JPH045885A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPH045885A JPH045885A JP10592090A JP10592090A JPH045885A JP H045885 A JPH045885 A JP H045885A JP 10592090 A JP10592090 A JP 10592090A JP 10592090 A JP10592090 A JP 10592090A JP H045885 A JPH045885 A JP H045885A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- resist
- resin
- electrodeposited
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000010410 layer Substances 0.000 claims abstract description 47
- 239000011347 resin Substances 0.000 claims abstract description 26
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 238000004070 electrodeposition Methods 0.000 claims abstract description 17
- 239000011247 coating layer Substances 0.000 claims abstract description 16
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000000243 solution Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000002253 acid Substances 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 13
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 abstract description 10
- 239000004310 lactic acid Substances 0.000 abstract description 5
- 235000014655 lactic acid Nutrition 0.000 abstract description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract description 4
- 239000007864 aqueous solution Substances 0.000 abstract description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract description 2
- 239000011889 copper foil Substances 0.000 abstract description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract description 2
- 239000007921 spray Substances 0.000 abstract description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 150000001450 anions Chemical group 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 9
- 238000007747 plating Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- -1 nitric acid Chemical class 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- OTKCEEWUXHVZQI-UHFFFAOYSA-N 1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1=CC=CC=C1 OTKCEEWUXHVZQI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 206010011732 Cyst Diseases 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- RQMIWLMVTCKXAQ-UHFFFAOYSA-N [AlH3].[C] Chemical compound [AlH3].[C] RQMIWLMVTCKXAQ-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 208000031513 cyst Diseases 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 150000007524 organic acids Chemical group 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- WXNYILVTTOXAFR-UHFFFAOYSA-N prop-2-en-1-ol;styrene Chemical compound OCC=C.C=CC1=CC=CC=C1 WXNYILVTTOXAFR-UHFFFAOYSA-N 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、基板の所定位置にファインパターンの導電性
金属層が形成され得るプリント配線板の製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing a printed wiring board in which a fine pattern conductive metal layer can be formed at a predetermined position on a substrate.
(従来技術)
従来、ファインパターンの導電性金属層が形成されたプ
リント配線板の製造方法として、ドライフィルムを導電
性金属層の被覆された基板上に逆パターンでマスク露光
現像し、吹いて該ドライフィルム層の形成されていない
該金属層の露出部分をエツチングにより除去した後、該
ドライフィルムを除去するテンティング法、同様に逆パ
ターンでドライフィルム層を形成した後半田メツキを施
し、次いで該ドライフィルムを除去し、該金属層の形成
されていない部分をエツチングにより除去し、然る後該
半田メツキを剥離する半田剥離法などが知られている。(Prior art) Conventionally, as a manufacturing method for a printed wiring board on which a fine-pattern conductive metal layer is formed, a dry film is exposed and developed using a mask in a reverse pattern on a substrate coated with a conductive metal layer, and then blown to form a printed wiring board. After removing the exposed portion of the metal layer on which the dry film layer is not formed by etching, the tenting method is used to remove the dry film, followed by solder plating with a dry film layer formed in the same reverse pattern. A solder stripping method is known in which the dry film is removed, the portion where the metal layer is not formed is removed by etching, and then the solder plating is stripped off.
また導電性金属層の被覆された基板上に逆パターンのレ
ジスト層を形成し、次いで該レジスト層の被覆されてい
ない該金属層の露出部分上にメツキを施した後該メツキ
層上に電着塗装樹脂層を形成し、次いで、該レジスト層
をアルカリ溶液にて除去し、更に該レジスト層の除去に
依って露出した金属層をエツチングにより除去し、然る
後、該電着塗装樹脂層を高濃度のアルカリ溶液や有機溶
奴等により除去する方法などもある。Alternatively, a resist layer with a reverse pattern is formed on a substrate coated with a conductive metal layer, and then plating is performed on the exposed portion of the metal layer that is not covered with the resist layer, and then electrodeposition is performed on the plating layer. A coated resin layer is formed, then the resist layer is removed with an alkaline solution, the metal layer exposed by the removal of the resist layer is removed by etching, and then the electrodeposition coated resin layer is removed. There is also a method of removing it using a highly concentrated alkaline solution or an organic melt.
(発明の目的)
上記ドライフィルムを利用するテンティング法や半田剥
離法は、該ドライフィルムの基板に対する密着信頼性に
欠け、高精度のファインパターンが形成し難く、更に半
田には鉛公害の問題があり、剥8圧するための酸処理工
程に用いられる酸は硝酸などの無機系強酸であり、その
上その廃液には金属が含まれるなど廃液処理も含め様々
な問題がある。(Purpose of the Invention) The tenting method and solder peeling method using the above-mentioned dry film lack reliability of adhesion of the dry film to the substrate, making it difficult to form a fine pattern with high precision, and furthermore, the solder has problems with lead pollution. The acid used in the acid treatment process for stripping is a strong inorganic acid such as nitric acid, and the waste liquid contains metals, which poses various problems including waste liquid treatment.
一方しシスト層を設けて行う方法は、ファインパターン
が形成され、半田に起因する公害等の問題は発生しない
ものの、該レジスト層の除去のために用いられた弱アル
カリ溶液の水洗が不十分であると、次いて形成される電
着塗装樹脂の密着性に欠は十分なファインパターンが形
成されないというような問題がある。On the other hand, with the method of forming a cyst layer, a fine pattern is formed and problems such as pollution caused by solder do not occur, but the weak alkaline solution used to remove the resist layer is not sufficiently washed with water. If this happens, the adhesion of the electrodeposition coating resin that is subsequently formed will be poor, and a sufficient fine pattern will not be formed.
従って本発明の目的は上記のような従来法の有する諸問
題に鑑み発明されたもので、公害問題などを発生させず
、しかも高精度のファインバターンが形成され得るプリ
ント配線板の製造方法を提供するものである。Therefore, an object of the present invention was invented in view of the problems of the conventional methods as described above, and provides a method for manufacturing a printed wiring board that does not cause pollution problems and can form fine patterns with high precision. It is something to do.
(目的を達成するための手段)
本発明者らは、鋭意研究した結果ある種のアルカリ剥離
電着ネガ型フ第1・レジス1−が、次工程に影響を与え
るアルカリ溶液を用いずに除去できることを見いだし本
発明に至った。(Means for Achieving the Object) As a result of intensive research, the present inventors have discovered that a certain kind of alkali-removable electrodeposited negative film resist 1- can be removed without using an alkaline solution that affects the next process. We have discovered that this can be done and have come up with the present invention.
即ち、本発明は導電性金属層で全表面が被覆さガたスル
ーホールを有するまたは有しない基板上に、得ようとす
るパターンの逆パターンのアルカリ剥離電着ネガ型フォ
トレジスト被覆層を形成し、次いで該レジスト被覆層の
形成されていない該金属層の露出部分に、電着塗装樹脂
層を形成し、次いで該レジスト被覆層を弱酸溶液にて除
去した後、エツチングにより露出した金属層を除去し、
然る後該電着塗装樹脂層をアルカリ溶液や有機溶媒など
で除去することを特徴とするプリント配線板の製造方法
である。That is, the present invention involves forming an alkaline peelable electrodeposited negative photoresist coating layer with a pattern opposite to the desired pattern on a substrate whose entire surface is covered with a conductive metal layer and which has or does not have through holes. Next, an electrodeposited resin layer is formed on the exposed portion of the metal layer where the resist coating layer is not formed, and then the resist coating layer is removed with a weak acid solution, and then the exposed metal layer is removed by etching. death,
This method of manufacturing a printed wiring board is characterized in that the electrodeposited resin layer is then removed using an alkaline solution, an organic solvent, or the like.
ここで用いられるアルカリ剥離電着ネガ型フォトレジス
トとはアニオン電着可能なアクリル樹脂系光硬化性の樹
脂組成物で、メタアクリルアミド、アクリル酸及び2−
エチルへキシルメタクリレートを共重合させて得られる
アクリル樹脂にグリシジルアクリレートを付加して得ら
れる樹脂組成物や、上記アクリル樹脂にキシリレンジイ
ソシアネートを付加して得られる樹脂組成物等にベンゾ
イン、アントラキノン、2−フェニルアセトフェノンな
どの光重合開始剤が添加されたものであり、必要に応じ
てブチルアルコール、ジエチレングリコール、メチルエ
チルケトン、酢酸エチル等の溶剤が添加される。The alkaline peelable electrodeposition negative photoresist used here is an acrylic resin-based photocurable resin composition that can be anionically electrodeposited, and is composed of methacrylamide, acrylic acid, and 2-
Benzoin, anthraquinone, 2 - A photopolymerization initiator such as phenylacetophenone is added, and a solvent such as butyl alcohol, diethylene glycol, methyl ethyl ketone, ethyl acetate, etc. is added as necessary.
次に上記レジスト被覆層の形成されなかった導電性金属
層の露出部分に被覆される電着塗装樹脂とは、通常の電
着塗装用の樹脂が用いることができ、末端にカルボキシ
ルキ等を有する液状ポリブタジェン樹脂、スチレン−ア
リルアルコール系樹脂、アクリル樹脂等のアニオン性の
電着塗装樹脂などが相当し、公知の方法で形成される。Next, as the electrodeposition coating resin to be coated on the exposed portion of the conductive metal layer where the resist coating layer is not formed, a resin for ordinary electrodeposition coating can be used, and the resin has carboxylic acid or the like at the end. Anionic electrodeposition coating resins such as liquid polybutadiene resins, styrene-allyl alcohol resins, and acrylic resins are suitable, and are formed by known methods.
次いでレジスト被覆層を除去するために用いられる弱酸
とは乳酸、ヒドロキシ酢酸、トリクロロ酢酸等の有機酸
で、その内でも乳酸を用いると該レジスト被覆層の除去
が容易であり好ましい。Next, the weak acid used to remove the resist coating layer is an organic acid such as lactic acid, hydroxyacetic acid, or trichloroacetic acid, and among these, lactic acid is preferably used because it facilitates the removal of the resist coating layer.
(実施例)
導電性金属層(1)として35μ厚銅箔が両面に積層一
体止された基板(2)に、レジスト被覆層(3)として
ネガ型フォトレジスト(関西ペイントHHゾンネEDU
V376)を50mA/dボー3分電着し、80°C−
1分乾燥後50〜200μのライ〕ノ/スペースのパタ
ーンマスクを介して200mJ/cm2照射露光し、そ
の後1%炭酸ナトリウム溶液を用いて現像した。次いで
アニオン系電着塗装樹脂(東亜合成■製アロンS−40
90を主成分とする電着樹脂塗料)を常法により電着し
て電着樹脂塗装樹脂層(4)を形成し、60°C−20
%乳酸水溶液をスプレー塗布し、上記レジスト被覆層(
3)を除去した。(Example) A negative photoresist (Kansai Paint HH Sonne EDU) was applied as a resist coating layer (3) to a substrate (2) on which a 35μ thick copper foil was laminated and integrally fixed on both sides as a conductive metal layer (1).
Electrodeposit V376) at 50 mA/d baud for 3 minutes at 80°C.
After drying for 1 minute, it was exposed to 200 mJ/cm2 through a pattern mask with lines/spaces of 50 to 200 microns, and then developed using a 1% sodium carbonate solution. Next, anionic electrodeposition coating resin (Aron S-40 manufactured by Toagosei ■)
90 as a main component) was electrodeposited by a conventional method to form an electrodeposition resin coating resin layer (4), and heated at 60°C-20.
% lactic acid aqueous solution was spray applied to the resist coating layer (
3) was removed.
続いて露出された上記導電性金属層(1)を40°C塩
化第2鉄溶液にてエツチングした後、40°C−3%水
酸化すI−リウム水溶液を用いて上記電着塗装樹脂層(
4)を除去して70μのライン/スペースのファインパ
ターンが形成されたプリント配線板(5)を得た。Subsequently, the exposed conductive metal layer (1) is etched with a 40°C ferric chloride solution, and then the electrodeposited resin layer is etched with a 3% I-lium hydroxide aqueous solution at 40°C. (
4) was removed to obtain a printed wiring board (5) on which a fine pattern of 70 μm lines/spaces was formed.
(効 果)
本発明によれば、ドライフィルムや半田を用いる必要が
ないため、より高精度のファインパターンが形成される
と共に、半田に含有される鉛や半田を除去するための硝
酸等の強酸による公害問題が発生することもない。(Effects) According to the present invention, since there is no need to use a dry film or solder, fine patterns with higher precision can be formed, and strong acids such as nitric acid can be used to remove lead and solder contained in the solder. No pollution problems will occur.
また、従来性われているアルカリ−アルカリ除去の方法
と異なり、レジスト被覆層を酸で除去するために、従来
のレジスト被覆層を除去するためのアルカリが次の電着
塗装樹脂の電着に影響せず、該電着塗装樹脂の密着性に
も優れる上、工程管理が容易となる。Also, unlike the conventional alkali-alkali removal method, since the resist coating layer is removed with acid, the alkali used to remove the conventional resist coating layer affects the electrodeposition of the next electrodeposition coating resin. The electrodeposited resin has excellent adhesion and process control is easy.
図は本発明のプリント配線板の製造工程を示すもので、
第1図は導電性金属層の形成された基板に逆パターンの
レジスト層が形成された状態、第2図は電着塗装樹脂層
が形成された状態、第3図は該レジスト層が乳酸にて除
去され、該導電住金炭層の露出部分がエツチングされた
状態、第4図は該電着塗装樹脂層が除去され、本発明に
よるプリント配線板の仕上がり状態を示すそれぞれの断
面図である。
1:導電性金属M 2:基板
3ニレジスト被M層 4:電着塗装樹脂層5ニブリント
配線板
特許出願人 アイカニ業株式会社The figure shows the manufacturing process of the printed wiring board of the present invention.
Figure 1 shows a state in which a resist layer with a reverse pattern is formed on a substrate on which a conductive metal layer is formed, Figure 2 shows a state in which an electrodeposition coating resin layer is formed, and Figure 3 shows a state in which the resist layer is coated with lactic acid. FIG. 4 is a sectional view showing the finished state of the printed wiring board according to the present invention after the electrocoated resin layer has been removed and the exposed portion of the conductive aluminum carbon layer has been etched. 1: Conductive metal M 2: Substrate 3 Ni-resist coated M layer 4: Electrodeposition coating resin layer 5 Ni-blint wiring board Patent applicant Aikani Gyo Co., Ltd.
Claims (1)
するまたは有しない基板上に、得ようとするパターンの
逆パターンのアルカリ剥離電着ネガ型フォトレジスト被
覆層を形成し、次いで該レジスト被覆層の形成されてい
ない該金属層の露出部分に、電着塗装樹脂層を形成し、
次いで該レジスト被覆層を弱酸溶液にて除去した後、エ
ッチングにより露出した金属層を除去し、然る後該電着
塗装樹脂層をアルカリ溶液や有機溶媒などで除去するこ
とを特徴とするプリント配線板の製造方法。On a substrate with or without through holes whose entire surface is covered with a conductive metal layer, an alkaline peelable electrodeposited negative photoresist coating layer with a pattern opposite to the pattern to be obtained is formed, and then the resist coating layer is formed. Forming an electrodeposition coating resin layer on the exposed portion of the metal layer where is not formed,
Printed wiring characterized in that the resist coating layer is then removed with a weak acid solution, the exposed metal layer is removed by etching, and then the electrodeposited resin layer is removed with an alkaline solution, an organic solvent, etc. Method of manufacturing the board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10592090A JPH045885A (en) | 1990-04-23 | 1990-04-23 | Manufacture of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10592090A JPH045885A (en) | 1990-04-23 | 1990-04-23 | Manufacture of printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH045885A true JPH045885A (en) | 1992-01-09 |
Family
ID=14420303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10592090A Pending JPH045885A (en) | 1990-04-23 | 1990-04-23 | Manufacture of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH045885A (en) |
-
1990
- 1990-04-23 JP JP10592090A patent/JPH045885A/en active Pending
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