有し
ていてもよい芳香族化合物1モルに対して、通常、0.
5〜2.5モル、好ましくは1〜2モル程度使用され
る。The aromatic aldehyde compound is usually used in an amount of 0.1.0 per mol of the aromatic compound which may have a substituent.
It is used in an amount of 5 to 2.5 mol, preferably 1 to 2 mol.
【0019】縮合反応に使用される酸性触媒としては、
例えば、塩酸、硫酸、硝酸などの無機酸、p−トルエン
スルホン酸、フルオロメタンスルホン酸などの有機酸が
例示される。酸性触媒の量は、その種類と、出発原料の
反応性により大きく異なるが、通常、芳香族化合物と芳
香族アルデヒド化合物との総量に対して、通常、0.0
1〜10重量%程度である。なお、電子供与性基を有す
る出発原料を用いると、酸性触媒量が少なくて済む。よ
り具体的には、m−ジメトキシベンゼンとベンズアルデ
ヒドとを縮合させる場合には、p−トルエンスルホン酸
の添加量は、1〜7重量%程度てある。The acidic catalyst used in the condensation reaction is
Examples thereof include inorganic acids such as hydrochloric acid, sulfuric acid and nitric acid, and organic acids such as p-toluenesulfonic acid and fluoromethanesulfonic acid. The amount of the acidic catalyst varies greatly depending on the type and reactivity of the starting material, but is usually 0.0 with respect to the total amount of the aromatic compound and the aromatic aldehyde compound.
It is about 1 to 10% by weight. Note that when a starting material having an electron-donating group is used, the amount of acidic catalyst can be small. More specifically, when m-dimethoxybenzene and benzaldehyde are condensed, the amount of p-toluenesulfonic acid added is about 1 to 7% by weight.
【0020】縮合反応は、空気中、好ましくは窒素、ヘ
リウムなどの不活性ガス雰囲気中で行なわれる。縮合反
応は、有機溶媒の存在下で行なってもよいが、通常、溶
媒の不存在下、室温〜200℃、好ましくは100〜1
50℃程度の温度で10分〜12時間程度、好ましくは
30分〜6時間程度行なうことができる。反応時間を短
時間、例えば10分〜1時間程度とすると、B−ステー
ジの初期縮合物を得ることができる。The condensation reaction is carried out in air, preferably in an atmosphere of an inert gas such as nitrogen or helium. The condensation reaction may be carried out in the presence of an organic solvent, but usually in the absence of a solvent, room temperature to 200 ° C., preferably 100 to 1
It can be carried out at a temperature of about 50 ° C. for about 10 minutes to 12 hours, preferably for about 30 minutes to 6 hours. When the reaction time is short, for example, about 10 minutes to 1 hour, a B-stage precondensate can be obtained.
【0021】前記置換反応に使用される有機アルカリ金
属としては、例えば、メチルリチウム、エチルリチウ
ム、エチルナトリウム、エチルカリウム、プロピルリチ
ウム、ブチルリチウム、ブチルナトリウム、ブチルカリ
ウム、ヘキシルリチウム、オクチルリチウムなどのアル
キル−アルカリ金属、フェニルリチウム、フェニルナト
リウム、ナフチルリチウムなどのアリール−アルカリ金
属などが例示される。これらの有機アルカリ金属は一種
又は二種以上使用できる。好ましい有機アルカリ金属に
は有機リチウムが含まれる。Examples of the organic alkali metal used in the substitution reaction include alkyl lithium such as methyl lithium, ethyl lithium, ethyl sodium, ethyl potassium, propyl lithium, butyl lithium, butyl sodium, butyl potassium, hexyl lithium and octyl lithium. -Aryl-alkali metals such as alkali metals, phenyllithium, phenylsodium, and naphthyllithium are exemplified. These organic alkali metals can be used alone or in combination of two or more. Preferred organic alkali metals include organolithium.
【0022】トリアリールメタン構造を有するポリマー
と有機アルカリ金属との割合は、ポリマーのトリアリー
ルメタン構造単位に対して1〜5当量、好ましくは1.
2〜3当量程度使用される。The ratio of the polymer having a triarylmethane structure to the organic alkali metal is 1 to 5 equivalents, preferably 1.
It is used in 2-3 equivalents.
【0023】反応は通常反応に不活性な溶媒中で行なわ
れる。溶媒としては、例えば、ベンゼン、トルエン、キ
シレンなどの芳香族炭化水素、ジオキサン、エチルエー
テル、プロピルエーテル、テトラヒドロフランなどのエ
ーテル類や、これらの混合溶媒が使用できる。反応は、
−45℃〜50℃、好ましくは−25℃〜25℃程度で
行なうことができる。The reaction is usually carried out in a solvent inert to the reaction. As the solvent, for example, aromatic hydrocarbons such as benzene, toluene and xylene, ethers such as dioxane, ethyl ether, propyl ether and tetrahydrofuran, and mixed solvents thereof can be used. The reaction is
It can be carried out at -45 ° C to 50 ° C, preferably about -25 ° C to 25 ° C.
【0024】なお、前記一般式で表される構造単位を有
するポリマーは、他の帆法でも得ることができる。例え
ば、前記芳香族化合物と、トリクロロメチル基などのト
リハロゲノメチル基を有する芳香族化合物とをルイス酸
の存在下で縮合させ、縮合反応により生成したポリマー
とアルコキシアルカリ金属とを反応させ、メチン炭素の
ハロゲン原子をアルキルエーテル基で置換する。次い
で、アルカリ金属と反応させ、アルキルエーテル基をア
ルカリ金属で置換する。The polymer having the structural unit represented by the above general formula can also be obtained by another sail method. For example, the aromatic compound and an aromatic compound having a trihalogenomethyl group such as a trichloromethyl group are condensed in the presence of a Lewis acid, and a polymer produced by the condensation reaction is reacted with an alkoxy alkali metal to give a methine carbon. The halogen atom of is substituted with an alkyl ether group. Then, it is reacted with an alkali metal to replace the alkyl ether group with the alkali metal.
【0025】前記ルイス酸としては、慣用の化合物、例
えば、AlCl3 、FeCl3 、ZnCl2 、TiCl
3 、TiCl4 、SnCl2 、SnCl4 などが挙げら
れる。アルコキシアルカリ金属としては、ナトリウムメ
トキシド、ナトリウムエトキシド、ナトリウムプロポキ
シド、ナトリウムブトキシドなどのナトリウムアルコキ
シド、これらに対応するリチウムアルコキシド、カリウ
ムアルコキシドなどが例示される。アルカリ金属として
は、前記と同様、リチウム、ナトリウム、カリウムなど
が挙げられ、リチウムが好ましい。Examples of the Lewis acid include conventional compounds such as AlCl 3 , FeCl 3 , ZnCl 2 and TiCl 2 .
3 , TiCl 4 , SnCl 2 , SnCl 4 and the like. Examples of the alkoxyalkali metal include sodium alkoxide such as sodium methoxide, sodium ethoxide, sodium propoxide and sodium butoxide, and lithium alkoxide and potassium alkoxide corresponding to these. Examples of the alkali metal include lithium, sodium, potassium, etc., as described above, and lithium is preferable.
【0026】反応終了後、生成したポリマーは、通常、
良溶媒と貧溶媒とを用いた精製法などにより不純物を除
去する除去工程に供される。このようにして得られた前
記一般式で表される構造単位を有するポリマーと、ハロ
ゲン原子を有するシラン化合物とを反応させることによ
り、ラジカルが生成した有機強磁性体が得られる。After the reaction is completed, the produced polymer is usually
It is subjected to a removal step of removing impurities by a purification method using a good solvent and a poor solvent. By reacting the thus obtained polymer having the structural unit represented by the general formula with a silane compound having a halogen atom, an organic ferromagnet in which radicals are generated can be obtained.
【0027】シラン化合物は、ハロゲン原子を有してい
ればよい。ハロゲン原子を有するシラン化合物は、例え
ば、(R)3 SiX(式中、Rは、同一又は異なって、
水素原子、アルキル基、アルケニル基、アリール基、シ
クロアルキル基を示し、Xはハロゲン原子を示す)で表
される。The silane compound may have a halogen atom. The silane compound having a halogen atom is, for example, (R) 3 SiX (wherein R is the same or different,
A hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a cycloalkyl group, and X represents a halogen atom).
【0028】前記アルキル基には、例えば、メチル、エ
チル、プロピル、イソプロピル、ブチル、イソブチル、
t−ブチル、ペンチル、ヘキシル基などが含まれる。ア
ルケニル基には、例えば、ビニル基などの炭素数2〜6
程度の低級アルケニル基が含まれる。アリール基にはフ
ェニル基などが含まれ、シクロアルキル基にはシクロヘ
キシル基などが含まれる。これらの置換基は、フッ素原
子などのハロゲン原子、シアノ基などを有していてもよ
い。前記ハロゲン原子Xには塩素原子、臭素原子などが
含まれる。Examples of the alkyl group include methyl, ethyl, propyl, isopropyl, butyl, isobutyl,
Includes t-butyl, pentyl, hexyl groups and the like. The alkenyl group includes, for example, a vinyl group having 2 to 6 carbon atoms.
Some lower alkenyl groups are included. The aryl group includes a phenyl group and the like, and the cycloalkyl group includes a cyclohexyl group and the like. These substituents may have a halogen atom such as a fluorine atom or a cyano group. The halogen atom X includes a chlorine atom, a bromine atom and the like.
【0029】このようなモノハロシラン化合物として
は、例えば、クロロトリメチルシラン、クロロジメチル
−t−ブチルシラン、クロロジメチルトリフルオロプロ
ピルシラン、クロロトリフェニルシラン、クロロジメチ
ルフェニルシランなどが例示される。これらのシラン化
合物は一種又は二種以上使用できる。なお、前記シラン
化合物には、ハロゲン原子がケイ素に結合している限
り、2以上のケイ素原子を有するポリシランも含まれ
る。好ましいシラン化合物には、フェニル基を有するシ
ラン化合物が含まれる。シラン化合物のフェニル基の数
が多くなるにつれて、メチン部位でのラジカルの生成効
率が高くなる傾向を示す。Examples of such monohalosilane compounds include chlorotrimethylsilane, chlorodimethyl-t-butylsilane, chlorodimethyltrifluoropropylsilane, chlorotriphenylsilane, chlorodimethylphenylsilane and the like. These silane compounds may be used either individually or in combination of two or more. The silane compound also includes polysilane having two or more silicon atoms as long as the halogen atom is bonded to silicon. Preferred silane compounds include silane compounds having a phenyl group. As the number of phenyl groups in the silane compound increases, the radical generation efficiency at the methine site tends to increase.
【0030】ハロゲン原子を有するシラン化合物は、前
記一般式で表される構造単位に対して、例えば、1〜5
当量、好ましくは1.2〜3当量程度使用される。反応
は通常反応に悪影響を及ぼさない溶媒中で行なわれる。
このような反応溶媒としては、前記一般式で表される構
造単位を有するポリマーと有機アルカリ金属との反応で
使用できるのと同様の溶媒が例示される。反応は、適宜
の温度、例えば、−45〜80℃、好ましくは−30〜
50℃程度で行なうことができ、通常、30分〜24時
間程度で終了する。The silane compound having a halogen atom is, for example, 1 to 5 with respect to the structural unit represented by the above general formula.
The equivalent is used, preferably about 1.2 to 3 equivalents. The reaction is usually performed in a solvent that does not adversely influence the reaction.
As such a reaction solvent, the same solvent as that which can be used in the reaction between the polymer having the structural unit represented by the above general formula and the organic alkali metal is exemplified. The reaction is carried out at an appropriate temperature, for example, −45 to 80 ° C., preferably −30 to 30 ° C.
It can be performed at about 50 ° C., and is usually completed in about 30 minutes to 24 hours.
【0031】このようにして前記ポリマーとシラン化合
物とを反応させると、メチン部位にラジカルが効率よく
生成すると共に、生成したラジカルが安定化する。この
ことは、反応により生成したシランラジカルが極めて不
安定であり迅速に再結合して安定なジシランが生成し、
メチン部位のラジカルに悪影響を及ぼさないためと推測
される。By thus reacting the polymer with the silane compound, radicals are efficiently generated at the methine site and the generated radicals are stabilized. This means that the silane radicals produced by the reaction are extremely unstable and recombine rapidly to produce stable disilane,
It is presumed that this does not adversely affect the radicals at the methine site.
【0032】なお、前記ポリマーに含まれる4量体以下
の低分子化合物は除去するのが好ましい。低分子化合物
の除去は、適宜の段階、例えば、縮合反応、アルカリ金
属の置換反応やシラン化合物との反応の後行なってもよ
い。4量体以下の低分子化合物を除去することにより、
ラジカルの消失を抑制でき、ラジカルを長期に亘り安定
化できる。低分子化合物の除去は、慣用の方法、例え
ば、溶剤分別法、吸着法、モレキュラーシーブ、液体ク
ロマトグラフィー、ゲル濾過クロマトグラフィー、カラ
ムクロマトグラフィーなどに従って行なうことができ
る。It is preferable to remove tetramer or lower low-molecular compounds contained in the polymer. The removal of the low molecular weight compound may be carried out at an appropriate stage, for example, a condensation reaction, an alkali metal substitution reaction or a reaction with a silane compound. By removing low molecular weight compounds of tetramer or less,
It is possible to suppress the disappearance of radicals and stabilize the radicals for a long period of time. The low molecular weight compound can be removed by a conventional method, for example, solvent fractionation method, adsorption method, molecular sieve, liquid chromatography, gel filtration chromatography, column chromatography and the like.
【0033】溶媒分別法で使用される良溶媒及び貧溶媒
は、ポリマーの溶解性に応じて選択できる。良溶媒とし
ては、例えば、ジクロロメタン、クロロホルムなどのハ
ロゲン化炭化水素類、テトラヒドロフランなどのエーテ
ル類、アセトンなどのケトン類などが例示される。ま
た、貧溶媒としては、例えば、ヘキサン、オクタンなど
の脂肪族炭化水素類、シクロヘキサンなどの脂環族炭化
水素類、メタノール、エタノール、プロパノール、イソ
プロパノール、シクロヘキシルアルコールなどのアルコ
ール類やこれらの混合溶媒が例示される。The good solvent and poor solvent used in the solvent fractionation method can be selected according to the solubility of the polymer. Examples of the good solvent include halogenated hydrocarbons such as dichloromethane and chloroform, ethers such as tetrahydrofuran, and ketones such as acetone. Examples of the poor solvent include aliphatic hydrocarbons such as hexane and octane, alicyclic hydrocarbons such as cyclohexane, alcohols such as methanol, ethanol, propanol, isopropanol and cyclohexyl alcohol, and mixed solvents thereof. It is illustrated.
【0034】吸着法で使用される吸着剤としては、例え
ば、シリカゲル、粘土、アルミナ、活性炭、ゼオライ
ト、合成ゼオライトなどが例示される。また、モレキュ
ラーシーブとしては、低分子化合物の除去に適した細孔
径を有するゼオライトや合成ゼオライトが例示できる。Examples of the adsorbent used in the adsorption method include silica gel, clay, alumina, activated carbon, zeolite, and synthetic zeolite. Examples of the molecular sieve include zeolite and synthetic zeolite having a pore size suitable for removing low molecular weight compounds.
【0035】カラムクロマトグラフィーによる低分子化
合物の除去は、慣用の方法、例えば、生成物の有機溶媒
溶液を、吸着剤などを充填したカラムに通じて溶出させ
る方法;カラムに充填した吸着剤などに生成物を担持さ
せた後、貧溶媒で低分子量成分を溶出し、次いで良溶媒
で高分子量成分を溶出させる方法などにより行なうこと
ができる。Removal of low molecular weight compounds by column chromatography is carried out by a conventional method, for example, a method of eluting an organic solvent solution of the product through a column packed with an adsorbent or the like; After supporting the product, the low molecular weight component is eluted with a poor solvent, and then the high molecular weight component is eluted with a good solvent.
【0036】これらの除去方法のうち、カラムクロマト
グラフィーが好ましい。Of these removal methods, column chromatography is preferred.
【0037】有機強磁性体は、熱可塑性又は熱硬化性を
示すので、成形品、フィルムや繊維などに容易に成形加
工することができると共に、有機溶媒溶液として使用す
ることにより、容易に薄膜を形成できる。また、磁場を
作用させた状態で成形加工すると、磁性が大きくなる。
なお、有機強磁性体は、鉄、コバルト、ニッケルなどの
金属と複合化していてもよい。Since the organic ferromagnet exhibits thermoplasticity or thermosetting property, it can be easily molded into a molded product, film or fiber, and when used as an organic solvent solution, a thin film can be easily formed. Can be formed. Further, when the molding process is performed in the state where the magnetic field is applied, the magnetism becomes large.
The organic ferromagnet may be compounded with a metal such as iron, cobalt or nickel.
【0038】有機強磁性体のラジカルは、少なくともメ
チン炭素部位に存在すればよく、前記一般式で表される
構造単位のうち共鳴構造を採りうる部位がラジカル化し
ていてもよい。メチン炭素部位や共鳴構造を採りうる部
位にラジカルが生成しても、トリアリールメタン構造を
有する有機強磁性体では、ラジカルは安定に存在する。
従って、安定なラジカルに起因して、磁性が長期に亘り
発現する。The radical of the organic ferromagnetic substance has only to be present in at least the methine carbon site, and the site of the structural unit represented by the above general formula that can have a resonance structure may be radicalized. Even if a radical is generated at a methine carbon site or a site capable of adopting a resonance structure, the radical is stably present in the organic ferromagnet having a triarylmethane structure.
Therefore, magnetism is developed for a long period of time due to the stable radicals.
【0039】有機強磁性体は、磁性を発現させる上で必
要な範囲で適宜のラジカル濃度を有していればよく、ラ
ジカル濃度は、通常、1017/g以上、好ましくは10
18/g以上である。有機強磁性体のラジカルはESRで
確認できる。It suffices for the organic ferromagnet to have an appropriate radical concentration within a range necessary for exhibiting magnetism, and the radical concentration is usually 10 17 / g or more, preferably 10 17 / g or more.
18 / g or more. The radicals of the organic ferromagnet can be confirmed by ESR.
【0040】有機強磁性体の磁性は、次のようにして確
認することができる。簡便な方法としては、有機強磁性
体を粉砕し、水を注入したシャーレの下部に磁石を配す
ると共に、水面上に樹脂粉末を浮べ、放置する方法が挙
げられる。この方法では、水面上の樹脂粉末が、磁石の
うち磁束密度の大きな部位に移動し、磁石の周囲に集合
する。また、他の方法としては、磁化特性測定機を用い
て、有機強磁性体の磁気特性を測定できる。The magnetism of the organic ferromagnetic material can be confirmed as follows. As a simple method, there is a method in which an organic ferromagnetic material is crushed, a magnet is arranged under a petri dish into which water is injected, and a resin powder is floated on the water surface and allowed to stand. In this method, the resin powder on the water surface moves to a portion of the magnet having a large magnetic flux density and gathers around the magnet. As another method, the magnetic characteristic of the organic ferromagnet can be measured using a magnetization characteristic measuring device.
【0041】[0041]
【発明の効果】本発明の方法では、メチン炭素部位のア
ルカリ金属をシラン化合物により脱離させるので、ラジ
カル濃度が高く、強磁性を発現する有機強磁性体を容易
かつ再現性よく製造できる。According to the method of the present invention, since the alkali metal at the methine carbon site is eliminated by the silane compound, an organic ferromagnet having a high radical concentration and exhibiting ferromagnetism can be easily and reproducibly produced.
【0042】[0042]
【実施例】以下に、実施例に基づいて本発明をより詳細
に説明する。EXAMPLES The present invention will be described in more detail based on the following examples.
【0043】実施例1 m−ジメトキシベンゼン1モルとベンズアルデヒド1.
25とを混合し、これらの総量に対して5重量%のp−
トルエンスルホン酸を添加し、窒素雰囲気中、温度12
0℃で1時間撹拌し、脱水縮合した。得られたポリマー
をジクロロメタンに溶解し、濾過して不溶分を除去した
後、濾液を20倍容量のメタノールに注入し、沈澱物を
回収した。回収したポリマーをベンゼンに溶解し、シリ
カゲル(merk 60 )に担持させ、メタノールで十分洗浄
した後、良溶媒であるベンゼンでポリマーを溶出させ、
低分子量物を除去した。得られたトリアリールメタン構
造を有するポリマーの分子量をゲルパーミエーションク
ロマトグラフィー(溶媒:テトラヒドロフラン)により
測定したところ、重合度約50であった。Example 1 1 mol of m-dimethoxybenzene and 1.
25 and mixed with 5% by weight of p-
Toluenesulfonic acid was added, and the temperature was set to 12 in a nitrogen atmosphere.
The mixture was stirred at 0 ° C. for 1 hour and dehydrated and condensed. The obtained polymer was dissolved in dichloromethane and filtered to remove insoluble matter, and then the filtrate was poured into 20 times volume of methanol to collect a precipitate. The recovered polymer is dissolved in benzene, supported on silica gel (merk 60), washed thoroughly with methanol, and then eluted with benzene, which is a good solvent,
Low molecular weight material was removed. When the molecular weight of the obtained polymer having a triarylmethane structure was measured by gel permeation chromatography (solvent: tetrahydrofuran), the degree of polymerization was about 50.
【0044】22.6gのポリマーをテトラヒドロフラ
ン1Lに溶解し、n−ブチルリチウム0.2モルを添加
した。混合液を−20℃で1時間時間撹拌した後、1時
間かけて室温迄昇温し、前駆体ポリマーを生成させ、前
駆体ポリマーを含むテトラヒドロフラン溶液にクロロト
リフェニルシラン0.2モルを添加し、−10℃で反応
させた。反応溶液を20倍容量のジエチルエーテルに滴
下し、生成した沈澱物を濾取し乾燥させ、有機強磁性体
を得た。22.6 g of the polymer was dissolved in 1 L of tetrahydrofuran, and 0.2 mol of n-butyllithium was added. The mixture was stirred at -20 ° C for 1 hour, then heated to room temperature over 1 hour to form a precursor polymer, and 0.2 mol of chlorotriphenylsilane was added to a tetrahydrofuran solution containing the precursor polymer. , -10 degreeC was made to react. The reaction solution was added dropwise to 20 times volume of diethyl ether, and the formed precipitate was collected by filtration and dried to obtain an organic ferromagnetic material.
【0045】実施例2 クロロトリフェニルシランに代えて、クロロジメチルフ
ェニルシラン0.2モルを用いる以外、実施例1と同様
にして、有機強磁性体を得た。Example 2 An organic ferromagnet was obtained in the same manner as in Example 1 except that 0.2 mol of chlorodimethylphenylsilane was used instead of chlorotriphenylsilane.
【0046】実施例3 クロロトリフェニルシランに代えて、クロロトリメチル
シラン0.2モルを用いる以外、実施例1と同様にし
て、有機強磁性体を得た。Example 3 An organic ferromagnetic material was obtained in the same manner as in Example 1 except that 0.2 mol of chlorotrimethylsilane was used instead of chlorotriphenylsilane.
【0047】比較例 実施例1で得られた前駆体ポリマーを含むテトラヒドロ
フラン溶液にヨウ素0.2モルを添加し、−40℃で反
応させる以外、実施例1と同様にして、有機強磁性体を
得た。なお、反応溶液はカチオンの存在を示す緑色とな
った。Comparative Example An organic ferromagnet was prepared in the same manner as in Example 1 except that 0.2 mol of iodine was added to the tetrahydrofuran solution containing the precursor polymer obtained in Example 1 and the reaction was carried out at -40 ° C. Obtained. The reaction solution turned green, which indicates the presence of cations.
【0048】実施例1〜3及び比較例で得られた有機強
磁性体のスピン濃度をESRにより測定したところ、表
に示す結果を得た。The spin concentrations of the organic ferromagnets obtained in Examples 1 to 3 and Comparative Example were measured by ESR, and the results shown in the table were obtained.
【0049】[0049]
【表1】 表より、シラン化合物との反応により、有機強磁性体の
ラジカル濃度が増大する。[Table 1] From the table, the reaction with the silane compound increases the radical concentration of the organic ferromagnetic material.
Claims (3)
炭素にアルカリ金属が置換したポリマーと、ハロゲン原
子を有するシラン化合物とを反応させる有機強磁性体の
製造方法。1. A method for producing an organic ferromagnetic material, which comprises reacting a polymer having a triarylmethane structure, in which a methine carbon is substituted with an alkali metal, with a silane compound having a halogen atom.
記載の有機強磁性体の製造方法。2. The alkali metal is lithium.
A method for producing the described organic ferromagnetic material.
項1記載の有機強磁性体の製造方法。3. The method for producing an organic ferromagnetic material according to claim 1, wherein the silane compound has a phenyl group.
Priority Applications (1)
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JP3244487A JPH0559142A (en) | 1991-08-28 | 1991-08-28 | Production of organic ferromagnetic substance |
Applications Claiming Priority (1)
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JP3244487A JPH0559142A (en) | 1991-08-28 | 1991-08-28 | Production of organic ferromagnetic substance |
Publications (1)
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JPH0559142A true JPH0559142A (en) | 1993-03-09 |
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JP3244487A Pending JPH0559142A (en) | 1991-08-28 | 1991-08-28 | Production of organic ferromagnetic substance |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7444467B2 (en) | 1993-06-30 | 2008-10-28 | Hitachi, Ltd. | Storage system having a semiconductor memory device which stores data and parity data permanently |
-
1991
- 1991-08-28 JP JP3244487A patent/JPH0559142A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7444467B2 (en) | 1993-06-30 | 2008-10-28 | Hitachi, Ltd. | Storage system having a semiconductor memory device which stores data and parity data permanently |
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