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JPH05232314A - Dichroic mirror - Google Patents

Dichroic mirror

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Publication number
JPH05232314A
JPH05232314A JP3458492A JP3458492A JPH05232314A JP H05232314 A JPH05232314 A JP H05232314A JP 3458492 A JP3458492 A JP 3458492A JP 3458492 A JP3458492 A JP 3458492A JP H05232314 A JPH05232314 A JP H05232314A
Authority
JP
Japan
Prior art keywords
wavelength region
light
dichroic mirror
multilayer film
surface layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3458492A
Other languages
Japanese (ja)
Other versions
JP2935765B2 (en
Inventor
Kunio Kurobe
邦夫 黒部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujinon Corp
Original Assignee
Fuji Photo Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Optical Co Ltd filed Critical Fuji Photo Optical Co Ltd
Priority to JP4034584A priority Critical patent/JP2935765B2/en
Publication of JPH05232314A publication Critical patent/JPH05232314A/en
Application granted granted Critical
Publication of JP2935765B2 publication Critical patent/JP2935765B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To obtain a dichroic mirror which acts as a half mirror for a specified wavelength region and as a total reflection mirror for the rest of wavelength region. CONSTITUTION:This dichroic mirror is obtd. by successively base multilayer film 2 which totally reflects light in <2700nm wavelength region and almost totally transmits light in >2700nm wavelength region, a Ge first surface layer 3, and a ZnS second surface layer 4 on a glass substrate 1. This mirror acts as a total reflection mirror for 1500-2700nm wavelength region (near infrared region) and as a half mirror having about 50% transmittance for about >2700nm wavelength region (medium and far infrared region).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は薄膜による光の干渉を利
用して、特定の波長領域の光のみを反射し、残りの波長
領域の光を透過するダイクロイックミラーに関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dichroic mirror which reflects only light in a specific wavelength region and transmits light in the remaining wavelength region by utilizing interference of light by a thin film.

【0002】[0002]

【従来の技術】従来から、ガラス面上に蒸着した多層膜
の薄膜干渉を利用して、このガラス面に入射した光のう
ち特定の波長領域の光のみを反射し、残りを透過すると
いったダイクロイックミラーが知られている。
2. Description of the Related Art Conventionally, by utilizing thin film interference of a multilayer film deposited on a glass surface, a dichroic that reflects only light in a specific wavelength region of light incident on the glass surface and transmits the rest. Mirrors are known.

【0003】上記多層膜は高屈折率物質と低屈折率物質
を交互に所定の厚みで積層することにより形成し、積層
する物質の種類とその膜厚により反射と透過の切換波長
をコントロールできることが知られている。
The above-mentioned multilayer film is formed by alternately laminating a high refractive index substance and a low refractive index substance with a predetermined thickness, and the switching wavelength between reflection and transmission can be controlled by the kind of the substance to be laminated and its film thickness. Are known.

【0004】[0004]

【発明が解決しようとする課題】ところで、このような
ダイクロイックミラーを用いて物体の分光測定を行なう
場合に、反射光と透過光のうちいずれか一方を分光放射
計に入射させて物体からの射出光の分光放射率を測定す
るとともに他方をカメラに入射させて物体の輪郭を得、
最後にこれら2つの情報を合わせるような手法が知られ
ている。
When performing spectroscopic measurement of an object using such a dichroic mirror, one of reflected light and transmitted light is made incident on a spectroradiometer and is emitted from the object. The spectral emissivity of light is measured and the other is made incident on the camera to obtain the contour of the object,
Finally, a method of combining these two pieces of information is known.

【0005】しかしながら、このような物体の分光測定
においては、物体からの射出光の分光放射率を全波長領
域にわたってなるべく多くの光量により測定しておきた
いという要求も多く、その一方でカメラからは物体の輪
郭の情報を得るだけでよいからカメラへの入射光量はあ
る程度小さくてもよいとされる場合も多い。
However, in such a spectroscopic measurement of an object, there is also a great demand for measuring the spectral emissivity of the light emitted from the object with as much light amount as possible over the entire wavelength range. In many cases, the amount of light incident on the camera may be small to some extent because it is sufficient to obtain information about the contour of the object.

【0006】例えば、熱線を放射する物体からの光のう
ち、特定の赤外波長領域の光のみを赤外カメラに入射さ
せて物体の輪郭を撮影するとともに、残りの光を分光放
射計に入射させて熱線の分光放射率を得るような場合に
は、赤外カメラの感度を例えば3000〜5000nmとしてお
き、ダイクロイックミラーにより3000〜5000nmの波長
領域の光の一部のみ透過させて赤外カメラに入射させ、
残りの全光量はダイクロイックミラーにより反射させて
分光放射計に入射せしめ、物体から放射される全ての波
長領域についてなるべく多くの光量を用いて分光測定を
行なうようにするのが望ましい。
For example, of the light from an object that emits heat rays, only the light in a specific infrared wavelength region is made incident on the infrared camera to photograph the contour of the object, and the remaining light is made incident on the spectroradiometer. When obtaining the spectral emissivity of heat rays, the sensitivity of the infrared camera is set to, for example, 3000 to 5000 nm, and only a part of the light in the wavelength region of 3000 to 5000 nm is transmitted by the dichroic mirror to the infrared camera. Make it incident,
It is desirable that the remaining total amount of light be reflected by a dichroic mirror to be incident on a spectroradiometer, and spectroscopic measurement be performed using as much amount of light as possible for all wavelength regions emitted from the object.

【0007】本発明はこのような事情に鑑みなされたも
ので、所定波長領域の光に対してはハーフミラーとし
て、残りの波長領域の光に対しては全反射ミラーとして
機能するダイクロイックミラーを提供することを目的と
するものである。
The present invention has been made in view of the above circumstances, and provides a dichroic mirror that functions as a half mirror for light in a predetermined wavelength region and as a total reflection mirror for light in the remaining wavelength regions. The purpose is to do.

【0008】[0008]

【課題を解決するための手段】本発明のダイクロイック
ミラーは、透明基板上に、所定値以下の波長領域の光を
略全反射せしめ、該所定値より大きい波長領域の光を高
透過率点以上の割合で透過せしめる、第1の物質からな
る薄層と第2の物質からなる薄層を交互に積層せしめて
なる基礎多層膜を設け、この基礎多層膜上に、前記所定
値より大きい波長領域の光を、該基礎多層膜の入射時に
対して前記高透過率点より小さい割合で透過せしめる、
前記第1の物質からなる薄層と前記第2の物質からなる
薄層を各々1層ずつ有してなる表層膜を設けてなること
を特徴とするものである。
The dichroic mirror of the present invention is such that light in a wavelength region of a predetermined value or less is almost totally reflected on a transparent substrate, and light in a wavelength region of a predetermined value or more is higher than a high transmittance point. A basic multilayer film is formed by alternately laminating a thin layer made of a first substance and a thin layer made of a second substance, which is transmitted at a ratio of 1. Light is transmitted at a rate smaller than the high transmittance point with respect to the time of incidence of the basic multilayer film,
It is characterized in that a surface layer film having one thin layer made of the first substance and one thin layer made of the second substance is provided.

【0009】また、上記「高透過率点」とは所定値より
大きい波長領域の光を透過する率が、上記基礎多層膜の
みによってはこの点より小さくなることがなく、上記表
層膜を設けることにより初めてこの点より小さくなるよ
うな透過率の基準点を示し、例えば90%という高透過率
の値に設定される。
The "high transmittance point" means that the transmittance of light in a wavelength region larger than a predetermined value does not become smaller than this point only by the basic multilayer film, and the surface layer film is provided. For the first time, the reference point of the transmittance that becomes smaller than this point is shown for the first time, and is set to a high transmittance value of 90%, for example.

【0010】[0010]

【作用および発明の効果】上記構成によれば、まず、透
明基板上に第1の物質からなる薄層と第2の物質からな
る薄層を交互に積層せしめてなる基礎多層膜を設けて、
所定値以下の波長領域の光を略全反射せしめるとともに
この所定値より大きい波長領域の光を高透過率点より大
きい割合で透過せしめている。
According to the above-described structure, first, a basic multilayer film is formed by alternately laminating thin layers made of a first substance and thin layers made of a second substance on a transparent substrate,
Light in a wavelength region of a predetermined value or less is almost totally reflected, and light in a wavelength region of a predetermined value or more is transmitted at a rate higher than the high transmittance point.

【0011】このような基礎多層膜のみからなるいわゆ
る一般的なダイクロイックミラーは所定波長の前後で略
全反射と略全透過を切り換えるように機能し、一般に、
薄層の積層数の増減によって所定波長領域の光の透過率
を大幅に増減させることは困難であると考えられてい
た。
A so-called general dichroic mirror composed only of such a basic multilayer film functions to switch between substantially total reflection and substantially total transmission before and after a predetermined wavelength, and generally,
It has been considered difficult to significantly increase or decrease the transmittance of light in a predetermined wavelength region by increasing or decreasing the number of laminated thin layers.

【0012】事実、本出願人の実験によっても例えば20
層程度までは薄層の積層数の増減と上記透過率の増減と
の関連性は余り認められておらず、その透過率を例えば
90%以下とすることはできなかった。
In fact, according to the applicant's experiments, for example, 20
Up to about a few layers, there is little relation between the increase and decrease in the number of laminated thin layers and the increase or decrease in the above transmittance.
It could not be less than 90%.

【0013】しかしながら、本出願人はこの基礎多層膜
上に第1の物質からなる表面薄層と第2の物質からなる
表面薄層を設けると上記透過率が大幅に減少し、しかも
これらの表面薄層の厚みを調整することでこの透過率を
例えば70%とすることも50%とすることも可能であるこ
とを見い出した。
However, the Applicant has found that when the surface thin layer made of the first substance and the surface thin layer made of the second substance are provided on the basic multilayer film, the above-mentioned transmittance is greatly reduced, and further, the surfaces thereof are reduced. It was found that the transmittance can be set to 70% or 50% by adjusting the thickness of the thin layer.

【0014】本発明のダイクロイックミラーはこのよう
な事実に基づきなされたもので、これにより、所定波長
領域の光に対しては所望の透過率を有するハーフミラー
として、残りの波長領域の光に対しては通常の全反射ミ
ラーとして機能することが可能となる。
The dichroic mirror of the present invention is made on the basis of such a fact, whereby a dichroic mirror as a half mirror having a desired transmissivity for light in a predetermined wavelength region can be used for light in the remaining wavelength region. It becomes possible to function as a normal total reflection mirror.

【0015】[0015]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0016】図2は、本発明の第1の実施例に係るダイ
クロイックミラーの層構成を示す概略図である。このダ
イクロイックミラーはゲルマニウム(Ge)基板1上に
基礎多層膜2、Ge(屈折率4.00)からなる第1表面層
3およびZnS(屈折率2.10)からなる第2表面層4を
蒸着法を用いてこの順に積層してなるものである。
FIG. 2 is a schematic view showing the layer structure of the dichroic mirror according to the first embodiment of the present invention. In this dichroic mirror, a basic multilayer film 2, a first surface layer 3 made of Ge (refractive index 4.00) and a second surface layer 4 made of ZnS (refractive index 2.10) are formed on a germanium (Ge) substrate 1 by vapor deposition. The layers are laminated in this order.

【0017】上記基礎多層膜2は、ZnSからなる薄層
を奇数層に、Geからなる薄層を偶数層にして23層積層
してなるもので全膜厚が10〜15μm程度となるように形
成されている。
The basic multilayer film 2 is formed by laminating 23 thin layers made of ZnS in odd layers and Ge thin layers in even layers, so that the total thickness is about 10 to 15 μm. Has been formed.

【0018】また、上記Geからなる第1表面層3は4
nd=2400nm程度、上記ZnSからなる第2表面層4
は4nd=2644nm程度となるような厚みに形成されて
いる。
The first surface layer 3 made of Ge is 4
nd = 2400 nm, the second surface layer 4 made of ZnS.
Is formed to have a thickness of about 4nd = 2644 nm.

【0019】この第1の実施例に係るダイクロイックミ
ラーの透過特性を図1に示す。
FIG. 1 shows the transmission characteristics of the dichroic mirror according to the first embodiment.

【0020】この図1に示す透過特性から、このダイク
ロイックミラーは1500〜2700nm程度の波長領域(近赤
外領域)においては全反射ミラー、2700nm程度以上の
波長領域(中間、遠赤外領域)においては透過率50%程
度のハーフミラーとして機能することが明らかである。
From the transmission characteristics shown in FIG. 1, this dichroic mirror is a total reflection mirror in the wavelength region of 1500 to 2700 nm (near infrared region), and in the wavelength region of about 2700 nm or more (intermediate and far infrared region). Clearly functions as a half mirror with a transmittance of about 50%.

【0021】一方、図2に示す層構成のうちガラス基板
1上に基礎多層膜2のみを設けたダイクロイックミラー
の透過特性を図3に示す。
On the other hand, FIG. 3 shows the transmission characteristics of the dichroic mirror having only the basic multilayer film 2 provided on the glass substrate 1 in the layer structure shown in FIG.

【0022】図1と図3の比較から、第1表面層3と第
2表面層4を設けたことにより、透過領域(波長2700n
m程度以上の領域)における透過率を小さくすることが
できた。
From the comparison between FIGS. 1 and 3, the provision of the first surface layer 3 and the second surface layer 4 results in the transmission region (wavelength 2700n).
It was possible to reduce the transmittance in a region of about m or more).

【0023】なお、上記図1と図3の透過特性は入射角
を45°に設定したときの値に基づく。
The transmission characteristics of FIGS. 1 and 3 are based on the values when the incident angle is set to 45 °.

【0024】次に、図4は、本発明の第2の実施例に係
るダイクロイックミラーの層構成を示す概略図である。
このダイクロイックミラーはガラス基板11上に基礎多層
膜12、TiO2 (屈折率2.33)からなる第1表面層13お
よびSiO2 (屈折率1.47)からなる第2表面層14を蒸
着法を用いてこの順に積層してなるものである。
Next, FIG. 4 is a schematic view showing the layer structure of the dichroic mirror according to the second embodiment of the present invention.
In this dichroic mirror, a basic multilayer film 12, a first surface layer 13 made of TiO 2 (refractive index 2.33) and a second surface layer 14 made of SiO 2 (refractive index 1.47) are formed on a glass substrate 11 by vapor deposition. They are laminated in order.

【0025】上記基礎多層膜には、TiO2 からなる薄
層を奇数層に、SiO2 からなる薄層を偶数層にして20
層積層してなるもので全膜厚が10〜15μm程度となるよ
うに形成されている。
In the basic multilayer film, a thin layer made of TiO 2 is used as an odd number layer and a thin layer made of SiO 2 is used as an even number layer.
It is formed by stacking layers so that the total film thickness is about 10 to 15 μm.

【0026】また、上記TiO2 からなる第1表面層13
は4nd=3064nm程度、上記SiO2 からなる第2表
面層14は4nd=2760nm程度となるような厚みに形成
されている。
The first surface layer 13 made of TiO 2 is also used.
Is about 4nd = 3064 nm, and the second surface layer 14 made of SiO 2 is formed to a thickness of about 4nd = 2760 nm.

【0027】この第2の実施例に係るダイクロイックミ
ラーの透過特性を図5に示す。
FIG. 5 shows the transmission characteristics of the dichroic mirror according to the second embodiment.

【0028】この図5に示す透過特性から、このダイク
ロイックミラーは 740nm程度より小さい波長領域(可
視光領域)においては全反射ミラー、 740nm程度以上
の波長領域(赤外領域)においては透過率70%程度のハ
ーフミラーとして機能することが明らかである。
From the transmission characteristics shown in FIG. 5, this dichroic mirror has a total reflection mirror in a wavelength region (visible light region) smaller than about 740 nm, and a transmittance of 70% in a wavelength region of about 740 nm or more (infrared region). It is clear that it acts as a half mirror.

【0029】一方、図4に示す層構成のうちガラス基板
11上に基礎多層膜12のみを設けたダイクロイックミラー
の透過特性を図6に示す。
On the other hand, the glass substrate of the layer structure shown in FIG.
FIG. 6 shows the transmission characteristics of a dichroic mirror in which only the basic multilayer film 12 is provided on the substrate 11.

【0030】図5と図6の比較から、第1表面層13と第
2表面層14を設けたことにより、透過領域(波長 740n
m程度以上の領域)における透過率を小さくすることが
できた。
From the comparison between FIG. 5 and FIG. 6, since the first surface layer 13 and the second surface layer 14 are provided, the transmission region (wavelength 740 n
It was possible to reduce the transmittance in a region of about m or more).

【0031】なお、上記図5と図6の透過特性は入射角
を13°に設定したときの値に基づく。
The transmission characteristics in FIGS. 5 and 6 are based on the values when the incident angle is set to 13 °.

【0032】なお、本発明のダイクロイックミラーとし
ては上述した実施例のものに限られるものではなく、基
礎多層膜、第1の表面薄層および第2の表面薄層を構成
する材料および各々の膜については種々の態様をとり得
る。例えば上記2つの実施例において第1表面層3、13
および第2表面層4、14の層厚を変えることにより透過
領域の透過率を所望の値に設定することが可能である。
The dichroic mirror of the present invention is not limited to the above-mentioned embodiment, but the materials and respective films constituting the basic multilayer film, the first surface thin layer and the second surface thin layer. Can take various forms. For example, in the above two embodiments, the first surface layer 3, 13
The transmittance of the transmissive region can be set to a desired value by changing the layer thickness of the second surface layers 4 and 14.

【0033】また、例えば第1の実施例において第2表
面層4を構成する材料としてZnSの代わりに、これと
略同様の屈折率を有するZrO2 、TiO2 およびSi
O等を使用することも可能である。
Further, for example, instead of ZnS as the material forming the second surface layer 4 in the first embodiment, ZrO 2 , TiO 2 and Si having a substantially similar refractive index to ZnS are used.
It is also possible to use O or the like.

【0034】また、上記実施例においては入射角度を13
°および45°に設定しているが、入射角度を0〜45°の
いずれの角度に設定しても同様の効果を得ることができ
る。さらに、上記実施例はハーフミラーとして用いる場
合について説明しているが、表層膜上にさらに基板を接
合し、ハーフプリズムとして用いることも可能である。
In the above embodiment, the incident angle is 13
Although the angle is set to ° and 45 °, the same effect can be obtained even if the incident angle is set to any angle of 0 to 45 °. Further, although the above-mentioned embodiment describes the case of using as a half mirror, it is also possible to further bond a substrate on the surface layer film and use it as a half prism.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係るダイクロイックミラ
ーの透過特性を示すグラフ
FIG. 1 is a graph showing transmission characteristics of a dichroic mirror according to a first embodiment of the present invention.

【図2】本発明の第1実施例に係るダイクロイックミラ
ーの層構成を示す概略図
FIG. 2 is a schematic view showing the layer structure of a dichroic mirror according to the first embodiment of the present invention.

【図3】本発明の第1実施例に係るダイクロイックミラ
ーにおいて表層膜を除去したときの透過特性を示すグラ
FIG. 3 is a graph showing transmission characteristics when the surface layer film is removed in the dichroic mirror according to the first embodiment of the present invention.

【図4】本発明の第2実施例に係るダイクロイックミラ
ーの層構成を示す概略図
FIG. 4 is a schematic diagram showing a layer structure of a dichroic mirror according to a second embodiment of the present invention.

【図5】本発明の第2実施例に係るダイクロイックミラ
ーの透過特性を示すグラフ
FIG. 5 is a graph showing transmission characteristics of a dichroic mirror according to a second embodiment of the present invention.

【図6】本発明の第2実施例に係るダイクロイックミラ
ーにおいて表層膜を除去したときの透過特性を示すグラ
FIG. 6 is a graph showing transmission characteristics when the surface layer film is removed in the dichroic mirror according to the second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1,11 ガラス基板 2,12 基礎多層膜 3,13 第1表面層 4,14 第2表面層 1,11 Glass substrate 2,12 Basic multilayer film 3,13 First surface layer 4,14 Second surface layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に、 所定値以下の波長領域の光を略全反射せしめ、該所定値
より大きい波長領域の光を高透過率点以上の割合で透過
せしめる、第1の物質からなる薄層と第2の物質からな
る薄層を交互に積層せしめてなる基礎多層膜を設け、 この基礎多層膜上に、前記所定値より大きい波長領域の
光を、該基礎多層膜の入射時に対して前記高透過率点よ
り小さい割合で透過せしめる、前記第1の物質からなる
薄層と前記第2の物質からなる薄層を各々1層ずつ有し
てなる表層膜を設けてなることを特徴とするダイクロイ
ックミラー。
1. From a first substance, on a transparent substrate, light in a wavelength region of a predetermined value or less is substantially totally reflected, and light in a wavelength region of a predetermined value or more is transmitted at a ratio of a high transmittance point or more. And a thin layer of the second substance are alternately laminated to form a basic multilayer film, and light having a wavelength region larger than the predetermined value is incident on the basic multilayer film when the basic multilayer film is incident on the basic multilayer film. On the other hand, a surface layer film having one thin layer made of the first substance and one thin layer made of the second substance, which allows transmission at a rate smaller than the high transmittance point, is provided. Characteristic dichroic mirror.
JP4034584A 1992-02-21 1992-02-21 Manufacturing method of dichroic mirror Expired - Fee Related JP2935765B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4034584A JP2935765B2 (en) 1992-02-21 1992-02-21 Manufacturing method of dichroic mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4034584A JP2935765B2 (en) 1992-02-21 1992-02-21 Manufacturing method of dichroic mirror

Publications (2)

Publication Number Publication Date
JPH05232314A true JPH05232314A (en) 1993-09-10
JP2935765B2 JP2935765B2 (en) 1999-08-16

Family

ID=12418376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4034584A Expired - Fee Related JP2935765B2 (en) 1992-02-21 1992-02-21 Manufacturing method of dichroic mirror

Country Status (1)

Country Link
JP (1) JP2935765B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012002542A1 (en) * 2010-07-01 2012-01-05 株式会社ニコン Optical members and microscope
CN114236661A (en) * 2021-11-11 2022-03-25 中国航空工业集团公司洛阳电光设备研究所 Single crystal germanium infrared crystal spectroscope and preparation method of laser long-wave infrared beam splitting film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012002542A1 (en) * 2010-07-01 2012-01-05 株式会社ニコン Optical members and microscope
US8773761B2 (en) 2010-07-01 2014-07-08 Nikon Corporation Optical member and microscope
JP5673679B2 (en) * 2010-07-01 2015-02-18 株式会社ニコン microscope
CN114236661A (en) * 2021-11-11 2022-03-25 中国航空工业集团公司洛阳电光设备研究所 Single crystal germanium infrared crystal spectroscope and preparation method of laser long-wave infrared beam splitting film
CN114236661B (en) * 2021-11-11 2023-09-08 中国航空工业集团公司洛阳电光设备研究所 Single crystal germanium infrared crystal spectroscope and laser long wave infrared beam splitting film preparation method

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