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JPH0421939A - Optical disk - Google Patents

Optical disk

Info

Publication number
JPH0421939A
JPH0421939A JP2126040A JP12604090A JPH0421939A JP H0421939 A JPH0421939 A JP H0421939A JP 2126040 A JP2126040 A JP 2126040A JP 12604090 A JP12604090 A JP 12604090A JP H0421939 A JPH0421939 A JP H0421939A
Authority
JP
Japan
Prior art keywords
layer
substrate
film
fluororesin
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2126040A
Other languages
Japanese (ja)
Inventor
Yukari Tode
結花利 都出
Motohisa Taguchi
元久 田口
Kazuhiko Tsutsumi
和彦 堤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2126040A priority Critical patent/JPH0421939A/en
Publication of JPH0421939A publication Critical patent/JPH0421939A/en
Priority to US08/010,502 priority patent/US5450380A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prevent the warpage at the time of a change in temp. and humid ity, the sticking of dust and the generation of flaws by forming an optical recording layer and coating the optical recording layer with a fluororesin film, particularly a trifluorochloroethylene copolymer film, then forming an SiO2 layer. CONSTITUTION:An SiNx enhancement layer 20, a TbFeCo recording layer 30 and an SiNx protective layer 40 are successively laminated on a polycarbonate substrate 10 by a sputtering method. The layers are then coated with the tetrafluoroethylene/hexafluoropropylene copolymer resin which is the fluororesin to form the fluororesin layer 50. The SiO2 layer 60 is thereafter formed over the entire surface at 1500Angstrom by an LDP method. The trifluorochloroethylene copolymer may be used particularly for the above-mentioned fluororesin layer 50. The warpage of the substrate at the time of the abrupt change in the temp. and humidity is prevented in this way and the hardness and antistatic function of the substrate surface are enhanced so that the substrate surface is resistant to dust pick-up and flawing. The reliability is thus enhanced.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、情報を光により、記録再生する光ディスクに
関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an optical disc for recording and reproducing information using light.

〈従来の技術〉 光デイスク用基板材料には、透明プラスチック基板が、
複製が用意であり、特にポリカーボネー1、基板では低
コストである。
<Conventional technology> Transparent plastic substrates are used as substrate materials for optical disks.
Reproduction is easy and low cost, especially for polycarbonate 1 substrates.

ところが、ポリカーボネート基板のように透湿係数の比
較的大きなプラスチック基板を用いた場合、記録面を形
成していない方の面のみの給水により基板に反りが生じ
る。特に温湿度の変化が著しい環境下で使用する場合、
大きな反りが生じその結果、アクチュエーターのフォー
カストラッキングサーボが安定に追従できなくなり、誤
動作やエラーを生じて実用上大きな問題となる。
However, when a plastic substrate having a relatively high moisture permeability coefficient, such as a polycarbonate substrate, is used, the substrate warps due to water being supplied only to the side on which the recording surface is not formed. Especially when used in environments with significant changes in temperature and humidity.
A large warpage occurs, and as a result, the focus tracking servo of the actuator cannot follow it stably, causing malfunctions and errors, which poses a serious problem in practice.

反りを防止する方法として、基板の記録膜の形成しであ
る面と反対側の面に、防湿膜を形成することが知られて
いる。第3図は例えば特開平1−292639号公報に
示された従来の方法を示す光ディスクの断面図であり、
図において、1はプラスチック基板、3は記録膜、7は
紫外線硬化型樹脂層、8は防湿膜である。
As a method for preventing warpage, it is known to form a moisture-proof film on the surface of the substrate opposite to the surface on which the recording film is formed. FIG. 3 is a cross-sectional view of an optical disc showing a conventional method disclosed in, for example, Japanese Patent Application Laid-Open No. 1-292639.
In the figure, 1 is a plastic substrate, 3 is a recording film, 7 is an ultraviolet curing resin layer, and 8 is a moisture-proof film.

防湿膜は、有機系無機系どちらでもよく、有機系の膜で
あれば塗布など、無機系の膜であれば、スパッタリング
法、真空蒸着法、CVD法などが採用される。
The moisture-proof film may be either organic or inorganic, and if it is an organic film, coating or the like is used, and if it is an inorganic film, a sputtering method, a vacuum evaporation method, a CVD method, etc. are used.

しかし、防湿膜をディスクの一部分に形成した場合では
、緩やかな勾配の温度湿度変化時の反りは防止できても
、急激な勾配の温度湿度変化時に発生する反りは防止で
きない。これば、防湿膜が形成されていない基板部分か
ら急速に吸湿が生じ、基板内部の水分分布が一時的に不
均一になり、局部的に膨張することによる反りが発生す
るためである。
However, when a moisture-proof film is formed on a portion of the disk, although it is possible to prevent warping when the temperature and humidity change with a gentle gradient, it is not possible to prevent warping that occurs when the temperature and humidity change with a steep gradient. This is because moisture is rapidly absorbed from the parts of the substrate where the moisture-proof film is not formed, and the moisture distribution inside the substrate becomes temporarily uneven, causing warping due to local expansion.

〈発明が解決しようとする課題〉 従って、基板の材質が大気に露出しないように、ディス
ク全面にわたって透光性の防湿膜を形成する必要がある
。しかしながら、先に挙げた特開平1−292639号
広報にも示されているように、全面にわたって膜を均一
に形成することは非常に難しいことが知られている。す
なわち、従来のスピンコード、スパッタ法や蒸着法など
では、製造過程においてマスクを使用するなどで、膜の
境界ができたり、膜中に微小な穴(ボイド、ピンホール
)が生成するため、これら境界や穴により防湿効果が上
がらなかったり、保護膜の剥離や劣化が生じたりすると
いう問題があった。
<Problems to be Solved by the Invention> Therefore, it is necessary to form a light-transmitting moisture-proof film over the entire surface of the disk so that the material of the substrate is not exposed to the atmosphere. However, as shown in the above-mentioned Japanese Patent Application Publication No. 1-292639, it is known that it is very difficult to uniformly form a film over the entire surface. In other words, in conventional spin codes, sputtering methods, vapor deposition methods, etc., the use of masks during the manufacturing process creates film boundaries and microscopic holes (voids, pinholes) in the film. There have been problems in that the moisture-proofing effect cannot be improved due to boundaries and holes, and the protective film may peel off or deteriorate.

さらに光ディスクの場合、基板側よりレーザー光を入射
するので、基板上に形成された防湿膜をも光が透過する
。そのため、例えば光磁気ディスクのエンハンス効果や
、入射光強度やノイズの低減などの向上といった光ディ
スクの必要特性を損ねることなく、防湿膜を形成するこ
とが必要で、従って防湿膜の光学定数、厚み、表面粗さ
などをコントロールしなければならず、従来の膜形成方
法にてこれらを行うには、高度な技術を要し、製造コス
トも高くなる。
Furthermore, in the case of an optical disc, since the laser light is incident from the substrate side, the light also passes through the moisture-proof film formed on the substrate. Therefore, it is necessary to form a moisture-proof film without impairing the necessary characteristics of the optical disk, such as the enhancement effect of the magneto-optical disk and the reduction of incident light intensity and noise. Surface roughness and other factors must be controlled, and performing this with conventional film forming methods requires advanced technology and increases manufacturing costs.

また、光ディスクに挨がついたり、これを拭いたりする
場合に傷がついたりする。そのためこれを防止するのに
、基板の表面にバートコ−1・膜や帯電防止膜を形成す
ることが知られているが、従来のハードコート材に帯電
防止機能を付加すると、初期の八−ドコート材としての
機能が半減してしまう。例えばポリカーボネート基板の
場合、基板で3H,バートコ−1・後で7Hだったもの
が、帯電防止機能を付加した膜では4Hとなってしまう
というように、ハードコート機能と帯電防止機能を同時
に兼ね備えた膜がないという問題があった。
In addition, dust accumulates on the optical disc, and scratches occur when wiping it. To prevent this, it is known to form a Bartcoat 1 film or an antistatic film on the surface of the substrate, but adding an antistatic function to the conventional hard coat material Its function as a material is halved. For example, in the case of polycarbonate substrates, what used to be 3H for the substrate and 7H for Bartco-1 later became 4H for the film with antistatic function, which has both hard coat function and antistatic function at the same time. The problem was that there was no membrane.

これらを解決するために、特開昭63−112632号
公報に示されるような、液相薄膜形成法により基板に二
酸化ケイ素(S i 02 ) Mを形成する方法が提
案されている。この方法を用いて形成した膜は、良好な
防湿性だけなく、高い表面硬度、及び第4図に示すよう
に帯電防止機能をも兼ね備える。
In order to solve these problems, a method has been proposed in which silicon dioxide (S i 02 ) M is formed on a substrate by a liquid phase thin film forming method, as shown in Japanese Patent Application Laid-Open No. 63-112632. The film formed using this method has not only good moisture resistance but also high surface hardness and antistatic function as shown in FIG. 4.

さらに、特開平2−18729号公報に示されるような
、液相薄膜形成法により光記録媒体全面に二酸化ケイ素
(S10□)膜を形成する方法が提案されている。第5
図において、1はプラスチック基板、2は誘電体膜、3
は記録膜、4は誘電体保護膜、5はU/V効果樹脂、6
(よSiO2層である。LPD法にてSin2層を形成
する場合は、溶液にフッ酸系溶液を用いるため、金属で
ある記録膜が浸食される。そこで、基板に光記録膜を形
成し、その記録膜をLPD法の処理溶液であるフッ酸系
溶液より保護するための膜を形成した後、LPD処理に
より、SiO□層を全面に形成することが必要である。
Furthermore, a method has been proposed in which a silicon dioxide (S10□) film is formed on the entire surface of an optical recording medium by a liquid phase thin film forming method, as shown in Japanese Patent Application Laid-Open No. 2-18729. Fifth
In the figure, 1 is a plastic substrate, 2 is a dielectric film, and 3 is a plastic substrate.
is a recording film, 4 is a dielectric protective film, 5 is a U/V effect resin, 6
(This is a SiO2 layer. When forming a Si2 layer using the LPD method, a hydrofluoric acid solution is used as the solution, so the recording film, which is a metal, is eroded. Therefore, an optical recording film is formed on the substrate. After forming a film to protect the recording film from a hydrofluoric acid solution which is a processing solution of the LPD method, it is necessary to form an SiO□ layer over the entire surface by LPD processing.

スパッタ法や蒸着法による膜では膜の緻密性が悪くピン
ホールが無数に生成しほとんど全面にわたり記録膜が浸
食されてしまうため、従来、U/v硬化樹Huが用いら
れていた。しかしながら、との液相薄膜形成法(=Li
quid  Phase  Deposition (
略してLPDl法)にて、Sin、層を形成する場合は
、溶液にフッ酸系溶液を用いるため、金属である記録膜
が浸食され、記録膜を形成してからしPD処理を行うこ
とができない。そこで従来は、あらかじめ基板の状態で
LPD処理を行い、基板全面に5iOz層を形成した後
、記録膜を形成する方法がとられていたが、この方法で
は、基板に溝やプリピットが形成されている場合、その
部分にもSin、層が形成され、従ってそれらの形状が
変化してしまう。基板を成形するスタンバの設定を調節
することにより、若干の補正が可能だが、硬度な技術を
要するため完全な補正も難しく、そのため、乙の液相薄
膜形成法を光ディスクに適用するのが、困難であるとい
う問題があった。
Conventionally, U/v hardening resin Hu has been used because films formed by sputtering or vapor deposition have poor film density, generate countless pinholes, and erode the recording film over almost the entire surface. However, the liquid phase thin film formation method (=Li
Quid Phase Deposition (
When forming a Sin layer using the LPD method (abbreviated as LPDl method), since a hydrofluoric acid solution is used as a solution, the recording film, which is a metal, is eroded, making it difficult to form a recording film and then perform the mustard PD treatment. Can not. Conventionally, a method was used in which the substrate was subjected to LPD treatment to form a 5iOz layer on the entire surface of the substrate, and then a recording film was formed.However, with this method, grooves and pre-pits were formed on the substrate. If there is, a layer of Sin will be formed in that part as well, resulting in a change in their shape. Although it is possible to make a slight correction by adjusting the settings of the standber that molds the substrate, it is difficult to make a complete correction because it requires sophisticated technology.Therefore, it is difficult to apply the liquid phase thin film formation method described in Part B to optical discs. There was a problem that.

そこで、基板に光記録膜を形成し、その記録膜をLPD
法の処理溶液であるフッ酸系溶液より保護するための膜
を形成しtこ後、LPD処理により、SiO□層を全面
に形成することが考えられる。
Therefore, an optical recording film is formed on the substrate, and the recording film is used as an LPD.
It is conceivable that after forming a film for protection from a hydrofluoric acid solution, which is a processing solution of the method, an SiO□ layer is formed on the entire surface by LPD processing.

しかし、スパッタ法や蒸着法による膜では、膜の緻密性
が悪くピンホールが無数に生成するため、はとんど全面
にわたり記録膜が浸食されてしまう。
However, in films formed by sputtering or vapor deposition, the density of the film is poor and countless pinholes are generated, resulting in the recording film being eroded over almost the entire surface.

また、一般に知られているコーティング樹脂の多くは、
記録膜との密着性が悪く界面より液が浸透したり、膜に
ピンホールがありそこから液が記録膜に達したりして、
記録膜が浸食されたり、膜に硬化樹脂は硬化時に熱が加
わり、そのためプラスチック基板の場合は変形したり、
歪みが発生して複屈折が大きくなったり、LPD処理の
段階で、樹脂層や記録膜にクラックが入ったりしていた
In addition, many of the commonly known coating resins are
The adhesion with the recording film may be poor and the liquid may penetrate from the interface, or there may be pinholes in the film and the liquid may reach the recording film.
The recording film may be eroded, or the film may be deformed due to the heat applied to the film when the resin is cured.
Birefringence increased due to distortion, and cracks appeared in the resin layer and recording film during the LPD process.

本発明は上記のような問題点を解決するためになされた
もので、急激な勾配の温度湿度変化時にも反りの発生せ
ず、しかも挨や傷のつきにくい光ディスクを得る乙とを
目的をしている。
The present invention has been made in order to solve the above-mentioned problems, and aims to provide an optical disc that does not warp even when there is a sudden change in temperature and humidity, and is also resistant to dust and scratches. ing.

く課題を解決するための手段〉 本発明の光ディスクは、光記録膜を形成し、光記録膜を
フッ素系樹脂膜特に3フッ化塩素エチレンコポリマー膜
にて被覆した後、5102層を形成したことを特徴とし
ている。
Means for Solving the Problems> The optical disc of the present invention includes forming an optical recording film, covering the optical recording film with a fluororesin film, particularly a chlorine trifluoride ethylene copolymer film, and then forming a 5102 layer. It is characterized by

く作用〉 光記録層をフッ素樹脂で被覆した後、 8102層を形
成することにより、急激な勾配の温度湿度変化時のプラ
スチック基板の反り変化を防止するだけでな(、基板表
面に高い硬度と優れた帯電防止機能を兼ね備えた、挨や
傷のつきくい光ディスクが得られ、光記録層を被覆する
フッ素系樹脂に3フッ素化塩素エチレンコポリマーを用
いることlζより、環境の温湿度サイクル変化にも強い
、高い信頼性の光ディスクを得ることができる。
By forming the 8102 layer after coating the optical recording layer with fluororesin, it not only prevents the plastic substrate from warping due to rapid changes in temperature and humidity (it also provides high hardness and hardness to the substrate surface). By using trifluorinated chlorine ethylene copolymer for the fluorine-based resin that coats the optical recording layer, we can obtain an optical disc that has excellent antistatic properties and is resistant to dust and scratches, and is resistant to changes in environmental temperature and humidity cycles. A strong and highly reliable optical disc can be obtained.

また、5i02層は、1000〜200 oAといった
非常に薄い厚さで硬化が得られるため、基板側から入射
するレーザー光に対して影響を及ぼさず、従って屈折率
や厚みなどの厳密な制御を必要とせず、工程数やコスト
の節減がはかれる。
In addition, since the 5i02 layer can be cured at a very thin thickness of 1000 to 200 oA, it does not affect the laser light incident from the substrate side, so strict control of the refractive index and thickness is required. The number of processes and costs can be reduced without having to do this.

〈実施例〉 以下、この発明の一実施例を説明する。第1図において
、10はポリカーボネ−1・基板、20は5INx工ン
ハンス層、30はTbFeCo記録層、40はSiNx
保護層、50はフッ素系樹脂で60は5IO2層である
。ポリカーボネート基板に、20.30,40をスパッ
タ法により順次積層した後、フッ素系樹脂の4フッ化エ
チレン6フッ化プロピレン共重合樹脂(ダイキン工業(
株)製ネオフロンFEP)をコーティングし、その後、
特界昭63−112632号に示されるLPD法にて、
SiO□層を全面に1.500Aを形成した。この実施
例についての各種テスト結果を表1の実施例1の項に示
す。
<Example> An example of the present invention will be described below. In FIG. 1, 10 is a polycarbonate substrate, 20 is a 5INx processing layer, 30 is a TbFeCo recording layer, and 40 is a SiNx
The protective layer 50 is a fluororesin and 60 is a 5IO2 layer. After sequentially laminating 20, 30, and 40 on a polycarbonate substrate by sputtering, a fluorine-based resin, tetrafluoroethylene hexafluoropropylene copolymer resin (Daikin Industries, Ltd.)
Coated with Neoflon FEP (manufactured by Co., Ltd.), and then
In the LPD method shown in Special Kai No. 63-112632,
A SiO□ layer of 1.500 A was formed on the entire surface. Various test results for this example are shown in the Example 1 section of Table 1.

60℃50%RHから60℃90%RHに30分で環境
変化させたところ、発生した反り景はチルトで0.5m
radと非常に小さい値となった。
When the environment was changed from 60℃ 50%RH to 60℃ 90%RH in 30 minutes, the warping that occurred was 0.5m when tilted.
It was a very small value of rad.

また、80℃90%RH下に500時間投入試験を行っ
たが、C7Nビットエラーレートに変化なく、また表面
硬度は試験前後で7Hと変化なし、帯電性も前後でほぼ
変化なく、良好な信頼性が得られた。
In addition, a test was conducted for 500 hours at 80°C and 90% RH, but there was no change in the C7N bit error rate, the surface hardness was 7H before and after the test, and the charging property was almost unchanged before and after the test, indicating good reliability. I got sex.

次に、他の実施例について説明する。第1図において、
50のフッ素樹脂に3フッ素化塩素エヂレンコボリマー
(旭硝子(株)製ルミフ四ン)を用いた他は、全く前例
と同じ条件の光ディスクを作成した。この実施例の各種
テストの結果を表1の実施例2の項に示す。
Next, other embodiments will be described. In Figure 1,
An optical disc was prepared under exactly the same conditions as in the previous example, except that a trifluorinated chlorine ethylene copolymer (Lumifucin, manufactured by Asahi Glass Co., Ltd.) was used as the fluororesin No. 50. The results of various tests for this example are shown in the Example 2 section of Table 1.

60℃50%RH→90%RH変化時のチルト変化は0
.3mrad、80℃90%RH500時間投入試験で
の各特性についても変化なかった。
Tilt change when changing from 60℃50%RH to 90%RH is 0
.. There was no change in each characteristic in the 500-hour input test at 3 mrad, 80° C., 90% RH.

さらにJIS−C5024方法■に示されるZ/AD(
温湿度)テストを実施した結果、各特性について変化が
なく、高い信頼性が得られた。
Furthermore, Z/AD (
As a result of testing (temperature and humidity), there was no change in each characteristic, and high reliability was obtained.

他の実施例について説明する。第2図において、11は
ポリカーボネート基板、21はSiNxエンハンス層、
31はTbFeCo記録層、41はS i N x保護
層、51は3フッ素化塩素エヂレンコポリマーで、旭硝
子(株)製ルミフロンを用いた。11に21.31.4
1を順次スパッタ法により積層した後、特開昭63−1
12632号に示される方法において、ポリカーボネー
ト用SiO□層61を液相薄膜形成法によりポリカーボ
ネート基板の材質が露出する部分に1500 形成した
。この実施例の各種テストの結果を表1の実施例3の項
に示す。
Other embodiments will be described. In FIG. 2, 11 is a polycarbonate substrate, 21 is a SiNx enhancement layer,
31 is a TbFeCo recording layer, 41 is a S i N x protective layer, and 51 is a trifluorinated chlorine ethylene copolymer, and Lumiflon manufactured by Asahi Glass Co., Ltd. was used. 11 to 21.31.4
1 was sequentially laminated by sputtering method, and then JP-A-63-1
In the method shown in No. 12632, a SiO□ layer 61 for polycarbonate having a thickness of 1500 mm was formed on the exposed portion of the polycarbonate substrate by a liquid phase thin film forming method. The results of various tests for this example are shown in the Example 3 section of Table 1.

これにより、60℃50%RH→90%RH変化時のチ
ルト変化は0.7mrad、80℃90%RH500時
間投入試験、Z/ADテスト(JIs−C5024方法
I)におけろC/N、ビットエラーレートの変化はなく
、基板表面の鉛筆硬度7Hにも変化は見られなかった。
As a result, the tilt change when changing from 60°C 50%RH to 90%RH is 0.7mrad, and the C/N and bit in the 80°C 90%RH 500-hour test and Z/AD test (JIs-C5024 method I). There was no change in the error rate, and no change was observed in the pencil hardness of 7H on the substrate surface.

また、帯電性も、両面において良好で、信頼性試験によ
る劣化も見られなかった。
Furthermore, the charging properties were good on both sides, and no deterioration was observed in reliability tests.

従って、光記録層をフッ素系樹脂で被覆した後、基板の
材質が露出する部分にLPD法によt+siO□層を形
成することにより、基板の吸湿を防止することにより、
プラスチック基板の反りを防止し、高い表面硬度と優れ
た帯電防止機能を兼ね備えた挨や傷のつきにくい光ディ
スクが得られ、また、LPD処理の工程数を低減できる
。さらに、光記録膜を被覆するフッ素系樹脂に、3フッ
素化塩素エチレンポリマーを用いることにより、高い信
頼性の光ディスクを、少工程低コストで得ることができ
る。さらに、本発明は上記実施例の内容に限るものでは
なく、基板はガラスやポリカーボネー1−以外のプラス
チックでもよい。
Therefore, after coating the optical recording layer with a fluororesin, a t+siO□ layer is formed by the LPD method on the exposed portion of the substrate material, thereby preventing the substrate from absorbing moisture.
It is possible to prevent the plastic substrate from warping, to obtain an optical disk that is resistant to dust and scratches, has both high surface hardness and excellent antistatic function, and it is also possible to reduce the number of LPD processing steps. Furthermore, by using a trifluorinated chlorine ethylene polymer as the fluororesin that coats the optical recording film, a highly reliable optical disc can be obtained with a small number of steps and at a low cost. Further, the present invention is not limited to the contents of the above embodiments, and the substrate may be made of glass or plastic other than polycarbonate.

表 〈発明の効果〉 このように、光記録層をフッ素系樹脂で被覆した後、S
iO3層を形成することにより、急激な勾配の温度湿度
変化時のプラスチック基板の反り変化を防止するだけで
なく、基板表面に高い硬度と優れた帯電防止機能を兼ね
備えた、挨や傷のつきにくい光ディスクが得られ、光記
録層を被覆するフッ素系樹脂に、3フッ素化塩素エチレ
ンコポリマーを用いることにより、環境の温湿度サイク
ル変化にも強い、高い信頼性の光ディスクを少工程コス
トで得ることができる。
Table <Effects of the Invention> In this way, after coating the optical recording layer with a fluororesin, the S
By forming an iO3 layer, it not only prevents the plastic substrate from warping due to rapid changes in temperature and humidity, but also provides the substrate surface with high hardness and excellent antistatic properties, making it resistant to dust and scratches. By using a trifluorinated chlorine ethylene copolymer as the fluororesin that coats the optical recording layer, it is possible to obtain a highly reliable optical disc that is resistant to changes in environmental temperature and humidity cycles and with a small process cost. can.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の一実施例を示す光ディスクの断面図
、第2図は、本発明の他の実施例を示す光ディスクの断
面図、第3図は、従来の光ディスクを示す断面図、□第
4図は、ポリカーボネート基板表面の、SiO□層があ
る場合とない場合の帯電性を比較した図、第5図は、別
の従来のディスクを示す断面図である。図中50はフッ
素樹脂、51は3フッ素化塩素エチレンコポリマーであ
る。 なお、 図中、 同一符号は同一、 又は相当部分を 示す。
FIG. 1 is a sectional view of an optical disc showing one embodiment of the present invention, FIG. 2 is a sectional view of an optical disc showing another embodiment of the invention, and FIG. 3 is a sectional view of a conventional optical disc. □ Fig. 4 is a diagram comparing the charging properties of the surface of a polycarbonate substrate with and without an SiO □ layer, and Fig. 5 is a cross-sectional view showing another conventional disk. In the figure, 50 is a fluororesin, and 51 is a trifluorinated chlorine ethylene copolymer. In addition, the same symbols in the figures indicate the same or equivalent parts.

Claims (2)

【特許請求の範囲】[Claims] (1)基板とメモリ機能を有する光記録層からなる光記
録媒体において、基板に上記光記録層を形成し、上記光
記録層を被覆するフッ素系樹脂層を形成した後、SiO
_2層を形成したことを特徴とする光ディスク。
(1) In an optical recording medium consisting of a substrate and an optical recording layer having a memory function, after forming the optical recording layer on the substrate and forming a fluororesin layer covering the optical recording layer, SiO
An optical disc characterized by forming two layers.
(2)上記フッ素系樹脂層に3フッ素化塩素エチレンコ
ポリマーを用いたことを特徴とする特許請求の範囲第1
項の光ディスク。
(2) Claim 1, characterized in that a trifluorinated chlorine ethylene copolymer is used for the fluororesin layer.
Section optical disc.
JP2126040A 1990-05-15 1990-05-15 Optical disk Pending JPH0421939A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2126040A JPH0421939A (en) 1990-05-15 1990-05-15 Optical disk
US08/010,502 US5450380A (en) 1990-05-15 1993-01-28 Optical disk having an SiO2 coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2126040A JPH0421939A (en) 1990-05-15 1990-05-15 Optical disk

Publications (1)

Publication Number Publication Date
JPH0421939A true JPH0421939A (en) 1992-01-24

Family

ID=14925176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2126040A Pending JPH0421939A (en) 1990-05-15 1990-05-15 Optical disk

Country Status (1)

Country Link
JP (1) JPH0421939A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6326848A (en) * 1986-07-21 1988-02-04 Hitachi Ltd optical information recording member
JPH01290138A (en) * 1988-05-16 1989-11-22 Sekisui Chem Co Ltd Optical information recording medium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6326848A (en) * 1986-07-21 1988-02-04 Hitachi Ltd optical information recording member
JPH01290138A (en) * 1988-05-16 1989-11-22 Sekisui Chem Co Ltd Optical information recording medium

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