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JPH05128986A - Magnetic field type lens - Google Patents

Magnetic field type lens

Info

Publication number
JPH05128986A
JPH05128986A JP3289858A JP28985891A JPH05128986A JP H05128986 A JPH05128986 A JP H05128986A JP 3289858 A JP3289858 A JP 3289858A JP 28985891 A JP28985891 A JP 28985891A JP H05128986 A JPH05128986 A JP H05128986A
Authority
JP
Japan
Prior art keywords
electromagnetic coil
magnetic field
permanent magnet
lenses
gaps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3289858A
Other languages
Japanese (ja)
Inventor
Yoshihiro Arai
善博 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP3289858A priority Critical patent/JPH05128986A/en
Publication of JPH05128986A publication Critical patent/JPH05128986A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To reduce power consumption and to make lens control easier. CONSTITUTION:A permanent magnet 10 and an electromagnetic coil 11 are set along an optical axis, and they are surrounded by a yoke 12 except for the parts of gaps G1 and G2. The yoke 12 forms a magnetic circuit common to the permanent magnet 10 and the electromagnetic coil 11, and lenses are formed at the positions of the gaps G1 and G2. Since the lenses are formed at the positions of the gaps G1 and G2 by the composits magnetic field of the magnetic fields by the permanent magnet 10 and the electromagnetic coil 11, the two lenses can be controlled simultaneously by regulating the direction and the amount of the exciting current fed to the electromagnetic coil 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子顕微鏡の照射系等
に用いられる磁場型レンズの構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the structure of a magnetic field type lens used in an irradiation system of an electron microscope.

【0002】[0002]

【従来の技術】従来、透過型電子顕微鏡(TEM)の照
射系レンズとしては図3に示すように二つの電磁レンズ
が用いられるのが一般的である。図3において、第1コ
ンデンサレンズCL1 は電磁コイル1によって形成さ
れ、主として電子ビームのスポットサイズを調整するた
めに用いられる。また、第2コンデンサレンズCL2
電磁コイル2によって形成され、主として電子ビームの
拡がりを調整するために用いられる。なお、図3におい
て3は試料、Oは光軸を示し、電磁コイル1,2のヨー
クは省略している。
2. Description of the Related Art Conventionally, two electromagnetic lenses are generally used as an irradiation system lens of a transmission electron microscope (TEM) as shown in FIG. In FIG. 3, the first condenser lens CL 1 is formed by the electromagnetic coil 1 and is mainly used for adjusting the spot size of the electron beam. The second condenser lens CL 2 is formed by the electromagnetic coil 2 and is mainly used for adjusting the spread of the electron beam. In FIG. 3, reference numeral 3 is a sample, O is an optical axis, and the yokes of the electromagnetic coils 1 and 2 are omitted.

【0003】そして、像を低倍率で観察する場合には、
試料3の広い範囲に電子ビームを照射し、且つ輝度を得
るために、電磁コイル1は比較的弱励磁、電磁コイル2
は比較的強励磁となされ、図4Aに示すような収束状態
となされる。また、像を高倍率で観察する場合には、試
料3の狭い範囲に電子ビームを照射し、且つ電子ビーム
の平行性を高めるために、電磁コイル1は比較的強励
磁、電磁コイル2は比較的弱励磁となされ、図4Bに示
すような収束状態となされる。なお、図4A,Bにおい
て4は電子銃を示す。
When observing an image at a low magnification,
In order to irradiate a wide range of the sample 3 with the electron beam and obtain brightness, the electromagnetic coil 1 is relatively weakly excited, and the electromagnetic coil 2 is
Is relatively strongly excited, and a converged state as shown in FIG. 4A is obtained. Further, when observing an image at a high magnification, the electromagnetic coil 1 is relatively strongly excited, and the electromagnetic coil 2 is compared in order to irradiate the electron beam in a narrow area of the sample 3 and to enhance the parallelism of the electron beam. Weakly excited, and a converged state as shown in FIG. 4B is obtained. 4A and 4B, 4 indicates an electron gun.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、従来、
電子顕微鏡の照射系レンズは図3に示すように全て電磁
レンズで構成されているために、各レンズを独立に制御
できるという利点はあるものの、各レンズを形成するた
めの電磁コイルにはそれぞれ励磁電流を供給する必要が
あり、消費電力が非常に大きいものである。また、像を
観察する場合には、各電磁コイルに供給する励磁電流を
相互に関連させて設定する必要があることが通常であ
り、従って操作が煩わしいばかりでなく、その操作には
熟練を要し、操作を誤った場合には試料に必要以上の量
の電子ビームが照射され、試料が破壊されるという問題
も生じていた。これは生物試料を観察する場合には特に
顕著である。
[Problems to be Solved by the Invention] However, in the past,
As the irradiation system lens of the electron microscope is composed of all electromagnetic lenses as shown in FIG. 3, there is an advantage that each lens can be controlled independently, but the electromagnetic coils for forming each lens are respectively excited. It needs to supply an electric current and consumes a very large amount of power. Further, when observing an image, it is usually necessary to set the exciting currents to be supplied to the respective electromagnetic coils in association with each other. Therefore, not only is the operation troublesome, but the operation requires skill. However, if the operation is mistaken, there is a problem that the sample is irradiated with an excessive amount of electron beams and the sample is destroyed. This is especially noticeable when observing biological samples.

【0005】本発明は、上記の課題を解決するものであ
って、消費電力を低減することができ、且つ収束条件の
制御を容易に行うことができる磁場型レンズを提供する
ことを目的とするものである。
An object of the present invention is to solve the above problems, and an object thereof is to provide a magnetic field type lens capable of reducing power consumption and easily controlling the convergence condition. It is a thing.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の磁場型レンズは、光軸に沿って配置され
た永久磁石と、電磁コイルと、前記永久磁石と前記電磁
コイルに共通の磁気回路を形成し、且つ前記永久磁石と
前記電磁コイルの位置にギャップを備えるヨークとを備
えることを特徴とする。
In order to achieve the above object, the magnetic field type lens of the present invention includes a permanent magnet, an electromagnetic coil, the permanent magnet and the electromagnetic coil which are arranged along the optical axis. It is characterized in that a common magnetic circuit is formed and a yoke having a gap at the position of the permanent magnet and the electromagnetic coil is provided.

【0007】[0007]

【作用】レンズは各ギャップの位置に形成されるが、各
ギャップには永久磁石による磁場と、電磁コイルによる
磁場とが形成されるから、各レンズは永久磁石による磁
場と電磁コイルによる磁場との合成磁場により形成され
ることになる。従って、電磁コイルに供給する励磁電流
のみを調整することによって、容易に二つのレンズを同
時に制御することができる。
The lens is formed at the position of each gap. Since a magnetic field by a permanent magnet and a magnetic field by an electromagnetic coil are formed in each gap, each lens has a magnetic field by a permanent magnet and a magnetic field by an electromagnetic coil. It will be formed by the synthetic magnetic field. Therefore, the two lenses can be easily controlled simultaneously by adjusting only the exciting current supplied to the electromagnetic coil.

【0008】[0008]

【実施例】以下、図面を参照しつつ実施例を説明する。
図1は本発明に係る磁場型レンズをTEMの照射系レン
ズに適用した場合の一実施例の構成を示す図であり、図
中、10は永久磁石、11は電磁コイル、12はヨーク
を示し、図3と同じものについては同一の符号を付す。
Embodiments will be described below with reference to the drawings.
FIG. 1 is a diagram showing a configuration of an embodiment in which a magnetic field type lens according to the present invention is applied to an irradiation system lens of a TEM, in which 10 is a permanent magnet, 11 is an electromagnetic coil, and 12 is a yoke. The same components as those in FIG. 3 are designated by the same reference numerals.

【0009】図1において、永久磁石10と電磁コイル
11は光軸Oに沿って配置され、これら永久磁石10、
電磁コイル11はギャップG1 ,G2 の部分を除いてヨ
ーク12で囲繞されている。従ってヨーク12は永久磁
石10と電磁コイル11に共通の磁気回路を形成するこ
とになり、またレンズはギャップG1 ,G2 の位置に形
成されることになる。
In FIG. 1, the permanent magnet 10 and the electromagnetic coil 11 are arranged along the optical axis O.
The electromagnetic coil 11 is surrounded by a yoke 12 except for the gaps G 1 and G 2 . Therefore, the yoke 12 forms a common magnetic circuit for the permanent magnet 10 and the electromagnetic coil 11, and the lens is formed at the positions of the gaps G 1 and G 2 .

【0010】次に、永久磁石10と電磁コイル11によ
り光軸Oに沿って形成される磁場について説明する。ま
ず永久磁石10により形成される磁場は、図2の実線で
示すように、ギャップG1 ,G2 の位置に互いに逆曲性
に形成される。この磁場分布は磁場強度を−∞から+∞
まで積分すると零になる性質を有している。
Next, a magnetic field formed by the permanent magnet 10 and the electromagnetic coil 11 along the optical axis O will be described. First, the magnetic fields formed by the permanent magnets 10 are formed in the mutually opposite bendability at the positions of the gaps G 1 and G 2 , as shown by the solid line in FIG. This magnetic field distribution changes the magnetic field strength from -∞ to + ∞
It has the property of becoming zero when integrated up to.

【0011】これに対して、電磁コイル11による磁場
は図2の破線で示すように、同一極性でギャップG1
2 の位置に形成される。なお、図2においては永久磁
石10、電磁コイル11は省略し、ヨーク12のギャッ
プG1 ,G2 の位置のみを示す。
[0011] In contrast, the magnetic field generated by the electromagnetic coil 11, as indicated by the broken line in FIG. 2, the gap G 1 in the same polarity,
It is formed at the position of G 2 . In FIG. 2, the permanent magnet 10 and the electromagnetic coil 11 are omitted, and only the positions of the gaps G 1 and G 2 of the yoke 12 are shown.

【0012】従って、ギャップG1 ,G2 の位置に形成
されるレンズの磁場強度は永久磁石10による磁場と電
磁コイル11による磁場の合成磁場によって定まること
になるので、電磁コイル12に供給する励磁電流の方向
及び大きさを調整することによって二つのレンズの強度
を同時に制御することができる。例えば像を高倍率で観
察する場合には、ギャップG1 の位置における電磁コイ
ル11による磁場が図2に示すように永久磁石10によ
る磁場と同方向に形成されるように励磁電流を供給し、
その大きさを調整することによって図4Bに示す状態を
達成することができ、また、像を低倍率で観察する場合
には、ギャップG2 の位置における電磁コイル11によ
る磁場が図2に示すとは反対に永久磁石10による磁場
と逆方向に形成されるように励磁電流を供給し、その大
きさを調整することによって図4Aに示す状態を達成す
ることができる。
Therefore, since the magnetic field strength of the lens formed at the positions of the gaps G 1 and G 2 is determined by the combined magnetic field of the magnetic field of the permanent magnet 10 and the magnetic field of the electromagnetic coil 11, the magnetic field supplied to the electromagnetic coil 12 is excited. The intensity of the two lenses can be controlled simultaneously by adjusting the direction and magnitude of the current. For example, when observing an image at a high magnification, an exciting current is supplied so that the magnetic field generated by the electromagnetic coil 11 at the position of the gap G 1 is formed in the same direction as the magnetic field generated by the permanent magnet 10 as shown in FIG.
The state shown in FIG. 4B can be achieved by adjusting the size, and when the image is observed at a low magnification, the magnetic field generated by the electromagnetic coil 11 at the position of the gap G 2 is shown in FIG. On the contrary, the state shown in FIG. 4A can be achieved by supplying the exciting current so as to be formed in the direction opposite to the magnetic field by the permanent magnet 10 and adjusting the magnitude thereof.

【0013】そして、この構成によれば一方のレンズが
強励磁のときには他方のレンズは必ず弱励磁となり、共
に弱励磁となって試料に過度の電子ビームが照射される
状態は生じることはないので、試料を破壊することはな
いものである。
According to this structure, when one lens is strongly excited, the other lens is always weakly excited, and neither is weakly excited, and the sample is not irradiated with an excessive electron beam. , It does not destroy the sample.

【0014】以上、本発明の一実施例について説明した
が、本発明は上記実施例に限定されるものではなく種々
の変形が可能である。例えば上記実施例では本発明をT
EMの照射系レンズに適用した場合について説明した
が、これに限らず本発明は種々の場合に適用できるもの
であることは当然である。また、上記実施例では光軸に
沿って永久磁石、電磁コイルの順に配置されるものとし
たが、この逆でもよいことは当然である。
Although one embodiment of the present invention has been described above, the present invention is not limited to the above embodiment and various modifications can be made. For example, in the above embodiment, the present invention is
The case where the present invention is applied to the EM irradiation system lens has been described, but it is needless to say that the present invention can be applied to various cases without being limited to this. Further, in the above-mentioned embodiment, the permanent magnet and the electromagnetic coil are arranged in this order along the optical axis, but it goes without saying that the reverse order is also possible.

【0015】[0015]

【発明の効果】以上の説明から明らかなように、本発明
によれば、永久磁石と電磁コイルとを組み合わせるの
で、消費電力を従来に比して1/10以下に大幅に低減
させることができるばかりでなく、電磁コイルに供給す
る励磁電流の方向及び大きさを調整するだけで二つのレ
ンズを同時に制御でき、以て電子ビームの強度及び拡が
りを同時に且つ連続的に制御することが可能である。
As is apparent from the above description, according to the present invention, since the permanent magnet and the electromagnetic coil are combined, the power consumption can be greatly reduced to 1/10 or less as compared with the conventional one. Not only that, the two lenses can be controlled simultaneously by simply adjusting the direction and magnitude of the exciting current supplied to the electromagnetic coil, so that the intensity and spread of the electron beam can be controlled simultaneously and continuously. .

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の一実施例の構成を示す図である。FIG. 1 is a diagram showing a configuration of an exemplary embodiment of the present invention.

【図2】 図1の構成における磁場分布を説明するため
の図である。
FIG. 2 is a diagram for explaining a magnetic field distribution in the configuration of FIG.

【図3】 従来のTEMの照射系レンズの構成例を示す
図である。
FIG. 3 is a diagram showing a configuration example of an irradiation system lens of a conventional TEM.

【図4】 低倍率時及び高倍率時の電子ビームの収束状
態を示す図である。
FIG. 4 is a diagram showing a converged state of an electron beam at low magnification and high magnification.

【符号の説明】[Explanation of symbols]

10…永久磁石、11…電磁コイル、12…ヨーク。 10 ... Permanent magnet, 11 ... Electromagnetic coil, 12 ... Yoke.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光軸に沿って配置された永久磁石と、電
磁コイルと、前記永久磁石と前記電磁コイルに共通の磁
気回路を形成し、且つ前記永久磁石と前記電磁コイルの
位置にギャップを備えるヨークとを備えることを特徴と
する磁場型レンズ。
1. A permanent magnet arranged along an optical axis, an electromagnetic coil, a magnetic circuit common to the permanent magnet and the electromagnetic coil is formed, and a gap is formed between the permanent magnet and the electromagnetic coil. A magnetic field type lens comprising: a yoke.
JP3289858A 1991-11-06 1991-11-06 Magnetic field type lens Withdrawn JPH05128986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3289858A JPH05128986A (en) 1991-11-06 1991-11-06 Magnetic field type lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3289858A JPH05128986A (en) 1991-11-06 1991-11-06 Magnetic field type lens

Publications (1)

Publication Number Publication Date
JPH05128986A true JPH05128986A (en) 1993-05-25

Family

ID=17748674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3289858A Withdrawn JPH05128986A (en) 1991-11-06 1991-11-06 Magnetic field type lens

Country Status (1)

Country Link
JP (1) JPH05128986A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008044856A1 (en) * 2006-10-11 2008-04-17 Cebt Co. Ltd. An electron column using a magnetic lens layer having permanent magnets
WO2009157054A1 (en) * 2008-06-24 2009-12-30 株式会社アドバンテスト Multicolumn electron beam exposure apparatus and magnetic field generating apparatus
WO2011065240A1 (en) * 2009-11-26 2011-06-03 株式会社日立ハイテクノロジーズ Scanning electron microscope
CN103038855A (en) * 2010-10-27 2013-04-10 株式会社Param Electron lens and the electron beam device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008044856A1 (en) * 2006-10-11 2008-04-17 Cebt Co. Ltd. An electron column using a magnetic lens layer having permanent magnets
WO2009157054A1 (en) * 2008-06-24 2009-12-30 株式会社アドバンテスト Multicolumn electron beam exposure apparatus and magnetic field generating apparatus
JP5363480B2 (en) * 2008-06-24 2013-12-11 株式会社アドバンテスト Multi-column electron beam exposure apparatus and magnetic field generator
WO2011065240A1 (en) * 2009-11-26 2011-06-03 株式会社日立ハイテクノロジーズ Scanning electron microscope
US8921784B2 (en) 2009-11-26 2014-12-30 Hitachi High-Technologies Corporation Scanning electron microscope
CN103038855A (en) * 2010-10-27 2013-04-10 株式会社Param Electron lens and the electron beam device
EP2587517A1 (en) * 2010-10-27 2013-05-01 Param Corporation Electron lens and the electron beam device
EP2587517A4 (en) * 2010-10-27 2014-05-07 Param Corp Electron lens and the electron beam device
US9418815B2 (en) 2010-10-27 2016-08-16 Param Corporation Tubular permanent magnet used in a multi-electron beam device

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