JPH04310365A - Polishing plate - Google Patents
Polishing plateInfo
- Publication number
- JPH04310365A JPH04310365A JP3075237A JP7523791A JPH04310365A JP H04310365 A JPH04310365 A JP H04310365A JP 3075237 A JP3075237 A JP 3075237A JP 7523791 A JP7523791 A JP 7523791A JP H04310365 A JPH04310365 A JP H04310365A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polishing plate
- workpiece
- main body
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 78
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 8
- 239000010432 diamond Substances 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 2
- 239000012528 membrane Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 14
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】この発明はワ−クをオングストロ
−ムオ−ダの高精度で研磨加工するための非接触研磨装
置に用いられる研磨皿に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing plate used in a non-contact polishing apparatus for polishing a workpiece with high accuracy on the order of Angstroms.
【０００２】0002
【従来の技術】ウインドやミラ−などの光学部品をオン
グストロ−ムオ−ダの高精度に研磨加工する場合、非接
触研磨装置（フロ−トポリッシング）が用いられる。2. Description of the Related Art A non-contact polishing device (float polishing) is used to polish optical components such as windows and mirrors with high precision on the Angstrom order.
【０００３】非接触研磨装置は、表面に螺旋溝を刻設し
た研磨皿を回転させ、この上に研磨液を供給し、ワ−ク
を研磨液の動圧力によって浮かせた状態で研磨加工する
方法である。[0003] The non-contact polishing device rotates a polishing plate with a spiral groove carved on its surface, supplies a polishing liquid onto the plate, and polishes the workpiece while it is suspended by the dynamic pressure of the polishing liquid. It is.
【０００４】遊離砥粒を含んだ研磨液が流動することで
、砥粒がワ−クの下面に接触し、その下面が徐々に研磨
加工されてゆく。研磨速度は遅いが、凹凸の少ない高精
度の加工面を得ることができる。As the polishing liquid containing free abrasive grains flows, the abrasive grains come into contact with the lower surface of the workpiece, and the lower surface is gradually polished. Although the polishing speed is slow, it is possible to obtain a highly accurate machined surface with few irregularities.
【０００５】従来、研磨皿としては、鉄、銅、錫などの
金属系のものや樹脂系のピッチ皿が知られている。また
、最近では錫製の研磨皿の表面にニッケルをコ−テイン
グしたものが知られている。Conventionally, polishing plates made of metals such as iron, copper, and tin, and pitch plates made of resin are known. Also, recently, a polishing plate made of tin whose surface is coated with nickel is known.
【０００６】鉄や銅などの金属系の研磨皿は腐食し易い
。そのため、加工中にサビが研磨皿とワ−クとの間に入
り込み、ワ−クに傷を付けたりする。また、研磨皿が金
属系の材質であると、静止摩擦係数が高く、かつ硬いた
め、ワ−クとの相互差が大きくなる。そのため、加工開
始時には、ノッキング現象を起こし易く、それによって
ワ−クに傷を付けるということがある。[0006] Polishing plates made of metal such as iron or copper are susceptible to corrosion. Therefore, during processing, rust gets between the polishing plate and the workpiece, causing damage to the workpiece. Furthermore, if the polishing plate is made of a metal material, it has a high coefficient of static friction and is hard, resulting in a large difference between the polishing plate and the workpiece. Therefore, at the start of machining, a knocking phenomenon is likely to occur, which may damage the workpiece.
【０００７】樹脂系のピッチ皿は、加工中における研磨
皿の磨耗、変形が著しい。そのため、ワ−クを高精度に
仕上げるためには、研磨皿の状態を適確に判断し、その
都度、研磨皿を修正したり、加工条件を変更する必要が
ある。したがって、使用に際しては熟練を要するから、
実用的でない。[0007] Resin-based pitch plates are subject to significant wear and deformation during processing. Therefore, in order to finish a workpiece with high precision, it is necessary to accurately judge the condition of the polishing plate and modify the polishing plate or change the processing conditions each time. Therefore, skill is required when using it.
Not practical.
【０００８】錫の表面にニッケルをコ−テイングした研
磨皿も、上記金属系の研磨皿と同様、研磨液に水溶性の
ものを用いると、ニッケルが酸化され、サビの発生を招
くことになる。[0008] Similar to the above-mentioned metal-based polishing plates, if a polishing plate made of tin coated with nickel is used as a polishing liquid that is water-soluble, the nickel will be oxidized and rust will occur. .
【０００９】[0009]
【発明が解決しようとする課題】このように、従来の研
磨皿は、サビの発生などによってワ−クを高精度に研磨
加工することが難しいということがあった。SUMMARY OF THE INVENTION As described above, with conventional polishing plates, it has been difficult to polish a workpiece with high precision due to the occurrence of rust.
【００１０】この発明は上記事情にもとづきなされたも
ので、その目的とするところは、サビが発生したり、ノ
ッキング現象が生じるなどのことのない金属系の研磨皿
を提供することにある。The present invention has been made based on the above circumstances, and its object is to provide a metal polishing plate that does not rust or cause knocking.
【００１１】[0011]
【課題を解決するための手段】上記課題を解決するため
にこの発明は、少なくとも一方の面にダイヤモンド切削
により超精密仕上げ加工された研磨作用面が形成された
円盤状の本体と、この本体の研磨作用面に被着された弗
素樹脂膜とを具備したことを特徴とする。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention provides a disc-shaped main body on which at least one surface is formed with an abrasive working surface that is finished with ultra-precision finishing by diamond cutting, and It is characterized by comprising a fluororesin film adhered to the polishing surface.
【００１２】0012
【作用】上記構成によれば、本体の研磨作用面は耐腐食
性に優れているとともに、摩擦抵抗が小さい弗素樹脂膜
によって覆われているから、サビの発生や始動時におけ
るノッキッグ現象の発生を防止することができる。[Operation] According to the above structure, the polishing surface of the main body has excellent corrosion resistance and is covered with a fluororesin film that has low frictional resistance, so it prevents rusting and knocking phenomenon during startup. It can be prevented.
【００１３】[0013]
【実施例】以下、この発明の一実施例を図面を参照して
説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００１４】図３に示す非接触研磨装置１は有底円筒状
の加工槽２を備えている。この加工槽２の底部外面には
スピンドル３が連結され、このスピンドル３によって加
工槽３が回転駆動されるようになている。The non-contact polishing apparatus 1 shown in FIG. 3 includes a cylindrical processing tank 2 with a bottom. A spindle 3 is connected to the outer surface of the bottom of the processing tank 2, and the processing tank 3 is rotationally driven by the spindle 3.
【００１５】上記加工槽２の内底部には研磨皿４が設置
されている。この研磨皿４はアルミニウムあるいは銅な
どの材料によって円盤状に形成された本体５からなる。
この本体５の研磨作用面となる上面には、ダイヤモンド
切削により大溝６が螺旋状に刻設され、それによって凸
条７が同じく螺旋状に形成されている。上記大溝６の表
面は形状精度１μｍ程度に仕上げられる。上記凸条７の
上面には図２に示されるように小溝８が同じくダイヤモ
ンド切削によって螺旋状に形成されている。A polishing plate 4 is installed at the inner bottom of the processing tank 2. This polishing plate 4 consists of a main body 5 formed into a disc shape from a material such as aluminum or copper. On the upper surface of the main body 5, which is the polishing surface, a large groove 6 is cut in a spiral shape by diamond cutting, and thereby a protrusion 7 is also formed in a spiral shape. The surface of the large groove 6 is finished with a shape accuracy of about 1 μm. As shown in FIG. 2, a small groove 8 is formed in a spiral shape on the upper surface of the protrusion 7 by diamond cutting.
【００１６】上記本体５にアルミニウムあるいは銅など
の材料を選んだ理由としては、ダイヤモンド切削によっ
て高精度な加工が可能であること、および熱伝導率が高
いことなどが挙げられる。The reasons for choosing a material such as aluminum or copper for the main body 5 are that it can be processed with high precision by diamond cutting, and that it has high thermal conductivity.
【００１７】このように大溝６と小溝８とが形成された
本体５の表面にはたとえば四弗化エチレンなどの弗素樹
脂膜９が数十μｍの厚さでコ−テイングされている。コ
−テイングされた弗素樹脂膜９の表面はダイヤモンド切
削によって仕上げ加工されている。The surface of the main body 5 in which the large grooves 6 and small grooves 8 are formed is coated with a fluororesin film 9 made of, for example, tetrafluoroethylene to a thickness of several tens of μm. The surface of the coated fluororesin film 9 is finished by diamond cutting.
【００１８】上記研磨皿４の上方には下端に円盤状のホ
ルダ１１が設けられていると共に図示しない駆動源によ
って回転駆動される加工用スピンドル１２が軸線を垂直
にして設けられている。A disk-shaped holder 11 is provided at the lower end above the polishing plate 4, and a processing spindle 12 is provided with its axis perpendicular, which is rotatably driven by a drive source (not shown).
【００１９】上記ホルダ１１の下面にはウインドやミラ
−などの光学部品からなるワ−ク１３が接着などの手段
によって保持固定されている。このワ−ク１３は上記研
磨皿４の上面と所定の間隔で離間対向している。A workpiece 13 consisting of an optical component such as a window or a mirror is held and fixed on the lower surface of the holder 11 by adhesive or other means. This work 13 faces the upper surface of the polishing plate 4 at a predetermined distance.
【００２０】さらに、研磨槽２の上方には図示しない研
磨液循環装置に連通した研磨液供給ノズル１４が配置さ
れている。この研磨液供給ノズル１４からは遊離砥粒を
含むとともに温度管理された研磨液Ｌが供給されるよう
になっている。この研磨液Ｌの液面は図３に示すように
研磨皿４よりも十分に高い位置になるよう維持されてい
る。つまり、研磨皿４によるワ−ク１３の研磨加工は研
磨液Ｌ中で行われるようになっている。Further, above the polishing tank 2, a polishing liquid supply nozzle 14 is arranged which communicates with a polishing liquid circulation device (not shown). From this polishing liquid supply nozzle 14, a polishing liquid L containing free abrasive grains and whose temperature is controlled is supplied. The level of the polishing liquid L is maintained at a level sufficiently higher than the polishing plate 4, as shown in FIG. In other words, polishing of the workpiece 13 with the polishing plate 4 is carried out in the polishing liquid L.
【００２１】加工槽２に温度管理された研磨液Ｌを供給
するようにしたことで、研磨加工中に本体５と弗素樹脂
膜９との二重構造をなした研磨皿４が熱変形を起こすこ
とがなくなるから、それによって上記弗素樹脂膜９が本
体５から剥離するのが防止される。By supplying the temperature-controlled polishing liquid L to the processing tank 2, the polishing plate 4, which has a double structure of the main body 5 and the fluororesin film 9, is thermally deformed during the polishing process. This prevents the fluororesin film 9 from peeling off from the main body 5.
【００２２】このような構成の非接触研磨装置１によれ
ば、研磨皿４を金属製の本体５の研磨作用面に弗素樹脂
膜９をコ−テイングして形成した。弗素樹脂膜９は耐腐
食性、耐磨耗性に優れるとともに、摩擦抵抗が小さい。According to the non-contact polishing apparatus 1 having such a structure, the polishing dish 4 is formed by coating the polishing surface of the metal main body 5 with a fluororesin film 9. The fluororesin film 9 has excellent corrosion resistance and abrasion resistance, and low frictional resistance.
【００２３】研磨皿４が耐腐食性に優れることで、研磨
液Ｌにアルカリまたは酸性のものを用いても、腐食して
サビを発生するようなことがない。そのため、従来のよ
うにサビの発生により研磨精度が低下することがない。Since the polishing plate 4 has excellent corrosion resistance, even if an alkaline or acidic polishing liquid L is used, it will not corrode and rust. Therefore, the polishing accuracy does not deteriorate due to the occurrence of rust unlike in the conventional case.
【００２４】また、研磨皿４が耐磨耗性に優れることで
、加工中に磨耗することが少ない。そのため、高精度に
仕上げられた研磨皿４の形状精度がそのままワ−ク１３
に転写されるから、ワ−クを高精度に加工することがで
きる。Furthermore, since the polishing plate 4 has excellent wear resistance, it is less likely to wear out during processing. Therefore, the precision of the shape of the polishing plate 4, which has been finished with high precision, remains the same when applying the workpiece 13.
The workpiece can be processed with high precision.
【００２５】また、研磨皿４の摩擦抵抗が小さいことに
より、加工開始時（始動時）におけるステックスリップ
現象（始動時の抵抗が動き出した後の抵抗よりも大きい
現象）がない。そのため、研磨開始時に生じ易い、ワ−
ク１３と研磨皿４とがギクシャクしたノッキング現象が
なくなるから、加工開始時にワ−ク１３に傷を付けるこ
とが防止される。なお、上記一実施例では、弗素樹脂膜
として四弗化樹脂膜を挙げたが、弗素樹脂膜としては三
弗化樹脂膜であってもよい。Furthermore, since the frictional resistance of the polishing plate 4 is small, there is no stick-slip phenomenon (a phenomenon in which the resistance at the time of starting is greater than the resistance after the movement starts) at the start of processing (at the time of starting). Therefore, the workpiece that tends to occur at the start of polishing is
Since the knocking phenomenon in which the workpiece 13 and the polishing plate 4 are jerky is eliminated, damage to the workpiece 13 at the start of machining is prevented. In the above embodiment, a tetrafluoride resin film is used as the fluororesin film, but a trifluoride resin film may also be used as the fluororesin film.
【００２６】[0026]
【発明の効果】以上述べたようにこの発明は、円盤状の
本体の少なくとも一方の面をダイヤモンド切削により超
精密仕上げ加工して研磨作用面に形成し、この研磨作用
面に弗素樹脂膜を被着するようにした。Effects of the Invention As described above, the present invention is characterized in that at least one surface of a disc-shaped main body is processed with ultra-precision finishing by diamond cutting to form a polishing surface, and this polishing surface is coated with a fluororesin film. I decided to wear it.
【００２７】上記弗素樹脂膜は耐腐食性、耐磨耗性に優
れるとともに、摩擦抵抗が小さい。そのため、研磨皿は
、研磨液に侵されてサビを発生するということがないか
ら、サビによってワ−クを傷付け、加工精度を低下させ
ることがない。また、耐磨耗性に優れることで、研磨皿
の形状精度を確実にワ−クに転写することができるから
、そのことによっても加工精度の向上が計れ、さらに摩
擦抵抗が小さいことによって加工開始時におけるノッキ
ング現象を防止することができるなどの利点を有する。The above-mentioned fluororesin film has excellent corrosion resistance and abrasion resistance, as well as low frictional resistance. Therefore, the polishing plate will not be corroded by the polishing liquid and rust will not occur, so the workpiece will not be damaged by rust and the machining accuracy will not be reduced. In addition, due to its excellent wear resistance, the shape accuracy of the polishing plate can be reliably transferred to the workpiece, which also improves machining accuracy, and the low frictional resistance makes it possible to start machining. This has advantages such as being able to prevent knocking phenomena during times of use.
【図面の簡単な説明】[Brief explanation of the drawing]
【図１】この発明の一実施例の研磨皿の断面図。FIG. 1 is a sectional view of a polishing plate according to an embodiment of the present invention.
【図２】同じく研磨皿の一部を拡大した断面図。FIG. 2 is a partially enlarged sectional view of the polishing plate.
【図３】同じく被接触研磨装置の構成図。FIG. 3 is a configuration diagram of a contact polishing device.
４…研磨皿、５…本体、６…大溝、７…凸条、８…小溝
、９…弗素樹脂膜、１３…ワ−ク、Ｌ…研磨液。4... Polishing dish, 5... Main body, 6... Large groove, 7... Convex strip, 8... Small groove, 9... Fluorine resin film, 13... Work, L... Polishing liquid.
Claims (3)
削により超精密仕上げ加工された研磨作用面が形成され
た円盤状の本体と、この本体の研磨作用面に被着された
弗素樹脂膜とを具備したことを特徴とする研磨皿。Claim 1: A disc-shaped main body having a polishing surface finished with ultra-precision finishing by diamond cutting on at least one surface, and a fluororesin film adhered to the polishing surface of the main body. A polishing plate characterized by:
であることを特徴とする請求項１記載の研磨皿。2. The polishing dish according to claim 1, wherein the fluororesin film is made of tetrafluoroethylene resin.
旋状に刻設されていることを特徴とする請求項１記載の
研磨皿。3. The polishing dish according to claim 1, wherein said polishing surface has a large groove and a small groove formed in a spiral shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075237A JPH04310365A (en) | 1991-04-08 | 1991-04-08 | Polishing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075237A JPH04310365A (en) | 1991-04-08 | 1991-04-08 | Polishing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04310365A true JPH04310365A (en) | 1992-11-02 |
Family
ID=13570413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3075237A Pending JPH04310365A (en) | 1991-04-08 | 1991-04-08 | Polishing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04310365A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998045087A1 (en) * | 1997-04-04 | 1998-10-15 | Rodel Holdings, Inc. | Improved polishing pads and methods relating thereto |
| US5921853A (en) * | 1995-04-10 | 1999-07-13 | Matsushita Electric Industrial Co., Ltd. | Apparatus for polishing substrate using resin film or multilayer polishing pad |
| EP0983822A1 (en) * | 1998-09-04 | 2000-03-08 | Speedfam Co., Ltd. | Surface polishing apparatus |
| JP2000288918A (en) * | 1999-04-02 | 2000-10-17 | Applied Materials Inc | Improved CMP platen with pattern surface |
| JP2003197578A (en) * | 2001-12-25 | 2003-07-11 | Yodogawa Hu-Tech Kk | Disc-shaped molded product for CMP device, ring-shaped component for CMP device, and method for producing them |
| US6719618B2 (en) * | 2000-05-30 | 2004-04-13 | Renesas Technology Corp. | Polishing apparatus |
| CN103737452A (en) * | 2014-01-16 | 2014-04-23 | 王成 | Novel float polishing equipment and polishing method |
| US8910512B2 (en) | 2012-03-22 | 2014-12-16 | Kobe Steel, Ltd. | Multi-component force measurement spindle unit of tire testing machine |
-
1991
- 1991-04-08 JP JP3075237A patent/JPH04310365A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5921853A (en) * | 1995-04-10 | 1999-07-13 | Matsushita Electric Industrial Co., Ltd. | Apparatus for polishing substrate using resin film or multilayer polishing pad |
| WO1998045087A1 (en) * | 1997-04-04 | 1998-10-15 | Rodel Holdings, Inc. | Improved polishing pads and methods relating thereto |
| EP0983822A1 (en) * | 1998-09-04 | 2000-03-08 | Speedfam Co., Ltd. | Surface polishing apparatus |
| JP2000288918A (en) * | 1999-04-02 | 2000-10-17 | Applied Materials Inc | Improved CMP platen with pattern surface |
| US6719618B2 (en) * | 2000-05-30 | 2004-04-13 | Renesas Technology Corp. | Polishing apparatus |
| US6899603B2 (en) | 2000-05-30 | 2005-05-31 | Renesas Technology Corp. | Polishing apparatus |
| JP2003197578A (en) * | 2001-12-25 | 2003-07-11 | Yodogawa Hu-Tech Kk | Disc-shaped molded product for CMP device, ring-shaped component for CMP device, and method for producing them |
| US8910512B2 (en) | 2012-03-22 | 2014-12-16 | Kobe Steel, Ltd. | Multi-component force measurement spindle unit of tire testing machine |
| CN103737452A (en) * | 2014-01-16 | 2014-04-23 | 王成 | Novel float polishing equipment and polishing method |
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