JPH04206841A - Wire bonding equipment for semiconductor device - Google Patents
Wire bonding equipment for semiconductor deviceInfo
- Publication number
- JPH04206841A JPH04206841A JP2337480A JP33748090A JPH04206841A JP H04206841 A JPH04206841 A JP H04206841A JP 2337480 A JP2337480 A JP 2337480A JP 33748090 A JP33748090 A JP 33748090A JP H04206841 A JPH04206841 A JP H04206841A
- Authority
- JP
- Japan
- Prior art keywords
- wire
- bonding
- metal thin
- wire bonding
- capillary chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 abstract description 32
- 239000002184 metal Substances 0.000 abstract description 32
- 238000000034 method Methods 0.000 description 7
- 238000005452 bending Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010892 electric spark Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/78—Apparatus for connecting with wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/78301—Capillary
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
- H01L2224/8212—Aligning
- H01L2224/82148—Aligning involving movement of a part of the bonding apparatus
- H01L2224/82169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, e.g. nozzle
- H01L2224/8218—Translational movements
- H01L2224/82181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8512—Aligning
- H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
- H01L2224/85169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
- H01L2224/8518—Translational movements
- H01L2224/85181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01039—Yttrium [Y]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、半導体素子をワイヤポンドする装置及び、
左記方式にてワイヤボンドされた半導体装置に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an apparatus for wire bonding semiconductor devices, and
This relates to a semiconductor device wire-bonded using the method described on the left.
第3図(a)〜(g)は、従来のワイヤポンド装置で、
半導体素子とリードフレームをワイヤボンドする状態の
工程側面図である。FIGS. 3(a) to 3(g) show a conventional wire pounding device,
FIG. 3 is a process side view showing a state in which a semiconductor element and a lead frame are wire-bonded.
図において(1)は半導体素子、(2)は半導体素子上
の電極、(3)はキャピラリーチップ、(4)はワイヤ
クランパー、(5)は金属細線、(6)は金属細線先端
に形成されたボール部、(7)はリードフレーム、(8
)は金属細線にボール形成させるための電気l・−チで
ある。In the figure, (1) is a semiconductor element, (2) is an electrode on the semiconductor element, (3) is a capillary chip, (4) is a wire clamper, (5) is a thin metal wire, and (6) is formed at the tip of the thin metal wire. (7) is the lead frame, (8)
) is an electric l/-ch for forming a ball on a thin metal wire.
次に動作について説明する。第3図はワイヤポンド装置
の1ワイヤ分の動作工程を示すもので、第3図(a)〜
第3図(g)で1ワイヤ分の動作か終了する。Next, the operation will be explained. Figure 3 shows the operation process for one wire of the wire pounding device, and Figures 3(a) to 3(a) -
The operation for one wire is completed in FIG. 3(g).
すなわち、第3図(alに示すように、半導体素子(1
)に配置された電極(2)上に、キャピラリーチップ(
3)が移動する。その中で金属細線(5)はその先端に
ボール(6)か形成されている。That is, as shown in FIG.
) on the electrode (2) placed on the capillary tip (
3) moves. Therein, a ball (6) is formed at the tip of the thin metal wire (5).
次に、第3図(b)に示すようにキャピラリーチップ(
3)が下降しボール(6)を電極(2)にボンディング
する(1stボンド)
次に、第3図(C)、(cl)に示すように、半導体素
子(1)]二にボンディングを終了したキャピラリーチ
ップ(3)はリードフレーム(7)上へ移動し、金属細
線(5)を接合させる。(2ndボンl” )
次に、第3図(e)、げ)に示すように、リードフレ−
八(7)にボンディングを終了したキャピラリーチップ
(3)は下降する、この時ある高さからワイヤクランパ
(4)か金属細線(5)をはさんだ状態でさらに」−昇
するため、リードフレーム(7)上のホンディング部よ
り金属細線(5)が切断される。Next, as shown in Figure 3(b), the capillary chip (
3) descends to bond the ball (6) to the electrode (2) (1st bond) Next, as shown in FIGS. 3(C) and (cl), bonding to the semiconductor element (1)] is completed. The capillary chip (3) is moved onto the lead frame (7) and the thin metal wire (5) is bonded thereto. (2nd bond) Next, as shown in Figure 3(e), lead frame
At 8 (7), the capillary chip (3) that has completed bonding is lowered, and at this time, it is further raised from a certain height with the wire clamper (4) or thin metal wire (5) in between. 7) The thin metal wire (5) is cut from the upper honding part.
次に、第3図((至)に示すように、キャピラリーチッ
プ(3)先端より出た金属細線(5)の近くに電気1・
−チ(8)か接近し、電気スパークを起すことで、金属
細線(5)先端にボール(6)を形成させる。Next, as shown in Figure 3 ((to)), an electric current 1.
- A ball (6) is formed at the tip of the thin metal wire (5) by approaching the metal wire (8) and generating an electric spark.
従来のワイヤボンド装置は以」二のように構成されてい
るので、1ワイヤ毎に金属細線にボールを作らねばなら
ず、このため、ボールボンドする電極の大きさは少く共
ボールか形成された時の直径か必要な上、ボールを形成
する場合金属細線材質か金であれば大気中で可能である
が他の金属の場合は還元性雰囲気で酸化を防ぐだめの機
構か必要であるという問題点かあった。Conventional wire bonding equipment has the following configuration, so a ball must be made on the thin metal wire for each wire. Therefore, the size of the electrode to be ball-bonded is small, and it is difficult to form a ball on the metal wire for each wire. In addition to the required diameter, if the ball is made of thin metal wire or gold, it is possible to do so in the atmosphere, but in the case of other metals, a mechanism is required to prevent oxidation in a reducing atmosphere. There was a point.
この発明は上記のような問題を解消するためになされた
もので、ボールを形成する必要かなく、さらにX−Y全
方向に対してワイヤボン1−時の動作に制約かないワイ
ヤボンド装置を得ることを目的とする。This invention was made in order to solve the above-mentioned problems, and it is an object of the present invention to obtain a wire bonding device that does not require the formation of a ball and is not restricted in its operation during wire bonding in all X-Y directions. With the goal.
この発明に係るワイヤボンド装置は、ワイヤポンド終了
した時点てキャピラリーから出た金属細線か横側に折れ
曲げるようにしたので、そのままの状態で1stのワイ
ヤポンドかできるようにしたものである。In the wire bonding device according to the present invention, the thin metal wire coming out of the capillary is bent to the side when the wire bonding is completed, so that the first wire bonding can be performed in that state.
この発明におけるワイヤボンド装置は2ndポンドした
後のキャピラリーチップ及びワイヤクランパの動作方法
により、金属細線切断後の状態かキャピラリーチップに
対して横向きに折れる様に形成される。The wire bonding device according to the present invention is formed so that the thin metal wire is bent laterally with respect to the capillary chip after being cut by the method of operating the capillary chip and the wire clamper after 2nd pounding.
以下この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図において、(1)は半導体素子、(2)は半導体
素子上の電極、(3)はキャピラリーチップ、(4)は
ワイヤクランパ、(5)は金属細線、(7)はリードフ
レームである。In Figure 1, (1) is a semiconductor element, (2) is an electrode on the semiconductor element, (3) is a capillary chip, (4) is a wire clamper, (5) is a thin metal wire, and (7) is a lead frame. be.
次に動作について説明する。第1図はこの本発明のワイ
ヤボンド装置によるIワイヤ分の動作工程を示すもので
、第1図(a、j〜第1図(f+で1ワイヤ分の動作が
終了する。Next, the operation will be explained. FIG. 1 shows the operation steps for I wire by the wire bonding apparatus of the present invention, and the operation for one wire ends at FIG. 1 (a, j to FIG. 1 (f+).
すなわち、第1図(a)に示すように、半導体素子(1
)に配置された電極(2)に、キャピラリーチップ(3
)が移動するその中で金属細線(5)は、その先端か折
り曲げられている。That is, as shown in FIG. 1(a), a semiconductor element (1
), a capillary tip (3
) is moving, and the thin metal wire (5) is bent at its tip.
次に、第1図Tblに示すように、キャピラリーチップ
(3)が下降し、折り曲げられた金属細線(5)を電極
(2)にホンディングする。(1,3tボンド)次に、
第1回(C)、(dlに示すように、半導体素子(1)
上にボンディングを終了したキャピラリーチップ(3)
はリードフレーム(7)上に移動し、金属細線(5)を
接合する。(2ndボンl”)
次に、第1図(e)に示すように、2ndボンド終了後
、キャピラリーチップ(3)は少くとも金属細線(5)
の線径以上(1)上昇した状態で、ボンディングして来
た方向とは逆方向に移動する。Next, as shown in FIG. 1 Tbl, the capillary tip (3) descends and the bent metal thin wire (5) is bonded to the electrode (2). (1,3t bond) Next,
As shown in Part 1 (C) and (dl), the semiconductor element (1)
Capillary chip with bonding completed on top (3)
moves onto the lead frame (7) and joins the thin metal wire (5). (2nd bond l") Next, as shown in FIG.
(1) and moves in the opposite direction from the direction in which the wire was bonded.
次に、第1図げ)に示すように、ワイヤクランパ(4)
か金属細線(5)をつかみ、上を持ち上げる事により、
2ndボンドされた位置より金属細線(5)が切断され
、ワイヤポンドが完了する。Next, as shown in Figure 1), attach the wire clamper (4)
By grasping the thin metal wire (5) and lifting the top,
The thin metal wire (5) is cut from the second bonded position, and the wire bonding is completed.
上記実施例では、キャピラリーチップ(3)か2ndボ
ンド後に移動した後、ワイヤクランパ(4)が閉じて、
上昇する様に示したが、2ndボンド後キヤピラリーチ
ツプ(3)が移動中にワイヤクランパ(4)か閉じて金
属細線(5)を切断しても良い。In the above embodiment, after the capillary chip (3) moves after the 2nd bond, the wire clamper (4) closes,
Although shown as rising, the wire clamper (4) may be closed while the capillary reach tip (3) is moving after the second bonding to cut the thin metal wire (5).
また、第2図に示す様に、金属細線(3)切断後、金属
細線折り曲げバー(9)を設置することで、キャピラリ
ーチップ(3)又は、折り曲げバー(9)を移動させて
、金属細線を折り曲げても良い。In addition, as shown in Fig. 2, after cutting the thin metal wire (3), by installing the thin metal wire bending bar (9), the capillary tip (3) or the bending bar (9) can be moved and the thin metal wire You can also bend it.
さらに半導体素子とリードフレームとのボンディング順
はどぢらか先でも良い。Further, the semiconductor element and the lead frame may be bonded in any order.
以上のようにこの発明によれば、ワイヤボンド装置にボ
ールを作る機構か不要な」二、ワイヤポンドのルーピン
グもX−Yの移動も任意の方向へ移動が可能である。又
、ボールを作る必要がないため、銅やアルミ等の安価な
材料でワイヤボンドか可能となる。As described above, according to the present invention, there is no need for a ball-forming mechanism in the wire bonding device.2.The wire bond can be looped and moved in any direction in the X-Y direction. Furthermore, since there is no need to make a ball, wire bonding can be performed using inexpensive materials such as copper or aluminum.
さらに、ボールを生成しない状態でワイヤポンドするた
め半導体素子上の電極の大きさを小さくすることかてき
る等の効果かある。Furthermore, since wire pounding is performed without forming balls, it is possible to reduce the size of the electrodes on the semiconductor element.
第1図(al〜げ)は発明の一実施例によるワイヤボン
ド装置の工程図。
第2図(a)、(b)はこの発明の他の実施例によるワ
イヤボンド装置の部分工程図
第3図(a)〜(g)は従来のワイヤボンド装置の工程
図である。
図において、(1)は半導体素子、(2)は電極、(3
)はギヤピラリ−デツプ、(4)はワイヤクランパ、(
5)は金属細線、(7)はり−トフレーム、(9)は折
り曲げバーである。
なお、図中、同一符号は同一、又は相当部分を示す。
代 理 人 大 岩 増 雄第1−図
第2図
4こ導体素子
癲
ヤヤビラリヂップ
2イヤクランバー
ナ属細線
第3図FIG. 1 (al-ge) is a process diagram of a wire bonding device according to an embodiment of the invention. FIGS. 2(a) and 2(b) are partial process diagrams of a wire bonding apparatus according to another embodiment of the present invention. FIGS. 3(a) to 3(g) are process diagrams of a conventional wire bonding apparatus. In the figure, (1) is a semiconductor element, (2) is an electrode, and (3) is a semiconductor element.
) is the gear pillar depth, (4) is the wire clamper, (
5) is a thin metal wire, (7) is a beam frame, and (9) is a bending bar. In addition, in the figures, the same reference numerals indicate the same or equivalent parts. Representative Masuo Daiiwa Figure 1 - Figure 2 Figure 4 Conductor Element Layout 2 Ear Clam Burner Thin Wire Figure 3
Claims (1)
する際、ボンディング方向のX−Y軸に対して、全方向
にワイヤボンド可能なワイヤボンダ及び上記ワイヤボン
ドを実施できるようにした半導体装置用ワイヤボンダ装
置。A wire bonder capable of performing wire bonding in all directions with respect to an X-Y axis in a bonding direction when performing wedge wire bonding in a wire bonder apparatus, and a wire bonder apparatus for a semiconductor device capable of performing the wire bonding.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2337480A JPH04206841A (en) | 1990-11-30 | 1990-11-30 | Wire bonding equipment for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2337480A JPH04206841A (en) | 1990-11-30 | 1990-11-30 | Wire bonding equipment for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04206841A true JPH04206841A (en) | 1992-07-28 |
Family
ID=18309045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2337480A Pending JPH04206841A (en) | 1990-11-30 | 1990-11-30 | Wire bonding equipment for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04206841A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100309129B1 (en) * | 1995-12-01 | 2001-12-17 | 박종섭 | Wire bonding device and bonding method using it |
US6564989B2 (en) | 2000-08-22 | 2003-05-20 | Mitsubishi Denki Kabushiki Kaisha | Wire bonding method and wire bonding apparatus |
US7918378B1 (en) * | 2010-08-06 | 2011-04-05 | National Semiconductor Corporation | Wire bonding deflector for a wire bonder |
US20140138426A1 (en) * | 2011-05-17 | 2014-05-22 | Shinkawa Ltd. | Wire bonding apparatus and bonding method |
-
1990
- 1990-11-30 JP JP2337480A patent/JPH04206841A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100309129B1 (en) * | 1995-12-01 | 2001-12-17 | 박종섭 | Wire bonding device and bonding method using it |
US6564989B2 (en) | 2000-08-22 | 2003-05-20 | Mitsubishi Denki Kabushiki Kaisha | Wire bonding method and wire bonding apparatus |
US7918378B1 (en) * | 2010-08-06 | 2011-04-05 | National Semiconductor Corporation | Wire bonding deflector for a wire bonder |
US8267303B2 (en) * | 2010-08-06 | 2012-09-18 | National Semiconductor Corporation | Wire bonding apparatus with a textured capillary surface enabling high-speed wedge bonding of wire bonds |
US20140138426A1 (en) * | 2011-05-17 | 2014-05-22 | Shinkawa Ltd. | Wire bonding apparatus and bonding method |
US9337166B2 (en) * | 2011-05-17 | 2016-05-10 | Shinkawa Ltd. | Wire bonding apparatus and bonding method |
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