JPH05230246A - Molded object and production thereof - Google Patents
Molded object and production thereofInfo
- Publication number
- JPH05230246A JPH05230246A JP4036484A JP3648492A JPH05230246A JP H05230246 A JPH05230246 A JP H05230246A JP 4036484 A JP4036484 A JP 4036484A JP 3648492 A JP3648492 A JP 3648492A JP H05230246 A JPH05230246 A JP H05230246A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- polymer
- group
- silicon compound
- surface layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229920000642 polymer Polymers 0.000 claims abstract description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000000178 monomer Substances 0.000 claims abstract description 22
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 19
- -1 perchloric acid compound Chemical class 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 12
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 12
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 12
- 125000000524 functional group Chemical group 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 2
- 230000002378 acidificating effect Effects 0.000 claims description 31
- 239000002344 surface layer Substances 0.000 claims description 19
- 239000000470 constituent Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 15
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 9
- 230000007062 hydrolysis Effects 0.000 abstract description 8
- 238000006068 polycondensation reaction Methods 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 7
- 239000003960 organic solvent Substances 0.000 abstract description 5
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Substances OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 4
- 239000011368 organic material Substances 0.000 abstract description 4
- 238000000465 moulding Methods 0.000 abstract description 2
- 239000000047 product Substances 0.000 description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 22
- 239000011347 resin Substances 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- 239000000243 solution Substances 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000008199 coating composition Substances 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229920000297 Rayon Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000000981 basic dye Substances 0.000 description 3
- 239000007853 buffer solution Substances 0.000 description 3
- 239000007809 chemical reaction catalyst Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- MPCRDALPQLDDFX-UHFFFAOYSA-L Magnesium perchlorate Chemical compound [Mg+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O MPCRDALPQLDDFX-UHFFFAOYSA-L 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000012356 Product development Methods 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- LCANECIWPMDASZ-UHFFFAOYSA-N 2-isocyanatoethanol Chemical compound OCCN=C=O LCANECIWPMDASZ-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- CUTWSDAQYCQTGD-UHFFFAOYSA-N 2-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)C(C)OC(=O)C=C CUTWSDAQYCQTGD-UHFFFAOYSA-N 0.000 description 1
- GDDNTTHUKVNJRA-UHFFFAOYSA-N 3-bromo-3,3-difluoroprop-1-ene Chemical compound FC(F)(Br)C=C GDDNTTHUKVNJRA-UHFFFAOYSA-N 0.000 description 1
- WGKYSFRFMQHMOF-UHFFFAOYSA-N 3-bromo-5-methylpyridine-2-carbonitrile Chemical compound CC1=CN=C(C#N)C(Br)=C1 WGKYSFRFMQHMOF-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- YHFGMFYKZBWPRW-UHFFFAOYSA-N 3-methylpentane-1,1-diol Chemical compound CCC(C)CC(O)O YHFGMFYKZBWPRW-UHFFFAOYSA-N 0.000 description 1
- 229920006353 Acrylite® Polymers 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- ZRGUXTGDSGGHLR-UHFFFAOYSA-K aluminum;triperchlorate Chemical compound [Al+3].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O ZRGUXTGDSGGHLR-UHFFFAOYSA-K 0.000 description 1
- QNRMTGGDHLBXQZ-UHFFFAOYSA-N buta-1,2-diene Chemical compound CC=C=C QNRMTGGDHLBXQZ-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- CAEPKDWOZATEMI-UHFFFAOYSA-N dimethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C)(OC)COCC1CO1 CAEPKDWOZATEMI-UHFFFAOYSA-N 0.000 description 1
- PWPGWRIGYKWLEV-UHFFFAOYSA-N dimethoxy-methyl-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](C)(OC)CCOCC1CO1 PWPGWRIGYKWLEV-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- AXZAYXJCENRGIM-UHFFFAOYSA-J dipotassium;tetrabromoplatinum(2-) Chemical compound [K+].[K+].[Br-].[Br-].[Br-].[Br-].[Pt+2] AXZAYXJCENRGIM-UHFFFAOYSA-J 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- CQLRGDLBSOUXNO-UHFFFAOYSA-N ethane-1,2-diol;tetradecane Chemical compound OCCO.CCCCCCCCCCCCCC CQLRGDLBSOUXNO-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- BFMUNUUIHLWYSN-UHFFFAOYSA-N ethyl-dimethoxy-(oxiran-2-ylmethoxymethyl)silane Chemical compound CC[Si](OC)(OC)COCC1CO1 BFMUNUUIHLWYSN-UHFFFAOYSA-N 0.000 description 1
- YYDBOMXUCPLLSK-UHFFFAOYSA-N ethyl-dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC[Si](OC)(OC)CCCOCC1CO1 YYDBOMXUCPLLSK-UHFFFAOYSA-N 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- SCFQUKBBGYTJNC-UHFFFAOYSA-N heptyl prop-2-enoate Chemical compound CCCCCCCOC(=O)C=C SCFQUKBBGYTJNC-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920000847 nonoxynol Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910001487 potassium perchlorate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000007974 sodium acetate buffer Substances 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- RXBXBWBHKPGHIB-UHFFFAOYSA-L zinc;diperchlorate Chemical compound [Zn+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O RXBXBWBHKPGHIB-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、優れた表面硬度を有す
る成形物およびその製造方法に関する。本発明より得ら
れる成形物は、建築分野、自動車分野、光学分野など種
々の分野に利用できる。FIELD OF THE INVENTION The present invention relates to a molded article having excellent surface hardness and a method for producing the same. The molded product obtained from the present invention can be used in various fields such as the field of construction, the field of automobiles, and the field of optics.
【0002】[0002]
【従来の技術】ポリメチルメタクリレート樹脂、ポリカ
ーボネート樹脂、ジエチレングリコールビスアリルカー
ボネート樹脂等の合成樹脂成形物は、ガラス製品に比べ
て軽量で安価であるなどの利点を有しておりこれらの利
点を生かして種々の分野で利用されている。しかしなが
ら、これら合成樹脂成形物は表面硬度が不足しているた
め 成形物の輸送中、部品の取り付け時あるいは使用中
に他の物体との接触、衝撃、ひっかきなどの作用によっ
て表面が損傷を受け、製品歩留が低下したり、美観が損
なわれたりする。特に成形物の用途が光学レンズ、ファ
ッショングラス、サングラス、矯正レンズなどの眼鏡レ
ンズ、窓などの場合にはその表面に発生する損傷は商品
価値を著しく低下させたり、短期間で使用不可能となる
のでこれらの合成樹脂成形物表面の表面硬度を改良する
ことが強く要求されている。2. Description of the Related Art Synthetic resin moldings such as polymethylmethacrylate resin, polycarbonate resin, and diethylene glycol bisallyl carbonate resin have the advantages of being lighter and cheaper than glass products, and taking advantage of these advantages. It is used in various fields. However, since the surface hardness of these synthetic resin molded products is insufficient, the surface is damaged by the action of contact with other objects, impact, scratching, etc. during transportation of the molded product, attachment of parts or use. Product yield is reduced and aesthetics are impaired. Especially when the molded product is used for optical lenses, fashion glasses, sunglasses, spectacle lenses such as corrective lenses, windows, etc., damages that occur on the surface will significantly reduce the commercial value or render it unusable in a short period of time. Therefore, it is strongly required to improve the surface hardness of the surface of these synthetic resin molded products.
【0003】このような要求を満足するために従来から
種々の試みがなされてきた。特開昭51−2736号公
報、特開昭54−87736号公報、特開昭55−94
971号公報に記載されているようにコロイド状シリカ
とアルコールまたは水のような加水分解媒質中の加水分
解性珪素化合物との混合物を含有する被覆用組成物によ
って耐摩耗性が改良されている。またI.KAETSUらの報告
(Journal of Applied Polymer Science vol.22 487〜
496(1978)) によればエポキシ基を含有する加水分解性
珪素化合物、エポキシ基を含有する(メタ)アクリレー
ト化合物による被覆用組成物が、ジエチレングリコール
ビスアリルカーボネート樹脂の耐摩耗性改善に有効であ
るとされている。Various attempts have hitherto been made in order to satisfy such requirements. JP-A-51-2736, JP-A-54-87736, JP-A-55-94
Abrasion resistance is improved by a coating composition containing a mixture of colloidal silica and a hydrolyzable silicon compound in a hydrolyzing medium such as alcohol or water as described in 971. In addition, I.KAETSU et al. Report (Journal of Applied Polymer Science vol.22 487-
496 (1978)), a coating composition using a hydrolyzable silicon compound containing an epoxy group and a (meth) acrylate compound containing an epoxy group is effective for improving the wear resistance of diethylene glycol bisallyl carbonate resin. It is said that.
【0004】[0004]
【発明が解決しようとする課題】しかしながら 特開昭
51−2736号公報、特開昭54−87736号公報
の被覆用組成物による皮膜は、水分や湿気に対する抵抗
性に乏しいという欠点があり、特開昭55−94971
号公報の被覆用組成物による皮膜は、耐熱性が不十分で
あり皮膜に亀裂が生じやすい等耐久性に問題があった。
またI.KAETSUらの報告(Journal of Applied Polymer S
cience vol.22 487〜496(1978)) ではエポキシ基を含
有する加水分解性珪素化合物が縮重合した皮膜は、ポリ
メチルメタクリレート樹脂、ポリカーボネート樹脂に対
しては十分な密着性が得られにくいとされている。これ
はポリメチルメタクリレート樹脂、ポリカーボネート樹
脂の表面がエポキシ基と化学反応する官能基を十分持っ
ていないため密着不良を生じるものと考えられる。However, a film formed by the coating composition disclosed in JP-A-51-2736 and JP-A-54-87736 has a drawback that it is poor in resistance to moisture and humidity. Kaisho 55-94971
The coating film of the coating composition of Japanese Patent Laid-Open Publication has insufficient heat resistance and has a problem in durability such that cracks tend to occur in the coating film.
In addition, I.KAETSU's report (Journal of Applied Polymer S
cience vol.22 487-496 (1978)), it is said that a film obtained by polycondensation of a hydrolyzable silicon compound containing an epoxy group is difficult to obtain sufficient adhesion to polymethylmethacrylate resin and polycarbonate resin. ing. This is considered to cause poor adhesion because the surfaces of the polymethylmethacrylate resin and the polycarbonate resin do not have enough functional groups that chemically react with the epoxy groups.
【0005】前述したコロイド状シリカと加水分解性珪
素化合物を混合した被覆用組成物での欠点は、基材が適
切な表面処理されておらず基材上の官能基が不足してい
るためコロイド状シリカ表面のOH基、加水分解性珪素
化合物分子のOH基が、基材と化学的に結合していない
ためと考えられる。A drawback of the coating composition in which the above-mentioned colloidal silica and hydrolyzable silicon compound are mixed is that the substrate is not subjected to an appropriate surface treatment and the functional groups on the substrate are insufficient, so that the colloid is not present. It is considered that the OH group on the surface of the crystalline silica and the OH group of the hydrolyzable silicon compound molecule are not chemically bonded to the base material.
【0006】[0006]
【課題を解決するための手段】本発明者らは、上記目的
を達成すべく鋭意検討を重ねた結果、特定のモノマー、
紫外線照射、アルカリ処理を採用した結果、成形物の表
面に特定多量の酸性基を生成でき、この部分を珪素化合
物で処理することが非常に有効であるという知見に至
り、本発明を完成した。Means for Solving the Problems As a result of intensive studies to achieve the above object, the present inventors have found that a specific monomer,
As a result of employing ultraviolet irradiation and alkali treatment, a specific large amount of acidic groups can be generated on the surface of the molded product, and it was found that treating this portion with a silicon compound is very effective, and the present invention was completed.
【0007】すなわち本発明の成形物は、1分子中に2
個以上の(メタ)アクリロイルオキシ基を有する多官能
性モノマーに由来する構造単位を主構成単位として有す
る重合体を少なくともその表層部に有し、この表層部の
表面に0.02μmol/cm2以上の酸性基を有する
成形物であって、この酸性基上に一般式(A)で表され
る珪素化合物を縮重合させて得られるシリカ系重合体が
積層されていることを特徴とするものである。 XaSi(OY)4-a (A) (式中、Xは、エポキシ基を含有する有機官能基Yは、
炭化水素基aは、1〜3の整数を表す。)That is, the molded article of the present invention has 2 in 1 molecule.
A polymer having a structural unit derived from a polyfunctional monomer having at least one (meth) acryloyloxy group as a main constituent unit at least in its surface layer portion, and 0.02 μmol / cm 2 or more on the surface of this surface layer portion And a silica polymer obtained by polycondensing a silicon compound represented by the general formula (A) is laminated on the acidic group. is there. X a Si (OY) 4-a (A) (In the formula, X is an organic functional group Y containing an epoxy group,
The hydrocarbon group a represents an integer of 1 to 3. )
【0008】また、この発明による成形物の製造方法
は、1分子中に2個以上の(メタ)アクリロイルオキシ
基を有する多官能性モノマーに由来する構造単位を主構
成単位として有する重合体を少なくともその表層部に有
する成形物に対して300nm以下の波長を含む紫外線
を照射し、アルカリ処理を行い、この成形物の表層部に
0.02μmol/cm2以上の酸性基を生成し、次い
で上記記載の一般式(A)で表される珪素化合物で処理
することを特徴とするものである。Further, the method for producing a molded article according to the present invention comprises at least a polymer having as a main constituent unit a structural unit derived from a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule. The molded product in the surface layer part is irradiated with ultraviolet rays having a wavelength of 300 nm or less and alkali-treated to generate 0.02 μmol / cm 2 or more acidic groups in the surface layer part of the molded product, and then the above description Is treated with a silicon compound represented by the general formula (A).
【0009】[0009]
【作用】以下、本発明の成形物及びその製造方法につい
て詳細に説明にする。本発明においては、まず、1分子
中に2個以上の(メタ)アクリロイルオキシ基を有する
多官能性モノマーを含む組成物を重合させることにより
成形物の少なくとも表層部を形成する。この多官能性モ
ノマーとしては、たとえば、1,4−ブタンジオールジ
(メタ)アクリレート、1,6−ヘキサンジオールジ
(メタ)アクリレート、ネオペンチルグリコール(メ
タ)アクリレート、エチレングリコールジ(メタ)アク
リレート、トリエチレングリコールジ(メタ)アクリレ
ート、トリプロピレングリコールジ(メタ)アクリレー
ト、ジプロピレングリコールジ(メタ)アクリレート、
3−メチルペンタンジオールジ(メタ)アクリレート、
ジエチレングリコールビスβ−(メタ)アクリロイルオ
キシプロピオネート、トリメチロールエタンジ(メタ)
アクリレート、トリメチロールプロパントリ(メタ)ア
クリレート、ペンタエリスリトールトリ(メタ)アクリ
レート、ジペンタエリスリトールヘキサ(メタ)アクリ
レート、トリ(2−ヒドロキシエチル)イソシアネート
ジ(メタ)アクリレート、ペンタエリスリトールテトラ
(メタ)アクリレート、2,3−ビス(メタ)アクリロ
イルオキシエチルオキシメチル〔2.2.1〕ヘプタ
ン、ポリ1,2−ブタジエンジ(メタ)アクリレート、
1,2−ビス(メタ)アクリロイルオキシメチルヘキサ
ン、ノナエチレングリコールジ(メタ)アクリレート、
テトラデカンエチレングリコールジ(メタ)アクリレー
ト、10−デカンジオール(メタ)アクリレート、3,
8−ビス(メタ)アクリロイルオキシメチルトリシクロ
〔5.2.10〕デカン、水素添加ビスフェノールAジ
(メタ)アクリレート、2,2−ビス(4−(メタ)ア
クリロイルオキシジエトキシフェニル)プロパン、1,
4−ビス((メタ)アクリロイルオキシメチル)シクロ
ヘキサン、ヒドロキシピバリン酸エステルネオペンチル
グリコール(メタ)アクリレート、ビスフェノールAジ
グリシジルエーテルジ(メタ)アクリレート、エポキシ
変性ビスフェノールAジ(メタ)アクリレート等を挙げ
ることができる。多官能性モノマーは、一種のみを使用
しても良いし、二種以上を併用してもよい。また、必要
であれば単官能モノマーと併用して共重合させることも
できる。また多官能性モノマーは組成物中の30重量%
以上であることが望ましい。単官能モノマーのみを用い
て表層部を形成した場合は、後で紫外線照射およびアル
カリ処理を行っても、酸性基は少量しか得られず、本発
明の目的とする成形物は得られない。すなわち本発明に
おいて、多官能性モノマー(1分子中に2個以上の(メ
タ)アクリロイルオキシ基を有する多官能性モノマー)
を使用することは、重要な構成要素の一つである。The molded article of the present invention and the method for producing the same will be described in detail below. In the present invention, first, at least the surface layer portion of the molded article is formed by polymerizing a composition containing a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule. Examples of the polyfunctional monomer include 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol (meth) acrylate, ethylene glycol di (meth) acrylate, Triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate,
3-methylpentanediol di (meth) acrylate,
Diethylene glycol bis β- (meth) acryloyloxypropionate, trimethylolethanedi (meth)
Acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tri (2-hydroxyethyl) isocyanate di (meth) acrylate, pentaerythritol tetra (meth) acrylate, 2,3-bis (meth) acryloyloxyethyloxymethyl [2.2.1] heptane, poly 1,2-butadiene di (meth) acrylate,
1,2-bis (meth) acryloyloxymethylhexane, nonaethylene glycol di (meth) acrylate,
Tetradecane ethylene glycol di (meth) acrylate, 10-decanediol (meth) acrylate, 3,
8-bis (meth) acryloyloxymethyltricyclo [5.2.10] decane, hydrogenated bisphenol A di (meth) acrylate, 2,2-bis (4- (meth) acryloyloxydiethoxyphenyl) propane, 1 ,
4-bis ((meth) acryloyloxymethyl) cyclohexane, hydroxypivalic acid ester neopentyl glycol (meth) acrylate, bisphenol A diglycidyl ether di (meth) acrylate, epoxy modified bisphenol A di (meth) acrylate and the like can be mentioned. it can. As the polyfunctional monomer, only one kind may be used, or two or more kinds may be used in combination. If necessary, they can be used in combination with a monofunctional monomer for copolymerization. The polyfunctional monomer is 30% by weight in the composition.
The above is desirable. When the surface layer portion is formed using only a monofunctional monomer, a small amount of acidic groups can be obtained even after the subsequent irradiation of ultraviolet rays and alkali treatment, and the molded article intended by the present invention cannot be obtained. That is, in the present invention, a polyfunctional monomer (a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule)
Using is one of the important components.
【0010】また本発明においては、適当な基材よりな
る成形物の表面に上述したような多官能性モノマーを塗
布して供給し、それを重合することによって硬化膜を形
成してもよいし、あるいは上述したような多官能性モノ
マーを主成分とするもののみで成形物の全体を形成して
もよい。基材を使用する場合、その基材としては、透過
像を認識できるだけの透明性を呈するものが望ましい
が、特別な限定はない。基材としては、有機材料(特に
有機高分子材料)が好ましい。ただし無機材料と有機材
料との複合材料を基材として用いることもできる。有機
材料としては、アクリル樹脂、塩化ビニール樹脂、ポリ
カーボネート樹脂、ポリエステル樹脂などを挙げること
ができる。また基材の表面に記述したような多官能性モ
ノマーを塗布して重合する方法においては、その表面の
重合体層の厚さは、1μm以上が望ましく、3μm以上
が好ましい。ただし、先に述べたように、この基材は必
ずしも必要なものでなく、成形物全体が多官能性モノマ
ー(1分子中に2個以上の(メタ)アクリロイルオキシ
基を有する多官能性モノマー)の重合体で構成されるも
のであってもよい。Further, in the present invention, a cured film may be formed by coating and supplying the above-mentioned polyfunctional monomer on the surface of a molded article made of a suitable base material and polymerizing it. Alternatively, the entire molded product may be formed only by using the above-mentioned polyfunctional monomer as a main component. When a base material is used, it is desirable that the base material be transparent enough to recognize a transmitted image, but there is no particular limitation. As the base material, an organic material (particularly an organic polymer material) is preferable. However, a composite material of an inorganic material and an organic material can also be used as the base material. Examples of the organic material include acrylic resin, vinyl chloride resin, polycarbonate resin, polyester resin and the like. Further, in the method of coating and polymerizing the polyfunctional monomer as described on the surface of the substrate, the thickness of the polymer layer on the surface is preferably 1 μm or more, and more preferably 3 μm or more. However, as described above, this base material is not always necessary, and the entire molded product is a polyfunctional monomer (a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule). It may be composed of a polymer of
【0011】次に多官能性モノマーの重合により形成し
た表層部に300nm以下の波長を含む紫外線を照射す
る。この紫外線は、重合体の架橋構造の一部を切断でき
る程度のエネルギーを持つ波長範囲及び照射時間を適宜
選定して実施すればよい。重合体の架橋構造の結合エネ
ルギーは、重合体の組成によって異なるので一概には特
定できないが、約4eV以上のエネルギーを付与する紫
外線が望ましい。このエネルギーを持つ波長範囲は、3
00nm以下である。なお、紫外線照射を行っただけで
は酸性基は十分には発生しない。次に、紫外線照射部分
に通常のアルカリ処理、すなわちアルカリ水溶液中への
浸漬を施す。このアルカリ処理によって、先の紫外線照
射の作用と相伴って表層部に酸性基が生成する。アルカ
リ処理に使用するアルカリ水溶液としては、例えば、水
酸化ナトリウム、水酸化カリウムなどの水溶液、それら
に更にアルコールなどの各種溶剤を加えたアルカリ水溶
液などを挙げることができる。アルカリ処理の条件は、
紫外線照射量、紫外線照射部位の組成、成形物の形態、
目的とする性能などによって異なるので一概には規定で
きないが、例えば水酸化ナトリウムを用いる場合には、
濃度0.1〜50重量%の濃度の水溶液として使用する
ことが望ましく、さらには1〜30重量%が好ましい。
また、アルカリ処理の温度は、0〜100℃、好ましく
は20〜80℃である。アルカリ処理の時間は0.01
〜100時間、好ましくは0.1〜10時間である。Next, the surface layer portion formed by polymerization of the polyfunctional monomer is irradiated with ultraviolet rays having a wavelength of 300 nm or less. This ultraviolet ray may be carried out by appropriately selecting a wavelength range and an irradiation time having energy enough to cut a part of the cross-linked structure of the polymer. The binding energy of the crosslinked structure of the polymer cannot be unconditionally specified because it depends on the composition of the polymer, but ultraviolet rays that impart energy of about 4 eV or more are desirable. The wavelength range with this energy is 3
It is not more than 00 nm. It should be noted that the acidic groups are not sufficiently generated only by performing ultraviolet irradiation. Then, the UV-irradiated portion is subjected to normal alkali treatment, that is, immersion in an alkaline aqueous solution. By this alkali treatment, an acidic group is generated in the surface layer portion in association with the above-mentioned action of ultraviolet irradiation. Examples of the alkaline aqueous solution used for the alkaline treatment include an aqueous solution of sodium hydroxide, potassium hydroxide and the like, and an alkaline aqueous solution in which various solvents such as alcohol are further added. The conditions for alkaline treatment are
UV irradiation amount, composition of UV irradiation site, form of molded product,
It cannot be specified unconditionally because it depends on the desired performance, but when using sodium hydroxide, for example,
It is desirable to use as an aqueous solution having a concentration of 0.1 to 50% by weight, more preferably 1 to 30% by weight.
The temperature of the alkali treatment is 0 to 100 ° C, preferably 20 to 80 ° C. Alkaline treatment time is 0.01
~ 100 hours, preferably 0.1-10 hours.
【0012】上述した紫外線照射及びアルカリ処理の結
果、成形物の表面には通常0.02μmol/cm2以
上の酸性基が生成する。酸性基が生成した成形物表面の
赤外反射スペクトルからは、1570cm-1にCOO-
イオンによる吸収が観測された。この結果から酸性基
は、エステル結合の加水分解で生じるCOOH基、OH
基であると推定している。本発明において、酸性基の含
有量の値は、成形物表面の単位面積あたりに吸収しうる
塩基性染料のモル数(μmol/cm2)で表す。この
値は以下の方法により求めた値である。 (1)0.1規定の酢酸ナトリウム緩衝液(PH4.
5)を作成する。 (2)メチルバイオレットの濃度が1.0g/lの溶液
を、(1)の緩衝液をもとにして調整する。 (3)この溶液に50×50mm2の成形物を72時間
浸す。(温度25℃) (4)成形物を取り出して水洗する。 (5)水洗後の成形物の水分を除去する。 (6)その成形物をN,N−ジメチルホルムアミド液中
に24時間浸すことによって、染料を抽出溶解する。 (7)587nmの光を用いて染料抽出液の吸光度を測
定する。 (8)あらかじめN,N−ジメチルホルムアミドに溶解
した染料溶液より染料濃度の検量線を求め、成形物の単
位面積あたりの塩基性染料濃度を算出する。As a result of the above-mentioned ultraviolet irradiation and alkali treatment, 0.02 μmol / cm 2 or more of acidic groups are usually produced on the surface of the molded product. From the infrared reflection spectrum of the surface of the molded product in which the acidic group was generated, COO − at 1570 cm −1.
Absorption by ions was observed. From this result, the acidic group is a COOH group or OH generated by hydrolysis of the ester bond.
Presumed to be the basis. In the present invention, the value of the content of the acidic group is represented by the number of moles (μmol / cm 2 ) of the basic dye that can be absorbed per unit area of the surface of the molded product. This value is a value obtained by the following method. (1) 0.1 N sodium acetate buffer (PH4.
Create 5). (2) A solution having a methyl violet concentration of 1.0 g / l is prepared based on the buffer solution of (1). (3) A 50 × 50 mm 2 molded product is immersed in this solution for 72 hours. (Temperature 25 ° C.) (4) The molded product is taken out and washed with water. (5) Remove water from the molded product after washing with water. (6) The dye is extracted and dissolved by immersing the molded product in an N, N-dimethylformamide solution for 24 hours. (7) The absorbance of the dye extract is measured using 587 nm light. (8) The calibration curve of the dye concentration is obtained from the dye solution dissolved in N, N-dimethylformamide in advance, and the basic dye concentration per unit area of the molded product is calculated.
【0013】本発明の酸性基の含有量の値(0.02μ
mol/cm2以上)は、表面での結合能力を意味す
る。本発明においては、重合体層の表層部のみに酸性基
が適度に含有され、その内部側には酸性基はあまり含有
されておらず、酸性基が表面側に集中している。この酸
性基と珪素化合物(A)のエポキシ基とが反応し、化学
結合が形成されると推定される。したがつて、重合体層
上層では、酸性基と珪素化合物(A)が化学結合する機
能を呈し、重合体の下層では、架橋密度が重合体層形成
時のまま維持されている。この両者の特性が伴って非常
に良好な硬度、耐久性を有する成形物となる。この酸性
基を含有する層の厚さは、最表面から内部へ向かって1
μm以内であることが望ましい。酸性基を含有する層の
厚さが1μmを越えると、必要な硬度が得られない場合
がある。またその層の厚さの下限は、酸性基含有量など
の関係に影響されるので一概には規定できないが、一般
的には0.01μm程度である。The value of the content of acidic groups of the present invention (0.02 μ
mol / cm 2 or more) means the binding capacity at the surface. In the present invention, the acidic groups are contained appropriately only in the surface layer portion of the polymer layer, the acidic groups are not much contained in the inner side, and the acidic groups are concentrated on the surface side. It is presumed that this acidic group reacts with the epoxy group of the silicon compound (A) to form a chemical bond. Therefore, the upper layer of the polymer layer has a function of chemically bonding the acidic group and the silicon compound (A), and the lower layer of the polymer maintains the crosslink density as it was when the polymer layer was formed. By virtue of these two characteristics, a molded product having extremely good hardness and durability is obtained. The thickness of the layer containing the acidic group is 1 from the outermost surface to the inside.
It is desirable to be within μm. If the thickness of the layer containing an acidic group exceeds 1 μm, the required hardness may not be obtained in some cases. Further, the lower limit of the thickness of the layer cannot be unconditionally specified because it is influenced by the relationship such as the content of the acidic group, but it is generally about 0.01 μm.
【0014】なお、紫外線照射及びアルカリ処理を引き
続き行う本発明のこの処理に変えて、仮に従来の酸性基
導入方法(プラズマ処理、光照射グラフト重合、クロム
処理など)を1分子中に2個以上の(メタ)アクリロイ
ルオキシ基を有する多官能性モノマーの重合体に施した
としても、酸性基量、硬度、工程の容易性の面において
良好な結果を得にくい。このアルカリ処理後の成形物に
は、適当な水洗を通常行う。また必要に応じて無機酸や
有機酸で中和洗浄してもよい。Instead of this treatment of the present invention in which ultraviolet irradiation and alkali treatment are successively performed, two or more conventional acidic group introduction methods (plasma treatment, light irradiation graft polymerization, chromium treatment, etc.) are used in one molecule. Even when applied to the polymer of the polyfunctional monomer having a (meth) acryloyloxy group, it is difficult to obtain good results in terms of the amount of acidic groups, hardness, and process easiness. The molded product after the alkali treatment is usually washed with appropriate water. Moreover, you may neutralize and wash with an inorganic acid or an organic acid as needed.
【0015】ついで下記一般式(A) XaSi(OY)4-a (A) (式中Xは、エポキシ基を含有する有機官能基Yは、炭
化水素基aは、1〜3の整数を表す。)で表される珪素
化合物を過塩素酸化合物、水、有機溶剤の存在下で加水
分解、縮重合させて得られるシリカ系重合体を該成形物
の表面に塗布し、エポキシ基と酸性基を化学反応させる
ことによって、成形物表面に被覆し積層させる。一般式
(A)で表される珪素化合物としては、例えばグリシド
キシメチルトリメトキシシラン、グリシドキシメチルト
リエトキシシラン、β−グリシドキシエチルトリエトキ
シシラン、γ−グリシドキシプロピルトリメトキシシラ
ン、γ−グリシドキシプロピルトリエトキシシラン、グ
リシドキシメチル(メチル)ジメトキシシラン、グリシ
ドキシメチル(エチル)ジメトキシシラン、β−グリシ
ドキシエチル(メチル)ジメトキシシラン、β−グリシ
ドキシエチル(メチル)ジメトキシシラン、γ−グリシ
ドキシプロピル(メチル)ジメトキシシラン、γ−グリ
シドキシプロピル(エチル)ジメトキシシランを挙げる
ことができる。Then, the following general formula (A) X a Si (OY) 4-a (A) (where X is an organic functional group Y containing an epoxy group, hydrocarbon group a is an integer of 1 to 3) The silica-based polymer obtained by hydrolyzing and polycondensing a silicon compound represented by the formula (1) is subjected to hydrolysis and polycondensation in the presence of a perchloric acid compound, water, and an organic solvent to form an epoxy group. By chemically reacting acidic groups, the surface of the molded product is coated and laminated. Examples of the silicon compound represented by the general formula (A) include glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, β-glycidoxyethyltriethoxysilane, and γ-glycidoxypropyltrimethoxysilane. , Γ-glycidoxypropyltriethoxysilane, glycidoxymethyl (methyl) dimethoxysilane, glycidoxymethyl (ethyl) dimethoxysilane, β-glycidoxyethyl (methyl) dimethoxysilane, β-glycidoxyethyl ( Examples thereof include methyl) dimethoxysilane, γ-glycidoxypropyl (methyl) dimethoxysilane, and γ-glycidoxypropyl (ethyl) dimethoxysilane.
【0016】これら珪素化合物を加水分解、縮重合反応
させるには、反応触媒、水、有機溶剤の存在下で常温か
ら還流温度までの温度で約1〜10時間攪拌する。水、
有機溶剤の混合溶媒中に珪素化合物(A)を溶解させ加
水分解、縮重合させシリカ系重合体を形成させる際に
は、溶媒のPH値を制御する必要がある。J.D.Miller,
H.Ishidaの文献(Macromolecules vol.17 1659 (1984))
によれば強酸性(PH1〜3)、強アルカリ性(PH1
1〜14)では、珪素化合物(A)中のOY基が、加水
分解不完全なまま縮重合反応に移行するため、溶液中で
のシリカ重合体は一次元的重合鎖を持ち比較的低分子量
物となる。中性付近(PH7〜9)ではOY基の加水分
解が完全に行われてから縮合反応が急激に生じ、溶液中
でのシリカ系重合体は、三次元的重合鎖を持ち高分子物
となる。我々の検討でも強酸性(PH1〜3)、では、
生成粒子径が小さくて白濁もしないが中性付近(PH7
〜9)では生成粒子径が大きくて白濁しやすい結果を得
ている。 極端な場合沈殿物が生じた。To carry out the hydrolysis and polycondensation reaction of these silicon compounds, stirring is carried out in the presence of a reaction catalyst, water and an organic solvent at a temperature from room temperature to the reflux temperature for about 1 to 10 hours. water,
When the silicon compound (A) is dissolved in a mixed solvent of organic solvents to be hydrolyzed and polycondensed to form a silica-based polymer, it is necessary to control the PH value of the solvent. JDMiller,
H. Ishida reference (Macromolecules vol.17 1659 (1984))
According to the report, strong acidity (PH1-3), strong alkalinity (PH1)
1 to 14), since the OY group in the silicon compound (A) shifts to the polycondensation reaction while the hydrolysis is incomplete, the silica polymer in the solution has a one-dimensional polymer chain and has a relatively low molecular weight. It becomes a thing. In the vicinity of neutrality (PH7 to 9), the hydrolysis of the OY group is completely performed and then the condensation reaction rapidly occurs, and the silica-based polymer in the solution becomes a polymer having a three-dimensional polymer chain. .. According to our examination, strong acidity (PH1 to 3),
The generated particle size is small and does not cloud, but it is near neutral (PH7
In Nos. 9 to 9), the produced particle size is large and the result is likely to become cloudy. In the extreme case a precipitate formed.
【0017】このような加水分解、縮重合反応をPH値
によって制御するために反応触媒を用いる。反応触媒と
しては有機酸、無機酸、有機塩基、無機塩基、緩衝溶液
を使用する。PH値の設定は、溶液の安定性、シリカ系
重合体の分子量を考慮し、適当な条件を見いだす必要が
ある。我々の検討では、PH5〜6が望ましいと考えて
いる。また添加する水の量は、加水分解反応に必要なモ
ル当量以上とするのが望ましい。A reaction catalyst is used to control such hydrolysis and polycondensation reaction according to the PH value. As the reaction catalyst, an organic acid, an inorganic acid, an organic base, an inorganic base, or a buffer solution is used. To set the PH value, it is necessary to find suitable conditions in consideration of the stability of the solution and the molecular weight of the silica-based polymer. In our study, PH5-6 is considered desirable. Further, it is desirable that the amount of water to be added be not less than the molar equivalent required for the hydrolysis reaction.
【0018】有機溶剤としては、メチルアルコール、エ
チルアルコール、イソプロピルアルコールなどのアルコ
ール類、アセトン、メチルエチルケトンなどのケトン
類、テトラヒドロフランなどのエーテル類を挙げること
ができる。過塩素酸化合物は、加水分解、重縮合させて
得られるシリカ系重合体中に含まれているエポキシ基と
成形物表層の酸性基(−COOH基、−OH基)との化
学反応の触媒として使用する。これには、過塩素酸マグ
ネシウム、過塩素酸アンモニウム、過塩素酸カリウム、
過塩素酸ナトリウム、過塩素酸、過塩素酸亜鉛、過塩素
酸アルミニウムなどが使用できる。Examples of the organic solvent include alcohols such as methyl alcohol, ethyl alcohol and isopropyl alcohol, ketones such as acetone and methyl ethyl ketone, and ethers such as tetrahydrofuran. The perchloric acid compound serves as a catalyst for a chemical reaction between an epoxy group contained in a silica-based polymer obtained by hydrolysis and polycondensation and an acidic group (-COOH group, -OH group) on the surface layer of a molded article. use. This includes magnesium perchlorate, ammonium perchlorate, potassium perchlorate,
Sodium perchlorate, perchloric acid, zinc perchlorate, aluminum perchlorate, etc. can be used.
【0019】本発明に用いる被覆用組成物を、成形物の
表層部に塗布する方法としては、スプレー塗布、回転塗
布、浸漬塗布などの方法が採用できるが、作業性、皮膜
の平滑性などの点から浸漬塗布が好ましく、成形物の形
状が複雑な場合は、スプレー塗布が好ましい。皮膜の塗
布量としては、硬化皮膜の膜厚が1〜30μm、好まし
くは、1〜10μmの範囲にするのがよい。硬化皮膜の
膜厚が1μm未満の場合は十分な表面硬度、耐摩耗性が
得られず、30μmを越える場合は、基材との密着性が
低下したり、皮膜にクラックが発生しやすくなったりす
る。成形物の表層部に塗布したシリカ系重合体をさらに
重合、硬化させ、シリカ系重合体のエポキシ基と成形物
表層の酸性基(−COOH基、−OH基)とを化学反応
させるために加熱を行う。加熱条件としては、たとえば
オーブン中で100〜130℃10分〜10時間程度の
条件が採用できる。As a method for applying the coating composition used in the present invention to the surface layer of a molded article, spray coating, spin coating, dip coating and the like can be adopted, but workability, smoothness of the coating, etc. From the viewpoint, dip coating is preferable, and when the shape of the molded product is complicated, spray coating is preferable. The coating amount of the coating is such that the thickness of the cured coating is 1 to 30 μm, preferably 1 to 10 μm. When the film thickness of the cured film is less than 1 μm, sufficient surface hardness and abrasion resistance cannot be obtained, and when it exceeds 30 μm, the adhesion to the base material may be deteriorated or the film may be easily cracked. To do. Heating to further polymerize and cure the silica-based polymer applied to the surface layer of the molded product, and to chemically react the epoxy group of the silica-based polymer with the acidic group (-COOH group, -OH group) of the surface layer of the molded product. I do. As the heating conditions, for example, conditions of 100 to 130 ° C. for 10 minutes to 10 hours in an oven can be adopted.
【0020】[0020]
【実施例】以下本発明を実施例により更に詳細に説明す
る実施例1 ジペンタエリスリトールヘキサアクリレート10重量
%、コハク酸/トリメチロールエタン/アクリル酸の当
モル縮合物20重量%、テトラヒドロフルフリルアクリ
レート5重量%、光開始剤(ダロキュア1173(メル
ク社製))1.2重量%、イソプロパノール34重量
%、及びトルエン20重量%からなる溶液を調整した。
この溶液中に厚さ2mmのポリメチルメタクリレート樹
脂板を浸した。その後0.2cm/secの速度でゆっ
くりと引き上げ、樹脂板の表面に皮膜を形成した。つい
でこれを35℃に保ち、樹脂板の両側から15cmの距
離に設定された中心波長365nmを有する高圧水銀灯
を用い、840mJ/cm2の照射量にて照射を行っ
た。この結果、樹脂板の表面に厚さ3.5μmの硬化皮
膜を得た。またこの硬化皮膜が形成された樹脂板の鉛筆
硬度(JIS K5400)は5Hであった。EXAMPLES The present invention will be described in more detail with reference to Examples below. Example 1 10% by weight of dipentaerythritol hexaacrylate, 20% by weight of equimolar condensate of succinic acid / trimethylolethane / acrylic acid, tetrahydrofurfuryl acrylate A solution consisting of 5% by weight, 1.2% by weight of a photoinitiator (Darocur 1173 (manufactured by Merck)), 34% by weight of isopropanol, and 20% by weight of toluene was prepared.
A 2 mm-thick polymethylmethacrylate resin plate was immersed in this solution. Then, the film was slowly pulled up at a speed of 0.2 cm / sec to form a film on the surface of the resin plate. Then, this was kept at 35 ° C., and irradiation was performed at a dose of 840 mJ / cm 2 using a high pressure mercury lamp having a center wavelength of 365 nm set at a distance of 15 cm from both sides of the resin plate. As a result, a cured film having a thickness of 3.5 μm was obtained on the surface of the resin plate. The pencil hardness (JIS K5400) of the resin plate on which this cured film was formed was 5H.
【0021】そして、この硬化皮膜が形成された樹脂板
の上方から、中心波長254nmを有する低圧水銀灯を
用いて、1300mJ/cm2の照射量にて照射を行っ
た。照射後の樹脂板の表層部の酸性基を、塩基性染料メ
チルバイオレットにより測定した結果、0.012μm
ol/cm2であった。更に、その樹脂板を20重量%
の水酸化ナトリウム水溶液中に室温で3時間浸し、水
洗、乾燥、その後0.05重量%硫酸水溶液に室温で1
分浸し、水洗、乾燥した。アルカリ処理後の樹脂板の酸
性基は0.05μmol/cm2に増加した。つぎに下
記の組成で混合し、室温(20℃)で2時間攪拌した
後、一昼夜放置しコーティング溶液を得た。 1.γ−グリシドキシプロピルトリメトキシシラン 100.4重量部 2.イソプロピルアルコール 278.3重量部 3.0.1N酢酸/0.1N酢酸ナトリウム 22.9重量部 (PH 5の緩衝溶液 ) 4.過塩素酸マグネシウム 2.0重量部 この溶液を前述の表層部に酸性基を有する樹脂板に引き
上げ速度100cm/min.でディップコートし、1
05℃で3時間反応させ硬化皮膜を形成した。この硬化
皮膜の物性評価結果を表1と2に示す。Irradiation was performed from above the resin plate on which the cured film was formed, using a low pressure mercury lamp having a central wavelength of 254 nm at an irradiation dose of 1300 mJ / cm 2 . The acidic group on the surface layer of the resin plate after irradiation was measured by the basic dye methyl violet, and was 0.012 μm.
It was ol / cm 2 . Furthermore, the resin plate is 20% by weight
Immersed in an aqueous sodium hydroxide solution at room temperature for 3 hours, washed with water, dried, and then immersed in a 0.05% by weight aqueous solution of sulfuric acid at room temperature
It was soaked in water, washed with water, and dried. The acid groups of the resin plate after the alkali treatment increased to 0.05 μmol / cm 2 . Next, the following compositions were mixed, stirred at room temperature (20 ° C.) for 2 hours, and then allowed to stand for a day and night to obtain a coating solution. 1. γ-glycidoxypropyltrimethoxysilane 100.4 parts by weight 1. Isopropyl alcohol 278.3 parts by weight 3. 0.1N acetic acid / 0.1N sodium acetate 22.9 parts by weight (PH 5 buffer solution) 4. Magnesium perchlorate 2.0 parts by weight This solution was pulled up onto the resin plate having an acidic group on the surface layer described above at a speed of 100 cm / min. Dip coat with 1
The reaction was carried out at 05 ° C for 3 hours to form a cured film. The evaluation results of the physical properties of this cured film are shown in Tables 1 and 2.
【0022】なお評価は、次の方法で行った。 評価方法 1.表面硬度(耐摩耗性) 回転台に固定された試料表面に一定荷重下でテーバー社
製摩耗輪(CS−17)を押し当てながら、試料を20
0回回転させ、試料表面の摩耗を目視観察した。 2.密着性 試料表面にカッターナイフで縦、横それぞれ11本
1.5mm間隔で傷を入れ100個のます目を作り、セ
ロハンテープ25mm巾(ニチバン製)をます目に対し
て圧着させて、上方に急激にはがす。100個のます目
に対して試料表面に残留しているます目の数を密着性の
指標とした。 3.熱水テスト 80℃の水中で20時間浸した後、密着性及び外観を検
査した。The evaluation was carried out by the following method. Evaluation method 1. Surface hardness (wear resistance) While pressing a wear wheel (CS-17) manufactured by Taber Co., Ltd. under a constant load against the surface of the sample fixed to the rotary table, the sample was set to 20.
The sample was rotated 0 times and the abrasion of the sample surface was visually observed. 2. Adhesion 11 pieces each in the vertical and horizontal directions with a cutter knife on the sample surface
Make 100 squares by making scratches at 1.5 mm intervals, press cellophane tape 25 mm width (made by Nichiban) against the squares, and peel off rapidly. The number of squares remaining on the sample surface for 100 squares was used as an index of adhesion. 3. Hot water test After soaking in water at 80 ° C. for 20 hours, the adhesion and appearance were examined.
【0023】比較例1〜3 比較例1では、実施例中の表面に酸性基を有する樹脂板
の代わりに、1.5mmの通常の窓用ガラスを用いた。
比較例2および3では、実施例中の表面に酸性基を有す
る樹脂板の代わりに、表面硬化アクリル樹脂(商標名ア
クリライトMR、三菱レイヨン製)を用いた。この硬化
皮膜の物性評価結果を表1と2に示す。表1.表面硬度(耐摩耗性) Comparative Examples 1 to 3 In Comparative Example 1, 1.5 mm ordinary window glass was used instead of the resin plate having an acidic group on the surface in the examples.
In Comparative Examples 2 and 3, a surface-hardened acrylic resin (trade name: Acrylite MR, manufactured by Mitsubishi Rayon) was used instead of the resin plate having an acidic group on the surface in the examples. The evaluation results of the physical properties of this cured film are shown in Tables 1 and 2. Table 1. Surface hardness (wear resistance)
【0024】[0024]
【表1】 註:○;かすかに傷が見えるが、透明性は保持。 △;
すり傷があり、透明性が低下。 ×;すり傷がひどく、
まったく透明性がない。表2.耐久性 [Table 1] Note: ○; Slight scratches are visible, but transparency is maintained. △;
Scratches and reduced transparency. ×; severely scratched,
There is no transparency at all. Table 2. durability
【表2】 [Table 2]
【0025】[0025]
【発明の効果】以上のように本発明によって得られる被
覆成形物は、表面硬度、密着性、耐久性に優れたもので
ある。特にこの成形物は、表面に(−Si−O−Si
−)nの架橋構造硬化皮膜を有するため、表面硬度に極
めて優れるものである。また本発明は、簡易な工程、廉
価な設備で製造できる方法なので、表面硬度に優れた成
形物を得るのに有利である。As described above, the coated molded article obtained by the present invention is excellent in surface hardness, adhesion and durability. In particular, this molded product has (-Si-O-Si
-) Since it has a cross-linked structure cured film of n , it has extremely excellent surface hardness. Further, since the present invention is a method which can be manufactured by simple steps and inexpensive equipment, it is advantageous to obtain a molded product having excellent surface hardness.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小林 幸男 愛知県名古屋市東区砂田橋四丁目1番60号 三菱レイヨン株式会社商品開発研究所内 (72)発明者 赤木 勇司 愛知県名古屋市東区砂田橋四丁目1番60号 三菱レイヨン株式会社商品開発研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yukio Kobayashi 4-chome, Sunadabashi, Higashi-ku, Nagoya, Aichi Prefecture 60-1 Mitsubishi Rayon Co., Ltd. Product Development Laboratory (72) Inventor, Yuji Akagi 4-chome, Sunadabashi, Higashi-ku, Nagoya, Aichi No. 60 Mitsubishi Rayon Co., Ltd. Product Development Laboratory
Claims (2)
イルオキシ基を有する多官能性モノマーに由来する構造
単位を主構成単位として有する重合体を少なくともその
表層部に有し、該表層部の表面に0.02μmol/c
m2以上の酸性基を有する成形物において、該酸性基上
に一般式(A)で表される珪素化合物を縮重合させて得
られるシリカ系重合体が積層されていることを特徴とす
る成形物。 XaSi(OY)4-a (A) (式中、Xは、エポキシ基を含有する有機官能基Yは、
炭化水素基aは、1〜3の整数を表す。)1. A polymer having a structural unit derived from a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule as a main constitutional unit in at least its surface layer portion, and the surface layer portion. 0.02 μmol / c on the surface of
A molded article having m 2 or more acidic groups, characterized in that a silica-based polymer obtained by polycondensing a silicon compound represented by the general formula (A) is laminated on the acidic groups. object. X a Si (OY) 4-a (A) (In the formula, X is an organic functional group Y containing an epoxy group,
The hydrocarbon group a represents an integer of 1 to 3. )
イルオキシ基を有する多官能性モノマーに由来する構造
単位を主構成単位として有する重合体を少なくともその
表層部に有する成形物に対して300nm以下の波長を
含む紫外線を照射し、アルカリ処理を行い、該成形物の
表層部に0.02μmol/cm2以上の酸性基を生成
し、次いで請求項1記載の一般式(A)で表される珪素
化合物で処理することを特徴とする成形物の製造方法。2. A molded product having a polymer having a structural unit derived from a polyfunctional monomer having two or more (meth) acryloyloxy groups in one molecule as a main constituent unit at least in its surface layer portion. Irradiation with ultraviolet rays having a wavelength of 300 nm or less, alkali treatment is performed to generate 0.02 μmol / cm 2 or more of acidic groups in the surface layer portion of the molded article, and then the compound represented by the general formula (A) according to claim 1 is used. A method for producing a molded article, which comprises treating with a silicon compound as described above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4036484A JPH05230246A (en) | 1992-02-24 | 1992-02-24 | Molded object and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4036484A JPH05230246A (en) | 1992-02-24 | 1992-02-24 | Molded object and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05230246A true JPH05230246A (en) | 1993-09-07 |
Family
ID=12471098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4036484A Pending JPH05230246A (en) | 1992-02-24 | 1992-02-24 | Molded object and production thereof |
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Country | Link |
---|---|
JP (1) | JPH05230246A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010085131A (en) * | 2000-02-28 | 2001-09-07 | 김은엽 | Method of scratch-resistant multi-layer coating with silicon agent on the surface of polymer |
-
1992
- 1992-02-24 JP JP4036484A patent/JPH05230246A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010085131A (en) * | 2000-02-28 | 2001-09-07 | 김은엽 | Method of scratch-resistant multi-layer coating with silicon agent on the surface of polymer |
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