JPH0557656B2 - - Google Patents
Info
- Publication number
- JPH0557656B2 JPH0557656B2 JP62012085A JP1208587A JPH0557656B2 JP H0557656 B2 JPH0557656 B2 JP H0557656B2 JP 62012085 A JP62012085 A JP 62012085A JP 1208587 A JP1208587 A JP 1208587A JP H0557656 B2 JPH0557656 B2 JP H0557656B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- diffraction grating
- optical recording
- pattern
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 29
- 229920002120 photoresistant polymer Polymers 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 17
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 238000000748 compression moulding Methods 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
(技術分野)
本発明は読み出し専用の光学的記録媒体の製造
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a method of manufacturing a read-only optical recording medium.
(従来技術)
光学的記録は磁気的記録と比較して記録媒体と
再生ヘツドが非接触であり、且つ高密度な記録が
可能であるなどの利点がある。この光学的記録媒
体としては読みだし専用のものと追加書き込み可
能なもの、消去再書き込み可能なものが知られて
おり、本発明にかかる読みだし専用の光学的記録
媒体としてはまず既に実用化されたコンパクトデ
イスク(CD)や光学式のビデオデイスク等が挙
げられる。これらの光学的記録媒体で採用されて
いる方式は媒体中に形成された凹凸構造に情報が
記録され、情報の記録密度を挙げるため記録ピツ
ト(凹部又は凸部の最小単位)は1μm前後の大
きさにし、かつレーザ等の光源を用いて再生光を
該ピツトと同程度の大きさにし、かつレーザ等の
光源を用いて再生光を該ピツトと同程度の大きさ
に絞つて情報を読み出すことが行われているが、
読みだし光のビームが微少なことは再生の為にオ
ートフオーカス、オートトラツキングのための技
術、更に高価なレーザ光線を使わねばならないと
いう問題が生じる。(Prior Art) Optical recording has advantages over magnetic recording in that there is no contact between the recording medium and the reproducing head, and high-density recording is possible. As this optical recording medium, there are known read-only ones, additionally writable ones, and erasable/rewritable ones, and the read-only optical recording medium according to the present invention has already been put into practical use. Examples include compact discs (CDs) and optical video discs. The method used in these optical recording media is that information is recorded on the uneven structure formed in the medium, and in order to increase the recording density of information, the recording pits (the smallest unit of recesses or protrusions) are approximately 1 μm in size. and using a light source such as a laser to make the reproduction light about the same size as the pit, and using a light source such as a laser to narrow the reproduction light to a size about the same as the pit to read information. is being carried out, but
The fact that the readout light beam is minute poses a problem in that autofocusing, autotracking techniques, and more expensive laser beams must be used for reproduction.
一方、他の方式の光学的記録媒体として光学的
に高い反射率を有する部分と低い部分とをそれぞ
れ別の材料によつて構成し、この濃淡パターンを
形成しデジタル情報を記録する光学的記録媒体が
知られている。この方式による濃淡パターンの形
成方法は例えば特開昭60−66346号公報に開示さ
れているように、基板上に光学的低反射層と光学
的高反射層をこの順に積層し、表面にフオトレジ
ストを塗布し、そこへ微細な濃淡パターンをもつ
マスクを介して露光し、その後フオトレジストを
現像してレジストパターンを形成させ、しかる後
レジストパターンを利用してパターン状にエツチ
ングを行つて光学的高反射層を除去させ光学的低
反射層を露出せしめることにより行つている。こ
の方式は高価なレーザ光線を使用しなくてもよい
が、上述の様に製造工程の数が多く、各工程も容
易に行えるものではない。 On the other hand, as an optical recording medium of another type, an optical recording medium in which a portion having a high optical reflectance and a portion having a low optical reflectance are made of different materials, forming a shading pattern and recording digital information. It has been known. A method for forming a light and shade pattern using this method is, for example, as disclosed in Japanese Patent Application Laid-Open No. 60-66346, in which an optical low reflection layer and an optical high reflection layer are laminated in this order on a substrate, and a photoresist is coated on the surface. The photoresist is coated and exposed through a mask with a fine density pattern, and then the photoresist is developed to form a resist pattern.The resist pattern is then etched in a pattern to create an optical height. This is done by removing the reflective layer and exposing the optically low reflective layer. Although this method does not require the use of expensive laser beams, it requires a large number of manufacturing steps as described above, and each step is not easy to perform.
レーザ光線を使用しない別方式として情報の最
小単位である記録ピツトを回折格子で構成する光
学的記録媒体が考えられるが、数十μmオーダー
の回折格子部と平滑部を選択し、回折格子部に回
折格子を形成させるのは容易なことではない。 Another method that does not use laser beams is an optical recording medium in which the recording pit, which is the smallest unit of information, is composed of a diffraction grating. Forming a diffraction grating is not easy.
(発明の目的)
本発明は上記従来技術の問題点に鑑みなされた
ものであり、読み取り用の高価なレーザ光線を使
用せずに、しかも簡便な方法により大量複製を行
うことができる読み出し専用の光学的記録媒体の
製造方法を提供することにある。(Object of the Invention) The present invention has been made in view of the problems of the prior art described above, and is a read-only system that allows mass duplication to be carried out by a simple method without using an expensive laser beam for reading. An object of the present invention is to provide a method for manufacturing an optical recording medium.
(発明の概要)
本発明は基材上にフオトレジストを塗布し、形
成されたフオトレジスト層に微細な濃淡パターン
状に情報が記録されているマスクを用いて露光を
行ない、次いでレーザ光線を用いてホログラフイ
ツクな露光を行ない、その後フオトレジストを現
像させる。得られた記録パターンからスタンパを
起こし、このスタンパにより微細なパターン状に
回折格子が設けられた光学的記録媒体を複製させ
る光学的記録媒体の製造方法である。(Summary of the Invention) The present invention involves coating a photoresist on a substrate, exposing the formed photoresist layer to light using a mask in which information is recorded in a fine pattern of shading, and then using a laser beam to The photoresist is then developed. This is a method for manufacturing an optical recording medium, in which a stamper is raised from the obtained recording pattern, and an optical recording medium having a fine pattern of diffraction gratings is reproduced using the stamper.
(発明の詳述) 以下、本発明を図面に基づき詳細に説明する。(Detailed description of the invention) Hereinafter, the present invention will be explained in detail based on the drawings.
第1図から第5図までは記録パターンスタンパ
母型製造の段階を順に示したもので、第1図は光
学記録材料1の構成を説明するもので基材2上に
フオトレジスト層3が積層されている。フオトレ
ジストはポジ型が使用可能であり、塗布がむらな
く容易に行なえ、しかも高解像力で露光の際の微
細な情報記録パターンを充分に解像しうるものを
選び使用する。このようなフオトレジストの例と
しては、Shpley社製のAZ−1350、東京応化(株)社
製のOFPR−2、OFPR−5000などその他多数挙
げられる。基材2は用途に適した特性、例えば表
面の平滑性、耐性、などを有し、後工程、フオト
レジストの現像やスタンパ成形工程において劣化
や変形などの影響を受けないものを選び使用す
る。 1 to 5 show the steps of manufacturing a recording pattern stamper matrix in order, and FIG. 1 explains the structure of an optical recording material 1, in which a photoresist layer 3 is laminated on a base material 2. has been done. A positive type photoresist can be used, and a photoresist is selected and used that can be applied evenly and easily, and has a high resolution that can sufficiently resolve fine information recording patterns during exposure. Examples of such photoresists include AZ-1350 manufactured by Shpley, OFPR-2 and OFPR-5000 manufactured by Tokyo Ohka Co., Ltd., and many others. The base material 2 is selected to have characteristics suitable for the intended use, such as surface smoothness and durability, and is not affected by deterioration or deformation during post-processes such as photoresist development and stamper molding processes.
微細な濃淡パターン状に情報が記録されている
マスク4を介してフオトレジスト層3を露光させ
(第2図)、次いでレーザ露光装置を用いてフオト
レジスト層3にホログラフイツクな露光を行ない
回折格子の潜像を形成させる(第3図)。使用す
るレーザ光源としてはアルゴンレーザ(458n
m)、ヘリウム−カドミニウムレーザ(442nm)、
などが挙げられる。単位長さ当りの回折格子の溝
数はレーザの波長とレーザ露光装置の設定条件を
定めることにより任意に制御することができる。
さらに溝の形状が鋸歯状化された回折格子(ブレ
ーズド型回折格子)もレーザ露光装置の設定条件
により形成することができる。またレーザ光によ
り直接回折格子を形成するため精度の高い回折格
子が得られる。 The photoresist layer 3 is exposed to light through a mask 4 on which information is recorded in a fine pattern of shading (Fig. 2), and then the photoresist layer 3 is holographically exposed using a laser exposure device to form a diffraction grating. A latent image is formed (Fig. 3). The laser light source used is an argon laser (458n
m), helium-cadmium laser (442nm),
Examples include. The number of grooves of the diffraction grating per unit length can be arbitrarily controlled by determining the wavelength of the laser and the setting conditions of the laser exposure device.
Furthermore, a diffraction grating in which the grooves are serrated (a blazed diffraction grating) can also be formed depending on the setting conditions of the laser exposure apparatus. Furthermore, since the diffraction grating is directly formed using laser light, a highly accurate diffraction grating can be obtained.
その後、まずフオトレジストを現像し、回折格
子が形成されたレジストパターンを形成させ(第
4図)、次にフオトレジスト層3及び基材2の表
面に金属層5を形成させる(第5図)。金属層5
は後工程の第4図の形態(母型)のスタンパを起
こす技術方法(例えば電鋳法)を適用する際に不
都合でない金属を選び、それを真空蒸着又はスパ
ツタリングを行なうことで形成される。それがさ
らに光学的に高い反射率を有する金属の場合に
は、この状態に読み出し光を照射すると再生も可
能となり記録状態の確認を行なうことができる。
金属層5の例としてはAu、Ag、Cr、Cuなどが
挙げられる。電鋳法などの技術により得られた母
型からスタンパを起こし、そして得られたスタン
パ6により光学的記録媒体の大量複製を行なう
(第6図)。複製方法としては射出成形法、圧縮成
形法、紫外線硬化樹脂を使つた方法などが挙げら
れるが、複製品が良質で効率よく製造できる方法
を選んでから行なう。複製された基材7の表面に
は光学的に高い反射率を有する金属を選び、真空
蒸着又はスパツタリングにより金属層8を形成さ
せ、その上部には光学的に透明な材料9で保護層
を形成させる(第7図)。この場合読み取り光は
材料9の側から照射するが、逆に基材7を光学的
に透明な性質をも備えた材料を使い基材7の側か
ら読み出し光を照射する方式も可能である。ま
た、その表面に光学的に高い反射率を有する金属
薄膜を設けた熱可塑性樹脂にスタンパ6で圧縮成
形を行ない光学的記録情報を転写させる方法も可
能である。このようにして得られた光学的記録媒
体において、回折格子の形状が正弦波形でその深
さが0.16μmの場合、He−Neレーザー(632.8n
m)を入射角0°で照射した時の回折効率は33%で
あり、反射率は平滑部100に対し回折格子部3
4となり約60%のコントラストが確認される。読
み取り光は前記レーザー光に限定されるものでは
なく、例えば発光ダイオード等、特別な光源を選
ばずとも読み取りを可能とするものを提供するも
のである。 After that, first, the photoresist is developed to form a resist pattern in which a diffraction grating is formed (FIG. 4), and then a metal layer 5 is formed on the surfaces of the photoresist layer 3 and the base material 2 (FIG. 5). . metal layer 5
is formed by selecting a metal that is not inconvenient when applying a technical method (for example, electroforming) to form a stamper in the form (matrix mold) shown in FIG. If the material is a metal that has a higher optical reflectance, irradiating read light to this state makes it possible to reproduce and confirm the recorded state.
Examples of the metal layer 5 include Au, Ag, Cr, Cu, and the like. A stamper is formed from a master mold obtained by a technique such as electroforming, and the obtained stamper 6 is used to perform mass duplication of optical recording media (FIG. 6). Replication methods include injection molding, compression molding, and methods using ultraviolet curable resin, but a method that can produce high-quality and efficient replicas should be selected before proceeding. A metal having high optical reflectance is selected on the surface of the replicated base material 7, a metal layer 8 is formed by vacuum deposition or sputtering, and a protective layer is formed on top of the metal layer 8 using an optically transparent material 9. (Figure 7). In this case, the reading light is irradiated from the side of the material 9, but it is also possible to irradiate the reading light from the side of the substrate 7 using a material that also has optically transparent properties. It is also possible to perform compression molding using a stamper 6 on a thermoplastic resin having a metal thin film having a high optical reflectance on its surface to transfer optically recorded information. In the optical recording medium obtained in this way, when the shape of the diffraction grating is a sinusoidal waveform and its depth is 0.16 μm, a He-Ne laser (632.8n
m) is irradiated at an incident angle of 0°, the diffraction efficiency is 33%, and the reflectance is 33% for the diffraction grating section with respect to the smooth section 100.
4, and approximately 60% contrast is confirmed. The reading light is not limited to the above-mentioned laser light, but it is possible to use a light emitting diode or the like which enables reading without selecting a special light source.
この光学的記録媒体の製造方法は、格子部と平
滑部を選択的に形成が行なえ、しかも大量複製も
効率よく行なうことができる。 This method of manufacturing an optical recording medium allows selective formation of grating portions and smooth portions, and also enables efficient mass duplication.
(実施例)
以下本発明を実施例により説明するが、本発明
は実施例だけに限定されるものではない。(Examples) The present invention will be described below with reference to Examples, but the present invention is not limited to the Examples.
縦6〜7cm、横5〜6cmの表面が平滑なガラス
板上にフオトレジスト(AZ−1350)をスピナー
塗布し、乾燥後(90℃)、微細なパターンを有す
るマスクを介して露光を行ない、次いでArレー
ザー(458nm)を用いてホログラフイツクな露
光により回折格子の潜像を形成させ、その後フオ
トレジストを現像し、レジストパターンを形成
し、しかる後得られたレジストパターン上に金蒸
着を行ない導電性薄膜を形成した後これをスルフ
アミン酸ニツケル浴を用いたニツケル電鋳でニツ
ケルスタンパを作成し、厚さ0.5mmのポリ塩化ビ
ニルシート上にニツケルスタンパの形状を圧縮成
形で転写させ、得られた転写表面にアルミニウム
蒸着を行ない、回折格子の設けられている部分と
設けられていない部分、つまり平滑な部分とを顕
微鏡で観察したところ両者がはつきりと区別さ
れ、また発光ダイオードを読み取り光として
CCDラインセンサーで読み取つたところ実用に
充分なS/N比が得られた。 Photoresist (AZ-1350) is coated with a spinner on a glass plate with a smooth surface measuring 6 to 7 cm in length and 5 to 6 cm in width, and after drying (90°C), it is exposed to light through a mask with a fine pattern. Next, a latent image of a diffraction grating is formed by holographic exposure using an Ar laser (458 nm), the photoresist is developed to form a resist pattern, and then gold is deposited on the resulting resist pattern to form a conductive pattern. After forming a thin film, a nickel stamper was created using nickel electroforming using a nickel sulfamic acid bath, and the shape of the nickel stamper was transferred onto a 0.5 mm thick polyvinyl chloride sheet by compression molding. When aluminum was vapor-deposited on the transfer surface and the part with the diffraction grating and the part without it (in other words, the smooth part) were observed under a microscope, the two were clearly distinguishable, and the light emitting diode was used as the reading light.
When read with a CCD line sensor, a S/N ratio sufficient for practical use was obtained.
(本発明の効果)
本発明により回折格子部と平滑部を選択的に形
成が行なえ、しかもレーザ光学装置の組み換え方
により精度の高い種々の回折格子の形成も可能と
なり、しかも効率よく光学的記録媒体の大量複製
も行なうことができる。(Effects of the present invention) According to the present invention, it is possible to selectively form the diffraction grating portion and the smooth portion, and it is also possible to form various highly accurate diffraction gratings by recombining the laser optical device. Mass duplication of media can also be performed.
第1図から第7図は本発明の各工程に於ける断
面図の拡大図である。
1:光学的記録材料、2:基材、3:フオトレ
ジスト層、4:マスク、5:金属層、6:スタン
パ、7:複製された基材、8:金属層、9:光学
的に透明な材料。
FIGS. 1 to 7 are enlarged cross-sectional views at each step of the present invention. 1: Optical recording material, 2: Substrate, 3: Photoresist layer, 4: Mask, 5: Metal layer, 6: Stamper, 7: Replicated substrate, 8: Metal layer, 9: Optically transparent material.
Claims (1)
ーンが形成され該凹凸パターンの凹部又は凸部の
少なくとも一方に回折格子が形成されている光学
的記録媒体の製造方法に於て、基材上にフオトレ
ジストを塗布し、形成されたフオトレジスト層に
微細な濃淡パターン状に情報が記録されたマスク
を用いて露光を行い、次いでレーザ光線を用いて
ホログラフイツクな露光をさせ回折格子の潜像を
形成し、その後フオトレジストを現像し、得られ
た記録パターンのスタンパを起こし、該スタンパ
により微細なパターン状に回折格子が設けられた
光学的記録媒体を複製することを特徴とする光学
的記録媒体の製造方法。1. In a method for manufacturing an optical recording medium in which a concavo-convex pattern is formed of a material having an optically high reflectance and a diffraction grating is formed in at least one of the concave portions or convex portions of the concave-convex pattern, A photoresist is applied, and the formed photoresist layer is exposed to light using a mask in which information is recorded in a fine pattern of shading, and then holographic exposure is performed using a laser beam to form a latent image of the diffraction grating. An optical recording medium characterized in that an optical recording medium in which a diffraction grating is provided in a fine pattern is reproduced by forming a stamper of the obtained recording pattern by developing the photoresist, and using the stamper. manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62012085A JPS63181142A (en) | 1987-01-21 | 1987-01-21 | Production of optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62012085A JPS63181142A (en) | 1987-01-21 | 1987-01-21 | Production of optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63181142A JPS63181142A (en) | 1988-07-26 |
JPH0557656B2 true JPH0557656B2 (en) | 1993-08-24 |
Family
ID=11795744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62012085A Granted JPS63181142A (en) | 1987-01-21 | 1987-01-21 | Production of optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63181142A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0291833A (en) * | 1988-09-27 | 1990-03-30 | Toppan Printing Co Ltd | Optical recording medium and production thereof |
JP4495722B2 (en) * | 2003-04-22 | 2010-07-07 | オーファオデー キネグラム アーゲー | Microstructure creation method |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50102471A (en) * | 1974-01-16 | 1975-08-13 | ||
JPS53106550A (en) * | 1977-02-25 | 1978-09-16 | Rca Corp | Identification card device |
JPS5850073A (en) * | 1981-09-19 | 1983-03-24 | Anritsu Corp | Hologram card reader |
JPS5886503A (en) * | 1981-11-18 | 1983-05-24 | Dainippon Printing Co Ltd | Manufacture of patterned diffraction grating |
JPS58200275A (en) * | 1982-05-18 | 1983-11-21 | Dainippon Printing Co Ltd | Production for patterned fresnel hologram |
JPS6066346A (en) * | 1983-09-21 | 1985-04-16 | Dainippon Printing Co Ltd | Production of information recording body |
JPS60168279A (en) * | 1984-02-13 | 1985-08-31 | Sanyo Electric Co Ltd | Information detection system |
-
1987
- 1987-01-21 JP JP62012085A patent/JPS63181142A/en active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50102471A (en) * | 1974-01-16 | 1975-08-13 | ||
JPS53106550A (en) * | 1977-02-25 | 1978-09-16 | Rca Corp | Identification card device |
JPS5850073A (en) * | 1981-09-19 | 1983-03-24 | Anritsu Corp | Hologram card reader |
JPS5886503A (en) * | 1981-11-18 | 1983-05-24 | Dainippon Printing Co Ltd | Manufacture of patterned diffraction grating |
JPS58200275A (en) * | 1982-05-18 | 1983-11-21 | Dainippon Printing Co Ltd | Production for patterned fresnel hologram |
JPS6066346A (en) * | 1983-09-21 | 1985-04-16 | Dainippon Printing Co Ltd | Production of information recording body |
JPS60168279A (en) * | 1984-02-13 | 1985-08-31 | Sanyo Electric Co Ltd | Information detection system |
Also Published As
Publication number | Publication date |
---|---|
JPS63181142A (en) | 1988-07-26 |
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