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JPH05225777A - Semiconductor memory device - Google Patents

Semiconductor memory device

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Publication number
JPH05225777A
JPH05225777A JP4026603A JP2660392A JPH05225777A JP H05225777 A JPH05225777 A JP H05225777A JP 4026603 A JP4026603 A JP 4026603A JP 2660392 A JP2660392 A JP 2660392A JP H05225777 A JPH05225777 A JP H05225777A
Authority
JP
Japan
Prior art keywords
memory cell
monitoring
region
leak current
refresh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4026603A
Other languages
Japanese (ja)
Inventor
Yasushi Kubota
靖 久保田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP4026603A priority Critical patent/JPH05225777A/en
Publication of JPH05225777A publication Critical patent/JPH05225777A/en
Pending legal-status Critical Current

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  • Dram (AREA)

Abstract

PURPOSE:To obtain a leak current having capacity required to monitor refresh- timing with a memory cell MC for monitoring of comparatively few numbers, in a semiconductor memory device which sets refresh-timing of a memory cell for storing information by a refresh control circuit incorporated. CONSTITUTION:This device is provided with a memory cell for storing information (not illustrated) and a memory cell MC for monitoring in the same semiconductor substrate 1, also provided with a detector AMP which detects potential variation by a leak current of a capacitor C composing the memory cell MC for monitoring. The memory cell MC for monitoring is provided in a region 10 in the semiconductor substrate 1 where impurity concentration is higher than that in a region in which the above mentioned memory cell for storing information is provided.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は半導体メモリ装置に関
し、より詳しくは、情報を蓄積電荷として保持するキャ
パシタと上記電荷の出し入れを制御するトランジスタと
からなるメモリセルを有し、かつリフレッシュ回路を内
蔵したダイナミック・ランダム・アクセス・メモリ(疑
似SRAM)に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory device, and more particularly to a semiconductor memory device having a memory cell comprising a capacitor for holding information as accumulated charge and a transistor for controlling the transfer of the charge and having a built-in refresh circuit. Dynamic random access memory (pseudo SRAM).

【0002】[0002]

【従来の技術】一般に、リフレッシュ回路を内蔵したダ
イナミック・ランダム・アクセス・メモリ(疑似SRA
M)のリフレッシュ・タイミングは、予め評価されたメ
モリセルのリーク電流に基づいて、ある固定された時間
間隔に設計段階で決められている。すなわち、チップ完
成後のリーク電流の温度依存性と作製プロセスの変動
(最悪条件)とを考慮して設定されている。このため、実
際に必要なリフレッシュ間隔よりも極めて短い時間間隔
が設定されており、この結果、スタンバイ電流を低減で
きないという問題があった。
2. Description of the Related Art Generally, a dynamic random access memory (pseudo SRA) having a built-in refresh circuit is used.
The refresh timing of M) is determined at a fixed time interval at the design stage based on the leakage current of the memory cell evaluated in advance. That is, the temperature dependence of the leakage current after the completion of the chip and the fluctuation of the manufacturing process.
It is set in consideration of (the worst condition). For this reason, the time interval is set to be extremely shorter than the actually required refresh interval, and as a result, there is a problem that the standby current cannot be reduced.

【0003】そこで、最近、チップ毎のリーク電流の実
力値に応じてリフレッシュ・タイミングを与える方式が
提案されている(IEEE(米国電気電子学会)ISSC
C(インターナショナル・ソリッドステート・サーキッ
ト・コンファレンス)1991,p268)。この方式で
は、図3に示すように、1チップ(半導体基板1)内のメ
モリセルMC(キャパシタCを含む)のうち1024個を
モニタ用として並列接続し、各モニタ用メモリセルMC
とプリチャージ用トランジスタTRPCとの接続点の電
位を差動増幅器AMPに入力している。そして、差動増
幅器AMPによって、参照電位Vrefとの差、すなわち
リーク電流による蓄積電極SEの電位変動を検出し、リ
フレッシュ制御回路100によってリフレッシュ・タイ
ミングを決定する。これにより、プロセス変動によるリ
ーク電流のばらつきに応じて、リフレッシュ制御回路1
00によってチップ毎にリフレッシュ・タイミングを決
めることができ、また、使用時の温度環境に応じてリフ
レッシュ・タイミングを決めることができる。
Therefore, recently, a method has been proposed in which refresh timing is given according to the actual value of the leak current for each chip (IEEE (Institute of Electrical and Electronics Engineers) ISSC).
C (International Solid State Circuit Conference) 1991, p268). In this method, as shown in FIG. 3, 1024 of the memory cells MC (including the capacitor C) in one chip (semiconductor substrate 1) are connected in parallel for monitoring, and each memory cell MC for monitoring is connected.
And the potential at the connection point between the precharge transistor TRPC and the precharge transistor TRPC is input to the differential amplifier AMP. Then, the differential amplifier AMP detects the difference from the reference potential Vref, that is, the potential fluctuation of the storage electrode SE due to the leak current, and the refresh control circuit 100 determines the refresh timing. As a result, the refresh control circuit 1 responds to variations in the leak current due to process variations.
00, the refresh timing can be determined for each chip, and the refresh timing can be determined according to the temperature environment during use.

【0004】[0004]

【発明が解決しようとする課題】ところで、図3に示し
た方式において、モニタ用として1024個のメモリセ
ルMCを並列接続している理由は、差動増幅器AMPの
感度に合わせて、ある程度の大きさのリーク電流を得な
ければならないからである。このため、上記方式では、
チップ内でモニタ用メモリセルMCが占める領域が大き
いという問題がある。
By the way, in the system shown in FIG. 3, the reason for connecting 1024 memory cells MC for monitoring in parallel is to some extent in accordance with the sensitivity of the differential amplifier AMP. This is because the leak current must be obtained. Therefore, in the above method,
There is a problem that the area occupied by the monitor memory cell MC in the chip is large.

【0005】そこで、この発明の目的は、比較的少ない
数のモニタ用メモリセルでもって、モニタに必要な大き
さのリーク電流を得ることができる半導体メモリ装置を
提供することにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a semiconductor memory device capable of obtaining a leak current of a magnitude necessary for monitoring with a relatively small number of monitor memory cells.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、この発明の半導体メモリ装置は、電荷を保持するキ
ャパシタと上記電荷の出し入れを制御するトランジスタ
からなる情報記憶用メモリセルおよびモニタ用メモリセ
ルを同一半導体基板内に有するとともに、上記モニタ用
メモリセルを構成するキャパシタのリーク電流による電
位変化を検出する検出器と、上記検出器の出力に基づい
てリフレッシュ・タイミングを設定して上記情報記憶用
メモリセルのリフレッシュを行うリフレッシュ制御回路
を有する半導体メモリ装置において、上記モニタ用メモ
リセルは、上記半導体基板内で上記情報記憶用メモリセ
ルが設けられている領域よりも不純物濃度が高い領域に
設けられていることを特徴としている。
In order to achieve the above object, a semiconductor memory device of the present invention has an information storage memory cell and a monitor memory cell each comprising a capacitor for holding electric charge and a transistor for controlling the transfer of electric charge. And a detector for detecting a potential change due to a leak current of a capacitor that constitutes the monitoring memory cell, and a refresh timing is set based on the output of the detector for storing the information. In a semiconductor memory device having a refresh control circuit for refreshing memory cells, the monitor memory cell is provided in a region of the semiconductor substrate having a higher impurity concentration than a region in which the information storage memory cell is provided. It is characterized by

【0007】[0007]

【作用】モニタ用メモリセルは、情報記憶用メモリセル
が設けられている領域よりも不純物濃度が高い領域に設
けられている。これにより、モニタ用メモリセルを構成
するトランジスタの接合部で空乏層幅が狭くなって電界
が増大して、上記接合部のリーク電流が情報記憶用メモ
リセルのものに比して大幅に増加する(図2に例示する
ように、基板側の不純物濃度Nsubが1桁増加すると、
接合部のリーク電流Iも1桁程度増加する。)。したが
って、比較的少ない数のモニタ用メモリセルでもって、
モニタに必要な大きさのリーク電流が得られるようにな
る。
The monitor memory cell is provided in a region having a higher impurity concentration than the region in which the information storage memory cell is provided. As a result, the depletion layer width is narrowed at the junction of the transistors forming the monitor memory cell and the electric field is increased, and the leakage current at the junction is significantly increased as compared with that of the information storage memory cell. (As illustrated in FIG. 2, if the impurity concentration Nsub on the substrate side increases by one digit,
The leak current I at the junction also increases by about one digit. ). Therefore, with a relatively small number of monitor memory cells,
The leak current of the magnitude required for the monitor can be obtained.

【0008】[0008]

【実施例】以下、この発明の半導体メモリ装置を図示の
実施例により詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The semiconductor memory device of the present invention will be described in detail below with reference to the embodiments shown in the drawings.

【0009】図1に示すように、この半導体メモリ装置
は、情報記憶用のメモリセル(図示せず)と、並列接続さ
れた複数のモニタ用メモリセルMCとを、同一半導体基
板1内に備えている。モニタ用メモリセルMCは、少な
くとも蓄積電極SEと共通電極PLとで電荷を保持する
キャパシタCとからなっている。モニタ用メモリセルM
Cは、基板1内で上記情報記憶用メモリセルが設けられ
ている領域よりも不純物濃度が高い領域10に設けられ
ている。各モニタ用メモリセルMCとプリチャージ用ト
ランジスタTRPCとの接続点は、差動増幅器AMPの
一方の入力端子(−)に接続されている。差動増幅器AM
Pの他方の入力端子(+)には所定の参照電位Vrefが供
給されている。動作時には、制御信号φpによってプリ
チャージ用トランジスタTRPCを一時的にオンして、
蓄積電極SE側に電源電位Vccを与える。一方、共通電
極PL側をプリチャージ電位HVcc(=Vcc/2)に保
つ。この状態で、差動増幅器AMPによって、並列接続
された蓄積電極SEの電位と参照電位Vrefとの差、す
なわちリーク電流による蓄積電極SEの電位変動を検出
する。そして、この電位変動に基づいてリフレッシュ制
御回路100によってリフレッシュ・タイミングを決定
する。これにより、プロセス変動によるリーク電流のば
らつきに応じて、リフレッシュ制御回路100によって
チップ毎にリフレッシュ・タイミングを決めることがで
き、また、使用時の温度環境に応じてリフレッシュ・タ
イミングを決めることができる。
As shown in FIG. 1, this semiconductor memory device is provided with a memory cell (not shown) for storing information and a plurality of monitor memory cells MC connected in parallel in the same semiconductor substrate 1. ing. The monitor memory cell MC includes at least a storage electrode SE and a common electrode PL, and a capacitor C that holds electric charges. Monitor memory cell M
C is provided in a region 10 of the substrate 1 having a higher impurity concentration than the region in which the information storage memory cell is provided. A connection point between each monitor memory cell MC and the precharge transistor TRPC is connected to one input terminal (−) of the differential amplifier AMP. Differential amplifier AM
A predetermined reference potential Vref is supplied to the other input terminal (+) of P. During operation, the control signal φp temporarily turns on the precharge transistor TRPC,
A power supply potential Vcc is applied to the storage electrode SE side. On the other hand, the common electrode PL side is kept at the precharge potential HVcc (= Vcc / 2). In this state, the differential amplifier AMP detects the difference between the potential of the storage electrodes SE connected in parallel and the reference potential Vref, that is, the potential fluctuation of the storage electrodes SE due to the leak current. Then, the refresh timing is determined by the refresh control circuit 100 based on this potential fluctuation. Thus, the refresh timing can be determined for each chip by the refresh control circuit 100 according to the variation of the leak current due to the process variation, and the refresh timing can be determined according to the temperature environment during use.

【0010】ここで、上記モニタ用メモリセルMCは、
情報記憶用メモリセルが設けられている領域よりも不純
物濃度が高い領域10に設けられている。この結果、モ
ニタ用メモリセルをMCを構成するトランジスタの接合
部におけるリーク電流は、情報記憶用メモリセルのもの
に比して大幅に増加する。図2に例示したように、接合
部におけるリーク電流Iは上記領域10の不純物濃度N
subの増大に伴って増加するが、この不純物濃度Nsubは
実際レベルでは他の領域に対して1桁〜1.5桁増加で
きることから、上記リーク電流Iを1桁〜1.5桁増加
させることができる。したがって、比較的少ない数のモ
ニタ用メモリセルでもって、モニタに必要な大きさのリ
ーク電流を得ることができる。
Here, the monitor memory cell MC is
It is provided in the region 10 having a higher impurity concentration than the region in which the memory cell for storing information is provided. As a result, the leak current at the junction of the transistors forming the monitor memory cell MC is significantly increased as compared with that of the information storage memory cell. As illustrated in FIG. 2, the leakage current I at the junction is determined by the impurity concentration N of the region 10.
Although it increases with increasing sub, the impurity concentration Nsub can be increased by one digit to 1.5 digits compared to other regions at the actual level. Therefore, the leakage current I should be increased by one digit to 1.5 digits. You can Therefore, with a relatively small number of monitor memory cells, it is possible to obtain a leak current of a magnitude required for monitoring.

【0011】[0011]

【発明の効果】以上より明らかなように、この発明の半
導体メモリ装置は、情報記憶用メモリセルが設けられて
いる領域よりも不純物濃度が高い領域にモニタ用メモリ
セルを設けているので、モニタ用メモリセルを構成する
トランジスタの接合部のリーク電流を大きくできる。し
たがって、比較的少ない数のモニタ用メモリセルでもっ
て、モニタに必要な大きさのリーク電流を得ることがで
きる。
As is apparent from the above, in the semiconductor memory device of the present invention, the monitor memory cell is provided in the region having a higher impurity concentration than the region in which the information storage memory cell is provided. It is possible to increase the leak current at the junction of the transistors that form the memory cell for use. Therefore, with a relatively small number of monitor memory cells, it is possible to obtain a leak current of a magnitude required for monitoring.

【図面の簡単な説明】[Brief description of drawings]

【図1】 この発明の一実施例の半導体メモリ装置を示
す図である。
FIG. 1 is a diagram showing a semiconductor memory device according to an embodiment of the present invention.

【図2】 基板側の不純物濃度と接合部のリーク電流と
の関係を示す図である。
FIG. 2 is a diagram showing a relationship between an impurity concentration on a substrate side and a leak current at a junction.

【図3】 従来の半導体メモリ装置を示す図である。FIG. 3 is a diagram showing a conventional semiconductor memory device.

【符号の説明】[Explanation of symbols]

1 半導体基板 10 不純物濃度が高い領域 100 リフレッシュ制御回路 AMP 差動増幅器 C キャパシタ MC メモリセル PL 共通電極 SE 蓄積電極 TRPC プリチャージ用トランジスタ 1 semiconductor substrate 10 high impurity concentration region 100 refresh control circuit AMP differential amplifier C capacitor MC memory cell PL common electrode SE storage electrode TRPC precharge transistor

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電荷を保持するキャパシタと上記電荷の
出し入れを制御するトランジスタからなる情報記憶用メ
モリセルおよびモニタ用メモリセルを同一半導体基板内
に有するとともに、上記モニタ用メモリセルを構成する
キャパシタのリーク電流による電位変化を検出する検出
器と、上記検出器の出力に基づいてリフレッシュ・タイ
ミングを設定して上記情報記憶用メモリセルのリフレッ
シュを行うリフレッシュ制御回路を有する半導体メモリ
装置において、 上記モニタ用メモリセルは、上記半導体基板内で上記情
報記憶用メモリセルが設けられている領域よりも不純物
濃度が高い領域に設けられていることを特徴とする半導
体メモリ装置。
1. A memory cell for information storage and a memory cell for monitoring which are composed of a capacitor for holding electric charge and a transistor for controlling the input / output of the electric charge are provided in the same semiconductor substrate, and a capacitor for the memory cell for monitoring is formed. A semiconductor memory device having a detector for detecting a potential change due to a leak current and a refresh control circuit for refreshing the information storage memory cell by setting refresh timing based on the output of the detector, comprising: A semiconductor memory device, wherein the memory cell is provided in a region of the semiconductor substrate having a higher impurity concentration than a region in which the information storage memory cell is provided.
JP4026603A 1992-02-13 1992-02-13 Semiconductor memory device Pending JPH05225777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4026603A JPH05225777A (en) 1992-02-13 1992-02-13 Semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4026603A JPH05225777A (en) 1992-02-13 1992-02-13 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPH05225777A true JPH05225777A (en) 1993-09-03

Family

ID=12198094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4026603A Pending JPH05225777A (en) 1992-02-13 1992-02-13 Semiconductor memory device

Country Status (1)

Country Link
JP (1) JPH05225777A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180491A (en) * 1995-12-27 1997-07-11 Lg Semicon Co Ltd Sensing circuit for leak voltage of mos capacitor
US5652729A (en) * 1995-02-08 1997-07-29 Matsushita Electric Industrial Co., Ltd. Semiconductor integrated circuit apparatus and method of adjusting refresh timer cycle
US5761143A (en) * 1996-12-19 1998-06-02 Mitsubishi Denki Kabushiki Kaisha Using an output of a leak detector which detects leakage from a dummy memory cell to control a subtrate voltage in a semi conductor memory device
KR100641912B1 (en) * 1998-12-24 2007-07-12 주식회사 하이닉스반도체 Cell Leakage Current Detector

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652729A (en) * 1995-02-08 1997-07-29 Matsushita Electric Industrial Co., Ltd. Semiconductor integrated circuit apparatus and method of adjusting refresh timer cycle
JPH09180491A (en) * 1995-12-27 1997-07-11 Lg Semicon Co Ltd Sensing circuit for leak voltage of mos capacitor
US5761143A (en) * 1996-12-19 1998-06-02 Mitsubishi Denki Kabushiki Kaisha Using an output of a leak detector which detects leakage from a dummy memory cell to control a subtrate voltage in a semi conductor memory device
KR100641912B1 (en) * 1998-12-24 2007-07-12 주식회사 하이닉스반도체 Cell Leakage Current Detector

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