JPH0454703Y2 - - Google Patents
Info
- Publication number
- JPH0454703Y2 JPH0454703Y2 JP1989021289U JP2128989U JPH0454703Y2 JP H0454703 Y2 JPH0454703 Y2 JP H0454703Y2 JP 1989021289 U JP1989021289 U JP 1989021289U JP 2128989 U JP2128989 U JP 2128989U JP H0454703 Y2 JPH0454703 Y2 JP H0454703Y2
- Authority
- JP
- Japan
- Prior art keywords
- contact
- connection pad
- melting point
- low melting
- connection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 230000008018 melting Effects 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 11
- 150000002739 metals Chemical class 0.000 claims description 9
- 230000005496 eutectics Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- 238000007747 plating Methods 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- 239000004332 silver Substances 0.000 description 9
- 229910001338 liquidmetal Inorganic materials 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 5
- 229910052733 gallium Inorganic materials 0.000 description 5
- 229910001297 Zn alloy Inorganic materials 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
Landscapes
- Multi-Conductor Connections (AREA)
Description
【考案の詳細な説明】
〔概要〕
被接続物間の電気的接続コネクタに関し、
簡便であつて、信頼性が高いと共に操作時に殆
ど力を作用させる必要のないコネクタ装置の提供
を目的とし、
対向した被接続物間を電気的接続するコネクタ
であつて、一方の被接続物には接続パツドを設
け、他方の被接続物にはばね手段を有したコンタ
クトを設け、前記接続パツドとコンタクトとの各
対向面上にポーラスな拡散融合しにくい材料より
成る層を形成し、該層に室温で共晶の極低融点金
属となる第1と第2の低融点金属を夫々含浸させ
たことを特徴とするよう構成する。[Detailed description of the invention] [Summary] The purpose of this invention is to provide a connector device that is simple, highly reliable, and requires little force during operation, regarding electrical connectors between connected objects. A connector for electrically connecting two connected objects, one of which is provided with a connecting pad, the other connected object is provided with a contact with a spring means, and the connection between the connecting pad and the contact is provided. A layer made of a porous material that is difficult to diffuse and fuse is formed on each opposing surface, and each layer is impregnated with first and second low melting point metals that become eutectic extremely low melting point metals at room temperature. It is configured so that
本考案は、電気的接続コネクタに関する。 The present invention relates to an electrical connection connector.
近年、電算機の高性能化に伴い、回路基板は更
に高密度化し、小型化され、回路基板上には多数
の入出力用I/Oピンが設置される様になつた。
こうした回路基板間を電気的接続するために、回
路基板上に設けられた上記多数のI/Oピンを従
来のオス・メス型コネクタで接続するには余りに
も大きな接続力を必要とし、該オス・メス嵌合時
に回路基板に大きな負担をかけてしまう。この問
題を解決するために挿脱力の非常に小さなZIFや
LIFと呼ばれる機構を用いることもあるが、液体
金属を使用した接続も、上述した多ピン接続時の
1つの手法である。
In recent years, as computers have improved in performance, circuit boards have become more dense and smaller, and a large number of input/output I/O pins have come to be installed on the circuit boards.
In order to electrically connect these circuit boards, connecting the large number of I/O pins provided on the circuit boards with conventional male/female connectors requires too much connection force, and the male・A large burden is placed on the circuit board when mating the female. To solve this problem, we have developed a ZIF with very low insertion and removal force.
Although a mechanism called LIF is sometimes used, connection using liquid metal is also one method for the multi-pin connection described above.
液体金属を使用したI/Oピンの接続の従来技
術例として、本題と同一出願人による特開昭52−
73392号公報と他出願人による特開昭60−253177
号公報とがある。前者は可撓性材に液体金属を含
浸させてこれを接点とし、該接点を介してオス・
メスの各端子を接続させる。また後者は、非使用
時に固体である金属を使用時には加熱して液体金
属とし、これに電極を挿入することにより接続す
るものである。 As an example of the prior art of connecting I/O pins using liquid metal, Japanese Patent Application Laid-open No. 1986-52 by the same applicant as the subject matter
Publication No. 73392 and JP-A-60-253177 by another applicant
There is a publication number. In the former, a flexible material is impregnated with liquid metal and used as a contact, and a male
Connect each female terminal. In the latter method, a metal that is solid when not in use is heated to become a liquid metal when in use, and an electrode is inserted into the liquid metal for connection.
然しながら、前者においては接点に使用してい
る金属は常時液体であり、端子の挿脱を繰り返す
と液体金属が飛散等して使用が不能になつてしま
い、また後者では使用中のみ液体であるが、上記
同様、電極の挿脱に伴つて液体金属が飛散等し、
消耗すると共に、液体状態時に移動させる様なこ
とがあると零れるおそれがあり、更には加熱装置
等が必要であるためコスト高になるという欠点を
有する。
However, in the former, the metal used for the contacts is always liquid, and if the terminal is repeatedly inserted and removed, the liquid metal will scatter and become unusable, while in the latter, the metal used for the contacts is liquid only during use. , as above, liquid metal is scattered as the electrode is inserted and removed,
In addition to being expendable, there is a risk of spillage if it is moved while in a liquid state, and furthermore, a heating device and the like are required, resulting in high costs.
依つて本考案は斯かる課題の解決を図るべく、
簡便であつて、信頼性が高いと共に操作時に殆ど
力を作用させる必要のないコネクタ装置の提供を
目的とする。 Therefore, this invention aims to solve such problems,
An object of the present invention is to provide a connector device that is simple, highly reliable, and requires little force during operation.
上記目的に鑑みて本考案は、対向した被接続物
間を電気的接続するコネクタであつて、一方の被
接続物には接続パツドを設け、他方の被接続物に
はばね手段を有したコンタクトを設け、前記接続
パツドとコンタクトとの各対向面上にポーラスな
拡散融合しにくい材料より成る層を形成し、該層
に共晶の極低融点金属となる第1と第2の低融点
金属を夫々含浸させたコネクタ装置を提供する。
In view of the above object, the present invention provides a connector for electrically connecting opposing connected objects, wherein one connected object is provided with a connecting pad, and the other connected object is provided with a contact having a spring means. a layer made of a porous material that is difficult to diffuse and fuse is formed on each opposing surface of the connection pad and the contact, and in the layer are first and second low melting point metals that are eutectic ultra low melting point metals. Provided is a connector device impregnated with the following.
共晶の極低融点金属は、通常の室温では各々固
体である。然しながら両者を接触させると互いに
拡散して合金化し、この合金は融点が約20℃以下
であるため通常の室温では液体であり、従つて接
続パツドとコンタクトとは良好な電気的接触状態
となる。この場合、各拡散金属はポーラスな層に
含浸させられているため、両者の接触部近傍のみ
しか拡散融合しない。
The eutectic very low melting point metals are each solid at normal room temperatures. However, when the two are brought into contact, they diffuse into each other and form an alloy, and since this alloy has a melting point of about 20° C. or less, it is a liquid at normal room temperature, and therefore the connection pad and the contact are in good electrical contact. In this case, since each diffusion metal is impregnated into a porous layer, diffusion fusion occurs only in the vicinity of the contact area between the two.
以下本考案を添付図面に示す実施例に基づいて
更に詳細に説明する。
The present invention will be described in more detail below based on embodiments shown in the accompanying drawings.
第1図を参照すると、2枚の対向配置された回
路基板10と12とを電気的接続するコネクタ装
置が示されている。このうち一方の回路基板12
が、複数の回路基板を載置しているマザーボード
であつてもよい。回路基板10には接続パツド1
4が設けられており、他方の回路基板12には前
記接続パツド14と対向した位置に電気伝導性の
基台20を設け、該基台20上に電気伝導性を有
すると共に、ばね定数の小さなコイルばね16を
取り付け、該コイルばね16の上端には前記接続
パツド14と接触するコンタクト18が取り付け
られている。このコンタクト18も電気伝導性の
材料で造られていることは無論である。本実施例
ではコイルばね16は筒22の中に収容されてお
り、該筒22の長手方向に伸縮することができ
る。このコイルばね16の作用により、コンタク
ト18は接続パツド14と接触することができ
る。 Referring to FIG. 1, there is shown a connector device for electrically connecting two circuit boards 10 and 12 that are arranged opposite to each other. One of these circuit boards 12
However, it may be a motherboard on which a plurality of circuit boards are mounted. The circuit board 10 has connection pads 1
4, and the other circuit board 12 is provided with an electrically conductive base 20 at a position facing the connection pad 14, and on the base 20 is provided an electrically conductive base 20 with a small spring constant. A coil spring 16 is attached, and a contact 18 for contacting the connection pad 14 is attached to the upper end of the coil spring 16. Of course, this contact 18 is also made of an electrically conductive material. In this embodiment, the coil spring 16 is housed in a tube 22 and can expand and contract in the longitudinal direction of the tube 22. The action of this coil spring 16 allows the contact 18 to come into contact with the connecting pad 14.
第2図と第3図とはコンタクト18と接続パツ
ド14との接触部分Aの拡大図であり、接続パツ
ド14は銅母材24の表面にポーラスな銀メツキ
層26を、またコンタクト18は銅母材32の表
面にポーラスな銀メツキ層30を夫々形成してい
る。また、第4図と第5図とには更なる拡大図が
示されており、各ポーラスな銀メツキ層26,3
0には、夫々、錫・亜鉛合金34とガリウム36
が含浸されていることを示している。 2 and 3 are enlarged views of the contact area A between the contact 18 and the connection pad 14. The connection pad 14 has a porous silver plating layer 26 on the surface of the copper base material 24, and the contact 18 has a copper A porous silver plating layer 30 is formed on the surface of the base material 32, respectively. Furthermore, further enlarged views are shown in FIGS. 4 and 5, and each porous silver plating layer 26, 3
0 contains tin-zinc alloy 34 and gallium 36, respectively.
It shows that it is impregnated.
接続パツド14とコンタクトとが接触すると、
各銀メツキ層26,30銀部材に遮断され、第5
図に示す様に両ポーラスな銀メツキ層26,30
に含浸された各金属34,36のうち、接触領域
近傍のみが互いに拡散し、その結果約10℃の融点
を有する合金38に変わり、液状となつて接続パ
ツド14とコンタクト18との電気的接続を確実
化させることができる。 When the connection pad 14 and the contact come into contact,
Each silver plating layer 26, 30 is blocked by a silver member, and the fifth
As shown in the figure, biporous silver plating layers 26 and 30
Of the metals 34 and 36 impregnated with the metal, only those in the vicinity of the contact area diffuse into each other, resulting in an alloy 38 having a melting point of approximately 10°C, which becomes liquid and forms an electrical connection between the connection pad 14 and the contact 18. can be ensured.
上記液状化した合金38は、コンタクト18を
接続パツド14から引き離すと、該合金38の体
積と比較して非常に大きな体積を有する残りの含
浸金属、即ち、接続パツド14側は錫・亜鉛合金
34と、コンタクト18側はガリウム36との間
で拡散が生じ、再び元の様に錫・亜鉛合金又はガ
リウムに復元されるため幾度も電気的接続、並び
に遮断を行うことができる。また、ポーラスな銀
メツキ層は、過電流メツキで得られる。 When the contact 18 is separated from the connection pad 14, the liquefied alloy 38 leaves the remaining impregnated metal having a very large volume compared to the volume of the alloy 38, i.e., the tin-zinc alloy 34 on the connection pad 14 side. Then, diffusion occurs between the contact 18 side and the gallium 36, and the tin-zinc alloy or gallium is restored to its original state, so that electrical connection and disconnection can be made many times. Further, a porous silver plating layer can be obtained by overcurrent plating.
以上ポーラスな層として銀メツキ層を例にとつ
て説明したが、ガリウム等の低融点金属と拡散融
合を起こしにくい金属であればよく、ニツケル、
パラジウム等も用いることができる。又、低融点
金属の組合せとしては、ガリウム−インジウム、
ガリウム−インジウム・錫合金の組合せを用いる
こともできる。 The above explanation uses a silver plating layer as an example of a porous layer, but any metal that does not easily cause diffusion fusion with a low melting point metal such as gallium may be used;
Palladium and the like can also be used. In addition, as a combination of low melting point metals, gallium-indium,
A combination of gallium-indium-tin alloy can also be used.
以上の説明から明らかな様に本考案によれば、
接続パツドとコンタクトとが軽く接触するだけで
電気的接続が可能となるため各回路基板に過剰な
負荷力が作用せず、損傷することがない。また、
電気的接続された場合に、液状となる合金量は微
量であるため幾度も自然に復元され、従つて長期
間使用可能であると共に信頼性の高い、簡便なコ
ネクタ装置が提供可能となる。
As is clear from the above explanation, according to the present invention,
Since electrical connection is possible with only light contact between the connection pad and the contact, no excessive load force is applied to each circuit board and no damage is caused. Also,
Since the amount of the alloy that becomes liquid when electrically connected is small, it is naturally restored many times, making it possible to provide a simple connector device that can be used for a long period of time and is highly reliable.
第1図は本考案に係るコネクタ装置図、第2図
は第1図のA部の離融状態拡大図、第3図は第1
図のA部の拡大図、第4図は第2図のB部の拡大
図、第5図は第2図のC部の拡大図。
10,12……回路基板、14……接続パツ
ド、16……コイルばね、18……コンタクト、
26,30……ポーラスな銀メツキ層、34……
錫・亜鉛合金、36……ガリウム。
Fig. 1 is a diagram of the connector device according to the present invention, Fig. 2 is an enlarged view of part A in Fig. 1 in a melted state, and Fig. 3 is a diagram of the connector device according to the present invention.
FIG. 4 is an enlarged view of section B in FIG. 2, and FIG. 5 is an enlarged view of section C in FIG. 2. 10, 12... Circuit board, 14... Connection pad, 16... Coil spring, 18... Contact,
26, 30... Porous silver plating layer, 34...
Tin-zinc alloy, 36...Gallium.
Claims (1)
るコネクタであつて、一方の被接続物10には接
続パツド14を設け、他方の被接続物12にはば
ね手段16を有したコンタクト18を設け、前記
接続パツド14とコンタクト18との各対向面上
にポーラスな拡散融合しにくい材料より成る層2
6,30を形成し、該層26,30に室温で共晶
の極低融点金属となる第1と第2の低融点金属を
夫々含浸させたことを特徴とするコネクタ装置。 A connector that electrically connects opposing objects 10 and 12, in which one object 10 is provided with a connection pad 14, and the other object 12 is provided with a contact 18 having a spring means 16. A layer 2 of a porous diffusion-fused material is provided on each opposing surface of the connection pad 14 and the contact 18.
6 and 30, and the layers 26 and 30 are respectively impregnated with first and second low melting point metals that become eutectic extremely low melting point metals at room temperature.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989021289U JPH0454703Y2 (en) | 1989-02-28 | 1989-02-28 | |
EP90102348A EP0385142B1 (en) | 1989-02-28 | 1990-02-07 | Electrical connecting apparatus |
DE69022605T DE69022605T2 (en) | 1989-02-28 | 1990-02-07 | Electrical connection device. |
CA002010306A CA2010306C (en) | 1989-02-28 | 1990-02-19 | Connecting apparatus |
US07/483,170 US5017738A (en) | 1989-02-28 | 1990-02-22 | Connecting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989021289U JPH0454703Y2 (en) | 1989-02-28 | 1989-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02113271U JPH02113271U (en) | 1990-09-11 |
JPH0454703Y2 true JPH0454703Y2 (en) | 1992-12-22 |
Family
ID=31524337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989021289U Expired JPH0454703Y2 (en) | 1989-02-28 | 1989-02-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0454703Y2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07120545B2 (en) * | 1991-03-27 | 1995-12-20 | 山一電機株式会社 | Nested pressure connector |
-
1989
- 1989-02-28 JP JP1989021289U patent/JPH0454703Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPH02113271U (en) | 1990-09-11 |
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