JPH05146766A - Cleaner - Google Patents

Abstract

PURPOSE:To reduce the amt. of water to be used in the cleaner by controlling the water supplying time of a cleaning nozzle when the arrival of a material to be cleaned at the conveyor corresponding to each treating tank is detected. CONSTITUTION:A substrate 29 is conveyed by a net conveyor 1, when an operating switch is turned on, and a control relay X14 is energized. The substrate 29 is detected by a first photosensor 24 at the inlet to an ultrasonic cleaning tank 2, an inverter 30 is actuated, hence the first control relay X1 is energized, a contact X1A is closed, a ninth control relay X9 is energized, and an ultrasoninc vibrator 47 is operated. When the arrival of the substrate at a rough washing tank 3 is detected by a photosensor 25, an inverter 31 is actuated, a water feed solenoid valve 12 is opened through the control relays X2 and X10, and water is sprinkled from a shower nozzle 9. The water is supplied for the time determined by the capacitor C1 and resistance R11. Washing tanks 4 and 5 are also operated in the same way.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus in which a plurality of processing tanks are arranged along the conveying direction of an object to be cleaned and the conveyed object to be cleaned is sequentially cleaned in each processing tank.

In this specification, "cleaning" means
It also includes rinsing.

[0003]

2. Description of the Related Art A cleaning apparatus of this type, for example, a water-based ultrasonic cleaning apparatus for cleaning flux remaining on a board after soldering, is cleaned by a net conveyor 1 for transportation as shown in FIG. The substrate as an object is conveyed at a constant speed in the direction of the arrow A, and first reaches the cleaning tank 2 containing an alkaline detergent, and ultrasonic waves are generated by ultrasonic transducers 8 above and below the cleaning tank 2. Irradiation cleans the solder flux on the substrate. Then, the coarse rinsing tank 3, the main rinsing tank 4, and the finishing rinsing tank 5 are sequentially transported, and in each tank, shower nozzles 9 for rinsing and cleaning above and below the net conveyor 1 are provided.
Clean water is sprayed from 10 and 11 to rinse the detergent attached to the substrate. Further, the substrate after the rinse cleaning is carried to the drying tank 6 into which the air heated by the heater 20 is sent by the blower 21 to be dried and carried out.

In FIG. 4, reference numeral 22 is an operating section provided with an operation switch, 7 is an air nozzle, and 1 is an air nozzle.
4, 15 and 17 are filters, 16 is a water supply pump, 1
2 and 13 are solenoid valves for supplying water to the rough rinse tank 3 and the main rinse tank 4,
Reference numeral 18 is a pure water supply device, and 19 is a waste water purification system.

FIG. 5 is a circuit diagram of this ultrasonic cleaning device.

First, when the operation switch 48 is turned on,
The contact of the control relay X is closed, a current flows through the circuit, and the ultrasonic oscillator 4 is connected to the ultrasonic vibrator 8 of the ultrasonic cleaning tank 2.
7 operates to irradiate the cleaning liquid with ultrasonic waves. At the same time, the water supply solenoid valves 12 and 13 of the rough rinsing tank 3 and the main rinsing tank 4 are opened to supply water from the shower nozzles 9 and 10, and the pump 16 of the finishing rinsing tank 5 operates to operate the pure water supply device. Pure water from 18 is supplied from the shower nozzle 11. Further, the heater 20 and the blower 21 of the drying tank 6 are turned on to keep the temperature in the drying tank 6 at about 100 degrees. The temperature control in the drying tank 6 is controlled by the thermostat 49.
Done by.

[0007]

In such a conventional processing apparatus, the operation of each processing tank such as the rough rinsing tank 3, the main rinsing tank 4 and the finishing rinsing tank 5 is controlled only by the operation switch 48. Therefore, after the operation switch 48 is turned on, the shower nozzles 9, 10, 11 of the rough rinsing tank 3, the main rinsing tank 4, and the finishing rinsing tank 5 are used for rinsing cleaning regardless of the presence or absence of the object to be cleaned. Since water is supplied, there is a drawback that the amount of water used is large.

The present invention has been made in view of the above points, and an object thereof is to reduce the amount of water used in a cleaning device.

[0009]

In order to achieve the above object, the present invention is configured as follows.

That is, according to the present invention, a plurality of processing tanks are sequentially arranged in the conveying direction of the object to be cleaned, and a cleaning nozzle for supplying cleaning water is provided in each processing tank. In the cleaning device, the detection means for detecting whether or not the object to be cleaned has been conveyed to the conveyance position corresponding to each processing tank, and the water supply period of the cleaning nozzle based on the detection output of the detection means. And control means for controlling.

[0011]

According to the above construction, the object to be cleaned is detected at the transfer position corresponding to each processing tank, and the water supply period for cleaning is controlled based on the detected object. Therefore, it is possible to prevent water from being supplied from the cleaning nozzle.

[0012]

Embodiments of the present invention will now be described in detail with reference to the drawings.

FIG. 1 is a schematic configuration diagram of an ultrasonic cleaning apparatus according to an embodiment of the present invention, and the portions corresponding to the conventional example of FIG. 4 are designated by the same reference numerals.

This ultrasonic cleaning device is a water-based ultrasonic cleaning device that cleans the flux remaining on the board after soldering, and along the board transfer direction indicated by arrow A by the transfer net conveyor 1. The ultrasonic cleaning tank 2, the rough rinsing tank 3, the main rinsing tank 4, the finishing rinsing tank 5 and the drying tank 6 are sequentially arranged, and the space between the ultrasonic cleaning tank 2 and the rough rinsing tank 3 and the finishing rinsing are performed. Air nozzles 7 are provided between the tank 5 and the drying tank 6, respectively.

The ultrasonic cleaning tank 2 contains an alkaline detergent, and the cleaning tank 2 is provided with upper and lower ultrasonic vibrators 8. Each of the rough rinsing tank 3, the main rinsing tank 4, and the finishing rinsing tank 5 as processing tanks is rinsing cleaning for supplying water to the substrates conveyed by the net conveyor 1 to perform rinsing cleaning. Shower nozzles 9 to 11 are provided above and below. The rough rinsing tank 3 and the main rinsing tank 4 are respectively provided with water supply solenoid valves 12 and 13 and a filter 1.
Water is supplied to the finishing rinsing tank 5 via the pump 16 and the filter 17 from the pure water supply device 18, respectively. .. The drainage of each of the tanks 3, 4, and 5 is purified by the drainage purification system 19 and then drained.

The air heated by the heater 20 is fed into the drying tank 6 by the blower 21. Reference numeral 22 is an operation unit provided with an operation switch and the like, and 23 is a drive motor for the net conveyor 1.

The above construction is basically the same as that of the conventional example shown in FIG.

In this embodiment, the coarse rinsing tank 3 and the main rinsing tank 4 are used.
The ultrasonic cleaning tank 2 and the rough rinsing tank are used so as to reduce the amount of water and pure water used in the finishing rinsing tank 5 and not to drive the ultrasonic vibrator 8 of the ultrasonic cleaning tank 2 unnecessarily. 3, reflection-type first to fifth photosensors 24 to 28 are provided at the entrances of the main rinsing tank 4, the finishing rinsing tank 5, and the drying tank 6 as detection means for detecting the substrate. 2 and 3 for controlling the drive period of the ultrasonic transducer 8 and the period of water supply from the shower nozzles 9, 10, 11 in each tank 3, 4, 5 based on the outputs of the sensors 24 to 28. A control circuit having a configuration is provided.

In this embodiment, as shown in FIG. 2, the control circuit includes a substrate 2 conveyed by a net conveyor 1.
Of the first to fifth inverters 30 to 34 and the first to fourth inverters 30 to 33 that provide high level output when each transistor of the first to fifth photo sensors 24 to 28 is turned on. First to fourth transistor arrays 35 to 38 to which outputs are given, and second to fifth inverters 31
~ 34 to a high-level output of the first to fourth monostable multivibrator 3 which outputs a pulse of a constant time width
9 to 42 and the first to fourth monostable multivibrators 39
To fifth to eighth transistor arrays 43 to 46 to which the outputs of .about.42 are given, and first to eighth control relays X1 to X8, and further for the ultrasonic oscillator 47 and the rough rinsing tank shown in FIG. Water supply solenoid valve 12, water supply solenoid valve 1 for the main rinsing tank
3. Pump 16 for supplying water to the finishing rinsing tank and drying tank 6
No. 9 to No. 9 provided on the power supply line of the heater 20 of
The 14th control relay X9-X14 is provided. In FIG. 2, R1 to R5 are current limiting resistors, and R6 to R10.
Is the load resistance.

Next, the operation of the ultrasonic cleaning apparatus having the above structure will be described.

First, as in the conventional case, when the operation switch 48 shown in FIG. 3 is turned on, the transfer of the substrate 29 by the net conveyor 1 at a constant speed is started and the fourteenth control relay X14 of FIG. 3 is energized. The contact X14
(A) is closed and current flows through the circuit.

When the substrate 29 is conveyed and reaches the entrance of the ultrasonic cleaning tank 2 and the substrate 29 is detected by the first photosensor 24, the transistor built in the first photosensor 24 shown in FIG. Since the input of the first inverter 30 becomes low level, the output of the inverter 30 becomes high level and the first transistor array 35 turns on, whereby the first control relay X1 is energized. This first
When the control relay X1 is energized, the contact X1 (A) of the first control relay X1 shown in FIG. 3 is closed and the ninth control relay X9 is energized, and the contact X9 (A) is closed to cause the ultrasonic oscillator. 47 starts operation. The energization of the ninth control relay X9 is self-maintained by the A contact X9 (A) of the relay X9 and the B contact X3 (B) of the third control relay X3.

Next, the substrate 29 is transferred from the ultrasonic cleaning tank 2 to the rough rinsing tank 3 and the second photosensor 25 of the rough rinsing tank 3 is conveyed.
When the substrate 29 is detected, the transistor built in the second photosensor 25 shown in FIG. 2 is turned on and the input of the second inverter 31 becomes low level.
Output becomes high level and the second transistor array 3
6 is turned on, so that the second control relay X2 is energized. When the second control relay X2 is energized
The contact X2 (A) of the second control relay X2 shown in Fig. 2 is closed and the tenth control relay X10 is energized.
(A) is closed and the water supply solenoid valve 12 of the rough rinsing tank 3 is opened, and water is applied to the substrate from the shower nozzle 9 of the rough rinsing tank 3 to perform rinsing and cleaning. The tenth control relay X10 is energized by the A contact X10 (A) of the relay X10 and the fifth control relay X5.
It is self-held by the B contact X5 (B).

When the second photosensor 25 detects the substrate 29 and the output of the second inverter 31 shown in FIG. 2 becomes high level, in response to this, it is externally attached from the first monostable multivibrator 39. A pulse having a time width t determined by the capacitor C1 and the resistor R11 is output, whereby the fifth transistor array 43 is turned on and the third transistor array 43 is turned on.
The control relay X3 is energized for the time width t, the B contact X3 (B) of the third control relay X3 shown in FIG. 3 is opened only for the time width t, and the self-holding of the ninth control relay X9 is released. Then, the control relay X9 is de-energized and the ultrasonic oscillator 47 stops operating. The ultrasonic oscillator 47
The operation is stopped until the next substrate 29 is conveyed by the net conveyor 1 and detected by the first photo sensor 24.

That is, when the substrate 29 is detected on the side of the rough rinsing bath 3, rinsing and cleaning is started by the shower nozzle 9 on the side of the rough rinsing bath 3, and the substrate 29 is further washed from the ultrasonic cleaning bath 2 to the rough rinsing bath 3. After a time t corresponding to a period in which the ultrasonic cleaning tank 2 is completely transported, the ultrasonic cleaning of the ultrasonic cleaning tank 2 is stopped. That is, the ultrasonic oscillator 47 operates according to the period in which the substrate 29 is present in the ultrasonic cleaning tank 2.

Next, when the substrate 29 is conveyed from the rough rinsing bath 3 to the main rinsing bath 4 and the third photo sensor 26 of the main rinsing bath 4 detects the substrate 29, the third photo sensor 26 shown in FIG. Transistor turns on, and the third inverter 32
Becomes a low level, the output of the inverter 32 becomes a high level and the third transistor array 37 is turned on, whereby the fourth control relay X4 is energized. When the fourth control relay X4 is energized, the contact X4 (A) of the fourth control relay X4 shown in FIG. 3 is closed and the eleventh control relay X11 is energized.
(A) is closed and the water supply solenoid valve 13 of the main rinsing tank 4 is opened, and water is jetted from the shower nozzle 10 of the main rinsing tank 4 to the substrate 29 for rinsing and cleaning. Energization to the eleventh control relay X11 is self-maintained by the A contact X11 (A) of the relay X11 and the B contact X7 (B) of the seventh control relay X7.

When the third photosensor 26 detects the substrate 29 and the output of the third inverter 32 shown in FIG. 2 becomes high level, the third photosensor 26 is externally attached to the second monostable multivibrator 40 in response to this. A pulse having a time width t determined by the capacitor C2 and the resistor R12 is output, whereby the sixth transistor array 44 is turned on and the fifth transistor array 44 is turned on.
The control relay X5 is energized for the time width t, the B contact X5 (B) of the fifth control relay X5 shown in FIG. 3 is opened for the time width t, and the self-holding of the tenth control relay X10 is released. Then, the control relay X10 is de-energized, the electromagnetic solenoid valve 12 of the rough rinsing tank 3 is closed, and the water supply from the shower nozzle 9 is stopped. Water supply solenoid valve 12 for rough rinsing tank 3
Is closed until the next substrate 29 is conveyed by the net conveyor 1 and detected by the second photosensor 25.

That is, when the substrate 29 is detected on the main rinsing tank 4 side, rinsing is started by the shower nozzle 10 on the main rinsing tank 4 side, and further, the substrate 29 is completely transferred from the rough rinsing tank 3 to the main rinsing tank 4. After a time t corresponding to the time period during which the shower nozzle 9 of the rough rinsing tank 3 is carried out, the rinsing cleaning is stopped. That is, the cleaning by the shower nozzle 9 of the rough rinsing tank 3 is performed corresponding to the period in which the substrate 29 exists in the rough rinsing tank 3.

Similarly, when the substrate 29 is conveyed from the main rinsing tank 4 to the finishing rinsing tank 5 and the fourth photosensor 27 of the finishing rinsing tank 5 detects the substrate, the built-in fourth photosensor 27 shown in FIG. Since the transistor is turned on and the input of the fourth inverter 33 becomes low level, the inverter 3
The output of No. 3 becomes high level and the fourth transistor array 38 is turned on, whereby the sixth control relay X6 is energized. When the sixth control relay X6 is energized, the contact X6 (A) of the sixth control relay X6 shown in FIG. 3 is closed and the twelfth control relay X12 is energized, and the contact X1.
2 (A) is closed and the pump 16 of the finishing rinsing tank 5 starts operating, and pure water is supplied from the shower nozzle 11 of the finishing rinsing tank 5 to perform rinsing and cleaning. 12th control relay X12
The energization to the self is maintained by the A contact X12 (A) of the relay X12 and the B contact X8 (B) of the eighth control relay X8.

When the fourth photosensor 27 detects the substrate 29 and the output of the fourth inverter 33 shown in FIG. 2 becomes high level, in response to this, the third monostable multivibrator 41 is externally attached. A pulse having a time width t determined by the capacitor C3 and the resistor R13 is output, whereby the seventh transistor array 45 is turned on and the seventh transistor array 45 is turned on.
The control relay X7 is energized for the time width t, the B contact X7 (B) of the seventh control relay X7 shown in FIG. 3 is opened for the time width t, and the self-holding of the eleventh control relay X11 is released. Then, the control relay X11 is de-energized, the water supply solenoid valve 13 of the main rinsing tank 4 is closed, and the water supply from the shower nozzle 10 is stopped. Water supply solenoid valve 1 for main rinsing tank 4
5 is closed until the next substrate 29 is conveyed by the net conveyor 1 and detected by the third photo sensor 26.

That is, when the substrate 29 is detected on the side of the finishing rinsing tank 5, the shower nozzle 11 on the side of the finishing rinsing tank 5 is detected.
After the rinsing cleaning by the above is started, and after the time t corresponding to the period in which the substrate 29 is completely transported from the main rinsing tank 4 to the finishing rinsing tank 5, the shower nozzle 1 of the main rinsing tank 4 is
Stop wash with 0. That is, the rinse cleaning by the shower nozzle 10 of the main rinsing tank 4 is performed corresponding to the period in which the substrate 29 exists in the main rinsing tank 4.

Next, when the substrate 29 is transferred from the finishing rinsing tank 5 to the drying tank 6 and the fifth photosensor 28 of the drying tank 6 detects the substrate 29, the transistor incorporated in the fifth photosensor 28 shown in FIG. Turns on and the fifth inverter 34
Becomes low level, the output of the inverter 34 becomes high level, and in response to this, the capacitor C4 externally connected from the fourth monostable multivibrator 42 is connected.
And a pulse having a time width t determined by the resistor R14 is output. As a result, the eighth transistor array 46 is turned on, the eighth control relay X8 is energized for the time width t, and the eighth control relay shown in FIG. X8 B contact X8
(B) opens for the duration t and opens the 12th control relay X
The self-holding of 12 is released, the control relay X12 is no longer energized, the pump 16 of the finishing rinsing tank 5 is stopped, and the supply of pure water from the shower nozzle 11 is stopped. The pump 16 of the finishing rinse tank 5 is stopped until the next substrate 29 is conveyed by the net conveyor 1 and detected by the fourth photo sensor 27.

That is, when the substrate 29 is detected on the drying bath 6 side, after the time t corresponding to a period in which the substrate 29 is completely transferred from the finishing rinse bath 5 to the drying bath 6, the finishing rinse bath 5 is discharged. The rinse cleaning by the shower nozzle 11 is stopped. That is, the shower nozzle 11 of the finishing rinse tank 5
The cleaning by is performed corresponding to the period in which the substrate 29 is present in the finish rinsing tank 5.

Since the drying tank 6 has a time delay after the heater 20 is inserted and the temperature inside the drying tank 6 rises to the specified temperature, the drying tank 6 is always operated during the operation.
The temperature is controlled by the thermostat 49.

As described above, in the rough rinsing tank 3, the main rinsing tank 4 and the finishing rinsing tank 5, the photosensors 25 and 2 are provided.
Shower nozzles 9, 10, 11 corresponding to a period from when the substrate 29 is detected in 6, 27 until it is completely transported to the next tank, that is, a period in which the substrate 29 exists.
Since water and pure water are supplied for rinsing and washing from above, the usage amount of water and pure water is reduced during operation regardless of the presence or absence of the substrate 29, compared to the conventional example in which water and pure water are always supplied during operation. It will be.

In the above embodiment, the control relay X1
Although the control circuit is configured by using .about.X14 or the like, it may be controlled by a microcomputer as another embodiment of the present invention.

Further, in the above-described embodiment, the water supply to the tank at the front stage is stopped based on the output of the photo sensor at the entrance of the rear stage, but the output of the photo sensor at the rear stage is not used, The water supply to the tank in the preceding stage may be stopped after a certain time elapses from the output of the photosensor at the entrance to the entrance, or photosensors may be provided at the entrance and the exit for each tank.

[0038]

As described above, according to the present invention, the detection means for detecting whether or not the object to be cleaned has been conveyed to the conveyance position corresponding to each processing tank is provided, and based on the output of this detection means, Since the water supply period for cleaning in each treatment tank is controlled, the amount of water used in each treatment tank can be reduced.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of an embodiment of the present invention.

FIG. 2 is a circuit diagram of the embodiment shown in FIG.

FIG. 3 is a circuit diagram of a power supply line of the embodiment of FIG.

FIG. 4 is a schematic configuration diagram of a conventional example.

FIG. 5 is a circuit diagram of a conventional example.

[Explanation of symbols]

 2 Ultrasonic cleaning tank 3 Rough rinsing tank 4 main rinsing tank 5 Finishing rinsing tank 9, 10, 11 Shower nozzle 12, 13 Water supply solenoid valve 16 Pump 24-28 1st-5th photosensor X1-X14 1st-14th Control relay

Claims (1)

[Claims] 1. A cleaning apparatus comprising a plurality of processing tanks arranged in sequence in the direction of conveyance of an object to be cleaned, and a cleaning nozzle for supplying water for cleaning to each processing tank. There is a detection means for detecting whether or not the object to be cleaned has been conveyed to the conveyance position corresponding to each processing tank, and a control means for controlling the water supply period of the cleaning nozzle based on the detection output of the detection means. And a cleaning device.