JPH05303736A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPH05303736A JPH05303736A JP13002492A JP13002492A JPH05303736A JP H05303736 A JPH05303736 A JP H05303736A JP 13002492 A JP13002492 A JP 13002492A JP 13002492 A JP13002492 A JP 13002492A JP H05303736 A JPH05303736 A JP H05303736A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- thin film
- magnetic recording
- magnetic
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000010408 film Substances 0.000 claims abstract description 40
- 239000010409 thin film Substances 0.000 claims abstract description 28
- 230000005415 magnetization Effects 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000005468 ion implantation Methods 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 12
- 239000007789 gas Substances 0.000 claims abstract description 5
- 230000001681 protective effect Effects 0.000 abstract description 8
- 238000004544 sputter deposition Methods 0.000 abstract description 8
- 150000002500 ions Chemical class 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000011521 glass Substances 0.000 abstract description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- 230000000593 degrading effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は磁気記録媒体およびその
製造法に関し、さらに詳しくは、コンピュータ用の外部
記録媒体として使用されるスパッタハードデイスク等の
磁気記録媒体およびその製造法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium and a manufacturing method thereof, and more particularly to a magnetic recording medium such as a sputter hard disk used as an external recording medium for a computer and a manufacturing method thereof.
【0002】[0002]
【従来技術】一般に、磁気記録媒体としてはハードディ
スクが代表的なものであり、このような従来の磁気記録
媒体は、酸化鉄塗布型のもの、或いは、Coめっき型の
ものがあるが、最近になって、これらのものに代わっ
て、さらに高密度の記録が可能である磁気記録媒体が開
発され、かつ、実用化されてきている。2. Description of the Related Art Generally, a hard disk is a typical magnetic recording medium. Such conventional magnetic recording media include an iron oxide coating type and a Co plating type. Instead of these, magnetic recording media capable of higher density recording have been developed and put into practical use.
【0003】この高密度の磁気記録媒体は、図3に示す
ような構造であって、基板1はNi−Pめっきが設けら
れているAl合金、または、ガラスサブストレートであ
る。そして、基板1の上には、Cr膜からなる下地層2
(1000〜3000Å)、Co合金膜からなる磁性膜
3(500〜700Å)およびC製保護膜4(300〜
400Å)からなる三層構造の膜が形成されている。This high density magnetic recording medium has a structure as shown in FIG. 3, and the substrate 1 is an Al alloy provided with Ni-P plating or a glass substrate. Then, the base layer 2 made of a Cr film is formed on the substrate 1.
(1000-3000Å), magnetic film 3 (500-700Å) made of Co alloy film, and protective film 4 made of C (300-
A film having a three-layer structure composed of 400Å) is formed.
【0004】そして、この図3の磁気記録媒体の製造法
としては、スパッタリング法が採用され、基板1上に上
記の各膜を順次形成させることにより行われ、この製膜
には大量生産用のインラインスパッタ装置が使用されて
いる。この方法により得られた磁気記録媒体の磁気特性
は、保磁力Hc:1000〜1500Oe、角型比S:
0.75〜0.95As a method for manufacturing the magnetic recording medium shown in FIG. 3, a sputtering method is adopted, which is carried out by sequentially forming the above-mentioned films on the substrate 1. This film is used for mass production. In-line sputter equipment is used. The magnetic characteristics of the magnetic recording medium obtained by this method are as follows: coercive force Hc: 1000 to 1500 Oe, squareness ratio S:
0.75 to 0.95
【0005】しかし、最近になって、さらに高密度の記
録が可能な磁気記録媒体が強く要望されており、例え
ば、1500〜2000Oeの保磁力Hcを有してお
り、かつ、狭トラック化に伴う再生力低下を補うために
高い残留磁化Brδを有する磁気記録媒体の開発が切望
されている。However, recently, there has been a strong demand for a magnetic recording medium capable of higher density recording, for example, it has a coercive force Hc of 1500 to 2000 Oe and is accompanied by a narrower track. Development of a magnetic recording medium having a high residual magnetization Brδ has been earnestly desired in order to compensate for the reduction in reproducing power.
【0006】しかしながら、このように磁気記録媒体の
保磁力を高くしようとする場合は、その改善には自ずか
ら限界があり、即ち、保磁力Hc(Oe)は記録媒体の
残留磁化Br×膜厚δとは負の相関を示し、そして、残
留磁化Brδを低下させると保磁力Hcは増加する。However, in order to increase the coercive force of the magnetic recording medium in this way, there is a limit to the improvement, that is, the coercive force Hc (Oe) is the residual magnetization Br of the recording medium × the film thickness δ. Shows a negative correlation, and the coercive force Hc increases when the residual magnetization Brδ is decreased.
【0007】従って、磁性膜の厚さを薄くして保磁力H
cを高くすることは可能であるが、この場合は再生出力
が低下するので、その対策として、磁気記録媒体とヘッ
ドとの間の距離を極端にちいさくする必要があり、磁気
記録媒体表面の品質管理が極めて困難となる。Therefore, the coercive force H is reduced by reducing the thickness of the magnetic film.
Although it is possible to increase c, in this case, since the reproduction output decreases, it is necessary to make the distance between the magnetic recording medium and the head extremely small as a countermeasure, so that the quality of the surface of the magnetic recording medium is reduced. Management becomes extremely difficult.
【0008】[0008]
【発明が解決しようとする課題】本発明は上記に説明し
た従来の磁気記録媒体の種々の問題点および事情に鑑
み、本発明者が鋭意研究を行った結果、保磁力Hcおよ
び残留磁化Brδ等の磁気特性が優れている高密度記録
が可能な磁気記録媒体およびその製造法を開発したので
ある。In view of various problems and circumstances of the conventional magnetic recording medium described above, the present invention has been earnestly studied, and as a result, the coercive force Hc and the residual magnetization Brδ, etc. Has developed a magnetic recording medium capable of high-density recording, which has excellent magnetic characteristics, and a manufacturing method thereof.
【0009】[0009]
【課題を解決するための手段】本発明に係る磁気記録媒
体およびその製造法は、基板上に下地膜を介するか、或
いは、直接成膜されたCo系磁性薄膜を有する磁気記録
媒体であり、磁性薄膜がイオン注入によって薄膜面内に
圧縮応力および/または局所的応力が導入されているこ
とを特徴とする面内保磁力の高い磁気記録媒体を第1の
発明とし、水平磁気記録媒体として使用されるCo系磁
性薄膜を基板上に、薄膜成膜法により成膜を行った後、
この磁性薄膜面内にB、C、N、OおよびAr、Ne等
の希ガスの1種以上を1×1016/cm2以上のドープ
量でイオン注入を行うことにより、薄膜の飽和磁化を低
下させる事なく、面内の保磁力を高くすることを特徴と
する磁気記録媒体の製造法を第2発明とする2つの発明
よりなるものである。A magnetic recording medium and a method for manufacturing the same according to the present invention are a magnetic recording medium having a Co type magnetic thin film formed on a substrate through an underlayer film or directly. A magnetic recording medium having a high in-plane coercive force, wherein the magnetic thin film has a compressive stress and / or a local stress introduced into the thin film surface by ion implantation, is the first invention, and is used as a horizontal magnetic recording medium. After forming a Co-based magnetic thin film on a substrate by a thin film forming method,
Saturation magnetization of the thin film is improved by implanting ions of one or more rare gases such as B, C, N, O and Ar, Ne into the surface of the magnetic thin film with a doping amount of 1 × 10 16 / cm 2 or more. The present invention comprises two inventions, the second invention being a method of manufacturing a magnetic recording medium, which is characterized by increasing the in-plane coercive force without lowering.
【0010】本発明に係る磁気記録媒体およびその製造
法について、以下詳細に説明する。The magnetic recording medium and the manufacturing method thereof according to the present invention will be described in detail below.
【0011】即ち、本発明に係る磁気記録媒体は、Co
系の磁性薄膜層をガラス、アルミニウム等の基板上に、
スパッタリング、真空蒸着その他の成膜法によって第一
下地膜上、或いは、基板上に直接成膜により形成し、そ
の上に、C等の保護膜を形成した後、或いは、保護膜を
形成する前に、この磁性薄膜面内にイオン注入装置によ
りB、C、N、OはおよびAr、Ne等の希ガスの中か
ら選んだ1種以上をイオン注入を行うことにより磁気記
録媒体を製造することができ、そして、この磁気記録媒
体は残留磁化Brδを低下させることなく、保磁力Hc
だけを増大させることが可能である。That is, the magnetic recording medium according to the present invention comprises Co
System magnetic thin film layer on the substrate such as glass, aluminum,
After forming a protective film such as C on the first base film or directly on the substrate by sputtering, vacuum evaporation or other film forming method, or before forming the protective film A magnetic recording medium is manufactured by ion-implanting at least one selected from B, C, N, O, and rare gases such as Ar and Ne into the surface of the magnetic thin film by an ion-implanting device. And the coercive force Hc of the magnetic recording medium can be reduced without lowering the residual magnetization Brδ.
It is possible to increase only
【0012】本発明に係る磁気記録媒体およびその製造
法は、上記に説明したように基板上に、スパッタリン
グ、真空蒸着等の成膜法によってCo系の磁気記録層を
成膜後にイオン注入処理を行っている。As described above, the magnetic recording medium and the method for manufacturing the same according to the present invention are subjected to the ion implantation treatment after the Co type magnetic recording layer is formed on the substrate by a film forming method such as sputtering or vacuum deposition. Is going.
【0013】このCo系磁気記録媒体は、コバルト六方
晶のC軸方向に強い一軸性の磁気異方性を有しており、
また、真空蒸着、スパッタリング等の真空成膜法により
成膜されているので、結晶粒径が極めて微細であって、
従って、磁性薄膜中の磁壁移動を困難にしており、結果
として高い保磁力Hcが得られるのである。This Co-based magnetic recording medium has a strong uniaxial magnetic anisotropy in the C-axis direction of cobalt hexagonal crystal,
Further, since the film is formed by a vacuum film forming method such as vacuum deposition or sputtering, the crystal grain size is extremely fine,
Therefore, it is difficult to move the domain wall in the magnetic thin film, and as a result, a high coercive force Hc is obtained.
【0014】このように、本発明に係る磁気記録媒体お
よびその製造法は、従来のCo系薄膜よりなる記録媒体
の保磁力Hcをイオン注入によって、さらに高い保磁力
Hcを付与させることができるものである。As described above, in the magnetic recording medium and the manufacturing method thereof according to the present invention, the coercive force Hc of the conventional Co-based thin film can be given by ion implantation to give a higher coercive force Hc. Is.
【0015】即ち、B、C、N、OおよびAr、Ne等
の希ガスの1種以上を、Co系磁性薄膜層にイオン注入
することにより、先ず、第一にCo系磁性薄膜中の面内
に圧縮応力が残留することになり、この圧縮応力は、C
o系磁性薄膜が負の磁歪定数を有しているため、磁気弾
性効果により面内の磁気異方性を高くし、磁性薄膜面内
方向の保磁力Hcを増大させる効果を有するのである。That is, B, C, N, O and one or more kinds of rare gases such as Ar and Ne are ion-implanted into the Co-based magnetic thin film layer, and first, the surface in the Co-based magnetic thin film is first of all. A compressive stress remains inside, and this compressive stress is C
Since the o-based magnetic thin film has a negative magnetostriction constant, it has the effect of increasing the in-plane magnetic anisotropy by the magnetoelastic effect and increasing the coercive force Hc in the in-plane direction of the magnetic thin film.
【0016】さらに、第二にCo系磁性薄膜層にイオン
注入を行うことにより、Co系磁性薄膜中に数々の構造
欠陥およびそれに伴う局所的な応力を導入し、磁性薄膜
中に発生した磁壁の移動を抑制することにより保磁力H
cを増大させるという効果を有する。Secondly, by ion-implanting the Co-based magnetic thin film layer, a number of structural defects and local stresses associated therewith are introduced into the Co-based magnetic thin film, and the magnetic domain wall generated in the magnetic thin film is removed. Coercive force H by suppressing movement
It has the effect of increasing c.
【0017】また、Co系磁力薄膜の残留磁化Brδは
イオン注入を行うことにより、この膜の飽和磁気が低下
すること、および、表面がスパッタリングにより失わ
れ、膜厚が減少することにより低下するが、イオン注入
による注入量は飽和磁気を低下させるほど高くすること
は不可能であり、残留磁化Brδの減少は主として膜厚
の減少によってもたらされる。The remanent magnetization Brδ of the Co-based magnetic thin film is lowered by ion implantation, which lowers the saturation magnetism of this film and also reduces the film thickness due to loss of the surface by sputtering. However, it is impossible to increase the implantation amount by ion implantation to such a degree that the saturation magnetism is lowered, and the reduction of the residual magnetization Brδ is mainly caused by the reduction of the film thickness.
【0018】従って、イオン注入によって、保磁力Hc
は上昇するが残留磁化Brδは減少することになるが、
イオン注入効果による保磁力Hcの増大する効果が極め
て大きいので、実際には残留磁化Brδを殆ど低下させ
ることなく、保磁力Hcのみを増大させることが可能で
ある。Therefore, the coercive force Hc is obtained by the ion implantation.
Is increased but the residual magnetization Brδ is decreased,
Since the effect of increasing the coercive force Hc by the ion implantation effect is extremely large, it is possible to increase only the coercive force Hc without actually decreasing the remanent magnetization Brδ.
【0019】[0019]
【実 施 例】本発明に係る磁気記録媒体およびその製
造法の実施例を説明する。EXAMPLES Examples of the magnetic recording medium and the manufacturing method thereof according to the present invention will be described.
【0020】[0020]
【実 施 例 1】室温のガラス基板上に下地膜としてC
r膜を2000Å形成した後、この上に、CoNiCr
合金磁性膜600Å、C保護膜300Åの三層を形成し
た。このCr膜、Co、Ni、Cr合金膜およびC保護
膜は何れもスパッタリングにより成膜し、また、磁性膜
はCo−30Ni−7.5Cr合金を使用した。[Example 1] C as a base film on a glass substrate at room temperature
After forming an r film of 2000Å, CoNiCr
Three layers of an alloy magnetic film 600Å and a C protective film 300Å were formed. The Cr film, Co, Ni, Cr alloy film, and C protective film were all formed by sputtering, and the magnetic film used was Co-30Ni-7.5Cr alloy.
【0021】この成膜した磁気記録媒体に、Nを20K
ev、120μAの注入条件により、1×1016ion
s/cm2、3×1016ions/cm2、5×1016i
ons/cm2の割合の注入量でイオン注入を行い、保
磁力Hc、残留磁化Brδを測定した。20 K of N was added to the formed magnetic recording medium.
ev, 120 μA injection condition, 1 × 10 16 ion
s / cm 2 , 3 × 10 16 ions / cm 2 , 5 × 10 16 i
Ion implantation was performed at an implantation amount of ons / cm 2 , and coercive force Hc and residual magnetization Brδ were measured.
【0022】図1に保磁力Hc、残留磁化Brδを示し
てあるが、注入量を増加すると、保磁力Hcは945O
eから1235Oeにまで急激に増大し、残留磁化Br
δは略一定値450Gμmの注入前の値を保っているこ
とがわかる。FIG. 1 shows the coercive force Hc and the remanent magnetization Brδ, but when the injection amount is increased, the coercive force Hc becomes 945O.
abruptly increased from e to 1235 Oe and the residual magnetization Br
It can be seen that δ maintains a value of 450 Gμm, which is a substantially constant value, before the injection.
【0023】[0023]
【実 施 例 2】NiPめっきAl基板上に、下地膜を
設けないで直接CoCrPt合金磁性膜500Å、C保
護膜300Åをスパッタリングにより成膜を行った。こ
の磁性膜はCo−10Cr−15Pt合金を使用した。[Example 2] A CoCrPt alloy magnetic film 500Å and a C protective film 300Å were directly formed on an NiP-plated Al substrate by sputtering without providing a base film. For this magnetic film, a Co-10Cr-15Pt alloy was used.
【0023】また、成膜前の基板温度は200℃とし
た。成膜後、Bを20Kev、260μAの注入条件に
より、2×1016ions/cm2、4×1016/io
ns/cm2、6×1016ions/cm2の割合の注入
量で注入を行い、保磁力Hc、残留磁化Brδを測定し
た。The substrate temperature before film formation was 200 ° C. After the film formation, B was injected under the conditions of 20 Kev and 260 μA under the condition of 2 × 10 16 ions / cm 2 , 4 × 10 16 / io.
Implantation was performed at an injection rate of ns / cm 2 and 6 × 10 16 ions / cm 2 , and coercive force Hc and residual magnetization Brδ were measured.
【0024】図2に保磁力Hc、残留磁化Brδを示し
てあり、注入量の増加に伴って保磁力Hcは1950O
eから2260Oeにまで増加しており、また、残留磁
化Brδは略一定値310Gμmと注入前の値を保って
いる。FIG. 2 shows the coercive force Hc and the residual magnetization Brδ, and the coercive force Hc becomes 1950O as the injection amount increases.
From e to 2260 Oe, the remanent magnetization Brδ is maintained at a substantially constant value of 310 Gμm before injection.
【0025】[0025]
【発明の効果】以上説明したように、本発明に係る磁気
記録媒体およびその製造法は上記の構成であるから、高
い残留磁化Brδを有しており、さらに、保磁力Hcに
も優れている磁気記録媒体、即ち、高密度の記録が可能
な磁気記録媒体を得ることができるという効果を有する
ものである。As described above, since the magnetic recording medium and the method for manufacturing the same according to the present invention have the above-mentioned structure, they have a high residual magnetization Brδ and are also excellent in coercive force Hc. The magnetic recording medium, that is, the magnetic recording medium capable of high-density recording can be obtained.
【図1】実施例1のイオン注入量と保磁力Hcおよび残
留磁化Brδとの関係を示す図である。FIG. 1 is a diagram showing a relationship among an ion implantation amount, a coercive force Hc, and a residual magnetization Brδ in Example 1.
【図2】実施例2のイオン注入量と保磁力Hcおよび残
留磁化Brδとの関係を示す図である。FIG. 2 is a diagram showing a relationship between an ion implantation amount, a coercive force Hc, and a residual magnetization Brδ in Example 2;
【図3】高密度の磁気記録媒体の概略断面図である。FIG. 3 is a schematic cross-sectional view of a high density magnetic recording medium.
1・・・基盤 2・・・下地層 3・・・磁性膜 4・・・保護膜 1 ... Substrate 2 ... Underlayer 3 ... Magnetic film 4 ... Protective film
Claims (2)
成膜されたCo系磁性薄膜を有する磁気記録媒体であ
り、磁性薄膜がイオン注入によって薄膜面内に圧縮応力
および/または局所的応力が導入されていることを特徴
とする面内保磁力の高い磁気記録媒体。1. A magnetic recording medium having a Co-based magnetic thin film formed directly on or through a base film on a substrate, wherein the magnetic thin film is subjected to compressive stress and / or local in-plane by thin film ion implantation. A magnetic recording medium having a high in-plane coercive force, characterized in that stress is introduced.
磁性薄膜を基板上に、薄膜成膜法により成膜を行った
後、この磁性薄膜面内にB、C、N、OおよびAr、N
e等の希ガスの1種以上を1×1016/cm2以上のド
ープ量でイオン注入を行うことにより、薄膜の飽和磁化
を低下させる事なく、面内の保磁力を高くすることを特
徴とする磁気記録媒体の製造法。2. A Co-based magnetic thin film used as a horizontal magnetic recording medium is formed on a substrate by a thin film forming method, and B, C, N, O and Ar N
The in-plane coercive force is increased without lowering the saturation magnetization of the thin film by ion-implanting one or more rare gases such as e with a doping amount of 1 × 10 16 / cm 2 or more. Manufacturing method of magnetic recording medium.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13002492A JPH05303736A (en) | 1992-04-23 | 1992-04-23 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13002492A JPH05303736A (en) | 1992-04-23 | 1992-04-23 | Magnetic recording medium and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05303736A true JPH05303736A (en) | 1993-11-16 |
Family
ID=15024276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13002492A Withdrawn JPH05303736A (en) | 1992-04-23 | 1992-04-23 | Magnetic recording medium and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05303736A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1055745A1 (en) * | 1999-05-27 | 2000-11-29 | Sony Corporation | Method and apparatus for surface modification |
JP2001192826A (en) * | 1999-05-27 | 2001-07-17 | Sony Corp | Surface treatment apparatus, surface treatment method, and surface treated product |
JP2008084433A (en) * | 2006-09-27 | 2008-04-10 | Hoya Corp | Manufacturing method of magnetic recording medium |
-
1992
- 1992-04-23 JP JP13002492A patent/JPH05303736A/en not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1055745A1 (en) * | 1999-05-27 | 2000-11-29 | Sony Corporation | Method and apparatus for surface modification |
JP2001192826A (en) * | 1999-05-27 | 2001-07-17 | Sony Corp | Surface treatment apparatus, surface treatment method, and surface treated product |
JP2008084433A (en) * | 2006-09-27 | 2008-04-10 | Hoya Corp | Manufacturing method of magnetic recording medium |
US9005699B2 (en) | 2006-09-27 | 2015-04-14 | WD Media, LLC | Method for manufacturing magnetic recording medium |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990706 |