JPH0553636B2 - - Google Patents
Info
- Publication number
- JPH0553636B2 JPH0553636B2 JP59223849A JP22384984A JPH0553636B2 JP H0553636 B2 JPH0553636 B2 JP H0553636B2 JP 59223849 A JP59223849 A JP 59223849A JP 22384984 A JP22384984 A JP 22384984A JP H0553636 B2 JPH0553636 B2 JP H0553636B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- ethyl
- recording medium
- layer
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 9
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 8
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 34
- -1 n-octyl group Chemical group 0.000 description 31
- 239000011241 protective layer Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical class C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical class C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- MVVFUAACPKXXKJ-UHFFFAOYSA-N 4,5-dihydro-1,3-selenazole Chemical class C1CN=C[Se]1 MVVFUAACPKXXKJ-UHFFFAOYSA-N 0.000 description 2
- ZLLOWHFKKIOINR-UHFFFAOYSA-N 5-phenyl-1,3-thiazole Chemical compound S1C=NC=C1C1=CC=CC=C1 ZLLOWHFKKIOINR-UHFFFAOYSA-N 0.000 description 2
- HFDLDPJYCIEXJP-UHFFFAOYSA-N 6-methoxyquinoline Chemical compound N1=CC=CC2=CC(OC)=CC=C21 HFDLDPJYCIEXJP-UHFFFAOYSA-N 0.000 description 2
- LUYISICIYVKBTA-UHFFFAOYSA-N 6-methylquinoline Chemical compound N1=CC=CC2=CC(C)=CC=C21 LUYISICIYVKBTA-UHFFFAOYSA-N 0.000 description 2
- KDYVCOSVYOSHOL-UHFFFAOYSA-N 7-methylquinoline Chemical compound C1=CC=NC2=CC(C)=CC=C21 KDYVCOSVYOSHOL-UHFFFAOYSA-N 0.000 description 2
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical compound C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical class C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 2
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical class C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 2
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical class C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- SNHRXGLDPKKJKV-UHFFFAOYSA-N (4-methyl-5h-1,3-thiazol-4-yl)methanol Chemical compound OCC1(C)CSC=N1 SNHRXGLDPKKJKV-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- UUJOCRCAIOAPFK-UHFFFAOYSA-N 1,3-benzoselenazol-5-ol Chemical compound OC1=CC=C2[se]C=NC2=C1 UUJOCRCAIOAPFK-UHFFFAOYSA-N 0.000 description 1
- BREUOIWLJRZAFF-UHFFFAOYSA-N 1,3-benzothiazol-5-ol Chemical compound OC1=CC=C2SC=NC2=C1 BREUOIWLJRZAFF-UHFFFAOYSA-N 0.000 description 1
- ORIIXCOYEOIFSN-UHFFFAOYSA-N 1,3-benzothiazol-6-ol Chemical compound OC1=CC=C2N=CSC2=C1 ORIIXCOYEOIFSN-UHFFFAOYSA-N 0.000 description 1
- UPPYOQWUJKAFSG-UHFFFAOYSA-N 1,3-benzoxazol-5-ol Chemical compound OC1=CC=C2OC=NC2=C1 UPPYOQWUJKAFSG-UHFFFAOYSA-N 0.000 description 1
- SAHAKBXWZLDNAA-UHFFFAOYSA-N 1,3-benzoxazol-6-ol Chemical compound OC1=CC=C2N=COC2=C1 SAHAKBXWZLDNAA-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical class C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- SEKVBWUAFVMOOZ-UHFFFAOYSA-N 1-(5,6-dichloro-1h-benzimidazol-2-yl)ethanol Chemical compound ClC1=C(Cl)C=C2NC(C(O)C)=NC2=C1 SEKVBWUAFVMOOZ-UHFFFAOYSA-N 0.000 description 1
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 1
- LEHIFKNORUBLIE-UHFFFAOYSA-N 1-ethyl-5,6-difluorobenzimidazole Chemical compound FC1=C(F)C=C2N(CC)C=NC2=C1 LEHIFKNORUBLIE-UHFFFAOYSA-N 0.000 description 1
- GVRURIXNOTXYIW-UHFFFAOYSA-N 1-ethyl-5-(trifluoromethyl)benzimidazole Chemical compound FC(F)(F)C1=CC=C2N(CC)C=NC2=C1 GVRURIXNOTXYIW-UHFFFAOYSA-N 0.000 description 1
- IWSIUZWSCPQNIQ-UHFFFAOYSA-N 1-ethyl-5-(trifluoromethylsulfinyl)benzimidazole Chemical compound FC(F)(F)S(=O)C1=CC=C2N(CC)C=NC2=C1 IWSIUZWSCPQNIQ-UHFFFAOYSA-N 0.000 description 1
- RCQPJPWAVWKHFX-UHFFFAOYSA-N 1-ethyl-5-(trifluoromethylsulfonyl)benzimidazole Chemical compound FC(F)(F)S(=O)(=O)C1=CC=C2N(CC)C=NC2=C1 RCQPJPWAVWKHFX-UHFFFAOYSA-N 0.000 description 1
- KLNAUCYAFBCABL-UHFFFAOYSA-N 1-ethyl-5-ethylsulfonylbenzimidazole Chemical compound CCS(=O)(=O)C1=CC=C2N(CC)C=NC2=C1 KLNAUCYAFBCABL-UHFFFAOYSA-N 0.000 description 1
- MJKVVDGJSHIKLM-UHFFFAOYSA-N 1-ethyl-5-fluorobenzimidazole Chemical compound FC1=CC=C2N(CC)C=NC2=C1 MJKVVDGJSHIKLM-UHFFFAOYSA-N 0.000 description 1
- DFSQXJOVDDPIIJ-UHFFFAOYSA-N 1-ethyl-5-methylsulfonylbenzimidazole Chemical compound CS(=O)(=O)C1=CC=C2N(CC)C=NC2=C1 DFSQXJOVDDPIIJ-UHFFFAOYSA-N 0.000 description 1
- JZBAPADLDMOLOD-UHFFFAOYSA-N 1-ethyl-5-phenylbenzimidazole Chemical compound C=1C=C2N(CC)C=NC2=CC=1C1=CC=CC=C1 JZBAPADLDMOLOD-UHFFFAOYSA-N 0.000 description 1
- NQSCSQFDGIQQQD-UHFFFAOYSA-N 1-ethylbenzimidazole-5,6-dicarbonitrile Chemical compound N#CC1=C(C#N)C=C2N(CC)C=NC2=C1 NQSCSQFDGIQQQD-UHFFFAOYSA-N 0.000 description 1
- UHXUPSPGFPYATJ-UHFFFAOYSA-N 1-ethylbenzimidazole-5-carbonitrile Chemical compound N#CC1=CC=C2N(CC)C=NC2=C1 UHXUPSPGFPYATJ-UHFFFAOYSA-N 0.000 description 1
- UZOGKIHRCJXBPG-UHFFFAOYSA-N 1-ethylbenzimidazole-5-carboxylic acid Chemical compound OC(=O)C1=CC=C2N(CC)C=NC2=C1 UZOGKIHRCJXBPG-UHFFFAOYSA-N 0.000 description 1
- UHUPEGPJJKTCML-UHFFFAOYSA-N 1-ethylbenzimidazole-5-sulfonamide Chemical compound NS(=O)(=O)C1=CC=C2N(CC)C=NC2=C1 UHUPEGPJJKTCML-UHFFFAOYSA-N 0.000 description 1
- PZABXOBIJZECMR-UHFFFAOYSA-N 2-(5-cyanobenzimidazol-1-yl)ethyl acetate Chemical compound N#CC1=CC=C2N(CCOC(=O)C)C=NC2=C1 PZABXOBIJZECMR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JGDUEEXUWFGLTO-UHFFFAOYSA-N 3,3-dimethylbenzo[g]indole Chemical compound C1=CC2=CC=CC=C2C2=C1C(C)(C)C=N2 JGDUEEXUWFGLTO-UHFFFAOYSA-N 0.000 description 1
- NKSZCPBUWGZONP-UHFFFAOYSA-N 3,4-dihydroisoquinoline Chemical compound C1=CC=C2C=NCCC2=C1 NKSZCPBUWGZONP-UHFFFAOYSA-N 0.000 description 1
- JMLQKSJRTKLARI-UHFFFAOYSA-N 3-ethyl-6-fluorobenzimidazole-5-carbonitrile Chemical compound FC1=C(C#N)C=C2N(CC)C=NC2=C1 JMLQKSJRTKLARI-UHFFFAOYSA-N 0.000 description 1
- OZOATVDNYIWEEY-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzoselenazole Chemical compound C1CCCC2=C1N=C[se]2 OZOATVDNYIWEEY-UHFFFAOYSA-N 0.000 description 1
- RMFVVPBBEDMZQI-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzothiazole Chemical compound C1CCCC2=C1N=CS2 RMFVVPBBEDMZQI-UHFFFAOYSA-N 0.000 description 1
- YVORRVFKHZLJGZ-UHFFFAOYSA-N 4,5-Dimethyloxazole Chemical compound CC=1N=COC=1C YVORRVFKHZLJGZ-UHFFFAOYSA-N 0.000 description 1
- UWSONZCNXUSTKW-UHFFFAOYSA-N 4,5-Dimethylthiazole Chemical compound CC=1N=CSC=1C UWSONZCNXUSTKW-UHFFFAOYSA-N 0.000 description 1
- BGTVICKPWACXLR-UHFFFAOYSA-N 4,5-diphenyl-1,3-thiazole Chemical compound S1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 BGTVICKPWACXLR-UHFFFAOYSA-N 0.000 description 1
- XBZLGTFOMXCHPP-UHFFFAOYSA-N 4-[[4-(2-methoxyphenyl)-1,3-thiazol-2-yl]amino]benzoic acid Chemical compound COC1=CC=CC=C1C1=CSC(NC=2C=CC(=CC=2)C(O)=O)=N1 XBZLGTFOMXCHPP-UHFFFAOYSA-N 0.000 description 1
- GQPBBURQQRLAKF-UHFFFAOYSA-N 4-ethyl-1,3-oxazole Chemical compound CCC1=COC=N1 GQPBBURQQRLAKF-UHFFFAOYSA-N 0.000 description 1
- PUMREIFKTMLCAF-UHFFFAOYSA-N 4-methyl-1,3-oxazole Chemical compound CC1=COC=N1 PUMREIFKTMLCAF-UHFFFAOYSA-N 0.000 description 1
- BJATXNRFAXUVCU-UHFFFAOYSA-N 4-methyl-1,3-selenazole Chemical compound CC1=C[se]C=N1 BJATXNRFAXUVCU-UHFFFAOYSA-N 0.000 description 1
- SRGCYOMCADXFJA-UHFFFAOYSA-N 4-methyl-4,5-dihydro-1,3-thiazole Chemical compound CC1CSC=N1 SRGCYOMCADXFJA-UHFFFAOYSA-N 0.000 description 1
- NTFMLYSGIKHECT-UHFFFAOYSA-N 4-phenyl-1,3-oxazole Chemical compound O1C=NC(C=2C=CC=CC=2)=C1 NTFMLYSGIKHECT-UHFFFAOYSA-N 0.000 description 1
- MLBGDGWUZBTFHT-UHFFFAOYSA-N 4-phenyl-1,3-selenazole Chemical compound [se]1C=NC(C=2C=CC=CC=2)=C1 MLBGDGWUZBTFHT-UHFFFAOYSA-N 0.000 description 1
- KXCQDIWJQBSUJF-UHFFFAOYSA-N 4-phenyl-1,3-thiazole Chemical compound S1C=NC(C=2C=CC=CC=2)=C1 KXCQDIWJQBSUJF-UHFFFAOYSA-N 0.000 description 1
- YXGBCQGWEUFUID-UHFFFAOYSA-N 4-thiophen-2-yl-1,3-thiazole Chemical compound C1=CSC(C=2N=CSC=2)=C1 YXGBCQGWEUFUID-UHFFFAOYSA-N 0.000 description 1
- QMHIMXFNBOYPND-UHFFFAOYSA-N 4MTO Natural products CC1=CSC=N1 QMHIMXFNBOYPND-UHFFFAOYSA-N 0.000 description 1
- NBFKLCVXIZWRDX-UHFFFAOYSA-N 5,6-dibromo-1-ethylbenzimidazole Chemical compound BrC1=C(Br)C=C2N(CC)C=NC2=C1 NBFKLCVXIZWRDX-UHFFFAOYSA-N 0.000 description 1
- GYVLFYQMEWXHQF-UHFFFAOYSA-N 5,6-dichloro-1-ethylbenzimidazole Chemical compound ClC1=C(Cl)C=C2N(CC)C=NC2=C1 GYVLFYQMEWXHQF-UHFFFAOYSA-N 0.000 description 1
- HYXKRZZFKJHDRT-UHFFFAOYSA-N 5,6-dimethoxy-1,3-benzothiazole Chemical compound C1=C(OC)C(OC)=CC2=C1SC=N2 HYXKRZZFKJHDRT-UHFFFAOYSA-N 0.000 description 1
- CCIFOTJBTWDDQO-UHFFFAOYSA-N 5,6-dimethyl-1,3-benzoselenazole Chemical compound C1=C(C)C(C)=CC2=C1[se]C=N2 CCIFOTJBTWDDQO-UHFFFAOYSA-N 0.000 description 1
- QMUXKZBRYRPIPQ-UHFFFAOYSA-N 5,6-dimethyl-1,3-benzothiazole Chemical compound C1=C(C)C(C)=CC2=C1SC=N2 QMUXKZBRYRPIPQ-UHFFFAOYSA-N 0.000 description 1
- RWNMLYACWNIEIG-UHFFFAOYSA-N 5,6-dimethyl-1,3-benzoxazole Chemical compound C1=C(C)C(C)=CC2=C1OC=N2 RWNMLYACWNIEIG-UHFFFAOYSA-N 0.000 description 1
- KFDDRUWQFQJGNL-UHFFFAOYSA-N 5-bromo-1,3-benzothiazole Chemical compound BrC1=CC=C2SC=NC2=C1 KFDDRUWQFQJGNL-UHFFFAOYSA-N 0.000 description 1
- DUMYZVKQCMCQHJ-UHFFFAOYSA-N 5-chloro-1,3-benzoselenazole Chemical compound ClC1=CC=C2[se]C=NC2=C1 DUMYZVKQCMCQHJ-UHFFFAOYSA-N 0.000 description 1
- YTSFYTDPSSFCLU-UHFFFAOYSA-N 5-chloro-1,3-benzothiazole Chemical compound ClC1=CC=C2SC=NC2=C1 YTSFYTDPSSFCLU-UHFFFAOYSA-N 0.000 description 1
- VWMQXAYLHOSRKA-UHFFFAOYSA-N 5-chloro-1,3-benzoxazole Chemical compound ClC1=CC=C2OC=NC2=C1 VWMQXAYLHOSRKA-UHFFFAOYSA-N 0.000 description 1
- XHEABVQBDRMBMU-UHFFFAOYSA-N 5-chloro-1-ethylbenzimidazole Chemical compound ClC1=CC=C2N(CC)C=NC2=C1 XHEABVQBDRMBMU-UHFFFAOYSA-N 0.000 description 1
- IVFMTXLMTAAWKD-UHFFFAOYSA-N 5-ethoxybenzo[e][1,3]benzothiazole Chemical compound C12=CC=CC=C2C(OCC)=CC2=C1N=CS2 IVFMTXLMTAAWKD-UHFFFAOYSA-N 0.000 description 1
- AHIHYPVDBXEDMN-UHFFFAOYSA-N 5-methoxy-1,3-benzoselenazole Chemical compound COC1=CC=C2[se]C=NC2=C1 AHIHYPVDBXEDMN-UHFFFAOYSA-N 0.000 description 1
- PNJKZDLZKILFNF-UHFFFAOYSA-N 5-methoxy-1,3-benzothiazole Chemical compound COC1=CC=C2SC=NC2=C1 PNJKZDLZKILFNF-UHFFFAOYSA-N 0.000 description 1
- IQQKXTVYGHYXFX-UHFFFAOYSA-N 5-methoxy-1,3-benzoxazole Chemical compound COC1=CC=C2OC=NC2=C1 IQQKXTVYGHYXFX-UHFFFAOYSA-N 0.000 description 1
- PQPFOZJCILBANS-UHFFFAOYSA-N 5-methoxybenzo[e][1,3]benzothiazole Chemical compound C12=CC=CC=C2C(OC)=CC2=C1N=CS2 PQPFOZJCILBANS-UHFFFAOYSA-N 0.000 description 1
- LDDVDAMRGURWPF-UHFFFAOYSA-N 5-methyl-1,3-benzoselenazole Chemical compound CC1=CC=C2[se]C=NC2=C1 LDDVDAMRGURWPF-UHFFFAOYSA-N 0.000 description 1
- SEBIXVUYSFOUEL-UHFFFAOYSA-N 5-methyl-1,3-benzothiazole Chemical compound CC1=CC=C2SC=NC2=C1 SEBIXVUYSFOUEL-UHFFFAOYSA-N 0.000 description 1
- UBIAVBGIRDRQLD-UHFFFAOYSA-N 5-methyl-1,3-benzoxazole Chemical compound CC1=CC=C2OC=NC2=C1 UBIAVBGIRDRQLD-UHFFFAOYSA-N 0.000 description 1
- ZYMHCFYHVYGFMS-UHFFFAOYSA-N 5-methyl-1,3-oxazole Chemical compound CC1=CN=CO1 ZYMHCFYHVYGFMS-UHFFFAOYSA-N 0.000 description 1
- RLYUNPNLXMSXAX-UHFFFAOYSA-N 5-methylthiazole Chemical compound CC1=CN=CS1 RLYUNPNLXMSXAX-UHFFFAOYSA-N 0.000 description 1
- AAKPXIJKSNGOCO-UHFFFAOYSA-N 5-phenyl-1,3-benzothiazole Chemical compound C=1C=C2SC=NC2=CC=1C1=CC=CC=C1 AAKPXIJKSNGOCO-UHFFFAOYSA-N 0.000 description 1
- NIFNXGHHDAXUGO-UHFFFAOYSA-N 5-phenyl-1,3-benzoxazole Chemical compound C=1C=C2OC=NC2=CC=1C1=CC=CC=C1 NIFNXGHHDAXUGO-UHFFFAOYSA-N 0.000 description 1
- YPYPBEGIASEWKA-UHFFFAOYSA-N 5-phenyl-1,3-oxazole Chemical compound O1C=NC=C1C1=CC=CC=C1 YPYPBEGIASEWKA-UHFFFAOYSA-N 0.000 description 1
- WQKHERPPDYPMNX-UHFFFAOYSA-N 6-chloro-3,4-dihydro-2h-naphthalen-1-one Chemical compound O=C1CCCC2=CC(Cl)=CC=C21 WQKHERPPDYPMNX-UHFFFAOYSA-N 0.000 description 1
- JESXFLYNQWETGE-UHFFFAOYSA-N 6-chloro-3-ethylbenzimidazole-5-carbonitrile Chemical compound ClC1=C(C#N)C=C2N(CC)C=NC2=C1 JESXFLYNQWETGE-UHFFFAOYSA-N 0.000 description 1
- GKJSZXGYFJBYRQ-UHFFFAOYSA-N 6-chloroquinoline Chemical compound N1=CC=CC2=CC(Cl)=CC=C21 GKJSZXGYFJBYRQ-UHFFFAOYSA-N 0.000 description 1
- AJAKVPMSAABZRX-UHFFFAOYSA-N 6-ethoxyquinoline Chemical compound N1=CC=CC2=CC(OCC)=CC=C21 AJAKVPMSAABZRX-UHFFFAOYSA-N 0.000 description 1
- AHOIGFLSEXUWNV-UHFFFAOYSA-N 6-methoxy-1,3-benzothiazole Chemical compound COC1=CC=C2N=CSC2=C1 AHOIGFLSEXUWNV-UHFFFAOYSA-N 0.000 description 1
- FKYKJYSYSGEDCG-UHFFFAOYSA-N 6-methoxy-1,3-benzoxazole Chemical compound COC1=CC=C2N=COC2=C1 FKYKJYSYSGEDCG-UHFFFAOYSA-N 0.000 description 1
- DGZYJLQJHCIFFW-UHFFFAOYSA-N 6-methoxy-5-methyl-1,3-benzoselenazole Chemical compound C1=C(C)C(OC)=CC2=C1N=C[se]2 DGZYJLQJHCIFFW-UHFFFAOYSA-N 0.000 description 1
- IVKILQAPNDCUNJ-UHFFFAOYSA-N 6-methyl-1,3-benzothiazole Chemical compound CC1=CC=C2N=CSC2=C1 IVKILQAPNDCUNJ-UHFFFAOYSA-N 0.000 description 1
- SZWNDAUMBWLYOQ-UHFFFAOYSA-N 6-methylbenzoxazole Chemical compound CC1=CC=C2N=COC2=C1 SZWNDAUMBWLYOQ-UHFFFAOYSA-N 0.000 description 1
- WUODVEXEVQKQQP-UHFFFAOYSA-N 7-methoxybenzo[g][1,3]benzothiazole Chemical compound C1=CC2=CC(OC)=CC=C2C2=C1N=CS2 WUODVEXEVQKQQP-UHFFFAOYSA-N 0.000 description 1
- YVKTXAJDKKMNFM-UHFFFAOYSA-N 8-methoxybenzo[g][1,3]benzothiazole Chemical compound C12=CC(OC)=CC=C2C=CC2=C1SC=N2 YVKTXAJDKKMNFM-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KIWBPDUYBMNFTB-UHFFFAOYSA-N Ethyl hydrogen sulfate Chemical compound CCOS(O)(=O)=O KIWBPDUYBMNFTB-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 102100028255 Renin Human genes 0.000 description 1
- 108090000783 Renin Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- WEGAYUJORGBACB-UHFFFAOYSA-N [4-(hydroxymethyl)-5h-1,3-thiazol-4-yl]methanol Chemical compound OCC1(CO)CSC=N1 WEGAYUJORGBACB-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- IEICFDLIJMHYQB-UHFFFAOYSA-N benzo[g][1,3]benzoselenazole Chemical compound C1=CC=CC2=C([se]C=N3)C3=CC=C21 IEICFDLIJMHYQB-UHFFFAOYSA-N 0.000 description 1
- IIUUNAJWKSTFPF-UHFFFAOYSA-N benzo[g][1,3]benzothiazole Chemical compound C1=CC=CC2=C(SC=N3)C3=CC=C21 IIUUNAJWKSTFPF-UHFFFAOYSA-N 0.000 description 1
- BVVBQOJNXLFIIG-UHFFFAOYSA-N benzo[g][1,3]benzoxazole Chemical compound C1=CC=CC2=C(OC=N3)C3=CC=C21 BVVBQOJNXLFIIG-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- VPDMFCLAZAZCMR-UHFFFAOYSA-N ethyl 1-ethylbenzimidazole-5-carboxylate Chemical compound CCOC(=O)C1=CC=C2N(CC)C=NC2=C1 VPDMFCLAZAZCMR-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000006289 hydroxybenzyl group Chemical group 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002537 isoquinolines Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JZMJDSHXVKJFKW-UHFFFAOYSA-M methyl sulfate(1-) Chemical compound COS([O-])(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-M 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- TYRGSDXYMNTMML-UHFFFAOYSA-N propyl hydrogen sulfate Chemical compound CCCOS(O)(=O)=O TYRGSDXYMNTMML-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- OVYWMEWYEJLIER-UHFFFAOYSA-N quinolin-6-ol Chemical compound N1=CC=CC2=CC(O)=CC=C21 OVYWMEWYEJLIER-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
- G11B7/247—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes methine or polymethine dyes
- G11B7/2472—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes methine or polymethine dyes cyanine
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/249—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing organometallic compounds
- G11B7/2495—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing organometallic compounds as anions
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
〔技術分野〕
本発明は安定な光情報記録媒体に関し、さらに
詳しくはレーザビームのような高密度エネルギー
ビームにより書き込みおよび読出しを行うための
光情報記録媒体に関する。
〔従来技術〕
従来、回転しているデイスク状の情報記録媒体
にレーザ光を照射して情報を記録再生を行なう情
報記録媒体再生装置が知られている。そして、こ
の種の情報記録装置に用いられる情報記録媒体の
記録層としては、Te、Biなどの金属薄膜または
カルコゲン系非品質薄膜などが提案されている。
しかし、これらは酸化および湿度に対して弱い、
レーザ光に対する反射率が高すぎレーザ光の利用
率が低いなどの欠点を有する。
また、最近になつて比較的長波長の光で物性変
化し得る有機色素薄膜を記録層に用いることが提
案されている。この有機色素薄膜は上記欠点を除
去するものであるが一般に長波長側に吸収特性を
もつ有機色素は熱および光に対して安定性が低い
などの問題点がある。
〔目的〕
本発明は上記問題に鑑みてなされたものであつ
て、その目的は記録特性がよく安定な光情報記録
媒体を提供することにある。
〔構成〕
本発明の記録層は下記一般式〔〕または
〔〕で表わされる化合物を含むことを特徴とし
ている。
一般式〔〕
一般式〔〕
ただし、上記各式において、φはチアゾール、
オキサゾール、ピロール、3,3−ジアルキルイ
ンドレニン、イミダゾール、ピリジンおよびキノ
リンから選ばれた複素環を表わし、前記複素環に
はベンゼン環またはナフタレン環が縮合していて
もよくまた芳香核上には置換基が存在していもよ
く、Ψ1およびΨ2は同じかまたは異なつていても
よくそれぞれは置換もしくは非置換の芳香環を表
わすかあるいはΨ1およびΨ2は一緒になつて芳香
環を形成してもよく、Xはアニオンを表わし、l
は、0、1または2を表わし、mおよびnは0、
1、2または3を表わし、R1は水素、アルキル
基、アミノ基またはハロゲン原子を表わしそして
Yは置換もしくは非置換の5員環または6員環を
形成するために必要な原子群を表わす。
上記一般式において複素環を表わすφは、具体
的には式
で表わすことができる。ここで、R2アルキル基
(例えば、メチル基、エチル基、n−プロピル基
イソプロピル基、n−ブチル基、第2ブチル基、
イソブチル基、第3ブチル基、n−アミル基、第
3アミル基、n−ヘキシル基、n−オクチル基、
第3オクチル基など)、置換アルキル基(例えば
2−ヒドロキシエチル基、3−ヒドロキシプロピ
ル基、4−ヒドロキシブチル基、2−アセトキシ
エチル基、カルボキシメチル基、2−カルボキシ
エチル基、3−カルボキシプロピル基、2−スル
ホエチル基、3−スルホプロピル基、4−スルホ
ブチル基、3−スルフエートプロピル基、4−ス
ルフエートブチル基、N−(メチルスルホニル)−
カルバミルメチル基、3−(アセチルスルフアミ
ル)プロピル基、4−(アセチルスルフアミル)
ブチル基など)、環式アルキル基(例えば、シク
ロヘキシル基など)、アルル基(CH2=CH−CH2
−)などのアルケニル基、アラルキル基(例え
ば、ベンジル基、フエネチル基、α−ナフチルメ
チル基、β−ナフチルメチル基など)、置換アラ
ルキル基(例えば、カルボキシベンジル基、スル
ホベンジル基、ヒドロキシベンジル基など)、ア
リール基(例えば、フエニル基など)または置換
アリール基(例えば、カルボキシフエニル基、ス
ルホフエニル基、ヒドロキシフエニル基など)を
表わす。
また、Zは置換または未置換の複素環、例え
ば、チアゾール系列の核(例えばチアゾール、4
−メチルシアゾール、4−フエニルチアゾール、
5−メチルチアゾール、5−フエニルチアゾー
ル、4,5−ジメチルチアゾール、4,5−ジフ
エニルチアゾール、4−(2−チエニル)−チアゾ
ールなど)、ベンゾチアゾール系列の核(例えば
ベンゾチアゾール、5−クロロベンゾチアゾー
ル、5−メチルベンゾチアゾール、6−メチルベ
ンゾチアゾール、5,6−ジメチルベンゾチアゾ
ール、5−ブロモベンゾチアゾール、5−フエニ
ルベンゾチアゾール、5−メトキシベンゾチアゾ
ール、6−メトキシベンゾチアゾール、5,6−
ジメトキシベンゾチアゾール、5,6−ジオキシ
メチレンベンゾチアゾール、5−ヒドロキシベン
ゾチアゾール、6−ヒドロキシベンゾチアゾー
ル、4,5,6,7−テトラヒドロベンゾチアゾ
ールなど)、ナフトチアゾール系列の核(例えば
ナフト〔2.1−d〕チアゾール、ナフト〔1.2−
d〕チアゾール、5−メトキシナフト〔1.2−d〕
チアゾール、5−エトキシナフト〔1.2−d〕チ
アゾール、8−メトキシナフト〔2.1−d〕チア
ゾール、7−メトキシナフト〔2.1−d〕チアゾ
ールなど)、チオナフテン〔7.6−d〕チアゾール
系列の核(例えば7−メトキシチオナフテン
〔7.6−d〕チアゾール)、オキサゾール系列の核
(例えば4−メチルオキサゾール、5−メチルオ
キサゾール、4−フエニルオキサゾール、4.5−
ジフエニルオキサゾール、4−エチルオキサゾー
ル、4,5−ジメチルオキサゾール、5−フエニ
ルオキサゾール)、ベンゾオキサゾール系列の核
(例えばベンゾオキサゾール、5−クロロベンゾ
オキサゾール、5−メチルベンゾオキサゾール、
5−フエニルベンゾオキサゾール、6−メチルベ
ンゾオキサゾール、5,6−ジメチルベンゾオキ
サゾール、5−メトキシベンゾオキサゾール、6
−メトキシベンゾオキサゾール、5−ヒドロキシ
ベンゾオキサゾール、6−ヒドロキシベンゾオキ
サゾールなど)、ナフトオキサゾール系列の核
(例えばナフト〔2.1−d〕オキサゾール、ナフト
〔1.2−d〕オキサゾールなど)、セレナゾール系
列の核(例えば4−メチルセレナゾール、4−フ
エニルセレナゾールなど)、ベンゾセレナゾール
系列の核(例えばベンゾセレナゾール、5−クロ
ロベンゾセレナゾール、5−メチルベンゾセレナ
ゾール、5,6−ジメチルベンゾセレナゾール、
5−メトキシベンゾセレナゾール、5−メチル−
6−メトキシベンゾセレナゾール、5,6−ジオ
キシメチレンベンゾセレナゾール、5−ヒドロキ
シベンゾセレナゾール、4,5,6,7−テトラ
ヒドロベンゾセレナゾールなど)、ナフトセレナ
ゾール系列の核(例えばナフト〔2.1−d〕セレ
ナゾール、ナフト〔1.2−d〕セレナゾール)、チ
アゾリン系列の核(例えばチアゾリン、4−メチ
ルチアゾリン、4−ヒドロキシメチル−4−メチ
ルチアゾリン、4,4−ビス−ヒドロキシメチル
チアゾリンなど)、オキサゾリン系列の核(例え
ばオキサゾリン)、セレナゾリン系列の核(例え
ばセレナゾリン)、2−キノリン系列の核(例え
ばキノリン、6−メチルキノリン、6−クロロキ
ノリン、6−メトキシキノリン、6−エトキシキ
ノリン、6−ヒドロキシキノリン)、4−キノリ
ン系列の核(例えばキノリン、6−メトキシキノ
リン、7−メチルキノリン、8−メチルキノリ
ン)、1−イソキノリン系列の核(例えばイソキ
ノリン、3,4−ジヒドロイソキノリン)、3−
イソキノリン系列の核(例えばイソキノリン)、
3,3−ジアルキルインドレニン系列の核(例え
ば3,3−ジメチルインドレニン、3,3−ジメ
チル−5−クロロインドレニン、3,3,5−ト
リメチルインドレニン、3,3,7−トリメチル
インドレニン、3,3−ジメチル−5,7−ジク
ロルインドレニン)、3,3−ジアルキルナフト
ピロール系列の核(例えば3,3−ジメチル−ナ
フト〔1.2−d〕ピロール、3,3−ジメチル−
ナフト〔2.1−d〕ピロール、6−クロロ−3,
3−ジメチル−ナフト〔1.2−d〕ピロールなど)
ピリジン系列の核(例えばピリジン、5−メチル
ピリジン)、ベンゾイミダゾール系列の核(例え
ば1−エチル−5,6−ジクロロベンゾイミダゾ
ール、1−ヒドロキシエチル−5,6−ジクロロ
ベンゾイミダゾール、1−エチル−5−クロロベ
ンゾイミダゾール、1−エチル−5,6−ジブロ
モベンゾイミダゾール、1−エチル−5−フエニ
ルベンゾイミダゾール、1−エチル−5−フルオ
ロベンイミダゾール、1−エチル−5−シアノベ
ンゾイミダゾール、1−(β−アセトキシエチル)
−5−シアノベンゾイミダゾール、1−エチル−
5−クロロ−6−シアノベンゾイミダゾール、1
−エチル−5−フルオロ−6−シアノベンゾイミ
ダゾール、1−エチル−5−アセチルベゾイミダ
ゾール、1−エチル−5−カルボキシベンゾイミ
ダゾール、1−エチル−5エトキシカルボニルベ
ンゾイミダゾール、1−エチル−5−スルフアミ
ルベンゾイミダゾール、1−エチル−5−N−エ
チルスルフアミルベンゾイミダゾール、1−エチ
ル−5,6−ジフルオロベンゾイミダゾール、1
−エチル−5,6−ジシアノベンゾイミダゾー
ル、1−エチル−5−エチルスルホニルベンゾイ
ミダゾール、1−エチル−5−メチルスルホニル
ベンゾイミダゾール、1−エチル−5−トリフル
オロメチルベンゾイミダゾール、1−エチル−5
−トリフルオロメチルスルホニルベンゾイミダゾ
ール、1−エチル−5−トリフルオロメチルスル
フイニルベンゾイミダゾールなど)を形成するに
必要な非金属原子群を表わす。
上記一般式〔〕における
の具体例として下記の5員環および6員環化合物
をあげることができる。
また、Ψ1およびΨ2で表わされる置換または非
置換の芳香環の例としてはフエニル基、4−クロ
ルフエニル基、4−ジメチルアミノフエニル基、
4−ジエチルアミノ基、4−ジベンジルアミノフ
エニル基などがありそしてΨ1とΨ2とが一緒にな
つて形成する芳香環の例としては
などがあげられ、それぞれの環上には、アルキル
基、ハロゲン原子、アルコキシ基、置換または非
置換のアリール基などの置換基が存在していても
よい。また、アニオンを表わすXの例としてはふ
つ素イオン、塩素イオン、臭素イオン、沃素イオ
ンなどのハロゲンイオン、過塩素酸塩イオン、ベ
ンゼンスルホン酸塩イオン、p−トルエンスルホ
ン酸塩イオン、メチル硫酸塩イオン、エチル硫酸
塩イオン、プロピル硫酸塩イオンなどの酸アニオ
ンがある。
本発明の上記一般式〔〕および〔〕で表わ
される化合物の具体例を以下に示すがこれらに制
限されるものではない。
なお、本発明の上記一般式の化合物は基本的に
はφ−CH3と
とを、中間鎖を形成するジアミノ化合物またはジ
ヒドロキシ化合物あるいはトリメトキシ化合物と
反応させることにより合成することができる。
本発明における記録層を形成するにあたつて本
発明の上記化合物をそれ自体単独で用いてもよい
が、さらに必要に応じて他の第3成分例えばバイ
ダー、安定剤、他の色素などを含有させることも
できる。特に安定剤として長波長に吸収をもつ遷
移金属錯体やトリアリールアミノ化合物を記録層
に含有させるとその光安定性がより向上する。ま
た、本発明の一般式〔〕および〔〕の化合物
はそれぞれ単独で用いてもよいしあるいは併用し
てもよい。
記録層の膜厚は100Å〜10μm好ましくは200Å
〜2μmである。そして膜形成方法としては溶液
塗布法、たとえば浸漬コーテイング、スプレーコ
ーテイング、スピンナーコーテイング、ブレード
コーテイング、ローラーコーテイング、カーテン
コーテイングなどをあるいは他の方法として蒸
着、CVD、スパツター法などを用いることもで
きる。なお、塗布に用いる溶媒としては例えばメ
チルエチルケトンなどのケトン系、酢酸エチルな
どのエステル系、メチルセロソルブなどのエーテ
ル系、ジクロロエタン、クロロホルムなどのハロ
ゲン化アルキル系、トルエン、キシレンなどの芳
香族系などをあげることができる。
また、記録層を設ける基板の材質にはなんら制
限されることはなくこの分野で知られたもの例え
ば各種プラスチツク、ガラス、セラミツクス、金
属などを用いることができる。
また基板の形状は使用用途に応じてテープ、デ
イスク、ドラム、ベルトなどいずれであつてもよ
い。
本発明の記録媒体は基本的には基板上に記録層
を設けたものであるが、さらに目的に応じて他の
層例えば下引き層、中間層または保護層などを設
けてもよい。また、基板と記録層との間の下引き
層には必要に応じて案内溝を形成してもよい。ま
た、記録層は基板上の片面または両面に設けても
よいし、さらにこの記録媒体を一対とし記録層が
対抗するように配置したいわゆるサンドイツチ構
造にしてホコリやキズがつかないようにすること
もできる。さらに、記録層上には必要に応じ透明
基体を用いるときに表面として機能する反射層や
各種最上保護層、ハーフミラー層などを設けるこ
ともできる。ただ、本発明の化合物はそれ自体き
わめて反射率が高いのでこのような下地ないし反
射層は通常用いる必要がない。
下引き層は(a)接着性の向上、(b)水またはガスな
どのバリアー、(c)記録層の保存安定性の向上、(d)
反射率の向上、(e)溶剤からの基板の保護および(f)
プレグループの形成などを目的として使用され
る。(a)の目的に対しては例えばアイオノマー樹
脂、ポリアミド系樹脂、ビニル系樹脂、天然高分
子、シリコーン、液状ゴムなどの高分子材料およ
びシランカツプリング剤などの種々の物質を用い
ることができ、(b)、(c)の目的に対しては上記高分
子材料以外に無機化合物例えばSiO2、MgF2、
SiO、TiO2、ZnO、TiN、SiNなど、金属または
半金属例えばZn、Cu、S、Ni、Cr、Ge、Se、
Cd、Ag、Alなどを用いることができる。(d)の目
的に対しては金属例えばAl、Agなどまたは金属
光沢を有する有機薄膜例えばメタン染料、キサン
テン系染料などを用いることができそして(e)、(f)
の目的に対しては紫外線硬化樹脂、熱硬化性樹
脂、熱可塑性樹脂などを用いることができる。下
引き層の膜厚は0.1〜30μm好ましくは0.2〜10μm
が適当である。また、保護層はキズ、ホコリ、汚
れなどからの保護および記録層の化学的安定性の
向上を目的として設けられ、その材料としては下
引き層と同じ材料を使用することができる。保護
層の膜厚は0.1μm以上好ましくは50μm以上が適
当である。
次に、図面について本発明による光情報記録媒
体の構成を説明する。
第1図に示すように、本発明の光情報記録媒体
は基本的には基板1上に本発明の上記式〔〕ま
たは〔〕の化合物を含む記録層2を設けたもの
である。また、記録層は光反射層と光吸収層とを
任意の順序で組合せた2層構成とすることもでき
る。
また、第2図ないし第4図に示すように第1図
の構成のものにさらに下引き層3および/または
保護層4を設けた構成とすることもできる。ま
た、下引き層または保護層には安定剤、分散剤、
難燃剤、滑剤、帯電防止剤、界面活性剤、可塑剤
なども含有されていてもよい。
さらに、本発明による光情報記録媒体の別の構
成としては、第1図ないし第4図に示した同一構
成の2枚の記録媒体(場合によりその1枚を基板
のみとして)を用い記録層2を内側に配置して密
封したいわゆるエアーサンドスイツチ構造にして
もよいし、保護層4を介して接着したいわゆる密
着サンドイツチ構造(貼り合せ構造)にしてもよ
い。
〔実施例〕
以下に実施例をあげて本発明をさらに説明する
が、本発明はこれらに限定されるものではない。
実施例 1
前掲例示化合物(1)を、1,2−ジクロルエタン
に溶解して0.6重量%の塗布液を調製した。この
塗布液を光硬化性樹脂による案内溝を設けたアク
リル基板上に塗布して膜厚500Åの記録層を得た。
こうして得られた記録媒体に、スペーサを介して
保護カバーを接着した。
この記録媒体に、波長780nmの半導体レーザ
を用いてビーム径1.6μm、線速1.4m/secおよび
記録面ビームパワー3mWで、0.7MHzの信号を記
録した。
さらに、0.2mWの連続ビームを照射して記録
された信号を読み出したところ、53dBのCN比が
得られた。
さらに、この記録媒体を50℃、90%RHの環境
下に1000時間保存したが、特性の変化はみとめら
れなかつた。
実施例 2〜20
実施例1における化合物(1)の代りに、以下の表
に示した前掲例示化合物を用いた以外は実施例1
と同様にして各記録媒体を作製した。これらの記
録媒体についてC/Nおよび保存性を試験した結
果を以下の表にまとめて示す。
[Technical Field] The present invention relates to a stable optical information recording medium, and more particularly to an optical information recording medium for writing and reading with a high-density energy beam such as a laser beam. [Prior Art] Conventionally, an information recording medium reproducing apparatus is known that records and reproduces information by irradiating a rotating disk-shaped information recording medium with a laser beam. As the recording layer of the information recording medium used in this type of information recording device, metal thin films such as Te, Bi, or chalcogen-based non-quality thin films have been proposed.
However, they are sensitive to oxidation and humidity,
It has drawbacks such as the reflectance to laser light is too high and the utilization rate of laser light is low. Furthermore, it has recently been proposed to use an organic dye thin film whose physical properties can be changed by relatively long wavelength light in the recording layer. Although this organic dye thin film eliminates the above-mentioned drawbacks, organic dyes that generally have absorption characteristics on the long wavelength side have problems such as low stability against heat and light. [Objective] The present invention has been made in view of the above problems, and its object is to provide a stable optical information recording medium with good recording characteristics. [Structure] The recording layer of the present invention is characterized by containing a compound represented by the following general formula [] or []. General formula [] General formula [] However, in each of the above formulas, φ is thiazole,
Represents a heterocycle selected from oxazole, pyrrole, 3,3-dialkylindolenine, imidazole, pyridine, and quinoline, and the heterocycle may be fused with a benzene ring or a naphthalene ring, and the aromatic nucleus may be substituted. groups may be present, Ψ 1 and Ψ 2 may be the same or different, each represents a substituted or unsubstituted aromatic ring, or Ψ 1 and Ψ 2 together form an aromatic ring. may be used, X represents an anion, and l
represents 0, 1 or 2, m and n are 0,
1, 2 or 3, R 1 represents hydrogen, an alkyl group, an amino group or a halogen atom, and Y represents an atomic group necessary to form a substituted or unsubstituted 5- or 6-membered ring. In the above general formula, φ representing a heterocycle is specifically represented by the formula It can be expressed as Here, R 2 alkyl group (for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group,
Isobutyl group, tertiary butyl group, n-amyl group, tertiary amyl group, n-hexyl group, n-octyl group,
tertiary octyl group, etc.), substituted alkyl groups (e.g. 2-hydroxyethyl group, 3-hydroxypropyl group, 4-hydroxybutyl group, 2-acetoxyethyl group, carboxymethyl group, 2-carboxyethyl group, 3-carboxypropyl group) group, 2-sulfoethyl group, 3-sulfopropyl group, 4-sulfobutyl group, 3-sulfatepropyl group, 4-sulfatebutyl group, N-(methylsulfonyl)-
Carbamylmethyl group, 3-(acetylsulfamyl)propyl group, 4-(acetylsulfamyl)
butyl group, etc.), cyclic alkyl group (e.g., cyclohexyl group, etc.), allyl group ( CH2 =CH- CH2
-), aralkyl groups (e.g., benzyl group, phenethyl group, α-naphthylmethyl group, β-naphthylmethyl group, etc.), substituted aralkyl groups (e.g., carboxybenzyl group, sulfobenzyl group, hydroxybenzyl group, etc.) ), represents an aryl group (eg, phenyl group, etc.) or a substituted aryl group (eg, carboxyphenyl group, sulfophenyl group, hydroxyphenyl group, etc.). Further, Z is a substituted or unsubstituted heterocycle, for example, a thiazole series nucleus (for example, thiazole, 4
-Methylthiazole, 4-phenylthiazole,
5-methylthiazole, 5-phenylthiazole, 4,5-dimethylthiazole, 4,5-diphenylthiazole, 4-(2-thienyl)-thiazole, etc.), benzothiazole series nuclei (e.g. benzothiazole, 5- Chlorobenzothiazole, 5-methylbenzothiazole, 6-methylbenzothiazole, 5,6-dimethylbenzothiazole, 5-bromobenzothiazole, 5-phenylbenzothiazole, 5-methoxybenzothiazole, 6-methoxybenzothiazole, 5 ,6-
dimethoxybenzothiazole, 5,6-dioxymethylenebenzothiazole, 5-hydroxybenzothiazole, 6-hydroxybenzothiazole, 4,5,6,7-tetrahydrobenzothiazole, etc.), naphthothiazole series nuclei (e.g. naphtho[2.1 -d] Thiazole, naphtho [1.2-
d] Thiazole, 5-methoxynaphtho [1.2-d]
thiazole, 5-ethoxynaphtho[1.2-d]thiazole, 8-methoxynaphtho[2.1-d]thiazole, 7-methoxynaphtho[2.1-d]thiazole, etc.), thionaphthene[7.6-d]thiazole series nuclei (e.g. 7 -methoxythionaphthene[7.6-d]thiazole), oxazole series nuclei (e.g. 4-methyloxazole, 5-methyloxazole, 4-phenyloxazole, 4.5-
diphenyloxazole, 4-ethyloxazole, 4,5-dimethyloxazole, 5-phenyloxazole), benzoxazole series nuclei (e.g. benzoxazole, 5-chlorobenzoxazole, 5-methylbenzoxazole,
5-phenylbenzoxazole, 6-methylbenzoxazole, 5,6-dimethylbenzoxazole, 5-methoxybenzoxazole, 6
-methoxybenzoxazole, 5-hydroxybenzoxazole, 6-hydroxybenzoxazole, etc.), naphthoxazole series nuclei (e.g. naphtho[2.1-d]oxazole, naphtho[1.2-d]oxazole, etc.), selenazole series nuclei (e.g. 4-methylselenazole, 4-phenylselenazole, etc.), benzoselenazole series nuclei (e.g. benzoselenazole, 5-chlorobenzoselenazole, 5-methylbenzoselenazole, 5,6-dimethylbenzoselenazole,
5-methoxybenzoselenazole, 5-methyl-
6-methoxybenzoselenazole, 5,6-dioxymethylenebenzoselenazole, 5-hydroxybenzoselenazole, 4,5,6,7-tetrahydrobenzoselenazole, etc.), naphthoselenazole series nuclei (e.g. naphtho[ 2.1-d]selenazole, naphtho[1.2-d]selenazole), thiazoline series nuclei (e.g. thiazoline, 4-methylthiazoline, 4-hydroxymethyl-4-methylthiazoline, 4,4-bis-hydroxymethylthiazoline, etc.), Oxazoline series nuclei (e.g. oxazoline), selenazoline series nuclei (e.g. selenazoline), 2-quinoline series nuclei (e.g. quinoline, 6-methylquinoline, 6-chloroquinoline, 6-methoxyquinoline, 6-ethoxyquinoline, 6- hydroxyquinoline), 4-quinoline series nuclei (e.g. quinoline, 6-methoxyquinoline, 7-methylquinoline, 8-methylquinoline), 1-isoquinoline series nuclei (e.g. isoquinoline, 3,4-dihydroisoquinoline), 3-
Nuclei of the isoquinoline series (e.g. isoquinoline),
Nuclei of the 3,3-dialkylindolenine series (e.g. 3,3-dimethylindolenine, 3,3-dimethyl-5-chloroindolenine, 3,3,5-trimethylindolenine, 3,3,7-trimethylindolenine) renin, 3,3-dimethyl-5,7-dichloroindolenine), 3,3-dialkylnaphthopyrrole series nuclei (e.g. 3,3-dimethyl-naphtho[1.2-d]pyrrole, 3,3-dimethyl-
naphtho[2.1-d]pyrrole, 6-chloro-3,
3-dimethyl-naphtho[1.2-d]pyrrole, etc.)
Nuclei of the pyridine series (e.g. pyridine, 5-methylpyridine), nuclei of the benzimidazole series (e.g. 1-ethyl-5,6-dichlorobenzimidazole, 1-hydroxyethyl-5,6-dichlorobenzimidazole, 1-ethyl- 5-chlorobenzimidazole, 1-ethyl-5,6-dibromobenzimidazole, 1-ethyl-5-phenylbenzimidazole, 1-ethyl-5-fluorobenzimidazole, 1-ethyl-5-cyanobenzimidazole, 1 -(β-acetoxyethyl)
-5-cyanobenzimidazole, 1-ethyl-
5-chloro-6-cyanobenzimidazole, 1
-ethyl-5-fluoro-6-cyanobenzimidazole, 1-ethyl-5-acetylbezimidazole, 1-ethyl-5-carboxybenzimidazole, 1-ethyl-5ethoxycarbonylbenzimidazole, 1-ethyl-5- Sulfamylbenzimidazole, 1-ethyl-5-N-ethylsulfamylbenzimidazole, 1-ethyl-5,6-difluorobenzimidazole, 1
-Ethyl-5,6-dicyanobenzimidazole, 1-ethyl-5-ethylsulfonylbenzimidazole, 1-ethyl-5-methylsulfonylbenzimidazole, 1-ethyl-5-trifluoromethylbenzimidazole, 1-ethyl-5
-trifluoromethylsulfonylbenzimidazole, 1-ethyl-5-trifluoromethylsulfinylbenzimidazole, etc.). In the above general formula [] Specific examples include the following 5-membered ring and 6-membered ring compounds. Examples of substituted or unsubstituted aromatic rings represented by Ψ 1 and Ψ 2 include phenyl group, 4-chlorophenyl group, 4-dimethylaminophenyl group,
Examples of aromatic rings formed by combining Ψ 1 and Ψ 2 include 4-diethylamino group and 4-dibenzylaminophenyl group. etc., and substituents such as an alkyl group, a halogen atom, an alkoxy group, and a substituted or unsubstituted aryl group may be present on each ring. Examples of X representing an anion include halogen ions such as fluorine ion, chlorine ion, bromide ion, and iodide ion, perchlorate ion, benzenesulfonate ion, p-toluenesulfonate ion, and methyl sulfate. ion, ethyl sulfate ion, propyl sulfate ion, and other acid anions. Specific examples of the compounds represented by the above general formulas [] and [] of the present invention are shown below, but the invention is not limited thereto. In addition, the compound of the above general formula of the present invention basically has φ-CH 3 and can be synthesized by reacting with a diamino compound, dihydroxy compound, or trimethoxy compound forming an intermediate chain. In forming the recording layer of the present invention, the above compounds of the present invention may be used alone, but may further contain other third components such as binders, stabilizers, other pigments, etc., as necessary. You can also do it. In particular, when the recording layer contains a transition metal complex or triarylamino compound that absorbs at long wavelengths as a stabilizer, its photostability is further improved. Further, the compounds of the general formulas [] and [] of the present invention may be used alone or in combination. The thickness of the recording layer is 100 Å to 10 μm, preferably 200 Å
~2μm. As a film forming method, a solution coating method such as dip coating, spray coating, spinner coating, blade coating, roller coating, curtain coating, etc., or other methods such as vapor deposition, CVD, and sputtering method can also be used. Examples of solvents used for coating include ketones such as methyl ethyl ketone, esters such as ethyl acetate, ethers such as methyl cellosolve, alkyl halides such as dichloroethane and chloroform, and aromatics such as toluene and xylene. be able to. Further, the material of the substrate on which the recording layer is provided is not limited in any way, and materials known in this field, such as various plastics, glasses, ceramics, metals, etc., can be used. Further, the shape of the substrate may be tape, disk, drum, belt, etc. depending on the intended use. The recording medium of the present invention basically has a recording layer provided on a substrate, but other layers such as an undercoat layer, an intermediate layer, or a protective layer may be further provided depending on the purpose. Furthermore, guide grooves may be formed in the undercoat layer between the substrate and the recording layer, if necessary. Further, the recording layer may be provided on one or both sides of the substrate, or the recording medium may be arranged in a pair so that the recording layers face each other in a so-called sanderch structure to prevent dust and scratches from forming. can. Furthermore, a reflective layer, various uppermost protective layers, a half mirror layer, etc., which function as a surface when a transparent substrate is used, may be provided on the recording layer, if necessary. However, since the compound of the present invention itself has an extremely high reflectance, it is usually not necessary to use such a base or reflective layer. The undercoat layer (a) improves adhesion, (b) serves as a barrier against water or gas, (c) improves storage stability of the recording layer, and (d)
Improved reflectance, (e) protection of the substrate from solvents and (f)
It is used for purposes such as forming a pre-group. For the purpose of (a), various substances can be used, such as polymeric materials such as ionomer resins, polyamide resins, vinyl resins, natural polymers, silicones, liquid rubbers, and silane coupling agents; For purposes (b) and (c), inorganic compounds such as SiO 2 , MgF 2 ,
Metals or metalloids such as SiO, TiO 2 , ZnO, TiN, SiN, etc. Zn, Cu, S, Ni, Cr, Ge, Se,
Cd, Ag, Al, etc. can be used. For the purpose of (d), metals such as Al, Ag, etc. or organic thin films with metallic luster such as methane dyes, xanthene dyes, etc. can be used, and (e) and (f)
For this purpose, ultraviolet curing resins, thermosetting resins, thermoplastic resins, etc. can be used. The thickness of the undercoat layer is 0.1 to 30 μm, preferably 0.2 to 10 μm.
is appropriate. Further, the protective layer is provided for the purpose of protecting the recording layer from scratches, dust, dirt, etc. and improving the chemical stability of the recording layer, and the same material as that of the undercoat layer can be used for the protective layer. The thickness of the protective layer is suitably 0.1 μm or more, preferably 50 μm or more. Next, the structure of the optical information recording medium according to the present invention will be explained with reference to the drawings. As shown in FIG. 1, the optical information recording medium of the present invention basically comprises a substrate 1 and a recording layer 2 containing the compound of the above formula [] or [] of the present invention. Further, the recording layer can also have a two-layer structure in which a light-reflecting layer and a light-absorbing layer are combined in any order. Furthermore, as shown in FIGS. 2 to 4, the structure shown in FIG. 1 may be further provided with an undercoat layer 3 and/or a protective layer 4. In addition, stabilizers, dispersants,
Flame retardants, lubricants, antistatic agents, surfactants, plasticizers, etc. may also be contained. Furthermore, as another configuration of the optical information recording medium according to the present invention, two recording media having the same configuration as shown in FIGS. It may be a so-called air sand switch structure in which the film is placed inside and sealed, or it may be a so-called close sandwich structure (bonded structure) in which it is bonded with a protective layer 4 interposed therebetween. [Example] The present invention will be further explained with reference to Examples below, but the present invention is not limited thereto. Example 1 The above-mentioned exemplary compound (1) was dissolved in 1,2-dichloroethane to prepare a 0.6% by weight coating solution. This coating solution was coated onto an acrylic substrate provided with guide grooves made of photocurable resin to obtain a recording layer with a thickness of 500 Å.
A protective cover was adhered to the thus obtained recording medium via a spacer. A 0.7 MHz signal was recorded on this recording medium using a semiconductor laser with a wavelength of 780 nm at a beam diameter of 1.6 μm, a linear velocity of 1.4 m/sec, and a recording surface beam power of 3 mW. Furthermore, when we read out the signals recorded by irradiating with a 0.2 mW continuous beam, we obtained a CN ratio of 53 dB. Furthermore, this recording medium was stored in an environment of 50°C and 90% RH for 1000 hours, but no change in characteristics was observed. Examples 2 to 20 Example 1 except that the above-mentioned exemplified compounds shown in the table below were used instead of compound (1) in Example 1.
Each recording medium was produced in the same manner as described above. The results of testing the C/N and storage stability of these recording media are summarized in the table below.
本発明の光情報記録媒体によれば、記録特性が
良く(高いC/N)かつ安定な記録媒体を得るこ
とができた。
According to the optical information recording medium of the present invention, a stable recording medium with good recording characteristics (high C/N) could be obtained.
第1図ないし第4図は本発明の光情報記録媒体
の構成を示す断面図である。
1……基板、2……記録層、3……下引き層、
4……保護層。
1 to 4 are cross-sectional views showing the structure of the optical information recording medium of the present invention. 1... Substrate, 2... Recording layer, 3... Undercoat layer,
4...Protective layer.
Claims (1)
表わされる化合物を含む記録層を有することを特
徴とする、光情報記録媒体、 一般式〔〕 一般式〔〕 (上記式において、φはチアゾール、オキサゾー
ル、ピロール、3,3−ジアルキルインドレニ
ン、イミダゾール、ピリジンおよびキノリンから
選ばれた複素環を表わし、前記複素環にはベンゼ
ン環またはナフタレン環が縮合していてもよくま
た芳香核上には置換基が存在していもよく、Ψ1
およびΨ2は同じかまたは異なつていてもよくそ
れぞれは置換もしくは非置換の芳香環を表わすか
あるいはΨ1およびΨ2は一緒になつて芳香環を形
成してもよく、Xはアニオンを表わし、lは0、
1または2を表わし、mおよびnは0、1、2ま
たは3を表わし、R1は水素、アルキル基、アミ
ノ基またはハロゲン原子を表わしそしてYは置換
もしくは非置換の5員環または6員環を形成する
ために必要な原子群を表わす)。[Claims] 1. An optical information recording medium characterized by having a recording layer containing a compound represented by the following general formula [] or [] on a substrate, general formula [] General formula [] (In the above formula, φ represents a heterocycle selected from thiazole, oxazole, pyrrole, 3,3-dialkylindolenine, imidazole, pyridine, and quinoline, and a benzene ring or a naphthalene ring is fused to the heterocycle. Substituents may also exist on the aromatic nucleus, and Ψ 1
and Ψ 2 may be the same or different and each represents a substituted or unsubstituted aromatic ring, or Ψ 1 and Ψ 2 may be taken together to form an aromatic ring, and X represents an anion. , l is 0,
1 or 2, m and n represent 0, 1, 2 or 3, R 1 represents hydrogen, an alkyl group, an amino group or a halogen atom, and Y represents a substituted or unsubstituted 5- or 6-membered ring (represents the atomic group necessary to form).
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59223849A JPS61102292A (en) | 1984-10-26 | 1984-10-26 | Optical information-recording medium |
DE19853537539 DE3537539A1 (en) | 1984-10-23 | 1985-10-22 | Optical information recording material |
US07/217,125 US4891305A (en) | 1984-10-23 | 1988-07-07 | Optical information recording element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59223849A JPS61102292A (en) | 1984-10-26 | 1984-10-26 | Optical information-recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61102292A JPS61102292A (en) | 1986-05-20 |
JPH0553636B2 true JPH0553636B2 (en) | 1993-08-10 |
Family
ID=16804677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59223849A Granted JPS61102292A (en) | 1984-10-23 | 1984-10-26 | Optical information-recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61102292A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6382791A (en) * | 1986-09-26 | 1988-04-13 | Matsushita Electric Ind Co Ltd | Image-receiving material for sublimation transfer type thermal recording |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58125246A (en) * | 1982-01-22 | 1983-07-26 | Ricoh Co Ltd | Laser recording medium |
JPS58173696A (en) * | 1982-04-06 | 1983-10-12 | Canon Inc | Optical recording medium |
JPS58194595A (en) * | 1982-05-10 | 1983-11-12 | Canon Inc | Optical recording medium |
JPS58219091A (en) * | 1982-06-14 | 1983-12-20 | Canon Inc | Optical recording medium |
JPS58220143A (en) * | 1982-06-16 | 1983-12-21 | Canon Inc | Organic film |
JPS58220792A (en) * | 1982-06-16 | 1983-12-22 | Canon Inc | Optical recording medium |
JPS5924692A (en) * | 1982-07-30 | 1984-02-08 | Tdk Corp | Optical recording medium |
JPS5967092A (en) * | 1982-10-11 | 1984-04-16 | Tdk Corp | Optical recording medium |
JPS5985791A (en) * | 1982-11-08 | 1984-05-17 | Ricoh Co Ltd | Optical information recording medium |
JPS59150795A (en) * | 1983-02-17 | 1984-08-29 | Ricoh Co Ltd | Optical information recording medium |
-
1984
- 1984-10-26 JP JP59223849A patent/JPS61102292A/en active Granted
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58125246A (en) * | 1982-01-22 | 1983-07-26 | Ricoh Co Ltd | Laser recording medium |
JPS58173696A (en) * | 1982-04-06 | 1983-10-12 | Canon Inc | Optical recording medium |
JPS58194595A (en) * | 1982-05-10 | 1983-11-12 | Canon Inc | Optical recording medium |
JPS58219091A (en) * | 1982-06-14 | 1983-12-20 | Canon Inc | Optical recording medium |
JPS58220143A (en) * | 1982-06-16 | 1983-12-21 | Canon Inc | Organic film |
JPS58220792A (en) * | 1982-06-16 | 1983-12-22 | Canon Inc | Optical recording medium |
JPS5924692A (en) * | 1982-07-30 | 1984-02-08 | Tdk Corp | Optical recording medium |
JPS5967092A (en) * | 1982-10-11 | 1984-04-16 | Tdk Corp | Optical recording medium |
JPS5985791A (en) * | 1982-11-08 | 1984-05-17 | Ricoh Co Ltd | Optical information recording medium |
JPS59150795A (en) * | 1983-02-17 | 1984-08-29 | Ricoh Co Ltd | Optical information recording medium |
Also Published As
Publication number | Publication date |
---|---|
JPS61102292A (en) | 1986-05-20 |
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