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JPH0515020B2 - - Google Patents

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Publication number
JPH0515020B2
JPH0515020B2 JP60147439A JP14743985A JPH0515020B2 JP H0515020 B2 JPH0515020 B2 JP H0515020B2 JP 60147439 A JP60147439 A JP 60147439A JP 14743985 A JP14743985 A JP 14743985A JP H0515020 B2 JPH0515020 B2 JP H0515020B2
Authority
JP
Japan
Prior art keywords
punch
curved surface
mask
die
peripheral edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60147439A
Other languages
Japanese (ja)
Other versions
JPS628431A (en
Inventor
Takeo Fujimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14743985A priority Critical patent/JPS628431A/en
Publication of JPS628431A publication Critical patent/JPS628431A/en
Publication of JPH0515020B2 publication Critical patent/JPH0515020B2/ja
Granted legal-status Critical Current

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  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、シヤドウマスク式カラー陰極線管
のシヤドウマスクを構成する部材であるアパーチ
ヤマスクの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an aperture mask, which is a member constituting a shadow mask of a shadow mask type color cathode ray tube.

〔従来の技術〕[Conventional technology]

第7図は従来のシヤドウマスクの一部破断斜視
図で、シヤドウマスク1は、アパーチヤマスク2
と、これを保持する補強用のフレーム3と、フレ
ーム3の周辺に配設されてあるばね4とで構成さ
れ、ばね4により図示していないカラー陰極線管
のパネルのスカート部に植立てられているピンに
装着されるように構成されている。
FIG. 7 is a partially cutaway perspective view of a conventional shadow mask.
, a reinforcing frame 3 for holding this, and a spring 4 disposed around the frame 3, and the spring 4 is used to plant it on the skirt part of the panel of a color cathode ray tube (not shown). It is configured to be attached to the pin that is attached.

アパーチヤマスク2は、一般に0.1〜0.3mmの薄
い金属板で構成され、正面形状は通常ほぼ矩形状
であつて、ほぼ球面に近い形状に成形された前面
と、これにつづいて折り曲げ線8のところからほ
ぼ垂直に形成されたスカート部9とを有し、前面
は、所定幅の無孔周辺部7を残して電子ビームが
通る透孔10が、ほぼ矩形状の有効輪郭線6内の
面域に所定のパターンで形成されている有孔曲面
部5とを構成し、有孔曲面部5と、これにつづく
無孔周辺部7とは、当該シヤドウマスク1が装着
されるパネルの内面のわん曲面に合わせて、ほぼ
球面状に成形されている。
The aperture mask 2 is generally composed of a thin metal plate with a thickness of 0.1 to 0.3 mm, and the front face is usually approximately rectangular, with a front face formed into a nearly spherical shape, followed by a bending line 8. The front surface has a skirt portion 9 formed almost perpendicularly thereto, and a through hole 10 through which the electron beam passes, leaving a non-porous peripheral portion 7 of a predetermined width, is formed on a surface within a substantially rectangular effective contour line 6. The perforated curved surface part 5 and the non-perforated peripheral part 7 that follow this constitute a perforated curved surface part 5 formed in a predetermined pattern in the area, and the perforated curved surface part 5 and the non-perforated peripheral part 7 are formed on the inner surface of the panel on which the shadow mask 1 is attached. It is shaped into an almost spherical shape to match the curved surface.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来のアパーチヤマスクは、1枚の薄い金属板
に、エツチング法によつて透孔10を所定パター
ンで形成したフラツトマスクを、プレス成形加工
により有孔曲面部5および無孔周縁部7を球面に
形成するとともに、スカート部9を形成してい
た。
A conventional aperture mask is a flat mask in which through-holes 10 are formed in a predetermined pattern using an etching method on a single thin metal plate, and the perforated curved surface portion 5 and non-porous peripheral portion 7 are made into a spherical surface by press molding. At the same time, a skirt portion 9 was also formed.

しかし、このような製造方法によるアパーチヤ
マスク2では、例えばつぎのような問題点が生じ
てきた。
However, the aperture mask 2 manufactured by such a manufacturing method has the following problems, for example.

その一例をあげると、最近になつて、高解像度
または明るさの向上の要請から高電流密度の電子
ビームが用いられているが、これにともなつて、
電子ビームの射突によるアパーチヤマスクの温度
上昇が大となり、熱望張にともなう変形による色
ずれが生じる。これを解決するため、多量のニツ
ケルを含む熱望張係数の小さいニツケル合金薄板
でアパーチヤマスクを作ることが行なわれてい
る。
For example, recently, high current density electron beams have been used due to the need for higher resolution or improved brightness.
The temperature rise of the aperture mask due to the impact of the electron beam becomes large, and color shift occurs due to deformation due to aspiration. To solve this problem, an aperture mask is made of a nickel alloy thin plate containing a large amount of nickel and having a small aspiration coefficient.

しかし、ニツケル合金薄板はプレス成形の加工
性が悪いため、つぎのような難点がある。
However, nickel alloy thin sheets have poor workability in press forming, and therefore have the following drawbacks.

通常、有孔曲面部5の曲面の精度は、0.3mm
以内であることが必要であるが、ニツケル合金
薄板は、いわゆるスプリングバツクが大きいた
め、折り曲げ線8の部分でほぼ直径に絞つてス
カート部9を所定の形状に成形することが非常
に困難であり、この曲げ精度の出ていないアパ
ーチヤマスク2をフレーム3に取り付けると、
その成形寸法の誤差に基づく変形が有孔曲面部
5の曲面に歪を与えるため、曲面の精度が損な
われ、色ずれ等が生じる。
Normally, the precision of the curved surface of the perforated curved surface portion 5 is 0.3 mm.
However, since the nickel alloy thin plate has a large so-called spring back, it is extremely difficult to narrow the skirt portion 9 to a predetermined shape by narrowing it down to approximately the diameter at the bending line 8. , when this aperture mask 2 with poor bending accuracy is attached to the frame 3,
Since the deformation based on the error in the molding dimensions distorts the curved surface of the perforated curved surface portion 5, the precision of the curved surface is impaired and color shift etc. occur.

ニツケル合金薄板は、従来使用していた鉄板
より著しく高価であり安価な代替材料がないた
め、コスト高となる。
Nickel alloy thin plates are significantly more expensive than conventionally used iron plates, and there are no inexpensive alternative materials, resulting in high costs.

他の例をあげると、カラー陰極線管の超大形
化にともない、超大形のアパーチヤマスクが必
要となるが、従来の構成と、製造方法によつた
のでは、原材料であるシートロールに特別な広
幅のものを必要とし、入手が困難であるととも
に、はなはだ高価なものとなる。
To give another example, as color cathode ray tubes become extremely large, extremely large aperture masks are required. It requires a lot of equipment, is difficult to obtain, and is extremely expensive.

これらの問題の解決のために、有孔曲面部を形
成している第1の部材と、スカート部およびこれ
につづくほぼ直角に曲げられた中心方向へ延在す
る無孔周縁部をそれぞれ適当な材料で別々に作つ
たのち、これらを接合してアパーチヤマスクを作
ることが工夫されている。
In order to solve these problems, the first member forming the perforated curved surface part, the skirt part and the non-perforated peripheral part extending in the direction of the center which is bent approximately at right angles are respectively An idea has been to create an aperture mask by making separate materials and then joining them together.

以下、このような接合形アパーチヤマスクにつ
いて若干詳しく説明する。
Hereinafter, such a junction type aperture mask will be explained in some detail.

第1図は従来のこの種接合形シヤドウマスクの
正面図、第2図は第1図の−矢視断面図であ
る。
FIG. 1 is a front view of a conventional joint type shadow mask of this type, and FIG. 2 is a sectional view taken along the - arrow in FIG.

図において、11は熱膨張係数の小さいニツケ
ル合金薄板の有孔曲面部5に透孔10が形成され
ている第1の部材、12はプレスによる成形加工
性の良い鉄板でスカート部9と、これにつづいて
ほぼ直角に曲げられた中心方向に延在する無孔周
縁部7とが形成されているL字状の断面形状に形
成されている第2の部材で、第2の部材12の無
孔周縁部7の内周縁の接合部12aの外面と、第
1の部材11の外周縁の接合部11aの内面と
が、全周にわたつて幅Wで重ねられ、その重ね合
わされた接合部11a,12aの全域にわたつて
シーム溶接などの方法で溶着されている。
In the figure, 11 is a first member in which a through hole 10 is formed in a perforated curved surface portion 5 of a thin nickel alloy plate with a small coefficient of thermal expansion, and 12 is an iron plate that is easily formed by pressing and has a skirt portion 9 and The second member 12 has an L-shaped cross-sectional shape, and a non-porous peripheral edge 7 which is bent at a substantially right angle and extends toward the center. The outer surface of the joint 12a on the inner peripheral edge of the hole periphery 7 and the inner surface of the joint 11a on the outer peripheral edge of the first member 11 are overlapped with a width W over the entire circumference, and the overlapped joint 11a , 12a are welded by a method such as seam welding.

この例のように構成されたアパーチヤマスク2
は、有孔曲面部5が熱膨張係数の小さいニツケル
合金薄板で形成されているので、従来のアパーチ
ヤマスク2の全体をニツケル合金薄板で構成した
ものと同様に、電子ビーム射突による変形が小さ
い。
Aperture mask 2 configured as in this example
Since the perforated curved surface portion 5 is formed of a nickel alloy thin plate with a small coefficient of thermal expansion, deformation due to electron beam impact is less likely to occur, similar to the conventional aperture mask 2 made entirely of a nickel alloy thin plate. small.

他方、第2の部材12を加工性の良い鉄板で構
成しているので、プレス成形時のスプリングバツ
クが少なく、所定の精度で成形できるので、フレ
ーム3にアパーチヤマスク2を取り付ける際に、
有孔曲面部5を歪を与えることがない。
On the other hand, since the second member 12 is made of an iron plate with good workability, there is little spring back during press molding, and the molding can be performed with a predetermined precision.
The perforated curved surface portion 5 is not distorted.

第3図は接合形アパーチヤマスクの別の例の正
面図で、超大形のアパーチヤマスクの正面図であ
る。
FIG. 3 is a front view of another example of a bonded aperture mask, and is a front view of an extra-large aperture mask.

この例では、アパーチヤマスク2の長辺部分の
スカート部9aおよびこれにつづく無孔周縁部7
aを第2の部材12で構成し、有孔曲面部5およ
びこれにつづく無孔周縁部7b、スカート部9b
を第1の部材11で構成し、第1、第2の部材1
1,12は、重ね合わされた接合部11aと12
aを全域にわたつてシーム溶接などの方法で溶着
したものである。
In this example, the skirt portion 9a of the long side portion of the aperture mask 2 and the non-porous peripheral portion 7
a is composed of a second member 12, which includes a perforated curved surface portion 5, a non-perforated peripheral portion 7b following this, and a skirt portion 9b.
is composed of a first member 11, and the first and second members 1
1 and 12 are superposed joint parts 11a and 12
A is welded over the entire area by a method such as seam welding.

この例のように構成とすると、第1の部材11
を両側のスカート部9aを含まない寸法幅の材料
で材料取りができるので、超大形アパーチヤマス
クの材料費を大幅に低減することができる。
If configured as in this example, the first member 11
Since it is possible to use material with a width that does not include the skirt portions 9a on both sides, the material cost of the super-large aperture mask can be significantly reduced.

しかしながら、接合形アパーチヤマスクは、そ
の外周部に接合部があるため、有孔曲面部の高精
度な形成がきわめて困難である。
However, since the bonded aperture mask has a bonded portion on its outer periphery, it is extremely difficult to form a perforated curved surface portion with high precision.

この発明は上記事情にかんがみてなされたもの
で、有孔曲面部の周辺に第1の部材と第2の部材
の接合部があつても、有孔曲面部の高精度な成形
が可能なアパーチヤマスクの製造方法を提供する
ことを目的とする。
This invention has been made in view of the above circumstances, and provides an aperture that allows highly accurate molding of a curved surface portion with holes even if there is a joint between the first member and the second member around the curved surface portion with holes. The purpose of the present invention is to provide a method for manufacturing a tea mask.

〔問題点を解決するための手段〕[Means for solving problems]

この発明によるアパーチヤマスクの製造法は、
上記の第1の部材の外周縁の接合部と上記第2の
部材の内周縁と接合部とを重ね合わせてその重ね
合わせた接合部を全周にわたり溶着してフラツト
マスクを形成する工程と、上記第1の部材が全面
にわたりプレス成形金型のパンチの凸曲面に当接
する向きとなるように上記フラツトマスクをプレ
ス成形金型内に装填する工程と、上記パンチの外
周に配設されたアウタ金型で上記第2の部材の周
縁部を保持する工程と、上記パンチを押し出して
上記第1の部材およびこれにつづく第2の部材の
無孔周縁部を球面に成形するとともに上記パンチ
とこれに向かい合うダイとの間で上記接合部を挟
持する工程と、上記第2の部材の周縁部の保持を
解除する工程と、上記パンチとダイとで上記第1
および第2の部材の接合部を挟持したままで上記
第2の部材の外周縁部を上記アウタ金型内に押し
込んでほぼ直角に折り曲げられたスカート部を形
成する工程とを具備したことを特徴とする。
The method for manufacturing an aperture mask according to this invention is as follows:
forming a flat mask by overlapping the outer peripheral edge joint of the first member and the inner peripheral edge of the second member and welding the overlapping joint over the entire circumference; loading the flat mask into the press molding die so that the first member is oriented to abut against the convex curved surface of the punch of the press molding die over the entire surface; and an outer mold disposed around the outer periphery of the punch. holding the peripheral edge of the second member, and pushing out the punch to form the non-porous peripheral edge of the first member and the second member following it into a spherical surface, and facing the punch. a step of sandwiching the joint portion with the die; a step of releasing the holding of the peripheral edge of the second member; and a step of holding the joint portion between the punch and the die;
and a step of pushing the outer peripheral edge of the second member into the outer mold while holding the joint portion of the second member to form a skirt portion bent at a substantially right angle. shall be.

〔作用〕[Effect]

この発明の製造方法によれば、第1の部材の外
周縁の接合部と第2の部材の内周縁の接合部とを
重ね合わせ、その重ね合わせた接合部を全周にわ
たり溶着して、一体のフラツトマスクを形成し、
その後、有孔曲面部を形成する第1の部材が、全
面にわたり金型のパンチの凸曲面に当接する向き
となるように配置し、かつ第1の部材と第2の部
材の接合部を上記パンチとこれに対向するダイと
の間で挟持しながら、プレス加工を施すようにし
たから、有孔曲面部の周辺に第1の部材と第2の
部材の接合部があつても、有孔曲面部の高精度な
成形を達成することができる。
According to the manufacturing method of the present invention, the joint portion of the outer peripheral edge of the first member and the joint portion of the inner peripheral edge of the second member are overlapped, and the overlapped joint portions are welded over the entire circumference to form an integral piece. form a flat mask of
Thereafter, the first member forming the perforated curved surface portion is arranged so as to be in contact with the convex curved surface of the punch of the mold over the entire surface, and the joint portion of the first member and the second member is Since pressing is performed while being held between the punch and the die facing it, even if there is a joint between the first member and the second member around the perforated curved surface, the perforated High precision molding of curved surfaces can be achieved.

〔発明の実施例〕 以下、この発明によるアパーチヤマスクの製造
方法を、第1図で示す接合形アパーチヤマスクに
つき、第4図および第5図により説明する。
[Embodiments of the Invention] Hereinafter, a method for manufacturing an aperture mask according to the present invention will be explained with reference to FIGS. 4 and 5 using the bonded aperture mask shown in FIG. 1.

まず、第4図に示すフラツトマスク13を製造
する。
First, a flat mask 13 shown in FIG. 4 is manufactured.

フラツトマスク13は、有孔曲面部5を形成す
る面域に、透孔10が形成されている平板状の第
1の部材11と、その第1の部材11の外周縁の
接合部11aと、幅Wでもつて重なる内周縁の接
合部12aを形成する大きな透孔を有し、無孔周
縁部7とこれにつづくスカート部9とを形成する
幅を有する額縁に形成されている平板状の第2の
部材12とを、その接合部11a,12aの部分
で重ね合わせ、この接合部11a,12aをシー
ム溶接などの方法で全域にわたつて溶接して一体
の板状の形成したものである。
The flat mask 13 includes a flat first member 11 in which a through hole 10 is formed in a surface area forming the perforated curved surface portion 5, a joint 11a of the outer peripheral edge of the first member 11, and a width. A flat second plate-shaped second frame is formed on the picture frame and has a large through hole that forms the joint 12a of the inner peripheral edge that overlaps with the W, and has a width that forms the non-porous peripheral edge part 7 and the skirt part 9 that follows this. The members 12 are overlapped at their joint portions 11a and 12a, and the joint portions 11a and 12a are welded over the entire area by a method such as seam welding to form an integral plate.

このフラツトマスク13を第5図aに示す金型
により、形成する。金型20は、パンチ21、ダ
イ22、アウタ上型23、アウタ下型24で構成
され、図示していない押圧装置と、スライド機構
により、それぞれ矢印A方向に上下できるように
構成されており、パンチ21の下面は、成形しよ
うとするアパーチヤマスクの球面形状に、スプリ
ングバツクを加味した凸曲面21aに形成され、
ダイ22は外形がパンチ21の外形と一致し、そ
の周縁部だけが全周にわたつてパンチ21の凸曲
面21aと摺り合わせた凹曲面22aに形成され
ている。また、アウタ上型23と、アウタ下型2
4とは、向い合う周縁部が摺り合わされた曲面に
形成されている。
This flat mask 13 is formed using a mold shown in FIG. 5a. The mold 20 is composed of a punch 21, a die 22, an outer upper mold 23, and an outer lower mold 24, and is configured to be able to move up and down in the direction of arrow A using a pressing device and a slide mechanism (not shown). The lower surface of the punch 21 is formed into a convex curved surface 21a that has a spring back in addition to the spherical shape of the aperture mask to be formed.
The outer shape of the die 22 matches the outer shape of the punch 21, and only its peripheral edge is formed into a concave curved surface 22a that rubs against the convex curved surface 21a of the punch 21 over the entire circumference. In addition, an outer upper mold 23 and an outer lower mold 2
4 is formed into a curved surface with opposing peripheral edges rubbed together.

まず、第5図aに示すように、フラツトマスク
13を金型20に装てんする。この場合、第1、
第2の部材の接合部11a,12aが、ダイ22
の周縁部の凹曲面22a上に位置するように置か
れる。
First, as shown in FIG. 5a, the flat mask 13 is loaded into the mold 20. In this case, the first
The joint portions 11a and 12a of the second member are connected to the die 22.
It is placed on the concave curved surface 22a of the peripheral edge of.

つぎに、第5図bに示すように、アウタ上型2
3を矢印B方向に押し下げ、フラツトマスク13
の周縁部における第2の部材12をアウタ下型2
4との間で堅固に挾持する。
Next, as shown in FIG. 5b, the outer upper mold 2
3 in the direction of arrow B, flat mask 13
The second member 12 at the peripheral edge of the outer lower mold 2
Hold firmly between 4 and 4.

この挾持後、第5図cに示すように、パンチ2
1を矢印C方向に押し下げて、フラツトマスク1
3をパンチ21の凸曲面21aに沿うように押し
延ばし、第1の部材11で有孔曲面部5およびこ
れにつづく第2の部材12で無孔周縁部7が球面
に成形されるとともに、接合部11a,12a
が、パンチ21の凸曲面21aの周縁部分と、ダ
イ22の周縁部の凹曲面22aとの間で堅固に挾
持される。
After this clamping, as shown in Figure 5c, punch 2
1 in the direction of arrow C, flat mask 1
3 along the convex curved surface 21a of the punch 21, the perforated curved surface portion 5 is formed into a spherical surface by the first member 11, and the non-perforated peripheral portion 7 is formed into a spherical surface by the second member 12, and joined. Parts 11a, 12a
is firmly held between the peripheral edge of the convex curved surface 21a of the punch 21 and the concave curved surface 22a of the peripheral edge of the die 22.

さらに、第5図dに示すように、アウタ上型2
3に加えていた押圧力をゆるめるとともに、パン
チ21に一層強い押圧力を加えて矢印D方向に押
し下げる。この工程では、パンチ21とダイ22
はフラツトマスク13を挾んだまま矢印Eの方向
に移動し、アウタ下型24内に押し込まれ、折り
曲げ線8から絞られてスカート部9が成形され
る。
Furthermore, as shown in FIG. 5d, the outer upper mold 2
The pressing force applied to the punch 21 is loosened, and a stronger pressing force is applied to the punch 21 to push it down in the direction of arrow D. In this process, the punch 21 and die 22
moves in the direction of arrow E while holding the flat mask 13, is pushed into the outer lower mold 24, and is squeezed from the bending line 8 to form the skirt portion 9.

最後に、パンチ21およびアウタ上型23の押
圧力を解除して、パンチ21を上方に引き上げ、
成形されたアパーチヤマスク2を取り出す。
Finally, the pressing force of the punch 21 and the outer upper mold 23 is released, and the punch 21 is pulled upward.
The molded aperture mask 2 is taken out.

この成形工程において、第1、第2の部材の接
合部11a,12aがパンチ21とダイ22との
間で挾持され、パンチ21の凸曲面21aに第1
の部材11の有孔曲面部5およびそれにつづく周
縁が全面にわたつて当接して球面に成形されるの
で、接合部11a,12aが存在するにもかかわ
らず、一枚のフラツトマスクを成形するのと同様
の曲面精度に成形することができる。
In this forming process, the joint parts 11a and 12a of the first and second members are held between the punch 21 and the die 22, and the convex curved surface 21a of the punch 21
Since the perforated curved surface part 5 of the member 11 and the peripheral edge following it contact over the entire surface and are molded into a spherical surface, it is difficult to mold a single flat mask despite the presence of the joint parts 11a and 12a. It can be molded with similar curved surface accuracy.

なお、接合部11a,12aが全域にわたつて
強固に溶着されておれば、接合部11a,12a
が必ずしもパンチ21とダイ22の間で挾まされ
ることは必要でない。
Note that if the joint parts 11a and 12a are firmly welded over the entire area, the joint parts 11a and 12a
It is not necessary that the die be sandwiched between the punch 21 and the die 22.

また、第5図cに示す成型工程において、フラ
ツトマスク13が、パンチ21とダイ22で挾ま
れている部分で滑つたり、また、同図dに示す成
形工程において、スカート部9を形成するときの
影響をうけて有孔曲面部5の精度が損なわれたり
するのを防止するため、第6図に示すように、パ
ンチ21の周縁部とダイ22の凹曲面22aと
に、ビード成形部21b,22bを設け、フラツ
トマスク13の接合部11a,12aの部分に、
環状のビードを形成してもよい。
Furthermore, in the molding step shown in FIG. 5c, the flat mask 13 may slip at the portion sandwiched between the punch 21 and the die 22, and in the molding step shown in FIG. 5d, when forming the skirt portion 9. In order to prevent the accuracy of the perforated curved surface portion 5 from being impaired due to the influence of , 22b are provided, and at the joint portions 11a and 12a of the flat mask 13,
An annular bead may also be formed.

つぎに、第3図にような第2の部材が第1の部
材の外周に部分的に配置されているアパーチヤマ
スクの製造方法を説明する。
Next, a method of manufacturing an aperture mask in which the second member as shown in FIG. 3 is partially disposed around the outer periphery of the first member will be described.

この場合も、有孔曲面部5と、これにつづく短
辺側の無孔周縁部7bおよびスカート部9bとを
形成するのに必要な幅と長さとを有し、有孔曲面
部5を形成する面域に透孔10が一定パターンで
形成された第1の部材11に、長辺側の無孔周縁
部7aおよびこれにつづくスカート部9aを形成
するのに必要な幅と長さに形成された2つの第2
の部材12とを、幅Wだけ重ね合わせてシーム溶
接などの方法で全域にわたつて溶着することによ
り、フラツトマスク13を形成し、その後、前記
金型20を用いて同様に成形することにより、第
3図のようなアパーチヤマスク2を製造すること
ができる。
Also in this case, it has the width and length necessary to form the perforated curved surface part 5, the non-perforated peripheral part 7b on the short side following this, and the skirt part 9b, and forms the perforated curved surface part 5. The first member 11 has through holes 10 formed in a constant pattern in the surface area thereof, and is formed to have the width and length necessary to form the non-porous peripheral portion 7a on the long side and the skirt portion 9a following this. two second
A flat mask 13 is formed by overlapping the members 12 by the width W and welding them over the entire area by a method such as seam welding, and then molding the same using the mold 20. An aperture mask 2 as shown in FIG. 3 can be manufactured.

〔発明の効果〕〔Effect of the invention〕

この発明に係るアパーチヤマスクの製造方法
は、有孔曲面全面にわたつて、金型のパンチの凸
曲面に接するようにするとともに、接合部をパン
チとこれに対向するダイとの間で挾持して、プレ
ス加工を施すようにしたので、第1、第2の部材
の重ね合わせた接合部が存在しても、高精度なア
パーチヤマスクを得ることができる。
In the method for manufacturing an aperture mask according to the present invention, the entire curved surface with holes is brought into contact with the convex curved surface of the punch of the mold, and the joint portion is sandwiched between the punch and the die facing the punch. Since pressing is performed, a highly accurate aperture mask can be obtained even if there is a joint where the first and second members overlap.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の製造方法が適用されるアパ
ーチヤマスクの一例の正面図、第2図は第1図の
−線矢視断面図、第3図はこの発明の製造方
法が適用されるアパーチヤマスクの他の例の正面
図、第4図はこの発明の製造方法における工程途
中のフラツトマスクの形状を示す平面図、第5図
a〜dはこの発明の製造方法の一部をなすプレス
成形工程を説明するための断面図、第6図は他の
実施例のプレス成形工程を説明するための要部の
拡大断面図、第7図は従来のシヤドウマスクの一
部破断斜視図である。 2……アパーチヤマスク、5……有孔曲面部、
7,7a,7b……無孔周縁部、9,9a,9b
……スカート部、10……透孔、11……第1の
部材、11a,12a……接合部、12……第2
の部材、13……フラツトマスク、21……パン
チ、22……ダイ、23……アウタ上型、24…
…アウタ下型、21b,22b……ビード成形
部。なお、図中、同一符号はそれぞれ同一、また
は相当部分を示す。
FIG. 1 is a front view of an example of an aperture mask to which the manufacturing method of the present invention is applied, FIG. 2 is a sectional view taken along the - line in FIG. A front view of another example of the aperture mask, FIG. 4 is a plan view showing the shape of the flat mask in the middle of the process in the manufacturing method of the present invention, and FIGS. 5 a to d are presses forming a part of the manufacturing method of the present invention. FIG. 6 is an enlarged sectional view of essential parts for explaining the press molding process of another embodiment, and FIG. 7 is a partially cutaway perspective view of a conventional shadow mask. 2...Aperture mask, 5...Perforated curved surface part,
7, 7a, 7b... non-porous peripheral portion, 9, 9a, 9b
... Skirt part, 10 ... Through hole, 11 ... First member, 11a, 12a ... Joint part, 12 ... Second
members, 13...Flat mask, 21...Punch, 22...Die, 23...Outer upper mold, 24...
...Outer lower mold, 21b, 22b...Bead forming part. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】[Claims] 1 電子ビームの通る透孔が所定のパターンで形
成されかつ所定形状の有孔曲面部に形成された第
1の部材と、スカート部およびこのスカート部に
つづくほぼ直角に曲げられた中心方向へ延在する
無孔周縁部を形成してなる第2の部材との重ね合
わせ部を溶着してなるアパーチヤマスクの製造法
において、上記第1の部材の外周縁の接合部と上
記第2の部材の内周縁の接合部とを重ね合わせて
その重ね合わせた接合部を全周にわたり溶着して
フラツトマスクを形成する工程と、上記第1の部
材が全面にわたりプレス成形金型のパンチの凸曲
面に当接する向きとなるように上記フラツトマス
クをプレス成形金型内に装填する工程と、上記パ
ンチの外周に配設されたアウタ金型で上記第2の
部材の周縁部を保持する工程と、上記パンチを押
し出して上記第1の部材およびこれにつづく第2
の部材の無孔周縁部を球面に成形するとともに上
記パンチとこれに対向するダイとの間で上記接合
部を挟持する工程と、上記第2の部材の周縁部の
保持を解除する工程と、上記パンチとダイとで上
記第1および第2の部材の接合部を挟持したまま
上記第2の部材の外周縁部を上記アウタ金型内に
押し込んでほぼ直角に折り曲げられたスカート部
を形成する工程とを具備したことを特徴とするア
パーチヤマスクの製造方法。
1. A first member in which through-holes through which electron beams pass are formed in a predetermined pattern and formed in a perforated curved surface portion having a predetermined shape, a skirt portion, and a skirt portion extending toward the center bent at an approximately right angle following the skirt portion. In the method for manufacturing an aperture mask, the overlapping portion with a second member formed with a non-porous peripheral portion is welded, wherein the joint portion of the outer peripheral edge of the first member and the second member are welded together. A step of forming a flat mask by overlapping the joined portions of the inner circumferential edges of the first member and welding the overlapping joined portions all around the circumference, and a step of making the first member entirely contact the convex curved surface of the punch of the press molding die. loading the flat mask into a press molding die so that they are in contact with each other; holding the peripheral edge of the second member with an outer die disposed around the outer periphery of the punch; Extrude the first member and the second member following this.
a step of forming a non-porous peripheral portion of the second member into a spherical surface and sandwiching the joint portion between the punch and a die opposing the punch; a step of releasing the holding of the peripheral portion of the second member; Pushing the outer peripheral edge of the second member into the outer mold while holding the joint portion of the first and second members between the punch and die to form a skirt portion bent at a substantially right angle. A method for manufacturing an aperture mask, comprising the steps of:
JP14743985A 1985-07-02 1985-07-02 Aperture mask and its manufacture Granted JPS628431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14743985A JPS628431A (en) 1985-07-02 1985-07-02 Aperture mask and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14743985A JPS628431A (en) 1985-07-02 1985-07-02 Aperture mask and its manufacture

Publications (2)

Publication Number Publication Date
JPS628431A JPS628431A (en) 1987-01-16
JPH0515020B2 true JPH0515020B2 (en) 1993-02-26

Family

ID=15430360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14743985A Granted JPS628431A (en) 1985-07-02 1985-07-02 Aperture mask and its manufacture

Country Status (1)

Country Link
JP (1) JPS628431A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627442A (en) * 1992-07-09 1994-02-04 Nec Kagoshima Ltd Color liquid crystal display device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6450338A (en) * 1987-08-21 1989-02-27 Hitachi Ltd Manufacture of shadow mask frame
JPH02204943A (en) * 1989-02-01 1990-08-14 Mitsubishi Electric Corp Spread type shadow mask structure and manufacture thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013551B2 (en) * 1971-10-01 1975-05-20
JPS5344463B2 (en) * 1972-12-18 1978-11-29
JPS5465471A (en) * 1977-11-04 1979-05-26 Hitachi Ltd Color picture tube

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013551U (en) * 1973-06-04 1975-02-13
JPS581955Y2 (en) * 1976-09-20 1983-01-13 株式会社東芝 Tension holding device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013551B2 (en) * 1971-10-01 1975-05-20
JPS5344463B2 (en) * 1972-12-18 1978-11-29
JPS5465471A (en) * 1977-11-04 1979-05-26 Hitachi Ltd Color picture tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627442A (en) * 1992-07-09 1994-02-04 Nec Kagoshima Ltd Color liquid crystal display device

Also Published As

Publication number Publication date
JPS628431A (en) 1987-01-16

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