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JPH05273436A - Working method and working device for end face of optical fiber - Google Patents

Working method and working device for end face of optical fiber

Info

Publication number
JPH05273436A
JPH05273436A JP7386092A JP7386092A JPH05273436A JP H05273436 A JPH05273436 A JP H05273436A JP 7386092 A JP7386092 A JP 7386092A JP 7386092 A JP7386092 A JP 7386092A JP H05273436 A JPH05273436 A JP H05273436A
Authority
JP
Japan
Prior art keywords
optical fiber
face
etching
optical
liquid surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7386092A
Other languages
Japanese (ja)
Other versions
JP2971237B2 (en
Inventor
Akira Kashiwazaki
昭 柏崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP7386092A priority Critical patent/JP2971237B2/en
Publication of JPH05273436A publication Critical patent/JPH05273436A/en
Application granted granted Critical
Publication of JP2971237B2 publication Critical patent/JP2971237B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Light Guides In General And Applications Therefor (AREA)
  • Optical Couplings Of Light Guides (AREA)

Abstract

(57)【要約】 【目的】本発明は、光接続素子に用いられる光ファイバ
端面の加工方法および加工装置、特に光ファイバコア面
が光導波路との接続面となる光ファイバクラッド端面よ
りも内側にある光結合に好適な光ファイバ端面のエッチ
ング加工方法およびエッチング加工装置を提供する。 【構成】本発明は、光接続素子に用いられる光ファイバ
端面の加工方法および加工装置であって、エッチング溶
液の液面に光ファイバ端面を接触させた後、光ファイバ
端面をエッチング溶液の液面より僅か上方位置に移動さ
せ、光ファイバ端面のみエッチングするとともに、光フ
ァイバ端面とエッチング溶液の液面との接触状態を、接
触面からの反射戻り光を計測して検知、制御する光ファ
イバ端面のエッチング加工方法および加工装置である。
(57) [Abstract] [Object] The present invention provides a method and apparatus for processing an end face of an optical fiber used in an optical connecting element, and more particularly, an inner side of an end face of an optical fiber clad where an optical fiber core face serves as a connecting face with an optical waveguide. And a method for etching an optical fiber end face suitable for optical coupling. The present invention relates to a method and apparatus for processing an optical fiber end face used in an optical connecting element, wherein the optical fiber end face is brought into contact with the liquid surface of the etching solution, and then the optical fiber end face is brought into contact with the liquid surface of the etching solution. Move it to a slightly higher position to etch only the end face of the optical fiber, and detect the contact state between the end face of the optical fiber and the liquid surface of the etching solution by measuring the reflected return light from the contact face and controlling the end face of the optical fiber. An etching processing method and processing apparatus.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光接続素子に用いられ
る光ファイバ端面の加工方法および加工装置、特に光フ
ァイバコア面が光導波路との接続面となる光ファイバク
ラッド端面よりも内側にある光結合に好適な光ファイバ
端面のエッチング加工方法およびエッチング加工装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for processing an end face of an optical fiber used for an optical connecting element, and more particularly, an optical fiber core face is located inside an end face of an optical fiber clad serving as a connecting face with an optical waveguide. The present invention relates to an etching method and an etching apparatus for an optical fiber end face suitable for optical coupling.

【0002】[0002]

【従来技術およびその課題】従来、光ファイバ端面をエ
ッチングにより加工する方法としては、イオンビームエ
ッチングおよび沸酸によるエッチング等がある(例えば
特開平3−163406)。しかしながら真空中で、固
体材料にイオン衝撃を与えて表面原子を飛散させる、い
わゆるイオンビーム法は、設備が大がかりで、加工にか
かるコストが高くなる。また、エッチングの速度が遅い
ため、加工に時間がかかる。また、沸酸によるエッチン
グの場合は、沸酸溶液に、光ファイバ終端部を浸してエ
ッチングをするだけなので、イオンビーム法に比較し
て、設備、処理方法が簡単であり、光ファイバをエッチ
ングする速度も速く、加工に要する時間が短くて済む
が、エッチングされた光ファイバは、端面とともに沸酸
に浸されている部分の外周も同時にエッチングされるた
め、図3に示すように、光ファイバ端面部の外径1bは
小さくなってしまう。例えば、図4は46%の沸酸溶液
でシングルモード光ファイバをエッチングしたときの例
であるが、処理時間と共に光ファイバ端面付近の外径は
小さくなってしまう。
2. Description of the Related Art Conventionally, as a method of processing an end face of an optical fiber by etching, there are ion beam etching, etching with hydrofluoric acid, and the like (for example, Japanese Patent Laid-Open No. 3-163406). However, the so-called ion beam method, in which a solid material is subjected to ion bombardment to scatter surface atoms in a vacuum, requires a large amount of equipment and requires a high processing cost. Further, since the etching speed is slow, it takes time to process. Further, in the case of etching with hydrofluoric acid, since the end of the optical fiber is simply immersed in the hydrofluoric acid solution for etching, the equipment and processing method are simpler than the ion beam method, and the optical fiber is etched. Although the speed is high and the time required for processing is short, the etched optical fiber is etched at the same time with the outer periphery of the portion immersed in hydrofluoric acid as shown in FIG. The outer diameter 1b of the portion becomes small. For example, FIG. 4 shows an example in which a single mode optical fiber is etched with a 46% hydrofluoric acid solution, but the outer diameter near the end face of the optical fiber becomes smaller with the processing time.

【0003】このような構造の光ファイバをそのままで
使用する場合、例えば、エッチングされた光ファイバの
凹面部に溶融ガラス等を付着せしめて、マイクロレンズ
を形成し、光源等の結合用に用いる場合(例えば特開平
3−163406)には、光ファイバ端面における外径
の縮小はなんら問題ないが、光ファイバ外径を変化させ
ない状態で使用する場合には、結合用に使用するエッチ
ングされた光ファイバを補強するためにフェルールに装
着しようとする場合、エッチング光ファイバの外径とフ
ェルール内径の間に隙間が生じてしまい、安定かつ同心
度を保った状態に固定する事が困難となる。また、光フ
ァイバ端面のクラッド部を接着固定面に利用するときに
は、光ファイバの外周がエッチングされて、端面部の接
触面積が小さくなると、接着強度が悪くなってしまう。
When the optical fiber having such a structure is used as it is, for example, when molten glass or the like is adhered to the concave portion of the etched optical fiber to form a microlens, which is used for coupling a light source or the like. (For example, JP-A-3-163406), there is no problem in reducing the outer diameter of the end face of the optical fiber. However, when the optical fiber is used without changing the outer diameter, the etched optical fiber used for coupling is used. When it is attached to the ferrule to reinforce, a gap is formed between the outer diameter of the etching optical fiber and the inner diameter of the ferrule, and it is difficult to fix the etching optical fiber in a stable and concentric state. Further, when the clad portion of the end face of the optical fiber is used as the adhesive fixing face, if the outer periphery of the optical fiber is etched and the contact area of the end face portion becomes small, the adhesive strength becomes poor.

【0004】このような問題を解決するために端面部だ
けをエッチングする方法としては、光ファイバの円筒側
面にエッチング液に不活性な材料をコーティングしてエ
ッチング液に浸し、端面のみをエッチングする方法が考
えられる。例えば、石英系光ファイバを沸酸でエッチン
グする場合であれば、光ファイバ円筒側面にポリ塩化ビ
フェニールや鉛をコーティングすれば、沸酸溶液に浸し
たときに光ファイバ端面のみがエッチングされる事にな
る。しかしながら、この方法は、光ファイバ端面を除
き、円筒側面部のみにコーティングする処理が簡単でな
く、全体として、工程が増えてしまうという問題を生じ
る。
As a method of etching only the end face portion in order to solve such a problem, a method of coating only the end face on the cylindrical side surface of the optical fiber by coating a material inert to the etchant and immersing in the etchant. Can be considered. For example, if a silica-based optical fiber is to be etched with hydrofluoric acid, coating the side of the optical fiber cylinder with polychlorinated biphenyl or lead means that only the end face of the optical fiber will be etched when immersed in a hydrofluoric acid solution. Become. However, this method has a problem that the process of coating only the side surface of the cylinder is not easy except for the end surface of the optical fiber, and the number of steps is increased as a whole.

【0005】[0005]

【課題を解決するための手段】本発明は、これらの課題
を解決するために、光接続素子に用いられる光ファイバ
端面の加工方法および加工装置であって、エッチング溶
液の液面に光ファイバ端面を接触させた後、光ファイバ
端面をエッチング溶液の液面より僅か上方位置に移動さ
せ、光ファイバ端面のみエッチングするとともに、光フ
ァイバ端面とエッチング溶液の液面との接触状態を、接
触面からの反射戻り光を計測して検知、制御する光ファ
イバ端面のエッチング加工方法および加工装置を提供す
る。
In order to solve these problems, the present invention provides a method and an apparatus for processing an end face of an optical fiber used in an optical connecting element, wherein the end face of the optical fiber is on the liquid surface of an etching solution. After contacting, the optical fiber end surface is moved to a position slightly above the liquid surface of the etching solution, and only the end surface of the optical fiber is etched, and the contact state between the optical fiber end surface and the liquid surface of the etching solution is changed from the contact surface. Provided are an etching processing method and a processing apparatus for an end face of an optical fiber, which measures, detects, and controls reflected return light.

【0006】[0006]

【実施例】以下図面を用いて本発明の実施例を説明す
る。図1と図2は本発明の実施例を示し、図1は本実施
例装置の略図、図2は本発明によるエッチングの工程を
示す略図である。図において同じ部材は同じ符号で示
し、1は光ファイバ、2および3は光ファイバを保持す
るホルダ、4は光分岐結合器、5は光源、6は受光器、
7はコントローラ、8は微動ステージ、10は基板、1
1はエッチング液である。
Embodiments of the present invention will be described below with reference to the drawings. 1 and 2 show an embodiment of the present invention, FIG. 1 is a schematic view of an apparatus of this embodiment, and FIG. 2 is a schematic view showing an etching process according to the present invention. In the drawings, the same members are designated by the same reference numerals, 1 is an optical fiber, 2 and 3 are holders for holding the optical fibers, 4 is an optical branching / coupling device, 5 is a light source, 6 is a light receiver,
7 is a controller, 8 is a fine movement stage, 10 is a substrate, 1
1 is an etching solution.

【0007】図において、エッチングする光ファイバ1
は光ファイバを固定するホルダ2にセットされ、光ファ
イバ1のエッチングする端面1aと反対側の終端は、光
ファイバホルダ3を介して、光分岐結合器4に接続され
ている。光分岐結合器4の反対側ポートには、それぞれ
光源5、および受光器6が接続されている。さらに受光
器6での検出値は制御用コントローラ7にリアルタイム
で取り込まれるようになっている。また、光ファイバー
ホルダ2は微動ステージ8に固定されており、微動ステ
ージ8は、コントローラ7よりの信号を受けて、ガイド
9に沿って、鉛直方向に動くようになっている。装置を
設置する基板10は、沸酸溶液の液面11aの振動を避
けるために防振構造になっているのが好ましい。
In the figure, an optical fiber 1 to be etched
Is set in a holder 2 for fixing an optical fiber, and the end of the optical fiber 1 opposite to the end face 1a to be etched is connected to an optical branching / coupling device 4 via an optical fiber holder 3. A light source 5 and a light receiver 6 are connected to the opposite ports of the optical branching / coupling device 4, respectively. Further, the detection value of the light receiver 6 is loaded into the control controller 7 in real time. The optical fiber holder 2 is fixed to the fine movement stage 8, and the fine movement stage 8 receives the signal from the controller 7 and moves along the guide 9 in the vertical direction. The substrate 10 on which the apparatus is installed preferably has a vibration-proof structure in order to avoid vibration of the liquid surface 11a of the hydrofluoric acid solution.

【0008】光源5から出射された光は、光分岐結合器
4を介して光ファイバ1に入射され端面1aから出射さ
れるが、この時端面での反射戻り光が光分岐結合器4を
介して受光器6で検出される。端面1aでの反射量は反
射面の屈折率の差によって決まる。エッチングされる光
ファイバ1の端面1aが、沸酸溶液の端面11aに接触
する前は、反射は光ファイバと空気の境界面での反射と
なる。
The light emitted from the light source 5 enters the optical fiber 1 through the optical branching coupler 4 and is output from the end face 1a. At this time, the reflected return light at the end face passes through the optical branching coupler 4. Is detected by the light receiver 6. The amount of reflection on the end surface 1a is determined by the difference in the refractive index of the reflection surface. Before the end face 1a of the optical fiber 1 to be etched comes into contact with the end face 11a of the hydrofluoric acid solution, the reflection is the reflection at the interface between the optical fiber and air.

【0009】図1に示すように、微動ステージ8を徐々
に下降させ、光ファイバ端面1aを沸酸溶液の液面11
aに近ずけてゆき、図2(b)のように、光ファイバ端
面1aが沸酸溶液の液面11aに接触したとき、光ファ
イバ端面1aの反射面は光ファイバと沸酸溶液の境界面
での反射となる。二つの屈折率の異なる媒質の境界面で
の反射率Rは、媒質1の屈折率をn1 、媒質2の屈折率
をn2 とすると、次式によって求められる。
As shown in FIG. 1, the fine movement stage 8 is gradually lowered so that the end face 1a of the optical fiber is at the liquid level 11 of the hydrofluoric acid solution.
2a, when the optical fiber end face 1a contacts the liquid surface 11a of the hydrofluoric acid solution as shown in FIG. 2B, the reflection surface of the optical fiber end face 1a is the boundary between the optical fiber and the hydrofluoric acid solution. It becomes a reflection on the surface. The reflectance R at the interface between two media having different refractive indices is calculated by the following equation, where n1 is the refractive index of the medium 1 and n2 is the refractive index of the medium 2.

【0010】 R=((n2 −n1 )/(n1 +n2 ))2 これから解るように、2つの媒質の屈折率差が大きいほ
ど反射量は大きくなる。光ファイバのコア、および空
気、沸酸溶液の屈折率はそれぞれ約1.46〜1.5、
1.00、1.33〜であるから、光ファイバ端面1a
が沸酸溶液の液面11aに接触したとき受光器6に検出
される反射光量は小さくなる。反射光量が変化したとき
微動ステージ8の下降を停止し、停止した位置よりも光
ファイバ端面の位置が数μm上の位置に来るように微動
ステージ8を引き上げる。この時、光ファイバ端面1a
の位置と液面11aとの間には僅かに高低差が出来る
が、液体の表面張力により、図2(c)に示すように液
面は光ファイバ端面1aにのみ接触した状態になる。こ
のような状態で、必要な処理時間のエッチングを実行す
れば、光ファイバ端面付近の外径を損なわずに、端面部
のみをエッチングすることが出来る。
R = ((n2-n1) / (n1 + n2)) 2 As can be seen from this, the larger the difference in refractive index between the two media, the larger the amount of reflection. The refractive index of the core of the optical fiber, the air, and the hydrofluoric acid solution are about 1.46 to 1.5, respectively.
Since 1.00 and 1.33, the optical fiber end face 1a
When the liquid comes into contact with the liquid surface 11a of the hydrofluoric acid solution, the amount of reflected light detected by the light receiver 6 becomes small. When the amount of reflected light changes, the fine movement stage 8 stops descending, and the fine movement stage 8 is pulled up so that the position of the end face of the optical fiber is several μm above the stopped position. At this time, the optical fiber end face 1a
There is a slight difference in height between the position and the liquid surface 11a, but due to the surface tension of the liquid, the liquid surface is in contact with only the optical fiber end surface 1a as shown in FIG. 2 (c). If etching is performed for a required processing time in such a state, only the end face portion can be etched without impairing the outer diameter near the end face of the optical fiber.

【0011】また、エッチング処理する時間が比較的長
いときには、光ファイバ端面1aの位置を、液面11a
から僅かに引き上げた位置に置かなくても、光ファイバ
の端面全体がエッチングされて、自然に端面の位置は液
面よりも高くなってくるので、エッチング量に応じて最
初の光ファイバ端面の位置を選択すれば良い。
Further, when the etching time is relatively long, the position of the optical fiber end face 1a is set to the liquid surface 11a.
Even if it is not placed at a position slightly pulled up from above, the entire end face of the optical fiber is etched, and the position of the end face naturally becomes higher than the liquid level.Therefore, depending on the etching amount, the position of the first end face of the optical fiber Should be selected.

【0012】このように、光ファイバ端面位置を液面よ
り僅かに離し、表面張力により端面にのみエッチング液
が接触した状態でエッチングを進行させることによっ
て、光ファイバ外周をエッチングすることなく、光ファ
イバ端面のみのエッチングを行う事が出来る。
In this way, the position of the end face of the optical fiber is slightly separated from the liquid surface, and the etching progresses in a state where the etching liquid is in contact with only the end face due to the surface tension. Only the end face can be etched.

【0013】[0013]

【発明の効果】以上詳細に説明したように本発明の方法
および装置によれば、光ファイバの外径が一様なエッチ
ングファイバを作製することが出来る、側面をコーティ
ングしたりする必要がないので工程が少なく簡単に作製
出来る、光ファイバ端面のエッチング液の液面への接触
は端面からの反射戻り光を利用し制御しているので、予
め光ファイバをセットするときに厳密な位置決めをする
必要がなく作業が簡単である等の利点を有する。
As described in detail above, according to the method and apparatus of the present invention, it is possible to fabricate an etching fiber having a uniform outer diameter, and it is not necessary to coat the side surface. Since the number of steps is small and can be easily manufactured, the contact of the etching liquid on the end surface of the optical fiber with the liquid surface of the etching liquid is controlled by using the reflected return light from the end surface, so strict positioning is required when setting the optical fiber in advance. It has advantages such as no work and easy work.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例装置の略図。FIG. 1 is a schematic diagram of an example device of the present invention.

【図2】本発明によるエッチングの工程を示す略図。FIG. 2 is a schematic view showing a process of etching according to the present invention.

【図3】従来の方法によるエッチング工程を示す略図。FIG. 3 is a schematic view showing an etching process according to a conventional method.

【図4】従来のエッチング工程による光ファイバ外周の
変化を示す図。
FIG. 4 is a diagram showing changes in the outer circumference of an optical fiber due to a conventional etching process.

【符号の説明】[Explanation of symbols]

1 光ファイバ 2 ホルダ 3 ホルダ 4 光分岐結合器 5 光源 6 受光器 7 コントローラ 8 微動ステージ 9 ガイド 10 基板 11 エッチング液 1 Optical fiber 2 Holder 3 Holder 4 Optical branching / coupling device 5 Light source 6 Light receiver 7 Controller 8 Fine movement stage 9 Guide 10 Substrate 11 Etching liquid

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】光接続素子に用いられる光ファイバ端面の
加工方法において、エッチング溶液の液面に光ファイバ
端面を接触させた後、光ファイバ端面をエッチング溶液
の液面より僅か上方位置に移動させ、光ファイバ端面の
みエッチングするとともに、光ファイバ端面とエッチン
グ溶液の液面との接触状態を、接触面からの反射戻り光
を計測して検知することを特徴とする光ファイバ端面の
加工方法。
1. A method for processing an end face of an optical fiber used for an optical connecting element, wherein the end face of the optical fiber is brought into contact with the liquid surface of the etching solution, and then the end face of the optical fiber is moved to a position slightly above the liquid surface of the etching solution. A method for processing an optical fiber end face, characterized in that only the end face of the optical fiber is etched and the contact state between the end face of the optical fiber and the liquid surface of the etching solution is detected by measuring the reflected return light from the contact face.
【請求項2】光接続素子に用いられる光ファイバ端面の
加工装置において、エッチング溶液の液面に光ファイバ
端面を接触させた後、光ファイバ端面をエッチング溶液
の液面より僅か上方位置に移動させる微動ステージと、
光ファイバ端面とエッチング溶液の液面との接触状態
を、接触面からの反射戻り光を計測して検知する機構と
を備えたことを特徴とする光ファイバ端面の加工装置。
2. In an optical fiber end face processing apparatus used for an optical connecting element, after the optical fiber end face is brought into contact with the liquid surface of the etching solution, the optical fiber end face is moved to a position slightly above the liquid surface of the etching solution. A fine movement stage,
An apparatus for processing an optical fiber end face, comprising a mechanism for measuring a contact state between the end face of the optical fiber and a liquid surface of an etching solution by measuring reflected light from the contact face.
JP7386092A 1992-03-30 1992-03-30 Optical fiber end face processing method and processing apparatus Expired - Fee Related JP2971237B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011232514A (en) * 2010-04-27 2011-11-17 Ritsumeikan Manufacturing method of optical fiber with processed tip, tip processing apparatus for optical fiber, method of liquid level detection, and optical fiber with processed tip
US11648509B2 (en) 2019-10-04 2023-05-16 Hamilton Sundstrand Corporation Process water gas management of inert gas generation electrolyzer system with gas-activated valve

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011232514A (en) * 2010-04-27 2011-11-17 Ritsumeikan Manufacturing method of optical fiber with processed tip, tip processing apparatus for optical fiber, method of liquid level detection, and optical fiber with processed tip
US11648509B2 (en) 2019-10-04 2023-05-16 Hamilton Sundstrand Corporation Process water gas management of inert gas generation electrolyzer system with gas-activated valve

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