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JPH04141320A - Work liquid feeding device for electric discharging machine - Google Patents

Work liquid feeding device for electric discharging machine

Info

Publication number
JPH04141320A
JPH04141320A JP26296090A JP26296090A JPH04141320A JP H04141320 A JPH04141320 A JP H04141320A JP 26296090 A JP26296090 A JP 26296090A JP 26296090 A JP26296090 A JP 26296090A JP H04141320 A JPH04141320 A JP H04141320A
Authority
JP
Japan
Prior art keywords
liquid
machining
resistivity
specific resistance
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26296090A
Other languages
Japanese (ja)
Inventor
Minehisa Katou
加藤 峰久
Masaru Shinkai
勝 新開
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP26296090A priority Critical patent/JPH04141320A/en
Publication of JPH04141320A publication Critical patent/JPH04141320A/en
Pending legal-status Critical Current

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  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE:To maintain the highly accurate work of an electric discharging machine, and to enable an unmanned operation for a long time, by controlling the specific resistance value of a replenished work liquid so as to become the same value as the specific resistance value controlled by a specific resistance detection device by a specific resistance control unit. CONSTITUTION:A work liquid fed to a machine main body 10 by a pump 9 from a clean liquid tank 2 is returned to a dirty liquid tank 1 together with work chips, but the quantity of the work liquid returned to the dirty liquid tank 1 is being reduced by the evaporation, splash, etc. When the reduction of this liquid quantity is detected by a liquid level detector 14, a feed water means 15 replenishes the work liquid into the dirty liquid tank 1, via a specific resistance control unit 17 from a work liquid feeding source 13, further via a 2nd specific resistance detection device 16. When the liquid level detector 14 detects that the work liquid quantity inside the dirty liquid tank 1 reaches a constant quantity, the feed water means 15 stops the liquid replenishment. In the case of the specific resistance value controlled by the 1st specific resistance detection device 5 of the clean liquid tank 2 side being high and the specific resistance value of the work liquid feeding source 13 being low, at the replenishing time of the work liquid, the control unit 17 controls the specific resistance of the replenishing liquid in the same value as the value controlled by the detection device 5.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は放電加工機用加工液供給装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a machining fluid supply device for an electrical discharge machine.

[従来の技術] 第2図は従来の放電加工機用加工液供給装置の加工液の
回路を示す構成図である。図において、(1)は汚液槽
、(2)は清液槽、(3)は清液槽(2)内に設けたフ
ィルタ、(4)は汚液槽(1)内の加工液をフィルタ(
3)を通して清液槽(2)内に供給するための第1のポ
ンプ、(5)は清液槽(2)に設けた加工液の比抵抗検
出装置、(6)は清液槽(2)内の加工液の比抵抗を調
整するだめの純水装置、(7)は清液槽(2)内の加工
液を純水装置(6)に供給するための第2のポンプ、(
8)は比抵抗検出装置(5)の検出結果に基づいて第2
ポンプ(7)の制御を行う制御装置、(9)は比抵抗を
調整した清液槽(2)内の加工液を機械本体(10)に
供給するための第3のポンプ、(11)は汚液槽(1)
内の加工液量を検出するフロート、(12)はフロー1
−(II)の検出結果に基づいて水道等の加工液供給源
(13)からtη液槽(1)内へ自動的に加工液を補充
するためのバルブである。
[Prior Art] FIG. 2 is a block diagram showing a machining fluid circuit of a conventional machining fluid supply device for an electric discharge machine. In the figure, (1) is the dirty liquid tank, (2) is the clean liquid tank, (3) is the filter installed in the clean liquid tank (2), and (4) is the processing liquid in the dirty liquid tank (1). filter(
(3) is a first pump for supplying the liquid into the clear liquid tank (2), (5) is a specific resistance detection device for machining liquid provided in the clear liquid tank (2), and (6) is a first pump for supplying the clear liquid into the clear liquid tank (2). ) is a deionizer for adjusting the specific resistance of the machining fluid in the tank (7) is a second pump for supplying the machining fluid in the clear fluid tank (2) to the deionizer (6);
8) is based on the detection result of the resistivity detection device (5).
A control device that controls the pump (7), (9) a third pump for supplying the machining liquid in the clear liquid tank (2) with adjusted specific resistance to the machine body (10), and (11) a control device that controls the pump (7); Sewage tank (1)
Float that detects the amount of machining fluid in (12) is flow 1
- This is a valve for automatically replenishing machining fluid into the tη liquid tank (1) from a machining fluid supply source (13) such as tap water based on the detection result of (II).

このようなものにおいて、汚液槽(1)内の加工液中の
加工屑は、汚液槽(1)内の加工液を第1ポンプ(4)
によりフィルタ(3)に送給し、ろ過することによって
取り除かれる。フィルタ(3)にてろ過された加工液は
清液槽(2)に貯留されるが、このろ過された清液槽(
2)内の加工液を高精度加工に供するためには、更に加
工液の比抵抗を調整する必要がある。この加工液の比抵
抗制御は、比抵抗検出装置(5)で検出された信号によ
って、制御装置(8)が第2ポンプ(7)の起動、停止
を行い、純水装置(6)に加工液を送給することにより
行われる。比抵抗が制御された加工液は、第3のポンプ
(9)により機械本体くlO)に供給され、放電加工に
寄与する。
In such a device, the machining waste in the machining fluid in the sewage tank (1) is removed from the machining fluid in the sewage tank (1) by the first pump (4).
is fed to the filter (3) and removed by filtration. The processing liquid filtered by the filter (3) is stored in the clear liquid tank (2);
In order to use the machining fluid in 2) for high-precision machining, it is necessary to further adjust the resistivity of the machining fluid. To control the resistivity of the machining fluid, the control device (8) starts and stops the second pump (7) based on the signal detected by the resistivity detection device (5), and the water is processed into the pure water device (6). This is done by supplying liquid. The machining fluid whose specific resistance has been controlled is supplied to the machine body (9) by the third pump (9) and contributes to electrical discharge machining.

機械本体(10)に供給された加工液は、加工屑と一緒
に汚液槽(1)に戻されるが、加工部における加工時に
発生する熱による蒸発や、あるいは加工液の飛散等によ
り、汚液槽(1)に戻される加]二液の量は減少してい
く。そこで、従来はフロート(11)とバルブ(12)
により、加工液が減少した分を加工液供給源(13)か
ら汚液槽(1)内に水道水等を直接自動補充するように
している。
The machining fluid supplied to the machine body (10) is returned to the sewage tank (1) together with machining waste, but contamination may occur due to evaporation due to heat generated during machining in the machining section or scattering of the machining fluid. The amount of the two liquids returned to the liquid tank (1) decreases. Therefore, conventionally the float (11) and valve (12)
Accordingly, tap water or the like is automatically replenished directly from the machining fluid supply source (13) into the sewage tank (1) to compensate for the decrease in machining fluid.

[発明が解決しようとする課題] 従来の放電加工機用加工液供給装置は、以上のように構
成されているため、高精度加工における加工液の比抵抗
値は、例えば超硬材は10万Ω以上に設定しであるが、
加工中に加工液が減少することにより、通常比抵抗値が
1万Ω前後である水道水か直接補充されることになり、
比抵抗を4IQ御していない加工液が加工液供給装置内
に混在し、清液槽(2)に設置している純水装置(6)
にて加工液の比抵抗調整を行っているものの、連続運転
においては、純水装置(6)による加工液の比抵抗調整
の間に、設定した比抵抗値以外の加工液が機械本体(J
O)に供給され、この結果放電加工用電極と被加工物と
の間の放電ギャップが変化し、延いては加工精度が悪化
するという問題があった。
[Problems to be Solved by the Invention] Since the conventional machining fluid supply device for an electrical discharge machine is configured as described above, the specific resistance value of the machining fluid in high-precision machining is, for example, 100,000 yen for carbide materials. Although it is set to Ω or more,
As the machining fluid decreases during machining, it must be directly replenished with tap water, which usually has a specific resistance value of around 10,000 Ω.
Processing fluid whose specific resistance is not controlled by 4IQ is mixed in the processing fluid supply device, and the pure water device (6) is installed in the clear fluid tank (2).
Although the specific resistance of the machining fluid is adjusted by the pure water device (6), during continuous operation, machining fluid other than the set resistivity value reaches the machine body (J).
As a result, the discharge gap between the electrode for electrical discharge machining and the workpiece changes, which leads to a problem in that machining accuracy deteriorates.

また、このような問題は、高精度加工における放電加工
機の長時間連続無人運転を実現するための加工液供給装
置を構築する際の強い障害となるとともに、放電加工機
がワイヤ放電加工機である場合には、ワイヤ電極の断線
を引き起こす要因となり、これによって加工が中断する
ことがあった。
In addition, such problems become a strong obstacle when constructing a machining fluid supply system to realize long-term continuous unmanned operation of electric discharge machines in high-precision machining, and they also cause problems when electric discharge machines are wire electric discharge machines. In some cases, this may cause the wire electrode to break, which may interrupt processing.

本発明は以上の点に鑑み、加工液が減少した場合でも、
加工を中断することなく高精度加工が維持できるととも
に、放電加工機の長時間連続無人運転を実現することの
可能な放電加工機用加工液Cj(給装置を得ることを目
的とする。
In view of the above points, the present invention has been developed so that even when the machining fluid decreases,
The object of the present invention is to obtain a machining fluid Cj (feeding device) for an electric discharge machine that can maintain high precision machining without interrupting machining and realize long-term continuous unmanned operation of the electric discharge machine.

[課題を解決するための手段] 本発明に係る放電加工機用加工液供給装置は、機械本体
に供給される加工液を貯留する清液槽と、機械本体から
の加工液を回収する汚液槽と、この汚液槽内の加工液量
を検出する液面検出器と、この液面検出器の検出結果に
基づいて加工液供給源から汚液槽内へ加工液を補充する
給水手段と、上記汚液槽内の加工液をフィルタを介して
上記清液槽に送給するための第1のポンプと、」1記清
液槽内の加工液の比抵抗を検出する第1の比抵抗検出装
置と、上記清液槽内の加工液の比抵抗を調整するための
純水装置と、上記清液槽内の加工液を上記純水装置に送
給するための第2のポンプと、上記第1比抵抗検出装置
の検出結果に基づいて上記第2のポンプの制御を行う制
御装置と、上記給水手段により補充される加工液の比抵
抗を検出する第2の比抵抗検出装置と、この第2比抵抗
検出装置で検出した比抵抗値と上記第1比抵抗検出装置
で制御される比抵抗値上に基づいて」二記給水手段より
補充される加工液の比抵抗を制御する比抵抗制御装置と
を備えたものである。
[Means for Solving the Problems] A machining fluid supply device for an electric discharge machine according to the present invention includes a clean fluid tank that stores machining fluid to be supplied to the machine body, and a dirty fluid tank that collects the machining fluid from the machine body. A tank, a liquid level detector for detecting the amount of machining liquid in the sewage tank, and a water supply means for replenishing the machining liquid from a machining liquid supply source into the sewage tank based on the detection result of the liquid level detector. , a first pump for feeding the machining fluid in the dirty fluid tank to the clean fluid tank via the filter, and a first ratio for detecting the specific resistance of the machining fluid in the clean fluid tank. a resistance detection device, a pure water device for adjusting the specific resistance of the machining liquid in the fresh liquid tank, and a second pump for feeding the machining liquid in the fresh liquid tank to the pure water device. , a control device that controls the second pump based on the detection result of the first resistivity detection device, and a second resistivity detection device that detects the resistivity of the machining fluid replenished by the water supply means. , the resistivity of the machining fluid replenished from the water supply means is controlled based on the resistivity value detected by the second resistivity detector and the resistivity value controlled by the first resistivity detector. It is equipped with a resistivity control device.

[作 用コ 本発明においては、比抵抗制御装置が、補充される加工
液の比抵抗値を、第1比抵抗検出装置て制御される比抵
抗値と同値となるように制御し、比抵抗値の異なる加工
液が加工液供給装置内に混在するのを防ぐ。
[Function] In the present invention, the specific resistance control device controls the specific resistance value of the machining fluid to be replenished to be the same value as the specific resistance value controlled by the first specific resistance detection device, and To prevent machining fluids with different values from mixing in the machining fluid supply device.

[実施例] 以下、従来に相当する部分には同一符号を付して示す第
1図の一実施例により本発明を説明する。
[Embodiment] Hereinafter, the present invention will be explained with reference to an embodiment shown in FIG. 1, in which parts corresponding to conventional ones are denoted by the same reference numerals.

第1図は本実施例に係る放電加工機用加工液供給装置の
加工液の回路を示す構成図で、図において、(14)は
汚液槽(1)内の加工液量を検出する液面検出器、(1
5)は液面検出器(14)の検出結果に基づいて水道等
の加工液供給源(13)から汚液槽(1)内へ自動的に
加工液を補充するための給水手段、(16)は加工液供
給源(13)から給水手段(15)を介して汚液槽(1
)内へ補充される加工液の比抵抗を検出する第2の比抵
抗検出装置、(17)は第2比抵抗検出装置(1B)で
得た比抵抗値と清液槽(2)側の比抵抗検出装置(以下
、第1比抵抗検出装置という)(5)で制御される比抵
抗植生に基づいて、加工液供給源(13)から給水手段
(15)を介して補充される加工液の比抵抗を制御する
比抵抗制御装置であり、第2比抵抗検出装置(1G)で
得た比抵抗値と第1比抵抗検出装置(5)で制御される
比抵抗値とが異なった場合、加工液供給源(13)より
補充される加工液の比抵抗を第1比抵抗検出装置(5)
で制御される比抵抗値と同じ値となるように制御する。
FIG. 1 is a block diagram showing the machining fluid circuit of the machining fluid supply device for an electrical discharge machine according to this embodiment. Surface detector, (1
5) is a water supply means (16) for automatically replenishing machining fluid from a machining fluid supply source (13) such as water supply into the sewage tank (1) based on the detection result of the fluid level detector (14); ) is connected to the waste liquid tank (1) from the processing liquid supply source (13) via the water supply means (15).
), the second resistivity detector (17) detects the resistivity of the machining fluid replenished into the tank (2), and (17) is the resistivity value obtained by the second resistivity detector (1B) and that of the clear liquid tank (2). The machining fluid is replenished from the machining fluid supply source (13) via the water supply means (15) based on the resistivity vegetation controlled by the resistivity detection device (hereinafter referred to as the first resistivity detection device) (5). This is a resistivity control device that controls the resistivity of the device, and when the resistivity value obtained by the second resistivity detector (1G) and the resistivity value controlled by the first resistivity detector (5) are different. , a first resistivity detection device (5) detects the resistivity of the machining fluid replenished from the machining fluid supply source (13).
The specific resistance value is controlled to be the same as the specific resistance value controlled by .

上述以外の構成は従来と同様であるので、その説明は省
略する。
Since the configuration other than the above is the same as the conventional one, the explanation thereof will be omitted.

以上のように構成される本実施例装置において、清液槽
(2)から第3のポンプ(9)によって機械本体(lO
)に供給された加工液は、加工屑と一緒に汚液槽(1)
に戻されるが、加工部における加工時に発生する熱によ
る蒸発や、あるいは加工液の飛散等により、汚液槽(1
)に戻される加工液の量は減少していく。この加工液量
の減少を液面検出器(14)が検知すると、給水手段(
15)は、加工液を加工液供給源(13)から比抵抗制
御装置(17)を介し、更に第2比抵抗検出装置(16
)を経て、汚液槽(1)内へ自動的に補充する。補充さ
れた加工液により汚液槽(1)内の加工液量が一定量に
達したと液面検出器(I4)が検知すると、給水手段(
15)は加工液の補充を停止する。
In the apparatus of this embodiment configured as described above, the third pump (9) moves the main body (lO
) The processing fluid supplied to the waste tank (1) together with processing waste is
However, due to evaporation due to the heat generated during processing in the processing section, or scattering of processing fluid,
) The amount of machining fluid returned to ) decreases. When the liquid level detector (14) detects this decrease in the amount of machining liquid, the water supply means (
15) passes the machining fluid from the machining fluid supply source (13) to the resistivity control device (17), and further to the second resistivity detection device (16).
), the sewage tank (1) is automatically replenished. When the liquid level detector (I4) detects that the amount of machining liquid in the waste liquid tank (1) has reached a certain level due to the replenished machining liquid, the water supply means (
15) stops replenishment of machining fluid.

加工液の補充時、清液槽(2)側の第1比抵抗検出装置
(5)で制御される比抵抗値が高く(例えば、10万Ω
)、加工液供給源(13)が水道等のように比抵抗値の
低い(2万Ω程度)場合、第2比抵抗検出装置(16)
で得た比抵抗値と第1比抵抗検出装置(5)で制御され
る比抵抗値とが異なるため、比抵抗制御装置(17)は
、加工液供給源(13)より補充される加工液の比抵抗
を第1比抵抗検出装置(5)で制御される比抵抗値と同
じ値となるように制御する。
When replenishing the machining fluid, the resistivity value controlled by the first resistivity detection device (5) on the clear fluid tank (2) side is high (for example, 100,000Ω).
), when the machining fluid supply source (13) has a low resistivity value (approximately 20,000Ω), such as water supply, the second resistivity detection device (16)
Since the specific resistance value obtained in 1 and the specific resistance value controlled by the first specific resistance detection device (5) are different, the specific resistance control device (17) detects the machining fluid replenished from the machining fluid supply source (13). The specific resistance is controlled to be the same value as the specific resistance value controlled by the first specific resistance detection device (5).

このように、本実施例装置は、補充される加工液の比抵
抗値が、常に設定どおりの比抵抗値となるため、比抵抗
値の異なる加工液が加工液供給装置内に混在することが
なく、長時間連続無人運転においても、放電加工用電極
と被加工物との間の放電ギャップが安定し、高精度加工
の維持が可能となる。
In this way, in the device of this embodiment, the resistivity value of the machining fluid to be replenished is always the set resistivity value, so machining fluids with different resistivity values do not coexist in the machining fluid supply device. Therefore, the discharge gap between the electric discharge machining electrode and the workpiece is stabilized even during continuous unattended operation for long periods of time, making it possible to maintain high precision machining.

なお、本発明は水を主体とする加工液を使用する加工装
置であれば、ワイヤ放電加工装置、不粘性型彫放電加工
装置、電解加工装置等、種々の加工装置に適用できるこ
とは言うまでもない。
It goes without saying that the present invention can be applied to various machining devices that use a machining fluid mainly composed of water, such as a wire electrical discharge machining device, an inviscid die-sinking electrical discharge machining device, and an electrolytic machining device.

[発明の効果コ 以上述べたように、本発明によれば、補充される加工液
の比抵抗値を常に設定どおりの比抵抗値とすることがで
きるので、加工液が減少した場合でも、加工を中断する
ことなく高精度加工が維持できるとともに、放電加工機
の長時間連続無人運転を実現することが可能となるとい
う効果がある。
[Effects of the Invention] As described above, according to the present invention, the specific resistance value of the machining fluid to be replenished can always be set to the set resistivity value, so even when the machining fluid decreases, machining can be continued. This has the effect that high-precision machining can be maintained without interruption, and it is also possible to realize long-term continuous unmanned operation of the electrical discharge machine.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本実施例に係る放電加工機用加工液供給装置の
加工液の回路を示す構成図、第2図は従来の放電加工機
用加工液供給装置の加工液の回路を示す構成図である。 図において、(1)は汚液槽、(2)は清液槽、(3)
はフィルタ、(4)は第1のポンプ、(5)は第1の比
抵抗検出装置、(6)は純水装置、(7)は第2のポン
プ、(8)は制御装置、(10)は機械本体、(13)
は加工液供給源、(14)は液面検出器、(15)は給
水手段、 (1B)は第2の比抵抗検出装置である。 なお、 各図中、 同一符号は同−又は相当部分を 示す。
FIG. 1 is a block diagram showing a machining fluid circuit of a machining fluid supply device for an electric discharge machine according to this embodiment, and FIG. 2 is a diagram showing a machining fluid circuit of a conventional machining fluid supply device for an electric discharge machine. It is. In the figure, (1) is the dirty liquid tank, (2) is the clean liquid tank, and (3)
is the filter, (4) is the first pump, (5) is the first resistivity detection device, (6) is the pure water device, (7) is the second pump, (8) is the control device, (10 ) is the machine body, (13)
(14) is a liquid level detector, (15) is a water supply means, and (1B) is a second resistivity detection device. In each figure, the same reference numerals indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims]  機械本体に供給される加工液を貯留する清液槽と、機
械本体からの加工液を回収する汚液槽と、この汚液槽内
の加工液量を検出する液面検出器と、この液面検出器の
検出結果に基づいて加工液供給源から汚液槽内へ加工液
を補充する給水手段と、上記汚液槽内の加工液をフィル
タを介して上記清液槽に送給するための第1のポンプと
、上記清液槽内の加工液の比抵抗を検出する第1の比抵
抗検出装置と、上記清液槽内の加工液の比抵抗を調整す
るための純水装置と、上記清液槽内の加工液を上記純水
装置に送給するための第2のポンプと、上記第1比抵抗
検出装置の検出結果に基づいて上記第2のポンプの制御
を行う制御装置と、上記給水手段により補充される加工
液の比抵抗を検出する第2の比抵抗検出装置と、この第
2比抵抗検出装置で検出した比抵抗値と上記第1比抵抗
検出装置で制御される比抵抗値とに基づいて上記給水手
段より補充される加工液の比抵抗を制御する比抵抗制御
装置とを備えることを特徴とする放電加工機用加工液供
給装置。
A clean liquid tank that stores the machining liquid supplied to the machine body, a dirty liquid tank that collects the machining liquid from the machine body, a liquid level detector that detects the amount of machining liquid in this dirty liquid tank, and a liquid level detector that detects the amount of machining liquid in this dirty liquid tank. water supply means for replenishing the machining fluid from the machining fluid supply source into the sewage tank based on the detection result of the surface detector; and for feeding the machining fluid in the sewage tank to the clear fluid tank via the filter. a first pump, a first resistivity detection device for detecting the resistivity of the machining fluid in the fresh fluid tank, and a pure water device for adjusting the resistivity of the machining fluid in the fresh fluid tank; , a second pump for feeding the machining liquid in the fresh liquid tank to the pure water device, and a control device that controls the second pump based on the detection result of the first resistivity detection device. and a second resistivity detection device that detects the resistivity of the machining fluid replenished by the water supply means, and a resistivity value detected by the second resistivity detection device and a resistivity value that is controlled by the first resistivity detection device. and a resistivity control device for controlling the resistivity of the machining fluid replenished from the water supply means based on the resistivity value of the machining fluid for an electrical discharge machine.
JP26296090A 1990-10-02 1990-10-02 Work liquid feeding device for electric discharging machine Pending JPH04141320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26296090A JPH04141320A (en) 1990-10-02 1990-10-02 Work liquid feeding device for electric discharging machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26296090A JPH04141320A (en) 1990-10-02 1990-10-02 Work liquid feeding device for electric discharging machine

Publications (1)

Publication Number Publication Date
JPH04141320A true JPH04141320A (en) 1992-05-14

Family

ID=17382939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26296090A Pending JPH04141320A (en) 1990-10-02 1990-10-02 Work liquid feeding device for electric discharging machine

Country Status (1)

Country Link
JP (1) JPH04141320A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007113915A1 (en) * 2006-04-05 2007-10-11 Mitsubishi Denki Kabushiki Kaisha Method of liquid-quality control, liquid-quality control apparatus, and electrical discharge machining apparatus making use of the same
JP2010538848A (en) * 2007-09-14 2010-12-16 イクストルード ホーン ゲーエムベーハー Methods and devices for electrochemical processing
JP2011131361A (en) * 2009-12-25 2011-07-07 Ihi Corp Electrochemical machining device and method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007113915A1 (en) * 2006-04-05 2007-10-11 Mitsubishi Denki Kabushiki Kaisha Method of liquid-quality control, liquid-quality control apparatus, and electrical discharge machining apparatus making use of the same
JPWO2007113915A1 (en) * 2006-04-05 2009-08-13 三菱電機株式会社 Liquid quality control method, liquid quality control apparatus, and electric discharge machining apparatus using the same
JP4926710B2 (en) * 2006-04-05 2012-05-09 三菱電機株式会社 Liquid quality control method, liquid quality control apparatus, and electric discharge machining apparatus using the same
US8217296B2 (en) 2006-04-05 2012-07-10 Mitsubishi Electric Corporation Fluid-quality control method, fluid-quality control apparatus, and electric-discharge machining apparatus employing the same
JP2010538848A (en) * 2007-09-14 2010-12-16 イクストルード ホーン ゲーエムベーハー Methods and devices for electrochemical processing
JP2011131361A (en) * 2009-12-25 2011-07-07 Ihi Corp Electrochemical machining device and method

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