JPH05183020A - Manufacture of tab lead type semiconductor device - Google Patents
Manufacture of tab lead type semiconductor deviceInfo
- Publication number
- JPH05183020A JPH05183020A JP3345764A JP34576491A JPH05183020A JP H05183020 A JPH05183020 A JP H05183020A JP 3345764 A JP3345764 A JP 3345764A JP 34576491 A JP34576491 A JP 34576491A JP H05183020 A JPH05183020 A JP H05183020A
- Authority
- JP
- Japan
- Prior art keywords
- inner leads
- bonding
- hole
- under pressure
- thermocompression
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000008188 pellet Substances 0.000 claims abstract description 16
- 238000009826 distribution Methods 0.000 claims abstract description 12
- 238000006073 displacement reaction Methods 0.000 abstract description 3
- 239000011295 pitch Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 5
- 238000002788 crimping Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/50—Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、バンプ電極とインナリ
ードとの熱圧着時に、バンプ電極とインナリードとの位
置ずれを防止し得るTABリード型半導体装置の製造方
法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a TAB lead type semiconductor device capable of preventing the bump electrode and the inner lead from being displaced during thermocompression bonding of the bump electrode and the inner lead.
【0002】[0002]
【従来の技術】TABリード型半導体装置は、図3及び
図4に示すように、絶縁性フィルムからなる枠状フィル
ム(1)に穿設した透孔(2)内に半導体ペレット
(3)を配置して構成する。上記半導体ペレット(3)
は、盛り上げメッキ等で表面の各側辺(4a)(4b)
(4c)(4d)に複数個形成したバンプ電極(5)
を、導電パターン(図示省略)を延在させてなる複数の
インナリード(6)と熱圧着することによって、透孔
(2)内に支持されている。2. Description of the Related Art As shown in FIGS. 3 and 4, a TAB lead type semiconductor device has a semiconductor pellet (3) in a through hole (2) formed in a frame-shaped film (1) made of an insulating film. Arrange and configure. The above semiconductor pellet (3)
Is the side edges (4a) (4b) of the surface due to raised plating, etc.
(4c) A plurality of bump electrodes (5) formed on (4d)
Is thermocompression-bonded to a plurality of inner leads (6) formed by extending conductive patterns (not shown), thereby being supported in the through holes (2).
【0003】上記構成からなるTABリード型半導体装
置のバンプ電極(5)とインナリード(6)の熱圧着
は、従来、図4に示す要領で行なわれている。先ず、透
孔(2)を設けた枠状フィルム(1)を所定位置に搬送
した上で、透孔(2)内の規定位置に半導体ペレット
(3)を配置する。しかる後、半導体ペレット(3)を
下方から支持部材(7)で支持しながら平面状の底面を
有するボンディングツール(8)を降下させ、インナリ
ード(6)をバンプ電極(5)に押付けて熱圧着する。
1箇所のインナリード(6)とバンプ電極(5)との熱
圧着が終わると、ボンディングツール(8)を時計回り
方向に移動させて、順次隣接するインナリード(6)の
上方に移送し、同様にして個々のインナリード(6)と
対応するバンプ電極(5)とを熱圧着する。Conventionally, the thermocompression bonding of the bump electrode (5) and the inner lead (6) of the TAB lead type semiconductor device having the above-mentioned structure has been carried out as shown in FIG. First, the frame-shaped film (1) provided with the through holes (2) is conveyed to a predetermined position, and then the semiconductor pellets (3) are arranged at the specified positions in the through holes (2). Then, the semiconductor pellet (3) is supported from below by the supporting member (7), the bonding tool (8) having a planar bottom surface is lowered, and the inner lead (6) is pressed against the bump electrode (5) to generate heat. Crimp.
When the thermocompression bonding of the inner lead (6) and the bump electrode (5) at one place is completed, the bonding tool (8) is moved in the clockwise direction and sequentially transferred to the upper side of the adjacent inner lead (6), Similarly, the individual inner leads (6) and the corresponding bump electrodes (5) are thermocompression bonded.
【0004】[0004]
【発明が解決しようとする課題】従来、ボンディングツ
ール(8)を時計回り方向に移動させ、順次隣接するイ
ンナリード(6)とバンプ電極(5)とを1箇所ずつ熱
圧着するので、インナリード(6)の最初の熱圧着と最
後の熱圧着との間に大きな時間差が生じる。このため熱
圧着により生じた熱がインナリード(6)を介して枠状
フィルム(1)に伝導すると、透孔(2)の開口縁
(9)が、局部的に高温となって温度分布が不均一とな
り、熱歪み、反り等が生じ、この開口縁(9)の熱歪
み、反り等によりインナリード(6)が規定位置から位
置ずれし、バンプ電極(5)の真上に位置しなくなる場
合があった。このようにインナリード(6)が位置ずれ
した状態でバンプ電極に熱圧着されると、圧着が不完全
となって接続不良になる虞があり、製品の歩留まりがき
わめて悪くなる。特に、近年の半導体装置の小型化ある
いは高密度化に伴うリード間ピッチ及びリード幅の狭小
傾向下においては、インナリードの僅かな位置ずれでも
上記不具合が生じ、製品の信頼性及び生産性が低下す
る。Conventionally, since the bonding tool (8) is moved in the clockwise direction and the inner lead (6) and the bump electrode (5) which are adjacent to each other are thermocompression-bonded one by one, the inner lead. A large time difference occurs between the first thermocompression bonding and the last thermocompression bonding in (6). Therefore, when the heat generated by the thermocompression bonding is conducted to the frame-shaped film (1) through the inner leads (6), the opening edge (9) of the through hole (2) locally becomes high in temperature and the temperature distribution becomes Non-uniformity causes thermal distortion, warpage, etc. Due to the thermal distortion, warpage, etc. of the opening edge (9), the inner lead (6) is displaced from the specified position and is no longer positioned directly above the bump electrode (5). There were cases. If the inner leads (6) are thermo-compression-bonded to the bump electrodes in such a position-shifted state, the pressure-bonding may be incomplete and the connection may be defective, resulting in extremely low product yield. In particular, under the tendency of narrowing the lead pitch and the lead width due to the recent miniaturization or high density of semiconductor devices, even the slight displacement of the inner leads causes the above-mentioned problems, and the product reliability and the productivity are deteriorated. To do.
【0005】本発明は、上記問題点に鑑み提案されたも
ので、インナリードの幅及びリード間ピッチが小さい場
合でも、バンプ電極とインナリードとを位置ずれするこ
となく確実に熱圧着することのできるTABリード型半
導体装置の製造方法を提供することを目的としている。The present invention has been proposed in view of the above problems, and it is possible to reliably perform thermocompression bonding between the bump electrode and the inner lead without displacement even when the width of the inner lead and the pitch between the leads are small. An object of the present invention is to provide a method of manufacturing a TAB lead type semiconductor device that can be manufactured.
【0006】[0006]
【課題を解決するための手段】本発明は、上記目的を達
成するため、絶縁フィルムに穿設した透孔内に導電パタ
ーンを延在させて形成した複数のインナリードと、上記
透孔内に配置した半導体ペレットの複数のバンプ電極と
を重合配置し、重合部分を順次ボンディングツールで熱
圧着するに際し、熱圧着時における絶縁フィルムの透孔
開口縁の温度分布が略均一となるように、ボンディング
順序を設定するようにしたものである。In order to achieve the above object, the present invention provides a plurality of inner leads formed by extending a conductive pattern in a through hole formed in an insulating film, and a plurality of inner leads in the through hole. When a plurality of bump electrodes of the placed semiconductor pellets are superposed and arranged, and the superposed portions are sequentially thermocompression bonded with a bonding tool, bonding is performed so that the temperature distribution of the opening edge of the through hole of the insulating film during thermocompression bonding becomes substantially uniform. The order is set.
【0007】[0007]
【作用】半導体ペレットのバンプ電極とインナリード延
在端部とを熱圧着すると、インナリードを介して絶縁フ
ィルムの透孔開口縁に熱伝導するが、複数個所のバンプ
電極とインナリード延在端部とは、熱圧着時における絶
縁フィルムの透孔開口縁の温度分布が均一となるよう
に、任意の順序で熱圧着されるので、絶縁フィルムの透
孔開口縁が、熱によって歪んだり、反ったりするのを防
止することが可能となる。When the bump electrode of the semiconductor pellet and the inner lead extension end are thermocompression bonded, heat is conducted to the through hole opening edge of the insulating film through the inner lead. The parts are thermocompressed in any order so that the temperature distribution of the openings of the insulating film during thermocompression bonding becomes uniform, so the openings of the insulating film are warped or warped by heat. It is possible to prevent the occurrence.
【0008】[0008]
【実施例】以下本発明の実施例を図1及び図2を参照し
ながら説明すると次の通りである。尚、図3及び図4に
示したものと同一物には同一符号を付して説明を省略す
る。Embodiments of the present invention will be described below with reference to FIGS. 1 and 2. The same components as those shown in FIGS. 3 and 4 are designated by the same reference numerals and the description thereof will be omitted.
【0009】本発明方法の特徴は、上記枠状フィルム
(1)の透孔(2)内に配置した半導体ペレット(3)
の複数のバンプ電極(5)と、枠状フィルム(1)に形
成された複数のインナリード(6)の延在端部とを1箇
所ずつボンディングツール(8)で順次熱圧着するに際
し、熱圧着時における枠状フィルム(1)の透孔(2)
の開口縁(9)の温度分布が均一となるように、複数箇
所のバンプ電極(5)とインナリード(6)の延在端部
とを任意の順序で熱圧着するようにしたことである。The method of the present invention is characterized in that the semiconductor pellet (3) arranged in the through hole (2) of the frame-shaped film (1).
When the plurality of bump electrodes (5) and the extended ends of the plurality of inner leads (6) formed on the frame-shaped film (1) are sequentially thermocompression bonded by the bonding tool (8) one by one, Through holes (2) of the frame-shaped film (1) during pressure bonding
The bump electrodes (5) and the extended ends of the inner leads (6) are thermocompression-bonded in any order so that the temperature distribution of the opening edge (9) becomes uniform. ..
【0010】上記バンプ電極(5)とインナリード
(6)との熱圧着の順序の一例を図1に示す。先ず、半
導体ペレット(3)の第1の側辺(4a)の図1におけ
る下方のコーナ部分(11)近傍の隣接するインナリー
ド(6a)(6b)をバンプ電極(5)に熱圧着したの
ち、このインナリード(6a)(6b)との点対称位置
に位置する第3の側辺(4c)の上方のコーナ部分(1
3)近傍の隣接するインナリード(6c)(6d)を順
次熱圧着する。しかる後、第2の側辺(4b)の左側の
コーナ部分(12)近傍の隣接するインナリード(6
e)(6f)をバンプ電極(5)に夫々熱圧着したの
ち、インナリード(6e)(6f)との点対称位置に位
置する第4の側辺(4d)の右側のコーナ部分(14)
近傍に位置するインナリード(6g)(6h)を熱圧着
する。同じ要領で半導体ペレット(3)の各側辺(4
a)(4c)(4b)(4d)の他方のコーナ部分(1
4)(12)(11)(13)のインナリード(6i)
〜(6p)を熱圧着したのち、各側辺の残りの未圧着の
インナリード(6)を順次熱圧着する。このような要領
でインナリードを熱圧着すると、最初に、半導体ペレッ
ト(3)の各側辺(4a)〜(4d)の両側コーナ部分
(11)〜(14)近傍のインナリード(6a)〜(6
p)が、極めて小さい時間差で熱圧着されるので、この
熱圧着により生じた熱がインナリードを介して枠状フィ
ルム(1)の透孔(2)の開口縁(9)に熱伝導して
も、開口縁(9)の各辺は略均等に加熱され、局部的に
高温となることがなく、温度分布が均一となる。したが
って、枠状フィルム(1)の透孔(2)の開口縁(9)
が熱によって歪んで、反ったりすることがなく、すべて
のインナリード(6)(6a)〜(6p)は、規定位置
から位置ずれすることなく、バンプ電極(5)の真上に
確実に位置する。FIG. 1 shows an example of the sequence of thermocompression bonding of the bump electrode (5) and the inner lead (6). First, adjacent inner leads (6a) (6b) near the lower corner portion (11) of FIG. 1 on the first side (4a) of the semiconductor pellet (3) are thermocompression bonded to the bump electrodes (5). , A corner portion (1) above the third side (4c) located at a point symmetrical position with the inner leads (6a) (6b).
3) The adjacent inner leads (6c) (6d) in the vicinity are thermocompression-bonded in sequence. Then, the adjacent inner leads (6) near the corner portion (12) on the left side of the second side (4b).
e) (6f) is thermocompression-bonded to the bump electrodes (5), respectively, and then the corner portion (14) on the right side of the fourth side (4d) located at a point symmetrical position with the inner leads (6e) (6f).
The inner leads (6g) (6h) located in the vicinity are thermocompression bonded. In the same manner, each side of the semiconductor pellet (3) (4
a) (4c) (4b) (4d) the other corner portion (1
4) Inner leads (6i) of (12) (11) (13)
(6p) are thermocompression bonded, and then the remaining uncompressed inner leads (6) on each side are sequentially thermocompression bonded. When the inner leads are thermocompression-bonded in such a manner, first, the inner leads (6a) to (4a) to (14d) in the vicinity of the both side portions (4a) to (4d) of the semiconductor pellet (3) are first. (6
Since p) is thermocompression bonded with an extremely small time difference, the heat generated by this thermocompression is conducted to the opening edge (9) of the through hole (2) of the frame-shaped film (1) via the inner leads. However, each side of the opening edge (9) is heated substantially evenly, and the temperature does not rise locally, and the temperature distribution becomes uniform. Therefore, the opening edge (9) of the through hole (2) of the frame-shaped film (1).
Is not distorted by heat and does not warp, and all the inner leads (6) (6a) to (6p) are securely positioned right above the bump electrode (5) without being displaced from the specified position. To do.
【0011】また、次のような要領でバンプ電極(5)
とインナリード(6)とを熱圧着してもよい。即ち、図
2に示すように、半導体ペレット(3)の第1乃至第4
の各側辺(4a)〜(4d)を3つのブロック(a)
(b)(c)に夫々分割し、第1の側辺(4a)の図2
における下方のコーナ部分(11)近傍の第1のブロッ
ク(a)に位置する隣接したインナリード(6)を順次
熱圧着したのち、上方のコーナ部分(14)近傍の第2
のブロック(b)の隣接したインナリード(6)を熱圧
着し、しかる後、中間部の第3のブロック(c)の隣接
したインナリード(6)を熱圧着する。このように半導
体ペレット(3)の第1の側辺(4a)のすべてのイン
ナリード(6)の熱圧着が終了すると、第3の側辺(4
c)、第2の側辺(4b)及び第4の側辺(4d)の各
ブロック(a)〜(c)のインナリード(6)を上記と
同じ要領で熱圧着する。この様に各側辺(4a)〜(4
d)のブロック(a)〜(c)毎にインナリード(6)
を熱圧着すると、この熱圧着によりインナリード(6)
を介して枠状フィルム(1)の開口縁(9)に熱伝導し
た場合、開口縁(9)の各辺は略均等に加熱され、温度
分布が均一となる。In addition, the bump electrode (5) is formed in the following manner.
The inner lead (6) and the inner lead (6) may be thermocompression bonded. That is, as shown in FIG. 2, the first to fourth semiconductor pellets (3) are
Each side (4a) to (4d) of the three blocks (a)
(B) and (c) are respectively divided into the first side (4a) of FIG.
The adjacent inner leads (6) located in the first block (a) in the vicinity of the lower corner portion (11) are sequentially thermocompressed, and then in the second corner in the vicinity of the upper corner portion (14).
The adjacent inner leads (6) of the block (b) are thermocompression bonded, and then the adjacent inner leads (6) of the third block (c) in the intermediate portion are thermocompression bonded. When the thermocompression bonding of all the inner leads (6) of the first side (4a) of the semiconductor pellet (3) is completed in this way, the third side (4)
c), the inner leads (6) of the blocks (a) to (c) of the second side (4b) and the fourth side (4d) are thermocompression bonded in the same manner as above. In this way, each side (4a) to (4
Inner lead (6) for each of blocks (a) to (c) in d)
When thermocompression bonding is performed, the inner leads (6) are
When the heat is conducted to the opening edge (9) of the frame-shaped film (1) through, the respective sides of the opening edge (9) are heated substantially uniformly, and the temperature distribution becomes uniform.
【0012】また、上記バンプ電極(5)とインナリー
ド(6)の熱圧着の順序は、上記の例に限定されるわけ
ではなく、上述の通り、熱圧着時における枠状フィルム
(1)の透孔開口縁(9)の温度分布が均一となるよう
に、複数箇所のバンプ電極(5)とインナリード(6)
の延在端部とを任意の順序で熱圧着すればよく、例え
ば、ボンディングツール(8)を時計回り方向に移動さ
せて、インナリード(6)を一つ置き、あるいは二つ置
き等で熱圧着した後、残りのインナリード(6)を熱圧
着してもよい。このように一つ置き、あるいは二つ置き
等でインナリード(6)を熱圧着すると、ボンディング
ツール(8)が1周する時間が非常に短くなるので、枠
状フィルム(1)の開口縁(9)はインナリード(6)
を介して略均等に加熱され、局部的に高温となることが
なく、温度分布が均一になる。Further, the order of thermocompression bonding of the bump electrode (5) and the inner lead (6) is not limited to the above example, and as described above, the frame-shaped film (1) during thermocompression bonding is used. The bump electrodes (5) and the inner leads (6) at a plurality of locations so that the temperature distribution of the opening edge (9) of the through hole becomes uniform.
The extension ends of the can be thermocompression bonded in any order. For example, by moving the bonding tool (8) in the clockwise direction, one inner lead (6) is placed, or two inner leads (6) are placed. After crimping, the remaining inner leads (6) may be thermocompressed. When the inner leads (6) are thermocompression-bonded by placing one or two in this way, the time for the bonding tool (8) to make one turn becomes very short, so that the opening edge of the frame-shaped film (1) ( 9) is the inner lead (6)
Is heated substantially evenly through the, so that the temperature does not rise locally and the temperature distribution becomes uniform.
【0013】[0013]
【発明の効果】本発明方法によれば、複数個所のバンプ
電極とインナリード延在端部とは、熱圧着時における絶
縁フィルムの透孔開口縁の温度分布が均一となるよう
に、任意の順序で熱圧着されるので、絶縁フィルムの透
孔開口縁が、熱によって歪んだり、反ったりするのを確
実に防止することが可能となる。したがって、インナリ
ードの熱圧着時、インナリードの幅及びリード間ピッチ
が小さい場合であっても、インナリードが規定位置から
位置ずれすることがなく、常にバンプ電極の真上に位置
させることができ、熱圧着が完全に行なわれて、製品の
歩留まりが良好となり、製品の信頼性及び生産性が向上
する。According to the method of the present invention, the bump electrodes and the inner lead extending end portions at a plurality of positions are arbitrarily arranged so that the temperature distribution at the opening edge of the through hole of the insulating film during thermocompression bonding becomes uniform. Since thermocompression bonding is performed in order, it is possible to reliably prevent the opening edge of the through hole of the insulating film from being distorted or warped by heat. Therefore, during thermocompression bonding of the inner leads, even if the width and the pitch between the leads are small, the inner leads do not shift from the specified position and can always be positioned directly above the bump electrodes. The thermocompression bonding is completely performed, the product yield is improved, and the product reliability and productivity are improved.
【図1】本発明方法によるインナリードの熱圧着要領を
示す説明図。FIG. 1 is an explanatory view showing a thermocompression bonding procedure of an inner lead according to the method of the present invention.
【図2】インナリードの他の熱圧着要領を示す説明図。FIG. 2 is an explanatory view showing another thermocompression bonding method of the inner lead.
【図3】(a)はTABリード型半導体装置の平面図、
(b)は側断面図。FIG. 3A is a plan view of a TAB lead-type semiconductor device,
(B) is a side sectional view.
【図4】一般的なインナボンディング装置を示す側断面
図。FIG. 4 is a side sectional view showing a general inner bonding apparatus.
1 絶縁フィルム 2 透孔 3 半導体ペレ
ット 5 バンプ電極 6、6a〜6p イン
ナリード 8 ボンディングツール1 Insulating Film 2 Through Hole 3 Semiconductor Pellet 5 Bump Electrode 6, 6a-6p Inner Lead 8 Bonding Tool
Claims (1)
ターンを延在させて形成した複数のインナリードと、上
記透孔内に配置した半導体ペレットの複数のバンプ電極
とを重合配置し、重合部分を順次ボンディングツールで
熱圧着するに際し、 熱圧着時における絶縁フィルムの透孔開口縁の温度分布
が略均一となるように、ボンディング順序を設定するこ
とを特徴とするTABリード型半導体装置の製造方法。1. A plurality of inner leads formed by extending a conductive pattern in a through hole formed in an insulating film, and a plurality of bump electrodes of a semiconductor pellet arranged in the through hole are superposed and arranged. A TAB lead-type semiconductor device, characterized in that the bonding order is set so that the temperature distribution of the opening edge of the through hole of the insulating film during thermocompression bonding becomes substantially uniform when thermocompression-bonding the overlapped portions one after another with a bonding tool. Production method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3345764A JPH05183020A (en) | 1991-12-27 | 1991-12-27 | Manufacture of tab lead type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3345764A JPH05183020A (en) | 1991-12-27 | 1991-12-27 | Manufacture of tab lead type semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05183020A true JPH05183020A (en) | 1993-07-23 |
Family
ID=18378820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3345764A Pending JPH05183020A (en) | 1991-12-27 | 1991-12-27 | Manufacture of tab lead type semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05183020A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0675533A1 (en) * | 1994-03-30 | 1995-10-04 | Nec Corporation | Single point bonding method |
WO1998022980A1 (en) * | 1996-11-21 | 1998-05-28 | Hitachi, Ltd. | Semiconductor device and process for manufacturing the same |
KR20020069884A (en) * | 2001-02-28 | 2002-09-05 | 앰코 테크놀로지 코리아 주식회사 | Wire bonding method of semiconductor package |
-
1991
- 1991-12-27 JP JP3345764A patent/JPH05183020A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0675533A1 (en) * | 1994-03-30 | 1995-10-04 | Nec Corporation | Single point bonding method |
US5662263A (en) * | 1994-03-30 | 1997-09-02 | Nec Corporation | Single point bonding method |
WO1998022980A1 (en) * | 1996-11-21 | 1998-05-28 | Hitachi, Ltd. | Semiconductor device and process for manufacturing the same |
US6664616B2 (en) | 1996-11-21 | 2003-12-16 | Hitachi, Ltd. | Semiconductor device and manufacturing method thereof |
US6759272B2 (en) | 1996-11-21 | 2004-07-06 | Renesas Technology Corp. | Semiconductor device and manufacturing method thereof |
KR20020069884A (en) * | 2001-02-28 | 2002-09-05 | 앰코 테크놀로지 코리아 주식회사 | Wire bonding method of semiconductor package |
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