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JPH0537146A - Wiring board - Google Patents

Wiring board

Info

Publication number
JPH0537146A
JPH0537146A JP18635591A JP18635591A JPH0537146A JP H0537146 A JPH0537146 A JP H0537146A JP 18635591 A JP18635591 A JP 18635591A JP 18635591 A JP18635591 A JP 18635591A JP H0537146 A JPH0537146 A JP H0537146A
Authority
JP
Japan
Prior art keywords
land
wiring board
semiconductor chip
solder
electronic component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18635591A
Other languages
Japanese (ja)
Inventor
Toshifumi Nakamura
利文 中村
Keisuke Matsunami
敬祐 松波
Keiko Sogo
啓子 十河
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP18635591A priority Critical patent/JPH0537146A/en
Publication of JPH0537146A publication Critical patent/JPH0537146A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8119Arrangement of the bump connectors prior to mounting
    • H01L2224/81191Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0094Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452Solder masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To correctly mount electronic parts without causing displacement of parts or generation of defective soldering on the occasion of mounting electronic parts. CONSTITUTION:In a wiring board where a wiring pattern 2 formed by patterning of a conductive layer is provided on an insulating base material 1, a through hole formed as a conductor is provided in the necessary areas, a land 4 extending from a wiring pattern 2 is also formed by a conductor at the chip parts mounting region and solder resist 5 is formed to the region except for the land 4, a solder layer 6 having protruded and recessed regions is formed on the land 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、表面に、半導体チップ
等の電子部品が実装される導体層により形成されたラン
ドを有する配線基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wiring board having a land formed on its surface by a conductor layer on which an electronic component such as a semiconductor chip is mounted.

【0002】[0002]

【従来の技術】これまでの半導体チップの接合方式とし
ては、半導体チップを樹脂パッケージ内に封止して構成
したICをプリント配線基板に接続するという方法が一
般的であった。しかし、プリント配線基板の配線パター
ンがファインピッチ化してくると、上記方法では、実装
密度が上がらないという問題がある。そこで、現在で
は、直接半導体チップをプリント配線基板に接続するこ
とにより、実装密度を向上させるようにしている。
2. Description of the Related Art Conventionally, as a method of joining semiconductor chips, a method of connecting an IC formed by sealing a semiconductor chip in a resin package to a printed wiring board has been generally used. However, when the wiring pattern of the printed wiring board has a fine pitch, the above method has a problem that the mounting density cannot be increased. Therefore, at present, the mounting density is improved by directly connecting the semiconductor chip to the printed wiring board.

【0003】半導体チップを直接配線基板に接合させる
方式としては、金線を使用したワイヤボンディング法や
配線基板あるいは半導体チップにバンプを形成してこの
バンプを介して半導体チップを接続する方法(バンプ
法)がある。前者のワイヤボンディング法は、後者のバ
ンプ法に比べて作業性及び実装密度が劣ることから、今
日では、後者のバンプ法が実装密度を上げる技術として
注目されている。
As a method of directly bonding a semiconductor chip to a wiring board, a wire bonding method using a gold wire or a method of forming bumps on the wiring board or the semiconductor chip and connecting the semiconductor chips via the bumps (bump method) ). Since the former wire bonding method is inferior in workability and packaging density to the latter bump method, the latter bump method is now drawing attention as a technique for increasing the packaging density.

【0004】このバンプ法は、具体的には、半導体チッ
プのアクティブ面(表面)を下向きにして配線基板と向
い合わせ、更に双方の接続点をバンプを介して電気的に
接続させるというものである(フェースダウン接合方
式)。
Specifically, the bump method is to face the wiring board with the active surface (front surface) of the semiconductor chip facing downward, and to electrically connect both connection points via the bumps. (Face down joining method).

【0005】従来の配線基板は、図9に示すように、絶
縁性基材21上に形成した導体層によるランド22上に
例えば厚み3〜5μm程度の共晶半田23を形成するよ
うにしている。尚、24はソルダーレジストである。
In a conventional wiring board, as shown in FIG. 9, a eutectic solder 23 having a thickness of, for example, about 3 to 5 μm is formed on a land 22 formed of a conductor layer formed on an insulating base material 21. . Incidentally, 24 is a solder resist.

【0006】そして、バンプ付き半導体チップCを配線
基板上に実装する場合は、配線基板のランド22上に半
導体チップCを配置した後、共晶半田23が溶融する温
度にてリフロー処理することにより、共晶半田23を溶
融させて半導体チップCのバンプ25を配線基板上のラ
ンド22に電気的に接続するようにしている。
When the semiconductor chip C with bumps is mounted on the wiring board, the semiconductor chip C is placed on the land 22 of the wiring board, and then reflow processing is performed at a temperature at which the eutectic solder 23 melts. The eutectic solder 23 is melted to electrically connect the bumps 25 of the semiconductor chip C to the lands 22 on the wiring board.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、従来の
配線基板においては、ランド22上に共晶半田23を例
えばめっき等の析出法等を用いて形成するようにしてい
るため、図9に示すように、共晶半田23は、ランド2
2上において、ほぼ半球状の形で形成される。そのた
め、半導体チップCの実装時において、半導体チップC
の位置がずれ易いという問題があった。特に、半導体チ
ップCの実装時に行うリフロー処理にて、半導体チップ
Cが共晶半田23上を移動し、半導体チップCの位置ず
れを起こし易いという欠点がある。この位置ずれは、搬
送時においても生じていた。
However, in the conventional wiring board, the eutectic solder 23 is formed on the land 22 by using, for example, a deposition method such as plating. Therefore, as shown in FIG. The eutectic solder 23 is the land 2
It is formed in a substantially hemispherical shape on 2. Therefore, when the semiconductor chip C is mounted, the semiconductor chip C
There was a problem that the position of was easily displaced. In particular, there is a drawback in that the semiconductor chip C moves on the eutectic solder 23 during the reflow process performed when the semiconductor chip C is mounted, and the semiconductor chip C is easily displaced. This misalignment also occurred during transportation.

【0008】また、通常、半導体チップCのバンプ25
には、その高さに製造上のばらつきがあるが、半導体チ
ップCの実装時、半球形状の共晶半田23では、そのば
らつきを吸収することができず、その結果、配線基板の
ランド22と半導体チップCのバンプ25間において、
半田付け不良が発生し易く、半導体チップCを実装した
配線基板の信頼性が著しく劣化するという不都合があっ
た。
Also, the bumps 25 of the semiconductor chip C are usually used.
However, the hemispherical eutectic solder 23 cannot absorb the variation when the semiconductor chip C is mounted. Between the bumps 25 of the semiconductor chip C,
There is a problem in that soldering defects are likely to occur and the reliability of the wiring board on which the semiconductor chip C is mounted is significantly deteriorated.

【0009】また、配線基板に半導体チップCを実装す
る際、ランド22の位置を画像処理等で確かめながら行
うが、ランド22上に半球形状の共晶半田23が形成さ
れている場合、その正確な位置をつかみにくいという不
都合があった。
When the semiconductor chip C is mounted on the wiring board, the position of the land 22 is checked by image processing or the like. When the hemispherical eutectic solder 23 is formed on the land 22, the accuracy of There was an inconvenience that it was difficult to grab a certain position.

【0010】本発明は、このような課題に鑑み成された
もので、その目的とするところは、半導体チップを実装
する際において、半導体チップの位置ずれを引き起こす
ことなく、かつ半田付け不良を発生させることなく、半
導体チップを良好に実装することができる配線基板を提
供することにある。
The present invention has been made in view of the above problems. An object of the present invention is to mount a semiconductor chip without causing misalignment of the semiconductor chip and causing soldering failure. An object of the present invention is to provide a wiring board on which a semiconductor chip can be satisfactorily mounted without causing the above problem.

【0011】[0011]

【課題を解決するための手段】本発明は、表面に、電子
部品Cが実装されるランド4が形成された配線基板にお
いて、ランド4上に凹凸形状の導体層(半田層6)を設
けて構成する。
According to the present invention, an uneven conductor layer (solder layer 6) is provided on the land 4 in a wiring board having a land 4 on which an electronic component C is mounted. Constitute.

【0012】また、本発明は、上記配線基板において、
ランド4自体を凹凸形状に形成して構成する。
Further, the present invention provides the above wiring board,
The land 4 itself is formed to have an uneven shape.

【0013】[0013]

【作用】上述の本発明の第1の構成によれば、ランド4
上に凹凸形状の導体層(半田層6)を設けるようにした
ので、従来の半球形状の半田の場合と異なり、電子部品
Cを、その接続部(バンプ10)を導体層6にて囲むよ
うにして実装することができる。従って、電子部品Cの
実装時において、電子部品Cの位置がずれるということ
が回避され、また、リフロー処理において、電子部品C
がランド4上を移動するという現象も回避される。もち
ろん搬送時における電子部品Cの位置ずれも防止するこ
とができる。
According to the first configuration of the present invention described above, the land 4
Since the uneven conductor layer (solder layer 6) is provided on the upper surface of the electronic component C, the conductor layer 6 surrounds the connecting portion (bump 10) of the electronic component C, unlike the conventional hemispherical solder. Can be implemented. Therefore, it is possible to prevent the position of the electronic component C from being displaced when the electronic component C is mounted, and to prevent the electronic component C from being reflowed.
The phenomenon that the vehicle moves on the land 4 is also avoided. Of course, it is possible to prevent the position shift of the electronic component C during transportation.

【0014】また、ランド4上に形成される導体層6が
凹凸形状を有しているため、この導体層6を、電子部品
Cをランド4に対して位置決めする際の位置決め用マー
クとして利用することができる。即ち、例えば画像処理
にてランド4の位置を探る場合、導体層6が凹凸形状と
なっているため、ランド4の位置を認識し易い。そのた
め、導体層6自体を位置決め用マークとして有効に利用
することができる。従って、本発明の場合、電子部品C
をランド4に高精度に実装することが可能となる。
Since the conductor layer 6 formed on the land 4 has an uneven shape, the conductor layer 6 is used as a positioning mark when the electronic component C is positioned with respect to the land 4. be able to. That is, for example, when the position of the land 4 is searched for by image processing, the position of the land 4 is easily recognized because the conductor layer 6 has an uneven shape. Therefore, the conductor layer 6 itself can be effectively used as a positioning mark. Therefore, in the case of the present invention, the electronic component C
Can be mounted on the land 4 with high accuracy.

【0015】また、通常、電子部品Cの接続部(バンプ
10)には、その高さに製造上のばらつきがあるが、電
子部品Cの実装時、凹凸形状の導体層6にてそのばらつ
きを吸収することができるため、配線基板のランド4と
電子部品Cの接続部(バンプ10)間における半田付け
不良は生じ難くなる。
In general, the height (height) of the connecting portion (bump 10) of the electronic component C varies due to manufacturing. However, when the electronic component C is mounted, the unevenness is caused by the uneven conductor layer 6. Since it can be absorbed, soldering failure between the land 4 of the wiring board and the connection portion (bump 10) of the electronic component C is less likely to occur.

【0016】このようなことから、本発明に係る配線基
板によれば、電子部品Cを実装する際において、電子部
品Cの位置ずれを引き起こすことなく、かつ半田付け不
良を発生させることなく、電子部品Cを良好に実装する
ことができ、電子部品Cを実装した配線基板の信頼性を
大幅に向上させることができる。
From the above, according to the wiring board of the present invention, when the electronic component C is mounted, the electronic component C is not displaced and the soldering failure does not occur. The component C can be mounted well, and the reliability of the wiring board on which the electronic component C is mounted can be significantly improved.

【0017】また、上述の本発明の第2の構成によれ
ば、ランド4自体を凹凸形状に形成するようにしたの
で、ランド4上に形成される半田層6の形状も、ランド
4の形状を反映して凹凸形状となる。従って、この構成
においても、上記第1の構成と同様に、電子部品Cを実
装する際において、電子部品Cの位置ずれを引き起こす
ことなく、かつ半田付け不良を発生させることなく、電
子部品Cを良好に実装することができ、電子部品Cを実
装した配線基板の信頼性を大幅に向上させることができ
る。
Further, according to the above-mentioned second structure of the present invention, since the land 4 itself is formed in an uneven shape, the shape of the solder layer 6 formed on the land 4 is also the shape of the land 4. Is reflected to form an uneven shape. Therefore, also in this configuration, similarly to the first configuration, when the electronic component C is mounted, the electronic component C is prevented from being displaced and the soldering failure is not caused. It can be mounted well, and the reliability of the wiring board on which the electronic component C is mounted can be significantly improved.

【0018】[0018]

【実施例】以下、図1〜図8を参照しながら本発明の実
施例を説明する。図1は、第1実施例に係る配線基板の
要部(電子部品の接続部分)を示す構成図である。
Embodiments of the present invention will be described below with reference to FIGS. FIG. 1 is a configuration diagram showing a main part (a connection part of an electronic component) of a wiring board according to the first embodiment.

【0019】この配線基板は、絶縁性基材1上に導体層
をパターニングして形成された配線パターン2を有する
と共に、その所要箇所において、導電化されたスルーホ
ール3を有し、特に、チップ部品実装部分において、上
記配線パターン2から延びる多数のランド(図示の例で
はランドを代表的に1つで示す)4が同じく導体層にて
形成されている。尚、このランド4以外の部分(スルー
ホール3を含む)にはソルダーレジスト5が被覆されて
いる。
This wiring board has a wiring pattern 2 formed by patterning a conductor layer on an insulating base material 1 and conductive through-holes 3 at required positions thereof. In the component mounting portion, a large number of lands (in the illustrated example, one land is representatively shown as one) 4 extending from the wiring pattern 2 are also formed of a conductor layer. A portion other than the land 4 (including the through hole 3) is covered with a solder resist 5.

【0020】しかして、本例においては、露出するラン
ド4上に凹凸形状を有する半田層6が形成されて構成さ
れている。この凹凸形状は、例えば図2Aに示すよう
に、外形が平面矩形状となされた半田層6において、そ
の左右両側に2つの凸部(斜線で示す)6aを設け、中
央に凹部6bを設けた形状にしてもよいし、図2Bに示
すように、平面L字状の凸部6aを設け、そのL字状の
内側2辺にて凹部6bの一部を囲むように形成してもよ
い。また、図2Cに示すように、中央の凹部6bを平面
枠状に形成された凸部6aにて囲むように形成してもよ
い。
In this example, however, the solder layer 6 having an uneven shape is formed on the exposed land 4. 2A, for example, as shown in FIG. 2A, in the solder layer 6 having a rectangular outer shape, two convex portions (indicated by diagonal lines) 6a are provided on both left and right sides thereof, and a concave portion 6b is provided in the center. It may be shaped, or as shown in FIG. 2B, a planar L-shaped convex portion 6a may be provided and two concave L-shaped inner sides may surround a part of the concave portion 6b. Further, as shown in FIG. 2C, the central concave portion 6b may be formed so as to be surrounded by the convex portion 6a formed in a planar frame shape.

【0021】尚、ランド4(及び半田層6)の外形形状
は、上記矩形のほか、円形でもよく限定されるものでは
ない。また、半田層6の凹凸形状も、図2で示した例
は、ほんの一例に過ぎず、種々の形状が考えられる。
The outer shape of the land 4 (and the solder layer 6) is not limited to the above-mentioned rectangular shape and may be a circular shape. Also, the uneven shape of the solder layer 6 is only an example in the example shown in FIG. 2, and various shapes are conceivable.

【0022】次に、上記第1実施例に係る配線基板の形
成方法の一例を図3及び図4に基いて説明する。尚、図
1と対応するものについては同符号を記す。
Next, an example of the method of forming the wiring board according to the first embodiment will be described with reference to FIGS. The same reference numerals are given to those corresponding to FIG.

【0023】まず、図3Aに示すように、絶縁性基材1
の両面に銅箔7が形成された銅張り基板8を用意し、こ
の銅張り基板8の所要位置にスルーホール3を穿設す
る。その後、この銅張り基板8に、無電界めっき及び銅
めっきを施して、スルーホール3を含む全面に銅めっき
層9を形成する。その後、銅めっき層9及びその下層の
銅箔7をパターニングして、絶縁性基材1上に配線パタ
ーン2と該配線パターン2から延びるランド4を形成す
る。
First, as shown in FIG. 3A, the insulating base material 1
A copper-clad substrate 8 having copper foils 7 formed on both surfaces thereof is prepared, and through holes 3 are formed at required positions of the copper-clad substrate 8. Then, electroless plating and copper plating are applied to the copper-clad substrate 8 to form a copper plating layer 9 on the entire surface including the through holes 3. Then, the copper plating layer 9 and the copper foil 7 below it are patterned to form the wiring pattern 2 and the land 4 extending from the wiring pattern 2 on the insulating base material 1.

【0024】次に、図3Bに示すように、ランド4を除
いた部分の全面にソルダーレジスト5を形成する。その
後、露出するランド4上に選択的に半田層6bをコーテ
ィングする。
Next, as shown in FIG. 3B, a solder resist 5 is formed on the entire surface except the land 4. Then, the exposed land 4 is selectively coated with the solder layer 6b.

【0025】次に、図3Cに示すように、ランド4上に
形成された半田層6bの表面中、その一部のみにレジス
ト膜9を形成する。その後、露出する半田層6b上に例
えば半田鍍金、Dip等で半田層6aをコーティングす
る。ここで、半田層6aの部分が凸部、レジスト膜下に
おける半田層6bの部分が凹部となる。
Next, as shown in FIG. 3C, a resist film 9 is formed only on a part of the surface of the solder layer 6b formed on the land 4. After that, the solder layer 6a is coated on the exposed solder layer 6b by, for example, solder plating or Dip. Here, the portion of the solder layer 6a becomes a convex portion, and the portion of the solder layer 6b below the resist film becomes a concave portion.

【0026】次に、図4に示すように、上記半田層6b
上のレジスト膜9を剥離して第1実施例に係る配線基板
を得る。
Next, as shown in FIG. 4, the solder layer 6b is formed.
The upper resist film 9 is peeled off to obtain the wiring board according to the first embodiment.

【0027】この第1実施例によれば、ランド4上に凹
凸形状の半田層6を設けるようにしたので、従来の半球
形状の半田の場合と異なり、図1に示すように、バンプ
付き半導体チップCを、そのバンプ10を半田層6にて
囲むようにして実装することができる。従って、半導体
チップCの実装時において、半導体チップCの位置がず
れるということが回避され、また、リフロー処理におい
て、半導体チップCがランド4上を移動するという現象
も回避される。もちろん搬送時における半導体チップC
の位置ずれも防止することができる。
According to the first embodiment, since the uneven solder layer 6 is provided on the land 4, unlike the conventional hemispherical solder, as shown in FIG. The chip C can be mounted by surrounding the bump 10 with the solder layer 6. Therefore, it is possible to prevent the position of the semiconductor chip C from being displaced when the semiconductor chip C is mounted, and to avoid the phenomenon that the semiconductor chip C moves on the land 4 in the reflow process. Of course, semiconductor chip C during transportation
It is also possible to prevent the position shift of.

【0028】また、ランド4上に形成される半田層6が
凹凸形状を有しているため、この半田層6を、半導体チ
ップCをランド4に対して位置決めする際の位置決め用
マークとして利用することができる。即ち、例えば画像
処理にてランド4の位置を探る場合、ランド4の上層に
形成された半田層6が凹凸形状となっているため、ラン
ド4の位置を認識し易い。そのため、半田層6自体を位
置決め用マークとして有効に利用することができる。従
って、上記第1実施例に係る配線基板の場合、半導体チ
ップCをランド4に高精度に実装することが可能とな
る。
Since the solder layer 6 formed on the land 4 has an uneven shape, this solder layer 6 is used as a positioning mark when the semiconductor chip C is positioned with respect to the land 4. be able to. That is, for example, when the position of the land 4 is searched by image processing, the position of the land 4 is easily recognized because the solder layer 6 formed on the upper layer of the land 4 has an uneven shape. Therefore, the solder layer 6 itself can be effectively used as a positioning mark. Therefore, in the case of the wiring board according to the first embodiment, the semiconductor chip C can be mounted on the land 4 with high accuracy.

【0029】また、通常、半導体チップCのバンプ10
には、その高さに製造上のばらつきがあるが、半導体チ
ップCの実装時、凹凸形状の半田層6にてそのばらつき
を吸収することができるため、配線基板のランド4と半
導体チップCのバンプ10間における半田付け不良は生
じ難くなる。
In addition, the bump 10 of the semiconductor chip C is usually used.
Although there is a manufacturing variation in the height, the unevenness can be absorbed by the uneven solder layer 6 when the semiconductor chip C is mounted. Therefore, the land 4 of the wiring substrate and the semiconductor chip C can be absorbed. Soldering failure between the bumps 10 is less likely to occur.

【0030】このようなことから、上記第1実施例に係
る配線基板によれば、バンプ付き半導体チップCを実装
する際において、半導体チップCの位置ずれを引き起こ
すことなく、かつ半田付け不良を発生させることなく、
半導体チップCを良好に実装することができ、半導体チ
ップCを実装した配線基板の信頼性を大幅に向上させる
ことができる。
From the above, according to the wiring board of the first embodiment, when the semiconductor chip C with bumps is mounted, the misalignment of the semiconductor chip C is not caused and the soldering failure occurs. Without letting
The semiconductor chip C can be mounted well, and the reliability of the wiring board on which the semiconductor chip C is mounted can be greatly improved.

【0031】上記第1実施例では、ランド4上に凹凸形
状を有する半田層6を形成するようにしたが、次に、ラ
ンド4自体を凹凸形状にした第2実施例について図5〜
図7を参照しながら説明する。尚、図1と対応するもの
については同符号を記す。
In the first embodiment described above, the solder layer 6 having an uneven shape was formed on the land 4, but next, a second embodiment in which the land 4 itself has an uneven shape is shown in FIGS.
This will be described with reference to FIG. The same reference numerals are given to those corresponding to FIG.

【0032】この第2実施例に係る配線基板は、図5に
示すように、ランド4自体が凹凸形状となっている。そ
して、この凹凸形状に形成されたランド4上に半田層6
が形成されて構成されている。半田層6は、下層のラン
ド4の形状をそのまま反映してランド4と同じような凹
凸形状に形成されている。
In the wiring board according to the second embodiment, as shown in FIG. 5, the land 4 itself has an uneven shape. Then, the solder layer 6 is formed on the land 4 formed in the uneven shape.
Are formed and configured. The solder layer 6 is formed in an uneven shape similar to the land 4 by directly reflecting the shape of the lower land 4.

【0033】次に、この第2実施例に係る配線基板の形
成方法を図6及び図7に基いて説明する。
Next, a method of forming the wiring board according to the second embodiment will be described with reference to FIGS. 6 and 7.

【0034】まず、図6Aに示すように、絶縁性基材1
の両面に銅箔7が形成された銅張り基板8を用意し、こ
の銅張り基板8の所要位置にスルーホール3を穿設す
る。その後、この銅張り基板8の銅箔7をパターニング
して、絶縁性基材1上に配線パターン2と該配線パター
ン2から延びるランド4を形成する。
First, as shown in FIG. 6A, the insulating base material 1
A copper-clad substrate 8 having copper foils 7 formed on both surfaces thereof is prepared, and through holes 3 are formed at required positions of the copper-clad substrate 8. Then, the copper foil 7 of the copper-clad substrate 8 is patterned to form the wiring pattern 2 and the land 4 extending from the wiring pattern 2 on the insulating base material 1.

【0035】次に、図6Bに示すように、全面にレジス
ト膜11を形成した後、ランド4上の所要箇所における
レジスト膜11を除去して開口11aを形成する。
Next, as shown in FIG. 6B, after the resist film 11 is formed on the entire surface, the resist film 11 at a desired portion on the land 4 is removed to form an opening 11a.

【0036】次に、図6Cに示すように、無電界めっき
及び銅めっきを施す。このとき、スルーホール3の内壁
及びランド4中、開口11aから露出する部分のみに銅
めっき層9が形成される。
Next, as shown in FIG. 6C, electroless plating and copper plating are applied. At this time, the copper plating layer 9 is formed only on the inner wall of the through hole 3 and the land 4 exposed from the opening 11a.

【0037】次に、図7Aに示すように、レジスト膜1
1を剥離する。このとき、ランド4は、上記図6Cで形
成した銅めっき層9によって、ランド4自体が凹凸形状
に形成された形となる。
Next, as shown in FIG. 7A, the resist film 1
1 is peeled off. At this time, the land 4 has a shape in which the land 4 itself is formed in an uneven shape by the copper plating layer 9 formed in FIG. 6C.

【0038】次に、図7Bに示すように、ランド4を除
いた部分の全面にソルダーレジスト5を形成する。その
後、露出する凹凸形状となされたランド4上に例えば半
田鍍金、Dip等で半田層6をコーティングして第2実
施例に係る配線基板を得る。このとき、この半田層6
は、下層のランド4の形状に沿って凹凸形状に形成され
る。
Next, as shown in FIG. 7B, a solder resist 5 is formed on the entire surface except the land 4. Then, the exposed land 4 having an uneven shape is coated with a solder layer 6 by, for example, solder plating or Dip to obtain a wiring board according to the second embodiment. At this time, the solder layer 6
Are formed in an uneven shape along the shape of the lower land 4.

【0039】この第2実施例によれば、ランド4自体を
凹凸形状に形成するようにしたので、ランド4上に形成
される半田層6の形状も、ランド4の形状を反映して凹
凸形状となる。従って、この例においても、上記第1実
施例と同様に、半導体チップCを実装する際において、
半導体チップCの位置ずれを引き起こすことなく、かつ
半田付け不良を発生させることなく、半導体チップCを
良好に実装することができ、半導体チップCを実装した
配線基板の信頼性を大幅に向上させることができる。
According to the second embodiment, since the land 4 itself is formed in an uneven shape, the shape of the solder layer 6 formed on the land 4 also reflects the shape of the land 4 and is uneven. Becomes Therefore, also in this example, when mounting the semiconductor chip C, as in the first embodiment,
The semiconductor chip C can be satisfactorily mounted without causing the positional displacement of the semiconductor chip C and without causing the soldering failure, and the reliability of the wiring board on which the semiconductor chip C is mounted is significantly improved. You can

【0040】ところで、上記第1実施例及び第2実施例
において、半導体チップCのバンプ10に対応するラン
ド4全てを凹凸形状に形成するようにしても良いが、図
8に示すように、半導体チップCのバンプ10中、コー
ナー部に形成されたバンプ10cに対応するランド4c
(及び半田層6c)のみを凹凸形状に形成するようにし
ても良い。尚、図8において、斜線で示す部分は、凸部
を示す。
By the way, in the first and second embodiments, all the lands 4 corresponding to the bumps 10 of the semiconductor chip C may be formed in an uneven shape. However, as shown in FIG. Lands 4c corresponding to the bumps 10c formed at the corners of the bumps 10 of the chip C
Only (and the solder layer 6c) may be formed in an uneven shape. In addition, in FIG. 8, a hatched portion indicates a convex portion.

【0041】[0041]

【発明の効果】本発明に係る配線基板によれば、電子部
品を実装する際において、電子部品の位置ずれを引き起
こすことなく、かつ半田付け不良を発生させることな
く、電子部品を良好に実装することができる。
According to the wiring board of the present invention, when an electronic component is mounted, the electronic component is satisfactorily mounted without causing displacement of the electronic component and without causing soldering failure. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】第1実施例に係る配線基板の要部(電子部品の
接続部分)を示す構成図。
FIG. 1 is a configuration diagram showing a main part (a connection part of an electronic component) of a wiring board according to a first embodiment.

【図2】半田層の凹凸形状の例を示す平面図。FIG. 2 is a plan view showing an example of an uneven shape of a solder layer.

【図3】第1実施例に係る配線基板の形成方法を示す工
程図(その1)。
FIG. 3 is a process diagram (1) showing the method for forming a wiring board according to the first embodiment.

【図4】第1実施例に係る配線基板の形成方法を示す工
程図(その2)。
FIG. 4 is a process diagram (No. 2) showing the method for forming the wiring board according to the first embodiment.

【図5】第2実施例に係る配線基板の要部(電子部品の
接続部分)を示す構成図。
FIG. 5 is a configuration diagram showing a main part (a connection part of an electronic component) of a wiring board according to a second embodiment.

【図6】第2実施例に係る配線基板の形成方法を示す工
程図(その1)。
FIG. 6 is a process drawing (1) showing a method for forming a wiring board according to a second embodiment.

【図7】第2実施例に係る配線基板の形成方法を示す工
程図(その2)。
FIG. 7 is a process diagram (part 2) showing the method of forming the wiring board according to the second embodiment.

【図8】半導体チップのバンプに対するランド(及び半
田層)の形成パターンの一例を示す平面図。
FIG. 8 is a plan view showing an example of a land (and solder layer) formation pattern for bumps of a semiconductor chip.

【図9】従来例に係る配線基板の要部(電子部品の接続
部分)を示す構成図。
FIG. 9 is a configuration diagram showing a main part (a connection part of an electronic component) of a wiring board according to a conventional example.

【符号の説明】[Explanation of symbols]

1 絶縁性基材 2 配線パターン 3 スルーホール 4 ランド 5 ソルダーレジスト 6 半田層 6a 凸部 6b 凹部 10 バンプ C 半導体チップ 1 Insulating base material 2 wiring pattern 3 through holes 4 lands 5 Solder resist 6 Solder layer 6a convex part 6b recess 10 bumps C semiconductor chip

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 表面に、電子部品が実装されるランドが
形成された配線基板において、 上記ランド上に凹凸形状の導体層を設けたことを特徴と
する配線基板。
1. A wiring board having a land on which an electronic component is mounted is formed on a surface of the wiring board, wherein a conductor layer having an uneven shape is provided on the land.
【請求項2】 表面に、電子部品が実装されるランドが
形成された配線基板において、 上記ランド自体が凹凸形状になっていることを特徴とす
る配線基板。
2. A wiring board having a land on which an electronic component is mounted is formed on a surface thereof, wherein the land itself has an uneven shape.
JP18635591A 1991-07-25 1991-07-25 Wiring board Pending JPH0537146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18635591A JPH0537146A (en) 1991-07-25 1991-07-25 Wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18635591A JPH0537146A (en) 1991-07-25 1991-07-25 Wiring board

Publications (1)

Publication Number Publication Date
JPH0537146A true JPH0537146A (en) 1993-02-12

Family

ID=16186917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18635591A Pending JPH0537146A (en) 1991-07-25 1991-07-25 Wiring board

Country Status (1)

Country Link
JP (1) JPH0537146A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5511306A (en) * 1994-04-05 1996-04-30 Compaq Computer Corporation Masking of circuit board vias to reduce heat-induced board and chip carrier package warp during wavesolder process
US5822856A (en) * 1996-06-28 1998-10-20 International Business Machines Corporation Manufacturing circuit board assemblies having filled vias
KR20020058205A (en) * 2000-12-29 2002-07-12 마이클 디. 오브라이언 Circuit board and semiconductor package using it
JP2009260008A (en) * 2008-04-16 2009-11-05 Nikon Corp Semiconductor device manufacturing device, and method of manufacturing semiconductor device
JP2012027644A (en) * 2010-07-22 2012-02-09 Toppan Forms Co Ltd Manufacturing method of electronic circuit board and electronic circuit board manufactured by the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5511306A (en) * 1994-04-05 1996-04-30 Compaq Computer Corporation Masking of circuit board vias to reduce heat-induced board and chip carrier package warp during wavesolder process
US5822856A (en) * 1996-06-28 1998-10-20 International Business Machines Corporation Manufacturing circuit board assemblies having filled vias
US6127025A (en) * 1996-06-28 2000-10-03 International Business Machines Corporation Circuit board with wiring sealing filled holes
US6138350A (en) * 1996-06-28 2000-10-31 International Business Machines Corporation Process for manufacturing a circuit board with filled holes
KR20020058205A (en) * 2000-12-29 2002-07-12 마이클 디. 오브라이언 Circuit board and semiconductor package using it
JP2009260008A (en) * 2008-04-16 2009-11-05 Nikon Corp Semiconductor device manufacturing device, and method of manufacturing semiconductor device
JP2012027644A (en) * 2010-07-22 2012-02-09 Toppan Forms Co Ltd Manufacturing method of electronic circuit board and electronic circuit board manufactured by the same

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