JPH0414185B2 - - Google Patents
Info
- Publication number
- JPH0414185B2 JPH0414185B2 JP60224960A JP22496085A JPH0414185B2 JP H0414185 B2 JPH0414185 B2 JP H0414185B2 JP 60224960 A JP60224960 A JP 60224960A JP 22496085 A JP22496085 A JP 22496085A JP H0414185 B2 JPH0414185 B2 JP H0414185B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- molten
- vapor
- ejecting
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 claims description 24
- 239000012768 molten material Substances 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000010409 thin film Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、めつき技術などの電気化学的手段
ではなく、各種基板(金属、半導体、絶縁物な
ど)上に物質薄膜層などの薄膜を形成する、たと
えば真空蒸着法などの薄膜形成装置における溶融
物質(たとえば鉛、銅、金、銀、ガドミウム、テ
ルルなど)の蒸気噴出装置に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] This invention is not based on electrochemical means such as plating technology, but rather on the production of thin films such as material thin film layers on various substrates (metals, semiconductors, insulators, etc.). The present invention relates to a device for ejecting vapor of a molten substance (such as lead, copper, gold, silver, gadmium, tellurium, etc.) in a thin film forming device such as a vacuum evaporation method.
一般にこの種薄膜形成装置は、蒸着しようとす
る溶融物質を、蒸気噴出孔を有する密閉形のるつ
ぼに収容してこれを加熱し、るつぼを設置した高
真空雰囲気(たとえば10-4Torr以下のガス圧)
と、加熱によりるつぼ内に形成される溶融物質蒸
気との間に少なくとも10倍以上の圧力差を形成す
るとともに、るつぼ内の溶融物質蒸気に熱平衡状
態を保持させることにより、蒸気噴出孔から溶融
物質蒸気を低ガス圧雰囲気中に噴射させ、断熱膨
張による過冷却状態を蒸気噴出孔の近傍に形成さ
せて、過飽和状態による凝縮によつて塊状原子集
団(クラスタ)をつくり、この一部をイオン化し
クラスタイオンビームとしてイオン引出電極に与
えた負の高電圧によつてこクラスタイオンビーム
に運動エネルギーを与え、中性クラスタビームと
共に、基板上に所定の物質薄膜層を形成するよう
にしたものである。 In general, this type of thin film forming apparatus heats the molten material to be deposited in a closed crucible with a steam outlet, and heats it in a high vacuum atmosphere (e.g., gas of 10 -4 Torr or less). pressure)
By forming a pressure difference of at least 10 times or more between the molten material vapor and the molten material vapor formed in the crucible due to heating, and maintaining the thermal equilibrium state of the molten material vapor in the crucible, the molten material is released from the steam outlet. Steam is injected into a low gas pressure atmosphere, a supercooled state is formed near the steam outlet due to adiabatic expansion, and a lumpy atomic group (cluster) is created by condensation due to the supersaturated state, some of which is ionized. A negative high voltage applied to the ion extraction electrode as a cluster ion beam gives kinetic energy to the cluster ion beam, and forms a thin film layer of a predetermined material on the substrate together with the neutral cluster beam. .
第3図A,Bは従来の薄膜形成装置における溶
融物質の蒸気噴出装置の要部を示す平面図と縦断
面図を示し、第3図A,Bはるつぼ1が円筒形の
場合、また第4図A,Bはるつぼ1が矩形箱形の
場合を示している。1は内部に所定の溶融物質5
を収容したるつぼ、2はこのるつぼ1を所定間隔
をあけて囲繞し、このるつぼ1を加熱する加熱用
フイラメント、3はるつぼ1の上部開口を閉塞
し、天井部中央に所定内径の蒸気噴出孔4を形成
した蓋体、5aはるつぼ1内で形成され、蒸気噴
出孔4から噴出する溶融物質蒸気である。
3A and 3B show a plan view and a vertical cross-sectional view showing the main parts of a molten material vapor ejecting device in a conventional thin film forming apparatus. 4A and 4B show the case where the crucible 1 has a rectangular box shape. 1 has a predetermined molten substance 5 inside
2 is a heating filament that surrounds the crucible 1 at a predetermined interval and heats the crucible 1; 3 is a heating filament that closes the upper opening of the crucible 1 and has a steam jet hole with a predetermined inner diameter in the center of the ceiling. The lid body 5a formed with 4 is formed within the crucible 1 and is a molten material vapor that is ejected from the steam ejection hole 4.
従来の蒸気噴出装置は上記のように構成されて
いるので、加熱フイラメント2に通電することに
よつて加熱されたるつぼ1内の溶融物質5が蒸発
すると、その蒸気5aはるつぼ1内の圧力を高
め、蒸気噴出孔4かか噴出されるが、この溶融物
質蒸気5aは圧力差による断熱膨張によつて横方
向に拡がると共に、この溶融物質蒸気5aは断熱
膨張によつて加熱冷却され、10〜1000個前後の原
子が緩く結合した塊状原子集団(スラスタ)が形
成され、このクラスタが被蒸着材(図示せず)の
薄膜形成に用いられる。 Since the conventional steam ejecting device is configured as described above, when the molten substance 5 in the crucible 1 heated by energizing the heating filament 2 evaporates, the steam 5a increases the pressure in the crucible 1. The molten material vapor 5a spreads laterally due to adiabatic expansion caused by the pressure difference, and is heated and cooled by the adiabatic expansion. A cluster of atoms (thruster) in which about 1000 atoms are loosely bonded is formed, and this cluster is used to form a thin film of a material to be deposited (not shown).
上述した従来の蒸気噴出装置においては、加熱
フイラメント2と、るつぼ1の外周壁との間隔が
一定でないと、るつぼ1が均等に加熱されない欠
点があり、特に、第4図A,Bに示すようにるつ
ぼ1が矩形箱形であると、加熱フイラメント2と
の非対向面部分のるつぼの加熱温度がきわめて低
く、るつぼ内の溶融物質5が溶融されないため、
溶融物質蒸気5aの噴出量が不安定になつたり、
著しく低下する欠点がある。
In the conventional steam ejecting device described above, there is a drawback that if the distance between the heating filament 2 and the outer circumferential wall of the crucible 1 is not constant, the crucible 1 will not be heated evenly. When the crucible 1 has a rectangular box shape, the heating temperature of the portion of the crucible that does not face the heating filament 2 is extremely low, and the molten substance 5 in the crucible is not melted.
The amount of ejection of the molten material vapor 5a becomes unstable,
There is a drawback that it deteriorates significantly.
この発明はかかる点に着目してなされたもの
で、加熱フイラメントと、るつぼの外周壁との間
隔の「バラツキ」や、るつぼの形状によつて、る
つぼ加熱温度が不均等にならないようにした蒸気
噴出装置を提供しようとするものである。 This invention was made with attention to this point, and the invention uses steam to prevent the heating temperature of the crucible from becoming uneven due to "variations" in the distance between the heating filament and the outer peripheral wall of the crucible, or due to the shape of the crucible. The present invention aims to provide a jetting device.
この発明にかかる蒸気噴出装置は、るつぼの外
周壁の所定位置に、熱伝導性と保温性の良好な所
定厚さの恒温用金属板を重合定着するようにした
ものである。
The steam ejecting device according to the present invention has a thermostatic metal plate having a predetermined thickness and good thermal conductivity and heat retention property polymerized and fixed at a predetermined position on the outer circumferential wall of a crucible.
この発明においては、るつぼの外周壁の所定位
置に、熱伝導性と、保温性の良好な恒温用金属板
を重合定着するようにしたので、加熱フイラメン
トと、るつぼの外周壁との間隔の「バラツキ」
や、るつぼの形状によつて、るつぼ加熱温度が全
体的に不均等になるようなことがない。
In this invention, a constant temperature metal plate with good thermal conductivity and heat retention is polymerized and fixed at a predetermined position on the outer peripheral wall of the crucible, so that the distance between the heating filament and the outer peripheral wall of the crucible is "Dispersion"
Also, the heating temperature of the crucible does not become uneven overall depending on the shape of the crucible.
〔発明の実施例〕
第1図および第2図A,Bは何れもこの発明の
一実施例を示すもので、第1図は蒸気噴出装置の
縦断面図、第2図Aは要部の平面図、第2図Bは
その縦断面図であり、上述した従来のもの(第3
図および第4図)と同一符号は同一構成部材につ
きその説明を省略する。[Embodiment of the Invention] Fig. 1 and Fig. 2 A and B each show an embodiment of the present invention. The plan view and FIG.
The same reference numerals as those in FIG.
まず、第1図において、8は溶融物質5を収容
したるつぼ1の上部にこれを同心的に所定間隔を
あけて配設され、溶融物質蒸気5aから生成され
たクラスタをイオン化するイオン化電子放出フイ
ラメント7から放出される電子を加速するグリツ
ド、9はこのグリツド8の上部に所定間隔をあけ
て配設され、イオン化されたクラスタを加速制御
する加速電極、10は表面に物質薄膜を蒸着させ
る被蒸着材、11は各構成部材を収容した真空
槽、6はるつぼ1の外周壁のうち、加熱用フイラ
メント2に対向しないるつぼ1の外周壁に重合定
着された恒温用金属板で、この恒温用金属板6は
たとえば熱伝導性と保温性の良好な「タンタル」
などの高温金属材料が用いられており、この恒温
金属板6はるつぼ1の加熱温度を全体的に均等に
し、且つるつぼ1を保温するために設けられたも
のである。 First, in FIG. 1, reference numeral 8 denotes an ionizing electron emitting filament which is disposed concentrically at a predetermined interval above the crucible 1 containing the molten material 5, and which ionizes the clusters generated from the molten material vapor 5a. A grid 7 accelerates the electrons emitted from the grid 8; an accelerating electrode 9 disposed at a predetermined interval above the grid 8 controls the acceleration of the ionized cluster; and 10 a deposition target for depositing a thin film of material on the surface. 11 is a vacuum chamber containing each component; 6 is a constant temperature metal plate polymerized and fixed on the outer peripheral wall of the crucible 1 that does not face the heating filament 2; The plate 6 is made of tantalum, for example, which has good thermal conductivity and heat retention.
The constant-temperature metal plate 6 is provided to make the heating temperature of the crucible 1 uniform throughout and to keep the crucible 1 warm.
この発明の溶融物質の蒸気噴出装置は上記のよ
うに構成されているので、るつぼ1を加熱するた
めに加熱フイラメント2から放出された熱電子
は、るつぼ1と加熱用フイラメント2との間に印
加された正のバイアス電圧によりるつぼ1に衝突
してこれを加熱する。この際、第2図に示す如
く、加熱フイラメント2と恒温用金属板6との距
離aは加熱フイラメント2とるつぼ1との距離b
より短く、また角を有するので電界が集中するた
め熱電子が集中し、るつぼ1より遥かに熱入力が
大きい。この熱入力によつて高温に加熱された恒
温用金属板6は良好な熱伝導性により、加熱用フ
イラメント2に対向しないるつぼ1の面に熱を伝
え、結果的にるつぼ1は全周を加熱されているの
と同じ程度に温度が均一になり、溶融物質蒸気5
aの噴出量が安定化され、しかも、この恒温用金
属板6の保温性により、るつぼ1の熱効率が向上
する。 Since the molten substance vapor ejecting device of the present invention is configured as described above, thermionic electrons emitted from the heating filament 2 to heat the crucible 1 are applied between the crucible 1 and the heating filament 2. The applied positive bias voltage impinges on the crucible 1 and heats it. At this time, as shown in FIG. 2, the distance a between the heating filament 2 and the constant temperature metal plate 6 is the distance b between the heating filament 2 and the crucible 1.
Since it is shorter and has corners, the electric field concentrates and thermionic electrons concentrate, resulting in a much larger heat input than crucible 1. The thermostatic metal plate 6 heated to a high temperature by this heat input has good thermal conductivity and transfers heat to the surface of the crucible 1 that does not face the heating filament 2, and as a result, the crucible 1 heats the entire circumference. The temperature becomes uniform to the same extent as the molten material vapor 5
The ejection amount of a is stabilized, and the thermal efficiency of the crucible 1 is improved due to the heat retention properties of the constant temperature metal plate 6.
この発明の溶融物質の蒸気噴出装置は上述した
ように、加熱用フイラメントに対向しないるつぼ
の外周壁に、このるつぼの温度を均等にする恒温
用金属板を重合定着するようにしたので、加熱用
フイラメントによつて局部的に高温に加熱された
るつぼの熱は、加熱フイラメントに対向しないる
つぼの外周壁に伝達されるため、るつぼの加熱温
度が全体的に均等化されることによつて溶融物質
蒸気の噴出量が安定化されるばかりでなく、この
恒温用金属板の保温性によつてるつぼの熱効率が
向上し、低温プロセスによつて被蒸着材に薄膜を
生成することができる優れた効果を有するもであ
る。
As mentioned above, in the molten substance vapor ejecting device of the present invention, a constant temperature metal plate that equalizes the temperature of the crucible is polymerized and fixed on the outer peripheral wall of the crucible that does not face the heating filament. The heat of the crucible, which is locally heated to a high temperature by the filament, is transferred to the outer peripheral wall of the crucible that does not face the heating filament, so the heating temperature of the crucible is uniformized over the whole, and the molten material is This not only stabilizes the amount of steam ejected, but also improves the thermal efficiency of the crucible due to the heat retention properties of this constant-temperature metal plate, which has the excellent effect of creating a thin film on the material to be deposited through a low-temperature process. It also has.
第1図および第2図A,Bは何れもこの発明の
一実施例を示すもので、第1図は蒸気噴出装置の
縦断面図、第2図Aは要部の平面図、第2図Bは
その縦断面図である。第3図A,Bおよび第4図
A,Bは従来の溶融物質の蒸気噴出装置の要部を
それぞれ示す平面図と縦断面図である。
図において、1はるつぼ、2は加熱フイラメン
ト、3は蓋体、4は蒸気噴出孔、5は溶融物質、
5aは溶融物質蒸気、6は恒温用金属板である。
なお、図中同一符号は同一または相当部分を示
す。
Fig. 1 and Figs. 2A and 2B all show one embodiment of the present invention. Fig. 1 is a longitudinal cross-sectional view of the steam ejecting device, Fig. 2A is a plan view of the main part, and Fig. 2A is a plan view of the main part. B is a longitudinal sectional view thereof. FIGS. 3A and 3B and FIGS. 4A and 4B are a plan view and a vertical cross-sectional view, respectively, showing the main parts of a conventional molten material steam ejection device. In the figure, 1 is a crucible, 2 is a heating filament, 3 is a lid, 4 is a steam outlet, 5 is a molten substance,
5a is a molten substance vapor, and 6 is a constant temperature metal plate.
Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
溶融物質を収容したるつぼにおいて、前記加熱用
フイラメントに対向しないるつぼの外周壁に、該
るつぼの温度を均等にする恒温用金属板を重合定
着したことを特徴とする溶融物質の蒸気噴出装
置。 2 前記恒温用金属板にタンタルを用いたことを
特徴とする特許請求の範囲第1項記載の溶融物質
の蒸気噴出装置。 3 前記るつぼの上部開口を閉塞する蓋体の天井
部中央に溶融物質蒸気を噴出させる蒸気噴出孔を
形成していることを特徴とする特許請求の範囲第
1項記載の溶融物質の蒸気噴出装置。 4 前記るつぼの上部に、これと同心的に溶融金
属蒸気から生成されたクラスタをイオン化するイ
オン化電子放出フイラメントから放出される電子
を加速するグリツドを設けたことを特徴とする特
許請求の範囲第1項記載の溶融物質の蒸気噴出装
置。[Scope of Claims] 1. In a crucible that is heated by a heating filament and contains a molten substance therein, a thermostatic metal plate that equalizes the temperature of the crucible is provided on the outer peripheral wall of the crucible that does not face the heating filament. A device for ejecting steam from a molten substance, characterized in that it is polymerized and fixed. 2. The molten substance vapor ejecting device according to claim 1, wherein tantalum is used for the constant temperature metal plate. 3. The molten material vapor ejection device according to claim 1, wherein a vapor ejection hole for ejecting molten material vapor is formed in the center of the ceiling of the lid that closes the upper opening of the crucible. . 4. Claim 1, characterized in that a grid is provided concentrically above the crucible to accelerate electrons emitted from an ionizing electron emitting filament that ionizes clusters generated from molten metal vapor. A device for ejecting steam from a molten substance as described in 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22496085A JPS6286154A (en) | 1985-10-11 | 1985-10-11 | Ejection device for molten material vapor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22496085A JPS6286154A (en) | 1985-10-11 | 1985-10-11 | Ejection device for molten material vapor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6286154A JPS6286154A (en) | 1987-04-20 |
JPH0414185B2 true JPH0414185B2 (en) | 1992-03-12 |
Family
ID=16821895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22496085A Granted JPS6286154A (en) | 1985-10-11 | 1985-10-11 | Ejection device for molten material vapor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6286154A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160012710A (en) * | 2014-07-25 | 2016-02-03 | 현대중공업 주식회사 | Push Rod Cover of Engine |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5842159A (en) * | 1981-09-08 | 1983-03-11 | Mini Pairo Denki:Kk | Single base type discharge lamp |
-
1985
- 1985-10-11 JP JP22496085A patent/JPS6286154A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5842159A (en) * | 1981-09-08 | 1983-03-11 | Mini Pairo Denki:Kk | Single base type discharge lamp |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160012710A (en) * | 2014-07-25 | 2016-02-03 | 현대중공업 주식회사 | Push Rod Cover of Engine |
Also Published As
Publication number | Publication date |
---|---|
JPS6286154A (en) | 1987-04-20 |
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