JPH0555180A - Lift-off device for large-sized substrate and regulating method therefor - Google Patents

Abstract

(57) [Summary] [Objective] A lift-off device used for forming a thin film transistor on a panel that constitutes a liquid crystal display, electroluminescence, etc., and an object thereof is to provide a lift-off device capable of uniform lift-off processing and having high processing capability. And [Structure] A lift-off tank 32 in which a plurality of ultrasonic wave generators 31 are arranged at a predetermined interval at a bottom to store a stripping solution 33, and a stripping solution 33
A substrate holding jig 34 for horizontally holding the substrate 1 to be processed dipped in the substrate, and a substrate swinging mechanism 35 for swinging the substrate 1 to be processed in at least one of a vertical direction, a horizontal direction, and a depth direction, In addition, the lift-off tank 32 includes a sound pressure detection mechanism 4 that measures the sound pressure of ultrasonic waves in a plurality of regions and outputs a signal, and a sound pressure distribution display mechanism 5 that displays the sound pressure distribution in the lift-off tank 32. To be configured.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing facility for a panel which constitutes a liquid crystal display or electroluminescence, and more particularly to a lift-off device used for forming a driving thin film transistor on the panel.

In a thin film transistor (TFT) drive type liquid crystal display or electroluminescence, a large number of drive TFTs arranged in a matrix are formed on a large glass substrate, and defective products are mixed in these TFTs. If so, the dots at that portion are missing and display quality is degraded.

Therefore, even in a lift-off device used for forming a driving thin film transistor on a panel, there is a strong demand for development of a device which does not leave an unnecessary film such as a resist on a glass substrate. ..

[0004]

2. Description of the Related Art FIG. 5 is a diagram showing an outline of a manufacturing process of a TFT, and FIG. 6 is a perspective view showing a main part of a conventional lift-off device.

To manufacture a TFT, first, as shown in FIG. 5A, a gate electrode 11 made of Ti and a gate bus line 12 to which a plurality of gate electrodes 11 forming rows or columns are connected are formed on a glass substrate 1. , And plasma C as shown in Fig. 5 (b).
By VD, a gate insulating film 13 made of SiO ₂ and SiN, an operating semiconductor layer 14 made of a-Si, a protective layer 15 made of SiO ₂ , and an adhesion layer 16 made of a-Si are successively formed.

A resist mask occupies an area on the gate electrode 11 as shown in FIG. 5 (c) by applying a resist on the entire surface of the adhesion layer 16 made of a-Si and then exposing and developing from the back surface of the glass substrate 1. Form 17.

Next, as shown in FIG. 5D, the adhesion layer 16 and the protective layer 15 are etched by etching using the resist mask 17 as a mask.
Is patterned, and a contact layer 18 made of n ⁺ -a-Si and a Ti film 19 for forming an electrode are sequentially formed on the operating semiconductor layer 14, and then the glass substrate 1 is immersed in a stripping solution for lift-off. The resist mask 17 on the adhesion layer 16 is removed.

Further, dry etching is performed using a resist mask covering the entire element region, and then the resist mask is removed. As a result, the Ti film 19 is patterned as shown in FIG. 5 (e) to form the source electrode 20 and the drain electrode 21. Is formed, and the contact layer 18 and the operating semiconductor layer 14 are patterned to form the element-isolated TFT 2.

A conventional lift-off device 3 for removing a resist mask in the above-mentioned TFT manufacturing includes a lift-off tank 32 having a plurality of ultrasonic wave generators 31 arranged on a bottom surface at a predetermined interval, as shown in FIG. And lift-off tank 32
A predetermined amount of the stripping solution 33 stored in the ultrasonic wave generator 31 is vibrated by the ultrasonic wave generator 31.

The substrate to be processed 1 immersed in the stripping solution 33 is held horizontally by the substrate holding jig 34, and
The substrate swing mechanism 35 with the substrate holding jig 34 mounted thereon is reciprocated in the XYZ directions by a power source (not shown), so that the substrate 1 to be processed is vertically, horizontally, and depthwise in the stripping solution 33. The resist mask is shaken and the resist mask is removed.

[0011]

When the sound pressure of the ultrasonic waves for vibrating the stripping solution becomes non-uniform in the apparatus for lifting off a large substrate to be processed, all resist masks are removed in the region where the sound pressure is high. However, the resist mask and other films remain in the region where the sound pressure is small, and defective TFTs intervene in the completed panel, which causes deterioration of image display quality.

Therefore, in the conventional lift-off device, as a means for preventing the sound pressure of ultrasonic waves for vibrating the stripping solution from becoming non-uniform, it is proportional to the strength of the ultrasonic waves just above the ultrasonic generator. By utilizing the fact that the liquid surface of the stripping liquid rises, the liquid amount of the stripping liquid and the output level of the ultrasonic generator are adjusted so that the amount of rising of the liquid surface becomes almost uniform.

However, it is extremely difficult to visually detect the difference in the amount of protrusion of the liquid surface, the accuracy is low, and a long time is required for the adjustment. Moreover, since the sound pressure distribution depends on the amount of the stripping solution, it must be adjusted frequently according to the outflow of the stripping solution.

Further, in the conventional lift-off device, as the number of processed substrates increases, the stripping solution becomes turbid and its ability deteriorates. Therefore, after the processing of a predetermined number of substrates is finished, the processing is interrupted and the stripping solution is replaced with ultrasonic waves. There was a problem that the sound pressure had to be adjusted.

An object of the present invention is to provide a lift-off device which is capable of uniform lift-off processing and has a high processing capacity.

[0016]

FIG. 1 is a schematic view showing a lift-off device according to the present invention. Note that the same object is denoted by the same symbol throughout the drawings.

The above-mentioned problem is a lift-off tank 32 in which a plurality of ultrasonic wave generators 31 are arranged at predetermined intervals at the bottom and store a stripping solution 33.
And a substrate holding jig 34 for horizontally holding the substrate 1 to be processed immersed in the stripping solution 33, and a substrate swinging mechanism for swinging the substrate 1 to be processed in at least one of a vertical direction, a horizontal direction, and a depth direction.
A sound pressure detection mechanism 4 having 35 and measuring ultrasonic sound pressures in a plurality of regions in the lift-off tank 32 and outputting a signal.
And a lift-off device for large substrates according to the present invention, which comprises a sound pressure distribution display mechanism 5 for displaying the sound pressure distribution in the lift-off tank 32.

[0018]

In FIG. 1, a lift-off tank in which a plurality of ultrasonic wave generators are arranged at predetermined intervals in the bottom to store a stripping solution, and a substrate holding jig for horizontally holding a substrate to be processed immersed in the stripping solution , Has a substrate swing mechanism that swings the substrate to be processed in at least one of the vertical, horizontal, and depth directions, and measures the sound pressure of ultrasonic waves in a plurality of regions in the lift-off tank and outputs a signal. The large-scale substrate lift-off device of the present invention, which includes a sound pressure detection mechanism that performs the sound pressure distribution and a sound pressure distribution display mechanism that displays the sound pressure distribution in the lift-off tank, enables the sound pressure distribution of the ultrasonic waves in the lift-off tank to be reduced in a short time. It becomes possible to detect with high accuracy, and the adjustment time is greatly shortened. That is, it is possible to realize a lift-off device capable of performing uniform lift-off processing and having high processing capacity.

[0019]

Embodiments of the present invention will be described below with reference to the accompanying drawings. 2 is a schematic view showing an embodiment of the present invention, FIG. 3 is a side sectional view showing another embodiment of the present invention, and FIG. 4 is a side sectional view showing still another embodiment of the present invention.

A lift-off device according to the present invention for removing a resist mask in manufacturing a TFT is as shown in FIG.
The bottom surface is provided with a lift-off tank 32 in which a plurality of ultrasonic wave generators 31 are arranged at predetermined intervals, and a predetermined amount of stripping liquid 33 stored in the lift-off tank 32 is vibrated by the ultrasonic wave generator 31. ing.

The substrate 1 to be processed immersed in the stripping solution 33 is held horizontally by the substrate holding jig 34, and
The substrate swing mechanism 35 with the substrate holding jig 34 mounted thereon is reciprocated in the XYZ directions by a power source (not shown), so that the substrate 1 to be processed is vertically, horizontally, and depthwise in the stripping solution 33. The resist mask is shaken and the resist mask is removed.

Further, unlike the conventional apparatus, the lift-off device according to the present invention detects the sound pressure of ultrasonic waves in a plurality of regions in the lift-off tank 32 in addition to the lift-off tank 32 and outputs a signal. The mechanism 4 and the sound pressure distribution display mechanism 5 for displaying the sound pressure distribution in the lift-off tank 32 based on the output signal of the sound pressure detection mechanism 4 are provided.

The sound pressure detecting mechanism 4 has a plurality of sound pressure sensors 41 arranged at equal intervals and having their ends immersed in the peeling liquid 33, and a moving mechanism for holding the sound pressure sensors 41 and moving them in a direction orthogonal to the arrangement direction. 42 and a plurality of analyzers 43 that convert the output signal of the sound pressure sensor 41 into a voltage corresponding to the sound pressure.

The sound pressure distribution display mechanism 5 is connected to the control device 51 via the input / output board 52 for inputting the output signal of the analyzer 43 to the control device 51, and the moving mechanism 42 by the input / output board 52. A controller 53 for controlling and a display device 54 connected to the control device 51 for displaying the sound pressure distribution in the lift-off tank 32 are configured.

In the lift-off device, based on the sound pressure distribution displayed on the display device 54 of the sound pressure distribution display mechanism 5, the amount of the stripping liquid 33 stored in the lift-off tank 32 or the ultrasonic wave generator 31 is stored. By adjusting the output level and making the sound pressure distribution in the lift-off tank 32 uniform, uniform lift-off processing becomes possible.

Moreover, since the sound pressure distribution of ultrasonic waves in the region where the substrate 1 to be processed is immersed in the stripping solution 33 is directly quantitatively displayed, the stripping solution stored in the lift-off tank 32 is displayed.
The precision in adjusting the liquid amount of 33 or the output level of the ultrasonic generator 31 is enhanced, and the time required for the adjustment can be significantly shortened.

In the embodiment of the present invention shown in FIG. 2, the substrate swing mechanism 35 in the lift-off device is used as the moving mechanism 42, and a plurality of sounds arranged at equal intervals and having their tips immersed in the stripping solution 33 are used. The pressure sensor 41 is held by a substrate swinging mechanism 35 that mounts a substrate holding jig 34 via a holding metal fitting 44 instead of the moving mechanism 42.

The reciprocating movement of the substrate swinging mechanism 35 in the XYZ directions is performed based on a command from a controller (not shown), and a control signal of the substrate swinging mechanism 35 is transmitted via the input / output board 52. By inputting to the control device 51, the sound pressure distribution in the lift-off tank 32 can be detected by moving the plurality of sound pressure sensors 41 using the substrate swing mechanism 35.

Moreover, since the sound pressure sensor 41 moves simultaneously with the substrate 1 to be processed to directly and quantitatively detect the sound pressure distribution in the stripping liquid 33, the change in the sound pressure distribution is detected and corrected even during the lift-off process. Therefore, the time required for the adjustment can be further shortened, and at the same time, the processing capacity of the lift-off device can be further improved.

A lift-off tank in which a plurality of ultrasonic wave generators are thus arranged at a predetermined interval at the bottom to store the stripping solution, and a substrate holding jig for horizontally holding the substrate to be processed immersed in the stripping solution A substrate swing mechanism for swinging the substrate to be processed in at least one of a vertical direction, a horizontal direction, and a depth direction, and
A large-sized substrate of the present invention including a sound pressure detection mechanism that measures the sound pressure of ultrasonic waves in a plurality of regions in the lift-off tank and outputs a signal, and a sound pressure distribution display mechanism that displays the sound pressure distribution in the lift-off tank. The lift-off device can detect the sound pressure distribution of ultrasonic waves in the lift-off tank in a short time and with high accuracy, and the adjustment time can be greatly shortened. That is, it is possible to realize a lift-off device capable of performing uniform lift-off processing and having high processing capacity.

Further, in the conventional lift-off device which repeatedly performs the treatment with the stripping liquid stored in the lift-off tank, the stripping liquid becomes turbid and its capability is deteriorated as the number of substrates to be processed increases, and the sound pressure of ultrasonic waves is reduced. Even if the distribution is uniform, uniform lift-off processing becomes impossible. As a means for preventing the stripping solution from becoming turbid, there is a method in which the stripping solution is circulated through a filter and filtered. However, if the stripping solution is circulated during the lift-off process, a wave is generated on the surface of the solution and the output of the ultrasonic generator decreases.

In another embodiment of the present invention shown in FIG. 3, a lift-off tank 62 having a plurality of ultrasonic wave generators 31 arranged on the bottom surface at a predetermined interval, and separation in the lift-off tank 62 via a filter 63. A pump 64 for circulating the liquid 33 is provided, and a predetermined amount of the stripping liquid 33 stored in the lift-off tank 32 is an ultrasonic wave generator.
Excited by 31.

Then, after the substrate 1 to be processed held by the substrate holding jig 34 is immersed in the stripping solution 33 in order to eliminate waves during circulation of the stripping solution, for example, the thickness is about 5 mm and the mesh is about 5 mm × 5 mm. The wave-eliminating mesh plate 61 is immersed near the liquid surface of the peeling liquid 33. The decrease in output of the ultrasonic wave generator 31 caused by immersing the mesh plate 61 is negligibly small.

The substrate 1 to be processed immersed in the stripping solution 33 is held horizontally by the substrate holding jig 34, and
The substrate swing mechanism 35 with the substrate holding jig 34 mounted thereon is reciprocated in the XYZ directions by a power source (not shown), so that the substrate 1 to be processed is vertically, horizontally, and depthwise in the stripping solution 33. The resist mask is shaken and the resist mask is removed.

In this way, the wave-eliminating mesh plate 61 is immersed in the vicinity of the liquid surface of the stripping solution 33 stored in the lift-off tank 62, and the stripping solution 33 is not corrugated on the surface of the stripping solution 33 during the lift-off process. By circulating and filtering 33, the lift-off process is not interrupted, the throughput of the lift-off device is improved, and uniform lift-off process is possible.

In a further embodiment of the present invention shown in FIG. 4, a plurality of lift-off tanks 72 having a plurality of ultrasonic wave generators 31 arranged on the bottom surface at predetermined intervals, and a lift-off tank via a filter 63 are provided. A pump 64 for circulating the stripping solution 33 in the 72 and a plurality of valves 73 provided on the stripping solution inlet 71 side of each lift-off tank 72 are provided.

When the cloudy stripping solution 33 is filtered, the valve 73 provided on the stripping solution inlet 71 side of the lift-off tank 72 is opened, and the stripping solution 33 circulating through the filter 63 is transferred to the lift-off tank 72. By causing it to flow, the turbid stripping liquid 33 overflows from the upper edge of the lift-off tank 72 and is fed into the filter 63 again by the pump 64.

On the other hand, when performing the lift-off process, the valve 73 provided on the stripping liquid inlet 71 side of the lift-off tank 72 is closed, the flow of the stripping liquid 33 into the lift-off tank 72 is stopped, and the cock 74 is turned on. The liquid amount of the opening peeling liquid 33 is adjusted. Then, by driving the ultrasonic generator 31, ultrasonic waves are applied to the peeling liquid 33 in the lift-off tank 72.

As described above, a plurality of lift-off tanks 72 are provided.
While the lift-off process is being performed in each lift-off tank 72, the lift-off process can be eliminated by eliminating the interruption of the lift-off process by filtering the peeling liquid 33 in another lift-off tank 72 and adjusting the sound pressure distribution of ultrasonic waves. The processing capacity of the apparatus is improved and uniform lift-off processing is possible.

[0040]

As described above, according to the present invention, it is possible to provide a lift-off device capable of performing uniform lift-off processing and having high processing capacity.

[Brief description of drawings]

FIG. 1 is a schematic view showing a lift-off device according to the present invention.

FIG. 2 is a schematic view showing an embodiment of the present invention.

FIG. 3 is a side sectional view showing another embodiment of the present invention.

FIG. 4 is a side sectional view showing still another embodiment of the present invention.

FIG. 5 is a diagram showing an outline of a manufacturing process of a TFT.

FIG. 6 is a perspective view showing a main part of a conventional lift-off device.

[Explanation of symbols] 1 substrate to be processed 4 sound pressure detection mechanism 5 sound pressure distribution display mechanism 31 ultrasonic generator 32 lift-off tank 33 stripping liquid 34 substrate holding jig 35 substrate swinging mechanism 41 sound pressure sensor 42 moving mechanism 43 analyzer 44 Holding bracket 51 Control device 52 I / O board 53 Controller 54 Display device 61 Mesh plate 62 Lift-off tank 63 Filter 64 Pump 71 Stripping liquid inlet 72 Lift-off tank 73 Valve 74 Cock

 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Atsushi Hoshino 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Fujitsu Limited

Claims (5)

[Claims] 1. A lift-off tank (32) having a plurality of ultrasonic generators (31) arranged at predetermined intervals at a bottom thereof and storing a stripping solution (33).
A substrate holding jig (34) for horizontally holding the substrate to be processed (1) immersed in the stripping solution (33), and the substrate to be processed (1) vertically,
It has a substrate rocking mechanism (35) that rocks laterally or in at least one direction in the depth direction, and also measures the sound pressure of ultrasonic waves in a plurality of regions within the lift-off tank (32) and outputs a signal. Sound pressure detection mechanism (4)
A lift-off device for a large substrate comprising a sound pressure distribution display mechanism (5) for displaying a sound pressure distribution in the lift-off tank (32). 2. A plurality of sound pressure sensors (41), wherein the sound pressure detection mechanisms (4) according to claim 1 are arranged at equal intervals, and the tips are immersed in a stripping solution (33), and the sound pressure sensors (41). ), And a plurality of analyzers (43) that convert the output signal of the sound pressure sensor (41) into a voltage corresponding to the sound pressure (42). An input / output board (52) for the pressure distribution display mechanism (5) to input the output signal of the analyzer (43) to the control device (51),
A controller (53) connected to the control device (51) via the input / output board (52) to control the moving mechanism (42); and a lift-off tank (32) connected to the control device (51). A lift-off device for a large substrate, comprising a display device (54) for displaying a sound pressure distribution. 3. The lift-off device for a large substrate according to claim 1, based on the display content of the sound pressure distribution display mechanism (5),
The volume of the stripping liquid (33) stored in the lift-off tank (32) or the output level of the ultrasonic generator (31) is adjusted to make the sound pressure distribution in the lift-off tank (32) uniform. A method for adjusting a lift-off device, which is characterized by the above. 4. A lift-off tank (62) in which a plurality of ultrasonic wave generators (31) are arranged at predetermined intervals at a bottom to store a stripping solution (33).
And a wave-dissipating mesh plate (61) immersed in the stripping solution (33) after immersing the substrate (1) to be treated in the stripping solution (33)
And a pump (64) for circulating the stripping solution (33) in the lift-off tank (62) through a filter (63), and is configured to filter the stripping solution (33) during the lift-off process. A lift-off device for a large substrate, which is characterized in that 5. A plurality of lift-off tanks in which a plurality of ultrasonic wave generators (31) are arranged at predetermined intervals at the bottom and store a stripping solution (33).
(72), a pump (64) for circulating the stripping liquid (33) in the lift-off tank (72) through a filter (63), and a stripping liquid inlet (71) side of each lift-off tank (72) Each of the plurality of valves (73) is provided, and when the stripping solution (33) is filtered, the valve (73) is opened to allow the stripping solution (33) to flow into the lift-off tank (72). The peeling liquid (33) overflowing from the upper edge of the lift-off tank (72) is sent again to the filter (63) by the pump (64), and the valve (of the lift-off tank (72) for performing the lift-off process is performed. 73) is closed to remove the stripping solution.
A lift-off device for a large substrate, which is configured to stop the inflow of (33).