JPH05311479A - Formation of resin coating film - Google Patents
Formation of resin coating filmInfo
- Publication number
- JPH05311479A JPH05311479A JP3212678A JP21267891A JPH05311479A JP H05311479 A JPH05311479 A JP H05311479A JP 3212678 A JP3212678 A JP 3212678A JP 21267891 A JP21267891 A JP 21267891A JP H05311479 A JPH05311479 A JP H05311479A
- Authority
- JP
- Japan
- Prior art keywords
- curable resin
- transfer
- silicon pad
- pad
- transferred
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 73
- 239000011347 resin Substances 0.000 title claims abstract description 73
- 239000011248 coating agent Substances 0.000 title claims description 5
- 238000000576 coating method Methods 0.000 title claims description 5
- 230000015572 biosynthetic process Effects 0.000 title description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 51
- 239000010703 silicon Substances 0.000 claims abstract description 51
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 50
- 238000012546 transfer Methods 0.000 claims abstract description 39
- 238000010894 electron beam technology Methods 0.000 claims abstract description 12
- 238000010023 transfer printing Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 21
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 description 32
- 238000001723 curing Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 15
- 238000005323 electroforming Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- 238000013518 transcription Methods 0.000 description 2
- 230000035897 transcription Effects 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- QLOKJRIVRGCVIM-UHFFFAOYSA-N 1-[(4-methylsulfanylphenyl)methyl]piperazine Chemical compound C1=CC(SC)=CC=C1CN1CCNCC1 QLOKJRIVRGCVIM-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- JLQFVGYYVXALAG-CFEVTAHFSA-N yasmin 28 Chemical compound OC1=CC=C2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1.C([C@]12[C@H]3C[C@H]3[C@H]3[C@H]4[C@@H]([C@]5(CCC(=O)C=C5[C@@H]5C[C@@H]54)C)CC[C@@]31C)CC(=O)O2 JLQFVGYYVXALAG-CFEVTAHFSA-N 0.000 description 1
Landscapes
- Dry Shavers And Clippers (AREA)
Abstract
(57)【要約】
【目的】 被転写体の表面にパターンや文字のような独
立した模様体を形成するに際し、転写印刷用のシリコン
パッドで凹版から紫外線もしくは電子線硬化性樹脂を拾
い上げて該硬化性樹脂を被転写体に高精度にかつ確実に
転写する。
【構成】 転写印刷用シリコンパッド5のパッド面に未
硬化状態の紫外線もしくは電子線硬化性樹脂8を当接さ
せた状態で、該硬化性樹脂8をシリコンパッド5の接触
面側から紫外線もしくは電子線を照射して半硬化させ
る。次にシリコンパッド5で該硬化性樹脂8を被転写体
表面に転移させる。転移後に紫外線もしくは電子線を照
射して該硬化性樹脂8を完全硬化させる。
(57) [Abstract] [Purpose] When forming an independent pattern such as a pattern or letters on the surface of a transfer target, pick up ultraviolet ray or electron beam curable resin from the intaglio with a silicon pad for transfer printing. The curable resin is transferred to the transferred body with high accuracy and reliability. [Structure] In a state where an uncured ultraviolet ray or electron beam curable resin 8 is brought into contact with the pad surface of the transfer printing silicon pad 5, the curable resin 8 is exposed to ultraviolet rays or electrons from the contact surface side of the silicon pad 5. Irradiate a ray to semi-cure. Next, the curable resin 8 is transferred to the surface of the transfer target with the silicon pad 5. After the transfer, the curable resin 8 is completely cured by irradiation with ultraviolet rays or electron beams.
Description
【0001】[0001]
【産業上の利用分野】本発明は、被転写体の表面にパタ
ーンや文字のような独立した模様体を樹脂塗膜で形成す
るに際し、被転写体表面に対して転写用シリコンパッド
で該樹脂塗膜を高精度にかつ簡単確実に転写する方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the formation of an independent pattern body such as a pattern or a character with a resin coating film on the surface of a transferred material, using a transfer silicon pad for the surface of the transferred material. The present invention relates to a method for transferring a coating film with high accuracy, easily and surely.
【0002】[0002]
【従来の技術】例えば、図6は電気かみそりにおけるド
ーム形の網目状外刃を電鋳法により製造する従来工程を
示しており、そこではまず図6(a)に示すごとく平板
状の電鋳母材1の表面に紫外線硬化性樹脂8を均一に塗
布する。ついで図6(b)に示すごとくこの硬化性樹脂
8の上にシャドウマスク16をのせて焼付、現像の各処
理を施し、硬化性樹脂8による電気絶縁膜4を形成する
(図6(c)参照)。電気絶縁膜4が形成された電鋳母
材1をプレスで絞り加工して図6(d)に示すごとく所
定のドーム形状の電鋳母型2を形成する。ついで、図6
(e)に示すごとく電鋳母型2の電気絶縁膜4によって
覆われていない表面に、断面がほぼ円弧状の一次電着層
9を形成し、この一次電着層9の表面に剥離層を形成し
たのち、二次電着を行って網目状外刃となる二次電着層
11を形成する(図6(f)参照)。最後に二次電着層
11を剥離して、図2に示すごとく毛導入孔13と、毛
導入孔13を囲み下面にカウンターシンク15が形成さ
れた断面逆皿形の連続リブ14とを有するドーム形の網
目状外刃12を得ていた。2. Description of the Related Art For example, FIG. 6 shows a conventional process for producing a dome-shaped mesh outer blade for an electric razor by an electroforming method. First, as shown in FIG. The ultraviolet curable resin 8 is uniformly applied to the surface of the base material 1. Then, as shown in FIG. 6 (b), a shadow mask 16 is placed on the curable resin 8 and subjected to baking and development processes to form an electric insulating film 4 of the curable resin 8 (FIG. 6 (c)). reference). The electroformed base material 1 on which the electric insulating film 4 is formed is drawn by a press to form a predetermined dome-shaped electroformed base die 2 as shown in FIG. 6 (d). Then, Fig. 6
As shown in (e), a primary electrodeposition layer 9 having a substantially arcuate cross section is formed on the surface of the electroforming mold 2 which is not covered with the electrical insulating film 4, and a release layer is formed on the surface of the primary electrodeposition layer 9. After forming, the secondary electrodeposition is performed to form the secondary electrodeposition layer 11 which becomes the mesh outer blade (see FIG. 6 (f)). Finally, the secondary electrodeposition layer 11 is peeled off to have a hair introducing hole 13 as shown in FIG. 2 and a continuous rib 14 having an inverted dish-shaped cross section surrounding the hair introducing hole 13 and having a counter sink 15 formed on the lower surface. The dome-shaped mesh-shaped outer blade 12 was obtained.
【0003】[0003]
【発明が解決しようとする課題】ここで問題なのは平板
状の電鋳母材1に電気絶縁膜4を形成したのち、該母材
1を絞り加工してドーム形の電鋳母型2を形成する点で
ある。すなわち、この絞り加工に電鋳母型2の肩部A等
のように伸びの著しい箇所では電気絶縁膜4が延びきれ
ず、このため該当個所に電気絶縁膜4の剥離、きず、ピ
ンホール等が発生し、電着層の形成に悪影響を及ぼして
製品不良が続発するからである。この発明は、かかる観
点からドーム形網目状外刃などの製造工程中における電
気絶縁膜の剥離、きず、ピンホール等の不良を無くすこ
とを目的とする。The problem here is that after forming the electrical insulating film 4 on the flat plate-shaped electroformed base material 1, the base material 1 is drawn to form the dome-shaped electroformed base material 2. It is a point to do. That is, in this drawing process, the electrically insulating film 4 cannot be fully extended at a portion such as the shoulder portion A of the electroformed mother die 2 where the elongation is remarkable, so that the electrically insulating film 4 is peeled off, flaws, pinholes, etc. at the corresponding portions. Is generated, which adversely affects the formation of the electrodeposition layer, and product defects continue. From this point of view, it is an object of the present invention to eliminate defects such as peeling, scratches, and pinholes of the electrical insulating film during the manufacturing process of the dome-shaped mesh outer blade and the like.
【0004】[0004]
【課題を解決するための手段】本発明に係る樹脂塗膜の
形成方法は、転写印刷用シリコンパッド5のパッド面に
未硬化状態の紫外線もしくは電子線硬化性樹脂8を当接
させた状態で、該硬化性樹脂8をシリコンパッド5の接
触面側から紫外線もしくは電子線を照射して半硬化させ
る工程と、シリコンパッド5で該硬化性樹脂8を被転写
体表面に転移させる工程と、転移後に紫外線もしくは電
子線を照射して該硬化性樹脂8を完全硬化させる工程と
からなることを要件とする。According to the method for forming a resin coating film of the present invention, an uncured ultraviolet ray or electron beam curable resin 8 is brought into contact with the pad surface of a transfer printing silicon pad 5. A step of semi-curing the curable resin 8 by irradiating it with ultraviolet rays or an electron beam from the contact surface side of the silicon pad 5, and a step of transferring the curable resin 8 to the surface of the transfer target by the silicon pad 5. The subsequent step is to irradiate ultraviolet rays or electron beams to completely cure the curable resin 8.
【0005】[0005]
【発明の効果】以上のようにした本発明方法によれば、
電鋳母型2をドーム形に形成したのち該母型2の凸形表
面に紫外線もしくは電子線硬化性樹脂による電気絶縁膜
4を形成するので、平板状の母材1に電気絶縁膜4を形
成してからドーム形に絞り加工する従来方法と異なり、
電気絶縁膜4に剥がれ、きず、ピンホール等が発生する
のを皆無にできる。また、電気絶縁膜4の形成に際して
は転写印刷用シリコンパッド5を用いるので、電鋳母型
2の表面が凸曲面状であってもこれに電気絶縁膜4を容
易かつ確実に転写形成できる利点を有する。According to the method of the present invention as described above,
Since the electroformed mother die 2 is formed into a dome shape, and the electrically insulating film 4 made of ultraviolet ray or electron beam curable resin is formed on the convex surface of the mother die 2, the electrically insulating film 4 is formed on the flat base material 1. Unlike the conventional method of forming and then drawing into a dome shape,
It is possible to completely prevent the electric insulating film 4 from being peeled off and causing scratches and pinholes. Further, since the transfer printing silicon pad 5 is used in forming the electric insulating film 4, the electric insulating film 4 can be easily and surely transferred and formed on the surface of the electroformed mold 2 even if the surface is convex. Have.
【0006】[0006]
【実施例】以下、この発明の実施例を図1ないし図5に
基づき説明する。まず、図1(a)に示す平板状の母材
1を用意し、これを図1(b)に示すごとく絞り加工し
て所定ドーム形状の母型2を形成する。ついで図1
(c)に示すごとく電鋳母型2の凸形表面上における網
目状外刃12の毛導入孔13に相当する部分(パター
ン)に、紫外線硬化性樹脂による電気絶縁膜4を形成す
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. First, a flat plate-shaped base material 1 shown in FIG. 1A is prepared, and this is drawn as shown in FIG. 1B to form a predetermined dome-shaped base mold 2. Figure 1
As shown in (c), an electric insulating film 4 made of an ultraviolet curable resin is formed on a portion (pattern) corresponding to the hair introduction hole 13 of the mesh-shaped outer blade 12 on the convex surface of the electroformed mold 2.
【0007】この電気絶縁膜4を形成するには、転写印
刷用シリコンパッド5を用いるが、このさい図3に示す
ごとくSKD(合金工具鋼)等の焼入れ材による凹版6
にエッチング加工等で前記パターンに合致する凹部7を
形成しておき、この凹部7に紫外線硬化性樹脂8を充填
し、図4に示すごとくシリコンパッド5を該凹版6上に
押し付けて紫外線硬化性樹脂8をシリコンパッド5に乗
せる(図5参照)。To form the electric insulating film 4, a transfer printing silicon pad 5 is used. At this time, as shown in FIG. 3, an intaglio plate 6 made of a quenching material such as SKD (alloy tool steel) is used.
A concave portion 7 matching the pattern is formed by etching or the like, and the concave portion 7 is filled with an ultraviolet curable resin 8. The silicon pad 5 is pressed onto the intaglio plate 6 as shown in FIG. The resin 8 is placed on the silicon pad 5 (see FIG. 5).
【0008】しかるのち紫外線硬化性樹脂8を電鋳母型
2の凸形表面に転写して電気絶縁膜4を形成する。この
とき、シリコンパッド5を凹版6上の紫外線硬化性樹脂
8に単に押し付けるだけではシリコンパッド5に紫外線
硬化性樹脂8が十分に乗らないことがある。After that, the ultraviolet curable resin 8 is transferred to the convex surface of the electroforming mold 2 to form the electric insulating film 4. At this time, simply pressing the silicon pad 5 against the ultraviolet curable resin 8 on the intaglio 6 may not sufficiently fill the silicon pad 5 with the ultraviolet curable resin 8.
【0009】そこで図4に示すごとくシリコンパッド5
は紫外線強度の比較的弱い光源10を内蔵していて透光
生を有するものを用意し、このシリコンパッド5を凹版
6上の紫外線硬化性樹脂8に押し付けたときに、該光源
10から紫外線を照射して紫外線硬化性樹脂8のシリコ
ンパッド5との接触面近くを半硬化させて該樹脂8をシ
リコンパッド5に拾い上げる。シリコンパッド5に乗せ
られた状態の紫外線硬化性樹脂8は、その表面が前述の
ように半硬化層となっているが、下層部は未硬化の状態
にある。従って、シリコンパッド5は転写生に優れてい
ることと相まって、その表面が半硬化状態でも紫外線硬
化性樹脂8は電鋳母型2の表面に確実に転移される。Therefore, as shown in FIG. 4, the silicon pad 5 is used.
Prepares a light source 10 having a relatively low ultraviolet intensity and having a light transmitting property. The resin 8 is picked up on the silicon pad 5 by irradiating it to semi-cure the vicinity of the contact surface of the ultraviolet curable resin 8 with the silicon pad 5. The surface of the ultraviolet curable resin 8 placed on the silicon pad 5 is a semi-cured layer as described above, but the lower layer portion is in an uncured state. Therefore, in combination with the excellent transfer of the silicon pad 5, the ultraviolet curable resin 8 is reliably transferred to the surface of the electroforming mold 2 even when the surface thereof is in a semi-cured state.
【0010】特にこの場合、シリコンパッド5を押しつ
けた状態で半硬化させるため、押圧による形くずれを抑
制し、転写時の紫外線硬化性樹脂8の表面はシリコンパ
ッド5の表面精度そのものが現われることになり、後述
する一次・二次電着層面の表面精度を高めることができ
る。しかも上記半硬化により硬化時の収縮を減少せしめ
た後に転写硬化するため、一気に完全硬化させる場合に
比して、硬化収縮による被転写体からの剥離や、応力割
れ、あるいは被転写体が薄物の場合の縮み、変形をも抑
制できる。In this case, in particular, since the silicon pad 5 is semi-cured while being pressed, deformation of the shape due to pressing is suppressed, and the surface precision of the silicon pad 5 appears on the surface of the ultraviolet curable resin 8 during transfer. Therefore, the surface accuracy of the primary / secondary electrodeposition layer surface described later can be improved. Moreover, since transfer curing is performed after the shrinkage at the time of curing is reduced by the above semi-curing, peeling from the transferred object due to curing contraction, stress cracking, or the transferred object is thin compared to the case of complete curing at once. In this case, shrinkage and deformation can be suppressed.
【0011】この後は、従来方法と同様に紫外線照射
(前記光源10の紫外線強度より大なる光源)により電
気絶縁膜4を硬化処理する。次にこの絶縁膜4を有する
電鋳母型2を電着層に移し、銅などの金属の一次電着を
行って、図1(d)に示すごとく母型2の絶縁膜4によ
って覆われていない表面上に、絶縁膜4の厚さを越えて
突出するような例えば断面がほぼ円弧状の一次電着層9
を形成したのち、重クロム酸ナトリウムまたは重クロム
酸カリウム等の水溶液中に浸漬し、その一次電着層9の
表面に剥離層(図示省略)を形成する。After that, the electric insulating film 4 is cured by irradiation with ultraviolet rays (a light source having an intensity higher than that of the light source 10) as in the conventional method. Next, the electroformed mother die 2 having this insulating film 4 is transferred to the electrodeposition layer, and the primary electrodeposition of a metal such as copper is carried out, and the mother die 2 is covered with the insulating film 4 as shown in FIG. 1 (d). The primary electrodeposition layer 9 having a substantially arcuate cross section, for example, which protrudes beyond the thickness of the insulating film 4 on the surface not covered with the insulating film 4.
After the formation, a dipping layer (not shown) is formed on the surface of the primary electrodeposition layer 9 by immersing it in an aqueous solution of sodium dichromate or potassium dichromate.
【0012】さらにニッケル又はニッケルとコバルトの
合金などで二次電着を行って図1(e)に示すごとく一
次電着層9の剥離層の表面に網目状外刃12の毛導入孔
13・13間の連続リブ14となる二次電着層11を形
成する。この電着後に電鋳母型2を電着槽から引き上
げ、二次電着層11を一次電着層9から剥離すれば、図
2に示すごとく毛導入孔13と、下面にカウンターシン
ク15が形成された毛導入孔13・13間の連続リブ1
4とを有するドーム形の網目状外刃12が得られる。Further, secondary electrodeposition is carried out using nickel or an alloy of nickel and cobalt, and as shown in FIG. 1 (e), on the surface of the peeling layer of the primary electrodeposition layer 9, hair introduction holes 13 of the mesh-like outer blade 12 are formed. The secondary electrodeposition layer 11 to be the continuous ribs 14 between the layers 13 is formed. After this electrodeposition, the electroformed mold 2 is pulled up from the electrodeposition tank, and the secondary electrodeposition layer 11 is peeled off from the primary electrodeposition layer 9. As shown in FIG. Continuous rib 1 between the formed hair introducing holes 13
A dome-shaped mesh outer cutter 12 having 4 and 4 is obtained.
【0013】電気絶縁膜4の紫外線硬化性樹脂8として
は、不飽和ポリエステル樹脂、あるいはチオールオレフ
ィン樹脂などが好ましい。なお紫外線硬化性樹脂のほか
に、電子線硬化性樹脂であってもよい。The ultraviolet curable resin 8 of the electric insulating film 4 is preferably unsaturated polyester resin or thiol olefin resin. In addition to the ultraviolet curable resin, an electron beam curable resin may be used.
【図1】ドーム形網目状外刃の製造工程を順次的に示す
断面図である。FIG. 1 is a sectional view sequentially showing a manufacturing process of a dome-shaped mesh outer blade.
【図2】電気かみそりにおける一般的なドーム形網目状
外刃の断面図である。FIG. 2 is a cross-sectional view of a general dome-shaped mesh outer blade in an electric shaver.
【図3】凹版の断面図である。FIG. 3 is a sectional view of an intaglio plate.
【図4】転写印刷用シリコンパッドを紫外線硬化性樹脂
に押し付けた状態での断面図である。FIG. 4 is a cross-sectional view in which a transfer printing silicon pad is pressed against an ultraviolet curable resin.
【図5】紫外線硬化性樹脂を転写印刷用シリコンパッド
に拾い上げた状態での断面図である。FIG. 5 is a cross-sectional view showing a state where an ultraviolet curable resin is picked up by a transfer printing silicon pad.
【図6】従来のドーム形網目状外刃の製造工程を順次的
に示す断面図である。FIG. 6 is a sectional view sequentially showing a manufacturing process of a conventional dome-shaped mesh outer blade.
1 電鋳母材 2 電鋳母型 4 電気絶縁膜 5 転写印刷用シリコンパッド 8 紫外線もしくは電子線硬化性樹脂 9 一次電着層 11 二次電着層 12 網目状外刃 13 毛導入孔 14 連続リブ 1 Electroformed base material 2 Electroformed base material 4 Electrical insulating film 5 Silicon pad for transfer printing 8 UV or electron beam curable resin 9 Primary electrodeposition layer 11 Secondary electrodeposition layer 12 Reticulated outer blade 13 Hair introduction hole 14 Continuous rib
【手続補正書】[Procedure amendment]
【提出日】平成3年8月27日[Submission date] August 27, 1991
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】全文[Name of item to be corrected] Full text
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【書類名】 明細書[Document name] Statement
【発明の名称】 パッド転写方法Title: Pad transfer method
【特許請求の範囲】[Claims]
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、シリコンパッド(シリ
コンゴムからなるタンポン)を使用して所望のパターン
や文字のような独立した模様体などを被転写体表面に転
写する方法に関する。BACKGROUND OF THE INVENTION The present invention relates to a silicon pad (silicon
The present invention relates to a method of transferring a desired pattern or an independent pattern body such as a character onto a surface of a transfer target using a tampon made of rubber .
【0002】[0002]
【従来の技術】この種のパッド転写は、例えば、転写原
版に所望のパターンや模様体に合致する凹部を形成し、
その版面に樹脂(樹脂型インキ)を塗り、次にその表面
を拭いて、凹部にだけ樹脂を残し、その樹脂をシリコン
パッドに移しとり、これを被転写体の表面に転写印刷し
ている(文献不詳)。 2. Description of the Related Art This type of pad transfer is, for example, a transfer source.
Form a recess that matches the desired pattern or pattern on the plate,
Resin (resin type ink) is applied to the plate surface, and then the surface
Wipe the resin, leaving the resin only in the recess,
Transfer to a pad and transfer print it onto the surface of the transfer target.
(Unknown literature).
【0003】[0003]
【発明が解決しようとする課題】しかるに、転写原版の
凹部の樹脂をシリコンパッドに移しとるためには、シリ
コンパッドを樹脂に単に押し付けているに過ぎない。そ
のため樹脂がシリコンパッドに十分に移しとれないこと
があり、インキ少、インキ欠け、版抜け不良などのトラ
ブルによりパターンや模様体の形くずれが生じやすい。
本発明の目的は、転写原版上の樹脂をシリコンパッドで
正確かつ簡単に移しとることができるようにする点にあ
る。 However, in order to transfer the resin in the recess of the transfer original plate to the silicon pad, the silicon pad is merely pressed against the resin. Therefore, the resin may not be sufficiently transferred to the silicon pad, and the pattern or the pattern body is likely to lose its shape due to troubles such as a small amount of ink, a lack of ink, and defective printing.
An object of the present invention, near-point to allow the resin on the transfer master can be accurately and easily transferred and Rukoto with silicon pads
It
【0004】[0004]
【課題を解決するための手段】本発明に係るパッド転写
方法は、シリコンパッド5を転写原版6上の未硬化状態
の紫外線硬化性樹脂8に押し付けた状態で、該硬化性樹
脂8のシリコンパッド5の接触面側を紫外線照射で半硬
化させて該硬化性樹脂8をシリコンパッド5に移しとる
工程と、シリコンパッド5上の該硬化性樹脂8を被転写
体表面に転写させる工程と、転写後に紫外線を照射して
該硬化性樹脂8を完全硬化させる工程とからなることを
要件とする。 Pad transfer according to the present invention
Methods, in a state pressed against the divorced pad 5 the uncured state on the transfer original 6 ultraviolet ray hardening resin 8, the semi-cured with ultraviolet radiation a contact surface side of the silicon pad 5 of the curable resin 8 and allowed to Ru preparative transferred curable resin 8 in the silicon pad 5 step is, the curable resin 8 on the silicon pad 5 by irradiating a step of transcription of a transfer surface, after transcription ultraviolet ray The step is to completely cure the curable resin 8.
【0005】[0005]
【発明の効果】本発明のパッド転写方法によれば、シリ
コンパッド5を転写原版6上の未硬化状態の紫外線硬化
性樹脂8に押し付けた状態で紫外線照射で該硬化性樹脂
8のシリコンパッド5との接触面側を半硬化させるの
で、転写原版6から該硬化性樹脂8をシリコンパッド5
に形くずれなく正確にかつ簡単に移しとることができ
る。また、シリコンパッド5に移しとられた時の硬化性
樹脂8の下層側は未硬化状態であるので、依然適度の粘
性を保ったままであり、それを被転写体表面に対し確実
に転写させることができる。さらに、上記半硬化により
硬化時の収縮を減少せしめた後に転写硬化するため、一
気に完全硬化させる場合に比して、硬化収縮による被転
写体からの剥離や応力割れ、あるいは被転写体が薄物の
場合の縮みや変形をも抑制できて有利である。 According to the pad transfer method of the present invention, the
UV curing of the uncured state on the transfer master 6
Of the curable resin by irradiating with ultraviolet rays while being pressed against the curable resin 8.
8 is semi-cured on the contact surface side with the silicon pad 5.
Then, the curable resin 8 is transferred from the transfer original plate 6 to the silicon pad 5
Can be transferred accurately and easily without losing its shape.
It Also, the curability when transferred to the silicon pad 5.
Since the lower layer side of Resin 8 is in an uncured state, it still has an appropriate viscosity.
It retains its property and is sure against the surface of the transferred material.
Can be transferred to. Furthermore, due to the above semi-curing
Since the transfer curing is performed after the shrinkage during curing is reduced,
Compared to the case where it is completely cured,
Delamination from the object or stress cracking, or the transferred object is thin
This is advantageous because it can suppress shrinkage and deformation in some cases.
【0006】[0006]
【実施例】本発明を電気かみそりのドーム形の網目状外
刃の電鋳製造法に適用した場合の実施例について説明す
る。まず、図1(a)に示す平板状の電鋳母材1を用意
し、これを図1(b)に示すごとく絞り加工して所定ド
ーム形状の電鋳母型2を形成する。ついで図1(c)に
示すごとく電鋳母型2の凸形表面上における網目状外刃
12の毛導入孔13に相当する部分(パターン)に、紫
外線硬化性樹脂による電気絶縁膜4を形成する。EXAMPLES The present invention is applied to the outer dome-shaped mesh of an electric shaver.
An example in which the method is applied to a blade electroforming method will be described. First, a plate-shaped electroformed preform 1 shown in FIG. 1 (a), which was drawn as shown in FIG. 1 (b) to form an electroforming mother die 2 having a predetermined dome-shaped. Then, as shown in FIG. 1 (c), an electric insulating film 4 made of an ultraviolet curable resin is formed on the convex surface of the electroformed mold 2 at a portion (pattern) corresponding to the hair introduction hole 13 of the mesh outer blade 12. To do.
【0007】この電気絶縁膜4は本発明のパッド転写方
法で形成する。すなわち、図3に示すごとくSKD(合
金工具鋼)等の焼入れ材による転写原版6にエッチング
加工等で前記パターンに合致する凹部7を形成してお
き、この凹部7に印刷に適した通常の粘度に調整された
紫外線硬化性樹脂8を充填し、図4に示すごとくシリコ
ンパッド5を該転写原版6上に押し付けて紫外線硬化性
樹脂8をシリコンパッド5に移しとる(図5参照)。This electric insulating film 4 is the pad transfer method of the present invention.
Form by method. In other words, leave a recess 7 that matches the pattern by etching or the like to transfer the original version 6 by hardening material such as SKD (alloy tool steel) as shown in FIG. 3, the usual suitable for printing in the recess 7 filling the <br/> ultraviolet curable resin 8, which is adjusted to a viscosity, Nikki transferred to the silicon pad 5 an ultraviolet curing resin 8 silicon pad 5 pressed onto the transfer original plate 6 as shown in FIG. 4 (FIG. 5).
【0008】しかるのち紫外線硬化性樹脂8を電鋳母型
2の凸形表面に転写して電気絶縁膜4を形成する。この
とき、シリコンパッド5を転写原版6上の紫外線硬化性
樹脂8に単に押し付けるだけではシリコンパッド5に紫
外線硬化性樹脂8が十分に乗らないことがある。After that, the ultraviolet curable resin 8 is transferred to the convex surface of the electroforming mold 2 to form the electric insulating film 4. In this case, it may ultraviolet curing resin 8 in the silicon pad 5 only presses simply silicon pad 5 on the ultraviolet curing resin 8 on the transfer original version 6 does not ride sufficiently.
【0009】そこで図4に示すごとくシリコンパッド5
は紫外線強度の比較的弱い光源10を内蔵していて透光
性を有するものを用意し、このシリコンパッド5を転写
原版6上の紫外線硬化性樹脂8に押し付けたときに、該
光源10から紫外線を照射して紫外線硬化性樹脂8のシ
リコンパッド5との接触面近くを半硬化させて該樹脂8
をシリコンパッド5に移しとる。シリコンパッド5に移
しとられた状態の紫外線硬化性樹脂8は、その表面が前
述のように半硬化層となっているが、下層側は未硬化の
状態にある。従って、シリコンパッド5は転写性に優れ
ていることと相まって、その表面が半硬化状態でも紫外
線硬化性樹脂8は被転写体たる電鋳母型2の表面に確実
に転写される。Therefore, as shown in FIG. 4, the silicon pad 5 is used.
Has a light source 10 with a relatively weak UV intensity
Prepare a material that has properties and transfer this silicon pad 5
When pressed against the UV-curable resin 8 of the original version of the 6, light source 10 is irradiated with ultraviolet light to semi-cure the contact surface near the silicon pad 5 of the ultraviolet curing resin 8 from the resin 8
Are transferred to the silicon pad 5. Move to silicon pad 5
The surface of the removed ultraviolet curable resin 8 is a semi-cured layer as described above, but the lower layer side is in an uncured state. Therefore, in combination with the excellent transferability of the silicon pad 5, the ultraviolet curable resin 8 is reliably transferred to the surface of the electroformed mold 2 that is the transferred object even if the surface thereof is in a semi-cured state.
【0010】この場合、シリコンパッド5を押しつけた
状態で半硬化させるため、押圧による形くずれを抑制
し、転写時の紫外線硬化性樹脂8の表面はシリコンパッ
ド5の表面精度そのものが現われることになり、後述す
る一次・二次電着層面の表面精度を高めることができ
る。しかも上記半硬化により硬化時の収縮を減少せしめ
た後に転写硬化するため、一気に完全硬化させる場合に
比して、硬化収縮による被転写体たる電鋳母型2からの
剥離や、応力割れ、あるいは被転写体が薄物の場合の縮
み、変形を抑制できる。[0010] In this case, since the semi-curing in a state of pressing the silicon pad 5, to suppress loss of shape by the pressing, the surface of the ultraviolet curable resin 8 during transfer to the surface accuracy itself of the silicon pad 5 appears Therefore, the surface accuracy of the primary / secondary electrodeposition layer surface described later can be improved. Moreover, since transfer curing is performed after the shrinkage at the time of curing is reduced by the above-mentioned semi-curing, peeling from the electroformed mother die 2 which is the transferred object due to curing shrinkage, stress cracking, or shrinkage when the transfer member is thin, can suppression deformation.
【0011】この後は、 紫外線照射(前記光源10の
紫外線強度より大なる光源)により電気絶縁膜4を硬化
処理する。次に、電鋳の常套手段通り、この絶縁膜4を
有する電鋳母型2を電着層に移し、銅などの金属の一次
電着を行って、図1(d)に示すごとく母型2の絶縁膜
4によって覆われていない表面上に、絶縁膜4の厚さを
越えて突出するような例えば断面がほぼ円弧状の一次電
着層9を形成したのち、重クロム酸ナトリウムまたは重
クロム酸カリウム等の水溶液中に浸漬し、その一次電着
層9の表面に剥離層(図示省略)を形成する。[0011] Thereafter, a curing treatment an electrical insulating film 4 by ultraviolet irradiation (larger becomes the light source than the ultraviolet intensity of the light source 10). Then , the electroforming mother die 2 having the insulating film 4 is transferred to the electrodeposition layer and the metal such as copper is subjected to the primary electrodeposition according to the conventional means of electroforming, and the mother die is formed as shown in FIG. 1 (d). On the surface not covered with the insulating film 4 of No. 2, a primary electrodeposition layer 9 having a substantially arcuate cross section is formed so as to protrude beyond the thickness of the insulating film 4, and then sodium dichromate or heavy dichromate is formed. It is dipped in an aqueous solution of potassium chromate or the like to form a release layer (not shown) on the surface of the primary electrodeposition layer 9.
【0012】さらにニッケル又はニッケルとコバルトの
合金などで二次電着を行って図1(e)に示すごとく一
次電着層9の剥離層の表面に網目状外刃12の毛導入孔
13・13間の連続リブ14となる二次電着層11を形
成する。この電着後に電鋳母型2を電着槽から引き上
げ、二次電着層11を一次電着層9から剥離すれば、図
2に示すごとく毛導入孔13と、下面にカウンターシン
ク15が形成された毛導入孔13・13間の連続リブ1
4とを有するドーム形の網目状外刃12が得られる。Further, secondary electrodeposition is carried out using nickel or an alloy of nickel and cobalt, and as shown in FIG. 1 (e), on the surface of the peeling layer of the primary electrodeposition layer 9, hair introduction holes 13 of the mesh-like outer blade 12 are formed. The secondary electrodeposition layer 11 to be the continuous ribs 14 between the layers 13 is formed. After this electrodeposition, the electroformed mold 2 is pulled up from the electrodeposition tank, and the secondary electrodeposition layer 11 is peeled off from the primary electrodeposition layer 9. As shown in FIG. Continuous rib 1 between the formed hair introducing holes 13
A dome-shaped mesh outer cutter 12 having 4 and 4 is obtained.
【0013】電気絶縁膜4の紫外線硬化性樹脂8として
は、一般に印刷用として使用されている硬化性樹脂が活
用でき、不飽和ポリエステル樹脂、あるいはチオールオ
レフィン樹脂などが好ましい。また転写原版6として
は、凹部7を形成したもののほかに、例えば、平面状の
ものも同様に使用でき、この面上に直接描画したもの
を、直接描画できない缶やつぼなどの面に転写する場合
にも有効である。 As the ultraviolet curable resin 8 of the electric insulating film 4, a curable resin generally used for printing is used.
Unsaturated polyester resin or thiol olefin resin can be used . In addition, as the transfer master 6
In addition to the one in which the concave portion 7 is formed,
Things can be used as well, drawn directly on this surface
Is transferred to the surface of a can or a pot that cannot be drawn directly.
It is also effective.
【図面の簡単な説明】[Brief description of drawings]
【図1】ドーム形網目状外刃の製造工程を順次的に示す
断面図である。FIG. 1 is a sectional view sequentially showing a manufacturing process of a dome-shaped mesh outer blade.
【図2】電気かみそりにおける一般的なドーム形網目状
外刃の断面図である。FIG. 2 is a cross-sectional view of a general dome-shaped mesh outer blade in an electric shaver.
【図3】転写原版の断面図である。FIG. 3 is a cross-sectional view of a transfer original version.
【図4】シリコンパッドを紫外線硬化性樹脂に押し付け
た状態での断面図である。[4] The divorced pad is a cross-sectional view of a state pressed against the UV-curable resin.
【図5】紫外線硬化性樹脂をシリコンパッドに拾い上げ
た状態での断面図である。 5 is a cross-sectional view of a state where an ultraviolet curable resin was picked up divorced pad.
【符号の説明】2 電鋳母型(被転写体) 5 シ リコンパッド6 転写原版 8 紫外線硬化性樹脂[EXPLANATION OF SYMBOLS] 2 electroforming mother die (transfer member) 5 divorced pad 6 transfer precursor 8 ultraviolet ray hardening resin
【手続補正2】[Procedure Amendment 2]
【補正対象書類名】図面[Document name to be corrected] Drawing
【補正対象項目名】図6[Name of item to be corrected] Figure 6
【補正方法】削除[Correction method] Delete
Claims (1)
に未硬化状態の紫外線もしくは電子線硬化性樹脂8を当
接させた状態で、該硬化性樹脂8をシリコンパッド5の
接触面側から紫外線もしくは電子線を照射して半硬化さ
せる工程と、 シリコンパッド5で該硬化性樹脂8を被転写体表面に転
移させる工程と、 転移後に紫外線もしくは電子線を照射して該硬化性樹脂
8を完全硬化させる工程とからなる樹脂塗膜の形成方
法。1. An ultraviolet ray or an electron beam curable resin 8 in an uncured state is brought into contact with the pad surface of the transfer printing silicon pad 5, and the curable resin 8 is irradiated from the contact surface side of the silicon pad 5 with ultraviolet rays. Alternatively, a step of irradiating with an electron beam to semi-cure, a step of transferring the curable resin 8 to the surface of the transfer target with the silicon pad 5, and a step of irradiating ultraviolet rays or an electron beam after the transfer to completely cure the curable resin 8 A method for forming a resin coating film, which comprises a step of curing.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58214577A JPS60106990A (en) | 1983-11-14 | 1983-11-14 | Production of domed screen-like outside blade for electric razor |
JP3212678A JPH05311479A (en) | 1983-11-14 | 1991-07-29 | Formation of resin coating film |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58214577A JPS60106990A (en) | 1983-11-14 | 1983-11-14 | Production of domed screen-like outside blade for electric razor |
JP3212678A JPH05311479A (en) | 1983-11-14 | 1991-07-29 | Formation of resin coating film |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58214577A Division JPS60106990A (en) | 1983-11-14 | 1983-11-14 | Production of domed screen-like outside blade for electric razor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05311479A true JPH05311479A (en) | 1993-11-22 |
Family
ID=26519358
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58214577A Granted JPS60106990A (en) | 1983-11-14 | 1983-11-14 | Production of domed screen-like outside blade for electric razor |
JP3212678A Pending JPH05311479A (en) | 1983-11-14 | 1991-07-29 | Formation of resin coating film |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58214577A Granted JPS60106990A (en) | 1983-11-14 | 1983-11-14 | Production of domed screen-like outside blade for electric razor |
Country Status (1)
Country | Link |
---|---|
JP (2) | JPS60106990A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009155710A (en) * | 2007-12-27 | 2009-07-16 | Tokai Rika Co Ltd | Method of manufacturing fine structure |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6056555A (en) * | 1983-09-09 | 1985-04-02 | Kyushu Hitachi Maxell Ltd | Photo-curable ink placing method to transfer printing silicon pad |
-
1983
- 1983-11-14 JP JP58214577A patent/JPS60106990A/en active Granted
-
1991
- 1991-07-29 JP JP3212678A patent/JPH05311479A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6056555A (en) * | 1983-09-09 | 1985-04-02 | Kyushu Hitachi Maxell Ltd | Photo-curable ink placing method to transfer printing silicon pad |
Also Published As
Publication number | Publication date |
---|---|
JPH0478719B2 (en) | 1992-12-11 |
JPS60106990A (en) | 1985-06-12 |
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