JPH04176690A - Production of support for planographic printing plate - Google Patents
Production of support for planographic printing plateInfo
- Publication number
- JPH04176690A JPH04176690A JP30641590A JP30641590A JPH04176690A JP H04176690 A JPH04176690 A JP H04176690A JP 30641590 A JP30641590 A JP 30641590A JP 30641590 A JP30641590 A JP 30641590A JP H04176690 A JPH04176690 A JP H04176690A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- sealing
- printing plate
- acid
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims description 76
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000011282 treatment Methods 0.000 claims abstract description 49
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000007788 roughening Methods 0.000 claims abstract description 10
- 239000010407 anodic oxide Substances 0.000 claims description 13
- 238000007743 anodising Methods 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 2
- 238000007789 sealing Methods 0.000 abstract description 34
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 10
- 230000003647 oxidation Effects 0.000 abstract description 10
- 238000007254 oxidation reaction Methods 0.000 abstract description 10
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 239000012298 atmosphere Substances 0.000 abstract description 2
- 238000005238 degreasing Methods 0.000 abstract description 2
- 239000010731 rolling oil Substances 0.000 abstract description 2
- 239000008151 electrolyte solution Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 37
- 229920005989 resin Polymers 0.000 description 37
- 239000011347 resin Substances 0.000 description 37
- 238000000034 method Methods 0.000 description 34
- 150000001875 compounds Chemical class 0.000 description 32
- 239000000203 mixture Substances 0.000 description 24
- -1 O-naphthoquinone diazide compound Chemical class 0.000 description 21
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 16
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 16
- 239000000975 dye Substances 0.000 description 16
- 239000002253 acid Substances 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 14
- 229920000642 polymer Polymers 0.000 description 14
- 239000003921 oil Substances 0.000 description 11
- 229920006395 saturated elastomer Polymers 0.000 description 11
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- 239000003792 electrolyte Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 229940000635 beta-alanine Drugs 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 150000008049 diazo compounds Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000001491 aromatic compounds Chemical class 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- HSJKGGMUJITCBW-UHFFFAOYSA-N 3-hydroxybutanal Chemical compound CC(O)CC=O HSJKGGMUJITCBW-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical group CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 150000001241 acetals Chemical class 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- USEUJPGSYMRJHM-UHFFFAOYSA-N formaldehyde;4-methylphenol Chemical compound O=C.CC1=CC=C(O)C=C1 USEUJPGSYMRJHM-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000007793 ph indicator Substances 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 238000006303 photolysis reaction Methods 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 230000015843 photosynthesis, light reaction Effects 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- CQGBQHVFCCEEPW-UHFFFAOYSA-N (4-nonylphenyl) hydrogen sulfate Chemical compound CCCCCCCCCC1=CC=C(OS(O)(=O)=O)C=C1 CQGBQHVFCCEEPW-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- UWQPDVZUOZVCBH-UHFFFAOYSA-N 2-diazonio-4-oxo-3h-naphthalen-1-olate Chemical compound C1=CC=C2C(=O)C(=[N+]=[N-])CC(=O)C2=C1 UWQPDVZUOZVCBH-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Polymers OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- DIYZUWALSKUDMZ-UHFFFAOYSA-N 2-phenylethyl hydrogen sulfate Chemical compound OS(=O)(=O)OCCC1=CC=CC=C1 DIYZUWALSKUDMZ-UHFFFAOYSA-N 0.000 description 1
- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
- CXJAFLQWMOMYOW-UHFFFAOYSA-N 3-chlorofuran-2,5-dione Chemical compound ClC1=CC(=O)OC1=O CXJAFLQWMOMYOW-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 1
- VZLUGGCFYPMLMI-UHFFFAOYSA-N 5-(3,5-dihydroxyphenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC(C=2C=C(O)C=C(O)C=2)=C1 VZLUGGCFYPMLMI-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- KDGASBMKCFVAGA-UHFFFAOYSA-N 5-benzoyl-2-hydroxybenzenesulfonic acid Chemical compound OC1=C(C=C(C=C1)C(C1=CC=CC=C1)=O)S(=O)(=O)O KDGASBMKCFVAGA-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
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- 238000004438 BET method Methods 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
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- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical group 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
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- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- AFCIMSXHQSIHQW-UHFFFAOYSA-N [O].[P] Chemical compound [O].[P] AFCIMSXHQSIHQW-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- HRKQOINLCJTGBK-UHFFFAOYSA-N dihydroxidosulfur Chemical group OSO HRKQOINLCJTGBK-UHFFFAOYSA-N 0.000 description 1
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000002092 orthoester group Chemical group 0.000 description 1
- 150000002905 orthoesters Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は平版印刷版用支持体、特に平版印刷版用アルミ
ニウム粗面版の製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a support for a lithographic printing plate, and particularly to a method for producing a rough aluminum plate for a lithographic printing plate.
(従来の技術) −
アルミニウム上に感光性組成物を薄層状に塗設した感光
性平版印刷版(いわゆるPS版)は、アルミニウム板を
通常ブラシグレイン法やポールグレイン法のごとき機械
的な方法や電解グレイン法のごとき電気化学的な方法あ
るいは両者を組み合わせた方法などの粗面化処理に付し
、その表面を梨地状にした後、酸またはアルカリなどの
水溶液によりエツチングし、さらに陽極酸化処理を施し
た後、所望により親水化処理を施し、その上に感光層を
設けることにより製造される。(Prior art) - Photosensitive lithographic printing plates (so-called PS plates), in which a photosensitive composition is coated in a thin layer on aluminum, are produced using mechanical methods such as the brush grain method or pole grain method. The surface is roughened by an electrochemical method such as the electrolytic grain method or a combination of both methods to give the surface a satin finish, then etched with an aqueous solution of acid or alkali, and then anodized. After that, if desired, a hydrophilic treatment is performed, and a photosensitive layer is provided thereon.
このPS版は、通常、像露光、現像、修正、ガム引き工
程を施して平版印刷版とされ、これを印刷機にとりつけ
て印刷する。This PS plate is usually subjected to image exposure, development, correction, and gumming processes to form a lithographic printing plate, which is then mounted on a printing machine and printed.
平版印刷版の諸性能の中、非画像部の強度は、酸化皮膜
の厚さとともに向上する。Among the various performances of a lithographic printing plate, the strength of the non-image area improves with the thickness of the oxide film.
しかしながら、酸化皮膜量を多くすると、ポジ型平版印
刷版では、■現像後、非画像部に感光層中の染料、高分
子バインダーが残り易くなる、■ハイライト部の再現性
が悪くなる、等の欠点があった。またネガ型平版印刷版
でも、■感光層中の染料や高分子バインダーが時間の経
過と共に支持体表面に非可逆的に吸着され、汚れが生じ
る、■シャド一部の網点の再現性が悪くなる、等の欠点
があった。However, when the amount of oxide film is increased, positive-working lithographic printing plates suffer from the following problems: (1) dyes and polymer binders in the photosensitive layer tend to remain in non-image areas after development, (2) reproducibility of highlighted areas deteriorates, etc. There was a drawback. In addition, even with negative planographic printing plates, (1) dyes and polymeric binders in the photosensitive layer are irreversibly adsorbed onto the support surface over time, causing stains; (2) poor reproducibility of halftone dots in some shadow areas; There were drawbacks such as:
また、非画像部の酸又はアルカリに対する耐食性は酸化
皮膜を封孔処理することにより向上する。Furthermore, the corrosion resistance of the non-image area against acids or alkalis is improved by sealing the oxide film.
封孔処理には幾つかの方法があるが、例えば米国特許第
3.181.461号明細書に記載されているように陽
極酸化したアルミニウム支持体をアルカリ金属珪酸塩の
水溶液中に浸漬処理する方法、米国特許第3.440.
050号明細書に記載されているように弗化ジルコニウ
ム酸のアルカリ金属塩水溶液中に浸漬処理する方法、米
国特許第4.153.461号、同第4.689.27
2号に記載されているようなポリビニルホスホン酸で処
理する方法等があるが、これらの方法により製造された
PS版は非画像部の汚染がなく印刷物に“地汚れ”を発
生させることのない平版印刷版を与えるが、その反面印
刷版の耐刷性が上記処理を施さない場合に比べて大幅に
減少する欠点を伴っていた。There are several methods for sealing, but for example, as described in U.S. Pat. No. 3,181,461, an anodized aluminum support is immersed in an aqueous solution of an alkali metal silicate. Method, U.S. Patent No. 3.440.
A method of immersion treatment in an aqueous alkali metal salt solution of fluorozirconic acid as described in US Pat. No. 4,153,461 and US Pat. No. 4,689,27.
There are methods such as treatment with polyvinylphosphonic acid as described in No. 2, but PS plates manufactured by these methods do not stain non-image areas and do not cause "background stains" on printed matter. A lithographic printing plate is obtained, but on the other hand, the printing durability of the printing plate is significantly reduced compared to a case without the above-mentioned treatment.
また、特開昭59−1141[)号には水蒸気で処理す
る方法が記載され、この方法では、上記印刷版の耐刷性
が低下することがないとされている。しかし、この方法
でも封孔反応が進み過ぎると、ポジ型平版印刷版では、
ケイ酸塩を主成分とする現像液で現像した後の非画像部
の親水性が低下し、又、耐刷性が低下し、ネガ型平版印
刷版では非画像部の親水性が低下し、印刷物に地汚れが
発生し易くなり、耐刷性も低下するという欠点があった
。Furthermore, Japanese Patent Application Laid-Open No. 1141/1983 describes a method of treating with water vapor, and it is said that this method does not reduce the printing durability of the printing plate. However, even with this method, if the sealing reaction progresses too much, the positive planographic printing plate will
After development with a developer containing silicate as a main component, the hydrophilicity of the non-image area decreases, and the printing durability decreases, and in negative planographic printing plates, the hydrophilicity of the non-image area decreases. There were disadvantages in that printed matter was more likely to have background stains and its printing durability was reduced.
(発明が解決しようとする課題)
本発明の目的は、非画像部の強度及び耐食性に優れた平
版印刷版を製造するのに適した平版印刷版用支持体の製
造法を提供することにある。(Problems to be Solved by the Invention) An object of the present invention is to provide a method for producing a lithographic printing plate support suitable for producing a lithographic printing plate with excellent strength and corrosion resistance in non-image areas. .
(課題を解決するための手段)
本発明者らは、上記目的を達成すべく鋭意検討した結果
本発明をなすにいたったものである。本発明は、アルミ
ニウム板の表面を粗面化し、陽極酸化皮膜の量が2 g
/ m’以上となるように陽極酸化したのち、熱水又
は水蒸気により封孔処理して酸化皮膜の表面積を40〜
95%減少させ、その後親水化処理及び/又は親水性下
塗り処理を施すことを特徴とする平版印刷版用支持体の
製造法である。(Means for Solving the Problems) The present inventors have made extensive studies to achieve the above object, and as a result, have come up with the present invention. In the present invention, the surface of an aluminum plate is roughened, and the amount of anodized film is 2 g.
/ m' or more, and then sealing with hot water or steam to reduce the surface area of the oxide film to 40 ~
This is a method for producing a support for a lithographic printing plate, which is characterized in that it is reduced by 95% and then subjected to a hydrophilic treatment and/or a hydrophilic undercoating treatment.
以下本発明について、順を追って説明する。The present invention will be explained step by step below.
(アルミニウム板)
本発明に於て用いられるアルミニウム板は純アツベニウ
ムや、アルミニウムを主成分とし重量の異原子を含むア
ルミニウム合金等の板状体である。(Aluminum Plate) The aluminum plate used in the present invention is a plate-shaped body of pure atubenium or an aluminum alloy whose main component is aluminum and contains a heavy amount of different atoms.
このような異原子には、珪素、鉄、マンガン、銅、マク
ネシウム、クロム、亜鉛、ビスマス、ニッケル、チタン
などがある。これらの異原子の含有率は、一般に10重
量%以下である。本発明の支持体に好適なアルミニウム
は、純アツベニウムであるが、完全に純粋なアルミニウ
ムは精錬技術上製造が困難であるので、できるだけ異原
子を含まないものがよい。このように、本発明に適用さ
れるアルミニウム板は、その組成が限定されるものでは
なく、従来公知、公用の素材(たとえばJISA105
0、JIS Al100、JISA1200、JIS
A3103、JISA3003、JIS A30
05など)のものを適宜利用できる。本発明に用いられ
るアルミニウム板の厚さは、0.1111[11−0,
5mm程度が適当である。Such foreign atoms include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of these foreign atoms is generally 10% by weight or less. Aluminum suitable for the support of the present invention is pure atubenium, but since it is difficult to produce completely pure aluminum due to refining technology, it is preferable to use aluminum that does not contain foreign atoms as much as possible. As described above, the aluminum plate applied to the present invention is not limited in its composition, and can be made of conventionally known and publicly used materials (for example, JISA105
0, JIS Al100, JISA1200, JIS
A3103, JISA3003, JIS A30
05 etc.) can be used as appropriate. The thickness of the aluminum plate used in the present invention is 0.1111[11-0,
Approximately 5 mm is appropriate.
(粗面化処理)
アルミニウム板の表面は、陽極酸化するのに先立ち、表
面の圧延油を除去するための、例えば界面活性剤、また
はアルカリ性水溶液による脱脂処理が所望により行なわ
れたのち、粗面化される。(Surface Roughening Treatment) Prior to anodizing, the surface of the aluminum plate is subjected to degreasing treatment using a surfactant or alkaline aqueous solution to remove rolling oil on the surface, if desired, and then roughened. be converted into
粗面化の方法には、機械的に表面を粗面化する方法、電
気化学的に表面を粗面化する方法及び、化学的に表面を
選択溶解させる方法がある。機械的に表面を粗面化する
方法としては、ボール研磨法、ブラシ研磨法、サンドブ
ラスト研磨法、ホーユング研磨法などと称される公知の
方法を用いることができる。また電気化学的な粗面化法
としては塩酸または硝酸電解液中で交流または直流によ
り、行なう方法がある。また特開昭54−63902号
公報に開示されているように機械的な粗面化法と電気化
学的な粗面化法を組み合わせた方法も利用することがで
きる。Surface roughening methods include a method of mechanically roughening the surface, a method of electrochemically roughening the surface, and a method of selectively dissolving the surface chemically. As a method for mechanically roughening the surface, known methods such as ball polishing, brush polishing, sandblasting, Hojung polishing, etc. can be used. Further, as an electrochemical surface roughening method, there is a method in which alternating current or direct current is used in a hydrochloric acid or nitric acid electrolyte. Furthermore, as disclosed in Japanese Patent Application Laid-Open No. 54-63902, a method combining mechanical surface roughening and electrochemical surface roughening can also be used.
このようにして粗面化されたアルミニウム板は、必要に
応じてアルカリエツチング処理及び中和処理される。The aluminum plate thus roughened is subjected to alkali etching treatment and neutralization treatment as required.
(陽極酸化処理)
この様に処理された表面は、引き続いて陽極酸化処理さ
れる。(Anodizing Treatment) The surface treated in this manner is subsequently subjected to an anodizing treatment.
アルミニウム板の陽極酸化処理に用いられる電解質とし
ては多孔性酸化皮膜を形成するものならばいかなるもの
でもよく、一般的には硫酸、燐酸、蓚酸、クロム酸ある
いはそれらの混酸または水酸化ナトリウム、水酸化カリ
ウムあるいはそれらの混合液や弗化アンモニウム添加浴
などが用いられ、それらに添加する電解質やその濃度は
電解質の種類によって、適宜法められる、陽極酸化の処
理条件は電解質の種類によって変わるので一概に特定し
得ないが、一般的には電解質の濃度1−80重量%、液
温5−80℃、電流密度5−80A/dm2、電圧1−
1OOV、電解時間5秒−10分の範囲が適当である。The electrolyte used for anodizing the aluminum plate may be anything as long as it forms a porous oxide film, and generally sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid thereof, sodium hydroxide, or hydroxide is used as the electrolyte. Potassium or a mixture thereof, ammonium fluoride additive bath, etc. are used, and the electrolyte added to them and its concentration are determined as appropriate depending on the type of electrolyte.The treatment conditions for anodic oxidation vary depending on the type of electrolyte, so they cannot be generalized. Although it cannot be specified, generally the electrolyte concentration is 1-80% by weight, the liquid temperature is 5-80℃, the current density is 5-80A/dm2, and the voltage is 1-80% by weight.
A range of 1 OOV and electrolysis time of 5 seconds to 10 minutes is appropriate.
本発明において特に好ましい陽極酸化は電解質として硫
酸を用いるものであり、特に英国特許第1、412.7
68号又は米国特許第4.211.619号に記載され
ているような条件下で陽極酸化する方法が好ましい。A particularly preferred anodic oxidation method in the present invention uses sulfuric acid as an electrolyte, particularly as described in British Patent No. 1,412.7.
68 or US Pat. No. 4,211,619 is preferred.
本発明において最も好ましい陽極酸化は、5〜20重量
%の硫酸及び3〜15重量%のアルミニウムイオンを含
有する電解液中で、温度25〜50℃にて5〜20A/
dm2の電流密度で直流で陽極酸化する方法である。The most preferred anodic oxidation in the present invention is 5 to 20 A/20 A /
This is a method of direct current anodic oxidation at a current density of dm2.
陽極酸化皮膜の量は2−5 g / m’が好適である
。The amount of anodized film is preferably 2-5 g/m'.
(封孔処理)
封孔処理とは、多孔質陽極酸化皮膜の穴を金属、酸化物
または水酸化物でふさいでしまう処理である。本発明で
は、多孔質酸化皮膜を蒸気雰囲気に暴露したり熱水中に
浸漬する方法で封孔処理を行なう。(Sealing Treatment) The sealing treatment is a treatment in which holes in a porous anodic oxide film are closed with a metal, oxide, or hydroxide. In the present invention, the pore sealing process is performed by exposing the porous oxide film to a steam atmosphere or immersing it in hot water.
蒸気によって封孔する場合には、加圧または常圧の水蒸
気が用いられる。常圧の蒸気を用いた場合の処理条件は
相対湿度が70%以上蒸気温度95℃以上で2秒から2
分間程度が適当である。When sealing with steam, pressurized or normal pressure steam is used. When using steam at normal pressure, the processing conditions are a relative humidity of 70% or higher and a steam temperature of 95°C or higher for 2 to 2 seconds.
About a minute is appropriate.
熱水中に浸漬する場合には、各種の封孔促進効果のある
添加物を熱水中に添加することが好ましい。When immersing in hot water, it is preferable to add various additives having a sealing promoting effect to the hot water.
ここで、封孔の目安として封孔率を用いることにする。Here, the sealing rate will be used as a measure of sealing.
封孔率とは、酸化皮膜の表面積の減少の割合を表わし、
下記の式で定義される。The sealing rate represents the rate of decrease in the surface area of the oxide film,
It is defined by the formula below.
上記表面積は簡易BET方式であるQUANTASOR
B(湯浅アイオニクス〔株〕製)を使って測定した値で
ある。The above surface area is QUANTASOR, which is a simple BET method.
This is a value measured using B (manufactured by Yuasa Ionics Co., Ltd.).
以上のようにして封孔処理まで行なったアルミニウム板
は、そのまま直ちに平版印刷版用支持体に供することが
でき、例えばワイプ・オン用支持体とするか、あるいは
石版印刷用に適した感光層を設けて感光性平版印刷版と
することができるが、本発明では、封孔処理後に更に親
水化処理、親水性下塗層の塗設などの処理を単独で又は
組合せて施こすことが好ましい。The aluminum plate that has been subjected to the sealing treatment as described above can be used as a support for a lithographic printing plate immediately as it is, for example, it can be used as a wipe-on support, or it can be coated with a photosensitive layer suitable for lithographic printing. However, in the present invention, it is preferable to further perform treatments such as hydrophilic treatment and application of a hydrophilic undercoat layer alone or in combination after the sealing treatment.
(親水化処理)
本発明に使用される親水化処理としては、米国特許第2
.714.066号及び米国特許第3.181.461
号に開示されているようなアルカリ金属シリケート(例
えば珪酸ナトリウム水溶液)、または特公昭36−22
063号公報に開示されている弗化ジルコン酸カリウム
、及び米国特許第4.153.461号、同第4.68
9.272号に開示されているようなポリビニルホスホ
ン酸で処理する方法など、公知の方法を用いることがで
きる。このような親水化処理は、特にジアゾ樹脂を含む
感光層を設ける場合には施こすことが望ましい。(Hydrophilization treatment) As the hydrophilization treatment used in the present invention, US Pat.
.. No. 714.066 and U.S. Patent No. 3.181.461
Alkali metal silicates (e.g. sodium silicate aqueous solution) as disclosed in Japanese Patent Publication No. 36-22
Potassium fluorozirconate disclosed in Publication No. 063, and U.S. Pat. Nos. 4.153.461 and 4.68
Known methods can be used, such as the method of treatment with polyvinylphosphonic acid as disclosed in No. 9.272. It is desirable to carry out such a hydrophilic treatment especially when a photosensitive layer containing a diazo resin is provided.
(親水性下塗層)
本発明に使用される親水性下塗層の好ましいものは特開
昭60−149491号公報に開示されている、少なく
とも1個のアミノ基と、カルボキシル基及びその塩の基
並びにスルホ基及びその塩の基からなる群から選ばれた
少なくとも1個の基とを有する化合物からなる親木層、
特開昭60−232998号公報に開示されている少な
くとも1個のアミン基と少なくとも1個の水酸基を有す
る化合物およびその塩から選ばれた化合物からなる親水
層、特開昭62−19494号公報に開示されているリ
ン酸塩を含む親水層、特開昭59−101651号公報
に開示されているスルホ基を有するモノマー単位の少な
くとも1種を繰り返し単位として分子中に含む高分子化
合物からなる親木層が含まれる。この下塗層は、前述の
封孔処理後に設けてもよいし、封孔処理後に上記親水化
処理を施こしてから設けてもよい。(Hydrophilic Undercoat Layer) A preferred hydrophilic undercoat layer used in the present invention is the one disclosed in JP-A-60-149491, which contains at least one amino group, a carboxyl group, and a salt thereof. and at least one group selected from the group consisting of a sulfo group and a salt group thereof;
A hydrophilic layer comprising a compound selected from compounds having at least one amine group and at least one hydroxyl group and salts thereof disclosed in JP-A-60-232998; A hydrophilic layer containing a phosphate as disclosed, a parent tree consisting of a polymer compound containing in its molecule at least one type of monomer unit having a sulfo group as a repeating unit as disclosed in JP-A-59-101651. Contains layers. This undercoat layer may be provided after the above-mentioned sealing treatment, or may be provided after the above-mentioned hydrophilic treatment is performed after the sealing treatment.
このような中間層を設ける前又は後に陽極酸化されたア
ルミニウム板を米国特許箱3.181.461号に記載
されているようにアルカリ金属珪酸塩の水溶液で処理す
ることができる。このようにして得られた平版印刷版用
支持体の上には従来より知られている感光層を設けて、
感光性平版印刷版を得ることができ、これを製版処理し
て得た平版印刷版は優れた性能を有している。Before or after providing such an intermediate layer, the anodized aluminum plate can be treated with an aqueous solution of an alkali metal silicate as described in US Pat. No. 3,181,461. A conventionally known photosensitive layer is provided on the lithographic printing plate support thus obtained.
A photosensitive lithographic printing plate can be obtained, and the lithographic printing plate obtained by plate-making treatment has excellent performance.
上記の感光層の組成物としては、露光の前後で現像液に
対する溶解性又は膨潤性が変化するものならば使用でき
る。以下、その代表的なものについて説明する。As the composition for the above-mentioned photosensitive layer, any composition can be used as long as its solubility or swelling property in a developer changes before and after exposure. The typical ones will be explained below.
(A) o−キノンジアジド化合物からなる感光層ポジ
型感光性組成物の感光性化合物としては、0−キノンジ
アジド化合物が挙げられ、その代表として0−ナフトキ
ノンジアジド化合物が挙げられる。(A) Photosensitive layer consisting of an o-quinonediazide compound Examples of the photosensitive compound of the positive photosensitive composition include an 0-quinonediazide compound, and a representative example thereof is an 0-naphthoquinonediazide compound.
0−ナフトキノンジアジド化合物としては、特公昭43
−28403号公報に記載されている1゜2−ジアゾナ
フトキノンスルホン酸クロライドとピロガロール−アセ
トン樹脂とのエステルであるものが好ましい。その他の
好適なオルトキノンジアジド化合物としては、米国特許
箱3.046.120号および同第3.188.210
号明細書中に記載されている1、2−ジアゾナフトキノ
ンスルホン酸クロライドとフェノール−ホルムアルデヒ
ド樹脂とのエステルがある。その他の有用な0−ナフト
キノンジアジド化合物としては、数多くの特許に報告さ
れ、知られているものが挙げられる。たとえば、特開昭
47−5303号、同48−83802号、同48−6
3803号、同48−96575号、同49−3870
1号、同48−13354号、特公昭37−18015
号、同41−11222号、同45−9610号、同4
9−17481号公報、米国特許箱2.797.213
号、同第3.454.400号、同第3.544.32
3号、同第3.573.917号、同第3、674.4
95号、同第3.785.825号、英国特許第1.2
27.602号、同第1.251.345号、同第1.
267、005号、同第1.329.888号、同第1
.330.932号、ドイツ特許第854.890号な
どの各明細書中に記載されているものをあげることがで
きる。As the 0-naphthoquinone diazide compound,
An ester of 1°2-diazonaphthoquinonesulfonic acid chloride and pyrogallol-acetone resin described in Japanese Patent No. 28403 is preferred. Other suitable orthoquinonediazide compounds include U.S. Pat.
There are esters of 1,2-diazonaphthoquinone sulfonic acid chloride and phenol-formaldehyde resins described in the above specification. Other useful 0-naphthoquinone diazide compounds include those reported in numerous patents and known. For example, JP-A No. 47-5303, JP-A No. 48-83802, JP-A No. 48-6
No. 3803, No. 48-96575, No. 49-3870
No. 1, No. 48-13354, Special Publication No. 37-18015
No. 41-11222, No. 45-9610, No. 4
Publication No. 9-17481, U.S. Patent Box 2.797.213
No. 3.454.400, No. 3.544.32
No. 3, No. 3.573.917, No. 3, 674.4
No. 95, No. 3.785.825, British Patent No. 1.2
No. 27.602, No. 1.251.345, No. 1.
No. 267,005, No. 1.329.888, No. 1
.. Examples include those described in various specifications such as No. 330.932 and German Patent No. 854.890.
本発明において特に好ましいO−ナフトキノンジアジド
化合物は、分子量1.000以下のポリヒドロキシ化合
物と1,2−ジアゾナフトキノンスルホン酸クロライド
との反応により得られる化合物である。このような化合
物の具体例は、特開昭51−139402号、同58−
150948号、同58−203434号、同59−1
65053号、同60−121.445号、同60−1
34235号、同60−163043号、同61−11
8744号、同62−10645号、同62−1064
6号、同62−153950号、同62−178562
号、同64−76047号、米国特許箱3.102.8
09号、同第3.126.281号、同第3.130.
047号、同第3、148.983号、同第3.184
.310号、同第3.188.210号、同第4.63
9.406号などの各公報または明細書に記載されてい
るものを挙げることができる。A particularly preferred O-naphthoquinone diazide compound in the present invention is a compound obtained by reacting a polyhydroxy compound having a molecular weight of 1.000 or less with 1,2-diazonaphthoquinone sulfonic acid chloride. Specific examples of such compounds are disclosed in JP-A-51-139402 and JP-A-58-1989.
No. 150948, No. 58-203434, No. 59-1
No. 65053, No. 60-121.445, No. 60-1
No. 34235, No. 60-163043, No. 61-11
No. 8744, No. 62-10645, No. 62-1064
No. 6, No. 62-153950, No. 62-178562
No. 64-76047, U.S. Patent Box 3.102.8
No. 09, No. 3.126.281, No. 3.130.
No. 047, No. 3, No. 148.983, No. 3.184
.. 310, 3.188.210, 4.63
Examples include those described in various publications or specifications such as No. 9.406.
これらの0−ナフトキノンジアジド化合物を合成する際
は、ポリヒドロキシ化合物のヒドロキシル基に対して1
.2−ジアゾナフトキノンスルホン酸クロリドを0.2
〜1.2当量反応させる事が好ましく、0.3〜1.0
当量反応させる事がさらに好ましい。1.2−ジアゾナ
フトキノンスルホン酸クロリドとしては、1.2−ジア
ゾナフトりノン−5−スルホン酸クロリドが好ましいが
、1.2−ジアシナフトキノン−4−スルホン酸クロリ
ドも用いる事ができる。When synthesizing these 0-naphthoquinone diazide compounds, 1
.. 0.2 of 2-diazonaphthoquinone sulfonic acid chloride
It is preferable to react by 1.2 equivalents, and 0.3 to 1.0 equivalents.
It is more preferable to carry out an equivalent reaction. As the 1.2-diazonaphthoquinone sulfonic acid chloride, 1.2-diazonaphthoquinone-5-sulfonic acid chloride is preferred, but 1.2-diazonaphthoquinone-4-sulfonic acid chloride can also be used.
また得られる0−ナフトキノンジアジド化合物は、1.
2−ジアゾナフトキノンスルホン酸エステル基の位置及
び導入量の種々異なるものの混合物となるが、ヒドロキ
シル基がすべて1,2−ジアゾナフトキノンスルホン酸
エステルに転換された化合物がこの混合物中に占める割
合(完全にエステル化された化合物の含有率)は5モル
%以上である事が好ましく、さらに好ましくは20〜9
9モル%である。Moreover, the obtained 0-naphthoquinone diazide compound is 1.
The result is a mixture of compounds with different positions and amounts of 2-diazonaphthoquinone sulfonic acid ester groups, but the proportion of compounds in which all hydroxyl groups have been converted to 1,2-diazonaphthoquinone sulfonic acid esters (completely The content of esterified compounds is preferably 5 mol% or more, more preferably 20 to 9 mol%.
It is 9 mol%.
また0−ナフトキノンジアジド化合物を用いずにポジ型
に作用する感光性化合物として、例えば特公昭56−2
696号に記載されているオルトニトロカルビノールエ
ステル基を有するポリマー化合物も本発明に使用するこ
とができる。In addition, as a photosensitive compound that acts positively without using an 0-naphthoquinone diazide compound, for example,
Polymeric compounds having orthonitrocarbinol ester groups as described in No. 696 can also be used in the present invention.
更に光分解により酸を発生する化合物と、酸により解離
する一C−O−C−基又は−〇−○−81基を有する化
合物との組合せ系も本発明に使用することができる。Furthermore, a combination system of a compound that generates an acid upon photolysis and a compound having a 1C-O-C- group or a -○-○-81 group that dissociates with an acid can also be used in the present invention.
例えば光分解により酸を発生する化合物とアセタール又
はO,N−アセタール化合物との組合せ(特開昭48−
89003号)、オルトエステル又はアミドアセタール
化合物との組合せ(特開昭51−120714号)、主
鎖にアセタール又はケタール基を有するポリマーとの組
合せ(特開昭53−133429号)、エノールエーテ
ル化合物との組合せ(特開昭55−12995号)、N
−アシルイミノ炭素化合物との組合せ(特開昭55−1
26236号)、主鎖にオルトエステル基を有するポリ
マーとの組合せ(特開昭56−17345号)、シリル
エステル化合物との組合せ(特開昭60−10247号
)及びシリルエーテル化合物との組合せ(特開昭60−
37549号、特開昭60−121446号)などが挙
げられる。For example, a combination of a compound that generates an acid by photolysis and an acetal or an O,N-acetal compound (JP-A-48-1999-1)
89003), a combination with an orthoester or amide acetal compound (JP-A-51-120714), a combination with a polymer having an acetal or ketal group in the main chain (JP-A-53-133429), and an enol ether compound. combination (JP-A-55-12995), N
- Combination with acylimino carbon compound (JP-A-55-1
26236), a combination with a polymer having an orthoester group in the main chain (JP-A-56-17345), a combination with a silyl ester compound (JP-A-60-10247), and a combination with a silyl ether compound (JP-A-56-10247). 1986-
No. 37549, JP-A-60-121446), etc.
本発明の感光性組成物中に占めるこれらのポジ型に作用
する感光性化合物(上記のような組合せを含む)の量は
10〜50重量%が適当であり、より好ましくは15〜
40重量%である。The amount of these positive-acting photosensitive compounds (including the above-mentioned combinations) in the photosensitive composition of the present invention is suitably 10 to 50% by weight, more preferably 15 to 50% by weight.
It is 40% by weight.
0−キノンジアジド化合物は単独でも感光層を構成する
が、アルカリ水に可溶な樹脂を結合剤(バインダー)と
してこの種の樹脂と共に使用することが好ましい。この
ようなアルカリ水に可溶性の樹脂としては、この性質を
有するラボラック樹脂があり、たとえばフェノールホル
ムアルデヒド樹脂、m−クレゾールホルムアルデヒド樹
脂、p−クレゾールホルムアルデヒド樹脂、m−/p−
混合クレゾールホルムアルデヒド樹脂、フェノール/ク
レゾール(m−1p−1又はm−/p−混合のいずれで
もよい)混合ホルムアルデヒド樹脂などのクレゾールホ
ルムアルデヒド樹脂、フェノール変性キシレン樹脂、ポ
リヒドロキシスチレン、ポリハロゲン化ヒドロキシスチ
レン、4t[昭51−34711号公報に開示されてい
るようなフェノール性水酸基を含有するアクリル系樹脂
、特開平2−866号公報に記載のスルホンアミド基を
有するアクリル系樹脂や、ウレタン系の樹脂、等種々の
アルカリ可溶性の高分子化合物を含有させることができ
る。これらのアルカリ可溶性高分子化合物は、重量平均
分子量が500〜20.000で数平均分子量が200
〜60.000のものが好ましい。Although the 0-quinonediazide compound alone constitutes the photosensitive layer, it is preferable to use a resin soluble in alkaline water as a binder together with this type of resin. Examples of resins soluble in alkaline water include Labolac resins having this property, such as phenol formaldehyde resin, m-cresol formaldehyde resin, p-cresol formaldehyde resin, m-/p-
Cresol formaldehyde resins such as mixed cresol formaldehyde resins, phenol/cresol (either m-1p-1 or m-/p-mixed) mixed formaldehyde resins, phenol-modified xylene resins, polyhydroxystyrene, polyhalogenated hydroxystyrene, 4t [Acrylic resin containing a phenolic hydroxyl group as disclosed in Japanese Patent Publication No. 51-34711, acrylic resin containing a sulfonamide group as disclosed in Japanese Patent Application Laid-Open No. 2-866, urethane resin, Various alkali-soluble polymer compounds such as the following can be contained. These alkali-soluble polymer compounds have a weight average molecular weight of 500 to 20,000 and a number average molecular weight of 200.
~60.000 is preferred.
かかるアルカリ可溶性の高分子化合物は全組成物の70
重量%以下の添加量で用いられる。Such alkali-soluble polymer compound accounts for 70% of the total composition.
It is used in an amount of less than % by weight.
更に、米国特許第4.123.279号明細書に記載さ
れているように、t−ブチルフェノールホルムアルデヒ
ド樹脂、オクチルフェノールホルムアルデヒド樹脂のよ
うな、炭素数3〜8のアルキル基を置換基として有する
フェノールとホルムアルデヒドとの縮合物を併用するこ
とは画像の感脂性を向上させる上で好ましい。Furthermore, as described in U.S. Pat. No. 4,123,279, phenol and formaldehyde having an alkyl group having 3 to 8 carbon atoms as a substituent, such as t-butylphenol formaldehyde resin and octylphenol formaldehyde resin, It is preferable to use a condensate with the above compound in combination to improve the oil sensitivity of the image.
本発明における感光性組成物中には、感度を高めるため
に環状酸無水物、露光後直ちに可視像を得るための焼出
し剤、画像着色剤としての染料やその他のフィラーなど
を加えることができる。環状酸無水物としては米国特許
第4.115.128号明細書に記載されているように
無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒド
ロ無水フタル酸、3.6−ニンドオキシー△4−テトラ
ヒドロ無水フタル酸、テトラクロル無水フタル酸、無水
マレイン酸、クロル無水マレイン酸、α−フェニル無水
マレイン酸、無水コハク酸、無水ピロメリット酸等があ
る。これらの環状酸無水物を全組成物の重量に対して1
から15重量%含有させることによって感度を最大3倍
程度に高めることができる。The photosensitive composition of the present invention may contain a cyclic acid anhydride to increase sensitivity, a printing agent to obtain a visible image immediately after exposure, a dye as an image coloring agent, and other fillers. can. Examples of the cyclic acid anhydride include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and 3,6-nindooxy-△4-tetrahydrophthalic anhydride as described in U.S. Pat. No. 4,115,128. , tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride, and the like. 1 of these cyclic acid anhydrides based on the weight of the total composition.
By containing from 15% by weight, the sensitivity can be increased up to about 3 times.
露光後直ちに可視像を得るた約の焼出し剤としては露光
によって酸を放出する感光性化合物と塩を形成し得る有
機染料の組合せを代表としてあげることができる。具体
的には特開昭50−36209号公報、特開昭53−8
128号公報に記載されている0−ナフトキノンジアジ
ド−4−スルホン酸ハロゲニドと塩形成性有機染料の組
合せや特開昭53−36223号、同54−74728
号、同60−3626号、同61−143748号、同
61−151644号、同63−58440号公報に記
載されているトリハロメチル化合物と塩形成性有機染料
の組合せをあげることができる。Typical print-out agents that provide a visible image immediately after exposure include a combination of a photosensitive compound that releases an acid upon exposure and an organic dye that can form a salt. Specifically, JP-A-50-36209, JP-A-53-8
The combination of 0-naphthoquinonediazide-4-sulfonic acid halide and a salt-forming organic dye described in JP-A No. 128, and JP-A-53-36223 and JP-A-54-74728.
For example, combinations of a trihalomethyl compound and a salt-forming organic dye described in Japanese Patent No. 60-3626, No. 61-143748, No. 61-151644, and No. 63-58440 can be mentioned.
画像の着色剤として前記の塩形成性有機染料以外に他の
染料も用いることができる。塩形成性有機染料を含めて
好適な染料として油溶性染料および塩基染料をあげるこ
とができる。具体的には、オイルイエロー#101、オ
イルイエロー#130、オイルピンク#312、オイル
グリーンBG、オイルブルーBO3、オイルブルー#6
03、オイルブラックBY、オイルブラックBS、オイ
ルブラックT−505(以上、オリエント化学工業株式
会社製)、ビクトリアピュアブルー、クリスタルバイオ
レット(CI42555)、メチルバイオレット (C
I42535)、ローダミンB (CI45170B)
、マラカイトグリーン(CI 42000)、メチレン
ブルー(CI52015)などをあげることができる。In addition to the above-mentioned salt-forming organic dyes, other dyes can also be used as image coloring agents. Suitable dyes include oil-soluble dyes and basic dyes, including salt-forming organic dyes. Specifically, oil yellow #101, oil yellow #130, oil pink #312, oil green BG, oil blue BO3, oil blue #6
03, Oil Black BY, Oil Black BS, Oil Black T-505 (manufactured by Orient Chemical Industry Co., Ltd.), Victoria Pure Blue, Crystal Violet (CI42555), Methyl Violet (C
I42535), rhodamine B (CI45170B)
, malachite green (CI 42000), methylene blue (CI 52015), and the like.
また、特開昭62−293247号公報に記載されてい
る染料は特に好ましい。Moreover, the dyes described in JP-A-62-293247 are particularly preferred.
本発明における感光性組成物は、上記各成分を溶解する
溶媒に溶かして支持体上に塗布する。ここで使用する溶
媒としては、エチレンジクロライド、シクロヘキサノン
、メチルエチルケトン、エチレングリコールモノメチル
エーテル、エチレングリコールモノエチルエーテル、2
−メトキシエチルアセテート、1−メトキシ−2−プロ
パツール、1−メトキシ−2−プロピルアセテート、ト
ルエン、酢酸エチル、乳酸メチル、乳酸エチル、ジメチ
ルスルホキシド、ジメチルアセトアミド、ジメチルホル
ムアミド、水、N−メチルピロリドン、テトラヒドロフ
ルフリルアルコール、アセトン、ジアセトンアルコール
、メタノール、エタノール、イソプロパツール、ジエチ
レングリコール、ジメチルエーテルなどがあり、これら
の溶媒を単独あるいは混合して使用する。そして、上記
成分中の濃度(固形分)は、2〜50重量%である。The photosensitive composition in the present invention is dissolved in a solvent that dissolves each of the above components and applied onto a support. The solvents used here include ethylene dichloride, cyclohexanone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether,
-Methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propylacetate, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl sulfoxide, dimethylacetamide, dimethylformamide, water, N-methylpyrrolidone, Examples include tetrahydrofurfuryl alcohol, acetone, diacetone alcohol, methanol, ethanol, isopropanol, diethylene glycol, and dimethyl ether, and these solvents can be used alone or in combination. The concentration (solid content) of the above components is 2 to 50% by weight.
また、塗布量は用途により異なるが、例えば感光性平版
印刷版についていえば一般的に固形分として0.5〜3
.0g/m”が好ましい。塗布量が薄くなるにつれ感光
性は大になるが、感光膜の物性は低下する。The coating amount varies depending on the application, but for example, for photosensitive planographic printing plates, the solid content is generally 0.5 to 3.
.. 0 g/m'' is preferable.As the coating amount becomes thinner, the photosensitivity increases, but the physical properties of the photosensitive film deteriorate.
本発明における感光性組成物中には、塗布性を良化する
ための界面活性剤、例えば特開昭62=170950号
公報に記載されているようなフッ素系界面活性剤を添加
することができる。好ましい添加量は、全感光性組成物
の0.01〜1重量%、さらに好ましくは0.05〜0
.5重量%である。In the photosensitive composition of the present invention, a surfactant for improving coating properties, for example, a fluorine-based surfactant as described in JP-A-62-170950 can be added. . The preferred amount added is 0.01 to 1% by weight of the total photosensitive composition, more preferably 0.05 to 0.
.. It is 5% by weight.
(B)ジアゾ樹脂とバインダーとからなる感光層:ネガ
作用型感光性ジアゾ化合物としては米国特許第2.06
3.631号及び同第2.667、415号の各明細書
に開示されているジアゾニウム塩とアルドールやアセク
ールのような反応性カルボニル基を含有する有機縮合剤
との反応生成物であるジフェニルアミン−p−ジアゾニ
ウム塩とホルムアルデヒドとの縮合生成物(所謂感光性
ジアゾ樹脂)が好適に用いられる、この他の有用な縮合
ジアゾ化合物は特公昭49−48001号、同49−4
5322号、同49−45323号の各公報等に開示さ
れている。これらの型の感光性ジアゾ化合物は通常水溶
性無機塩の形で得られ、従って水溶液から塗布すること
ができる。又、これらの水溶性ジアゾ化合物を特公昭4
7−1167号公報に開示された方法により1個又はそ
れ以上のフェノール性水酸基、スルホン酸基又はその両
者を有する芳香族又は脂肪族化合物と反応させ、その反
応生成物である実質的に水不溶性の感光性ジアゾ樹脂を
使用することもできる。(B) Photosensitive layer consisting of diazo resin and binder: As a negative-working photosensitive diazo compound, US Pat. No. 2.06
Diphenylamine, which is a reaction product of the diazonium salt disclosed in No. 3.631, No. 2.667, and No. 415, and an organic condensing agent containing a reactive carbonyl group such as aldol or acecool. Other useful condensed diazo compounds in which a condensation product of p-diazonium salt and formaldehyde (so-called photosensitive diazo resin) is suitably used are disclosed in Japanese Patent Publication Nos. 49-48001 and 49-4.
It is disclosed in each publication such as No. 5322 and No. 49-45323. These types of photosensitive diazo compounds are usually obtained in the form of water-soluble inorganic salts and can therefore be coated from aqueous solution. In addition, these water-soluble diazo compounds were
A substantially water-insoluble reaction product obtained by reacting with an aromatic or aliphatic compound having one or more phenolic hydroxyl groups, sulfonic acid groups, or both by the method disclosed in Publication No. 7-1167. It is also possible to use photosensitive diazo resins.
また、特開昭56−i 21031号公報に記載されて
いるようにヘキサフルオロ燐酸塩または、テトラフルオ
ロ硼酸塩との反応生成物として使用することもできる。It can also be used as a reaction product with hexafluorophosphate or tetrafluoroborate as described in JP-A-56-I21031.
フェノール性水酸基を有する反応物の例としては、ヒド
ロキシベンゾフェノン、4,4−ビス(4′−ヒドロキ
シフェニル)ペンタン酸、レゾルシノール、又はジレゾ
ルシノールのようなジフェノール酸であって、これらは
更に置換基を有していてもよい。ヒドロキシベンゾフェ
ノンには2゜4−ジヒドロキシベンゾフェノン、2−ヒ
ドロキシ−4−メトキシベンゾフェノン、2.2’ −
ジヒドロキシ−4,4′−ジメトキシベンゾフェノン又
は2.2’、4.4’ −テトラヒドロキシベンゾフェ
ノンが含まれる。好ましいスルホン酸とシテは、例えば
ベンゼン、トルエン、キシレン、ナフタリン、フェノー
ル、ナフトールおよびベンゾフェノン等のスルホン酸の
ような芳香族スルホン酸、又はそれ等の可溶性塩類、例
えば、アンモニウム及びアルカリ金属塩が例示できる。Examples of reactants with phenolic hydroxyl groups include diphenolic acids such as hydroxybenzophenone, 4,4-bis(4'-hydroxyphenyl)pentanoic acid, resorcinol, or diresorcinol, which may further contain substituents. It may have. Hydroxybenzophenone includes 2゜4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2.2'-
Dihydroxy-4,4'-dimethoxybenzophenone or 2,2',4,4'-tetrahydroxybenzophenone is included. Preferred sulfonic acids and compounds include aromatic sulfonic acids such as sulfonic acids such as benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone, or soluble salts thereof, such as ammonium and alkali metal salts. .
スルホン酸基含有化合物は、一般に低級アルキル、ニト
ロ基、ハロ基、及び/又はもう一つのスルホン酸基で置
換されていてもよい。このような化合物の好ましいもの
としては、ベンゼンスルホン酸、トルエンスルホン酸、
ナフタリンスルホン酸、2゜5−ジメチルベンゼンスル
ホン酸、ベンゼンスルホン酸ナトリウム、ナフタリン−
2−スルホン酸、1−ナフトール−2(又は4)−スル
ホン酸、2゜4−ジニトロ−1−ナフトール−7−スル
ホン酸、2−ヒドロキシ−4−メトキシベンゾフェノン
−5−スルホン酸、m−(p’−アニリノフェニルアゾ
)ベンゼンスルホン酸ナトリウム、アリザリンスルホン
酸、o−トルイジン−1m−スルホン酸及びエタンスル
ホン酸等があげられる。アルコールのスルホン酸エステ
ルとその塩類も又有用である。このような化合物は通常
アニオン性界面活性剤として容易に人手できる。その例
としてはラウリルサルフェート、アルキルアリールサル
フェート、p〜ノニルフェニルサルフェート、2−フェ
ニルエチルサルフェート、イソオクチルフェノキシジェ
トキシエチルサルフェート等のアンモニウム塩又はアル
カリ金属塩があげられる。Sulfonic acid group-containing compounds may generally be substituted with lower alkyl, nitro groups, halo groups, and/or another sulfonic acid group. Preferred examples of such compounds include benzenesulfonic acid, toluenesulfonic acid,
Naphthalene sulfonic acid, 2゜5-dimethylbenzenesulfonic acid, sodium benzenesulfonate, naphthalene-
2-sulfonic acid, 1-naphthol-2 (or 4)-sulfonic acid, 2゜4-dinitro-1-naphthol-7-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, m-( Examples include sodium p'-anilinophenylazo)benzenesulfonate, alizarinsulfonic acid, o-toluidine-1m-sulfonic acid, and ethanesulfonic acid. Sulfonic esters of alcohols and their salts are also useful. Such compounds are usually readily available as anionic surfactants. Examples include ammonium salts or alkali metal salts such as lauryl sulfate, alkylaryl sulfate, p-nonylphenyl sulfate, 2-phenylethyl sulfate, isooctylphenoxyjethoxyethyl sulfate.
これ等の実質的に水不溶性の感光性ジアゾ樹脂は水溶性
の感光性ジアゾ樹脂と前記の芳香族又は脂肪族化合物の
水溶液を好ましくはほぼ等量となる量で混合することに
よって沈澱として単離される。These substantially water-insoluble photosensitive diazo resins can be isolated as a precipitate by mixing the water-soluble photosensitive diazo resin and an aqueous solution of the aromatic or aliphatic compound, preferably in approximately equal amounts. It can be done.
また、英国特許第1.312.925号明細書に記載さ
れているジアゾ樹脂も好ましい。Also preferred are the diazo resins described in GB 1.312.925.
また特願平2−53101号明細書に8己載されている
リンの酸素酸基を含有するジアゾ樹脂、また特願平1−
130493号明細書に記載されているカルボキシル基
含有アルデヒド又はそのアセタール化合物で縮合したジ
アゾ樹脂、また特願平2−40690号明細書に記載さ
れているフェノキシ酢酸等のカルボキシ基含有芳香族化
合物との共縮合ジアゾ樹脂も好ましい。In addition, diazo resins containing phosphorus oxygen acid groups, which are described in Japanese Patent Application No. 53101/1998, and Japanese Patent Application No.
Diazo resin condensed with a carboxyl group-containing aldehyde or its acetal compound described in No. 130493, and a carboxyl group-containing aromatic compound such as phenoxyacetic acid described in Japanese Patent Application No. 2-40690. Cocondensed diazo resins are also preferred.
もっとも好適なジアゾ樹脂はp−ジアゾジフェニルアミ
ンとホルムアルデヒドとの縮合物の2−メトキシ−4−
ヒドロオキシ−5−ベンゾイルベンゼンスルホン酸塩で
ある。The most preferred diazo resin is 2-methoxy-4-condensate of p-diazodiphenylamine and formaldehyde.
Hydroxy-5-benzoylbenzene sulfonate.
ジアゾ樹脂の含有量は、感光層中に5〜50重量%含ま
れているのが適当である。ジアゾ樹脂の量が少なくなれ
ば感光性は当然大になるが、経時安定性が低下する。最
適のジアゾ樹脂の量は約8〜20重量%である。The appropriate content of the diazo resin in the photosensitive layer is 5 to 50% by weight. As the amount of diazo resin decreases, photosensitivity naturally increases, but stability over time decreases. The optimum amount of diazo resin is about 8-20% by weight.
一方、バインダーとしては、種々の高分子化合物が使用
され得るが、本発明においては、ヒドロキシ、アミノ、
カルボン酸、アミド、スルホンアミド、活性メチレン、
チオアルコール、エポキシ等の基を含むものが望ましい
。このような好ましいバインダーには、英国特許第1.
350.521号明細書に記されているシェラツク、英
国特許第1.460゜978号および米国特許第4.1
23.276号の各明細書に記されているようなヒドロ
キシエチルアクリレート単位またはヒドロキシエチルメ
タクリレート単位を主なる繰り返し単位として含むポリ
マー、米国特許第3.751.257号明細書に記され
ているポリ了ミド樹脂、英国特許1.074.392号
明細書に記されているフェノール樹脂および例えばポリ
ビニルフォルマール樹脂、ポリビニルブチラールm脂の
ようなポリビニルアセタール樹脂、米国特許第3、66
0.097号明細書に記されている線状ポリウレタン樹
脂、ポリビニルアルコールのフタレート化樹脂、ビスフ
ェノールAとエピクロルヒドリンから縮合されたエポキ
シ樹脂、ポリアミノスチレンやポリアルキルアミノ (
メタ)アクリレートのようなアミノ基を含むポリマー、
酢酸セルロース、セルロースアルキルエーテル、セルロ
ースアセテートフタレート等のセルロース誘導体等が包
含される。On the other hand, various polymer compounds can be used as the binder, but in the present invention, hydroxy, amino,
Carboxylic acids, amides, sulfonamides, activated methylene,
Those containing groups such as thioalcohol and epoxy are desirable. Such preferred binders include those described in British Patent No. 1.
350.521, British Patent No. 1.460°978 and US Patent No. 4.1
Polymers containing hydroxyethyl acrylate units or hydroxyethyl methacrylate units as a main repeating unit as described in U.S. Pat. No. 3,751,257; Ryomid resins, phenolic resins as described in British Patent No. 1.074.392 and polyvinyl acetal resins such as polyvinyl formal resins, polyvinyl butyral resins, U.S. Pat. No. 3,66
Linear polyurethane resins, polyvinyl alcohol phthalate resins, epoxy resins condensed from bisphenol A and epichlorohydrin, polyaminostyrene and polyalkylamino (
polymers containing amino groups, such as meth)acrylates,
Included are cellulose derivatives such as cellulose acetate, cellulose alkyl ether, and cellulose acetate phthalate.
ジアゾ樹脂とバインダーからなる組成物には、更に、英
国特許第1.041.463号明細書に記されているよ
うなpH指示薬、米国特許第3.236.646号明細
書に記載されている燐酸、染料などの添加剤を加えるこ
とができる。The composition of diazo resin and binder may further include a pH indicator as described in British Patent No. 1.041.463, a pH indicator as described in U.S. Pat. No. 3.236.646. Additives such as phosphoric acid and dyes can be added.
(C)アジド化合物とバインダー(高分子化合物)から
なる感光層
例えば英国特許第1.235.281号、同第1.49
5.861号の各明細書および特開昭51−32331
号、同51−36128号公報などに記されている了シ
ト化合物と水溶性またはアルカリ可溶性高分子化合物か
らなる組成物の他、特開昭50−5102号、同50−
84302号、同50−84303号、同53−129
84号の各公報などに記されているアジド基を含むポリ
マーとバインダーとしての高分子化合物からなる組成物
が含まれる。(C) Photosensitive layer consisting of an azide compound and a binder (polymer compound), for example, British Patent No. 1.235.281, British Patent No. 1.49
Specifications of No. 5.861 and JP-A-51-32331
In addition to the compositions comprising a phosphor compound and a water-soluble or alkali-soluble polymer compound described in JP-A No. 51-36128, JP-A No. 50-5102, JP-A No. 50-50-
No. 84302, No. 50-84303, No. 53-129
Included are compositions consisting of a polymer containing an azide group and a polymer compound as a binder, as described in each publication of No. 84.
(D)その他の感光性樹脂層
例えば、特開昭52−96696号公報に開示されてい
るポリエステル化合物、英国特許第1,112、277
号、同第1.313.390号、同第1.341.00
4号、同第1.377、747号等の各明細書に記載の
ポリビニルシンナメート系樹脂、米国特許第4.072
.528号および同第4.072.527号の各明細書
などに記されている光重合型フォトポリマー組成物が含
まれる。(D) Other photosensitive resin layers For example, polyester compounds disclosed in JP-A-52-96696, British Patent No. 1,112, 277
No. 1.313.390, No. 1.341.00
Polyvinyl cinnamate resins described in specifications such as No. 4, No. 1.377, and No. 747, U.S. Patent No. 4.072
.. The photopolymerizable photopolymer compositions described in the specifications of No. 528 and No. 4.072.527 are included.
(E)電子写真感光層
電子写真感光層は、主として、光導電性化合物とバイン
ダーからなるが、感度向上、所望の感光波長域を得る等
の目的のために、必要に応じて、公知の顔料、染料、化
学増感剤、その他の添加剤等を使用することが出来る。(E) Electrophotographic photosensitive layer The electrophotographic photosensitive layer mainly consists of a photoconductive compound and a binder, but if necessary, known pigments may be added for the purpose of improving sensitivity and obtaining a desired photosensitive wavelength range. , dyes, chemical sensitizers, other additives, etc. can be used.
感光層は単層あるいは、電荷発生と電荷輸送の機能を分
離した複数の層から構成するこ七が出来る。平版印刷版
は、公知の電子写真プロセスにより、感光層上にトナー
画像を形成し、これをレジスト層として、非画像部をデ
コーディングすることにより得ることが出来る。例えば
、特公昭37−17162号、同38−6961号、特
開昭56−107246号、同60−254142号、
特公昭59−36259号、同59−25217号、特
開昭56−146145号、同62−194257号、
同57−147656号、同58−100862号、同
57−161863号をはじ約多数の刊行物に記載され
ており、これらはいずれも好適に使用することが出来る
。The photosensitive layer can be composed of a single layer or a plurality of layers in which charge generation and charge transport functions are separated. A lithographic printing plate can be obtained by forming a toner image on a photosensitive layer by a known electrophotographic process, and using this as a resist layer, decoding non-image areas. For example, Japanese Patent Publication No. 37-17162, Japanese Patent Publication No. 38-6961, Japanese Patent Publication No. 56-107246, Japanese Patent Publication No. 60-254142,
JP 59-36259, JP 59-25217, JP 56-146145, JP 62-194257,
It is described in numerous publications including No. 57-147656, No. 58-100862, and No. 57-161863, and any of these can be suitably used.
感光層の膜厚は、0.1−30μm1より好ましくは、
0.5−10μmで使用することができる。The thickness of the photosensitive layer is preferably 0.1-30 μm1,
It can be used at 0.5-10 μm.
支持体上に設けられる感光層の量(固形分)は約0.1
〜約7 g / m’、好ましくは0.5〜4 g/m
’の範囲である。平版印刷版は画像露光されたのち、常
法により現像を含む処理によって樹脂画像が形成される
。The amount (solid content) of the photosensitive layer provided on the support is approximately 0.1
~7 g/m', preferably 0.5-4 g/m'
' range. After the lithographic printing plate is imagewise exposed, a resin image is formed by a conventional process including development.
例えば、感光層(A)を有するポジ型平版印刷版の場合
には画像露光後、米国特許第4.259.434号明細
書に記載されているようなアルカリ水溶液で現像するこ
とにより露光部分の感光層が除去されて、平版印刷版が
得られる。For example, in the case of a positive planographic printing plate having a photosensitive layer (A), after image exposure, the exposed areas are developed by developing with an alkaline aqueous solution as described in U.S. Pat. No. 4,259,434. The photosensitive layer is removed to obtain a lithographic printing plate.
またジアゾ樹脂とバインダーからなる感光層(B)を有
するネガ型平版印刷版の場合には画像露光後、例えば米
国特許第4.186.006号明細書に記載されている
ような現像液で現像することにより、未露光部分の感光
層が除去されて平版印刷版が得られる。In addition, in the case of a negative planographic printing plate having a photosensitive layer (B) consisting of a diazo resin and a binder, after image exposure, it is developed with a developer such as that described in U.S. Pat. No. 4,186,006. By doing so, the unexposed portions of the photosensitive layer are removed and a lithographic printing plate is obtained.
(発明の効果)
本発明方法は、従来法に右ける陽極酸化皮膜量の増加、
熱水又は水蒸気による酸化皮膜の封孔処理に伴なう欠点
がない。また本発明により得られる支持体を用いた平版
印刷版は、従来の支持体を用いたものに比べて、非画像
部の強度、耐食性にすぐれている。(Effects of the invention) The method of the present invention increases the amount of anodic oxide film compared to the conventional method;
There are no drawbacks associated with sealing the oxide film using hot water or steam. Furthermore, a lithographic printing plate using a support obtained according to the present invention has superior strength and corrosion resistance in non-image areas compared to those using a conventional support.
(実施例)
以下、本発明を実施例により、具体的に説明する。なお
実施例中の(%)は、特に指定のない限り (重量%)
とする。(Example) Hereinafter, the present invention will be specifically explained with reference to Examples. In addition, (%) in the examples is (weight%) unless otherwise specified.
shall be.
(実施例1)
JISA 1050 アルミニウムシートをパミス
水懸濁液を研磨剤として回転ナイロンブラシで表面を砂
目立てした。このときの表面粗さ(中心線平均粗さ)は
0.5μであった。水洗後、10%苛性ソーダ水溶液を
70℃に温めた溶液中に浸漬して、アルミニウムの溶解
量が6 g / m”になるようにエツチングした。水
洗後、30%硝酸水溶液に1分間浸漬して中和し、十分
水洗した。その後に、0.7%硝酸水溶液中で、陽極特
電圧13ボルト、陰極特電圧6ボルトの矩形波交番波形
電圧を用いて20秒間電電解面化を行ない、20%硫酸
の50℃溶液中に浸漬して表面を洗浄した後、水洗した
。(Example 1) The surface of a JISA 1050 aluminum sheet was grained using a rotating nylon brush using a pumice water suspension as an abrasive. The surface roughness (center line average roughness) at this time was 0.5μ. After washing with water, it was etched by immersing it in a 10% aqueous solution of caustic soda heated to 70°C so that the amount of aluminum dissolved was 6 g/m. After washing with water, it was immersed in a 30% aqueous nitric acid solution for 1 minute. It was neutralized and thoroughly washed with water.Then, electrolytic surfaceization was carried out for 20 seconds in a 0.7% nitric acid aqueous solution using a square wave alternating waveform voltage with an anode special voltage of 13 volts and a cathode special voltage of 6 volts. After cleaning the surface by immersing it in a 50°C solution of % sulfuric acid, it was washed with water.
さらに20%硫酸水溶液中で直流を用いて多孔性陽極酸
化皮膜形成処理を行なった。電流密度5A/dm2で電
解を行ない、電解時間を調節して陽極酸化皮膜重量4.
0g/m’の基板を作った。この基板を100℃1気圧
において飽和した蒸気チャンバーの中で10秒間処理し
て封孔率60%の支持体(基板■)を作成した。Furthermore, a porous anodic oxide film formation treatment was performed using direct current in a 20% sulfuric acid aqueous solution. Electrolysis was carried out at a current density of 5 A/dm2, and the electrolysis time was adjusted to adjust the weight of the anodic oxide film to 4.
A substrate of 0 g/m' was made. This substrate was treated for 10 seconds in a saturated steam chamber at 100° C. and 1 atm to produce a support (substrate ①) with a sealing rate of 60%.
基板■の表面にβ−アラニン1g1水5g及びメタノー
ル94gからなる溶液(A)を乾燥重量が20mg/m
’となるように塗布し、80℃30秒間乾燥した。この
ようにして作成した基板に下記組成物を乾燥後の塗布重
量が2.5g/m’となるように塗布、乾燥して感光層
を設けた。A solution (A) consisting of 1 g of β-alanine, 5 g of water, and 94 g of methanol was applied to the surface of the substrate (dry weight 20 mg/m2).
' and dried at 80°C for 30 seconds. The following composition was coated onto the thus prepared substrate so that the coating weight after drying was 2.5 g/m' and dried to provide a photosensitive layer.
感光性組成物
ナフトキノン−1,2−ジアジド−5−スルホニルクロ
ライドとピロガロール−アセトン樹脂とのエステル化合
物 0.75 g(米国特許第3.635
.709号
明細書実施例1記載のもの)
クレゾールノボラック樹脂 2.00 gオイル
ブルー#603
(オリエント化学類) 0.04 gエ
チレンジクロライド 16g2−メトキシ
エチルアセテート 12gこのようにして作られた
感光性平版印刷版を、真空焼枠中で、透明ポジティブフ
ィルムを通して1mの距離から3μwのメタルハライド
ランプにより、50秒間露光を行なったのち、SlO□
/NaJのモル比が1.74の珪酸ナトリウムの5.2
6%水溶液(pH= 12.7 )で現像した。Photosensitive composition Ester compound of naphthoquinone-1,2-diazido-5-sulfonyl chloride and pyrogallol-acetone resin 0.75 g (U.S. Pat. No. 3.635
.. 709 Specification, Example 1) Cresol novolac resin 2.00 g Oil Blue #603 (Orient Chemicals) 0.04 g Ethylene dichloride 16 g 2-methoxyethyl acetate 12 g Photosensitive lithographic printing thus produced The plate was exposed in a vacuum printing frame through a transparent positive film for 50 seconds using a 3μW metal halide lamp from a distance of 1m, and then exposed to SlO□.
5.2 of sodium silicate with a molar ratio of /NaJ of 1.74.
It was developed with a 6% aqueous solution (pH=12.7).
このように現像した後、十分水洗し、ガム引きしたのち
、常法の手順で印刷−した。このときの■非画像部の強
度、■非画像部の耐食性、■非画像部上の染料の残り易
さ、■ハイライト部の再現性、■現像後の親水性及び■
耐刷性を評価した。結果を表1に示した。After developing in this manner, the film was thoroughly washed with water and gummed, and then printed using a conventional procedure. At this time, ■ strength of non-image area, ■ corrosion resistance of non-image area, ■ ease of dye remaining on non-image area, ■ reproducibility of highlight area, ■ hydrophilicity after development, and ■
The printing durability was evaluated. The results are shown in Table 1.
(実施例2)
陽極酸化皮膜重量を2.0g/m’とし、100℃1気
圧において飽和した蒸気チャンバーの中で6秒間処理し
て封孔率40%としたことを除いて実施例Iと同一の操
作を繰り返した。印刷結果は表1に示した。(Example 2) Same as Example I except that the weight of the anodic oxide film was 2.0 g/m' and the treatment was performed for 6 seconds in a saturated steam chamber at 100°C and 1 atm to give a sealing rate of 40%. The same operation was repeated. The printing results are shown in Table 1.
(実施例3)
陽極酸化皮膜重量を5.0g/m’とし、100℃1気
圧において、飽和した蒸気チャンバーの中で15秒間処
理して封孔率95%にしたことを除いて実施例1と同一
の操作を繰り返した。印刷結果は表1に示した。(Example 3) Example 1 except that the anodic oxide film weight was 5.0 g/m' and the treatment was performed for 15 seconds in a saturated steam chamber at 100°C and 1 atm to achieve a sealing rate of 95%. The same operation was repeated. The printing results are shown in Table 1.
(実施例4)
β−アラニン下塗り処理の代わりに、ポリビニルホスホ
ン酸1%水溶液(60℃)中に、1分間浸漬処理したこ
とを除いて実施例1と同一の操作を繰り返した。印刷結
果は表1に示した。(Example 4) The same operation as in Example 1 was repeated except that instead of the β-alanine undercoat treatment, a 1-minute immersion treatment was performed in a 1% polyvinylphosphonic acid aqueous solution (60° C.). The printing results are shown in Table 1.
(実施例5)
陽極酸化皮膜重量を6.0g/m″とし、100℃、1
気圧において飽和した蒸気チャンバーの中で10秒間処
理して封孔率60%にしたことを除いて実施例1と同一
の操作を繰り返した。印刷結果は表1に示した。(Example 5) The weight of the anodic oxide film was 6.0 g/m'', 100°C, 1
The same operation as in Example 1 was repeated, except that the treatment was carried out for 10 seconds in a steam chamber saturated at atmospheric pressure to achieve a sealing rate of 60%. The printing results are shown in Table 1.
(実施例6)
β−アラニン下塗り処理の代わりに、フェニルホスホン
酸1g1水5gおよびメタノール94gの溶液(B)を
乾燥後の重量で20mg/m’となるように塗布したこ
とを除いて実施例1と同一の操作を繰り返した。印刷結
果は表1に示した。(Example 6) Example except that instead of the β-alanine undercoating treatment, a solution (B) of 1 g of phenylphosphonic acid, 5 g of water, and 94 g of methanol was applied so that the weight after drying was 20 mg/m' The same operation as 1 was repeated. The printing results are shown in Table 1.
(比較例1)
β−アラニン下塗り処理を行わなかったほかは、実施例
1と同一の操作を繰り返した。印刷結果は表1に示した
。(Comparative Example 1) The same operation as in Example 1 was repeated except that the β-alanine undercoating treatment was not performed. The printing results are shown in Table 1.
(比較例2)
陽極酸化皮膜重量を1.0g/m”とし、100℃、1
気圧において飽和した蒸気チャンバーの中で10秒間処
理して封孔率60%にしたことを除いて実施例1と同一
の操作を繰り返した。印刷結果は表1に示した。(Comparative Example 2) The weight of the anodic oxide film was 1.0 g/m'', 100°C, 1
The same operation as in Example 1 was repeated, except that the treatment was carried out for 10 seconds in a steam chamber saturated at atmospheric pressure to achieve a sealing rate of 60%. The printing results are shown in Table 1.
(比較例3)
封孔処理を行なわなかったほかは実施例1と同一の操作
を繰り返した。印刷結果は表1に示した。(Comparative Example 3) The same operation as in Example 1 was repeated except that the sealing treatment was not performed. The printing results are shown in Table 1.
(比較例4)
100℃1気圧において飽和した蒸気子ャンバーの中で
2分間処理して封孔率100%にしたことを除いて実施
例1と同一の操作を繰り返した。(Comparative Example 4) The same operation as in Example 1 was repeated except that the sample was treated for 2 minutes in a saturated steam chamber at 100° C. and 1 atm to achieve a sealing rate of 100%.
印刷結果は表1に示した。The printing results are shown in Table 1.
(実施例7)
実施例1の基板工を3号ケイ酸ソーダ2,5%水溶液に
10℃で30秒間浸漬して水洗、乾燥した。このように
作成した基板に下記組成物を乾燥後の塗布重量が2.0
g/m’となるように塗布、乾燥して感光層を設けた。(Example 7) The substrate material of Example 1 was immersed in a No. 3 sodium silicate 2.5% aqueous solution at 10° C. for 30 seconds, washed with water, and dried. The following composition was applied to the substrate thus prepared so that the coating weight after drying was 2.0.
g/m' and dried to provide a photosensitive layer.
感光性組成物
N−(4−ヒドロキシフェニル)メタクリルアミド/2
−ヒドロキシエチルメタクリレート/アクリロニトリル
/メチルメタクリレート/メタクリル酸(=15:10
:30:38ニアモル比)共重合体(平均分子量600
00)・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・ 5.0g4−ジアゾ
ジフェニルアミンとホルムアルデヒドの縮合物の六弗化
燐酸塩・・団・・・・・・・ 0.5 g亜燐酸・・・
・・・・・・・・・・・・・・・・旧・・・・・・・・
・・・ 0.05 gビクトリアピュアブルーBOH
(作土ケ谷化学(株)社製)・・・・・・・・・・・・
・・・・・・・旧・・・・・ 0.1 g2−メトキ
シエタノール・・・・・−−−−・・−100gこのよ
うにして作られた感光性平版印刷版を、真空焼枠中で、
透明ネガティブフィルムを通して1mの距離から3KW
のメタルハライドランプを用いて50秒間露光を行なっ
たのち、下記組成の現像液で現像し、アラビアガム水溶
液でガム引きして平版印刷版とした。この印刷版を用い
て常法の手順で印刷した。Photosensitive composition N-(4-hydroxyphenyl)methacrylamide/2
-Hydroxyethyl methacrylate/acrylonitrile/methyl methacrylate/methacrylic acid (=15:10
:30:38 near molar ratio) copolymer (average molecular weight 600
00)・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・ 5.0g Hexafluorophosphate, a condensate of 4-diazodiphenylamine and formaldehyde Group... 0.5 g Phosphorous acid...
・・・・・・・・・・・・・・・ Old・・・・・・・・・
... 0.05 g Victoria Pure Blue BOH
(Manufactured by Sakudogaya Chemical Co., Ltd.)・・・・・・・・・・・・
......Old...0.1 g2-Methoxyethanol...100 gThe photosensitive lithographic printing plate made in this way was placed in a vacuum printing frame Inside,
3KW from a distance of 1m through a transparent negative film
After exposure for 50 seconds using a metal halide lamp, the plate was developed with a developer having the composition shown below, and gummed with an aqueous gum arabic solution to prepare a lithographic printing plate. Printing was carried out using this printing plate according to a conventional procedure.
現像液
亜硫酸ナトリウム・・・・・・−・・・・・・・・・・
・・・・・・・・・・ 5gベンジルアルコール・・・
・・・・・・・・・・・・・・・・・・ 30g炭酸ナ
トリウム・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・ 5gイソプロピルナフタレンスル
ホン酸ナトリウム・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
12g純 水・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・ 1000gこのときの■
非画像部の強度、■感光性組成物、高分子バインダーが
時間経過と共に支持体表面に非可逆的に吸着することに
よる汚れ、■シャドー部の網点の再現性、■非画像部の
親水性及び■耐刷性を調べた結果を表2に示した。Developer solution Sodium sulfite・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・ 5g benzyl alcohol...
・・・・・・・・・・・・・・・・・・ 30g Sodium carbonate・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・ 5g Sodium isopropylnaphthalene sulfonate・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
12g pure water・・・・・・・・・・・・・・・
・・・・・・・・・・・・ 1000g ■
Strength of non-image area, ■ Stains due to irreversible adsorption of the photosensitive composition and polymer binder to the support surface over time, ■ Reproducibility of halftone dots in shadow areas, ■ Hydrophilicity of non-image area and (2) The results of examining printing durability are shown in Table 2.
(実施例8)
陽極酸化皮膜重量を2.0g/m’とし、100℃1気
圧において飽和した蒸気チャンバーの中で6秒間処理し
て封孔率40%にしたことを除いて実施例7と同一の操
作を繰り返した。印刷結果は表2に示した。(Example 8) Same as Example 7 except that the weight of the anodic oxide film was 2.0 g/m' and the treatment was performed for 6 seconds in a saturated steam chamber at 100°C and 1 atm to achieve a sealing rate of 40%. The same operation was repeated. The printing results are shown in Table 2.
(実施例9)
陽極酸化皮膜重量を5.0g/m’とし、100℃1気
圧において飽和した蒸気チャンバーの中で15秒間処理
して封孔率95%にしたことを除いて実施例7と同一の
操作を繰り返した。印刷結果は表2に示した。(Example 9) Same as Example 7 except that the anodic oxide film weight was 5.0 g/m' and the treatment was performed for 15 seconds in a saturated steam chamber at 100°C and 1 atm to achieve a sealing rate of 95%. The same operation was repeated. The printing results are shown in Table 2.
(実施例10)
陽極酸化皮膜重量を6.0g/m’とし、100℃1気
圧において飽和した蒸気チャンバーの中で、10秒間処
理して封孔率60%にしたことを除いて実施例7と同一
の操作を繰り返した。印刷結果は表2に示した。(Example 10) Example 7 except that the anodic oxide film weight was 6.0 g/m' and the sealing rate was 60% by processing for 10 seconds in a saturated steam chamber at 100° C. and 1 atm. The same operation was repeated. The printing results are shown in Table 2.
(上比較例 5 )
陽極酸化皮膜重量を1.0g/m″とし、100℃1気
圧において飽和した蒸気チャンバーの中で10秒間処理
して封孔率60%にしたことを除いて実施例7と同一の
操作を繰り返した。印刷結果は表2に示した。(Above Comparative Example 5) Example 7 except that the anodic oxide film weight was 1.0 g/m'' and the sealing rate was 60% by processing for 10 seconds in a saturated steam chamber at 100°C and 1 atm. The same operations as above were repeated.The printing results are shown in Table 2.
・ (比較例6)
封孔処理を行わなかったほかは、実施例7と同一の操作
を繰り返した。印刷結果は表2に示した。- (Comparative Example 6) The same operations as in Example 7 were repeated except that the sealing treatment was not performed. The printing results are shown in Table 2.
(比較例7)
100℃1気圧において飽和した蒸気チャンバーの中で
2分間処理して封孔率100%にしたことを除いて実施
例7と同一の操作を繰り返した。(Comparative Example 7) The same operation as in Example 7 was repeated except that the sample was treated for 2 minutes in a saturated steam chamber at 100° C. and 1 atm to achieve a sealing rate of 100%.
印刷結果は表2に示した。The printing results are shown in Table 2.
表1及び表2に示した印刷性能の評価方法は次のとおり
である。The printing performance evaluation method shown in Tables 1 and 2 is as follows.
「非画像部の強度」:
現像、ガム引きした平版印刷版の非画像部について、新
東科学(株)製引掻強度試験機を使って、100〜40
0gの荷重をかけたダイヤモンド針で傷の付く荷重を測
定し、次の基準で評価した。"Strength of non-image area": The non-image area of a developed and gummed lithographic printing plate was measured using a scratch strength tester manufactured by Shinto Kagaku Co., Ltd., to a value of 100 to 40.
The scratching load was measured using a diamond needle with a load of 0 g applied, and evaluation was made based on the following criteria.
A:200gでも傷が付かない。A: No damage even with 200g.
B:100gでは傷が付かないが、200gで傷が付く
。B: No scratches occur at 100g, but scratches occur at 200g.
C:100gで傷が付く。C: Scratches occur at 100g.
「非画像部の耐食性」:
市販のプレートクリーナに平版印刷版を浸漬して、印刷
機のゴムブランケットで非画像部を500回擦ったとき
の磨耗の程度を目視により次の基準で判定した。"Corrosion resistance of non-image area": A lithographic printing plate was immersed in a commercially available plate cleaner, and the non-image area was rubbed 500 times with a rubber blanket of a printing machine, and the degree of wear was visually determined according to the following criteria.
A:全く磨耗なし。A: No wear at all.
B:多少磨耗しはじめている。B: It has started to wear out to some extent.
C:酸化皮膜が消失。C: Oxide film disappeared.
「非画像部上の染料の残り易さ」 :
現像後の平版印刷版の非画像部の600nmの光での反
射光学濃度と感光層塗布前の支持体表面の600nmの
光での反射光学濃度の差(△D)を測定し、下記の基準
で評価した。"Easiness of dye remaining on non-image areas": Reflection optical density at 600 nm light of the non-image area of the lithographic printing plate after development and reflection optical density at 600 nm light of the support surface before coating the photosensitive layer. The difference (ΔD) was measured and evaluated based on the following criteria.
A:△D≦0.005
B:0.005<△D≦0.01
C:0.01<△D≦0.02
D:0.02<△D≦0.03
E:0.03<△D≦0.04
F : 0.04 <△D
「ハイライト部の再現性」 :
フォグラ(FOGRA)のに値チャートを同一露光条件
で焼き付けて現像、ガム引きした平版印刷版で印刷し、
印刷物上でとばずに再現できている最小巾の細線のに値
により、下記基準で評価した。A: △D≦0.005 B: 0.005<△D≦0.01 C: 0.01<△D≦0.02 D: 0.02<△D≦0.03 E: 0.03< △D≦0.04 F: 0.04 <△D ``Reproducibility of highlight areas'': A FOGRA value chart was printed under the same exposure conditions, developed, and printed with a gummed lithographic printing plate.
Evaluation was made according to the following criteria based on the value of the minimum width of a thin line that could be reproduced without skipping on printed matter.
A:に値≦10μ
B:12μ≦に値≦15μ
C:20μ≦に値
「現像後の親水性」:
現像後の非画像部の接触角(油中水滴)を測定し、下記
基準で評価した。A: Value ≦10μ B: Value 12μ≦≦15μ C: Value 20μ≦ “Hydrophilicity after development”: Measure the contact angle (water droplets in oil) of the non-image area after development and evaluate according to the following criteria. did.
A:10°以下
B:20°〜40゜
C:60°以上
「非画像部の汚れ」:
感光性平版印刷版を45℃、75%相対湿度の条件下で
3日間保存した後に製版処理して得た平版印刷版を用い
て印刷したときの印刷物の非画像部の汚れの程度により
、下記の基準で評価した。A: 10 degrees or less B: 20 degrees to 40 degrees C: 60 degrees or more "stains in non-image areas": The photosensitive lithographic printing plate was stored at 45 degrees Celsius and 75% relative humidity for 3 days before plate making. The degree of staining of the non-image area of the printed matter when printed using the lithographic printing plate obtained was evaluated according to the following criteria.
A:全く汚れなし。A: No stains at all.
B:少し汚れあり。B: There is some dirt.
C:非常に汚れている。C: Very dirty.
「シャド一部の網点の再現性」 :
FOGRAのに値チャートを同一露光条件で焼き付けて
現像、ガム引きした平版印刷版で印刷し、印刷物上でつ
ぶれずに再現できている最小巾の細線のに値により、下
記の基準で評価した。"Reproducibility of halftone dots in some shadows": The smallest width fine line that can be reproduced without being crushed on printed matter by printing FOGRA's value chart on a lithographic printing plate that has been printed under the same exposure conditions, developed, and gummed. The evaluation was made according to the following criteria.
A:に値≦lOμ
B:12≦に値≦15μ
C:20μ≦に値
表1の「耐刷性」 :
実施例1の平版印刷版の耐刷力を100%としたときの
相対評価
表2の「耐刷性」:
実施例7の平版印刷版の耐刷力を100%としたときの
相対評価
手続補正書
3,1.14
平成 年 月 日
1、事件の表示 平成2年特許願第306415号
2、発明の名称 平版印刷版用支持体の製造法3
、補正をする者
事件との関係 出願人
名 称 (520> 富士写真フィルム株式会社4、
代理人
5、補正命令の日付 自 発
6、補正の対象 明細書の発明の詳細な説明の欄
7、補正の内容
(1)明細書第31頁第11行の“JrSAIQ50”
をrJIs A1050jと訂正する。A: Value ≦lOμ B: Value 12≦≦15μ C: Value 20μ≦ “Press durability” in Table 1: Relative evaluation table when the printing durability of the lithographic printing plate of Example 1 is taken as 100% 2 "Press life": Relative evaluation procedure amendment 3, 1.14 when the printing life of the lithographic printing plate of Example 7 is taken as 100% 1998, month, day 1, case description 1990 patent application No. 306415 2, Title of the invention Method for producing support for lithographic printing plate 3
, Relationship to the case of the person making the amendment Applicant name (520> Fuji Photo Film Co., Ltd. 4,
Agent 5, Date of amendment order Initiator 6, Subject of amendment Column 7 of detailed explanation of the invention in the specification, Contents of amendment (1) “JrSAIQ50” on page 31, line 11 of the specification
is corrected to rJIs A1050j.
(2)同書第32頁第11行の“β−アラニン1g”を
〜ββ−アラニン1gg−と訂正する。(2) "β-alanine 1g" on page 32, line 11 of the same book is corrected to ~ββ-alanine 1gg-.
(3)同書第35頁第5〜6行の“フェニルホスホン1
121g″ヲ・−フェニルホスホン酸0.1g−と訂正
する。(3) “Phenylphosphophone 1” in the same book, page 35, lines 5-6.
121g'' - Corrected to 0.1g of phenylphosphonic acid.
Claims (2)
の量が2g/m^2以上となるように陽極酸化したのち
、熱水又は水蒸気により封孔処理して酸化皮膜の表面積
を40〜95%減少させ、その後親水化処理及び/又は
親水性下塗り処理を施すことを特徴とする平版印刷版用
支持体の製造法。(1) After roughening the surface of the aluminum plate and anodizing it so that the amount of the anodic oxide film is 2 g/m^2 or more, the pores are sealed with hot water or steam to reduce the surface area of the oxide film to 40~ A method for producing a support for a lithographic printing plate, which comprises reducing the support by 95% and then subjecting it to a hydrophilic treatment and/or a hydrophilic undercoating treatment.
(1)に記載の平版印刷版用支持体の製造法。(2) The method for producing a support for a lithographic printing plate according to claim (1), wherein the amount of the oxide film is 2 to 5 g/m^2.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2306415A JP2640564B2 (en) | 1990-11-13 | 1990-11-13 | Manufacturing method of lithographic printing plate support |
EP19910119284 EP0485958B1 (en) | 1990-11-13 | 1991-11-12 | Process for preparing a substrate for a lithographic plate |
DE1991610838 DE69110838T2 (en) | 1990-11-13 | 1991-11-12 | Process for producing a substrate for a lithographic printing plate. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2306415A JP2640564B2 (en) | 1990-11-13 | 1990-11-13 | Manufacturing method of lithographic printing plate support |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04176690A true JPH04176690A (en) | 1992-06-24 |
JP2640564B2 JP2640564B2 (en) | 1997-08-13 |
Family
ID=17956748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2306415A Expired - Fee Related JP2640564B2 (en) | 1990-11-13 | 1990-11-13 | Manufacturing method of lithographic printing plate support |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0485958B1 (en) |
JP (1) | JP2640564B2 (en) |
DE (1) | DE69110838T2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002034544A1 (en) | 2000-10-26 | 2002-05-02 | Fuji Photo Film Co., Ltd. | Supporting body for lithography block and original lithography block |
EP1619023A2 (en) | 2004-07-20 | 2006-01-25 | Fuji Photo Film Co., Ltd. | Image forming material |
EP1637324A2 (en) | 2004-08-26 | 2006-03-22 | Fuji Photo Film Co., Ltd. | Color image-forming material and lithographic printing plate precursor |
EP1669195A1 (en) | 2004-12-13 | 2006-06-14 | Fuji Photo Film Co., Ltd. | Lithographic printing method |
EP1972438A1 (en) | 2007-03-20 | 2008-09-24 | FUJIFILM Corporation | Lithographic printing plate precursor and method of preparing lithographic printing plate |
EP2447085A2 (en) | 2010-07-23 | 2012-05-02 | Fujifilm Corporation | Lithographic printing plate support and presensitized plate |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0799717B1 (en) * | 1996-04-03 | 1999-11-17 | Agfa-Gevaert N.V. | A method for preparing a hydrophilic surface of a lithographic aluminum base for lithographic printing plates |
GB9721650D0 (en) * | 1997-10-13 | 1997-12-10 | Alcan Int Ltd | Coated aluminium workpiece |
JP2005234118A (en) * | 2004-02-18 | 2005-09-02 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
CN103660665A (en) * | 2013-12-05 | 2014-03-26 | 泰州市东方印刷版材有限公司 | Hole sealing technology for printing plate making |
CN109594113B (en) * | 2017-09-30 | 2021-02-09 | 北京小米移动软件有限公司 | Equipment shell, machining method thereof and electronic equipment |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59114100A (en) * | 1982-12-21 | 1984-06-30 | Fuji Photo Film Co Ltd | Manufacture of photosensitive planographic printing plate |
JPH01150583A (en) * | 1987-12-07 | 1989-06-13 | Fuji Photo Film Co Ltd | Support for planographic plate |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1546786C3 (en) * | 1965-06-03 | 1973-12-13 | Kalle Ag, 6202 Wiesbaden-Biebrich | Method and material for the manufacture of planographic printing plates |
US4116695A (en) * | 1974-09-12 | 1978-09-26 | Fuji Photo Film Co., Ltd. | Method of producing a support for a printing plate |
US4284674A (en) * | 1979-11-08 | 1981-08-18 | American Can Company | Thermal insulation |
JPS5751289A (en) * | 1980-09-10 | 1982-03-26 | Fuji Photo Film Co Ltd | Electrolytic treating device for belt-like metallic plate |
EP0149490B2 (en) * | 1984-01-17 | 1993-12-15 | Fuji Photo Film Co., Ltd. | Presensitized plate having an anodized aluminum base with an improved hydrophilic layer |
DE3717757A1 (en) * | 1986-05-26 | 1987-12-03 | Fuji Photo Film Co Ltd | Process for the production of a support for use in the production of a lithographic printing plate |
-
1990
- 1990-11-13 JP JP2306415A patent/JP2640564B2/en not_active Expired - Fee Related
-
1991
- 1991-11-12 EP EP19910119284 patent/EP0485958B1/en not_active Expired - Lifetime
- 1991-11-12 DE DE1991610838 patent/DE69110838T2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59114100A (en) * | 1982-12-21 | 1984-06-30 | Fuji Photo Film Co Ltd | Manufacture of photosensitive planographic printing plate |
JPH01150583A (en) * | 1987-12-07 | 1989-06-13 | Fuji Photo Film Co Ltd | Support for planographic plate |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002034544A1 (en) | 2000-10-26 | 2002-05-02 | Fuji Photo Film Co., Ltd. | Supporting body for lithography block and original lithography block |
EP1619023A2 (en) | 2004-07-20 | 2006-01-25 | Fuji Photo Film Co., Ltd. | Image forming material |
EP1637324A2 (en) | 2004-08-26 | 2006-03-22 | Fuji Photo Film Co., Ltd. | Color image-forming material and lithographic printing plate precursor |
EP1669195A1 (en) | 2004-12-13 | 2006-06-14 | Fuji Photo Film Co., Ltd. | Lithographic printing method |
EP1972438A1 (en) | 2007-03-20 | 2008-09-24 | FUJIFILM Corporation | Lithographic printing plate precursor and method of preparing lithographic printing plate |
EP2447085A2 (en) | 2010-07-23 | 2012-05-02 | Fujifilm Corporation | Lithographic printing plate support and presensitized plate |
US8632949B2 (en) | 2010-07-23 | 2014-01-21 | Fujifilm Corporation | Lithographic printing plate support and presensitized plate |
Also Published As
Publication number | Publication date |
---|---|
DE69110838D1 (en) | 1995-08-03 |
EP0485958A1 (en) | 1992-05-20 |
EP0485958B1 (en) | 1995-06-28 |
DE69110838T2 (en) | 1995-11-16 |
JP2640564B2 (en) | 1997-08-13 |
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