JPH0534504A - Chemical resistant antireflection film - Google Patents
Chemical resistant antireflection filmInfo
- Publication number
- JPH0534504A JPH0534504A JP3217897A JP21789791A JPH0534504A JP H0534504 A JPH0534504 A JP H0534504A JP 3217897 A JP3217897 A JP 3217897A JP 21789791 A JP21789791 A JP 21789791A JP H0534504 A JPH0534504 A JP H0534504A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- antireflection film
- chemical
- resistant antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000126 substance Substances 0.000 title claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 229910021385 hard carbon Inorganic materials 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 61
- 239000012788 optical film Substances 0.000 claims description 7
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 abstract description 4
- 239000005304 optical glass Substances 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract 2
- 230000002421 anti-septic effect Effects 0.000 abstract 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 description 17
- 239000011521 glass Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 239000007788 liquid Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 9
- 230000000249 desinfective effect Effects 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000645 desinfectant Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- CPKVUHPKYQGHMW-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;molecular iodine Chemical compound II.C=CN1CCCC1=O CPKVUHPKYQGHMW-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229960000587 glutaral Drugs 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229940127554 medical product Drugs 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000028327 secretion Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、洗浄液，消毒液に対し
て耐久性を有する耐薬反射防止膜に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical resistant antireflection film having durability against a cleaning liquid and a disinfecting liquid.
【０００２】[0002]
【従来の技術】近年、化学部品は様々な分野において使
用されるようになってきている。その中でも医療機器に
用いられるレンズ，プリズム等は、医療機器に必要とさ
れる各種の洗浄液，消毒液にさらされても最低限の化学
性能を維持することが要求される。特に、医療用内視鏡
は、生体器官等からの分泌物などがレンズ表面に付着す
るために頻繁に洗浄をする必要がある。2. Description of the Related Art In recent years, chemical parts have come to be used in various fields. Among them, lenses, prisms and the like used in medical equipment are required to maintain the minimum chemical performance even when exposed to various cleaning and disinfecting liquids required for medical equipment. In particular, medical endoscopes need to be washed frequently because secretions from living organs adhere to the lens surface.
【０００３】通常使用される洗浄液，消毒液は、酸性か
らアルカリ性までの幅広い薬品で構成されている。この
ために、従来、内視鏡の先端部等の直接洗浄液にさらさ
れる部分のレンズには、化学的に安定したガラス硝材を
用いるのが一般的であった。一方、通常の反射防止膜
は、空気と接する最表層を低屈折率材料であるＭｇＦ2
やＳｉＯ2 により形成している。ところが、医療機器に
用いられるレンズ等では、ＭｇＦ2 は膜の密度が低いこ
と、ＳｉＯ2 はアルカリ性に弱いことから、洗浄液，消
毒液に侵されて膜がはげ落ちるために、反射防止膜は施
されていなかった。さらに、一般に光学膜として使用さ
れる高屈折率材料は十分な耐薬品を有しておらず、特に
強アルカリ液に対しては膜が侵されるという問題があっ
た。The cleaning liquid and the disinfecting liquid which are usually used are composed of a wide range of chemicals from acidic to alkaline. Therefore, conventionally, a chemically stable glass glass material has been generally used for the portion of the lens such as the tip of the endoscope which is directly exposed to the cleaning liquid. On the other hand, in an ordinary antireflection film, the outermost layer in contact with air is made of a low-refractive-index material MgF 2
And SiO 2 . However, in lenses and the like used in medical equipment, since MgF 2 has a low film density and SiO 2 is weak in alkalinity, the film peels off when it is attacked by a cleaning solution or a disinfectant solution. Was not done. Further, a high refractive index material generally used as an optical film does not have sufficient chemical resistance, and there is a problem that the film is corroded especially against a strong alkaline solution.
【０００４】[0004]
【発明が解決しようとする課題】ところが、少しでも光
学系を細くして小型化を図りたい内視鏡においては、反
射防止膜をレンズに施すことができれば透過光量を増や
すことが可能になり、設計上大いに有利に働く。しか
し、従来は、上述のように内視鏡レンズの先端部分には
反射防止膜が施されておらず、光学性能上や機能上から
の問題があった。However, in an endoscope in which it is desired to make the optical system thinner to make it smaller, the amount of transmitted light can be increased if an antireflection film can be applied to the lens. It has a great advantage in design. However, conventionally, as described above, the tip portion of the endoscope lens is not provided with the antireflection film, and there is a problem in terms of optical performance and function.
【０００５】本発明は、かかる従来の問題点に鑑みてな
されたもので、医療用機器、特に内視鏡に用いられる光
学ガラスレンズに適用でき、洗浄液，消毒液に対して耐
久性を有する耐薬反射防止膜を提供することを目的とす
る。The present invention has been made in view of such conventional problems, and can be applied to medical instruments, particularly optical glass lenses used in endoscopes, and has chemical resistance which is durable against cleaning liquid and disinfecting liquid. It is intended to provide an antireflection film.
【０００６】[0006]
【課題を解決するための手段および作用】空気と接する
最表層をＭｇＦ2 やＳｉＯ2 に形成した一般的な反射防
止膜が、洗浄液，消毒液に侵されて膜が剥離する現象
は、膜と膜との界面またはガラス基板表面と膜との界面
に起因していることが研究の結果判明した。そして、こ
の現象は、ポーラス（密度が低い）な膜の場合に、洗浄
液である酸，アルカリ溶液が膜中を浸透して、膜界面の
不純物を溶融するため、またガラスの主成分である酸化
珪素と反応してガラス基板表面と膜との界面でガラスが
溶融するために生じていることがわかった。このこと
は、同じ条件で同じ膜を酸化珪素の含有率の異なるガラ
ス基板に成膜して比較したところ、明らかに酸化珪素の
含有率の少ないガラス硝材ほど薬品に対する耐久性が高
いこと、および化学的に安定している蒸着材料でも膜密
度が低い物ほど耐久性が低いことを検討した実験の結果
確かめられた。[Means and Actions for Solving the Problems] A general antireflection film having an outermost layer in contact with air formed of MgF 2 or SiO 2 is attacked by a cleaning solution or a disinfectant solution and peeled off. As a result of the research, it is found that it is caused by the interface with the film or the interface between the glass substrate surface and the film. This phenomenon is due to the fact that in the case of a porous (low density) film, an acid or alkali solution, which is a cleaning solution, penetrates into the film and melts impurities at the interface of the film, and the oxidation which is the main component of the glass is caused. It was found that the reaction occurred with silicon and the glass was melted at the interface between the glass substrate surface and the film. This means that when the same film was formed under the same conditions on glass substrates having different silicon oxide contents, a glass glass material having a clearly lower silicon oxide content was found to have higher chemical resistance, and It was confirmed as a result of an experiment that the lower the film density is, the lower the durability is of the vapor deposition material which is stable in terms of physical properties.
【０００７】そこで、上記目的を達成するために、本発
明は、空気と接する最表層を光学膜厚ｎｄが５ｎｍ≦ｎ
ｄ≦３０ｎｍの条件を満足した非晶質硬質カーボン膜に
より形成したものである。Therefore, in order to achieve the above object, according to the present invention, the outermost layer in contact with air has an optical film thickness nd of 5 nm ≦ n.
The amorphous hard carbon film satisfies the condition of d ≦ 30 nm.
【０００８】また、本発明は、基板側の第１層、第３層
にＺｒＯ2 ，Ｔａ2 Ｏ5 ，ＺｒＯ2 ，Ｔａ2 Ｏ5 との混
合物またはＺｒＯ2 とＴｉＯ2 との混合物を積層し、第
２層、第４層にＭｇＦ2 を積層し、第５層に光学膜厚ｎ
ｄが５ｎｍ≦ｎｄ≦３０ｎｍの条件を満足した非晶質硬
質カーボン膜を積層している。In the present invention, the first layer and the third layer on the substrate side are laminated with a mixture of ZrO 2 , Ta 2 O 5 , ZrO 2 , Ta 2 O 5 or a mixture of ZrO 2 and TiO 2. , MgF 2 is laminated on the second layer and the fourth layer, and the optical film thickness n is formed on the fifth layer.
An amorphous hard carbon film satisfying the condition that d is 5 nm ≦ nd ≦ 30 nm is laminated.
【０００９】上記構成では、空気と接する最表層に化学
的に安定であり、耐薬性に優れている非晶質硬質カーボ
ン膜を例えば高周波プラズマ中で成膜するため、洗浄
液、消毒液が膜表面からその下の膜さらにガラス基板に
浸透するのを防ぐことができる。この場合、非晶質硬質
カーボン膜の光学膜厚が３０ｎｍ以上になると膜の吸収
が大きくなり透過率の点で好ましくなく、また、非晶質
硬質カーボン膜の光学膜厚が５ｎｍ以下では保護膜とし
ての機能を有さず、好ましくない。In the above structure, an amorphous hard carbon film, which is chemically stable and has excellent chemical resistance, is formed on the outermost layer in contact with air, for example, in a high frequency plasma. It is possible to prevent the film from penetrating into the film and the glass substrate. In this case, if the optical film thickness of the amorphous hard carbon film is 30 nm or more, absorption of the film becomes large, which is not preferable in terms of transmittance, and if the optical film thickness of the amorphous hard carbon film is 5 nm or less, it is a protective film. It is not preferable because it does not have the function as.
【００１０】また、最表層よりも下層側を高屈折率材料
（ＺｒＯ2 ，Ｔａ2 Ｏ5 ，ＴｉＯ2 ）と低屈折率材料
（ＭｇＦ2 ，）からなる４層構造の多層膜とすることに
より可視光の広い波長領域での反射防止が可能となって
いる。Further, the lower layer side than the outermost layer is a multi-layer film having a four-layer structure composed of a high refractive index material (ZrO 2 , Ta 2 O 5 , TiO 2 ) and a low refractive index material (MgF 2 ,). It is possible to prevent reflection in a wide wavelength range of visible light.
【００１１】[0011]
【実施例１】ＢＫ７ガラス基板を真空蒸着装置のチャン
バー内にセットし、基板温度を２５０℃に設定して排気
を開始した。真空度が１×１０-5Ｔｏｒｒに達したとこ
ろで第１層のＺｒＯ2 を電子銃で表１に示す膜厚となる
まで蒸着した。第２層は電子銃を使った通常の真空蒸着
でＭｇＦ2 層を表１に示す膜厚となるまで蒸着させて成
膜した。以下、同様の手段により第３層のＺｒＯ2 層、
第４層のＭｇＦ2 層をそれぞれ蒸着した。次にガス流動
制御機を使用して真空蒸着装置のチャンバー内にＣＨ4
とＨ2 の混合ガスを導入し、圧力を１×１０-2Ｔｏｒｒ
に設定して５００Ｗ出力の高周波プラズマを発生させて
膜厚１５ｎｍとなるまで第５層の非晶質硬質カーボン膜
を成膜した。Example 1 A BK7 glass substrate was set in a chamber of a vacuum vapor deposition apparatus, the substrate temperature was set to 250 ° C., and evacuation was started. When the degree of vacuum reached 1 × 10 −5 Torr, the first layer of ZrO 2 was vapor-deposited with an electron gun until the film thicknesses shown in Table 1 were obtained. The second layer was formed by ordinary vacuum vapor deposition using an electron gun, by evaporating a MgF 2 layer to a film thickness shown in Table 1. Hereinafter, by the same means, the ZrO 2 layer of the third layer,
A fourth MgF 2 layer was deposited on each. Next, using a gas flow controller, CH 4 was placed in the chamber of the vacuum evaporation system.
Introduce a mixed gas of H 2 and H 2 and adjust the pressure to 1 × 10 -2 Torr.
Then, a high-frequency plasma having an output of 500 W was generated to form a fifth layer of amorphous hard carbon film until the film thickness became 15 nm.
【００１２】[0012]
【表１】 [Table 1]
【００１３】次に、このようにして成膜した試料をステ
リハイドＬ（丸石製薬（株）製）、ソナサイド（Ａｙｅ
ｓｔ Ｌａｂｏｒａｔｏｒｉｅｓ ＩＮＣ製）、イソジ
ン（明治製薬（株）製）、ウェスコダイン（ＡＭＳＣＯ
ＭＥＤＩＣＡＬＰＲＯＤＵＣＴ製）、サイデックス
（ジョンソン・アンド・ジョンソン（株）製）の各洗浄
液に浸漬して耐薬試験を行った。結果を表２に示すが、
本実施例の耐薬反射防止膜はいずれの洗浄液に対しても
全く変化が見られなかった。Next, the sample thus formed was treated with Sterihide L (manufactured by Maruishi Pharmaceutical Co., Ltd.) and Sonacide (Aye).
st Laboratories INC), Isodine (Meiji Pharmaceutical Co., Ltd.), Wescodine (AMSCO)
A chemical resistance test was conducted by immersing the product in each cleaning solution of MEDICAL PRODUCT) and SIDEX (manufactured by Johnson & Johnson Co., Ltd.). The results are shown in Table 2,
The chemical-resistant antireflection film of this example did not change at all with any cleaning solution.
【００１４】[0014]
【表２】 [Table 2]
【００１５】また、本実施例の反射防止膜の反射率特性
を図１に示した。図１は縦軸に反射率を、横軸に波長を
それぞれとったもので、本実施例の耐薬反射防止膜は良
好な反射率特性を有していた。The reflectance characteristics of the antireflection film of this embodiment are shown in FIG. In FIG. 1, the vertical axis represents the reflectance and the horizontal axis represents the wavelength, and the chemical-resistant antireflection film of this example had good reflectance characteristics.
【００１６】[0016]
【実施例２】ＢＫ７ガラス基板を真空蒸着装置のチャン
バー内にセットし、基板温度を２５０℃に設定して排気
を開始した。真空度が１×１０-5Ｔｏｒｒに達したとこ
ろで第１層のＴａ2 Ｏ5 を電子銃で表１に示す膜厚とな
るまで蒸着した。第２層は電子銃を使った通常の真空蒸
着でＭｇＦ2 を表１に示す膜厚となるまで蒸着させて成
膜した。以下、同様の手段により第３層のＴａ2 Ｏ5 、
第４層のＭｇＦ2をそれぞれ蒸着した。次にガス流量制
御機を使用して真空蒸着装置のチャンバー内に、ＣＨ4
とＨ2 の混合ガスを導入し、圧力を１×１０-2Ｔｏｒｒ
に設定して５００Ｗ出力の高周波プラズマを発生させ
て、膜厚１５ｎｍとなるまで第５層の非晶質硬質カーボ
ン膜を成膜した。Example 2 A BK7 glass substrate was set in the chamber of a vacuum vapor deposition apparatus, the substrate temperature was set to 250 ° C., and evacuation was started. When the degree of vacuum reached 1 × 10 −5 Torr, Ta 2 O 5 as the first layer was vapor-deposited with an electron gun until the film thicknesses shown in Table 1 were obtained. The second layer was formed by ordinary vacuum vapor deposition using an electron gun and evaporating MgF 2 to a film thickness shown in Table 1. Hereinafter, by the same means, Ta 2 O 5 of the third layer,
A fourth layer of MgF 2 was deposited respectively. Next, using a gas flow controller, CH 4 was placed in the chamber of the vacuum evaporation system.
Introduce a mixed gas of H 2 and H 2 and adjust the pressure to 1 × 10 -2 Torr.
Then, a high-frequency plasma with an output of 500 W was generated to form a fifth layer of amorphous hard carbon film until the film thickness became 15 nm.
【００１７】このようにして成膜した本実施例の耐薬反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の耐薬反射防止膜
は、５種類の洗浄液に対して全く変化が見られなかっ
た。また、本実施例の耐薬反射防止膜は、実施例１と同
様に図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the chemical-resistant antireflection film of this example thus formed in five kinds of cleaning solutions. As can be seen from Table 2, the chemical-resistant antireflection film of this example did not show any change in the five types of cleaning solutions. Further, the chemical-resistant antireflection film of this example had a good reflectance characteristic as shown in FIG.
【００１８】[0018]
【実施例３】ＢＫ７ガラス基板を真空蒸着装置のチャン
バー内にセットし、基板温度を２５０℃に設定して排気
を開始した。真空度が１×１０-5Ｔｏｒｒに達したとこ
ろでＺｒＯ2 とＴａ2 Ｏ5 を重量比８：２で混合した材
料を電子銃を使って表１に示す膜厚まで蒸着して、第１
層のＺｒＯ2 とＴａ2 Ｏ5 との混合層を成膜した。第２
層は電子銃を使った通常の真空蒸着でＭｇＦ2 を表１に
示す膜厚となるまで蒸着させて成膜した。以下、同様の
手段により第３層のＺｒＯ2 とＴａ2 Ｏ5 の混合層、第
４層のＭｇＦ2 をそれぞれ蒸着した。次にガス流動制御
機を使用して真空蒸着装置のチャンバー内に、ＣＨ4 と
Ｈ2 の混合ガスを導入し、圧力を１×１０-2Ｔｏｒｒに
設定して５００Ｗの高周波プラズマを発生させて、膜厚
１５ｎｍとなるまで第５層の非晶質硬質カーボン膜を成
膜した。Example 3 A BK7 glass substrate was set in the chamber of a vacuum vapor deposition apparatus, the substrate temperature was set to 250 ° C., and evacuation was started. When the degree of vacuum reached 1 × 10 -5 Torr, a material in which ZrO 2 and Ta 2 O 5 were mixed at a weight ratio of 8: 2 was evaporated to a film thickness shown in Table 1 by using an electron gun.
A mixed layer of ZrO 2 and Ta 2 O 5 was deposited. Second
The layer was formed by vapor-depositing MgF 2 by an ordinary vacuum vapor deposition using an electron gun to the film thickness shown in Table 1. Thereafter, a third layer of a mixed layer of ZrO 2 and Ta 2 O 5 and a fourth layer of MgF 2 were deposited by the same method. Next, using a gas flow controller, a mixed gas of CH 4 and H 2 was introduced into the chamber of the vacuum deposition apparatus, the pressure was set to 1 × 10 -2 Torr, and a high-frequency plasma of 500 W was generated. A fifth layer of amorphous hard carbon film was formed until the film thickness became 15 nm.
【００１９】このようにして成膜した本実施例の耐薬反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の耐薬反射防止膜
は、５種類の洗浄液に対して全く変化が見られなかっ
た。また、本実施例の耐薬反射防止膜は、実施例１と同
様に図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the chemical-resistant antireflection film of this example thus formed in five kinds of cleaning solutions. As can be seen from Table 2, the chemical-resistant antireflection film of this example did not show any change in the five types of cleaning solutions. Further, the chemical-resistant antireflection film of this example had a good reflectance characteristic as shown in FIG.
【００２０】[0020]
【実施例４】ＢＫ７ガラス基板を真空蒸着装置のチャン
バー内にセットし、基板温度を２５０℃に設定して排気
を開始した。真空度が１×１０-5Ｔｏｒｒに達したとこ
ろでＺｒＯ2 とＴｉＯ2 を重量比９：１で混合した材料
を電子銃を使って、表１に示す膜厚まで蒸着して、第１
層のＺｒＯ2 とＴｉＯ2 との混合層を成膜した。第２層
は電子銃を使った通常の真空蒸着でＭｇＦ2 層を表１に
示す膜厚となるまで蒸着させて成膜した。以上、同様の
手段により第３層のＺｒＯ2 とＴｉＯ2 の混合層、第４
層のＭｇＦ2 層をそれぞれ蒸着した。次にガス流量制御
機を使用して真空蒸着装置のチャンバー内に、ＣＨ4 と
Ｈ2 の混合ガスを導入し、圧力を１×１０-2Ｔｏｒｒに
設定して５００Ｗ出力の高周波プラズマを発生させて膜
厚１５ｎｍとなるまで第５層の非晶質硬質カーボン膜を
成膜した。Example 4 A BK7 glass substrate was set in the chamber of a vacuum vapor deposition apparatus, the substrate temperature was set to 250 ° C., and evacuation was started. When the degree of vacuum reached 1 × 10 −5 Torr, a material in which ZrO 2 and TiO 2 were mixed at a weight ratio of 9: 1 was vapor-deposited with an electron gun to a film thickness shown in Table 1, and
A mixed layer of ZrO 2 and TiO 2 was deposited. The second layer was formed by ordinary vacuum vapor deposition using an electron gun, by evaporating a MgF 2 layer to a film thickness shown in Table 1. As described above, by the same means, the mixed layer of ZrO 2 and TiO 2 of the third layer, the fourth layer
Each layer of MgF 2 was deposited. Next, using a gas flow controller, a mixed gas of CH 4 and H 2 was introduced into the chamber of the vacuum deposition apparatus, and the pressure was set to 1 × 10 -2 Torr to generate a high-frequency plasma of 500 W output. A fifth layer of amorphous hard carbon film was formed to a thickness of 15 nm.
【００２１】このようにして成膜した本実施例の耐薬反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の耐薬反射防止膜
は、５種類の洗浄液に対して全く変化が見られなかっ
た。また、本実施例の耐薬反射防止膜は、実施例１と同
様に図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the chemical-resistant antireflection film of this example thus formed in five kinds of cleaning solutions. As can be seen from Table 2, the chemical-resistant antireflection film of this example did not show any change in the five types of cleaning solutions. Further, the chemical-resistant antireflection film of this example had a good reflectance characteristic as shown in FIG.
【００２２】[0022]
【発明の効果】以上のように、本発明の耐薬反射防止膜
によれば、洗浄液，消毒液に対して耐久性を有し、膜剥
離を生じることがない。したがって、内視鏡先端レンズ
に反射防止膜を施すことができ、内視鏡画面のコントラ
スト向上、透過光量増加による光学系の精細化による内
視鏡本体の外径の縮小化に大きな効果をもたらす。As described above, according to the chemical resistant antireflection film of the present invention, it has durability against a cleaning liquid and a disinfecting liquid and does not cause film peeling. Therefore, an antireflection film can be applied to the tip lens of the endoscope, which has a great effect on improving the contrast of the endoscope screen and reducing the outer diameter of the endoscope main body by refining the optical system by increasing the amount of transmitted light. .
【図１】本発明の実施例１〜４の耐薬反射防止膜の反射
率特性を示すグラフである。FIG. 1 is a graph showing the reflectance characteristics of the chemical resistant antireflection coatings of Examples 1 to 4 of the present invention.
Claims (2)
ｎｍ≦ｎｄ≦３０ｎｍの条件を満足した非晶質硬質カー
ボン膜により形成したことを特徴とする耐薬反射防止
膜。1. The outermost layer in contact with air has an optical film thickness nd of 5
A chemical-resistant antireflection film formed by an amorphous hard carbon film satisfying the condition of nm ≦ nd ≦ 30 nm.
ａ2 Ｏ5 ，ＺｒＯ2 とＴａ2 Ｏ5 との混合物またはＺｒ
Ｏ2 とＴｉＯ2 との混合物を積層し、第２層、第４層に
ＭｇＦ2 を積層し、第５層に光学膜厚ｎｄが５ｎｍ≦ｎ
ｄ≦３０ｎｍの条件を満足した非晶質硬質カーボン膜を
積層したことを特徴とする耐薬反射防止膜。2. ZrO 2 , T in the first and third layers on the substrate side
a 2 O 5 , a mixture of ZrO 2 and Ta 2 O 5 or Zr
A mixture of O 2 and TiO 2 is laminated, MgF 2 is laminated on the second and fourth layers, and an optical film thickness nd is 5 nm ≦ n on the fifth layer.
A chemical-resistant antireflection film, comprising an amorphous hard carbon film satisfying a condition of d ≦ 30 nm, which is laminated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3217897A JPH0534504A (en) | 1991-08-02 | 1991-08-02 | Chemical resistant antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3217897A JPH0534504A (en) | 1991-08-02 | 1991-08-02 | Chemical resistant antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0534504A true JPH0534504A (en) | 1993-02-12 |
Family
ID=16711473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3217897A Withdrawn JPH0534504A (en) | 1991-08-02 | 1991-08-02 | Chemical resistant antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0534504A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2731806A1 (en) * | 1994-03-17 | 1996-09-20 | Lg Electronics Inc | Antireflective layer for display device with high surface resistance |
-
1991
- 1991-08-02 JP JP3217897A patent/JPH0534504A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2731806A1 (en) * | 1994-03-17 | 1996-09-20 | Lg Electronics Inc | Antireflective layer for display device with high surface resistance |
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| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
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