JPH05168806A - Composition used for removal of sticking water - Google Patents

Abstract

PURPOSE:To obtain a substitutive solvent compsn. 1,1,3,3-tetrafluorobutane which is to be used for removal of water stuck to electronic parts, precision machine parts, glass substrates, etc., and gives no influenece on the ozone layer. CONSTITUTION:The solvent compsn, consists of 1,1,3,3-tetrafluorobutane as the essential component to which at least one kind of solvent selected from alkanes having >=5 carbon number, cycloalkanes having >=5 carbon number, alcohols, ketones, ethers, hakigenated hydrocarbons, and chlorinated and fluorinated hydrocarbons, and/or a surfactant comprising a salt of an org. acid with an org. base are compounded. The amt. of the solvent soluble in 1,1,1,3- tetrafluorobutane is specified to 0.1-50wt.%, and the amt. of the surfactant comprising a salt of an org. acid with an org. base is specified to 0.001-10wt.%.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solvent composition used for removing adhered water from printed circuit boards, electronic parts such as ICs, precision machine parts, glass substrates and the like.

[0002]

2. Description of the Related Art Non-flammable, low toxicity,
1,1,2-trichloro-1,2,2-trifluoroethane (hereinafter referred to as R113), which has excellent stability, or a mixed solvent composition of this R113 and a solvent soluble in it, or the interface with R113 Mixed solvent compositions comprising activators are widely used. R113 has a feature that it can remove adhered water without attacking base materials such as metals, plastics and elastomers, so various precision machine parts and various electronic parts made of metal, plastics, elastomers, etc., and mounting these electronic parts It was most suitable for removing adhered water from printed circuit boards such as glass substrates.

[0003]

[Problems to be Solved by the Invention] Conventionally used R1
Despite having various advantages, 13 is chemically particularly stable, so that it has a long life in the troposphere and diffuses into the stratosphere where it is decomposed by ultraviolet rays to generate chlorine radicals. Chlorine radicals cause a chain reaction with stratospheric ozone, which destroys the ozone layer.

Therefore, in place of the conventional R113, an alternative solvent for removing adhered water that is less likely to destroy the ozone layer is being actively searched. As the alternative solvent for removing adhered water, 2,2-
Dichloro-1,1,1-trifluoroethane, 1,1-dichloro-1
-Fluoroethane, 3,3-dichloro-1,1,1,2,2-pentafluoropropane, 1,3-dichloro-1,1,2,2,3-pentafluoropropane, etc. have been developed.

These alternative solvents for removing adhered water have excellent adherent water removal properties similar to those of R113, and have a very small effect on the ozone layer. However, these alternative adherent water removing solvents have a slight effect on the ozone layer because they contain chlorine atoms. Therefore, there is a demand for the development of a more excellent alternative adherent water removing solvent that does not affect the ozone layer at all.

[0006] The present invention is a novel fluorinated hydrocarbon-based adhering water removal solvent that can be used as an alternative adsorbing water removal solvent that does not affect the ozone layer at all while satisfying the excellent properties of conventional R113. It is intended to provide a solvent composition.

[0007]

The present invention has been made to achieve the above-mentioned object. First, (A) 1,1,3,3-tetrafluorobutane and (B) 1,1 The present invention provides a solvent composition for removing adhered water, which comprises a solvent soluble in 3,3,3-tetrafluorobutane and (C) a surfactant composed of a salt of an organic acid and an organic base.

Secondly, the present invention is based on (A) 1,1,3,3-tetrafluorobutane and (B) 1,1,3,3-tetrafluorobutane. A solvent composition for removal is provided.

Thirdly, the present invention relates to a solvent for removing adhered water, which comprises (A) 1,1,3,3-tetrafluorobutane and (C) a surfactant consisting of a salt of an organic acid and an organic base. A composition is provided.

The composition of the present invention contains (A) 1,1,3,3-tetrafluorobutane (hereinafter referred to as R374pfc) as a main component, and (B) is soluble in R374pfc. (B-1) alkanes having 5 or more carbon atoms, (b-2) cycloalkanes having 5 or more carbon atoms, (b-3) alcohols as various solvents,
(b-4) at least one solvent selected from ketones, (b-5) ethers, (b-6) halogenated hydrocarbons, (b-7) chlorinated fluorinated hydrocarbons and / Alternatively, (C) a surfactant containing a salt of an organic acid and an organic base is blended.

(B) R374pfc used in the composition of the present invention
Examples of (b-1) alkanes having 5 or more carbon atoms and (b-2) cycloalkanes having 5 or more carbons as soluble solvents include pentane, 2-methylbutane, and 2,2-dimethylpropane. , Hexane, 2-methylpentane, 3-methylpentane,
2,2-dimethylbutane, 2,3-dimethylbutane, heptane,
2-methylhexane, 3-methylhexane, 2,3-dimethylpentane, 2,4-dimethylpentane, octane, 2,2,3-trimethylpentane, 2,2,4-trimethylpentane, cyclopentane, methylcyclopentane , Cyclohexane, methylcyclohexane, ethylcyclohexane, and the like, but are not limited thereto.

(B) (b-3) as a solvent soluble in R374pfc
Examples of alcohols include, but are not limited to, methanol, ethanol, i-propanol, n-propanol, n-butanol, i-butanol, s-butanol, t-butanol and the like.

(B) (b-4) as a solvent soluble in R374pfc
Examples of the ketones include, but are not limited to, acetone, methyl ethyl ketone, methyl butyl ketone, and methyl isobutyl ketone.

(B) (b-5) as a solvent soluble in R374pfc
Examples of ethers include, but are not limited to, diethyl ether, methyl cellosolve, tetrahydrofuran, and 1,4-dioxane.

(B) (b-6) as a solvent soluble in R374pfc
Halogenated hydrocarbons include dichloromethane and cis-
1,2-dichloroethylene, trans-1,2-dichloroethylene,
2-bromopropane and the like can be mentioned, but the invention is not limited thereto.

In addition, (B) as a solvent soluble in R374pfc
(b-7) chlorinated fluorinated hydrocarbons, 2,2-dichloro-1,1,1-trifluoroethane, 1,1-dichloro-1-fluoroethane, 3,3-dichloro-1, 1,1,2,2-pentafluoropropane, 1,3-dichloro-1,1,2,2,3-pentafluoropropane, 1,1-dichloro-1,2,2,3,3-pentafluoro Propane, 1,2-dichloro-1,1,3,3,3-pentafluoropropane, 1,2-dichloro-1,1,2,3,3-pentafluoropropane, 2,3-dichloro-1, Examples thereof include 1,1,2,3-pentafluoropropane and 2,2-dichloro-1,1,1,3,3-pentafluoropropane, but are not limited thereto.

As the surfactant (C) consisting of a salt of an organic acid and an organic base, which can be used in the composition of the present invention, various kinds of surfactants can be exemplified in a wide range. In particular, a salt of a higher fatty acid and a higher aliphatic amine is used. Caprylic acid caprylamine,
Caproyl caproate, capryl amine hexylate, dodecyl amine hexylate, stearyl amine hexylate, etc. are exemplified as preferable ones.

The mixed composition ratio of the composition of the present invention is not particularly limited, but the content of the solvent (B) soluble in R374pfc is preferably 0.1% by weight to 50% by weight, C)
The content of surfactants consisting of salts of organic acids and organic bases is
It is from 0.001% to 10% by weight.

In the composition of the present invention, other components may be further added and mixed, if necessary. For example, in the use as a solvent, nitro compounds such as nitromethane, nitroethane, nitropropane and nitrobenzene, amines such as diethylamine, triethylamine, i-propylamine, butylamine and i-butylamine, ethyl acetate, propyl acetate and butyl acetate. Esters such as phenol, o-cresol, m-cresol, p-cresol, thymol, pt-butylphenol, t-butylcatechol, catechol, isoeugenol, o-methoxyphenol, 4,4'-dihydroxyphenyl-2, 2-Propane, isoamyl salicylate, benzyl salicylate, methyl salicylate, phenols such as 2,6-di-t-butyl-p-cresol, 2- (2'-hydroxy-5'-methyl-phenyl) benzotriazole, 2 -(2'-Hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotri Orres,
1,2,3-benzotriazole, 1-[(N, N-bis-2-ethylhexyl) aminomethyl] benzotriazole triazoles and the like can be appropriately added.

A solvent composition for removing adhered water of the present invention, which comprises (A) R374pfc and (B) a solvent soluble therein and / or (C) a surfactant consisting of a salt of an organic acid and an organic base, ,Traditional
It has the same ability to remove adhered water as the R113 series and can be suitably used for various purposes.

As a method of removing the adhered water, hand-wiping, dipping,
Spraying, shaking, ultrasonic cleaning, steam cleaning or the like may be adopted.

[0022]

EXAMPLES Examples of the present invention will be shown below.

Examples 1 to 23 Tests for removing adhering water were conducted using the cleaning solvent compositions shown in Tables 1 to 4 below. That is, after immersing a glass plate of 30 mm × 18 mm × 5 mm in pure water, it is immersed in the cleaning solvent composition of the present invention shown in Tables 1 to 4 below for 20 seconds to drain water, and the taken out glass plate is anhydrous. The state of removal of the adhered water was judged from the amount of increase in the water content after immersion in methanol. The degree of removal of the adhered water is shown as the removal degree in Tables 1 to 4 below.

[0024]

[Table 1]

[0025]

[Table 2]

[0026]

[Table 3]

[0027]

[Table 4]

[0028]

EFFECT OF THE INVENTION Solvent for removing adhered water comprising 1,1,3,3-tetrafluorobutane of the present invention and a solvent soluble therein and / or a surfactant consisting of a salt of an organic acid and an organic base. The composition has advantages such as satisfying the excellent properties of conventional R113, especially the adhering water removal property, and not affecting the ozone layer.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Michino Ikehata 1150 Hazawa-machi, Kanagawa-ku, Yokohama, Kanagawa Prefecture Asahi Glass Co., Ltd. Central Research Laboratory

Claims (12)

[Claims] 1. (A) 1,1,3,3-tetrafluorobutane and (B)
A composition for removing adhered water, which comprises a solvent soluble in 1,1,3,3-tetrafluorobutane and (C) a surfactant comprising a salt of an organic acid and an organic base. 2. An (A) 1,1,3,3-tetrafluorobutane and (B)
A composition for removing adhered water, which comprises a solvent soluble in 1,1,3,3-tetrafluorobutane. 3. (A) 1,1,3,3-tetrafluorobutane and (C)
A composition used for removing attached water, which comprises a surfactant composed of a salt of an organic acid and an organic base. 4. A solvent soluble in (B) 1,1,3,3-tetrafluorobutane (b-1) alkanes having 5 or more carbon atoms, and (b-2) cycloalkane having 5 or more carbon atoms. , (B-3) alcohols,
(b-4) at least one solvent selected from ketones, (b-5) ethers, (b-6) halogenated hydrocarbons, (b-7) chlorinated fluorinated hydrocarbons A composition used for removing adhered water according to claim 1. 5. A solvent soluble in (B) 1,1,3,3-tetrafluorobutane (b-3) alcohols and (b-1) alkanes having 5 or more carbon atoms, (b-2) ) Cycloalkanes having 5 or more carbon atoms,
(b-4) Ketones, (b-5) ethers, (b-6) halogenated hydrocarbons, (b-7) at least one solvent selected from chlorinated fluorinated hydrocarbons The composition for removing adhered water according to claim 2, which comprises a mixture. 6. The composition used for removing adhered water according to claim 1, wherein the surfactant (C) consisting of a salt of an organic acid and an organic base is a salt of a higher fatty acid and a higher aliphatic amine. 7. (B) The content of a solvent soluble in 1,1,3,3-tetrafluorobutane is 0.1% by weight to 50% by weight, and (C) is a salt of an organic acid and an organic base. The content of the surfactant
The composition for removing adhered water according to claim 1, which is 0.001% by weight to 10% by weight. 8. The content of the solvent soluble in (B) 1,1,3,3-tetrafluorobutane is 0.1% by weight to 50% by weight.
A composition used for removing adhered water. 9. The composition used for removing adhered water according to claim 3, wherein the content of the surfactant (C) consisting of a salt of an organic acid and an organic base is 0.001% by weight to 10% by weight. 10. A solvent soluble in (B) 1,1,3,3-tetrafluorobutane is (b-1) an alkane having 5 or more carbon atoms, and (b-2) a cycloalkane having 5 or more carbon atoms. , (B-3) alcohols,
at least one solvent selected from (b-4) ketones, (b-5) ethers, (b-6) halogenated hydrocarbons, and (b-7) chlorinated fluorinated hydrocarbons And (C) the surfactant comprising a salt of an organic acid and an organic base is a salt of a higher fatty acid and a higher aliphatic amine. 11. A solvent soluble in (B) 1,1,3,3-tetrafluorobutane is (b-1) an alkane having 5 or more carbon atoms, and (b-2) a cycloalkane having 5 or more carbon atoms. , (B-3) alcohols,
(b-4) at least one solvent selected from ketones, (b-5) ethers, (b-6) halogenated hydrocarbons, (b-7) chlorinated fluorinated hydrocarbons A composition used for removing adhered water according to claim 8. 12. The composition used for removing adhered water according to claim 9, wherein the surfactant (C) comprising a salt of an organic acid and an organic base is a salt of a higher fatty acid and a higher aliphatic amine.