JPH05228735A - Machining liquid supply device for wire electric discharge machine - Google Patents
Machining liquid supply device for wire electric discharge machineInfo
- Publication number
- JPH05228735A JPH05228735A JP4029594A JP2959492A JPH05228735A JP H05228735 A JPH05228735 A JP H05228735A JP 4029594 A JP4029594 A JP 4029594A JP 2959492 A JP2959492 A JP 2959492A JP H05228735 A JPH05228735 A JP H05228735A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- machining
- tank
- filter device
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 177
- 238000003754 machining Methods 0.000 title claims abstract description 59
- 239000002699 waste material Substances 0.000 claims abstract description 51
- 239000012530 fluid Substances 0.000 claims abstract description 40
- 238000001914 filtration Methods 0.000 claims abstract description 33
- 238000001514 detection method Methods 0.000 claims abstract description 16
- 239000010802 sludge Substances 0.000 claims description 25
- 238000005192 partition Methods 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 6
- 239000010865 sewage Substances 0.000 description 16
- 239000000843 powder Substances 0.000 description 14
- 239000002351 wastewater Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 230000007423 decrease Effects 0.000 description 8
- 238000012423 maintenance Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Filtration Of Liquid (AREA)
Abstract
(57)【要約】
【目的】 フィルタ装置を寿命の到来前に交換するとい
う無駄をなくすと共に、放電加工中に自動的にフィルタ
装置を交換できるワイヤ放電加工装置の加工液供給装置
を得ること。
【構成】 少なくとも2個のフィルタ装置28a,28
bと、清液槽22内の加工液13の液面を検出する液面
検出手段37と、濾過ポンプ26とフィルタ装置28
a,28bとの間に設けられ液面検出手段37の検出結
果に基いて加工液回路を切換える切換手段41a,41
bと備えたもの。
(57) [Abstract] [Objective] To eliminate the waste of replacing the filter device before the end of its service life, and to obtain a machining fluid supply device for a wire electric discharge machine which can automatically replace the filter device during electric discharge machining. [Structure] At least two filter devices 28a, 28
b, liquid level detection means 37 for detecting the liquid level of the working liquid 13 in the clean liquid tank 22, the filtration pump 26, and the filter device 28.
switching means 41a, 41 provided between a and 28b for switching the machining liquid circuit based on the detection result of the liquid level detection means 37.
The one with b.
Description
【0001】[0001]
【産業上の利用分野】本発明は、ワイヤ放電加工装置に
係り、さらに詳しくは、ワイヤ放電加工装置の加工部に
加工液を供給し、また加工後の加工液を濾過するワイヤ
放電加工装置の加工液供給装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire electric discharge machine, and more particularly to a wire electric discharge machine which supplies a machining liquid to a machining part of the wire electric discharge machine and filters the machining liquid after machining. The present invention relates to a working fluid supply device.
【0002】[0002]
【従来の技術】図14は従来のワイヤ放電加工装置の一
例の構成図で、1は放電加工機、20は加工液供給装置
である。放電加工機1において、2はベッドで、その上
部にはサドル3が配設されており、サドル3は駆動モー
タ(図示せず)に駆動されて図面の垂直方向(Y方向)
に移動するようになってる。5はサドル3上に設けた駆
動モータ、6は駆動モータ5によって駆動されるねじ棒
である。2. Description of the Related Art FIG. 14 is a block diagram of an example of a conventional wire electric discharge machine, in which 1 is an electric discharge machine and 20 is a machining fluid supply device. In the electric discharge machine 1, 2 is a bed, and a saddle 3 is arranged on the bed, and the saddle 3 is driven by a drive motor (not shown) to be in a vertical direction (Y direction) in the drawing.
To move to. Reference numeral 5 is a drive motor provided on the saddle 3, and 6 is a screw rod driven by the drive motor 5.
【0003】4はねじ棒6に結合され、図の左右方向
(X方向)に移動するテーブルで、その上部には加工槽
7が取付けられており、加工槽7内には定盤8が設置さ
れている。9は定盤8上に取付けられた被加工物であ
る。10は被加工物9の上方においてワイヤ電極12を
支持する上部ワイヤガイド、11は被加工物9の下方に
おいてワイヤ電極12を支持する下部ワイヤガイドであ
る。Reference numeral 4 is a table which is connected to a screw rod 6 and moves in the left-right direction (X direction) in the figure. A processing tank 7 is attached to the upper portion of the table, and a surface plate 8 is installed in the processing tank 7. Has been done. Reference numeral 9 is a workpiece mounted on the surface plate 8. Reference numeral 10 is an upper wire guide that supports the wire electrode 12 above the work piece 9, and 11 is a lower wire guide that supports the wire electrode 12 below the work piece 9.
【0004】加工液供給装置20において、21は清液
槽22と汚液槽23とからなる加工液供給装置20の本
体、25は本体21上に設けられた供給ポンプで、清液
槽22に貯蔵された加工液13を上部ワイヤガイド10
及び下部ワイヤガイド11の加工液供給孔に圧送する。
27は清液槽22上に設けられ、フィルタ装置28が設
置される取付台である。フィルタ装置28は通常紙、布
などの繊維質の材料からなる円筒状の内フィルタ29と
その外側に配設された外フィルタ30、及び両フィルタ
29,30の間と内フィルタ29内に形成された流路3
1,32とからなり、流路31はその下部に設けたコネ
クタ34を介して濾過ポンプ26に接続されている。3
5は汚液槽23から濾過ポンプ26によって圧送された
汚液の流入口である。なお、33はフィルタ装置28の
蓋体、36はフィルタ装置28の周囲に設けられ、フィ
ルタ装置28から落下する加工液の飛散を防止するため
のカバーである。In the processing liquid supply device 20, 21 is a main body of the processing liquid supply device 20 consisting of a clean liquid tank 22 and a waste liquid tank 23, and 25 is a supply pump provided on the main body 21. The stored working fluid 13 is transferred to the upper wire guide 10
And the pressure is fed to the working liquid supply hole of the lower wire guide 11.
Reference numeral 27 is a mount provided on the clean liquid tank 22 and on which a filter device 28 is installed. The filter device 28 is usually formed by a cylindrical inner filter 29 made of a fibrous material such as paper or cloth, an outer filter 30 arranged outside thereof, and a space between the filters 29, 30 and in the inner filter 29. Channel 3
1, 32, and the flow path 31 is connected to the filtration pump 26 via a connector 34 provided in the lower part thereof. Three
Reference numeral 5 denotes an inflow port for the waste liquid pumped from the waste liquid tank 23 by the filtration pump 26. Incidentally, 33 is a lid of the filter device 28, and 36 is a cover which is provided around the filter device 28 and which prevents scattering of the working liquid falling from the filter device 28.
【0005】上記のように構成したワイヤ放電加工装置
において、被加工物9を加工する場合は、上部ワイヤガ
イド10と下部ワイヤガイド11間にワイヤ電極12を
架張して送給し、ワイヤ電極12と被加工物9と互いに
接近させた状態で両者の間に電圧を印加する。つまり、
被加工物9をプラス電位に、またワイヤ電極12をマイ
ナス電位として両者の間に電圧を印加し、加工間隙に放
電現象を発生させると共に、サドル3及びテーブル4を
NC装置等によってX−Y方向に駆動し、ワイヤ放電加
工を行なう。In the wire electric discharge machine configured as described above, when the workpiece 9 is to be machined, the wire electrode 12 is stretched between the upper wire guide 10 and the lower wire guide 11 and fed. A voltage is applied between the workpiece 12 and the workpiece 9 while they are brought close to each other. That is,
The workpiece 9 is set to a positive potential and the wire electrode 12 is set to a negative potential, and a voltage is applied between the two to generate a discharge phenomenon in the machining gap, and the saddle 3 and the table 4 are moved in the XY directions by an NC device or the like. To perform wire electric discharge machining.
【0006】この放電加工中、加工部には上部ワイヤガ
イド10と下部ワイヤガイド11を介して供給ポンプ2
5により清液槽22に貯蔵されている加工液13が継続
的に供給され、加工部を加工液13で浸して加工粉を除
去する。加工粉と共に加工部から流出した加工液13は
加工槽7に回収され、汚液槽23へ送られる。During this electric discharge machining, the feed pump 2 is provided in the machining section through the upper wire guide 10 and the lower wire guide 11.
5, the working liquid 13 stored in the clean liquid tank 22 is continuously supplied, and the working portion is immersed in the working liquid 13 to remove the working powder. The processing liquid 13 that has flowed out of the processing section together with the processing powder is collected in the processing tank 7 and sent to the waste liquid tank 23.
【0007】汚液槽23に貯蔵された加工粉の混ってい
る加工液13a(以下汚液という)は、濾過ポンプ26
によりフィルタ装置28に継続的に供給されて汚液流入
口35から流路31内に流入し、流路31内を上昇して
内外フィルタ29,30に浸み込む。内外フィルタ2
9,30によって濾過されて清液となった加工液13
は、内フィルタ29の内側の流路32及び外フィルタ3
0の外側から落下し、通路24を経て清液槽22に貯蔵
される。このとき、汚液13aに含まれていた加工粉
は、内外フィルタ29,30の間、したがって流路31
の下部に蓄積される。The processing liquid 13a (hereinafter referred to as "sewage") containing the processing powder stored in the wastewater tank 23 is filtered by the filtration pump 26.
Is continuously supplied to the filter device 28, flows into the flow path 31 from the waste liquid inflow port 35, rises in the flow path 31, and permeates the inner and outer filters 29, 30. Inner and outer filter 2
Working fluid 13 filtered by 9 and 30
Is a flow path 32 inside the inner filter 29 and the outer filter 3
It falls from the outside of 0 and is stored in the clean liquid tank 22 through the passage 24. At this time, the processed powder contained in the waste liquid 13a is not absorbed between the inner and outer filters 29, 30, and thus the flow path 31.
Accumulated at the bottom of.
【0008】そして、放電加工中にフィルタ装置28を
通過する汚液13aの流量が少なくなった場合、つま
り、内外フィルタ29,30の間の流路31に蓄積され
た加工粉が多くなった場合は、加工を停止して人手によ
りカバー36及びコネクタ34を取外し、フィルタ装置
28を新品と交換する。When the flow rate of the waste liquid 13a passing through the filter device 28 during the electric discharge machining is small, that is, when the machining powder accumulated in the flow passage 31 between the inner and outer filters 29, 30 is large. Stops the processing, manually removes the cover 36 and the connector 34, and replaces the filter device 28 with a new one.
【0009】図15は加工液供給装置20の他の従来例
を示すもので、本例においては、フィルタ装置28は中
心部に汚液槽23からの汚液13aが供給される流路3
1aを有し、その外周に円筒状のフィルタ30aを配設
したもので、その作用は図14で説明した従来例とほぼ
同じである。FIG. 15 shows another conventional example of the working liquid supply device 20, and in this example, the filter device 28 has a central portion where the flow path 3 is supplied with the waste liquid 13a from the waste liquid tank 23.
1a, and a cylindrical filter 30a is disposed on the outer periphery thereof, and its operation is almost the same as that of the conventional example described in FIG.
【0010】図16は加工液供給装置のさらに他の従来
例を示すもので、本例においては、汚液槽23にフロー
ト37を設け、汚液槽23内の汚液13aの量を目視に
より検出するようにしたものである。FIG. 16 shows still another conventional example of the processing liquid supply apparatus. In this example, a float 37 is provided in the waste liquid tank 23 to visually check the amount of the waste liquid 13a in the waste liquid tank 23. It is designed to be detected.
【0011】[0011]
【発明が解決しようとする課題】図14及び図15に示
した従来の加工液供給装置は上記のように構成されてい
るので、フィルタ装置28を交換する場合は放電加工を
停止しなければならない。しかし、一度放電加工を停止
してまた再開することは、加工制度を悪化させる要因と
なるため、加工時間に合わせてフィルタ装置28を寿命
の到来前に交換する必要がある。このため作業性が低下
するばかりでなく、コストアップを招いていた。また、
交換サイクルによっては連休中にフィルタ装置28を交
換しなければならないこともあり、このため長期間の連
続無人運転が困難であった。Since the conventional machining fluid supply device shown in FIGS. 14 and 15 is constructed as described above, the electric discharge machining must be stopped when the filter device 28 is replaced. .. However, once the electric discharge machining is stopped and then restarted, it becomes a factor that deteriorates the machining accuracy. Therefore, it is necessary to replace the filter device 28 before the end of its service life in accordance with the machining time. Therefore, not only the workability is lowered, but also the cost is increased. Also,
Depending on the replacement cycle, the filter device 28 may have to be replaced during consecutive holidays, which makes continuous unmanned operation for a long period of time difficult.
【0012】さらに、フィルタ装置28の流路31,3
1a、したがって汚液13aの流入口35の付近は加工
粉が溜り易く、フィルタ装置28の交換に際して目づま
りをおこした流入口35から流路31,31a内の汚液
13aが排出されないため、フィルタ装置28が大変重
くなってしまい運搬に不便である。また、運搬中に溜っ
た加工粉が流入口35より突然排出され、衣服を汚して
しまうことがしばしばある。Further, the flow paths 31, 3 of the filter device 28 are
1a, that is, the processing powder easily accumulates near the inflow port 35 of the waste liquid 13a, and the waste liquid 13a in the flow paths 31 and 31a is not discharged from the inflow port 35 that has clogged when the filter device 28 is replaced. 28 is very heavy and inconvenient to carry. Further, the processed powder accumulated during transportation is often discharged suddenly from the inflow port 35, and the clothes are often soiled.
【0013】また、図16に示した加工液供給装置にお
いては、加工時の発熱などにより、汚液13aが蒸発し
て汚液槽23の液面が低下したにもかかわらず、フロー
ト37の点検を怠ったため濾過ポンプ26の汚液吸込口
より液面が低下し、濾過ポンプ26が空運転状態になっ
て濾過ポンプ26が故障してしまうことがある。さら
に、濾過されない一部の汚泥が汚液槽23内に堆積して
いるため、定期的に汚液槽23内の汚液13aを排出し
て汚泥を除去しなければならないが、保守点検に時間が
かかり、メンテナンスコストの増加原因になっていた。Further, in the machining liquid supply apparatus shown in FIG. 16, the float 37 is inspected even though the waste liquid 13a is evaporated and the liquid level in the waste liquid tank 23 is lowered due to heat generated during processing. Since the liquid level is lowered from the dirty liquid suction port of the filtration pump 26, the filtration pump 26 may be in an idle state and the filtration pump 26 may fail. Furthermore, since some sludge that is not filtered is accumulated in the wastewater tank 23, the wastewater 13a in the wastewater tank 23 must be discharged periodically to remove the sludge, but it takes time for maintenance and inspection. It was a cause of increase in maintenance cost.
【0014】本発明は上記の課題を解決するためになさ
れたもので、フィルタ装置を寿命の到来前に交換すると
いう無駄をなくすと共に、放電加工中に自動的にフィル
タ装置を交換できるワイヤ放電加工装置の加工液供給装
置を得ることを目的としたものである。また、本発明の
他の目的は、フィルタ装置の交換に際して、フィルタ装
置内に溜った汚液を流入口より円滑に排出することので
きる加工液供給装置を得るにある。The present invention has been made to solve the above-mentioned problems, and eliminates the waste of replacing the filter device before the end of its life, and also allows the filter device to be automatically replaced during electric discharge machining. The purpose is to obtain a working fluid supply device for the device. Another object of the present invention is to obtain a working liquid supply device capable of smoothly discharging the dirty liquid accumulated in the filter device through the inlet when the filter device is replaced.
【0015】さらに、本発明の他の目的は、濾過ポンプ
の空運転状態を可及的に減少させ、また、汚液槽内に堆
積した汚泥を一度に大量に排出できるように構成するこ
とにより、保守点検の回数を減らしてメンテナンスコス
トを低減することのできる加工液供給装置を得るにあ
る。Still another object of the present invention is to reduce the idling state of the filtration pump as much as possible and to discharge a large amount of sludge accumulated in the waste tank at one time. The purpose of the present invention is to obtain a machining fluid supply device that can reduce the maintenance cost by reducing the number of maintenance inspections.
【0016】[0016]
【課題を解決するための手段】本発明に係るワイヤ放電
加工装置の加工液供給装置は、 (1)少なくとも2個のフィルタ装置と、清液槽内の加
工液の液面を検出する液面検出手段と、濾過ポンプとフ
ィルタ装置間に設けられ加工液回路を切換える切換手段
とを設けたもの。A working fluid supply device for a wire electric discharge machining apparatus according to the present invention comprises: (1) at least two filter devices and a liquid level for detecting the working fluid level in a clean liquid tank. A detector provided with a detection means and a switching means provided between the filtration pump and the filter device for switching the working fluid circuit.
【0017】(2)上記液面検出手段に代えて、フィル
タ装置で濾過された加工液の流量を検出する流量検出
器、又は濾過ポンプからフィルタ装置へ送られる加工液
の圧力を検出する圧力検出器を設けたもの。(2) Instead of the liquid level detection means, a flow rate detector for detecting the flow rate of the working fluid filtered by the filter device, or a pressure detector for detecting the pressure of the working fluid sent from the filtration pump to the filter device. It is equipped with a container.
【0018】(3)フィルタ装置の加工液流入口の上方
に開口部を設け、この開口部を着脱可能なキャップ又は
シート材で閉塞したもの。(3) An opening is provided above the working fluid inlet of the filter device, and the opening is closed by a removable cap or sheet material.
【0019】(4)汚液槽内の加工液の少なくとも下限
の液面を検出する液面検出器と、汚液槽内に配設された
可動仕切板と、この可動仕切板を駆動する駆動手段とを
備えたもの。(4) A liquid level detector for detecting at least the lower limit liquid level of the working liquid in the waste liquid tank, a movable partition plate arranged in the waste liquid tank, and a drive for driving the movable partition plate. Equipped with means.
【0020】(5)汚液槽内の加工液の少なくとも下限
の液面を検出する液面検出器と、この検出信号を入力す
る制御器と、汚液槽内に配設された可動仕切板と、制御
器からの指令によって可動仕切板を駆動する駆動手段
と、汚液槽の底部に設けた開口部を着脱可能に閉塞する
底蓋と、開口部の外側に着脱可能に取付けられる汚泥槽
と、清液槽内の加工液を排出する開閉手段とを備えたも
の。 及び、上記(4)と(5)の装置において、可動仕切板
の移動限界を検出する検出手段を設けたものである。(5) A liquid level detector for detecting at least the lower limit liquid level of the working liquid in the sewage tank, a controller for inputting this detection signal, and a movable partition plate arranged in the sewage tank. A driving means for driving the movable partition plate in response to a command from the controller, a bottom lid detachably closing the opening provided at the bottom of the waste tank, and a sludge tank detachably attached outside the opening. And an opening / closing means for discharging the processing liquid in the clean liquid tank. Further, the above-mentioned devices (4) and (5) are provided with a detection means for detecting the movement limit of the movable partition plate.
【0021】[0021]
【作用】ワイヤ放電加工装置の稼動中に一方のフィルタ
装置が加工粉が堆積して通過する加工液の量が低下し、
清液槽内の加工液の液面が低下すると、これを液面検出
手段が検出して未使用の他方のフィルタ装置に自動的に
切換える。このようなフィルタ装置の切換えは、フィル
タ装置で濾過された加工液の流量、又は濾過ポンプから
フィルタ装置へ送られる加圧液の圧力の変化によっても
行なうことができる。[Function] During operation of the wire electric discharge machining device, one filter device accumulates machining powder and the amount of machining fluid passing therethrough decreases,
When the liquid level of the working liquid in the clean liquid tank is lowered, the liquid level detecting means detects it and automatically switches to the other unused filter device. Such switching of the filter device can also be performed by changing the flow rate of the working liquid filtered by the filter device or the pressure of the pressurized liquid sent from the filtration pump to the filter device.
【0022】フィルタ装置を交換する際、開口部を閉塞
しているキャップを取外し、又はシート材を破ることに
より、開口部から大気が侵入して内部に溜っている加工
液を排出する。When the filter device is replaced, the cap closing the opening is removed or the sheet material is broken, so that the atmosphere penetrates through the opening and the machining liquid accumulated inside is discharged.
【0023】加工時の発熱などにより加工液が蒸発して
減少し、汚液槽内の加工液の液面が低下すると、液面検
出器がこれを検出して駆動手段を駆動し、可動仕切板を
移動させて汚液槽の容積を縮小し、加工液の液面を上昇
させて濾過ポンプの空転を防止する。When the machining fluid evaporates and decreases due to heat generation during machining, and the fluid level of the machining fluid in the waste tank decreases, the fluid level detector detects this and drives the drive means to move the movable partition. The plate is moved to reduce the volume of the sewage tank and raise the level of the working liquid to prevent the filtration pump from idling.
【0024】汚液槽内に汚泥が溜ったときは底蓋を外し
て汚液槽に汚泥槽を取付け、可動仕切板を移動して底部
に溜った汚泥を汚泥槽の中に掻き集める。そして、汚液
槽の開口部を底蓋で閉塞したのち汚泥槽を取外して溜っ
た汚泥を廃棄する。この間清液槽内の加工液を開閉手段
を介して適宜排出する。なお、移動限界を検出する検出
手段を設けた場合は、可動仕切板がこれに当ると駆動手
段が停止し、可動仕切板はその位置に保持される。When sludge is accumulated in the sludge tank, the bottom lid is removed and the sludge tank is attached to the sludge tank, and the movable partition plate is moved to scrape the sludge accumulated in the bottom into the sludge tank. Then, after closing the opening of the sewage tank with the bottom lid, the sludge tank is removed and the accumulated sludge is discarded. During this time, the working liquid in the clean liquid tank is appropriately discharged through the opening / closing means. When the detecting means for detecting the movement limit is provided, when the movable partition plate hits this, the driving means is stopped and the movable partition plate is held at that position.
【0025】[0025]
実施例1.図1は本発明の第1の実施例の構成図であ
る。なお、図14の従来例と同じ部分には同じ符号を付
し、説明を省略する。27aは加工液供給装置20の清
液槽22上において本体21に取付けられた第1の取付
台、27bは同じく第2の取付台で、両取付台27a,
27b上にはそれぞれ第1のフィルタ装置28a及び第
2のフィルタ装置28bが設置されており、それぞれ第
1,第2のカバー36a,36bによって被覆されてい
る。37は清液槽22内において取付板38に支持され
たフロートスイッチである。Example 1. FIG. 1 is a block diagram of the first embodiment of the present invention. The same parts as those in the conventional example of FIG. 14 are designated by the same reference numerals and the description thereof will be omitted. 27a is a first mounting base mounted on the main body 21 on the clean liquid tank 22 of the processing liquid supply device 20, 27b is also a second mounting base, both mounting bases 27a,
A first filter device 28a and a second filter device 28b are installed on 27b, respectively, and are covered with first and second covers 36a and 36b, respectively. A float switch 37 is supported by a mounting plate 38 in the clean liquid tank 22.
【0026】41aは第1の電磁弁、41bは第2の電
磁弁で、その入力側はそれぞれ濾過ポンプ26の出力側
に接続されており、第1の電磁弁41aの出力側はコネ
クタ34aを介して第1のフィルタ装置28aに、ま
た、第2の電磁弁41bの出力側はコネクタ34bを介
して第2のフィルタ装置28bにそれぞれ接続されてい
る。42は濾過ポンプ26の吐出側に設けられ、第1,
第2のフィルタ装置28a,28b内の圧力を表示する
圧力計である。43は制御器で、フロートスイッチ37
の出力信号が加えられ、第1、第2の電磁弁41a,4
1bを制御する。41a is a first solenoid valve, 41b is a second solenoid valve, the input side of which is connected to the output side of the filtration pump 26, and the output side of the first solenoid valve 41a is connected to the connector 34a. To the first filter device 28a, and the output side of the second solenoid valve 41b is connected to the second filter device 28b via a connector 34b. 42 is provided on the discharge side of the filtration pump 26,
It is a pressure gauge that displays the pressure inside the second filter devices 28a and 28b. 43 is a controller, which is a float switch 37
Output signal of the first and second electromagnetic valves 41a, 4
Control 1b.
【0027】次に、上記のように構成した第1の実施例
の作用を、図2、図3を参照して説明する。なお、放電
加工機1において被加工物9を放電加工する作用は従来
と同じなので説明を省略する。Next, the operation of the first embodiment constructed as described above will be described with reference to FIGS. The electric discharge machining of the workpiece 9 in the electric discharge machine 1 is the same as that of the conventional one, and therefore the description thereof is omitted.
【0028】図2において、第1のフィルタ装置28a
は稼動中であり、第2のフィルタ装置は未使用であると
する。したがって、第1の電磁弁41aは導通状態、第
2の電磁弁41bは非導通常態にあり、汚液槽23に貯
蔵された加工粉の混入した汚液13aは、濾過ポンプ2
6から第1の電磁弁41aを通り、第1のフィルタ装置
28aに継続的に送られる。第1のフィルタ装置28a
に送られた汚液13aは、流路に加工粉を蓄積して純粋
な加工液13のみがフィルタ装置を通過し、清液槽22
に貯蔵される。そして加工液13は清液槽22内に満た
され、オーバーフローした加工液13は汚液槽23へ流
出する。In FIG. 2, the first filter device 28a
Is operating and the second filter device is unused. Therefore, the first solenoid valve 41a is in the conducting state, the second solenoid valve 41b is in the non-conducting normal state, and the sewage liquid 13a containing the processed powder stored in the sewage bath 23 is not filtered by the filtration pump
6 through the first solenoid valve 41a and continuously sent to the first filter device 28a. First filter device 28a
The sewage liquid 13a sent to the tank collects the processing powder in the flow path, and only the pure processing liquid 13 passes through the filter device.
Stored in. Then, the processing liquid 13 is filled in the clean liquid tank 22, and the overflowed processing liquid 13 flows out to the waste liquid tank 23.
【0029】さらに放電加工が進行して第1のフィルタ
装置28a内に加工粉が蓄積され、第1のフィルタ装置
28aを通過する加工液13の流量が少なくなると、図
3に示すように清液槽22内の加工液13が減少し、汚
液槽23内の汚液13aが増加する。そしてこの状態が
続くと、汚液13aがオーバーフローして清液槽22に
流入し、加工液13を汚染する。When the electric discharge machining further progresses and machining powder is accumulated in the first filter device 28a and the flow rate of the machining liquid 13 passing through the first filter device 28a decreases, as shown in FIG. The working liquid 13 in the tank 22 decreases, and the waste liquid 13a in the waste tank 23 increases. Then, if this state continues, the sewage liquid 13a overflows and flows into the clean liquid tank 22, and contaminates the working liquid 13.
【0030】本実施例においては、上記のような現象が
発生する前に濾過ポンプ26の吐出圧力が上昇し、交換
時期が到来したことを示す。また、フロートスイッチ3
7により清液槽22の液面が低下したこと、即ち、限界
液面に達したことを検出し、その出力信号を制御器43
に加える。制御器43はこれ基いて電気信号を出力し、
第1の電磁弁41aを非導通に、第2の電磁弁41bを
導通に切換え、第1のフィルタ装置28bによる汚液1
3aの濾過を停止し、第2のフィルタ装置28bによる
汚液13aの濾過を開始する。In the present embodiment, it is shown that the discharge pressure of the filtration pump 26 rises before the above phenomenon occurs and the replacement time has come. Also, float switch 3
It is detected that the liquid level in the clean liquid tank 22 is lowered by 7, that is, the limit liquid level is reached, and its output signal is output to the controller 43.
Add to. Based on this, the controller 43 outputs an electric signal,
The first solenoid valve 41a is switched off and the second solenoid valve 41b is switched on so that the first filter device 28b causes the sewage 1
The filtration of 3a is stopped, and the filtration of the waste liquid 13a by the second filter device 28b is started.
【0031】次に、人手により第1のカバー36a及び
コネクタ34aを取外し、フィルタ装置28aを新品と
交換してコネクタ34aを接続し、第1のカバー36a
を取付ける。以下、上記のように第1、第2のフィルタ
装置28a,28bを交互に交換して連続的に放電加工
を行なう。Next, the first cover 36a and the connector 34a are manually removed, the filter device 28a is replaced with a new one, and the connector 34a is connected to the first cover 36a.
Install. Hereinafter, as described above, the first and second filter devices 28a and 28b are alternately exchanged to continuously perform electric discharge machining.
【0032】実施例2.図4、図5は本発明の第2の実
施例の作用説明図である。本実施例は第1のフロートス
イッチ37に代えて、第1、第2のフィルタ装置28
a、28bで濾過されて清液槽22に流出する加工液1
3の流量を検出する流量検出器45a、45bを設け、
その検出信号を制御器43に加えるようにしたものであ
る。Example 2. 4 and 5 are explanatory views of the operation of the second embodiment of the present invention. In this embodiment, instead of the first float switch 37, first and second filter devices 28 are provided.
Processing fluid 1 which is filtered by a and 28b and flows out to the clean fluid tank 22.
Flow rate detectors 45a and 45b for detecting the flow rate of 3 are provided,
The detection signal is applied to the controller 43.
【0033】上記のように構成した第2の実施例におい
ては、第1のフィルタ装置28a内に加工粉が堆積して
濾過される加工液13の流量が減少すると、流量検出器
45aがこれを検出してその出力信号を制御器43へ送
り、その流量がある値以下になると制御器43は第1、
第2の電磁弁41a、41bへ制御信号を送り、第1の
電磁弁41aを非導通、第2の電磁弁41bを導通に切
換える。以下の作用は第1の実施例の場合と同様であ
る。In the second embodiment configured as described above, when the processing powder is deposited in the first filter device 28a and the flow rate of the filtered processing liquid 13 decreases, the flow rate detector 45a detects this. The detected signal is sent to the controller 43, and when the flow rate is below a certain value, the controller 43
A control signal is sent to the second electromagnetic valves 41a and 41b to switch the first electromagnetic valve 41a to non-conductive and the second electromagnetic valve 41b to conductive. The following operation is similar to that of the first embodiment.
【0034】実施例3.第1、第2の実施例では清液槽
22内の加工液13の液面又は濾過された加工液13の
流量によって第1、第2の電磁弁41a、41bを切換
制御する例を示したが、濾過ポンプ26の吐出側に設け
た圧力計42の出力信号を制御器43に加え、第1、第
2のフィルタ装置28a、28bの加工粉の堆積による
圧力の上昇に基いて第1、第2の電磁弁41a、41b
を切換えるようにしてもよい。Example 3. In the first and second embodiments, an example is shown in which the first and second electromagnetic valves 41a and 41b are switched and controlled by the liquid level of the working liquid 13 in the clean liquid tank 22 or the flow rate of the filtered working liquid 13. However, the output signal of the pressure gauge 42 provided on the discharge side of the filtration pump 26 is applied to the controller 43, and the first and the second filter devices 28a and 28b increase the pressure due to the accumulation of the processed powder. Second solenoid valves 41a, 41b
May be switched.
【0035】実施例4.図6は本発明の第4の実施例の
構成図である。本実施例はフィルタ装置28の流路31
aの頂部に開口部46を設け、この開口部46に着脱自
在のキャップ47を設けたものである。Example 4. FIG. 6 is a block diagram of the fourth embodiment of the present invention. In this embodiment, the flow path 31 of the filter device 28 is used.
An opening 46 is provided at the top of a, and a detachable cap 47 is provided in the opening 46.
【0036】上記のように構成した本実施例において
は、放電加工機1の稼動時にはフィルタ装置28の流路
31aの開口部46はキャップ47で閉塞されており、
汚液槽23から送られた汚液13aを濾過する。フィル
タ装置28を交換する際はカバー36を取外し、コネク
タ34を分離する。しかし、この状態では流路31aの
下部に加工粉が溜っているため流路31a内の汚液13
aは流入口から排出されない。そこで、キャップ47を
取外して流路31aの開口部46を開放し、ここから流
路46内に大気を導入すれば、流路31a内に溜ってい
た汚液13aを汚液の流入口35より排出することがで
きる。In this embodiment constructed as described above, the opening 46 of the flow passage 31a of the filter device 28 is closed by the cap 47 when the electric discharge machine 1 is in operation.
The waste liquid 13a sent from the waste liquid tank 23 is filtered. When replacing the filter device 28, the cover 36 is removed and the connector 34 is separated. However, in this state, since the processed powder is accumulated in the lower part of the flow path 31a, the waste liquid 13 in the flow path 31a is
a is not discharged from the inlet. Therefore, if the cap 47 is removed to open the opening 46 of the flow path 31a and the atmosphere is introduced into the flow path 46 from here, the waste liquid 13a accumulated in the flow path 31a is discharged from the waste water inlet 35. Can be discharged.
【0037】実施例5.図7は本発明の第5の実施例を
示すもので、本実施例においてはフィルタ装置28の流
路31aの上部に設けた開口部46の周囲にフランジを
設け、流路31aに内からフランジに例えば合成樹脂シ
ートの如きシート材48を接着剤で貼着し、開口部46
を閉塞したものである。Example 5. FIG. 7 shows a fifth embodiment of the present invention. In this embodiment, a flange is provided around the opening 46 provided in the upper portion of the flow channel 31a of the filter device 28 so that the flow channel 31a is flanged from the inside. A sheet material 48 such as a synthetic resin sheet is attached to the above with an adhesive, and the opening 46
Is blocked.
【0038】上記のように構成した本実施例において
は、フィルタ装置28を交換する際、シート材48を破
れば流路31a内に大気が導入され、流路31a内の汚
液を排出することができる。なお、上記の説明では、図
6、図7に示したフィルタ装置28に第4、第5の実施
例を実施し場合を示したが、図14に示すような構成の
フィルタ装置28やさらに他の構成のフィルタ装置にも
本発明を実施することができる。In this embodiment constructed as described above, when the filter device 28 is replaced, if the sheet material 48 is broken, the atmosphere is introduced into the flow passage 31a and the waste liquid in the flow passage 31a is discharged. You can In the above description, the case where the fourth and fifth embodiments are implemented in the filter device 28 shown in FIGS. 6 and 7 has been described, but the filter device 28 having the configuration shown in FIG. The present invention can be applied to the filter device having the above configuration.
【0039】実施例6.図8は本発明の第6の実施例の
構成図である。なお、図16で説明した従来例と同じ部
分には同じ符号を付し、説明を省略する。図において、
51は本体21上に設けられたモータ、52はモータ5
1に回転駆動されるねじ棒である。53は汚液槽53内
に配設された可動仕切板で、ねじ棒52に結合され、ね
じ棒52の回転に対応して汚液槽23内を左右に移動す
る。54は汚液槽23の下限液面を検出するフロートス
イッチの如き液面検出器、55は同じく上限液面を検出
する液面検出器で、両液面検出器54、55の出力信号
は、制御器56に加えられ、制御器56の出力信号はモ
ータ51に加えられる。57は汚液槽23の最小容積を
検出するリミットスイッチで、その出力信号は制御器5
6に加えられる。Example 6. FIG. 8 is a block diagram of the sixth embodiment of the present invention. The same parts as those in the conventional example described with reference to FIG. 16 are designated by the same reference numerals and the description thereof will be omitted. In the figure,
51 is a motor provided on the main body 21, 52 is a motor 5
It is a threaded rod which is rotationally driven to 1. Reference numeral 53 denotes a movable partition plate provided in the waste liquid tank 53, which is connected to the screw rod 52 and moves left and right in the waste liquid tank 23 in response to the rotation of the screw rod 52. 54 is a liquid level detector such as a float switch that detects the lower limit liquid level of the waste liquid tank 23, and 55 is a liquid level detector that also detects the upper limit liquid level. The output signals of both liquid level detectors 54, 55 are The output signal of the controller 56 is applied to the motor 51. 57 is a limit switch for detecting the minimum volume of the waste liquid tank 23, the output signal of which is the controller 5
Added to 6.
【0040】上記のように構成した本実施例において、
放電加工機1の稼動中に汚液槽23内の汚液13aが蒸
発等により減少して液面が低下すると、下限液面検出器
54がこれを検出してその出力信号を制御器56に送
る。これにより制御器56はモータ51に信号を送って
これを駆動し、ねじ棒52を回転させてこれと結合する
可動仕切板53を図の右方に移動させる。これにより、
汚液槽23の容積が図9に示すように縮小されて汚液1
3aの液面が上昇するので、濾過ポンプ26には汚液1
3aが供給され、空転することはない。上昇した汚液1
3aの液面を上限液面検出器55が検出し、又はリミッ
トスイッチ57が可動仕切板53を検出したときは制御
器56に信号が送られ、制御器56からの指令によって
モータ51を停止し、可動仕切板53はその位置に保持
される。In the present embodiment constructed as described above,
When the effluent 13a in the effluent tank 23 decreases due to evaporation or the like and the liquid level decreases during the operation of the electric discharge machine 1, the lower limit liquid level detector 54 detects this and outputs its output signal to the controller 56. send. As a result, the controller 56 sends a signal to the motor 51 to drive it, thereby rotating the screw rod 52 and moving the movable partition plate 53 connected thereto to the right in the figure. This allows
The volume of the waste liquid tank 23 is reduced as shown in FIG.
Since the liquid level of 3a rises, 1
3a is supplied and does not idle. Raised sewage 1
When the upper limit liquid level detector 55 detects the liquid level of 3a or the limit switch 57 detects the movable partition plate 53, a signal is sent to the controller 56, and the motor 51 is stopped by a command from the controller 56. The movable partition plate 53 is held at that position.
【0041】実施例7.図10は本発明の第7の実施例
の構成図である。なお、第6の実施例と同じ部分にはこ
れと同じ符号を付し、説明を省略する。59は本体21
の底部の清液槽22に近接して設けた開口部58に着脱
可能に装着した底蓋、60は本体21の底部の外側にお
いて、開口部58の外周に着脱可能に装着された汚泥槽
である。また、61は清液槽22の底部に設けられた排
液部で、制御器56からの指令によって開閉する電磁弁
62を備えている。Example 7. FIG. 10 is a block diagram of the seventh embodiment of the present invention. The same parts as those in the sixth embodiment are designated by the same reference numerals and the description thereof will be omitted. 59 is the main body 21
The bottom lid detachably attached to the opening 58 provided in the vicinity of the bottom of the clean fluid tank 22 is a sludge tank detachably attached to the outer periphery of the opening 58 outside the bottom of the main body 21. is there. Further, reference numeral 61 is a draining portion provided at the bottom of the clean liquid tank 22, and is provided with an electromagnetic valve 62 which opens and closes in response to a command from the controller 56.
【0042】上記のように構成した本実施例において、
放電加工機1の可動中は底蓋59は閉じられており、電
磁弁62は閉止している。このときのフィルタ装置20
の動作は第6の実施例の場合とほぼ同じであるが本実施
例では上限液面検出器は省略してあり、可動仕切板53
の停止位置はリミットスイッチ57によって規制され
る。In the present embodiment constructed as described above,
While the electric discharge machine 1 is moving, the bottom cover 59 is closed and the solenoid valve 62 is closed. Filter device 20 at this time
Is almost the same as that of the sixth embodiment, but the upper limit liquid level detector is omitted in this embodiment, and the movable partition plate 53 is omitted.
The stop position of is restricted by the limit switch 57.
【0043】汚液槽23の底部に溜った汚泥を除去する
場合は、可動仕切板53を図11に示すように汚液槽2
3の左端に位置させ、底蓋59を除去する。このとき、
汚液槽23内の汚液13aの液面が高いときは、濾過ポ
ンプ26を駆動して汚液13aをフィルタ装置28に送
って濾過し、電磁弁62を開放して清液槽22内の加工
液13を槽外へ排出する。When removing the sludge accumulated at the bottom of the sewage tank 23, the movable partition plate 53 is used as shown in FIG.
It is located at the left end of 3, and the bottom lid 59 is removed. At this time,
When the level of the waste liquid 13a in the waste liquid tank 23 is high, the filtration pump 26 is driven to send the waste liquid 13a to the filter device 28 for filtering, and the electromagnetic valve 62 is opened to open the inside of the clean liquid tank 22. The processing liquid 13 is discharged outside the tank.
【0044】そして、制御器56の指令によりモータ5
1、ねじ棒52を駆動し、図12に示すようにこれに結
合された可動仕切板53を右方に移動させ、汚液槽21
の底部に溜った汚泥を掻いて汚泥槽60内に集積させ
る。この間、汚液13aは濾過ポンプ26によりフィル
タ装置28に送られ、濾過された加工液13は清液槽2
2から電磁弁62を介して排出される。可動仕切板53
が右方に移動してリミットスイッチ57に当接すると、
制御器56の指令によりモータ57が停止し、電磁弁6
2は閉成する。このときの状態を図12に示す。Then, the motor 5 is instructed by the controller 56.
1. The screw rod 52 is driven to move the movable partition plate 53 connected to the screw rod 52 to the right as shown in FIG.
The sludge accumulated at the bottom of the sludge is scraped and accumulated in the sludge tank 60. During this time, the waste liquid 13a is sent to the filter device 28 by the filtration pump 26, and the filtered working liquid 13 is discharged into the clean liquid tank 2
2 is discharged via the solenoid valve 62. Movable partition plate 53
Moves to the right and contacts the limit switch 57,
The motor 57 is stopped by a command from the controller 56, and the solenoid valve 6
2 is closed. The state at this time is shown in FIG.
【0045】ついで、図10に示すように開口部58を
底蓋59で閉鎖し、図13に示すように汚泥槽60を本
体21から取外して中に集積された汚泥を廃棄する。Then, as shown in FIG. 10, the opening 58 is closed by the bottom lid 59, and the sludge tank 60 is removed from the main body 21 as shown in FIG. 13 to discard the sludge accumulated therein.
【0046】以上本発明の実施例について説明したが、
本発明はこれに限定するものではなく、フィルタ装置そ
の他各部の構造は適宜変更することができる。The embodiments of the present invention have been described above.
The present invention is not limited to this, and the structure of the filter device and other parts can be appropriately changed.
【0047】[0047]
【発明の効果】以上の説明から明らかなように、本発明
は、2個以上のフィルタ装置を備え、フィルタ機能が低
下したときは自動的に新らしいフィルタに切換えるよう
にしたので、フィルタ装置の交換に際して放電加工を停
止する必要がなく、長時間の無人運転が可能になり、作
業能率を向上させることができる。また、フィルタ機能
の限界までフィルタ装置を使用できるので、フィルタ装
置の寿命を延長しコストを低減することができる。As is apparent from the above description, the present invention is provided with two or more filter devices, and when the filter function is deteriorated, the filter device is automatically switched to a new filter device. It is not necessary to stop the electric discharge machining at the time of replacement, and unmanned operation for a long time becomes possible, and the work efficiency can be improved. Moreover, since the filter device can be used up to the limit of the filter function, the life of the filter device can be extended and the cost can be reduced.
【0048】また、本発明は汚液の流入口の上方に開口
部を設け、この開口部を着脱可能なキャップ又はシール
材で閉塞し、フィルタ装置を交換する際はキャップを外
し又はシール材を破って空気を流入させ、汚液の流入口
より汚液を排出してフィルタ装置の重量を軽減するよう
にしたので、交換作業が容易になるばかりでなく、運搬
中に突然汚液が排出されて衣服を汚すおそれもない。Further, according to the present invention, an opening is provided above the inflow port of the sewage, and the opening is closed by a removable cap or sealing material. When the filter device is replaced, the cap is removed or the sealing material is removed. The filter is crushed to allow air to flow in, and the wastewater is discharged from the wastewater inlet to reduce the weight of the filter device, which not only facilitates replacement work, but also suddenly discharges wastewater during transportation. There is no risk of soiling your clothes.
【0049】さらに、汚液槽内の汚液が減少したときは
可動仕切板を移動させて汚液槽の容積を縮小し、汚液の
液面を上昇させるようにしたので、濾過ポンプが空転し
て故障を生じるのを防止できる。Further, when the amount of wastewater in the wastewater tank is reduced, the movable partition plate is moved to reduce the volume of the wastewater tank so as to raise the liquid level of the wastewater. Therefore, it is possible to prevent a failure.
【0050】また、汚液槽に開閉可能な底蓋を有する開
口部を設けると共に、この開口部に着脱可能に汚泥槽を
取付けるようにし、可動仕切板を移動させて汚液槽内の
汚液を汚泥槽内に集めるようにしたので、汚泥の除去を
きわめて容易かつ短時間で行なうことができ、メンテナ
ンスコストを低減することができる。Further, an opening having an openable / closable bottom lid is provided in the sewage tank, a sludge tank is detachably attached to the opening, and the movable partition plate is moved to move the sewage in the sewage tank. Since sludge is collected in the sludge tank, sludge can be removed extremely easily and in a short time, and the maintenance cost can be reduced.
【図1】本発明の第1の実施例の構成図である。FIG. 1 is a configuration diagram of a first embodiment of the present invention.
【図2】第1の実施例の作用説明図である。FIG. 2 is an explanatory view of the operation of the first embodiment.
【図3】第1の実施例の作用説明図である。FIG. 3 is an explanatory view of the operation of the first embodiment.
【図4】本発明の第2の実施例の構成図である。FIG. 4 is a configuration diagram of a second embodiment of the present invention.
【図5】第2の実施例の作用説明図である。FIG. 5 is an explanatory view of the operation of the second embodiment.
【図6】本発明の第4の実施例の模式図である。FIG. 6 is a schematic diagram of a fourth embodiment of the present invention.
【図7】本発明の第5の実施例の要部模式図である。FIG. 7 is a schematic view of a main part of a fifth embodiment of the present invention.
【図8】本発明の第6の実施例の模式図である。FIG. 8 is a schematic diagram of a sixth embodiment of the present invention.
【図9】第6の実施例の作用説明図である。FIG. 9 is an operation explanatory view of the sixth embodiment.
【図10】本発明の第7の実施例の模式図である。FIG. 10 is a schematic diagram of the seventh embodiment of the present invention.
【図11】第7の実施例の作用説明図である。FIG. 11 is an explanatory view of the operation of the seventh embodiment.
【図12】第7の実施例の作用説明図である。FIG. 12 is an explanatory view of the operation of the seventh embodiment.
【図13】第7の実施例の作用説明図である。FIG. 13 is an explanatory view of the operation of the seventh embodiment.
【図14】従来のワイヤ放電加工装置の一例の構成図で
ある。FIG. 14 is a configuration diagram of an example of a conventional wire electric discharge machine.
【図15】従来のワイヤ放電加工装置における加工液供
給装置の一例の模式図である。FIG. 15 is a schematic view of an example of a machining fluid supply device in a conventional wire electric discharge machining device.
【図16】従来のワイヤ放電加工装置の他の例の模式図
である。FIG. 16 is a schematic view of another example of the conventional wire electric discharge machine.
1 放電加工機 13 加工液 20 加工液供給装置 22 清液槽 23 汚液槽 25 供給ポンプ 26 濾過ポンプ 27a,27b 取付台 28a,28b フィルタ装置 34a,34b コネクタ 36a,36b カバー 37,54,55 液面検出器 41a,41b,62 電磁弁 42 圧力計 43,56 制御器 45a,45b 流量計 46 開口部 47 キャップ 48 シール材 51 モータ 52 ねじ棒 53 可動仕切板 57 リミットスイッチ 58 開口部 59 底蓋 60 汚泥槽 DESCRIPTION OF SYMBOLS 1 Electric discharge machine 13 Processing liquid 20 Processing liquid supply device 22 Clean liquid tank 23 Soil liquid tank 25 Supply pump 26 Filtration pump 27a, 27b Mounting base 28a, 28b Filter device 34a, 34b Connector 36a, 36b Cover 37, 54, 55 Liquid Surface detector 41a, 41b, 62 Solenoid valve 42 Pressure gauge 43, 56 Controller 45a, 45b Flow meter 46 Opening 47 Cap 48 Seal material 51 Motor 52 Screw rod 53 Movable partition plate 57 Limit switch 58 Opening 59 Bottom lid 60 Sludge tank
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 B23H 7/36 Z 9239−3C (72)発明者 加藤 峰久 名古屋市北区東大曽根町上五丁目1071番地 三菱電機エンジニアリング株式会社名古 屋事業所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Internal reference number FI Technical display location B23H 7/36 Z 9239-3C (72) Inventor Minohisa Kato 5th Kami, Higashioosone-cho, Kita-ku, Nagoya Address 1071 Mitsubishi Electric Engineering Co., Ltd., Nagoya Office
Claims (7)
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、 加工後の加工液を濾過する少なくとも2個のフィルタ装
置と、 前記清液槽内の加工液の液面を検出する液面検出手段
と、 前記濾過ポンプとフィルタ装置間に設けられ、前記液面
検出手段の検出結果に基いて加工液回路を切換える切換
手段とを備えたことを特徴とするワイヤ放電加工装置の
加工液供給装置。1. A processing liquid stored in a clean liquid tank is supplied to a processing part of a workpiece, and the processing liquid in a waste liquid tank storing the processed liquid after processing is sent to a filter device by a filtration pump. In a machining fluid supply device for filtering and storing in the clean fluid tank for reuse, at least two filter devices for filtering the machining fluid after processing and a liquid level of the machining fluid in the clean fluid tank are detected. Machining of a wire electric discharge machine comprising liquid level detection means and switching means provided between the filtration pump and the filter device and switching the machining liquid circuit based on the detection result of the liquid level detection means. Liquid supply device.
濾過されて清液槽に流出する加工液の流量を検出する流
量検出手段を設け、該流量検出手段の検出結果に基いて
加工液回路を切換える切換手段を設けたことを特徴とす
る請求項1記載のワイヤ放電加工装置の加工液供給装
置。2. The liquid level detecting means is replaced by a flow rate detecting means for detecting the flow rate of the working fluid filtered by a filter device and flowing out to the clean liquid tank, and the working fluid is detected based on the detection result of the flow rate detecting means. The machining fluid supply device for a wire electric discharge machine according to claim 1, further comprising switching means for switching circuits.
フィルタ装置へ送られる加工液の圧力を検出す圧力検出
手段を設け、該圧力検出手段の検出結果に基いて加工液
回路を切換える切換手段を設けたことを特徴とする請求
項1記載のワイヤ放電加工装置の加工液供給装置。3. A switch for replacing the liquid level detecting means with a pressure detecting means for detecting the pressure of the working fluid sent from the filtration pump to the filter device, and switching the working fluid circuit based on the detection result of the pressure detecting means. The machining fluid supply device of the wire electric discharge machining apparatus according to claim 1, further comprising means.
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、 前記フィルタ装置の加工液流入口の上方に開口部を設
け、該開口部を着脱可能なキャップ又はシート材で閉塞
したことを特徴とするワイヤ放電加工装置の加工液供給
装置。4. The machining liquid stored in the clean liquid tank is supplied to the processing part of the workpiece, and the machining liquid in the waste liquid tank in which the machining liquid after machining is stored is sent to a filter device by a filtration pump. In a working fluid supply device that is filtered and stored in the clean fluid tank for reuse, an opening is provided above the working fluid inlet of the filter device, and the opening is closed with a removable cap or sheet material. A machining fluid supply device for a wire electric discharge machine.
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、 前記汚液槽内の加工液の少なくとも下限の液面を検出す
る液面検出器と、 前記汚液槽内に配置された可動仕切板と、 前記液面検出器の検出結果に基いて前記可動仕切板を駆
動する駆動手段とを備えたことを特徴とするワイヤ放電
加工装置の加工液供給装置。5. The processing liquid stored in the clean liquid tank is supplied to the processing part of the workpiece, and the processing liquid in the waste liquid tank in which the processed liquid after processing is stored is sent to a filter device by a filtration pump. A processing liquid supply device for filtering and storing in the clean liquid tank for reuse, and a liquid level detector for detecting at least the lower limit liquid level of the processing liquid in the waste liquid tank, and arranged in the waste liquid tank. And a driving means for driving the movable partition plate based on the detection result of the liquid level detector.
加工部に供給し、加工後の加工液が貯蔵された汚液槽内
の加工液を濾過ポンプによりフィルタ装置に送って濾過
し、前記清液槽に貯蔵して再使用する加工液供給装置に
おいて、 前記汚液槽内の加工液の少なくとも下限の液面を検出す
る液面検出器と、 該液面検出器の検出信号を入力する制御器と、 前記汚液槽内に配設された可動仕切板と、 前記制御器からの指令によって前記可動仕切板を駆動す
る駆動手段と、 前記汚液槽の底部に設けた開口部を開閉可能に閉塞する
底蓋と、 前記開口部の外側において汚液槽に着脱可能に取付けら
れる汚泥槽と、 前記清液槽内の加工液を排出する開閉手段とを備えたこ
とを特徴とするワイヤ放電加工装置の加工液供給装置。6. The machining liquid stored in the clean liquid tank is supplied to the processing part of the workpiece, and the machining liquid in the waste liquid tank in which the machining liquid after machining is stored is sent to a filter device by a filtration pump. A processing liquid supply device for filtering and storing in the clean liquid tank for reuse, and a liquid level detector for detecting at least the lower limit liquid level of the processing liquid in the waste liquid tank, and detection by the liquid level detector. A controller for inputting a signal, a movable partition plate arranged in the waste liquid tank, a drive means for driving the movable partition plate according to a command from the controller, and a bottom portion of the waste liquid tank. A bottom lid that opens and closes the opening portion; a sludge tank that is detachably attached to the waste liquid tank outside the opening portion; and an opening and closing unit that discharges the processing liquid in the clean liquid tank. A machining fluid supply device for a characteristic wire electric discharge machine.
段を設けたことを特徴とする請求項5又は6記載のワイ
ヤ放電加工装置の加工液供給装置。7. A machining fluid supply apparatus for a wire electric discharge machining apparatus according to claim 5 or 6, further comprising detection means for detecting a movement limit of the movable partition plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4029594A JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4029594A JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05228735A true JPH05228735A (en) | 1993-09-07 |
JP2754431B2 JP2754431B2 (en) | 1998-05-20 |
Family
ID=12280406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4029594A Expired - Fee Related JP2754431B2 (en) | 1992-02-17 | 1992-02-17 | Machining fluid supply device for wire electric discharge machine |
Country Status (1)
Country | Link |
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JP (1) | JP2754431B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103752964A (en) * | 2013-12-25 | 2014-04-30 | 青岛科技大学 | Treatment and recycling system and method for circulation of electric spark machining working solution |
JP2015077646A (en) * | 2013-10-16 | 2015-04-23 | 株式会社ソディック | Machine tool machining fluid tank |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63107710A (en) * | 1986-10-24 | 1988-05-12 | Asahi Chem Ind Co Ltd | Continuous filter |
JPS63123638A (en) * | 1986-11-13 | 1988-05-27 | Sodeitsuku:Kk | Filter device of electric discharge machine |
JPH0230433A (en) * | 1988-07-21 | 1990-01-31 | Mitsubishi Electric Corp | Wire discharge processing unit |
JPH02152723A (en) * | 1988-12-06 | 1990-06-12 | Shizuoka Seiki Co Ltd | Electrolyte processor for electrolytic finishing machine |
JPH0379045A (en) * | 1989-08-22 | 1991-04-04 | Fujitsu Ltd | Manufacture of resin-sealed semiconductor device |
-
1992
- 1992-02-17 JP JP4029594A patent/JP2754431B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63107710A (en) * | 1986-10-24 | 1988-05-12 | Asahi Chem Ind Co Ltd | Continuous filter |
JPS63123638A (en) * | 1986-11-13 | 1988-05-27 | Sodeitsuku:Kk | Filter device of electric discharge machine |
JPH0230433A (en) * | 1988-07-21 | 1990-01-31 | Mitsubishi Electric Corp | Wire discharge processing unit |
JPH02152723A (en) * | 1988-12-06 | 1990-06-12 | Shizuoka Seiki Co Ltd | Electrolyte processor for electrolytic finishing machine |
JPH0379045A (en) * | 1989-08-22 | 1991-04-04 | Fujitsu Ltd | Manufacture of resin-sealed semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015077646A (en) * | 2013-10-16 | 2015-04-23 | 株式会社ソディック | Machine tool machining fluid tank |
CN103752964A (en) * | 2013-12-25 | 2014-04-30 | 青岛科技大学 | Treatment and recycling system and method for circulation of electric spark machining working solution |
Also Published As
Publication number | Publication date |
---|---|
JP2754431B2 (en) | 1998-05-20 |
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