JPH05154486A - Equipment for measuring chlorine demand - Google Patents
Equipment for measuring chlorine demandInfo
- Publication number
- JPH05154486A JPH05154486A JP34417191A JP34417191A JPH05154486A JP H05154486 A JPH05154486 A JP H05154486A JP 34417191 A JP34417191 A JP 34417191A JP 34417191 A JP34417191 A JP 34417191A JP H05154486 A JPH05154486 A JP H05154486A
- Authority
- JP
- Japan
- Prior art keywords
- chlorine
- free residual
- demand
- sodium hypochlorite
- residual chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 89
- 239000000460 chlorine Substances 0.000 title claims abstract description 89
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 89
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 239000005708 Sodium hypochlorite Substances 0.000 claims abstract description 28
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000007788 liquid Substances 0.000 claims abstract description 25
- 238000002347 injection Methods 0.000 abstract description 14
- 239000007924 injection Substances 0.000 abstract description 14
- 238000005259 measurement Methods 0.000 abstract description 9
- 239000000243 solution Substances 0.000 abstract description 8
- 239000008400 supply water Substances 0.000 abstract description 4
- 239000008399 tap water Substances 0.000 abstract description 4
- 235000020679 tap water Nutrition 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 2
- 230000000052 comparative effect Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 6
- 238000004737 colorimetric analysis Methods 0.000 description 4
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 4
- 235000019345 sodium thiosulphate Nutrition 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 239000002352 surface water Substances 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 241000195493 Cryptophyta Species 0.000 description 1
- 238000003928 amperometric titration Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 244000052769 pathogen Species 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
Landscapes
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
(57)【要約】
【構成】 次亜塩素酸ナトリウム液貯槽、原水貯槽、及
び次亜塩素酸ナトリウム液と原水を混合、反応させる混
合槽を備えた要求量算出部と、遊離残留塩素濃度を測定
するための遊離残留塩素測定部からなり、遊離残留塩素
測定値よりプログラムコンピューターを用いて塩素要求
量を算出し、レコーダーに連続記録することを特徴とす
る供給水源の塩素要求量の自動測定装置。
【効果】 供給水源の塩素要求量が変化しても短時間で
求めた塩素要求量により塩素注入量の制御が可能とな
り、一定の遊離残留塩素量を含む用水を得ることができ
る。特に上水においては利用価値が高い。次亜塩素酸ナ
トリウム液の過剰注入の危険性がなくなりランニングコ
ストの低減も可能となる。(57) [Summary] [Structure] A required amount calculation unit equipped with a sodium hypochlorite liquid storage tank, a raw water storage tank, and a mixing tank for mixing and reacting the sodium hypochlorite liquid with the raw water, and the free residual chlorine concentration. An automatic measuring device for chlorine demand from a source of supply water, which consists of a free residual chlorine measuring unit for measurement, calculates the chlorine demand from a measured value of free residual chlorine using a program computer, and records it continuously in a recorder. .. [Effect] Even if the chlorine demand of the supply water source changes, it is possible to control the chlorine injection amount by the chlorine demand calculated in a short time, and it is possible to obtain water containing a certain amount of free residual chlorine. Especially, it has high utility value in tap water. The risk of excessive injection of sodium hypochlorite solution is eliminated and the running cost can be reduced.
Description
【0001】[0001]
【産業上の利用分野】本発明は、塩素殺菌における原水
の塩素要求量を測定する装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for measuring the chlorine demand of raw water in chlorine sterilization.
【0002】[0002]
【従来の技術】遊離残留塩素を含む用水は、一般に、上
水やトイレ、公園等に使われている中水で利用されてい
る。これらへの供給水源である貯水池、湖沼、河川、雨
水等は、藻、バクテリア、病原菌等を含んでいる。その
ため、供給水源は、処理場において塩素殺菌され、さら
に、各処理を経て不純物が取り除かれ、各目的に合わせ
て供給されている。上水では、水道法施行規則の第16
条により、給水せんで遊離残留塩素濃度が0.1ppm以上と
いう規制を受けている。上限は規制されていないが、濃
度が極端に高すぎると塩素臭による利用者の苦情の対象
となることから、0.4ppm程度に押えなければならないの
が実状である。現在、遊離残留塩素濃度の制御は、処理
場出口で遊離残留塩素濃度を測定し、その測定値より次
亜塩素酸ナトリウム液の注入量を制御する、いわゆるフ
ィードバック方式が行われている。2. Description of the Related Art Water containing free residual chlorine is generally used as tap water or tap water used in toilets, parks and the like. Reservoirs, lakes, rivers, rainwater, etc., which are the sources of water supplied to these, contain algae, bacteria, pathogens and the like. Therefore, the supply water source is sterilized by chlorine at the treatment plant, and impurities are removed after each treatment, and the water is supplied according to each purpose. For clean water, 16th of the Water Supply Law Enforcement Regulations
According to the Article, the water supply line is regulated to have a free residual chlorine concentration of 0.1 ppm or more. The upper limit is not regulated, but if the concentration is too high, it will be subject to user complaints due to chlorine odor, so the actual situation is that it must be suppressed to around 0.4 ppm. Currently, the so-called feedback method is used to control the concentration of free residual chlorine by measuring the concentration of free residual chlorine at the outlet of the treatment plant and controlling the injection amount of the sodium hypochlorite liquid from the measured value.
【0003】[0003]
【発明が解決しようとする課題】従来の方法で遊離残留
塩素濃度を制御する場合、原水の水質の変化により変動
する遊離残留塩素濃度を処理場出口で測定して次亜塩素
酸ナトリウム液の注入量を制御しなくてはならず、原水
の水質の変化に対して短時間に次亜塩素酸ナトリウム液
の注入量を制御することは不可能である。すなわち、給
水せんでの遊離残留塩素量の過不足が起こり得る。過剰
の場合は、塩素臭による利用者の苦情の対象となり、不
足の場合は、配管途中での汚染の危険性が出てくる。特
に、後者の場合は、絶対に避けなければならず、どうし
ても次亜塩素酸ナトリウム液を過剰に注入することにな
る。When controlling the free residual chlorine concentration by the conventional method, the free residual chlorine concentration, which fluctuates due to changes in the water quality of the raw water, is measured at the treatment plant outlet and the sodium hypochlorite solution is injected. The amount must be controlled, and it is impossible to control the injection amount of the sodium hypochlorite liquid in a short time with respect to changes in the water quality of the raw water. That is, excess or deficiency of the amount of free residual chlorine in the water supply pipe may occur. If it is excessive, it will be subject to user complaints due to chlorine odor, and if it is insufficient, there is a risk of contamination during piping. Especially, in the latter case, it must be absolutely avoided, and the sodium hypochlorite solution is inevitably injected excessively.
【0004】そのため、あらかじめ原水の塩素要求量を
知り、それに応じて一定量の次亜塩素酸ナトリウム液を
注入し、給水せんでの適正な遊離残留塩素濃度を得るこ
とが望ましく、塩素要求量測定装置が望まれていた。Therefore, it is desirable to know the chlorine demand of the raw water in advance, and to inject a certain amount of sodium hypochlorite liquid accordingly to obtain an appropriate free residual chlorine concentration in the water supply pipe. A device was desired.
【0005】[0005]
【課題を解決するための手段】本発明者らは、鋭意研究
の結果、上記の目的を達成する塩素要求量測定装置を見
いだした。すなわち、次亜塩素酸ナトリウム液貯槽、原
水貯槽、及び次亜塩素酸ナトリウム液と原水を混合、反
応させる混合槽を備えた塩素要求量算出部、並びに遊離
残留塩素濃度を測定するための遊離残留塩素測定部から
なり、遊離残留塩素濃度の測定値よりプログラムコンピ
ューターを用いて塩素要求量を算出し、レコーダーに連
続記録することを特徴とする塩素要求量測定装置であ
る。As a result of earnest research, the present inventors have found a chlorine demand measuring device that achieves the above object. In other words, a sodium hypochlorite liquid storage tank, a raw water storage tank, and a chlorine demand calculation unit equipped with a mixing tank for mixing and reacting a sodium hypochlorite liquid with raw water, and a free residual residue for measuring a free residual chlorine concentration. This is a chlorine demand measuring device characterized by comprising a chlorine measuring unit, calculating the chlorine demand from a measured value of the free residual chlorine concentration using a program computer, and continuously recording it on a recorder.
【0006】以下、本発明を、本発明の塩素要求量測定
装置の配管図である図1に基づいて、詳しく説明する。The present invention will be described in detail below with reference to FIG. 1, which is a piping diagram of the chlorine demand measuring device of the present invention.
【0007】次亜塩素酸ナトリウム液貯槽4内の次亜塩
素酸ナトリウム液を次亜塩素酸ナトリウム液送液ポンプ
1で、原水貯槽5内の原水を原水送液ポンプ2で、攪は
ん機能を備えた混合槽6にそれぞれ一定の割合で送液し
する。混合槽6内で一定時間混合、反応させた混合液を
混合液送液ポンプ3で遊離残留塩素測定部7に送液す
る。送られた混合液の遊離残留塩素濃度を遊離残留塩素
測定装部7で測定する。本発明に用いる遊離残留塩素測
定部は、O-トリジン比色法、DPD(N,N-ジエチル-
P-フェニレンジアミン)比色法、ヨウ素滴定法、フェ
ニルアルセニオキサイド溶液による電流滴定法等各種遊
離残留塩素測定法を組み込んだもので、測定濃度範囲は
目的に応じて適宜設定することができる。遊離残留塩素
濃度の測定値は、電気信号として塩素要求量測定部8に
送られ、レコーダー9に記録される。また、塩素要求量
測定部8から送られた電気信号に応じ、次亜塩素酸ナト
リウム液と原水の混合割合を変化させ、前述の測定が繰
り返される。塩素要求量測定部8で、得られた測定値か
ら最小二乗法等により塩素要求量を求め、レコーダー9
で連続記録する。The sodium hypochlorite liquid in the sodium hypochlorite liquid storage tank 4 is agitated by the sodium hypochlorite liquid delivery pump 1 and the raw water in the raw water storage tank 5 is agitated by the raw water delivery pump 2. Liquid is sent to each of the mixing tanks 6 provided with a fixed ratio. The mixed solution which has been mixed and reacted in the mixing tank 6 for a certain period of time is sent to the free residual chlorine measuring unit 7 by the mixed solution sending pump 3. The free residual chlorine concentration of the sent mixed liquid is measured by the free residual chlorine measuring device 7. The free residual chlorine measuring unit used in the present invention is an O-tolidine colorimetric method, DPD (N, N-diethyl-
Various free residual chlorine measuring methods such as a P-phenylenediamine) colorimetric method, an iodometric titration method, and an amperometric titration method using a phenylarsenioxide solution are incorporated, and the measurement concentration range can be appropriately set according to the purpose. The measured value of the free residual chlorine concentration is sent to the chlorine demand amount measuring unit 8 as an electric signal and recorded in the recorder 9. Further, the mixing ratio of the sodium hypochlorite liquid and the raw water is changed according to the electric signal sent from the chlorine demand amount measuring unit 8, and the above-mentioned measurement is repeated. The chlorine demand measuring unit 8 obtains the chlorine demand from the obtained measured values by the least square method or the like, and the recorder 9
To record continuously.
【0008】本発明では、原水の塩素要求量が急激に変
化しても、短時間で原水の塩素要求量を求めることがで
きる。その結果、常に一定量の遊離残留塩素量を含むよ
うに塩素の注入量を制御することができる。遊離残留塩
素測定部7の測定濃度範囲を変えることにより、上水だ
けでなく、食品等の殺菌に利用される次亜塩素酸ナトリ
ウム液の濃度調整にも幅広く適用できる。According to the present invention, even if the chlorine demand of the raw water changes rapidly, the chlorine demand of the raw water can be obtained in a short time. As a result, it is possible to control the injection amount of chlorine so as to always include a fixed amount of free residual chlorine. By changing the measurement concentration range of the free residual chlorine measuring unit 7, it can be widely applied not only to clean water but also to the concentration adjustment of sodium hypochlorite solution used for sterilization of foods and the like.
【0009】[0009]
【実施例】以下、実施例により本発明を説明するが、本
発明は、これら実施例に何ら限定されるものではない。The present invention will be described below with reference to examples, but the present invention is not limited to these examples.
【0010】日本カーリット株式会社群馬工場内の表流
水を原水とした。表流水をポンプで汲み上げ、1m3の
原水貯槽タンクに貯め、2つのライン(ラインA、B)
に分岐した。ラインAには、塩素要求量測定装置及び次
亜塩素酸ナトリウム液注入装置を、ラインBには、次亜
塩素酸ナトリウム液注入装置のみを設置した。処理液の
遊離残留塩素濃度をライン出口で測定した。ラインAに
おいて、塩素要求量測定装置の遊離残留塩素測定部は、
DPD比色法により遊離残留塩素濃度を測定する高精度
遊離塩素計S−638(フランス:セレス社製)を用い
測定範囲を1〜999ppbに設定した。また塩素要求量算出
部は、原水貯槽、次亜素酸ナトリウム液貯槽、混合槽及
びポンプを備え、混合液の遊離残留塩素濃度を測定する
ことにより塩素要求量を求める装置(日本カーリット株
式会社製)を用いた。塩素要求量は、100〜950ppbの範
囲内の遊離残留塩素濃度の測定値3回を最小二乗法によ
り求めた。Surface water in the Gunma Factory of Japan Carlit Co., Ltd. was used as raw water. Surface water is pumped up and stored in a 1 m 3 raw water storage tank, two lines (lines A and B)
Branched to. A chlorine demand measuring device and a sodium hypochlorite liquid injection device were installed in line A, and only a sodium hypochlorite liquid injection device was installed in line B. The free residual chlorine concentration of the treatment liquid was measured at the line outlet. In line A, the free residual chlorine measuring section of the chlorine demand measuring device is
The measurement range was set to 1 to 999 ppb using a high-precision free chlorine meter S-638 (France: manufactured by Ceres), which measures free residual chlorine concentration by the DPD colorimetric method. Also, the chlorine demand calculation unit is equipped with a raw water storage tank, a sodium hypochlorite liquid storage tank, a mixing tank, and a pump, and a device for determining the chlorine demand by measuring the concentration of free residual chlorine in the liquid mixture (manufactured by Nippon Carlit Co., Ltd. ) Was used. The chlorine demand was determined by the least squares method using three measured values of the free residual chlorine concentration within the range of 100 to 950 ppb.
【0011】実施例1 ラインAで、原水供給流量を10l/分とした。また塩素
要求量を測定して次亜塩素酸ナトリウム液の注入量を制
御し、遊離残留塩素濃度を0.2ppmに設定した。開始1時
間後、DPD比色法によりライン出口の遊離残留塩素濃
度を測定した。Example 1 In line A, the raw water supply flow rate was set to 10 l / min. Also, the chlorine demand was measured to control the injection amount of the sodium hypochlorite liquid, and the free residual chlorine concentration was set to 0.2 ppm. One hour after the start, the free residual chlorine concentration at the line outlet was measured by the DPD colorimetric method.
【0012】実施例2 実施例1において、原水にチオ硫酸ナトリウム(塩素要
求量として3ppmに相当)を添加した以外は、実施例1
に準じて行った。Example 2 Example 1 was repeated except that sodium thiosulfate (corresponding to a chlorine demand of 3 ppm) was added to the raw water.
It was carried out according to.
【0013】実施例3 実施例1において、原水にチオ硫酸ナトリウム(塩素要
求量として6ppmに相当)を添加した以外は、実施例1
に準じて行った。Example 3 Example 1 was repeated except that sodium thiosulfate (corresponding to a chlorine demand of 6 ppm) was added to the raw water.
It was carried out according to.
【0014】実施例1〜3における塩素要求量及びライ
ン出口の遊離残留塩素濃度の測定結果を、表1に示す。
各実施例とも、原水の塩素要求量が変化しても一定の遊
離残留塩素濃度を含む用水が得られた。Table 1 shows the measurement results of the chlorine demand and the free residual chlorine concentration at the line outlet in Examples 1 to 3.
In each of the examples, water having a constant free residual chlorine concentration was obtained even if the chlorine demand of the raw water changed.
【0015】[0015]
【表1】 [Table 1]
【0016】比較例1 ラインBで、原水供給流量を10l/分、次亜塩素酸ナト
リウム液の注入量を3ppm/分に設定した。開始1時間
後、DPD法によりライン出口の遊離残留塩素濃度を測
定した。Comparative Example 1 In Line B, the raw water supply flow rate was set to 10 l / min, and the injection amount of the sodium hypochlorite solution was set to 3 ppm / min. One hour after the start, the free residual chlorine concentration at the line outlet was measured by the DPD method.
【0017】比較例2 比較例1において、原水にチオ硫酸ナトリウム(塩素要
求量として3ppmに相当)を添加した以外は、比較例1
に準じて行った。Comparative Example 2 Comparative Example 1 except that sodium thiosulfate (corresponding to a chlorine requirement of 3 ppm) was added to the raw water in Comparative Example 1.
It was carried out according to.
【0018】比較例3 比較例1において、次亜塩素酸ナトリウム液の注入量を
6ppm/分とした以外は、比較例1に準じて行った。Comparative Example 3 Comparative Example 1 was carried out according to Comparative Example 1 except that the injection amount of the sodium hypochlorite liquid was 6 ppm / min.
【0019】比較例4 比較例1において、原水にチオ硫酸ナトリウム(塩素要
求量として3ppmに相当)を添加、次亜塩素酸ナトリウ
ム液の注入量を6ppm/分とした以外は、比較例1に準
じて行った。Comparative Example 4 Comparative Example 1 was repeated except that sodium thiosulfate (corresponding to a chlorine requirement of 3 ppm) was added to the raw water and the injection amount of the sodium hypochlorite solution was 6 ppm / min. It carried out according to it.
【0020】比較例1〜4におけるライン出口の遊離残
留塩素濃度の測定結果を、表2に示す。次亜塩素酸ナト
リウム液の注入量を制御しない場合、原水の塩素要求量
が増えると遊離残留塩素濃度がゼロとなり、原水の塩素
要求量が減ると遊離残留塩素濃度が高くなった。Table 2 shows the measurement results of the free residual chlorine concentration at the line outlet in Comparative Examples 1 to 4. When the injection amount of sodium hypochlorite solution was not controlled, the free residual chlorine concentration became zero when the chlorine demand of the raw water increased, and the free residual chlorine concentration increased when the chlorine demand of the raw water decreased.
【0021】[0021]
【表2】 [Table 2]
【0022】[0022]
【発明の効果】本発明により、供給水源の塩素要求量が
変化しても短時間に塩素要求量を求めることができ、求
めた塩素要求量で塩素注入量を制御することにより一定
の遊離残留塩素量を含む用水を得ることができる。特に
上水において非常に利用価値が高い。すなわち、次亜塩
素酸ナトリウム液の過剰注入の危険性がなくなりランニ
ングコストの低減も可能となる。EFFECTS OF THE INVENTION According to the present invention, the chlorine demand can be obtained in a short time even if the chlorine demand of the supply water source changes, and a constant free residual residue can be obtained by controlling the chlorine injection amount with the obtained chlorine demand. It is possible to obtain water containing chlorine. It is very useful especially for tap water. That is, there is no danger of excessive injection of the sodium hypochlorite liquid, and the running cost can be reduced.
【図1】塩素要求量計の配管図である。FIG. 1 is a piping diagram of a chlorine demand meter.
1.次亜塩素酸ナトリウム液送液ポンプ 2.原水送液ポンプ 3.混合液送液ポンプ 4.次亜塩素酸ナトリウム液貯槽 5.原水貯槽 6.混合槽 7.遊離残留塩素測定部 8.塩素要求量測定部 9.レコーダー 1. Sodium hypochlorite liquid delivery pump 2. Raw water delivery pump 3. Mixed solution delivery pump 4. Sodium hypochlorite liquid storage tank 5. Raw water storage tank 6. Mixing tank 7. Free residual chlorine measurement unit 8. Chlorine demand measurement unit 9. recorder
Claims (1)
槽、及び次亜塩素酸ナトリウム液と原水を混合、反応さ
せる混合槽を備えた塩素要求量算出部、並びに遊離残留
塩素濃度を測定するための遊離残留塩素測定部からな
り、遊離残留塩素濃度の測定値よりプログラムコンピュ
ーターを用いて塩素要求量を算出し、レコーダーに連続
記録することを特徴とする塩素要求量測定装置。1. A chlorine demand calculation unit having a sodium hypochlorite liquid storage tank, a raw water storage tank, and a mixing tank for mixing and reacting a sodium hypochlorite liquid with raw water, and for measuring the residual residual chlorine concentration. The chlorine demand measuring device characterized by comprising the free residual chlorine measuring unit of (1), calculating the chlorine demand using a program computer from the measured value of the free residual chlorine, and continuously recording the demand on a recorder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34417191A JPH05154486A (en) | 1991-12-03 | 1991-12-03 | Equipment for measuring chlorine demand |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34417191A JPH05154486A (en) | 1991-12-03 | 1991-12-03 | Equipment for measuring chlorine demand |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05154486A true JPH05154486A (en) | 1993-06-22 |
Family
ID=18367175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34417191A Pending JPH05154486A (en) | 1991-12-03 | 1991-12-03 | Equipment for measuring chlorine demand |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05154486A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001348797A (en) * | 2000-03-31 | 2001-12-21 | Somar Corp | How to control white water slime |
KR100320660B1 (en) * | 1999-07-03 | 2002-01-19 | 임정규 | Automatic Determination Method &Device for Chlorine Demand Quantity of Water Treatment Plant |
JP2013220395A (en) * | 2012-04-17 | 2013-10-28 | Tsukishima Kikai Co Ltd | Method for treating purified water |
JP2019093371A (en) * | 2017-11-28 | 2019-06-20 | アクアス株式会社 | Method and apparatus for treating ammoniac nitrogen in water |
-
1991
- 1991-12-03 JP JP34417191A patent/JPH05154486A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100320660B1 (en) * | 1999-07-03 | 2002-01-19 | 임정규 | Automatic Determination Method &Device for Chlorine Demand Quantity of Water Treatment Plant |
JP2001348797A (en) * | 2000-03-31 | 2001-12-21 | Somar Corp | How to control white water slime |
JP2013220395A (en) * | 2012-04-17 | 2013-10-28 | Tsukishima Kikai Co Ltd | Method for treating purified water |
JP2019093371A (en) * | 2017-11-28 | 2019-06-20 | アクアス株式会社 | Method and apparatus for treating ammoniac nitrogen in water |
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