JPH0525089A - Production of 2-hydroxy acid derivative - Google Patents
Production of 2-hydroxy acid derivativeInfo
- Publication number
- JPH0525089A JPH0525089A JP3178032A JP17803291A JPH0525089A JP H0525089 A JPH0525089 A JP H0525089A JP 3178032 A JP3178032 A JP 3178032A JP 17803291 A JP17803291 A JP 17803291A JP H0525089 A JPH0525089 A JP H0525089A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- butyl
- acid
- metal alkoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 14
- 150000004703 alkoxides Chemical class 0.000 claims abstract description 13
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 11
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000000524 functional group Chemical group 0.000 claims abstract description 5
- 229910052987 metal hydride Inorganic materials 0.000 claims abstract description 5
- 150000004681 metal hydrides Chemical class 0.000 claims abstract description 5
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000006239 protecting group Chemical group 0.000 claims description 13
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 2
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 claims description 2
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 239000012312 sodium hydride Substances 0.000 claims description 2
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 abstract description 24
- 239000002253 acid Substances 0.000 abstract description 3
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 229940079593 drug Drugs 0.000 abstract description 2
- 239000003814 drug Substances 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical class OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 48
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 30
- -1 ec-butyl Chemical group 0.000 description 25
- 229910052739 hydrogen Inorganic materials 0.000 description 24
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 16
- 239000000126 substance Substances 0.000 description 16
- 239000000203 mixture Substances 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- 238000005160 1H NMR spectroscopy Methods 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000000921 elemental analysis Methods 0.000 description 12
- 239000012044 organic layer Substances 0.000 description 12
- 238000010898 silica gel chromatography Methods 0.000 description 12
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 11
- 150000001241 acetals Chemical class 0.000 description 11
- 229910052938 sodium sulfate Inorganic materials 0.000 description 11
- 235000011152 sodium sulphate Nutrition 0.000 description 11
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000006722 reduction reaction Methods 0.000 description 9
- 239000012300 argon atmosphere Substances 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 5
- GYFRZCJZXIMWER-UHFFFAOYSA-N 2,4-dihydroxyhexanedioic acid Chemical compound OC(=O)CC(O)CC(O)C(O)=O GYFRZCJZXIMWER-UHFFFAOYSA-N 0.000 description 5
- 150000001299 aldehydes Chemical class 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000000543 intermediate Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000008055 phosphate buffer solution Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000005886 esterification reaction Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 235000011090 malic acid Nutrition 0.000 description 4
- 239000012279 sodium borohydride Substances 0.000 description 4
- 229910000033 sodium borohydride Inorganic materials 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- IMJQBRXSCAFXSY-UHFFFAOYSA-N 2-hydroxy-4-oxohexanedioic acid Chemical compound OC(=O)C(O)CC(=O)CC(O)=O IMJQBRXSCAFXSY-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000001630 malic acid Substances 0.000 description 3
- 229940099690 malic acid Drugs 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003944 tolyl group Chemical group 0.000 description 3
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- CABVTRNMFUVUDM-VRHQGPGLSA-N (3S)-3-hydroxy-3-methylglutaryl-CoA Chemical compound O[C@@H]1[C@H](OP(O)(O)=O)[C@@H](COP(O)(=O)OP(O)(=O)OCC(C)(C)[C@@H](O)C(=O)NCCC(=O)NCCSC(=O)C[C@@](O)(CC(O)=O)C)O[C@H]1N1C2=NC=NC(N)=C2N=C1 CABVTRNMFUVUDM-VRHQGPGLSA-N 0.000 description 2
- HEWZVZIVELJPQZ-UHFFFAOYSA-N 2,2-dimethoxypropane Chemical compound COC(C)(C)OC HEWZVZIVELJPQZ-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- NGGGZUAEOKRHMA-UHFFFAOYSA-N 3-[(2-methylpropan-2-yl)oxy]-3-oxopropanoic acid Chemical compound CC(C)(C)OC(=O)CC(O)=O NGGGZUAEOKRHMA-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 229940121710 HMGCoA reductase inhibitor Drugs 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002471 hydroxymethylglutaryl coenzyme A reductase inhibitor Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 159000000003 magnesium salts Chemical class 0.000 description 2
- 150000002905 orthoesters Chemical class 0.000 description 2
- 229940096701 plain lipid modifying drug hmg coa reductase inhibitors Drugs 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 150000000185 1,3-diols Chemical class 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- IDQOCLIWDMZKBZ-UHFFFAOYSA-N 2-(2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl)acetic acid Chemical compound CC1(C)OC(CC(O)=O)C(=O)O1 IDQOCLIWDMZKBZ-UHFFFAOYSA-N 0.000 description 1
- MJVJIBWOQUOWOP-UHFFFAOYSA-N 2-(2-methyl-5-oxo-1,3-dioxolan-4-yl)acetic acid Chemical compound CC1OC(CC(O)=O)C(=O)O1 MJVJIBWOQUOWOP-UHFFFAOYSA-N 0.000 description 1
- IBMKUBQFLWTZDC-UHFFFAOYSA-N 3,5,6-trihydroxyhexanoic acid Chemical class OCC(O)CC(O)CC(O)=O IBMKUBQFLWTZDC-UHFFFAOYSA-N 0.000 description 1
- SHZVTRCNMSGMKI-UHFFFAOYSA-N 3,5-dihydroxy-6-oxohexanoic acid Chemical class OC(=O)CC(O)CC(O)C=O SHZVTRCNMSGMKI-UHFFFAOYSA-N 0.000 description 1
- CATITNIUWVBKHC-UHFFFAOYSA-N 6-o-tert-butyl 1-o-methyl 2-hydroxy-4-oxohexanedioate Chemical compound COC(=O)C(O)CC(=O)CC(=O)OC(C)(C)C CATITNIUWVBKHC-UHFFFAOYSA-N 0.000 description 1
- QWOJMRHUQHTCJG-UHFFFAOYSA-N CC([CH2-])=O Chemical compound CC([CH2-])=O QWOJMRHUQHTCJG-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 102000004316 Oxidoreductases Human genes 0.000 description 1
- 108090000854 Oxidoreductases Proteins 0.000 description 1
- 229940123934 Reductase inhibitor Drugs 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- ZCHPKWUIAASXPV-UHFFFAOYSA-N acetic acid;methanol Chemical compound OC.CC(O)=O ZCHPKWUIAASXPV-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000004651 carbonic acid esters Chemical group 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000001261 hydroxy acids Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229940116298 l- malic acid Drugs 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000004701 malic acid derivatives Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000006502 nitrobenzyl group Chemical group 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical compound CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、2−ヒドロキシ酸誘導
体の新規製造法に関するものである。2−ヒドロキシ酸
誘導体は、各種医薬品、農薬、生理活性物質等の有用な
合成中間体となるものである。FIELD OF THE INVENTION The present invention relates to a novel method for producing a 2-hydroxy acid derivative. The 2-hydroxy acid derivative is a useful synthetic intermediate for various drugs, agricultural chemicals, physiologically active substances and the like.
【0002】[0002]
【従来の技術】従来、2−ヒドロキシ酸のアセタール誘
導体から2−ヒドロキシ酸エステルへの一段階変換法と
しては、酸性条件下でのアルコール処理による方法が知
られているが、t−ブチルエステル基やテトラヒドロピ
ラニル基等、酸性条件下では容易に変化してしまうよう
な官能基を同時に有する基質に対しては用いる事ができ
なかった。二段階変換法としては加水分解反応を行って
アセタール部をα−ヒドロキシカルボン酸とした後通常
のエステル化反応を行う方法が挙げられるが、手間がか
かる。2. Description of the Related Art Conventionally, as a one-step conversion method from an acetal derivative of 2-hydroxy acid to a 2-hydroxy acid ester, a method by treating with alcohol under acidic conditions has been known. It could not be used for a substrate having at the same time a functional group, such as or a tetrahydropyranyl group, which easily changes under acidic conditions. Examples of the two-step conversion method include a method in which a hydrolysis reaction is performed to convert the acetal portion to α-hydroxycarboxylic acid and then a normal esterification reaction is performed, but it takes time and effort.
【0003】[0003]
【課題を解決するための手段】本発明者らはかかる実状
に鑑み、効果的で経済性に優れた2−ヒドロキシ酸のア
セタール誘導体から2−ヒドロキシ酸エステルへの一段
階変換法を鋭意検討した結果、2−ヒドロキシ酸エステ
ルの実用的な新規製造法を見いだし、本発明を完成し
た。In view of such circumstances, the present inventors have earnestly studied an effective and economical one-step conversion method from an acetal derivative of 2-hydroxy acid to a 2-hydroxy acid ester. As a result, they have found a practical new production method of 2-hydroxy acid ester and completed the present invention.
【0004】即ち本発明は、式(1):That is, the present invention uses the formula (1):
【化5】
(式中、XおよびYはそれぞれ独立に水素原子、アルキ
ル基、アラルキル基もしくはアリール基を表すか、また
はXとYは共同で環を形成する。Aは金属アルコキシド
と反応しない任意の官能基を表す。)で示される2−ヒ
ドロキシ酸誘導体を金属アルコキシドと反応させること
からなる、式(2):[Chemical 5] (In the formula, X and Y each independently represent a hydrogen atom, an alkyl group, an aralkyl group or an aryl group, or X and Y jointly form a ring. A is any functional group which does not react with a metal alkoxide. Of a 2-hydroxy acid derivative represented by the formula (2):
【化6】
(式中、R1はアルキル基、アラルキル基、アリール基
またはシリル基を表し、Pは水素原子または水酸基の保
護基を表す。Aは前記と同意義。)で示される2−ヒド
ロキシ酸誘導体の製造法に関する。[Chemical 6] (In the formula, R 1 represents an alkyl group, an aralkyl group, an aryl group or a silyl group, P represents a hydrogen atom or a protective group of a hydroxyl group, and A represents the same meaning as described above.) Regarding manufacturing method.
【0005】特に、Aが式(7):In particular, A is the formula (7):
【化7】
(式中、R2は水素原子またはアルキル基、アラルキル
基、アリール基またはシリル基を表す。)で示される基
である式(4):[Chemical 7] (In the formula, R 2 represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a silyl group.) Formula (4):
【化8】
(式中、R1,R2,Pは前記と同意義。)で表される2
−ヒドロキシ酸誘導体、またはAが式(8):[Chemical 8] (Wherein R 1 , R 2 and P have the same meanings as described above) 2
A hydroxy acid derivative, or A is of formula (8):
【化9】
(式中、Qは水素原子または水酸基の保護基を表す。R
2は前記と同意義。)である式(6):[Chemical 9] (In the formula, Q represents a hydrogen atom or a hydroxyl-protecting group. R
2 has the same meaning as above. ) Is a formula (6):
【化10】
(式中、R1,R2,P,Qは前記と同意義。)で表され
る2−ヒドロキシ酸誘導体の製造法に関する。[Chemical 10] (In the formula, R 1 , R 2 , P and Q have the same meanings as described above.) The present invention relates to a method for producing a 2-hydroxy acid derivative.
【0006】ここで本発明におけるX,Yの例としては
(X,Y)がそれぞれ独立に水素原子;メチル、エチ
ル、プロピル、イソプロピル、ブチル、イソブチル、s
ec−ブチル、t−ブチル、ペンチル、ヘキシル、ヘプ
チル、オクチル基などのようなアルキル基;ベンジル基
やp−ニトロベンジル基などのようなアラルキル基;フ
ェニル基やトリル基などのようなアリール基など、また
はそれらの組み合わせ、あるいは、XおよびYが共同で
環を形成したアセタール型保護基や、XおよびYのいず
れか一方が水素原子、アルキル基、アラルキル基等であ
り、残る一方がメトキシ、エトキシ、プロポキシ、イソ
プロポキシ、ブトキシ、フェノキシ等のアルコキシ基で
あるようなオルトエステル型保護基などを挙げることが
できる。As examples of X and Y in the present invention, (X, Y) are each independently a hydrogen atom; methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s.
alkyl groups such as ec-butyl, t-butyl, pentyl, hexyl, heptyl and octyl groups; aralkyl groups such as benzyl group and p-nitrobenzyl group; aryl groups such as phenyl group and tolyl group , Or a combination thereof, or an acetal-type protecting group in which X and Y together form a ring, or one of X and Y is a hydrogen atom, an alkyl group, an aralkyl group, etc., and the remaining one is methoxy or ethoxy. And an orthoester type protecting group such as an alkoxy group such as propoxy, isopropoxy, butoxy, phenoxy and the like.
【0007】PまたはQとしての水酸基の保護基として
は「プロテクティブ・グループス・イン・オーガニック
・シンセシス」“Protective Groups
in Organic Synthesis”セオド
ア・ダブリュ・グリーン(Theodor W. Gr
eene)著、ジョン・ワイリー・アンド・サンズ(J
OHN WILEY & SONS)出版、1981年
の10〜72頁に記載されているような各種の保護基が
挙げられる。すなわち例えばアセチル基やベンゾイル基
のようなエステル型保護基、ベンジル基、p−ニトロベ
ンジル基のようなエーテル型保護基、トリチル基のよう
なアルキル基、トリメチルシリル、トリエチルシリル、
トリイソプロピルシリル、t−ブチルジメチルシリル、
イソブチルジメチルシリル、テキシルジメチルシリル、
t−ブチルジフェニルシリル基のようなシリル型保護
基、t−ブトキシカルボニル基、ベンジルオキシカルボ
ニル基のような炭酸エステル型保護基等があげられる。Examples of the protective group for the hydroxyl group as P or Q include "Protective Groups in Organic Synthesis" and "Protective Groups".
in Organic Synthesis "Theodor W. Gr.
eene), John Wiley and Sons (J
OHN WILEY & SONS), pp. 10-72, 1981. That is, for example, ester type protecting groups such as acetyl group and benzoyl group, benzyl group, ether type protecting groups such as p-nitrobenzyl group, alkyl groups such as trityl group, trimethylsilyl, triethylsilyl,
Triisopropylsilyl, t-butyldimethylsilyl,
Isobutyldimethylsilyl, thexyldimethylsilyl,
Examples thereof include silyl type protecting groups such as t-butyldiphenylsilyl group, carbonic acid ester type protecting groups such as t-butoxycarbonyl group and benzyloxycarbonyl group.
【0008】R1の例としては、メチル、エチル、プロ
ピル、イソプロピル、ブチル、イソプチル、sec−ブ
チル、t−ブチル、ペンチル、ヘキシル、ヘプチル、オ
クチル基などのようなアルキル基;ベンジル基やp−ニ
トロベンジル基などのようなアラルキル基;フェニル基
やトリル基などのようなアリール基;トリメチルシリ
ル、トリエチルシリル、トリイソプロピルシリル、t−
ブチルジメチルシリル、イソブチルジメチルシリル、テ
キシルジメチルシリル、t−ブチルジフェニルシリル基
のようなシリル基等が挙げられる。Examples of R 1 are alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isoptyl, sec-butyl, t-butyl, pentyl, hexyl, heptyl and octyl groups; benzyl group and p-type group. Aralkyl groups such as nitrobenzyl group; aryl groups such as phenyl group and tolyl group; trimethylsilyl, triethylsilyl, triisopropylsilyl, t-
Examples thereof include silyl groups such as butyldimethylsilyl, isobutyldimethylsilyl, thexyldimethylsilyl, and t-butyldiphenylsilyl groups.
【0009】R2の例としては、水素原子;メチル、エ
チル、プロピル、イソプロピル、ブチル、イソブチル、
sec−ブチル、t−ブチル、ペンチル、ヘキシル、ヘ
ブチル、オクチル基などのようなアルキル基;ベンジル
基やp−ニトロベンジル基などのようなアラルキル基;
フェニル基やトリル基などのようなアリール基;トリメ
チルシリル、トリエチルシリル、トリイソプロピルシリ
ル、t−ブチルジメチルシリル、イソブチルジメチルシ
リル、テキシルジメチルシリル、t−ブチルジフェニル
シリル基のようなシリル基等が挙げられる。Examples of R 2 are hydrogen atom; methyl, ethyl, propyl, isopropyl, butyl, isobutyl,
Alkyl groups such as sec-butyl, t-butyl, pentyl, hexyl, hebutyl, octyl groups; aralkyl groups such as benzyl group and p-nitrobenzyl group;
Aryl groups such as phenyl group and tolyl group; silyl groups such as trimethylsilyl, triethylsilyl, triisopropylsilyl, t-butyldimethylsilyl, isobutyldimethylsilyl, thexyldimethylsilyl, t-butyldiphenylsilyl group, etc. To be
【0010】本発明に於ける化合物の関係を式で表すと
例えば次の通りである。The relations of the compounds in the present invention are represented by the formulas, for example, as follows.
【化11】 [Chemical 11]
【0011】リンゴ酸等から既知の方法で容易に誘導で
きる化合物(3)は、本発明のエステル化反応によっ
て、エステル基・ケト基など他の官能基に影響を与える
事なく容易に化合物(4)に導いた後、還元反応に付
し、更に必要に応じて保護基の導入を行うことにより化
合物(6)が得られる。あるいは化合物(3)をまず還
元反応に付して化合物(5)とした後、本発明のエステ
ル化反応によって極めて容易に化合物(6)が生成す
る。化合物(6)は例えば1位のエステル基を選択的に
還元することにより種々のHMG−CoA還元酵素阻害
剤の製造における極めて有用な中間体とすることができ
る。The compound (3), which can be easily derived from malic acid or the like by a known method, can be easily compounded by the esterification reaction of the present invention without affecting other functional groups such as ester group and keto group (4). Compound (6) is obtained by introducing the compound into a compound (6), then subjecting it to a reduction reaction, and further introducing a protecting group if necessary. Alternatively, compound (3) is first subjected to a reduction reaction to give compound (5), and then compound (6) is extremely easily produced by the esterification reaction of the present invention. The compound (6) can be made into an extremely useful intermediate in the production of various HMG-CoA reductase inhibitors by, for example, selectively reducing the 1-position ester group.
【0012】また、本発明における化合物(1)、
(2)、(3)、(4)、(5)および(6)は2位に
不斉炭素を持ち、さらに化合物(5)および(6)では
4位の炭素も不斉炭素であるので、本発明は(2R)、
(2S)あるいは(2R,4R)、(2R,4S)、
(2S,4R)、(2S,4S)のすべての光学活性体
及びその任意の割合での混合物及びラセミ化合物の製造
法すべてを包含するものである。光学活性なリンゴ酸を
用い、さらに還元方法に工夫を加えることにより効率的
に、ラセミ化することなく化合物(1)、(2)、
(3)、(4)、(5)および(6)の光学活性体を製
造できる。特にL−リンゴ酸を用いた場合、HMG−C
oA還元酵素阻害剤合成に重要な(2S,4R)の立体
配置を不斉誘起的還元により効率よく構築することが可
能である。Further, the compound (1) in the present invention,
(2), (3), (4), (5) and (6) have an asymmetric carbon at the 2-position, and in compounds (5) and (6) the carbon at the 4-position is also an asymmetric carbon. , The present invention is (2R),
(2S) or (2R, 4R), (2R, 4S),
It includes all the methods for producing (2S, 4R), all optically active isomers of (2S, 4S), a mixture thereof in any proportion, and a racemic compound. By using optically active malic acid and further improving the reduction method, compounds (1), (2),
The optically active substances (3), (4), (5) and (6) can be produced. Especially when L-malic acid is used, HMG-C
It is possible to efficiently construct the (2S, 4R) configuration important for oA reductase inhibitor synthesis by asymmetric induction reduction.
【0013】以下に本発明の製法を詳細に説明する。本
発明における出発原料である2−ヒドロキシ酸誘導体
(1)は2−ヒドロキシ酸から容易に誘導できる。例え
ば、まず2−ヒドロキシ酸と各種のケトンやアルデヒ
ド、オルトエステル等を反応させて、2−ヒドロキシ酸
の水酸基と1位のカルボン酸を同時に保護すればよい
(例えば、テトラヘドロン・レターズ(Tetrahe
doron Lett.)28,1685(198
7)、テトラヘドロン(Tetrahedron)4
0,1313(1984)など参照)。例えば、リンゴ
酸のアセトニド化により得られるリンゴ酸誘導体の4位
のカルボン酸部に対しては通常利用される増炭反応によ
る2炭素増炭が可能であり、また例えばカルボニルジイ
ミダゾールやクロルギ酸エステル等を用いて活性エステ
ルとするか、または塩化チオニル等により酸塩化物とし
た後にMgエノラートなどの2炭素増炭剤と反応させる
ことにより化合物(3)が得られる。The manufacturing method of the present invention will be described in detail below. The 2-hydroxy acid derivative (1) which is the starting material in the present invention can be easily derived from 2-hydroxy acid. For example, first, a 2-hydroxy acid may be reacted with various ketones, aldehydes, orthoesters or the like to simultaneously protect the hydroxyl group of 2-hydroxy acid and the carboxylic acid at the 1-position (eg, tetrahedron letters (Tetrahe).
doron Lett. ) 28 , 1685 (198)
7), Tetrahedron 4
0 , 1313 (1984), etc.). For example, for the carboxylic acid moiety at the 4-position of the malic acid derivative obtained by the acetonide conversion of malic acid, it is possible to increase the carbon by 2 carbons by the carbonization reaction that is usually used, and for example, carbonyldiimidazole and chloroformate. The compound (3) can be obtained by converting the compound into an active ester using, for example, or converting it into an acid chloride with thionyl chloride, and then reacting it with a two-carbon carbonaceous agent such as Mg enolate.
【0014】化合物(1)から化合物(2)への変換、
例えば化合物(3)から化合物(4)、化合物(5)か
ら化合物(6)へ変換するには、金属アルコキシドでア
セタール(3)を処理することにより一段階でエステル
化することができる。金属アルコキシドとしてはナトリ
ウムエトキシド、ナトリウムメトキシド、カリウムメト
キシド、カリウムエトキシド等の一般的な金属アルコキ
シドを用いることができるし、金属ヒドリドや金属アミ
ドあるいは有機金属などの塩基と、各種アルコールとの
組み合わせにより調製した金属アルコキシドを用いても
よい。またその際の反応溶媒としては、対応するアルコ
ールを用いてもよいし、THF、トルエン、エーテル、
ジオキサン等の非プロトン性溶媒を用いてもよいし、そ
れらを組み合わせてもよい。Conversion of compound (1) to compound (2),
For example, in order to convert the compound (3) to the compound (4) and the compound (5) to the compound (6), the acetal (3) can be treated with a metal alkoxide to effect the esterification in one step. As the metal alkoxide, a general metal alkoxide such as sodium ethoxide, sodium methoxide, potassium methoxide, and potassium ethoxide can be used, and a base such as a metal hydride or metal amide or an organic metal and various alcohols can be used. You may use the metal alkoxide prepared by combination. As the reaction solvent at that time, a corresponding alcohol may be used, or THF, toluene, ether,
An aprotic solvent such as dioxane may be used or they may be combined.
【0015】反応温度は溶媒の凝固点から沸点まで広い
範囲の中から採用できるが、操作上の簡便さから−80
℃〜60℃の範囲が好ましい。The reaction temperature can be selected from a wide range from the freezing point to the boiling point of the solvent, but it is -80 because of its simple operation.
The range of 60 ° C to 60 ° C is preferable.
【0016】化合物(3)から化合物(5)へ、あるい
は化合物(4)から化合物(6)への変換は、金属ヒド
リドによる還元反応あるいは接触水素添加反応等、通常
の還元反応が利用できる。For converting the compound (3) to the compound (5) or from the compound (4) to the compound (6), a general reduction reaction such as a reduction reaction with a metal hydride or a catalytic hydrogenation reaction can be used.
【0017】なお、各工程において、必要に応じて、
P,Qの水酸基の保護基の導入を行うことができる。こ
れらは公知の方法で行うことができ、例えば(6)の化
合物でP,Qがいずれも水素原子である1,3−ジオー
ルから、P,Qが共同してイソプロピリデン基を形成す
るようなアセタール型保護を行うには、アセトンと硫酸
あるいはジメトキシプロパンとp−トルエンスルホン酸
ピリジニウム塩を作用させればよい。In each step, if necessary,
A protective group for the hydroxyl groups of P and Q can be introduced. These can be carried out by a known method, for example, in the compound (6), P and Q together form an isopropylidene group from 1,3-diol in which P and Q are both hydrogen atoms. In order to carry out the acetal type protection, acetone and sulfuric acid or dimethoxypropane and pyridinium p-toluenesulfonate may be allowed to act.
【0018】化合物(6)はHMG−CoA還元酵素阻
害剤製造における極めて有用な中間体として用いること
ができる。例えば1位がエステルである場合、還元反応
により容易にアルコールまたはアルデヒドに変換でき
る。例えば水素化ホウ素ナトリウム等のような安価で容
易に使用可能な還元剤を用いることにより、きわめて簡
便かつ安全に3,5,6−トリヒドロキシヘキサン酸誘
導体が製造できる。また3,5−ジヒドロキシ−6−オ
キソ−ヘキサン酸誘導体を製造するには、適当な処理に
より化合物(6)の1位がカルボン酸であるものを調製
した後酸塩化物へと導き、水素添加反応によりアルデヒ
ドとするかまたは化合物(6)の1位がエステルである
ものを調製した後、還元反応あるいは還元反応とそれに
引き続く酸化反応によりアルデヒドへと導くことができ
る。The compound (6) can be used as an extremely useful intermediate in the production of HMG-CoA reductase inhibitors. For example, when the 1-position is an ester, it can be easily converted into an alcohol or an aldehyde by a reduction reaction. For example, by using an inexpensive and easily usable reducing agent such as sodium borohydride, the 3,5,6-trihydroxyhexanoic acid derivative can be produced very simply and safely. Further, in order to produce a 3,5-dihydroxy-6-oxo-hexanoic acid derivative, a compound (6) in which the 1-position is a carboxylic acid is prepared by an appropriate treatment and then introduced into an acid chloride, followed by hydrogenation. The aldehyde can be converted to an aldehyde by the reaction, or after the compound (6) having an ester at the 1-position is prepared, it can be converted to an aldehyde by a reduction reaction or a reduction reaction and a subsequent oxidation reaction.
【0019】化合物(1)〜(6)を単離するには、い
ずれも有機化学において一般的な方法を用いることがで
き、抽出、シリカゲルカラムクロマトグラフィー、蒸留
などで精製することができる。また各工程からはそれぞ
れの化合物を精製することなく次工程へ進めることも可
能である。In order to isolate the compounds (1) to (6), any method generally used in organic chemistry can be used, and the compounds (1) to (6) can be purified by extraction, silica gel column chromatography, distillation or the like. It is also possible to proceed to the next step from each step without purifying each compound.
【0020】[0020]
【実施例】以下、実施例及び参考例をあげて本発明を更
に説明するが、もとより本発明はこれに限定されるもの
ではない。EXAMPLES The present invention will be further described below with reference to examples and reference examples, but the present invention is not limited thereto.
【0021】実施例1
4−(2,2−ジメチル−5−オキソ−1,3−ジオ
キソラン−4−イル)−3−オキソブタン酸 t−ブチ
ルの製造[0021]Example 1
4- (2,2-dimethyl-5-oxo-1,3-dio
Xylan-4-yl) -3-oxobutanoic acid t-butyl
Manufacturing
【化12】
2,2−ジメチル−5−オキソ−1,3−ジオキソラン
−4−酢酸2.09g(12mmol)のTHF72.
0ml中溶液に、アルゴン雰囲気下、カルボニルジイミ
ダゾール2.14g(13.2mmol)を0℃で加え
て15分間撹拌した後、室温にて4時間撹拌した。得ら
れた溶液にビス(マロン酸 モノt−ブチルエステル)
マグネシウム塩5.35g(15.6mmol)を室温
で加え、18時間撹拌した。THFを減圧留去した後、
25%クエン酸水溶液100mlを加え、酢酸エチルを
用いて抽出した。有機層を150ml飽和NaHCO3
水溶液で洗浄し、硫酸ナトリウムで乾燥し、減圧留去し
た。残査をシリカゲルカラムクロマトグラフィ(ヘキサ
ン:酢酸エチル=3:1)に付すことにより純粋な4−
(2,2−ジメチル−5−オキソ−1,3−ジオキソラ
ン−4−イル)−3−オキソブタン酸 t−ブチル
3.14g(11.5mmol)を得た。収率96.1
%[Chemical 12] 2,2-Dimethyl-5-oxo-1,3-dioxolane-4-acetic acid 2.09 g (12 mmol) in THF 72.
To the solution in 0 ml, under an argon atmosphere, 2.14 g (13.2 mmol) of carbonyldiimidazole was added at 0 ° C., and the mixture was stirred for 15 minutes and then at room temperature for 4 hours. Bis (malonic acid mono-t-butyl ester) was added to the resulting solution.
Magnesium salt (5.35 g, 15.6 mmol) was added at room temperature, and the mixture was stirred for 18 hours. After distilling off THF under reduced pressure,
100 ml of 25% citric acid aqueous solution was added, and the mixture was extracted with ethyl acetate. 150 ml of the organic layer is saturated NaHCO 3
It was washed with an aqueous solution, dried over sodium sulfate, and evaporated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: ethyl acetate = 3: 1) to give pure 4-
(2,2-Dimethyl-5-oxo-1,3-dioxolan-4-yl) -3-oxobutanoic acid t-butyl
3.14 g (11.5 mmol) was obtained. Yield 96.1
%
【0022】1H−NMR (90MHz、CDC
l3):δ4.71(m,1H),δ3.37(s,2
H),δ3.10(m,2H),δ1.61(s,3
H),δ1.56(s,3H),δ1.46(s,9
H)
元素分析:分析値 C57.57%、 H 7.23%
計算値 C57.34%、 H 7.40% (C13H
20O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ 4.71 (m, 1H), δ 3.37 (s, 2)
H), δ 3.10 (m, 2H), δ 1.61 (s, 3
H), δ1.56 (s, 3H), δ1.46 (s, 9
H) Elemental analysis: analytical value C57.57%, H 7.23% calculated value C57.34%, H 7.40% (C 13 H
20 O 6 )
【0023】実施例2
2−ヒドロキシ−4−オキソアジピン酸 1−メチル
6−t−ブチルの製造[0023]Example 2
2-hydroxy-4-oxoadipic acid 1-methyl
Production of 6-t-butyl
【化13】
実施例1と同じ方法で得た4−(2,2−ジメチル−5
−オキソ−1,3−ジオキソラン−4−イル)−3−オ
キソブタン酸 t−ブチル16.30g(60.08m
mol)のトルエン120.0ml中溶液に、0℃でア
ルゴン雰囲気下、ナトリウムメトキシド(1M メタノ
ール溶液)60.3mlを10分間かけて滴下した。0
℃で30分間撹拌した後、1N塩酸60.5mlを滴下
し、0℃で10分間撹拌した。有機溶媒の大部分を減圧
留去した後、酢酸エチルで抽出し、飽和食塩水とリン酸
緩衝溶液(pH7.0)により洗浄した。有機層を合わ
せて硫酸ナトリウムで乾燥し減圧留去した。残査をシリ
カゲルカラムクロマトグラフィ(ヘキサン:アセトン=
2:1)に付すことにより純粋な2−ヒドロキシ−4−
オキソアジピン酸 1−メチル 6−t−ブチル 1
4.26g(57.91mmol)を得た。収率96.
4%[Chemical 13] 4- (2,2-dimethyl-5) obtained in the same manner as in Example 1
-Oxo-1,3-dioxolan-4-yl) -3-oxobutanoic acid t-butyl 16.30 g (60.08 m)
To a solution of (mol) in 120.0 ml of toluene, 60.3 ml of sodium methoxide (1M methanol solution) was added dropwise at 0 ° C. under an argon atmosphere over 10 minutes. 0
After stirring for 30 minutes at 0 ° C, 60.5 ml of 1N hydrochloric acid was added dropwise, and the mixture was stirred for 10 minutes at 0 ° C. Most of the organic solvent was distilled off under reduced pressure, followed by extraction with ethyl acetate and washing with saturated saline and a phosphate buffer solution (pH 7.0). The organic layers were combined, dried over sodium sulfate, and evaporated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: acetone =
2: 1) to give pure 2-hydroxy-4-
1-Methyl 6-t-butyl oxoadipate 1
Obtained 4.26 g (57.91 mmol). Yield 96.
4%
【0024】1H−NMR (90MHz、CDC
l3):δ4.52(m,1H),δ3.95(br,
1H),δ3.80(s,3H),δ3.40(s,2
H),δ3.04(m,2H),δ1.46(s,9
H)
元素分析:分析値 C53.45%、H 7.27%
計算値 C53.65%、H 7.37% (C11H18
O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ4.52 (m, 1H), δ3.95 (br,
1H), δ3.80 (s, 3H), δ3.40 (s, 2)
H), δ3.04 (m, 2H), δ1.46 (s, 9
H) Elemental analysis: Analytical value C53.45%, H 7.27% Calculated value C53.65%, H 7.37% (C 11 H 18
O 6 )
【0025】実施例3
2−ヒドロキシ−4−オキソアジピン酸 1−エチル
6−t−ブチルの製造[0025]Example 3
2-Hydroxy-4-oxoadipate 1-ethyl
Production of 6-t-butyl
【化14】
実施例1と同じ方法で得た4−(2,2−ジメチル−5
−オキソ−1,3−ジオキソラン−4−イル)−3−オ
キソブタン酸 t−ブチル 16.30g(60.08
mmol)のトルエン120.0ml−エタノール6
0.0ml混合溶媒中溶液に、0℃でアルゴン雰囲気
下、ナトリウムエトキシド4.91g(79.10mm
ol)を滴下した。0℃で30分間撹拌した後 1N塩
酸80.5mlを滴下し、0℃で10分間撹拌した。有
機溶媒の大部分を減圧留去した後、酢酸エチルで抽出
し、飽和食塩水とリン酸緩衝溶液(pH7.0)により
洗浄した。有機層を合わせて硫酸ナトリウムで乾燥し、
減圧濃縮した。残査をシリカゲルカラムクロマトグラフ
ィ(ヘキサン:アセトン=2:1)に付すことにより純
粋な2−ヒドロキシ−4−オキソアジピン酸 1−エチ
ル 6−t−ブチル 14.02g(53.85mmo
l)を得た。収率89.6%[Chemical 14] 4- (2,2-dimethyl-5) obtained in the same manner as in Example 1
T-Butyl-oxo-1,3-dioxolan-4-yl) -3-oxobutanoate 16.30 g (60.08)
mmol) of toluene 120.0 ml-ethanol 6
4.91 g (79.10 mm) of sodium ethoxide was added to a solution in a mixed solvent of 0.0 ml at 0 ° C. under an argon atmosphere.
ol) was added dropwise. After stirring at 0 ° C for 30 minutes, 80.5 ml of 1N hydrochloric acid was added dropwise, and the mixture was stirred at 0 ° C for 10 minutes. Most of the organic solvent was distilled off under reduced pressure, followed by extraction with ethyl acetate and washing with saturated saline and a phosphate buffer solution (pH 7.0). The organic layers are combined and dried over sodium sulfate,
It was concentrated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: acetone = 2: 1) to give pure 2-hydroxy-4-oxoadipate 1-ethyl 6-t-butyl 14.02 g (53.85 mmo).
l) was obtained. Yield 89.6%
【0026】1H−NMR (90MHz、CDC
l3):δ4.52(m,1H),δ4.30(q,2
H),δ3.43(s,2H),δ3.20(m,2
H),δ2.96(br,1H),δ1.46(s,9
H),δ1.28(t,3H)
元素分析:分析値 C 55.44%、 H 7.70
%
計算値 C 55.37%、 H 7.75% (C12
H20O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ4.52 (m, 1H), δ4.30 (q, 2)
H), δ3.43 (s, 2H), δ3.20 (m, 2)
H), δ2.96 (br, 1H), δ1.46 (s, 9
H), δ1.28 (t, 3H) Elemental analysis: analytical value C 55.44%, H 7.70
% Calculated values C 55.37%, H 7.75% (C 12
H 20 O 6)
【0027】実施例4
2−ヒドロキシ−4−オキソアジピン酸 1−イソプ
ロピル 6−t−ブチルの製造[0027]Example 4
2-Hydroxy-4-oxoadipic acid 1-isop
Production of ropyl 6-t-butyl
【化15】
アルゴン雰囲気下、水素化ナトリウム(60% 油中)
6.0g(150mmol)をヘキサンで洗浄して乾燥
させた後、THF170mlと混合した。この混合物を
0℃に冷却し、イソプロパノール30mlを滴下したと
ころ黄色溶液が生成した。実施例1で得た4−(2,2
−ジメチル−5−オキソ−1,3−ジオキソラン−4−
イル)−3−オキソブタン酸 t−ブチル 13.62
g(50.00mmol)をトルエン100.0mlに
溶解した後0℃に冷却し、上記の黄色溶液を滴下した。
0℃で30分間撹拌した後 1N塩酸60.0mlを滴
下し0℃で10分間撹拌した。有機溶媒の大部分を減圧
留去した後、酢酸エチルで抽出し、飽和食塩水とリン酸
緩衝溶液(pH7.0)により洗浄した。有機層を合わ
せて硫酸ナトリウムで乾燥し、減圧濃縮した。残査をシ
リカゲルカラムクロマトグラフィ(ヘキサン:アセトン
=2:1)に付すことにより純粋な2−ヒドロキシ−4
−オキソアジピン酸 1−イソプロピル 6−t−ブチ
ル 11.07g(40.35mmol)を得た。収率
80.7%[Chemical 15] Sodium hydride (60% in oil) under argon atmosphere
6.0 g (150 mmol) was washed with hexane, dried, and then mixed with 170 ml of THF. The mixture was cooled to 0 ° C. and 30 ml of isopropanol was added dropwise to form a yellow solution. 4- (2,2 obtained in Example 1
-Dimethyl-5-oxo-1,3-dioxolane-4-
Yl) -3-oxobutanoic acid t-butyl 13.62
g (50.00 mmol) was dissolved in 100.0 ml of toluene, cooled to 0 ° C., and the above yellow solution was added dropwise.
After stirring at 0 ° C for 30 minutes, 60.0 ml of 1N hydrochloric acid was added dropwise, and the mixture was stirred at 0 ° C for 10 minutes. Most of the organic solvent was distilled off under reduced pressure, followed by extraction with ethyl acetate and washing with saturated saline and a phosphate buffer solution (pH 7.0). The organic layers were combined, dried over sodium sulfate, and concentrated under reduced pressure. Pure 2-hydroxy-4 was obtained by subjecting the residue to silica gel column chromatography (hexane: acetone = 2: 1).
There was obtained 11.07 g (40.35 mmol) of 1-isopropyl 6-t-butyl -oxoadipate. Yield 80.7%
【0028】1H−NMR (90MHz、CDC
l3):δ5.12(m,1H),δ4.47(m,1
H),δ3.43(s,2H),δ3.25(br,1
H),δ3.00(m,2H),δ1.46(s,9
H),δ1.30(s,3H),δ1.23(s,3
H)
元素分析:分析値 C 56.84%、 H 8.02
%
計算値 C 56.92%、 H 8.08% (C13
H22O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ5.12 (m, 1H), δ4.47 (m, 1)
H), δ3.43 (s, 2H), δ3.25 (br, 1
H), δ3.00 (m, 2H), δ1.46 (s, 9
H), δ1.30 (s, 3H), δ1.23 (s, 3)
H) Elemental analysis: analytical value C 56.84%, H 8.02
% Calculated value C 56.92%, H 8.08% (C 13
H 22 O 6)
【0029】実施例5
4−(2,2−ジメチル−5−オキソ−1,3−ジオ
キソラン−4−イル)−3−ヒドロキシブタン酸 t−
ブチルの製造[0029]Example 5
4- (2,2-dimethyl-5-oxo-1,3-dio
Xylan-4-yl) -3-hydroxybutanoic acid t-
Butyl production
【化16】
実施例1と同様の方法で得た4−(2,2−ジメチル−
5−オキソ−1,3−ジオキソラン−4−イル)−3−
オキソブタン酸 t−ブチル 10.88g(40.0
mmol)をTHF20mlに溶解した後、−78℃
で、THF96.0ml−BEt3(1M THF溶
液)56.0ml混合溶液を45分間かけて滴下した。
−78℃で50分間撹拌した後、水素化ホウ素ナトリウ
ム1.51g(40.0mmol)を一度に加え、さら
に−78℃で4時間撹拌した後、0℃の1N塩酸に注
ぎ、酢酸エチルで抽出し、飽和食塩水により洗浄した。
有機層を合わせて硫酸ナトリウムで乾燥し、減圧濃縮し
た。残査をシリカゲルカラムクロマトグラフィ(ヘキサ
ン:酢酸エチル=2:1)に付すことにより純粋な4−
(2,2−ジメチル−5−オキソ−1,3−ジオキソラ
ン−4−イル)−3−ヒドロキシブタン酸 t−ブチル
6.08g(22.16mmol)を得た。収率55
%[Chemical 16] 4- (2,2-dimethyl-obtained in the same manner as in Example 1
5-oxo-1,3-dioxolan-4-yl) -3-
T-Butyl oxobutanoate 10.88 g (40.0
mmol) in 20 ml of THF and then at -78 ° C.
Then, a mixed solution of THF 96.0 ml-BEt 3 (1M THF solution) 56.0 ml was added dropwise over 45 minutes.
After stirring at −78 ° C. for 50 minutes, 1.51 g (40.0 mmol) of sodium borohydride was added at once, and the mixture was further stirred at −78 ° C. for 4 hours, then poured into 0 ° C. 1N hydrochloric acid, and extracted with ethyl acetate. And washed with saturated saline.
The organic layers were combined, dried over sodium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: ethyl acetate = 2: 1) to give pure 4-
There was obtained 6.08 g (22.16 mmol) of t-butyl (2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl) -3-hydroxybutanoate. Yield 55
%
【0030】1H−NMR (90MHz、CDC
l3):δ4.71(m,1H),δ4.28(br,
1H),δ3.40(m,1H),δ2.50(m,2
H),δ2.00(m,2H),δ1.61(s,3
H),δ1.56(s,3H),δ1.46(s,9
H)
元素分析:分析値 C57.07%、 H 8.13%
計算値 C56.92%、 H 8.08% (C13H
22O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ 4.71 (m, 1H), δ 4.28 (br,
1H), δ3.40 (m, 1H), δ2.50 (m, 2)
H), δ2.00 (m, 2H), δ1.61 (s, 3
H), δ1.56 (s, 3H), δ1.46 (s, 9
H) Elemental analysis: analysis C57.07%, H 8.13% Calculated C56.92%, H 8.08% (C 13 H
22 O 6 )
【0031】実施例6
2,4−ジヒドロキシアジピン酸 1−メチル 6−
t−ブチル の製造[0031]Example 6
2,4-Dihydroxyadipic acid 1-methyl 6-
Production of t-butyl
【化17】
実施例5で得た4−(2,2−ジメチル−5−オキソ−
1,3−ジオキソラン−4−イル)−3−ヒドロキシブ
タン酸 t−ブチル 5.49g(20.0mmol)
をトルエン40.0ml溶解した後、0℃でアルゴン雰
囲気下、ナトリウムメトキシド(1M メタノール溶
液)30.0mlを滴下した。0℃で30分間撹拌した
後、1N塩酸30.5mlを滴下し、0℃で10分間撹
拌した。有機溶媒の大部分を減圧留去した後、酢酸エチ
ルで抽出し、飽和食塩水とリン酸緩衝溶液(pH7.
0)により洗浄した。有機層を合わせて硫酸ナトリウム
で乾燥し、減圧濃縮した。残査をシリカゲルカラムクロ
マトグラフィ(ヘキサン:アセトン=2:1)に付すこ
とにより純粋な2,4−ジヒドロキシアジピン酸 1−
メチル 6−t−ブチル 3.69g(14.9mmo
l)を得た。収率74.3%[Chemical 17] 4- (2,2-dimethyl-5-oxo-obtained in Example 5
1,3-dioxolan-4-yl) -3-hydroxybutanoic acid t-butyl 5.49 g (20.0 mmol)
Was dissolved in 40.0 ml of toluene, and 30.0 ml of sodium methoxide (1M methanol solution) was added dropwise at 0 ° C. under an argon atmosphere. After stirring at 0 ° C for 30 minutes, 30.5 ml of 1N hydrochloric acid was added dropwise, and the mixture was stirred at 0 ° C for 10 minutes. Most of the organic solvent was distilled off under reduced pressure, followed by extraction with ethyl acetate, a saturated saline solution and a phosphate buffer solution (pH 7.
Washed with 0). The organic layers were combined, dried over sodium sulfate, and concentrated under reduced pressure. Pure 2,4-dihydroxyadipic acid 1- was obtained by subjecting the residue to silica gel column chromatography (hexane: acetone = 2: 1).
Methyl 6-t-butyl 3.69 g (14.9 mmo
l) was obtained. Yield 74.3%
【0032】1H−NMR (90MHz、CDC
l3):δ4.33(m,2H),δ3.76(s,3
H),δ3.61(br,2H),δ2.42(m,2
H),δ1.97(m,2H),δ1.46(s,9
H)
元素分析:分析値 C 53.29%、 H 8.10
%
計算値 C 53.21%、 H 8.12% (C11
H20O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ4.33 (m, 2H), δ3.76 (s, 3)
H), δ3.61 (br, 2H), δ2.42 (m, 2)
H), δ1.97 (m, 2H), δ1.46 (s, 9
H) Elemental analysis: Analytical value C 53.29%, H 8.10.
% Calculated values C 53.21%, H 8.12% (C 11
H 20 O 6)
【0033】実施例7
4−(2−メチル−5−オキソ−1,3−ジオキソラ
ン−4−イル)−3−オキソ−ブタン酸 t−ブチル
の製造[0033]Example 7
4- (2-methyl-5-oxo-1,3-dioxola
(N-4-yl) -3-oxo-butanoic acid t-butyl
Manufacturing of
【化18】
2−メチル−5−オキソ−1,3−ジオキソラン−4−
酢酸8.01g(50mmol)のTHF300.0m
l中溶液に、アルゴン雰囲気下、カルボニルジイミダゾ
ール8.92g(55mmol)を0℃で加えて15分
間撹拌した後、室温で4時間撹拌した。得られた溶液に
ビス(マロン酸 モノt−ブチルエステル)マグネシウ
ム塩22.27mg(65mmol)を室温で加え、酢
酸エチルにより抽出した。有機層を飽和NaHCO3水
溶液で洗浄し、硫酸ナトリウムで乾燥し、減圧濃縮し
た。残査をシリカゲルカラムクロマトグラフィ(ヘキサ
ン:酢酸エチル=3:1)に付すことにより純粋な4−
(2−メチル−5−オキソ−1,3−ジオキソラン−4
−イル)−3−オキソ−ブタン酸 t−ブチル9.80
g(38mmol)を得た。収率75.9%[Chemical 18] 2-Methyl-5-oxo-1,3-dioxolane-4-
Acetate 8.01 g (50 mmol) in THF 300.0 m
To the solution in 1 under an argon atmosphere, 8.92 g (55 mmol) of carbonyldiimidazole was added at 0 ° C. and stirred for 15 minutes, and then stirred at room temperature for 4 hours. 22.27 mg (65 mmol) of bis (malonic acid mono t-butyl ester) magnesium salt was added to the obtained solution at room temperature, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous NaHCO 3 , dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: ethyl acetate = 3: 1) to give pure 4-
(2-methyl-5-oxo-1,3-dioxolane-4
-Yl) -3-oxo-butanoic acid t-butyl 9.80
g (38 mmol) was obtained. Yield 75.9%
【0034】1H−NMR (90MHz、CDC
l3):δ5.96−5.53(m,1H),δ4.6
7(m,1H),δ3.40(s,2H),δ3.13
(m,2H),δ1.56(d,3H),δ1.46
(s,9H)
元素分析:分析値 C 55.99%、 H 6.95
%
計算値 C 55.80%、 H 7.03% (C12
H18O6) 1 H-NMR (90 MHz, CDC
l 3 ): δ5.96-5.53 (m, 1H), δ4.6
7 (m, 1H), δ 3.40 (s, 2H), δ 3.13
(M, 2H), δ1.56 (d, 3H), δ1.46
(S, 9H) Elemental analysis: analytical value C 55.99%, H 6.95
% Calculated value C 55.80%, H 7.03% (C 12
H 18 O 6 )
【0035】実施例8
2−ヒドロキシ−4−オキソアジピン酸 1−メチル
6−t−ブチル の製造[0035]Example 8
2-hydroxy-4-oxoadipic acid 1-methyl
Production of 6-t-butyl
【化19】
実施例7で得た4−(2−メチル−5−オキソ−1,3
−ジオキソラン−4−イル)−3−オキソ−ブタン酸
t−ブチル 5.16g(20.0mmol)をトルエ
ン40.0mlに溶解し、0℃でアルゴン雰囲気下、ナ
トリウムメトキシド(1M メタノール溶液)20.5
mlを10分間かけて滴下した。0℃で30分間撹拌し
た後、1N塩酸21.0mlを滴下し、0℃で10分間
撹拌した。有機溶媒の大部分を減圧留去した後、酢酸エ
チルで抽出し、飽和食塩水とリン酸緩衝溶液(pH7.
0)により洗浄した。有機層を合わせて硫酸ナトリウム
で乾燥し、減圧濃縮した。残査をシリカゲルカラムクロ
マト(ヘキサン:アセトン=2:1)に付すことにより
純粋な2−ヒドロキシ−4−オキソアジピン酸 1−メ
チル 6−t−ブチル 4.39g(17.83mmo
l)を得た。収率89.2%[Chemical 19] 4- (2-methyl-5-oxo-1,3 obtained in Example 7
-Dioxolan-4-yl) -3-oxo-butanoic acid
5.16 g (20.0 mmol) of t-butyl was dissolved in 40.0 ml of toluene, and sodium methoxide (1M methanol solution) 20.5 was added at 0 ° C. under an argon atmosphere.
ml was added dropwise over 10 minutes. After stirring at 0 ° C for 30 minutes, 21.0 ml of 1N hydrochloric acid was added dropwise, and the mixture was stirred at 0 ° C for 10 minutes. Most of the organic solvent was distilled off under reduced pressure, followed by extraction with ethyl acetate, a saturated saline solution and a phosphate buffer solution (pH 7.
Washed with 0). The organic layers were combined, dried over sodium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography (hexane: acetone = 2: 1) to give pure 1-methyl 6-t-butyl 2-hydroxy-4-oxoadipic acid 4.39 g (17.83 mmo).
l) was obtained. Yield 89.2%
【0036】1H−NMRは実施例2に一致した。
元素分析:分析値 C 53.59%、 H 7.45
%
計算値 C 53.65%、 H 7.37% (C11
H18O6) 1 H-NMR was in accordance with Example 2. Elemental analysis: analytical value C 53.59%, H 7.45
% Calculated values C 53.65%, H 7.37% (C 11
H 18 O 6 )
【0037】参考例
以下、本発明の方法を用いた、HMG−CoA合成阻害
剤の中間体3,5−0−イソプロピリデン−3,5,6
−トリヒドロキシヘキサン酸−t−ブチルの合成例を示
す。Reference Example The following is an intermediate 3,5-0-isopropylidene-3,5,6 of an HMG-CoA synthesis inhibitor using the method of the present invention.
An example of synthesizing -t-butyl trihydroxyhexanoate is shown.
【0038】参考例1
2,4−ジヒドロキシアジピン酸 1−メチル 6−
t−ブチルの製造
THF133.05ml,メタノール66.52ml,
BEt3(1MTHF溶液)72.71ml混合物をア
ルゴン雰囲気下、室温で1時間撹拌した。2−ヒドロキ
シ−4−オキソアジピン酸 1−メチル 6−t−ブチ
ル 12.79g(51.94mmol)をTHF31
2mlに溶解した後、−78℃に冷却し、上記のボラン
溶液を45分間かけて滴下した。−78℃で50分間撹
拌した後、水素化ホウ素ナトリウム2.26g(59.
72mmol)を一度に加え、さらに−78℃で3時間
撹拌した。酢酸−メタノール(1:1)混合溶液54m
lを15分かけて−78℃にて反応溶液に滴下した後、
更に15分撹拌した。得られた混合物を5%の塩化アン
モニウム511mlに注ぎ、15分撹拌した。pH7.
5に調製した後、有機層を減圧留去した。室温にて10
%過酸化水素水104mlを加えた後、pH7に調整
し、5%の亜硫酸ナトリウム水溶液312mlを加え、
室温で40分間撹拌した後、酢酸エチルを用いて抽出し
た。有機層を合わせて硫酸ナトリウムで乾燥後、減圧留
去した。残査をシリカゲルカラムクロマトグラフィ(ヘ
キサン:アセトン=2:1)に付すことにより純粋な
2,4−ジヒドロキシアジピン酸1−メチル 6−t−
ブチル 11.22g(45.19mmol)を得た。
収率87%[0038]Reference example 1
2,4-Dihydroxyadipic acid 1-methyl 6-
t-Butyl production
THF 133.05 ml, methanol 66.52 ml,
BEt3(1M THF solution) 72.71 ml
The mixture was stirred at room temperature for 1 hour under a Lgon atmosphere. 2-hydroxy
Ci-4-oxoadipic acid 1-methyl 6-t-butyl
12.79 g (51.94 mmol) of THF
After dissolving in 2 ml, it was cooled to -78 ° C and
The solution was added dropwise over 45 minutes. Stir at -78 ° C for 50 minutes
After stirring, 2.26 g of sodium borohydride (59.
72 mmol) at once and further at −78 ° C. for 3 hours
It was stirred. Acetic acid-methanol (1: 1) mixed solution 54 m
l was added dropwise to the reaction solution at −78 ° C. over 15 minutes,
It was stirred for another 15 minutes. The mixture obtained is treated with 5% ammonium chloride.
It was poured into 511 ml of monium and stirred for 15 minutes. pH 7.
After adjusting to 5, the organic layer was distilled off under reduced pressure. 10 at room temperature
Adjust the pH to 7 after adding 104 ml of hydrogen peroxide solution
Then, 312 ml of 5% sodium sulfite aqueous solution was added,
After stirring at room temperature for 40 minutes, extract with ethyl acetate.
It was The organic layers are combined and dried over sodium sulfate, and then distilled under reduced pressure.
I left. Silica gel column chromatography (
Xane: acetone = 2: 1)
2,4-Dihydroxyadipate 1-methyl 6-t-
Obtained 11.22 g (45.19 mmol) of butyl.
Yield 87%
【0039】1H−NMRは実施例6に一致した。
元素分析:分析値 C 53.37%、 H 8.23
%
計算値 C 53.21%、 H 8.12%(C11H
20O6) 1 H-NMR was in accordance with Example 6. Elemental analysis: analytical value C 53.37%, H 8.23
% Calculated value C 53.21%, H 8.12% (C 11 H
20 O 6 )
【0040】参考例2
2−メトキシカルボニル−4−t−ブトキシカルボニ
ルメチル−6,6−ジメチル−1,5−ジオキサン の
製造
2,4−ジヒドロキシアジピン酸 1−メチル 6−t
−ブチル 4.98g(20.02mmol)と塩化メ
チレン21の混合溶液に、ジメトキシプロパン9.6m
l(78mmol)、p−トルエンスルホン酸ピリジニ
ウム2.01g(8mmol)を加え、還流条件下1時
間撹拌し、次いでメタノールを共沸により除去しながら
40℃で3時間撹拌した。減圧濃縮後、得られた残査を
酢酸エチルに溶解した後、水に注ぎ、酢酸エチルで抽出
した。有機層を集めて硫酸ナトリウムで乾燥後、減圧濃
縮した。残査をシリカゲルカラムクロマトグラフィ(ヘ
キサン:アセトン=3:1)に付すことにより純粋な2
−メトキシカルボニル−4−t−ブトキシカルボニルメ
チル−6,6−ジメチル−1,5−ジオキサン 4.8
9g(17.01mmol)を得た。収率85%[0040]Reference example 2
2-methoxycarbonyl-4-t-butoxycarbonyl
Rumethyl-6,6-dimethyl-1,5-dioxane
Manufacturing
2,4-Dihydroxyadipic acid 1-methyl 6-t
-Butyl 4.98 g (20.02 mmol) and methyl chloride
In the mixed solution of Tylene 21, dimethoxypropane 9.6m
1 (78 mmol), pyridini p-toluenesulfonate
2.01 g (8 mmol) of sodium was added, and under reflux condition for 1 hour.
While stirring, then azeotropically removing methanol
The mixture was stirred at 40 ° C for 3 hours. After concentration under reduced pressure, the obtained residue is
After dissolving in ethyl acetate, pour into water and extract with ethyl acetate
did. The organic layers are collected, dried over sodium sulfate, and concentrated under reduced pressure.
Contracted. Silica gel column chromatography (
Xane: acetone = 3: 1) to give pure 2
-Methoxycarbonyl-4-t-butoxycarbonylme
Chill-6,6-dimethyl-1,5-dioxane 4.8
9 g (17.01 mmol) was obtained. Yield 85%
【0041】1H−NMR (90MHz、CDC
l3):δ4.70−4.17(m,2H),δ3.7
6(s,3H),δ2.41(m,2H),δ2.13
−1.56(m,2H),δ1.46(m,15H)
元素分析:分析値 C 58.38%、 H 8.42
%
計算値 C 58.31%、 H 8.39%(C14H
24O6) 1 H-NMR (90 MHz, CDC
l 3): δ4.70-4.17 (m, 2H), δ3.7
6 (s, 3H), δ2.41 (m, 2H), δ2.13
-1.56 (m, 2H), δ 1.46 (m, 15H) Elemental analysis: analytical value C 58.38%, H 8.42
% Calculated value C 58.31%, H 8.39% (C 14 H
24 O 6 )
【0042】参考例3
3,5−0−イソプロピリデン−3,5,6−トリヒ
ドロキシヘキサン酸 t−ブチル の製造
2−メトキシカルボニル−4−t−ブトキシカルボニル
メチル−6,6−ジメチル−1,5−ジオキサン2.8
8g(10mmol)をメタノール160mlに溶解し
た後、水素化ホウ素ナトリウム1.89g(50mmo
l)を一度に加え、アルゴン雰囲気下、室温で12時間
撹拌した。メタノールを減圧留去後、0℃で水を加え、
1N塩酸を用いてpH7に調整し、酢酸エチルで抽出し
た。有機層を集めて硫酸ナトリウムで乾燥後、減圧留去
した。残査をシリカゲルカラムクロマトグラフィ(ヘキ
サン:酢酸エチル=3:1)に付すことにより純粋な
3,5−0−イソプロピリデン−3,5,6−トリヒド
ロキシヘキサン酸 t−ブチル2.27g(8.7mm
ol)を得た。収率87%[0042]Reference example 3
3,5-0-isopropylidene-3,5,6-trihi
Production of t-butyl droxyhexanoate
2-methoxycarbonyl-4-t-butoxycarbonyl
Methyl-6,6-dimethyl-1,5-dioxane 2.8
Dissolve 8 g (10 mmol) in 160 ml of methanol
And then sodium borohydride 1.89 g (50 mmo
l) at once, and at room temperature under argon atmosphere for 12 hours
It was stirred. After the methanol was distilled off under reduced pressure, water was added at 0 ° C,
The pH was adjusted to 7 with 1N hydrochloric acid and extracted with ethyl acetate.
It was The organic layers were collected, dried over sodium sulfate, and evaporated under reduced pressure.
did. The residue is purified by silica gel column chromatography (hexane
Pure by applying Sun: Ethyl acetate = 3: 1)
3,5-0-isopropylidene-3,5,6-trihydr
2.27 g (8.7 mm) of t-butyl roxyhexanoate
ol) was obtained. Yield 87%
【0043】1H−NMR (90MHz、CDC
l3):δ4.43−3.82(m,2H),δ3.6
8−3.44(m,2H),δ2.71−2.32
(m,3H),δ1.82−1.5(m,2H),δ
1.47(s,9H),δ1.45(d,6H,J=4
Hz)
元素分析:分析値 C 59.97%、 H 9.46
%
計算値 C 59.98%、 H 9.29%(C13H
24O5) 1 H-NMR (90 MHz, CDC
l 3 ): δ 4.43-3.82 (m, 2H), δ 3.6
8-3.44 (m, 2H), [delta] 2.71-2.32.
(M, 3H), δ 1.82-1.5 (m, 2H), δ
1.47 (s, 9H), δ 1.45 (d, 6H, J = 4)
Hz) Elemental analysis: analytical value C 59.97%, H 9.46
% Calculated value C 59.98%, H 9.29% (C 13 H
24 O 5 )
【0044】参考例4
(3R,5S)−3,5−0−イソプロピリデン−
3,5,6−トリヒドロキシヘキサン酸 t−ブチル
の製造
実施例1での4−(2,2−ジメチル−5−オキソ−
1,3−ジオキソラン−4−イル)−3−オキソ−ブタ
ン酸 t−ブチル の製造における原料として、L−リ
ンゴ酸から誘導した (4S)−2,2−ジメチルー5
ーオキソ−1,3−ジオキソラン−4−酢酸2.09g
(12mmol)を用いて実施例1と同様の操作を行う
ことにより4−(2,2−ジメチル−5−オキソ−1,
3−ジオキソラン−(4S)−4−イル)−3−オキソ
−ブタン酸 t−ブチル を製造し、引き続き実施例2
および参考例1〜3と同様の操作を行うことにより(3
R,5S)−3,5−0−イソプロピリデン−3,5,
6−トリヒドロキシヘキサン酸t−ブチルを製造した。[0044]Reference example 4
(3R, 5S) -3,5-0-isopropylidene-
T-Butyl 3,5,6-trihydroxyhexanoate
Manufacturing of
4- (2,2-dimethyl-5-oxo-in Example 1
1,3-dioxolan-4-yl) -3-oxo-buta
As a raw material in the production of t-butyl acid salt, L-li
(4S) -2,2-Dimethyl-5 derived from ngoic acid
-Oxo-1,3-dioxolane-4-acetic acid 2.09 g
The same operation as in Example 1 is performed using (12 mmol).
As a result, 4- (2,2-dimethyl-5-oxo-1,
3-dioxolane- (4S) -4-yl) -3-oxo
T-Butyl butanoate was prepared and subsequently Example 2
And by performing the same operation as in Reference Examples 1 to 3 (3
R, 5S) -3,5-0-isopropylidene-3,5
T-Butyl 6-trihydroxyhexanoate was produced.
【0045】1H−NMRは参考例3に一致した。
元素分析:分析値 C 60.10%、 H 9.21
%
計算値 C 59.98%、 H 9.29%(C13H
24O5) 1 H-NMR coincided with Reference Example 3. Elemental analysis: analytical value C 60.10%, H 9.21
% Calculated value C 59.98%, H 9.29% (C 13 H
24 O 5 )
【化20】 [Chemical 20]
【0046】[0046]
【発明の効果】本発明の新規製造法を用いることによ
り、効果的で経済性に優れた2−ヒドロキシ酸のアセタ
ール誘導体から2−ヒドロキシ酸エステルの効率的な製
造が可能となり、さらにHMG−CoA還元酵素阻害剤
用の合成中間体(2−ヒドロキシ−4−オキソアジピン
酸 1−メチル 6−t−ブチル等)の効率的な製造が
可能となる。EFFECTS OF THE INVENTION By using the novel production method of the present invention, it becomes possible to efficiently produce an 2-hydroxy acid ester from an acetal derivative of 2-hydroxy acid, which is effective and economical, and further, HMG-CoA. It enables efficient production of synthetic intermediates for reductase inhibitors (1-methyl 6-t-butyl 2-hydroxy-4-oxoadipate, etc.).
Claims (13)
ル基、アラルキル基もしくはアリール基を表すか、また
はXとYは共同で環を形成する。Aは金属アルコキシド
と反応しない任意の官能基を表す。)で示される2−ヒ
ドロキシ酸誘導体を金属アルコキシドと反応させること
からなる、式(2): 【化2】 (式中、R1はアルキル基、アラルキル基、アリール基
またはシリル基を表し、Pは水素原子または水酸基の保
護基を表す。Aは前記と同意義。)で示される2−ヒド
ロキシ酸誘導体の製造法。1. Formula (1): (In the formula, X and Y each independently represent a hydrogen atom, an alkyl group, an aralkyl group or an aryl group, or X and Y jointly form a ring. A is any functional group which does not react with a metal alkoxide. Represented by the formula (2): embedded image which comprises reacting a 2-hydroxy acid derivative represented by the formula (2) with a metal alkoxide. (In the formula, R 1 represents an alkyl group, an aralkyl group, an aryl group or a silyl group, P represents a hydrogen atom or a protective group of a hydroxyl group, and A represents the same meaning as described above.) Manufacturing method.
アリール基またはシリル基を表す。)で示される基であ
る請求項1記載の製造法。2. A is of formula (7): (In the formula, R 2 is a hydrogen atom, an alkyl group, an aralkyl group,
Represents an aryl group or a silyl group. The manufacturing method of Claim 1 which is a group shown by these.
2は前記と同意義。)で示される基である請求項1記載
の製造法。3. A is of formula (8): (In the formula, Q represents a hydrogen atom or a hydroxyl-protecting group. R
2 has the same meaning as above. The manufacturing method of Claim 1 which is a group shown by these.
ル基である請求項1〜3のいずれかに記載の製造法。4. The production method according to claim 1, wherein X is a methyl group and Y is a hydrogen atom or a methyl group.
請求項2〜4のいずれかに記載の製造法。5. The production method according to claim 2, wherein R 2 is an alkyl group having 1 to 4 carbon atoms.
のいずれかに記載の製造法。6. The method according to claim 2, wherein R 2 is a t-butyl group.
The production method according to any one of 1.
れかに記載の製造法。7. The production method according to claim 3, wherein Q is a hydrogen atom.
請求項2〜7のいずれかに記載の製造法。8. The production method according to claim 2, wherein R 1 is an alkyl group having 1 to 4 carbon atoms.
ロピル基である請求項2〜8のいずれかに記載の製造
法。9. The production method according to claim 2, wherein R 1 is a methyl group, an ethyl group or an isopropyl group.
ル基であるときはナトリウムメトキシドまたはカリウム
メトキシド、エチル基であるときはナトリウムエトキシ
ドまたはカリウムエトキシド、もしくはイソプロピル基
であるときはナトリウムイソプロポキシドを用いる請求
項1〜9のいずれかに記載の製造法。10. As the metal alkoxide, when R 1 is a methyl group, sodium methoxide or potassium methoxide, when it is an ethyl group, sodium ethoxide or potassium ethoxide, or when it is an isopropyl group, sodium isopropoxy. The manufacturing method according to any one of claims 1 to 9, wherein a cord is used.
塩基の組み合わせにより調製したものを用いる請求項1
〜9のいずれかに記載の製造法。11. A metal alkoxide prepared by combining an alcohol and a base is used as the metal alkoxide.
10. The method according to any one of 9 to 9.
項11記載の製造法。12. The method according to claim 11, wherein a metal hydride is used as the base.
を用いる請求項12記載の製造法。13. The method according to claim 12, wherein sodium hydride is used as the metal hydride.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3178032A JPH0525089A (en) | 1991-07-18 | 1991-07-18 | Production of 2-hydroxy acid derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3178032A JPH0525089A (en) | 1991-07-18 | 1991-07-18 | Production of 2-hydroxy acid derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0525089A true JPH0525089A (en) | 1993-02-02 |
Family
ID=16041399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3178032A Pending JPH0525089A (en) | 1991-07-18 | 1991-07-18 | Production of 2-hydroxy acid derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0525089A (en) |
-
1991
- 1991-07-18 JP JP3178032A patent/JPH0525089A/en active Pending
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