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JPH0451795U - - Google Patents

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Publication number
JPH0451795U
JPH0451795U JP9280590U JP9280590U JPH0451795U JP H0451795 U JPH0451795 U JP H0451795U JP 9280590 U JP9280590 U JP 9280590U JP 9280590 U JP9280590 U JP 9280590U JP H0451795 U JPH0451795 U JP H0451795U
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JP
Japan
Prior art keywords
thin film
film
black
electrode
back electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9280590U
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Japanese (ja)
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JP2548182Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JP1990092805U priority Critical patent/JP2548182Y2/en
Publication of JPH0451795U publication Critical patent/JPH0451795U/ja
Application granted granted Critical
Publication of JP2548182Y2 publication Critical patent/JP2548182Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第18図は夫々この考案の実施例で
ある薄膜EL素子を示す断面図、第19図はこの
考案に用いられる酸化Taの抵抗率および光透過
率を示すグラフ、第20図はこの考案の実施例の
薄膜EL素子のコントラストを従来のものと比較
して示すグラフ、第21図は従来の薄膜EL素子
の例を示す断面図である。 1……ガラス基板、2……透明電極、3……第
1絶縁体層、4……発光体層、5……第2絶縁体
層、6……金属背面電極、7……交流電源、8…
…酸化Ta黒色導体、9……絶縁体膜、10……
背面黒色膜、11……絶縁体層、12……黒色絶
縁膜、13……半透明黒色膜。
Figures 1 to 18 are cross-sectional views showing thin film EL devices that are examples of this invention, Figure 19 is a graph showing the resistivity and light transmittance of Ta oxide used in this invention, and Figure 20 is a graph showing the resistivity and light transmittance of Ta oxide used in this invention. FIG. 21 is a graph showing the contrast of a thin film EL device according to an embodiment of this invention in comparison with a conventional one, and FIG. 21 is a cross-sectional view showing an example of a conventional thin film EL device. DESCRIPTION OF SYMBOLS 1... Glass substrate, 2... Transparent electrode, 3... First insulator layer, 4... Luminous layer, 5... Second insulator layer, 6... Metal back electrode, 7... AC power supply, 8...
...Ta oxidized black conductor, 9...Insulator film, 10...
Back side black film, 11... Insulator layer, 12... Black insulating film, 13... Translucent black film.

Claims (1)

【実用新案登録請求の範囲】 1 透明基板の上に透明電極を積層し該透明電極
と背面電極との間にEL発光を呈する薄膜発光層
を介在させた薄膜EL素子において、背面電極を
Taの不完全酸化黒色膜で形成したことを特徴と
する薄膜EL素子。 2 透明基板の上に透明電極を積層し該透明電極
と背面電極との間にEL発光を呈する薄膜発光層
を介在させた薄膜EL素子において、背面電極を
Taの不完全酸化黒色膜と金属膜との積層により
形成したことを特徴とする薄膜EL素子。 3 前記背面電極の上に低誘電率高抵抗の絶縁体
膜を形成し、その上にTaの不完全酸化黒色膜を
設けたことを特徴とする請求項1または2の薄膜
EL素子。 4 透明基板の上に透明電極を積層し該透明電極
と黒色化した背面電極との間にEL発光を呈する
薄膜発光層を介在させ該背面電極の上に絶縁体を
該絶縁体の上に背面電極と同一物質の背面黒色膜
を配置した薄膜EL素子において、前記背面電極
と薄膜発光層との間および前記背面黒色膜と絶縁
体との間に同一の物質からなる絶縁物を配置した
ことを特徴とする薄膜EL素子。 5 前記背面電極と背面黒色膜とがTaの不完全
酸化膜である請求項4の薄膜EL素子。 6 透明基板の上に透明電極を積層し該透明電極
と背面電極との間にEL発光を呈する薄膜発光層
を介在させた薄膜EL素子において、背面電極と
薄膜発光層との間に介在する絶縁膜に黒色絶縁膜
を用い、背面電極として黒色導体または黒色膜と
金属膜との積層を用いたことを特徴とする薄膜E
L素子。 7 前記背面電極の黒色導体または黒色膜をTa
の不完全酸化膜で形成し、前記黒色絶縁膜を前記
Taの不完全酸化膜をさらに酸化した絶縁膜で形
成した請求項6の薄膜EL素子。 8 透明基板の上に透明電極、第1絶縁体層、E
L発光を呈する発光体層、第2絶縁体層および背
面電極を順次積層した薄膜EL素子において、背
面電極をTaの不完全酸化黒色膜で形成し、第1
絶縁体層または第2絶縁体層の一部を前記Taの
不完全酸化黒色膜よりさらに酸化したTa酸化物
の絶縁膜を用いて形成した薄膜EL素子。 9 透明基板の上に透明電極を積層し該透明電極
と背面電極との間にEL発光を呈する薄膜発光層
を介在させた薄膜EL素子において、透明電極と
薄膜発光層との間の絶縁膜の全部または一部を着
色した絶縁膜で形成したことを特徴とする薄膜E
L素子。 10 透明基板の上に透明電極を積層し該透明電
極と背面電極との間にEL発光を呈する薄膜発光
層を介在させた薄膜EL素子において、透明電極
と透明基板との間に着色した絶縁膜を介在させた
ことを特徴とする薄膜EL素子。 11 前記着色した絶縁膜をTaの不完全酸化絶
縁膜で形成した請求項9または10の薄膜EL素
子。 12 前記背面電極を黒色導体または黒色膜と金
属膜の積層で形成した請求項9乃至11の薄膜E
L素子。 13 透明基板の上に透明電極を積層し該透明電
極と背面電極との間にEL発光を呈する薄膜発光
層を介在させた薄膜EL素子において、透明基板
の透明電極と反対側に半透明黒色膜を設けたこと
を特徴とする薄膜EL素子。 14 前記半透明黒色膜としてTaの不完全酸化
物を用いた請求項13の薄膜EL素子。 15 前記背面電極として黒色膜と金属膜との積
層を用いた請求項13の薄膜EL素子。
[Claims for Utility Model Registration] 1. In a thin film EL device in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, the back electrode is made of Ta. A thin film EL device characterized in that it is formed of an incompletely oxidized black film. 2. In a thin film EL element in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, the back electrode is formed of a partially oxidized black film of Ta and a metal film. A thin film EL device characterized in that it is formed by laminating with. 3. The thin film EL device according to claim 1, wherein an insulating film having a low dielectric constant and high resistance is formed on the back electrode, and a partially oxidized black film of Ta is provided thereon. 4 A transparent electrode is laminated on a transparent substrate, a thin film emitting layer exhibiting EL light is interposed between the transparent electrode and a blackened back electrode, and an insulator is placed on the back electrode. In a thin film EL element in which a back black film made of the same material as the electrode is arranged, an insulator made of the same material is arranged between the back electrode and the thin film light emitting layer and between the back black film and the insulator. Characteristic thin film EL element. 5. The thin film EL device according to claim 4, wherein the back electrode and the back black film are incompletely oxidized Ta films. 6 In a thin film EL element in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, the insulation interposed between the back electrode and the thin film emitting layer is Thin film E characterized in that a black insulating film is used as the film, and a black conductor or a laminated layer of a black film and a metal film is used as the back electrode.
L element. 7 The black conductor or black film of the back electrode is made of Ta.
7. The thin film EL device according to claim 6, wherein the black insulating film is formed of an insulating film obtained by further oxidizing the incompletely oxidized Ta film. 8 Transparent electrode, first insulator layer, E
In a thin film EL element in which a light emitter layer exhibiting L-emission, a second insulator layer and a back electrode are sequentially laminated, the back electrode is formed of a partially oxidized black film of Ta, and the first
A thin film EL device in which a part of the insulator layer or the second insulator layer is formed using an insulating film of Ta oxide that is further oxidized than the incompletely oxidized black film of Ta. 9 In a thin film EL element in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, an insulating film between the transparent electrode and the thin film emitting layer is Thin film E characterized by being formed entirely or partially of a colored insulating film
L element. 10 In a thin film EL element in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, a colored insulating film is provided between the transparent electrode and the transparent substrate. 1. A thin film EL device characterized by interposing. 11. The thin film EL device according to claim 9 or 10, wherein the colored insulating film is formed of an incompletely oxidized Ta insulating film. 12. The thin film E according to claims 9 to 11, wherein the back electrode is formed of a black conductor or a laminate of a black film and a metal film.
L element. 13 In a thin film EL element in which a transparent electrode is laminated on a transparent substrate and a thin film emitting layer that emits EL light is interposed between the transparent electrode and the back electrode, a translucent black film is provided on the side of the transparent substrate opposite to the transparent electrode. A thin film EL element characterized by being provided with. 14. The thin film EL device according to claim 13, wherein an incomplete oxide of Ta is used as the semitransparent black film. 15. The thin film EL device according to claim 13, wherein the back electrode is a laminated layer of a black film and a metal film.
JP1990092805U 1990-09-04 1990-09-04 High contrast thin film EL device Expired - Lifetime JP2548182Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990092805U JP2548182Y2 (en) 1990-09-04 1990-09-04 High contrast thin film EL device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990092805U JP2548182Y2 (en) 1990-09-04 1990-09-04 High contrast thin film EL device

Publications (2)

Publication Number Publication Date
JPH0451795U true JPH0451795U (en) 1992-04-30
JP2548182Y2 JP2548182Y2 (en) 1997-09-17

Family

ID=31829542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990092805U Expired - Lifetime JP2548182Y2 (en) 1990-09-04 1990-09-04 High contrast thin film EL device

Country Status (1)

Country Link
JP (1) JP2548182Y2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57123687A (en) * 1981-01-23 1982-08-02 Sumitomo Electric Industries Thin film light emitting element
JPS60117600U (en) * 1984-01-17 1985-08-08 日産自動車株式会社 Thin film EL panel
JPS62290096A (en) * 1986-05-23 1987-12-16 株式会社小松製作所 Thin film el device
JPS6443998A (en) * 1987-08-11 1989-02-16 Alps Electric Co Ltd Membranous el display element

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57123687A (en) * 1981-01-23 1982-08-02 Sumitomo Electric Industries Thin film light emitting element
JPS60117600U (en) * 1984-01-17 1985-08-08 日産自動車株式会社 Thin film EL panel
JPS62290096A (en) * 1986-05-23 1987-12-16 株式会社小松製作所 Thin film el device
JPS6443998A (en) * 1987-08-11 1989-02-16 Alps Electric Co Ltd Membranous el display element

Also Published As

Publication number Publication date
JP2548182Y2 (en) 1997-09-17

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