JPH04164202A - Positioning plate and scanning type tunnel microscope positioning and adjusting device - Google Patents

Abstract

PURPOSE:To curtail positioning adjusting time in replacing a probe by scanning the irregular pattern contour of a positioning plate in the X(Y) direction and determining the drift quantity of the plate in the X(Y) axis direction. CONSTITUTION:A specimen table 30 is arranged directly below an optical microscope 14, and the center of the visual field and the center O of the positioning plate 32 on the specimen table 30 are aligned using an X-X line and Y-Y line. In the next step, an X axis table 27 and Y axis table 28 are driven so that the plate 32 may be positioned to the location of a scanning type microscope 16. A line L1 is scanned by driving an X axis piezoelectric driving body. If the plate 32 is not inclined, the drift quantity of the positioning plate 32 from the center O of a probe 20 in the X direction becomes clear by comparing the surface contour of the irregular pattern of a measuring area 36 at this moment and the correlation between the irregular pattern having been stored in the CPU and the distance from the center O. In the same way, when the probe 20 is moved to an area 40, and a Y axis piezoelectric element driving body is driven to scan a line L2, the drift quantity from the center O in the Y direction becomes clear.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a positioning and adjusting device for a microscope, etc., and more particularly to a positioning and adjusting device for a scanning tunneling microscope that measures surface shapes and the like.

[Conventional technology]

The principle of a scanning tunneling microscope is that a metal probe with a thin tip and a piezoelectric element are used to drive the piezoelectric element in the Z direction perpendicular to the measurement surface so that the tunneling current remains constant. can be kept constant. In this state, the probe is driven in the x-y directions, and the surface shape of the measurement surface can be determined from changes in the voltage applied to the piezoelectric element.

On the other hand, such a scanning tunneling microscope has, for example, 10
An extremely small area of μ x 10 μ is observed, and the observation area is determined in advance using an optical microscope, and then a scanning tunneling microscope is set at the same observation position and observed. Therefore, scanning tunneling microscopes and optical microscopes are often used with a revolver, support beam, etc.

[Problem to be solved by the invention]

In a conventional scanning tunneling microscope, a measurement area is first observed using an optical microscope, and then the scanning tunneling microscope is centered by rotating a revolver or the like (or by moving the supporting part of the microscope) and then observed.

However, in the conventional apparatus, when replacing the probe of the scanning tunneling microscope, the inclination of the probe may vary due to play in the probe mounting portion, and the measurement area may differ from the measurement area set with the optical microscope. For this reason, adjustment for this play has conventionally been performed using a positioning plate or the like, but this has the disadvantage that adjustment takes time.

The present invention has been made in view of the above circumstances, and an object of the present invention is to propose a position adjustment device for a scanning tunneling microscope that can perform position adjustment in a short time when replacing a probe or the like.

[Means to solve problems]

In order to achieve the above object, the present invention measures the pattern shape by scanning an irregular pattern in the Y-axis direction perpendicular to the X-axis direction of the positioning plate with a probe at a set position, and measures the pattern shape in advance by the CPU. The amount of deviation in the X-axis direction is determined by comparing the memorized correlation between the shape of the irregular pattern in the Y-axis direction and the amount of deviation from the center, and the probe detects the irregularity in the X-axis direction of the positioning plate. Pattern Y
The pattern shape is measured by scanning in the direction, and this pattern shape is compared with the correlation between the shape of the irregular pattern in the X-axis direction and the amount of deviation from the center, which is stored in advance in the CPU, and the pattern shape is It is characterized by determining the amount of deviation.

[Effect]

According to the present invention, the irregular pattern shape of the positioning plate in the Y-axis direction is scanned to determine the amount of deviation in the X-axis direction.

Next, the irregular pattern shape of the positioning plate in the X-axis direction is scanned to determine the amount of deviation in the Y-axis direction.

〔Example〕

DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of a positioning and adjusting device for a microscope or the like according to the present invention will be described in detail below with reference to the accompanying drawings.

A gate-shaped support 12 is erected on a base 10 shown in FIG. 1, and an optical microscope 14 and a scanning tunneling microscope 16 are attached to the support 12 so as to be vertically movable. The optical microscope 14 is moved up and down to adjust the focus, and the scanning tunneling microscope 16 is moved up and down so that it can match the height of the measurement position of the workpiece.

At the bottom of the scanning tunneling microscope 16 is a trypot 18.
The probe 20 is attached via.

The tri-bod 18 includes an X-axis piezoelectric element driver 22 that controls the distance between the probe 20 and the measurement surface, and an X-axis piezoelectric element driver 2 that causes the probe 20 to scan in the X-axis direction on the measurement surface.
4. The probe 20 is composed of a piezoelectric element driver 26 in the Y-axis direction perpendicular to the X-axis direction. Z-axis pressure type element driver 2
The voltage change No. 2 is sent to the CPU 50, and the surface shape can be measured.

On the other hand, an X table 27 is disposed on the base 10 so as to be movable in the X-axis direction, and a Y table 2 is disposed on the X table 27.
8 is arranged movably in the Y-axis direction. Y table 28
A stage 30 is provided on the stage 30, and a positioning plate 32 or a workpiece is placed on the stage 30.

In FIG. 4, the positioning plate 32 is shown, and the intersection point O between the line XX and the line YY perpendicular thereto indicates the center of the plate 32. The x-x rays and y-y rays of the plate 32 are used to align the center of the optical microscope 14. Furthermore, the plate 32 has areas 34 and 36 in the vertical direction (Y-axis direction).
An irregular pattern consisting of irregular pattern shapes is formed, and this irregular pattern is shown, for example, in FIG. 5(A). Areas 34 and 36 are used to measure how far the probe 20 is from the center 0 in the X-axis direction. Furthermore, the plate 32 has areas 38 and 40 in the lateral direction (X-axis direction).
An irregular pattern consisting of irregular pattern shapes is formed. Areas 38 and 40 are used to measure how far away from the center ○ is in the Y-axis direction. Also, this area 3
4.36.38.40 irregular pattern shape is CP in advance
It is stored in U, and the correlation of how far a particular pattern is from the center O is manually calculated.

A preferred embodiment of the positioning and adjusting device for a scanning tunneling microscope according to the present invention constructed as described above will be described in detail.

After replacing the probe 20 of the scanning tunneling microscope 16, first, the X table 27 and Y table 28 are moved to place the stage 30 directly below the optical microscope 14. Next, finely move the X table 27 and Y table 28 to
The center of the field of view 4 and the center of the plate 32 on the stage 30 are aligned using the x-X line and the Y-Y line of the plate 32.

Next, move the X-axis table 26 so that the plate 32 is positioned at the scanning tunneling microscope that has been set in advance.
, drives the Y-axis table 28.

At this time, if the probe 20 has shifted and is located at one point on the measurement area 36, the X-axis pressure type element driver 24 is driven to scan the line L1. Assuming that the surface shape of the irregular pattern at this time is as shown in FIG. 5(B), the CPU
50 stores in advance the relationship between the pattern of FIG. 5(A) and the distance from the center ○, for example, 15 μ
You can tell that the plate is tilting when there is no tilting of the plate. Similarly, the probe 20 is moved to the measurement area 40, and the Y-axis pressure type element driver 26 is driven to scan the line L2. This makes it possible to determine the amount of deviation from the center O in the Y-axis direction. If the plate is not tilted by the above operation, probe 2
You can see the amount of deviation from the center of 0.

In addition, since the plate is generally tilted, the X-axis pressure type element driver 24 is driven to move the line L3 on the measurement area 38.
operate. By comparing line L2 and line L3, if there is no inclination of the plate, it is possible to know the inclination of the drive unit.

In the above embodiment, lines L+, L2, and L3 were used, but if the inclination of the plate can be ignored, line LIS
It is also possible to just scan L2.

In the embodiment, in order to scan the probe 20, the Z-axis piezoelectric element driver 22, the X-axis piezoelectric element driver 24, and the Y-axis piezoelectric element driver 22,
Although the axial piezoelectric element driver 26 is used, as shown in FIG. It may also be moved by a small distance using the Y moving table 6'0.

〔Effect of the invention〕

As explained above, according to the positioning plate and the positioning adjustment device for a scanning tunneling microscope according to the present invention, two
Since the amount of deviation of the probe from the center can be determined after one or three scans, the adjustment time is shortened.

[Brief explanation of the drawing]

Fig. 1 is a schematic diagram of a scanning tunneling microscope, Fig. 2 is a schematic diagram of a tri-bod, Fig. 3 is a control block diagram of a scanning tunneling microscope, Fig. 4 is an explanatory diagram of the positioning plate 32, and Fig. 5 (A ) is a waveform diagram of an irregular pattern, Figure 5 (B
) is a waveform diagram of line L1, and FIG. 6 is a control block diagram showing another embodiment of the present invention. 16...Scanning tunneling microscope, 18...Tripot, 20...Probe,
22... Two-axis pressure type element drive body, 24... X-axis piezoelectric element drive body, 26... Y-axis pressure type element drive body, 32... Positioning plate.

Claims (3)

[Claims] (1) An X-axis positioning area in which irregular patterns are continuously formed in the Y-axis direction perpendicular to the X-axis, and a Y-axis positioning area in which irregular patterns are continuously formed in the X-axis direction; A positioning plate consisting of. (2) A Z-axis piezoelectric element driver to which the probe is attached and controls the distance between the probe and the measurement surface; an X-axis piezoelectric element driver connected to the Z-axis piezoelectric element driver; In a scanning tunneling microscope comprising a piezoelectric element driver in the Y-axis direction connected to an element driver, an irregular pattern is formed in the Y-axis direction perpendicular to the X-axis direction of the positioning plate with the probe at the set position. is scanned to measure the pattern shape, and this pattern shape is compared with the correlation between the shape of the irregular pattern in the Y-axis direction and the amount of deviation from the center, which is stored in advance in the CPU, and the deviation in the X-axis direction is calculated. The irregular pattern in the X-axis direction of the positioning plate is scanned in the Y direction with the probe to measure the pattern shape, and this pattern shape is stored in advance in the CPU as the irregular pattern in the X-axis direction. 1. A positioning adjustment device for a scanning tunneling microscope, characterized in that the amount of deviation in the Y-axis direction is determined by comparing the correlation between the shape and the amount of deviation from the center. (3) Z-axis piezoelectric element driver to which the probe is attached and controls the distance between the probe and the measurement surface, and the measurement surface is
In a scanning tunneling microscope having an X-Y moving mechanism that moves in the direction, a probe at a set position scans an irregular pattern in the Y-axis direction perpendicular to the X-axis direction of the positioning plate to form a pattern. measuring the shape, comparing this pattern shape with the correlation between the shape of the irregular pattern in the Y-axis direction and the amount of deviation from the center, which was previously stored in the CPU, and determining the amount of deviation in the X-axis direction; The probe scans the irregular pattern in the X-axis direction of the positioning plate in the Y direction to measure the pattern shape, and this pattern shape is determined from the shape and center of the irregular pattern in the X-axis direction that has been stored in advance in the CPU. 1. A positioning adjustment device for a scanning tunneling microscope, characterized in that the amount of displacement in the Y-axis direction is determined by comparing the correlation with the amount of displacement of .