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JPH04225012A - Tetra-nuclear phenolic novolak and its production - Google Patents

Tetra-nuclear phenolic novolak and its production

Info

Publication number
JPH04225012A
JPH04225012A JP41512190A JP41512190A JPH04225012A JP H04225012 A JPH04225012 A JP H04225012A JP 41512190 A JP41512190 A JP 41512190A JP 41512190 A JP41512190 A JP 41512190A JP H04225012 A JPH04225012 A JP H04225012A
Authority
JP
Japan
Prior art keywords
formula
product
compound
allyl
novolak
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP41512190A
Other languages
Japanese (ja)
Inventor
Toshio Takahashi
利男 高橋
Ichiro Kimura
一郎 木村
Susumu Nagao
長尾 晋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP41512190A priority Critical patent/JPH04225012A/en
Publication of JPH04225012A publication Critical patent/JPH04225012A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To obtain the subject novolak having low softening temperature and excellent handleability and workability, and giving a cured product having excellent heat-resistance in high yield by reacting an o-cresol binuclear dimethylol compound with an aromatic compound having allyl group, etc. CONSTITUTION:The objective tetra-nuclear phenolic novolak expressed by formula III (R1, R2, R6 and R7 are H or allyl; R3, R4, R5 and R8 to R10 are H, <=5C alkoxy or <=5C alkyl) can be produced by adding a compound of formula II (R11 and R12 are H or allyl; R13 and R15 are H, <=5C alkoxy or <=5C alkyl) (e.g. 2-allylphenol) to an o-cresol binuclear dimethylol compound of formula I, stirring the mixture in nitrogen atmosphere at room temperature, adding p-toluenesulfonic acid to the mixture, reacting at 50 deg.C for 2hr, adding an organic solvent such as methyl isobutyl ketone to dissolve the reaction product, washing the obtained solution with water, separating the organic layer and finally distilling out the solvent.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、4核体フェノール類ノ
ボラック及びその製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tetranuclear phenolic novolak and a method for producing the same.

【0002】0002

【従来の技術】フェノール類ノボラックはフェノール樹
脂とて、電気、電子、建築、塗料関係等に広く使用され
ているが、従来のフェノール類ノボラックは分子量分布
が広く、主として軟化温度の違いによりそれぞれの用途
に用いられてきた。
[Prior Art] Phenolic novolaks are widely used as phenolic resins in electrical, electronic, architectural, paint-related, etc., but conventional phenolic novolaks have a wide molecular weight distribution, and their differences are mainly due to differences in softening temperature. It has been used for various purposes.

【0003】0003

【発明が解決しようとする課題】しかし、フェノール類
ノボラックを用いた樹脂に対する高性能化の要求は近年
増すばかりで、従来型の分子量分布の広いノボラックで
は対応しきれなくなってきている。
[Problems to be Solved by the Invention] However, demands for higher performance for resins using phenolic novolacs have been increasing in recent years, and conventional novolaks with a wide molecular weight distribution are no longer able to meet the demands.

【0004】例えば、電気、電子機器においては高集積
化、高性能化、高信頼性化には目を見張るものがあり、
それと共に、それに使用される絶縁材料、部品等に対し
て耐熱性、耐湿性、寸法安定性等の諸性能のより一層の
向上が望まれている。
[0004] For example, in electrical and electronic equipment, there has been a remarkable increase in integration, performance, and reliability.
At the same time, it is desired that the insulating materials, components, etc. used therefor be further improved in various performances such as heat resistance, moisture resistance, and dimensional stability.

【0005】従来より、これらの材料に用いられるフェ
ノール類ノボラックは、低粘度品(低軟化温度品)では
2核体等の低分子化合物が多く(例えば25重量%)含
み、硬化物での耐熱性に問題があり、ビスフェノール系
でも常温で液体の使いやすいものがあるが、二官能性で
あるため、硬化物での耐熱性に欠点を有する。
Conventionally, phenolic novolacs used for these materials have low viscosity products (low softening temperature products) containing a large amount (for example, 25% by weight) of low-molecular compounds such as binuclear bodies, and have poor heat resistance in the cured product. Some bisphenol-based compounds are liquid at room temperature and are easy to use, but because they are difunctional, they have a drawback in heat resistance when cured.

【0006】また高軟化温度のフェノール類ノボラック
は、硬化物での耐熱性は向上するものの軟化温度が高い
ため、作業性が悪くなり、相溶性との兼ね合いで使用が
限定される等の欠点を有する。
[0006] Although phenolic novolacs with a high softening temperature improve the heat resistance of the cured product, the high softening temperature causes poor workability and has drawbacks such as limited use due to compatibility. have

【0007】[0007]

【課題を解決するための手段】本発明者らは、フェノー
ル類ノボラックについて種々検討の結果、特定の4核体
フェノール類ノボラックは、軟化温度が低いにも拘わら
ずその硬化物が耐熱性に優れたフェノール類ノボラック
であることを見いだし本発明を完成させるに至った。
[Means for Solving the Problems] As a result of various studies on phenolic novolacs, the present inventors found that a specific tetranuclear phenolic novolak has a cured product with excellent heat resistance despite its low softening temperature. The present inventors discovered that the phenolic novolak is a phenolic novolak, and completed the present invention.

【0008】即ち本発明は、(1)  式〔1〕That is, the present invention provides (1) formula [1]

【00
09】
00
09]

【化4】[C4]

【0010】(式中、R1、R2、R6、R7はそれぞ
れ独立して水素原子またはアリル基を示し、R1、R2
、R6、R7の少なくとも一つはアリル基であり、R3
、R4、R5、R8、R9、R10、はそれぞれ独立し
て水素原子、炭素数5以下のアルコキシル基または炭素
数5以下のアルキル基を示す。)で表される4核体フェ
ノール類ノボラック。
(In the formula, R1, R2, R6, R7 each independently represent a hydrogen atom or an allyl group, and R1, R2
, R6, and R7 are allyl groups, and R3
, R4, R5, R8, R9, and R10 each independently represent a hydrogen atom, an alkoxyl group having 5 or less carbon atoms, or an alkyl group having 5 or less carbon atoms. ) is a tetranuclear phenolic novolac.

【0011】(2)  式〔2〕(2) Formula [2]

【0012】0012

【化5】[C5]

【0013】で表されるO−クレゾール2核体ジメチロ
ール化合物に式〔3〕
The O-cresol dinuclear dimethylol compound represented by the formula [3]

【0014】[0014]

【化6】[C6]

【0015】(式中、R11、R12はそれぞれ独立し
て水素原子またはアリル基を示し、R13、R14、R
15はそれぞれ独立して水素原子、炭素数5以下のアル
コキシル基または炭素数5以下のアルキル基を示す。)
で表される化合物を反応させる事を特徴とする前記式〔
1〕で表される4核体フェノール類ノボラックの製造法
、に関する。
(In the formula, R11 and R12 each independently represent a hydrogen atom or an allyl group, and R13, R14, R
15 each independently represents a hydrogen atom, an alkoxyl group having 5 or less carbon atoms, or an alkyl group having 5 or less carbon atoms. )
The above formula [ characterized by reacting a compound represented by
The present invention relates to a method for producing a tetranuclear phenol novolac represented by [1].

【0016】本発明において、4核体フェノール類ノボ
ラック〔1〕は前記式〔2〕で表されるO−クレゾール
2核体ジメチロール化合物と式〔3〕で表される化合物
を反応させる事により得ることができるが、反応は酸触
媒の存在下に行なうのが好ましく、脱水縮合により容易
に式〔1〕の化合物を得る事ができる。
In the present invention, the tetranuclear phenol novolak [1] is obtained by reacting the O-cresol dinuclear dimethylol compound represented by the above formula [2] with the compound represented by the formula [3]. However, the reaction is preferably carried out in the presence of an acid catalyst, and the compound of formula [1] can be easily obtained by dehydration condensation.

【0017】使用する触媒としては塩酸、硫酸、リン酸
等の無機酸、p−トルエンスルホン酸、シュウ酸等の有
機酸が挙げられるが、反応液の着色が少ないことにより
p−トルエンスルホン酸、シュウ酸が好ましい。
Examples of catalysts used include inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, and organic acids such as p-toluenesulfonic acid and oxalic acid. Oxalic acid is preferred.

【0018】触媒の使用量はO−クレゾール2核体ジメ
チロール化合物(式〔2〕)に対し好ましくは0.1〜
30重量%の範囲であるが、より好ましくは0.2〜1
0重量%である。
The amount of the catalyst used is preferably 0.1 to 0.1 to the O-cresol dinuclear dimethylol compound (formula [2]).
The range is 30% by weight, more preferably 0.2 to 1
It is 0% by weight.

【0019】式〔3〕の化合物としては、2−アリルフ
ェノール、アリルフェニルエーテル、2−アリル−4−
メチルフェノール、2−アリル−6−メチルフェノール
、4−アリル−2−メトキシフェノール等が挙げられる
が、2−アリルフェノールが好ましい。
Compounds of formula [3] include 2-allylphenol, allyl phenyl ether, 2-allyl-4-
Examples include methylphenol, 2-allyl-6-methylphenol, 4-allyl-2-methoxyphenol, and 2-allylphenol is preferred.

【0020】式[1]の4核体フェノール類ノボラック
において、末端の2つのベンゼン核のいずれにもアリル
基がついている場合は、式[3]の化合物として、上記
等のアリル基含有化合物の一種又は2種以上が用いられ
るが、式[1]の4核体フェノール類ノボラックの末端
の2つのベンゼン核のうちの一方にのみアリル基がつい
ている場合は、式[3]の化合物として、上記アリル基
含有化合物と他のフェノール類とを組合せて用いる。
In the tetranuclear phenolic novolak of formula [1], when allyl groups are attached to both of the two terminal benzene nuclei, the above-mentioned allyl group-containing compounds are used as compounds of formula [3]. One or more types may be used, but if an allyl group is attached to only one of the two terminal benzene nuclei of the tetranuclear phenol novolak of formula [1], as a compound of formula [3], The allyl group-containing compound and other phenols are used in combination.

【0021】他のフェノール類としては、例えば、フェ
ノールやo−クレゾール、m−クレゾール、p−クレゾ
ール、2,4−キシレノール、2,6−キシレノール、
2,3,6−トリメチルフェノール等の置換基として1
〜3個の低級アルキル基(例えばメチル基)を有するフ
ェノール類等が挙げられる。
Examples of other phenols include phenol, o-cresol, m-cresol, p-cresol, 2,4-xylenol, 2,6-xylenol,
1 as a substituent for 2,3,6-trimethylphenol, etc.
Examples include phenols having ~3 lower alkyl groups (for example, methyl groups).

【0022】式[3]の化合物として、上記アリル基含
有化合物と他のフェノール類とを組合わせて用いる場合
、アリル基含有化合物の使用割合は、式[3]の化合物
の総量中10モル%以上であることが好ましく、特に2
0モル%以上が好ましい。但し、反応して得られる反応
生成物をそのまま利用する場合に、アルケニル当量が大
きい反応生成物を用いたい場合は、アリル基含有化合物
の使用割合を10モル%以下とすることもできる。即ち
、アリル基含有化合物の使用割合は、必要に応じて自由
に選択することができる。
When the above allyl group-containing compound and other phenols are used in combination as the compound of formula [3], the proportion of the allyl group-containing compound used is 10 mol % of the total amount of the compound of formula [3]. It is preferable that it is more than 2, especially 2
It is preferably 0 mol% or more. However, when the reaction product obtained by the reaction is used as it is and it is desired to use a reaction product with a large alkenyl equivalent, the proportion of the allyl group-containing compound used can be 10 mol % or less. That is, the proportion of the allyl group-containing compound to be used can be freely selected as required.

【0023】式[3]の化合物の使用量はO−クレゾー
ル2核体ジメチロール化合物(式〔2〕)1モルに対し
て1〜50モルの範囲が好ましく、特に2〜15モルの
範囲が好ましい。
The amount of the compound of formula [3] to be used is preferably in the range of 1 to 50 moles, particularly preferably in the range of 2 to 15 moles, per mole of the O-cresol dinuclear dimethylol compound (formula [2]). .

【0024】反応は、溶媒を用いず無溶媒で行う事が出
来るが、溶媒中で行っても良く、溶媒としては、ベンゼ
ン、トルエン、メチルイソブチルケトン等原料及び生成
物と反応しないものであれば、特に限定されずいずれも
使用できる。
The reaction can be carried out without a solvent, but it can also be carried out in a solvent, and the solvent may be benzene, toluene, methyl isobutyl ketone, etc. as long as it does not react with the raw materials or products. , any of them can be used without particular limitation.

【0025】通常は、常圧下で反応を行うが、反応で生
成する水を反応系外に除去しながら且つ反応に使用する
原料化合物が留出しない程度の減圧、温度下で行う事も
できる。
The reaction is usually carried out under normal pressure, but it can also be carried out under reduced pressure and temperature to such an extent that the water produced in the reaction is removed from the reaction system and the raw material compounds used in the reaction are not distilled off.

【0026】反応温度は、溶媒を用いない場合は使用す
る原料化合物の融点より高い温度で行う事になるが、溶
媒を用いる場合には原料化合物の融点に関係ない温度で
行う事ができる。反応温度は通常20℃〜150℃の範
囲にあるが、好ましくは40℃〜100℃である。
When a solvent is not used, the reaction temperature is higher than the melting point of the starting compound used, but when a solvent is used, the reaction can be carried out at a temperature independent of the melting point of the starting compound. The reaction temperature is usually in the range of 20°C to 150°C, preferably 40°C to 100°C.

【0027】反応時間は特に限定されないが、通常10
分〜20時間であり、好ましくは30分〜10時間であ
る。
The reaction time is not particularly limited, but is usually 10
minutes to 20 hours, preferably 30 minutes to 10 hours.

【0028】反応終了後、使用した触媒を水洗等で除去
し、その後使用した溶媒及び過剰の式[3]の化合物を
減圧下で留去することにより目的物の4核体フェノール
類ノボラックが高収率で得られる。
After the completion of the reaction, the used catalyst is removed by washing with water, etc., and then the used solvent and excess compound of formula [3] are distilled off under reduced pressure to obtain a high amount of the target tetranuclear phenol novolac. obtained in high yield.

【0029】このようにして得られる反応生成物(アル
ケニル基含有フェノール類ノボラック)は、式[3]の
化合物として、アリル基含有化合物と他のフェノール類
を如何なる割合で用いたかにより異なるが、通常は、式
[1]の4核体フェノール類ノボラックを1重量%以上
含むが、アリル基含有化合物の使用割合を増やすことに
より、反応生成物(アルケニル基含有フェノール類ノボ
ラック)中の式[1]の4核体フェノール類ノボラック
の含有量を30重量%以上あるいは50重量%以上とす
ることができる。
The reaction product thus obtained (alkenyl group-containing phenol novolak) varies depending on the proportion of the allyl group-containing compound and other phenols used as the compound of formula [3], but usually contains 1% by weight or more of the tetranuclear phenolic novolac of formula [1], but by increasing the proportion of the allyl group-containing compound used, the formula [1] in the reaction product (alkenyl group-containing phenolic novolak) The content of the tetranuclear phenol novolak can be 30% by weight or more or 50% by weight or more.

【0030】上記反応により得られるアルケニル基含有
フェノール類ノボラックは、2核体フェノール類ノボラ
ックを、通常15重量%以下含み、より好ましくは10
重量%以下含み、特に好ましくは5重量%以下含む。
The alkenyl group-containing phenolic novolak obtained by the above reaction usually contains 15% by weight or less, more preferably 10% by weight or less of dinuclear phenolic novolak.
It contains at most 5% by weight, particularly preferably at most 5% by weight.

【0031】これら2核体フェノール類ノボラックとし
ては、式〔4〕で表される化合物が挙げられる。
Examples of these dinuclear phenol novolaks include compounds represented by formula [4].

【0032】[0032]

【化7】[C7]

【0033】アルケニル基含有フェノール類ノボラック
中に含まれる2核体フェノール類ノボラックの量は、少
ないほど好ましく、従って、式[4]の化合物がなるべ
く副生しないような条件をを選択することが好ましい。 アルケニル基含有フェノール類ノボラック中には、その
他に5核体、6核体、8核体等の多核体フェノール類ノ
ボラックが含まれてくることもある。
The smaller the amount of the dinuclear phenol novolak contained in the alkenyl group-containing phenol novolak, the better. Therefore, it is preferable to select conditions such that the compound of formula [4] is not produced as a by-product as much as possible. . The alkenyl group-containing phenol novolak may also contain polynuclear phenolic novolaks such as pentanuclear, hexanuclear, and octnuclear.

【0034】ここで、X核体とは、1分子中にX個のベ
ンゼル核を有する化合物を意味し、例えば、4核体、2
核体とは、それぞれ、1分子中に4個の又は2個のベン
ゼン核を有する化合物を意味する。
[0034] Here, the term "X-nuclear" refers to a compound having X benzene nuclei in one molecule, such as tetranuclear,
Nuclear body means a compound having four or two benzene nuclei in one molecule, respectively.

【0035】本発明の4核体フェノール類ノボラックは
、軟化温度が低いため取扱い易く、又、このシリコン化
合物等による変性物を用いて得られる硬化物は、耐熱性
、低応力性に優れている。従って、本発明の4核体フェ
ノール類ノボラックは電子、電気機器用途の耐熱性に優
れたエポキシ樹脂積層板やエポキシ樹脂成形材料の硬化
剤として使用でき、また、エポキシ樹脂の原料及び他の
誘導体の原料として使用することもできる。
The tetranuclear phenolic novolac of the present invention has a low softening temperature and is therefore easy to handle, and the cured product obtained using the modified product with silicone compounds has excellent heat resistance and low stress properties. . Therefore, the tetranuclear phenolic novolac of the present invention can be used as a curing agent for epoxy resin laminates and epoxy resin molding materials with excellent heat resistance for electronic and electrical equipment applications, and can also be used as a curing agent for epoxy resin raw materials and other derivatives. It can also be used as a raw material.

【0036】[0036]

【実施例】以下実施例を挙げて本発明を具体的に説明す
る。
[Examples] The present invention will be specifically explained below with reference to Examples.

【0037】実施例1 温度計、攪拌機を付けたガスラ容器にO−クレゾール2
核体ジメチロール化合物(式〔2〕)200g(0.6
9モル)及び2−アリルフェノール924.6g(6.
9モル)を仕込み窒素雰囲気下で室温で攪拌した。P−
トルエンスルホン酸2g(O−クレゾール2核体ジメチ
ロール化合物に対して1.0重量%)を発熱に注意し、
液温が50℃を越えないよう徐々に添加した。
Example 1 O-cresol 2 was placed in a gas container equipped with a thermometer and a stirrer.
Nuclear dimethylol compound (formula [2]) 200g (0.6
9 mol) and 924.6 g of 2-allylphenol (6.
9 mol) was charged and stirred at room temperature under a nitrogen atmosphere. P-
Add 2 g of toluenesulfonic acid (1.0% by weight based on the O-cresol dinuclear dimethylol compound), being careful not to generate heat.
The mixture was added gradually so that the liquid temperature did not exceed 50°C.

【0038】添加後油浴上で50℃まで加温し、2時間
反応させた後、メチルイソブチルケトンを500ml加
えて2リットルの分液ロートに移し水洗した。洗浄水が
中性を示すまで水洗後、有機層中の溶媒及び過剰の2−
アリルフェノールを減圧下除去し、淡黄色粘性物[生成
物(A)]340gを得た。
After the addition, the mixture was heated to 50° C. on an oil bath and reacted for 2 hours. After that, 500 ml of methyl isobutyl ketone was added and the mixture was transferred to a 2 liter separating funnel and washed with water. After washing with water until the washing water shows neutrality, the solvent in the organic layer and excess 2-
Allylphenol was removed under reduced pressure to obtain 340 g of a pale yellow viscous substance [product (A)].

【0039】生成物(A)の軟化温度は40.1℃で水
酸基等量(g/eq)は131アルケニル当量(g/e
q)は265であった。
The softening temperature of the product (A) is 40.1°C, and the hydroxyl group equivalent (g/eq) is 131 alkenyl equivalent (g/eq).
q) was 265.

【0040】溶媒としてテトラヒドロフラン(THF)
を用いて生成物(A)を次のGPC装置により分析した
ところ図1に示される分子量分布曲線を得た。
Tetrahydrofuran (THF) as a solvent
When the product (A) was analyzed using the following GPC apparatus, the molecular weight distribution curve shown in FIG. 1 was obtained.

【0041】GPC装置  :  島津製作所カ  ラ
  ム  :  TSK−G−3000HXL(1本)
+TSK−G−2000HXL(2本)溶      
媒  :  テトラヒドロフラン  1ml/min検
      出  :  UV(254nm)
[0041] GPC device: Shimadzu Co., Ltd. Column: TSK-G-3000HXL (1 piece)
+TSK-G-2000HXL (2 pieces)
Medium: Tetrahydrofuran 1ml/min Detection: UV (254nm)

【004
2】この分析条件でのビスフェノールFの現れるリテン
ションタイムは29.5分であるので、メインピークの
リテンションタイムはベンゼン核を4個有する4核体の
リテンションタイムに相当し、図1よりメインピークの
化合物の生成物(A)中の含有量は90重量%であった
004
2] The retention time at which bisphenol F appears under these analysis conditions is 29.5 minutes, so the retention time of the main peak corresponds to the retention time of a tetranuclear substance having four benzene nuclei. The content of the compound in the product (A) was 90% by weight.

【0043】メインピークの化合物を分取し、マススペ
クトル(FAB−MS)によって分析したところ、M+
520が得られた。従って、メインピークの化合物は次
の式[5]の化学構造を有する化合物であることがわか
った。
When the main peak compound was separated and analyzed by mass spectrometry (FAB-MS), it was found that M+
520 was obtained. Therefore, it was found that the compound of the main peak was a compound having the chemical structure of the following formula [5].

【0044】[0044]

【化8】[Chemical formula 8]

【0045】また、図1より生成物(A)は2核体フェ
ノール類ノボラックを0.3重量%含んでいることがわ
かった。
Further, from FIG. 1, it was found that the product (A) contained 0.3% by weight of the dinuclear phenol novolak.

【0046】実施例2 実施例1において、2−アリルフェノール量を370g
(2.76モル)とした以外は実施例1と同様に反応、
処理して淡黄色固体[生成物(B)]337gを得た。 生成物(B)の軟化温度は57.4℃でアルケニル当量
(g/eq)で275であった。
Example 2 In Example 1, the amount of 2-allylphenol was changed to 370 g.
Reaction was carried out in the same manner as in Example 1 except that (2.76 mol) was used.
After treatment, 337 g of a pale yellow solid [product (B)] was obtained. The softening temperature of the product (B) was 57.4° C. and 275 in terms of alkenyl equivalent (g/eq).

【0047】生成物(B)のGPC装置による分析結果
を図2に示す。なお、分析条件は実施例1と同じである
。メインピークのリテンションタイムは図1と同じく4
核体のリテンションタイムに相当し、図2よりメインピ
ークの化合物の生成物(B)中の含有量は60重量%で
あり、又、生成物(B)は2核体フェノール類ノボラッ
クを0.7重量%含んでいることがわかった。
The results of analysis of product (B) using a GPC device are shown in FIG. Note that the analysis conditions are the same as in Example 1. The retention time of the main peak is 4 as in Figure 1.
The content of the main peak compound in the product (B), which corresponds to the retention time of the nuclear body, is 60% by weight as shown in FIG. It was found that it contained 7% by weight.

【0048】又、実施例1と同様に、メインピークの化
合物を分取し、マススペクトルにより分析したところ、
M+520が得られ、メインピークの化合物は式[5]
の化学構造を有することがわかった。
[0048] Similarly to Example 1, the main peak compound was fractionated and analyzed by mass spectroscopy.
M+520 was obtained, and the main peak compound was of formula [5]
It was found that it has the chemical structure of

【0049】実施例3 実施例1において、2−アリルフェノール924.6g
の代りに2−アリルフェノール184.9g(1.38
モル)とO−クレゾール149.0g(1.38モル)
を用いた以外は実施例1と同様に反応、処理して淡黄色
固体[生成物(C)]326gを得た。生成物(C)の
軟化温度は84.0℃でアルケニル当量(g/eq)は
735であった。
Example 3 In Example 1, 924.6 g of 2-allylphenol
184.9g (1.38g) of 2-allylphenol instead of
mol) and O-cresol 149.0g (1.38 mol)
The reaction and treatment were carried out in the same manner as in Example 1 except that 326 g of a pale yellow solid [product (C)] was obtained. Product (C) had a softening temperature of 84.0°C and an alkenyl equivalent (g/eq) of 735.

【0050】生成物(C)のGPC分析を図3に示す(
分析条件は実施例1と同じ)。メインピークのリテンシ
ョンタイムは図1と同じく4核体のリテンションタイム
に相当し、図3よりメインピークの化合物の生成物(C
)中の含有量は58重量%であり、又、生成物(C)は
2核体フェノール類ノボラックを0.6重量%含んでい
ることがわかった。
GPC analysis of product (C) is shown in FIG.
The analysis conditions are the same as in Example 1). The retention time of the main peak corresponds to the retention time of the tetranuclear body as in Figure 1, and from Figure 3, the main peak compound product (C
) was found to be 58% by weight, and the product (C) was found to contain 0.6% by weight of dinuclear phenol novolak.

【0051】又、実施例1と同様に、メインピークの化
合物を分取し、マススペクトルにより分析したところ、
M+520、M+494及びM+468が得られ、メイ
ンピークの化合物は、次の(C−1)、(C−2)、(
C−3)の3つの化合物の混合物であることがわかった
[0051] In addition, in the same manner as in Example 1, the main peak compound was fractionated and analyzed by mass spectroscopy.
M+520, M+494 and M+468 were obtained, and the main peak compounds were the following (C-1), (C-2), (
It was found to be a mixture of three compounds C-3).

【0052】[0052]

【化9】[Chemical formula 9]

【0053】[0053]

【0054】実施例4 実施例1において、2−アリルフェノール924.6g
の代りに2−アリルフェノール92.5g(0.69モ
ル)とO−クレゾール223.6g(2.07モル)を
用いた以外は実施例1と同様に反応、処理して淡黄色固
体[生成物(D)]320gを得た。生成物(D)の軟
化温度は84.5℃でアルケニル当量(g/eq)は1
450であった。
Example 4 In Example 1, 924.6 g of 2-allylphenol
The reaction and treatment were carried out in the same manner as in Example 1, except that 92.5 g (0.69 mol) of 2-allylphenol and 223.6 g (2.07 mol) of O-cresol were used instead of 2-allylphenol. Product (D)] 320 g was obtained. The softening temperature of the product (D) is 84.5°C and the alkenyl equivalent (g/eq) is 1
It was 450.

【0055】生成物(D)のGPC分析を図4に示す(
分析条件は実施例1と同じ)。メインピークのリテンシ
ョンタイムは図1と同じく4核体のリテンションタイム
に相当し、図4よりメインピーク化合物の生成物(D)
中の含有量は59重量%であり、又、生成物(D)は2
核体フェノール類ノボラックを0.7重量%を含んでい
ることがわかった。
GPC analysis of product (D) is shown in FIG.
The analysis conditions are the same as in Example 1). The retention time of the main peak corresponds to the retention time of the tetranuclear body as in Figure 1, and from Figure 4, the main peak compound product (D)
The content of the product (D) is 59% by weight, and the product (D) is 2% by weight.
It was found that it contained 0.7% by weight of the nuclear phenolic novolak.

【0056】又、実施例1と同様に、メインピークの化
合物を分取し、マススペクトルにより分析したところ、
M+520、M+494及びM+468が得られ、メイ
ンピークの化合物は前記(C−1)、(C−2)、(C
−3)の3つの化合物の混合物であることがわかった。
[0056] Similarly to Example 1, the main peak compound was fractionated and analyzed by mass spectroscopy.
M+520, M+494 and M+468 were obtained, and the main peak compounds were the above (C-1), (C-2), (C
-3) was found to be a mixture of three compounds.

【0057】実施例5 実施例1において、2−アリルフェノール924.6g
の代りに2−アリルフェノール184.9g(1.38
モル)と2,6−キシレノール168.4g(1.38
モル)を用いた以外は実施例1と同様に反応、処理して
淡黄色固体[生成物(E)]337gを得た。生成物(
E)の軟化温度は80.6℃でアルケニル当量(g/e
q)は790であった。
Example 5 In Example 1, 924.6 g of 2-allylphenol
184.9g (1.38g) of 2-allylphenol instead of
mol) and 168.4 g (1.38 mol) of 2,6-xylenol
The reaction and treatment were carried out in the same manner as in Example 1 except that mol) was used to obtain 337 g of a pale yellow solid [product (E)]. product (
The softening temperature of E) is 80.6°C and the alkenyl equivalent (g/e
q) was 790.

【0058】生成物EのGPC分析を図5に示す(分析
条件は実施例1と同じ)。メインピークのリテンション
タイムは図1と同じく4核体のリテンションタイムに相
当し、図5よりメインピークの化合物の生成物(E)中
の含有量は61重量%であり、又、生成物(E)は2核
体フェノール類ノボラックを0.6重量%含んでいるこ
とがわかった。
The GPC analysis of product E is shown in FIG. 5 (analytical conditions are the same as in Example 1). The retention time of the main peak corresponds to the retention time of the tetranuclear body as in Figure 1, and from Figure 5, the content of the compound of the main peak in the product (E) is 61% by weight, and ) was found to contain 0.6% by weight of the dinuclear phenolic novolak.

【0058】又、実施例1と同様に、メインピークの化
合物を分取し、マススペクトルにより分析したところ、
M+520、M+508及びM+496が得られ、メイ
ンピークの化合物は、次の(E−1)、(E−2)、(
E−3)の3つの化合物の混合物であることがわかった
[0058] Similarly to Example 1, the main peak compound was fractionated and analyzed by mass spectroscopy.
M+520, M+508 and M+496 were obtained, and the main peak compounds were the following (E-1), (E-2), (
It was found to be a mixture of three compounds E-3).

【0059】[0059]

【化10】[Chemical formula 10]

【0060] 【0061】実施例6 実施例1において、2−アリルフェノール924.6g
の代りに2−アリルフェノール184.9g(1.38
モル)と2,3,6−トリメチルフェノール188.0
g(1.38モル)を用いた以外は実施例1と同様に反
応、処理して淡黄色固体[生成物(F)]334gを得
た。生成物(F)の軟化温度は80.2℃でアルケニル
当量(g/eq)は820であった。
Example 6 In Example 1, 924.6 g of 2-allylphenol
184.9g (1.38g) of 2-allylphenol instead of
mol) and 2,3,6-trimethylphenol 188.0
The reaction and treatment were carried out in the same manner as in Example 1, except that 334 g of a pale yellow solid [product (F)] was obtained, except that 1.38 mol of the product was used. The product (F) had a softening temperature of 80.2°C and an alkenyl equivalent (g/eq) of 820.

【0062】生成物(F)のGPC分析を図6に示す(
分析条件は実施例1と同じ)。メインピークのリテンシ
ョンタイムは図1と同じく4核体のリテンションタイム
に相当し、図6よりメインピークの化合物の生成物(F
)中の含有量は60重量%であり、又、生成物(F)は
2核体フェノール類ノボラックを0.5重量%含んでい
ることがわかった。
GPC analysis of product (F) is shown in FIG.
The analysis conditions are the same as in Example 1). The retention time of the main peak corresponds to that of the tetranuclear body as in Figure 1, and from Figure 6, the main peak compound product (F
) was found to be 60% by weight, and the product (F) was found to contain 0.5% by weight of dinuclear phenolic novolac.

【0063】又、実施例1と同様に、メインピークの化
合物を分取し、マススペクトルにより分析したところ、
M+524、M+522及びM+520が得られ、メイ
ンピークの化合物は、次の(F−1)、(F−2)、(
F−3)の3つの化合物の混合物であることがわかった
[0063] Similarly to Example 1, the main peak compound was fractionated and analyzed by mass spectroscopy.
M+524, M+522 and M+520 were obtained, and the main peak compounds were the following (F-1), (F-2), (
It was found to be a mixture of three compounds of F-3).

【0064】[0064]

【化11】[Chemical formula 11]

【0065】   化合物(F−1):式[8]において      
    R22=アリル基、R23=H、R24=H、
          R25=アリル基、R26=H、
R27=H、  化合物(F−2):式[8]において
          R22=アリル基、R23=H、
R24=H、          R25=メチル基、
R26=メチル基、R27=メチル基  化合物(F−
3):式[8]において          R22〜
R27全てがメチル基
Compound (F-1): In formula [8]
R22=allyl group, R23=H, R24=H,
R25=allyl group, R26=H,
R27=H, Compound (F-2): In formula [8], R22=allyl group, R23=H,
R24=H, R25=methyl group,
R26=methyl group, R27=methyl group Compound (F-
3): In formula [8], R22~
All R27 are methyl groups

【0066】応用例1 温度計、攪拌機、環流冷却器、滴下ロート及び水分離装
置の付いた1リットルのガラス反応器に実施例1で得た
アルケニル基含有フェノール類ノボラック[生成物(A
)]50g及びメチルイソブチルケトン500ml、2
重量%白金濃度の2−エチルヘキサノール変性塩化白金
酸溶液0.05gを仕込み1時間共沸脱水を行った後、
環流下でシリコーンオイル(G){チッソ(株)、FM
−1121、H当量:2334}440.4gを30分
間で滴下した。更に同温度で3時間反応させた後、水洗
処理し溶媒を減圧下濃縮し淡黄色粘性物487.6g(
生成物A1)を得た。
Application Example 1 The alkenyl group-containing phenolic novolak [Product (A
)] 50g and methyl isobutyl ketone 500ml, 2
After charging 0.05 g of a 2-ethylhexanol-modified chloroplatinic acid solution with a platinum concentration of % by weight and performing azeotropic dehydration for 1 hour,
Silicone oil (G) under reflux {Chisso Co., Ltd., FM
-1121, H equivalent: 2334}440.4 g was added dropwise over 30 minutes. After further reacting at the same temperature for 3 hours, the solvent was washed with water and concentrated under reduced pressure to obtain 487.6 g of pale yellow viscous material (
Product A1) was obtained.

【0067】応用例2 応用例1において実施例1で得た生成物(A)の代わり
に実施例2で得た生成物(B)50g:シリコーンオイ
ル(G)424.4gを用いた以外は実施例1と同様に
反応、処理し、淡黄色粘性物472.7g(生成物B1
)を得た。
Application Example 2 In Application Example 1, 50 g of the product (B) obtained in Example 2: 424.4 g of silicone oil (G) was used instead of the product (A) obtained in Example 1. The reaction and treatment were carried out in the same manner as in Example 1, and 472.7 g of pale yellow viscous material (product B1
) was obtained.

【0068】応用例3 応用例1において実施例1で得た生成物(A)の代わり
に実施例3で得た生成物(C)50g、シリコーンオイ
ル(G)158.8gを用いた以外は実施例1と同様に
反応、処理し、淡黄色粘性物206.2g(生成物C1
)を得た。
Application Example 3 In Application Example 1, 50 g of the product (C) obtained in Example 3 and 158.8 g of silicone oil (G) were used instead of the product (A) obtained in Example 1. The reaction and treatment were carried out in the same manner as in Example 1, and 206.2 g of pale yellow viscous material (product C1
) was obtained.

【0069】応用例4 応用例1において実施例1で得た生成物(A)の代わり
に実施例4で得た生成物(D)50g、シリコーンオイ
ル(G)80.5gを用いた以外は実施例1と同様に反
応、処理し、淡黄色粘性物128.5g(生成物D1)
を得た。
Application Example 4 Application Example 1 except that 50 g of the product (D) obtained in Example 4 and 80.5 g of silicone oil (G) were used instead of the product (A) obtained in Example 1. Reacted and treated in the same manner as in Example 1, yielding 128.5 g of pale yellow viscous material (product D1).
I got it.

【0070】応用例5 応用例1において実施例1で得た生成物(A)の代わり
に実施例5で得た生成物(E)50g、シリコーンオイ
ル(G)147.7gを用いた以外は実施例1と同様に
反応、処理し、淡黄色粘性物195.8g(生成物E1
)を得た。
Application Example 5 In Application Example 1, 50 g of the product (E) obtained in Example 5 and 147.7 g of silicone oil (G) were used instead of the product (A) obtained in Example 1. The reaction and treatment were carried out in the same manner as in Example 1, yielding 195.8 g of a pale yellow viscous substance (product E1).
) was obtained.

【0071】応用例6 応用例1において実施例1で得た生成物(A)の代わり
に実施例6で得た生成物(F)50g、シリコーンオイ
ル(G)142.3gを用いた以外は実施例1と同様に
反応、処理し、淡黄色粘性物189.6g(生成物F1
)を得た。
Application Example 6 Application Example 1 except that 50 g of the product (F) obtained in Example 6 and 142.3 g of silicone oil (G) were used instead of the product (A) obtained in Example 1. The reaction and treatment were carried out in the same manner as in Example 1, and 189.6 g of pale yellow viscous material (product F1
) was obtained.

【0072】参考例1〜6、比較例1 第1表に示す割合でO−クレゾールノボラック型エポキ
シ樹脂(EOCN−1020:日本化薬(株)製、エポ
キシ当量(g/eq):200、軟化温度66.4℃)
で応用例1,2,3,4,5及び6で得られたシリコー
ン変性フェノール類ノボラック樹脂A1,B1,C1,
D1,E1,F1と市販のフェノールノボラック樹脂(
日本化薬(株)、軟化温度83.0℃)を硬化剤として
用い、トリフェニルホスフィンを触媒に用いて加熱硬化
させ第1表の脚注に示した装置及び方法により各物性を
測定した。比較例として第1表に示したフェノールノボ
ラック樹脂だけを硬化剤として用い、前記と同様にして
物性を測定し、その結果を第1表に示した。
Reference Examples 1 to 6, Comparative Example 1 O-cresol novolak type epoxy resin (EOCN-1020: manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent (g/eq): 200, softened in the proportions shown in Table 1) temperature 66.4℃)
Silicone-modified phenolic novolak resins A1, B1, C1, obtained in Application Examples 1, 2, 3, 4, 5 and 6,
D1, E1, F1 and commercially available phenol novolak resin (
Nippon Kayaku Co., Ltd. (softening temperature: 83.0° C.) was used as a curing agent, and triphenylphosphine was used as a catalyst to heat cure the material and measure each physical property using the apparatus and method shown in the footnotes of Table 1. As a comparative example, only the phenol novolak resin shown in Table 1 was used as a curing agent, and the physical properties were measured in the same manner as above, and the results are shown in Table 1.

【0073】第1表から明らかなように、本発明の4核
体フェノール類ノボラックを主成分とするアルケニル基
含有フェノール類ノボラックをシリコーン変性し、硬化
剤として用いた場合の硬化物のガラス転移温度は、比較
例とほぼ同じ水準を示し、耐熱性を保持しながら弾性率
は大幅に減少し低応力化されている。
As is clear from Table 1, the glass transition temperature of the cured product when the alkenyl group-containing phenolic novolac of the present invention, which is mainly composed of the tetranuclear phenolic novolak, is modified with silicone and used as a curing agent. shows almost the same level as the comparative example, and while maintaining heat resistance, the elastic modulus is significantly reduced and stress is reduced.

【0074】 1)  熱機械測定装置  :  真空理工(株)  
TM−7000 2)  JIS  K  6911
1) Thermomechanical measuring device: Shinku Riko Co., Ltd.
TM-7000 2) JIS K 6911

【0075】[0075]

【発明の効果】本発明の4核体フェノール類ノボラック
は、軟化温度が低いため取扱い易く、作業性に優れてい
る。本発明の製造法によれば、4核体フェノール類ノボ
ラックを高収率で容易に得る事ができる。
Effects of the Invention The tetranuclear phenol novolak of the present invention has a low softening temperature, so it is easy to handle and has excellent workability. According to the production method of the present invention, a tetranuclear phenolic novolak can be easily obtained in high yield.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】実施例1で得られた生成物(A)の分子量分布
曲線
FIG. 1: Molecular weight distribution curve of product (A) obtained in Example 1

【図2】実施例2で得られた生成物(B)の分子量分布
曲線
FIG. 2: Molecular weight distribution curve of product (B) obtained in Example 2

【図3】実施例3で得られた生成物(C)の分子量分布
曲線
FIG. 3: Molecular weight distribution curve of product (C) obtained in Example 3

【図4】実施例4で得られた生成物(D)の分子量分布
曲線
FIG. 4: Molecular weight distribution curve of product (D) obtained in Example 4

【図5】実施例5で得られた生成物(E)の分子量分布
曲線
FIG. 5: Molecular weight distribution curve of product (E) obtained in Example 5

【図6】実施例6で得られた生成物(F)の分子量分布
曲線
FIG. 6: Molecular weight distribution curve of product (F) obtained in Example 6

【図7】市販のO−クレゾールノボラックの分子量分布
曲線
[Figure 7] Molecular weight distribution curve of commercially available O-cresol novolak

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】式〔1〕 【化1】 (式中、R1、R2、R6、R7はそれぞれ独立して水
素原子またはアリル基を示し、R1、R2、R6、R7
の少なくとも一つはアリル基であり、R3、R4、R5
、R8、R9、R10はそれぞれ独立して水素原子、炭
素数5以下のアルコキシル基または炭素数5以下のアル
キル基を示す。)で表される4核体フェノール類ノボラ
ック。
Claim 1: Formula [1] [Formula 1] (wherein R1, R2, R6, R7 each independently represent a hydrogen atom or an allyl group, R1, R2, R6, R7
At least one of R3, R4, R5 is an allyl group, and R3, R4, R5
, R8, R9, and R10 each independently represent a hydrogen atom, an alkoxyl group having 5 or less carbon atoms, or an alkyl group having 5 or less carbon atoms. ) is a tetranuclear phenolic novolac.
【請求項2】式〔2〕 【化2】 で表されるO−クレゾール2核体ジメチロール化合物に
式〔3〕 【化3】 (式中、R11、R12はそれぞれ独立して水素原子ま
たはアリル基を示し、R13、R14、R15はそれぞ
れ独立して水素原子、炭素数5以下のアルコキシル基ま
たは炭素数5以下のアルキル基を示す。)で表される化
合物を反応させる事を特徴とする請求項1の式〔1〕で
表される4核体フェノール類ノボラックの製造法。
Claim 2: An O-cresol dinuclear dimethylol compound represented by the formula [2] [Chemical formula 2] is combined with a formula [3] [Chemical formula 3] (wherein R11 and R12 are each independently a hydrogen atom or an allyl R13, R14, and R15 each independently represent a hydrogen atom, an alkoxyl group having 5 or less carbon atoms, or an alkyl group having 5 or less carbon atoms. A method for producing a tetranuclear phenol novolak represented by the formula [1] in Item 1.
JP41512190A 1990-12-27 1990-12-27 Tetra-nuclear phenolic novolak and its production Pending JPH04225012A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP41512190A JPH04225012A (en) 1990-12-27 1990-12-27 Tetra-nuclear phenolic novolak and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP41512190A JPH04225012A (en) 1990-12-27 1990-12-27 Tetra-nuclear phenolic novolak and its production

Publications (1)

Publication Number Publication Date
JPH04225012A true JPH04225012A (en) 1992-08-14

Family

ID=18523526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41512190A Pending JPH04225012A (en) 1990-12-27 1990-12-27 Tetra-nuclear phenolic novolak and its production

Country Status (1)

Country Link
JP (1) JPH04225012A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07330647A (en) * 1994-06-07 1995-12-19 Nippon Steel Chem Co Ltd Production of bisphenol compound
JPH0931167A (en) * 1995-07-19 1997-02-04 Mitsui Toatsu Chem Inc Liquid epoxy resin composition for sealing and cured material thereof
WO1997029144A1 (en) * 1996-02-09 1997-08-14 Nippon Kayaku Kabushiki Kaisha Epoxy resin, epoxy resin composition and products of curing thereof
JP2014141688A (en) * 2014-05-15 2014-08-07 Nippon Kayaku Co Ltd Phenol resin, epoxy resin, epoxy resin composition and cured product thereof
JP5651169B2 (en) * 2010-04-23 2015-01-07 パナソニック株式会社 Epoxy resin composition, prepreg, metal-clad laminate and printed wiring board

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07330647A (en) * 1994-06-07 1995-12-19 Nippon Steel Chem Co Ltd Production of bisphenol compound
JPH0931167A (en) * 1995-07-19 1997-02-04 Mitsui Toatsu Chem Inc Liquid epoxy resin composition for sealing and cured material thereof
WO1997029144A1 (en) * 1996-02-09 1997-08-14 Nippon Kayaku Kabushiki Kaisha Epoxy resin, epoxy resin composition and products of curing thereof
US6124420A (en) * 1996-02-09 2000-09-26 Nippon Kayaku Kabushiki Kaisha Epoxy resin, epoxy resin composition and hardened product thereof
CN1099434C (en) * 1996-02-09 2003-01-22 日本化药株式会社 Epoxy resin, epoxy resin composition and products of curing thereof
JP5651169B2 (en) * 2010-04-23 2015-01-07 パナソニック株式会社 Epoxy resin composition, prepreg, metal-clad laminate and printed wiring board
JP2014141688A (en) * 2014-05-15 2014-08-07 Nippon Kayaku Co Ltd Phenol resin, epoxy resin, epoxy resin composition and cured product thereof

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