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JPH05339787A - Continuous electroplating method - Google Patents

Continuous electroplating method

Info

Publication number
JPH05339787A
JPH05339787A JP15251092A JP15251092A JPH05339787A JP H05339787 A JPH05339787 A JP H05339787A JP 15251092 A JP15251092 A JP 15251092A JP 15251092 A JP15251092 A JP 15251092A JP H05339787 A JPH05339787 A JP H05339787A
Authority
JP
Japan
Prior art keywords
steel plate
roll
rolls
conductor
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15251092A
Other languages
Japanese (ja)
Inventor
Seiichi Takahashi
誠一 高橋
Akio Sakurai
昭雄 桜井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP15251092A priority Critical patent/JPH05339787A/en
Publication of JPH05339787A publication Critical patent/JPH05339787A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To obtain the uniform distribution of plating amount and an alloy composition by alternately arranging conductor rolls and back-up rolls at the upper and lower surface sides of a steel plate to be plated, thereby correcting the camber in the transverse direction of the steel plate. CONSTITUTION:The steel plate 3 is electroplated with anodes 4 by alternately arranging conductor rolls 1a to 1k and back-up rolls 2a to 2k at the upper and lower surface sides of the steel plate 3. Cambers in the steel plate 3 are made to be slightly upward and slightly downward successively from an entrance side cell and influence by cambers is cancelled as the whole of the cell strings.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、水平型電気めっきセル
列による連続電気めっき方法に係り、詳しくは通電ロー
ルとバックアップロールの使用方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous electroplating method using a horizontal electroplating cell array, and more particularly to a method of using a current-carrying roll and a backup roll.

【0002】[0002]

【従来の技術】水平型電気めっきで、横型セルを用いて
鋼板にめっきを施す場合には、図3に示す如く、鋼板3
をコンダクタロール1と表面をゴム又は樹脂等で構成し
たバックアップロール2とで挟み、コンダクタロール1
に鋼板3を接触させて移動せしめて、通電めっきを行
う。この際、ロール交換が便利なように、コンダクタロ
ール1を鋼板3の上面側に配置していた。
2. Description of the Related Art In horizontal electroplating, when a steel sheet is plated using a horizontal type cell, as shown in FIG.
Is sandwiched between a conductor roll 1 and a backup roll 2 whose surface is made of rubber, resin, or the like.
The steel plate 3 is brought into contact with and moved to perform electroplating. At this time, the conductor roll 1 is arranged on the upper surface side of the steel plate 3 for the convenience of roll replacement.

【0003】しかし、バックアップロール2は、液切
り、水切り機能を重視することから、ゴムまたは樹脂系
の弾性特性を重んじ、従来はゴム硬度(JIS K-7215)でせ
いぜい40°までであった。このため、コンダクタロール
1の圧下により鋼板3がバックアップロール2に沈み込
み、鋼板3に幅方向の反り(以下C反りという)5が発
生していた。図中4はアノードである。
However, since the backup roll 2 attaches importance to the liquid draining function and the water draining function, it emphasizes the elastic characteristics of rubber or resin system, and conventionally, the rubber hardness (JIS K-7215) is up to 40 ° at most. Therefore, the steel plate 3 sinks into the backup roll 2 due to the reduction of the conductor roll 1, and the steel plate 3 is warped in the width direction (hereinafter, referred to as C warpage) 5. In the figure, 4 is an anode.

【0004】図4はC反り発生のメカニズムを示す図で
ある。コンダクタロール1の圧下により、鋼板3にL反
りが発生し、これにセル内の張力が加わる。これによ
り、鋼板3が伸ばされ、鋼板3の下面に圧縮応力、上面
に引張応力が生じ、これを解放する方向に鋼板3が反
り、C反りが発生する。この鋼板のC反りにより、幅方
向のめっき付着量、合金比率分布が均一とならないとい
う問題があった。
FIG. 4 is a diagram showing the mechanism of C warpage. Due to the reduction of the conductor roll 1, L-warp is generated in the steel plate 3, and tension in the cell is applied to this. As a result, the steel plate 3 is stretched, a compressive stress is generated on the lower surface of the steel plate 3, and a tensile stress is generated on the upper surface thereof, and the steel plate 3 warps in the direction of releasing the stress and C-warp occurs. Due to the C warpage of the steel sheet, there was a problem that the coating amount in the width direction and the alloy ratio distribution were not uniform.

【0005】図5に、C反りによるめっき付着量分布、
合金比率分布の例を示す。従来、この問題を解決する方
法としては、バックアップロールの硬度を上げ、鋼板
の沈み込みを防止する方法、めっきセル入側にテンシ
ョンレベラを設け、セル入側で逆方向の反りを与える方
法等が用いられていた。
FIG. 5 shows the distribution of the amount of plating adhered due to C warpage,
An example of alloy ratio distribution is shown. Conventionally, as a method for solving this problem, there is a method of increasing the hardness of the backup roll to prevent the steel sheet from sinking, a method of providing a tension leveler on the plating cell entry side and giving a warp in the opposite direction on the cell entry side. Was used.

【0006】[0006]

【発明が解決しようとする課題】しかし、上記のの方
法では、板厚の異なる溶接点が通過する時にスパークが
生じる問題があり実用化は難しかった。またの方法で
は、効果は入側の数セルに限られ、今日のように10〜20
台のめっきセルが並ぶような場合には、その効果は期待
できない。
However, in the above method, there is a problem that a spark occurs when a welding point having a different plate thickness passes, and it is difficult to put it into practical use. With the other method, the effect is limited to a few cells on the ingress side, and it is 10 to 20 as in today.
The effect cannot be expected when the plating cells on the table are arranged side by side.

【0007】本発明は、このような問題を解決した水平
型電気めっきセルを用いた連続電気めっき方法を提供す
ることを目的とする。
An object of the present invention is to provide a continuous electroplating method using a horizontal electroplating cell which solves the above problems.

【0008】[0008]

【課題を解決するための手段】本発明は、被めっきスト
リップ鋼板をコンダクタロールとバックアップロール間
に挟持して通板する水平型電気めっきセルにおいて、コ
ンダクタロールとバックアップロールを被めっき鋼板の
上下面側に交互に配置しコンダクタロールとバック ア
ップロールの挟持によって生じる被めっき鋼板の幅方向
の反りを、後続のコンダクタロールとバックアップロー
ルの挟持によって矯正することを特徴とする連続電気め
っき方法である。
The present invention relates to a horizontal electroplating cell in which a strip steel sheet to be plated is sandwiched between a conductor roll and a backup roll and passed through, and the conductor roll and the backup roll are provided on the upper and lower surfaces of the steel sheet to be plated. The continuous electroplating method is characterized in that the warp in the width direction of the steel sheet to be plated, which is alternately arranged on the side and is caused by the sandwiching of the conductor roll and the backup roll, is corrected by sandwiching the subsequent conductor roll and the backup roll.

【0009】[0009]

【作用】本発明によれば、コンダクタロールを入側セル
より順に鋼板の上面側、次のセルでは下面側と交互に配
置してそれぞれのコンダクタロールの圧下力を適正に調
節することにより、鋼板のC反りも入側セルより順にわ
ずかの上反り、わずかの下反りとなり、めっきセル列全
体としては、隣接するセルの反りの影響が相殺され幅方
向に付着量及び合金比率の均一なめっきを施すことがで
きる。
According to the present invention, the conductor rolls are alternately arranged on the upper surface side of the steel sheet from the entry side cell and on the lower surface side of the next cell, and the rolling force of each conductor roll is appropriately adjusted, whereby the steel sheet is The C-curve also has a slight upward warp and a slight downward warp in order from the entry side cell, and the effect of the warp of the adjacent cells is canceled out for the entire plating cell row, and a uniform coating amount and alloy ratio are applied in the width direction. Can be given.

【0010】すなわち、同一方向の巻きぐせが重畳され
ることがないので、C反り量は軽微であり、実質的に無
害なレベルにとどまる。なお、このような配置をした場
合、交換頻度の高いコンダクタロールが鋼板の下面側に
なるという問題はあるが、この点に関しては、ロールを
横抜きすることにより解決できる。
That is, since the curl in the same direction is not overlapped, the amount of C warpage is slight and remains substantially harmless. In addition, in the case of such an arrangement, there is a problem that the conductor roll, which is frequently exchanged, is on the lower surface side of the steel sheet, but this problem can be solved by horizontally pulling out the roll.

【0011】なお本発明と類似の構成になるめっき装置
が特開平4ー74896号公報に開示されているが、上
記特許では、単に表裏の光沢差をなくすことのみが述べ
られているに過ぎず、本願のC反り矯正にまでは到って
いない。
A plating apparatus having a structure similar to that of the present invention is disclosed in Japanese Patent Application Laid-Open No. 4-74896, but the above patent merely mentions that the difference in gloss between the front and the back is eliminated. However, the C warpage correction of the present application has not been reached yet.

【0012】[0012]

【実施例】本発明の一実施例を図面に基づいて説明す
る。図1は、本発明に用いるめっきセル列の一例を示す
配置図である。この例はセル数が10基の場合であるが、
本発明はこれに限るものではなく、セル数が2基以上で
あれば、いくらでもよい。
An embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a layout diagram showing an example of a plating cell array used in the present invention. In this example, the number of cells is 10, but
The present invention is not limited to this, and may be any number as long as the number of cells is two or more.

【0013】図1において、1a〜1kはコンダクタロ
ール、2a〜2kはバックアップロールであり、コンダ
クタロール1a〜1kとバックアップロール2a〜2k
が鋼板3の上下面側に交互に配置されている。4はアノ
ードであるこの配置にてそれぞれのコンダクタロールの
圧下力を適正に調節することにより、セル内のC反りの
方向は交互にわずかの上反り、わずかの下反りとなり、
付着量分布、合金比率分布は各セル毎にはわずかに生ず
るものの、隣接するセルの間で相殺されめっき層全体と
しては均一にすることができる。
In FIG. 1, 1a to 1k are conductor rolls, 2a to 2k are backup rolls, and conductor rolls 1a to 1k and backup rolls 2a to 2k.
Are alternately arranged on the upper and lower surfaces of the steel plate 3. No. 4 is the anode. By properly adjusting the rolling force of each conductor roll in this arrangement, the direction of C-warp in the cell alternates slightly upward and downward,
Although the adhesion amount distribution and the alloy ratio distribution slightly occur in each cell, they are canceled out by the adjacent cells and can be made uniform as a whole plating layer.

【0014】次に、図2に本発明によりめっきした場合
の幅方向付着量分布、合金比率分布の測定例を示す。本
発明の場合は、前述の図5に示した従来例に比べて、付
着量及び合金比率の幅方向分布が格段に均一になったこ
とがわかる。
Next, FIG. 2 shows an example of measurement of the deposition amount distribution in the width direction and the alloy ratio distribution in the case of plating according to the present invention. In the case of the present invention, it can be seen that the distribution in the width direction of the adhesion amount and the alloy ratio is remarkably uniform as compared with the conventional example shown in FIG.

【0015】[0015]

【発明の効果】以上説明したように、本発明により、幅
方向に均一なめっき付着量分布及び合金組成分布が得ら
れる。
As described above, according to the present invention, a uniform coating amount distribution and alloy composition distribution in the width direction can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に用いる装置の一例を示す配置図であ
る。
FIG. 1 is a layout view showing an example of an apparatus used in the present invention.

【図2】本発明による幅方向のめっき付着量及び合金比
率の例を示すグラフである。
FIG. 2 is a graph showing an example of a plating adhesion amount and an alloy ratio in the width direction according to the present invention.

【図3】従来の水平電気めっきセルにおけるC反りを示
す説明図である。
FIG. 3 is an explanatory diagram showing C warpage in a conventional horizontal electroplating cell.

【図4】C反りの発生メカニズムの説明図である。FIG. 4 is an explanatory diagram of a mechanism of occurrence of C warpage.

【図5】従来の幅方向のめっき付着量及び合金比率の例
を示すグラフである。
FIG. 5 is a graph showing an example of a conventional coating amount and alloy ratio in the width direction.

【符号の説明】[Explanation of symbols]

1 コンダクタロール 2 バックアップロール 3 鋼板 4 アノード 5 C反り 1 Conductor roll 2 Backup roll 3 Steel plate 4 Anode 5 C Warpage

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 被めっきストリップ鋼板をコンダクタロ
ールとバックアップロール間に挟持して通板する水平型
電気めっきセルにおいて、コンダクタロールとバックア
ップロールを被めっき鋼板の上下面側に交互に配置しコ
ンダクタロールとバックアップロールの挟持によって生
じる被めっき鋼板の幅方向の反りを、後続のコンダクタ
ロールとバックアップロールの挟持によって矯正するこ
とを特徴とする連続電気めっき方法。
1. A horizontal type electroplating cell in which a strip steel sheet to be plated is sandwiched between a conductor roll and a backup roll to pass through, and conductor rolls and backup rolls are alternately arranged on the upper and lower surfaces of the steel sheet to be plated. A continuous electroplating method characterized in that the warp in the width direction of the steel sheet to be plated caused by the sandwiching of the backup roll and the backup roll is corrected by sandwiching the subsequent conductor roll and the backup roll.
JP15251092A 1992-06-11 1992-06-11 Continuous electroplating method Pending JPH05339787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15251092A JPH05339787A (en) 1992-06-11 1992-06-11 Continuous electroplating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15251092A JPH05339787A (en) 1992-06-11 1992-06-11 Continuous electroplating method

Publications (1)

Publication Number Publication Date
JPH05339787A true JPH05339787A (en) 1993-12-21

Family

ID=15542033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15251092A Pending JPH05339787A (en) 1992-06-11 1992-06-11 Continuous electroplating method

Country Status (1)

Country Link
JP (1) JPH05339787A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231772A (en) * 2001-02-05 2002-08-16 Shindo Denshi Kogyo Kk Warping correction method of tab tape carrier
JP2007016316A (en) * 2005-07-08 2007-01-25 Hoellmueller Maschinenbau Gmbh Apparatus and process for electrolytically treating of foils from roller to roller

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231772A (en) * 2001-02-05 2002-08-16 Shindo Denshi Kogyo Kk Warping correction method of tab tape carrier
JP2007016316A (en) * 2005-07-08 2007-01-25 Hoellmueller Maschinenbau Gmbh Apparatus and process for electrolytically treating of foils from roller to roller

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