JPH0549846B2 - - Google Patents
Info
- Publication number
- JPH0549846B2 JPH0549846B2 JP59236071A JP23607184A JPH0549846B2 JP H0549846 B2 JPH0549846 B2 JP H0549846B2 JP 59236071 A JP59236071 A JP 59236071A JP 23607184 A JP23607184 A JP 23607184A JP H0549846 B2 JPH0549846 B2 JP H0549846B2
- Authority
- JP
- Japan
- Prior art keywords
- frame
- pedestal
- vibration
- rubber
- supported
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/36—Springs made of rubber or other material having high internal friction, e.g. thermoplastic elastomers
- F16F1/40—Springs made of rubber or other material having high internal friction, e.g. thermoplastic elastomers consisting of a stack of similar elements separated by non-elastic intermediate layers
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Architecture (AREA)
- Mechanical Engineering (AREA)
- Floor Finish (AREA)
- Vibration Prevention Devices (AREA)
- Buildings Adapted To Withstand Abnormal External Influences (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は免震・防振構造に係り、特に半導体製
造装置を載置するために好適な免震・防振構造に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a seismic isolation/vibration isolation structure, and particularly to a seismic isolation/vibration isolation structure suitable for mounting semiconductor manufacturing equipment.
クリーンルーム等においては各種の半導体製造
装置が設置され、この半導体製造装置の中にはス
テツパー等のように極端に振動を嫌う装置があ
る。従つてこのような振動を嫌う半導体製造装置
においては免震・防振構造の床上に設置する必要
がある。第1図では従来の免震・防振構造が示さ
れている。第1図に示すように基盤10には上方
が開放した架台枠12が設置されており、この架
台枠12には中間架台14が支持されている。即
ち中間架台14はコイルばね16を介してその下
面が架台枠12に支持され、その側方においてゴ
ムダンパ18を介して架台枠12に支持されてい
る。尚、符号20で示す部材は中間架台14の中
央部に配置された錘りである。中間架台14の上
部には防振ゴム22,22を介して架台24が設
置され、この架台24上には半導体製造装置等の
機器類が設置されることになる。
Various types of semiconductor manufacturing equipment are installed in clean rooms and the like, and some of these semiconductor manufacturing equipment, such as steppers, are extremely sensitive to vibration. Therefore, semiconductor manufacturing equipment that dislikes such vibrations must be installed on a floor with a seismically isolated and vibration-proof structure. Figure 1 shows a conventional seismic isolation/vibration isolation structure. As shown in FIG. 1, a mount frame 12 with an open top is installed on the base 10, and an intermediate mount 14 is supported on this mount frame 12. That is, the intermediate pedestal 14 is supported on its lower surface by the pedestal frame 12 via a coil spring 16, and is supported by the pedestal frame 12 on its side via a rubber damper 18. Note that the member indicated by the reference numeral 20 is a weight disposed at the center of the intermediate frame 14. A pedestal 24 is installed on the upper part of the intermediate pedestal 14 via anti-vibration rubbers 22, 22, and equipment such as semiconductor manufacturing equipment is installed on this pedestal 24.
しかしながら前記第1図に示す免震・防振構造
では、機器類の重量が大きくなると防振ゴム22
が座屈を起こし、機器類を支持出来ない恐れがあ
る。また前記防振構造では、防振構造の構造が複
雑である上に、免震・防振効果は一方向(上下方
向)にしか有効ではなく、更に低周波(周波数が
10Hz以下)に対して共振するおそれがある等3次
元的に吸振効果を有することが困難である。 However, in the seismic isolation/vibration-proof structure shown in Fig. 1, when the weight of the equipment increases, the vibration-proof rubber 22
may buckle and become unable to support equipment. In addition, in the above-mentioned vibration isolation structure, the structure of the vibration isolation structure is complicated, and the seismic isolation/vibration isolation effect is only effective in one direction (up and down direction).
It is difficult to have a three-dimensional vibration absorption effect, as there is a risk of resonance for frequencies (below 10Hz).
第2図では別の従来の免震・防振構造が示され
ている。基盤10と機器類等が設置される架台2
4との間には積層ゴム26が配設されている。積
層ゴム26はゴム板28と金属板30とが交互に
積層状に配置され、これらは相互に接着されて積
層ゴム26を構成している。 Fig. 2 shows another conventional seismic isolation/vibration isolation structure. A base 10 and a pedestal 2 on which equipment etc. are installed
A laminated rubber 26 is disposed between the rubber member 4 and the rubber member 4. The laminated rubber 26 includes rubber plates 28 and metal plates 30 arranged alternately in a laminated manner, and these are adhered to each other to constitute the laminated rubber 26.
しかしながら前記積層ゴム26を用いる従来の
免震・防振構造は、金属板30を配している為大
きな鉛直方向荷重を支持できる利点があるが、架
台24上に設置される機器類が軽量の場合には水
平方向に対しては剛性が弱い為、座屈を生じる恐
れがある。 However, the conventional seismic isolation/vibration isolation structure using the laminated rubber 26 has the advantage of being able to support a large vertical load because the metal plate 30 is arranged, but the equipment installed on the pedestal 24 is lightweight. In some cases, buckling may occur because the rigidity is weak in the horizontal direction.
本発明はこのような事情に鑑みてなされたもの
で、機器類の重量に関係なく免震・防振効果を有
し、更に3次元的に免震・防振効果を有する免
震・防振構造を提案することを目的としている。
The present invention has been made in view of the above circumstances, and is a seismic isolation/vibration proofing system that has a seismic isolation/vibration proofing effect regardless of the weight of the equipment, and further has a seismic isolation/vibration proofing effect in three dimensions. The purpose is to propose a structure.
本発明は前記目的を達成するために、基盤と、
基盤上に複数の積層ゴムを介して支持された架台
枠と、前記架台枠上に設けられ複数の空間部を形
成する格子状縦壁と、前記格子状縦壁で形成され
た複数の空間部に内にそれぞれ配置されると共に
機器類を支持し、その上部または下部が弾性体で
架台枠に支持されると共にその側部が架台枠の縦
壁に積層ゴムを介して支持された複数の架台と、
から成り、該複数の架台のそれぞれに前記個々の
機器類を載置することを特徴としている。
In order to achieve the above object, the present invention includes a base;
a pedestal frame supported on a base via a plurality of laminated rubber; a lattice-shaped vertical wall provided on the pedestal frame and forming a plurality of spaces; and a plurality of spaces formed by the lattice-shaped vertical wall. A plurality of mounts, each of which is placed within the mount frame and supports equipment, whose upper or lower part is supported by an elastic body on the mount frame, and whose sides are supported by the vertical wall of the mount frame via laminated rubber. and,
It is characterized in that the individual devices are placed on each of the plurality of frames.
以下添付図面に従つて本発明に係る免震・防振
構造の好ましい実施例を詳説する。
Preferred embodiments of the seismic isolation/vibration isolation structure according to the present invention will be described in detail below with reference to the accompanying drawings.
第3図並びに第4図では本発明に係る第1実施
例の構造が示されている。第3図に示すように基
盤10上には架台枠32が積層ゴム26,26を
介して支持されている。積層ゴム26は前記した
ようにゴム板28と金属板30とが交互に積層状
に配設されて構成されている。架台枠32には上
方に向けて縦壁34が格子状に立設されている。
(図3、図4上では格子状の縦壁34で形成され
る1個の空間部のみを図示し、その他の空間部は
省略する。)この縦壁34で形成される空間部に
は半導体製造装置等の機器類等を支持する架台2
4が設置される。架台24の底面は弾性体36を
介して架台枠32上に支持されている。また架台
24の4側面24A,24A,24A,24A、
は積層ゴム26を介して架台枠32の縦壁34に
支持されている。積層ゴム26は架台24の側面
24Aと架台枠32の縦壁34との〓間に予め予
圧をかけて圧縮した状態で配置される。 3 and 4 show the structure of a first embodiment of the present invention. As shown in FIG. 3, a pedestal frame 32 is supported on the base 10 via laminated rubber 26, 26. As described above, the laminated rubber 26 is composed of rubber plates 28 and metal plates 30 arranged alternately in a laminated manner. Vertical walls 34 are erected upward on the mount frame 32 in a grid pattern.
(In FIGS. 3 and 4, only one space formed by the lattice-like vertical walls 34 is shown, and other spaces are omitted.) Frame 2 that supports equipment such as manufacturing equipment
4 will be installed. The bottom surface of the pedestal 24 is supported on a pedestal frame 32 via an elastic body 36. In addition, the four sides 24A, 24A, 24A, 24A of the pedestal 24,
is supported by the vertical wall 34 of the pedestal frame 32 via the laminated rubber 26. The laminated rubber 26 is placed between the side surface 24A of the pedestal 24 and the vertical wall 34 of the pedestal frame 32 in a compressed state with preload applied thereto.
前記の如く構成された本発明に係る実施例によ
れば、鉛直方向の荷重に対しては基盤10と架台
枠32との間に設置される積層ゴム26で支持
し、水平方向の荷重に対しては架台24と縦壁3
4との間に設置される積層ゴム26において支持
するので、2次元の方向の振動に対して免震・防
振効果を有することになる。 According to the embodiment of the present invention configured as described above, the load in the vertical direction is supported by the laminated rubber 26 installed between the base 10 and the frame frame 32, and the load in the horizontal direction is supported. The frame 24 and the vertical wall 3
Since it is supported by the laminated rubber 26 installed between the base plate and the base plate 4, it has a seismic isolation and vibration damping effect against vibrations in two-dimensional directions.
第5図並びに第6図では本発明に係る第2実施
例の構造が示されている。第2実施例においては
基盤10と架台枠32との間には多段形式の積層
ゴム40が配設されている。多段形式の積層ゴム
40は通常の積層ゴム26,26を複数の連結板
42で途中連結し、水平方向の変位に対して積層
ゴム26が座屈するのを防止するものである。連
結板42は、剛体で形成され、積層ゴム26の金
属板30を連結するようにしてもよい。これによ
り上方に設置される機器類等が軽量であつても水
平方向の変位に対して多段形式の積層ゴム40に
より積層ゴム26,26が座屈するようなことは
無い。第2実施例においては架台枠32上に立設
される縦壁34は第6図に示すように格子状に形
成され、複数の空間部44が形成されている。こ
の複数の空間部44内には各々機器類等を支持す
る架台46が配設されている。この架台46は内
部が空洞の角柱状に形成され、この下端部には縦
壁34の下部に形成された支持突起48との間に
弾性材50を介して支持されている。また架台4
6の側面と縦壁34との間には予め予圧を加えた
状態で積層ゴム26が配設されている。この積層
ゴム26は水平方向の荷重を吸収するために設け
られたものである。他の空間部44における架台
46を支持する積層ゴム26並びに弾性体50は
架台46が支持する機器類等の重量或いは要求さ
れる防振構造に合わせてその弾性係数等を決定す
ることができる。尚、架台46は弾性体50でそ
の底面を架台枠32に支持したのであるが、弾性
体で吊下げるようにしてもよい。 5 and 6 show the structure of a second embodiment of the present invention. In the second embodiment, a multi-stage laminated rubber 40 is disposed between the base 10 and the pedestal frame 32. The multi-stage rubber laminate 40 has ordinary rubber laminates 26, 26 connected midway through a plurality of connecting plates 42 to prevent the rubber laminate 26 from buckling against displacement in the horizontal direction. The connecting plate 42 may be formed of a rigid body and connect the metal plates 30 of the laminated rubber 26. As a result, even if the equipment and the like installed above are lightweight, the multi-stage rubber lamination 40 prevents the laminated rubber 26, 26 from buckling due to displacement in the horizontal direction. In the second embodiment, the vertical walls 34 erected on the frame frame 32 are formed in a lattice shape as shown in FIG. 6, and a plurality of spaces 44 are formed. Each of the plurality of spaces 44 is provided with a pedestal 46 for supporting equipment and the like. The pedestal 46 is formed into a prismatic shape with a hollow interior, and is supported at its lower end with an elastic member 50 interposed between it and a support protrusion 48 formed at the lower part of the vertical wall 34 . Also, pedestal 4
Laminated rubber 26 is disposed between the side surface of 6 and the vertical wall 34 in a preloaded state. This laminated rubber 26 is provided to absorb horizontal loads. The elastic modulus of the laminated rubber 26 and elastic body 50 that support the pedestal 46 in the other space 44 can be determined according to the weight of the equipment supported by the pedestal 46 or the required vibration isolation structure. Although the bottom surface of the pedestal 46 is supported on the pedestal frame 32 by an elastic body 50, it may be suspended by an elastic body.
前記実施例によれば、架台枠32を支持する積
層ゴム40は多段形式に構成されているので、水
平方向の剛性は強く軽量の機器類が設置されても
横揺れに対して座屈するようなことはない。また
横方向の揺れに対しては縦壁34と架台46との
間には積層ゴム26が配設されているので、横方
向の荷重を支持することができる。 According to the embodiment, the laminated rubber 40 that supports the pedestal frame 32 is constructed in a multi-tiered manner, so that it has strong horizontal rigidity and does not buckle due to horizontal shaking even when lightweight equipment is installed. Never. Moreover, since the laminated rubber 26 is disposed between the vertical wall 34 and the pedestal 46, the load in the lateral direction can be supported.
また、第2実施例によれば、格子状の架台枠3
2に形成された複数の空間部44に弾性体50を
介して個別に架台46を設けたので、それぞれの
架台46に機器類を任意に設定することができ
る。従つて、架台枠32を支持している積層ゴム
40,40に十分な荷重をかけることができるの
で、積層ゴム40,40の座屈変形を防止するこ
とができる。 Further, according to the second embodiment, the lattice-shaped mount frame 3
Since the pedestals 46 are individually provided in the plurality of spaces 44 formed in 2 through the elastic bodies 50, devices can be arbitrarily set in each pedestal 46. Therefore, a sufficient load can be applied to the rubber laminations 40, 40 supporting the frame frame 32, so that buckling deformation of the rubber laminations 40, 40 can be prevented.
また、複数の機器類を個別の架台に振り分ける
ことができるので、各々の機器類が稼動した時の
各々の振動を個別の架台46で受けることができ
る。従つて、複数の機器類のそれぞれの振動が架
台46を介して他の機器類に伝播して相互に悪影
響を及ぼすことを防止できる。 Furthermore, since a plurality of devices can be distributed to individual pedestals, each pedestal 46 can receive vibrations generated when each device operates. Therefore, it is possible to prevent the vibrations of each of the plurality of devices from propagating to other devices via the pedestal 46 and adversely affecting each other.
さらに、格子状に形成された1つの架台枠32
に複数の機器類を設けることができるので設備の
簡略化を図ることができる。 Furthermore, one mount frame 32 formed in a grid shape
Since a plurality of devices can be installed in the system, the equipment can be simplified.
以上説明したように本発明に係る免震・防振床
構造によれば、機器類等支持する架台の側面と架
台を支持する架台枠の縦壁との間に積層ゴムを配
設したので、横方向の荷重を支持することができ
る。また架台枠の縦枠は格子状に区切られ複数の
空間部が形成され、この空間部には各機器類を支
持する架台が配置され、各架台は架台枠の間に配
設される積層ゴムの種類並びにばね等の弾性係数
を適宜変えることにより各半導体製造装置の要求
に合つた免震・防振効果を与えることができる。
さらに架台枠は基盤との間に積層ゴムを多段形式
で配設しているので、機械類が軽量のような場合
であつても横方向の荷重に対して積層ゴムが座屈
するようなことはない。
As explained above, according to the seismic isolation/vibration isolation floor structure according to the present invention, since the laminated rubber is disposed between the side surface of the pedestal that supports equipment etc. and the vertical wall of the pedestal frame that supports the pedestal, Can support lateral loads. In addition, the vertical frame of the mount frame is divided into a grid pattern to form a plurality of spaces, and a mount supporting each piece of equipment is placed in this space. By appropriately changing the type of the spring and the elastic modulus of the spring, etc., it is possible to provide seismic isolation and vibration isolation effects that meet the requirements of each semiconductor manufacturing device.
Furthermore, since the mount frame has laminated rubber placed in multiple stages between it and the base, the laminated rubber will not buckle under lateral loads even if the machinery is lightweight. do not have.
また、本発明に係る免震・防振構造によれば、
格子状の架台枠に形成された複数の空間部に弾性
体を介して個別に架台を設けたので、それぞれの
架台に機器類を任意に設定することができる。従
つて、架台枠を支持している複数の積層ゴムに十
分な荷重をかけることができるので、複数の積層
ゴムの座屈変形を防止することができる。 Moreover, according to the seismic isolation/vibration isolation structure according to the present invention,
Since the mounts are individually provided in the plurality of spaces formed in the lattice-shaped mount frame via elastic bodies, it is possible to arbitrarily set equipment on each mount. Therefore, a sufficient load can be applied to the plurality of laminated rubbers supporting the gantry frame, so that buckling deformation of the plurality of laminated rubbers can be prevented.
また、複数の機器類を個別の架台に振り分ける
ことができるので、各々の機器類が稼動した時の
各々の振動を個別の架台で受けることができる。
従つて、複数の機器類のそれぞれの振動が架台を
介して他の機器類に伝播して相互に悪影響を及ぼ
すことを防止できる。 Furthermore, since a plurality of devices can be distributed to individual mounts, each mount can receive the vibrations generated when each device operates.
Therefore, it is possible to prevent the vibrations of each of the plurality of devices from propagating to other devices via the pedestal and adversely affecting each other.
さらに、格子状に形成された1つの架台枠に複
数の機器類を設けることができるので設備の簡略
化を図ることができる。 Furthermore, since a plurality of devices can be provided on one lattice-shaped mount frame, the equipment can be simplified.
第1図は従来の免震・防振構造の構造を示す断
面図、第2図は別の従来の積層ゴムを用いた免
震・防振構造を示す正面図、第3図は本発明に係
る第1実施例の構造を示す断面図、第4図はその
平面図、第5図並びに第6図は本発明に係る第2
実施例の構造を示す図面で、第5図はその部分断
面図、第6図はその平面図である。
10……基盤、26……積層ゴム、32……架
台枠、34……縦壁、40……多段積層ゴム。
Figure 1 is a sectional view showing the structure of a conventional seismic isolation/vibration isolation structure, Figure 2 is a front view showing another conventional seismic isolation/vibration isolation structure using laminated rubber, and Figure 3 is a cross-sectional view showing the structure of a conventional seismic isolation/vibration isolation structure. 4 is a sectional view showing the structure of the first embodiment, FIG. 4 is a plan view thereof, and FIGS. 5 and 6 are sectional views showing the structure of the first embodiment.
The drawings show the structure of the embodiment, FIG. 5 is a partial sectional view thereof, and FIG. 6 is a plan view thereof. DESCRIPTION OF SYMBOLS 10... Base, 26... Laminated rubber, 32... Frame, 34... Vertical wall, 40... Multi-stage laminated rubber.
Claims (1)
台枠と、 前記架台枠上に設けられ複数の空間部を形成す
る格子状縦壁と、 前記格子状縦壁で形成された複数の空間部に内
にそれぞれ配置されると共に機器類を支持し、そ
の上部または下部が弾性体で架台枠に支持される
と共にその側部が架台枠の縦壁に積層ゴムを介し
て支持された複数の架台と、 から成り、該複数の架台のそれぞれに前記個々の
機器類を載置することを特徴とする免振・防振構
造。 2 基板と架台枠との間の積層ゴムは互いに連結
板で連結されていることを特徴とする特許請求の
範囲第1項の免振・防振構造。[Scope of Claims] 1. A base, a pedestal frame supported on the base via a plurality of laminated rubber, a lattice-shaped vertical wall provided on the pedestal frame and forming a plurality of spaces, and the lattice-shaped vertical wall It is placed in a plurality of spaces formed by vertical walls and supports the equipment, and its upper or lower part is an elastic body and is supported by the frame frame, and the side part is laminated to the vertical wall of the frame frame. A vibration-isolating/vibration-isolating structure comprising: a plurality of pedestals supported via rubber; and the individual devices are placed on each of the plurality of pedestals. 2. The vibration isolation/vibration isolation structure according to claim 1, wherein the laminated rubber between the substrate and the frame frame are connected to each other by a connecting plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23607184A JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23607184A JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61116142A JPS61116142A (en) | 1986-06-03 |
JPH0549846B2 true JPH0549846B2 (en) | 1993-07-27 |
Family
ID=16995282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23607184A Granted JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61116142A (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62159824A (en) * | 1985-12-28 | 1987-07-15 | Bridgestone Corp | Earthquake motion releasing/vibration removing support device |
JPS6357933A (en) * | 1986-08-29 | 1988-03-12 | Nippon Denki Kankyo Eng Kk | Vibrrationproof base |
JPH0672639B2 (en) * | 1987-01-28 | 1994-09-14 | 工業技術院長 | Vibration damper |
JP2676066B2 (en) * | 1987-04-17 | 1997-11-12 | 株式会社ブリヂストン | Vibration isolation container for transportation |
JPH028530A (en) * | 1988-06-27 | 1990-01-12 | Ohbayashi Corp | Multi-stage vibration removing device |
JPH0289143U (en) * | 1988-12-28 | 1990-07-16 | ||
JPH02136900U (en) * | 1989-04-21 | 1990-11-15 | ||
FR2711765B1 (en) * | 1993-10-25 | 1996-01-19 | Metravib Sa | Suspension device for a system intended to be placed in weightlessness. |
JP2002310232A (en) * | 2001-04-11 | 2002-10-23 | Tokkyokiki Corp | Vibration isolation pedestal for clean room |
JP2012042016A (en) * | 2010-08-20 | 2012-03-01 | Shimizu Corp | Three-dimensional base isolation device |
JP2014162526A (en) * | 2013-02-26 | 2014-09-08 | Mitsubishi Heavy Ind Ltd | Container, method for stacking the same |
JP6309170B2 (en) * | 2015-09-30 | 2018-04-11 | 三菱電機株式会社 | Seismic isolation unit and seismic isolation device |
CN112324828B (en) * | 2020-11-24 | 2021-08-17 | 北京航空航天大学 | A high load-bearing metal-rubber composite vibration isolator with three-way stiffness damping decoupling |
DE102023209476A1 (en) * | 2023-09-27 | 2025-03-27 | Carl Zeiss Smt Gmbh | Projection exposure system for semiconductor lithography with a connecting element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59228571A (en) * | 1983-06-08 | 1984-12-21 | 多田 英之 | Earthquake-proof enclosure |
-
1984
- 1984-11-09 JP JP23607184A patent/JPS61116142A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59228571A (en) * | 1983-06-08 | 1984-12-21 | 多田 英之 | Earthquake-proof enclosure |
Also Published As
Publication number | Publication date |
---|---|
JPS61116142A (en) | 1986-06-03 |
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