JPH041051A - Ink-jet recording device - Google Patents
Ink-jet recording deviceInfo
- Publication number
- JPH041051A JPH041051A JP10136989A JP10136989A JPH041051A JP H041051 A JPH041051 A JP H041051A JP 10136989 A JP10136989 A JP 10136989A JP 10136989 A JP10136989 A JP 10136989A JP H041051 A JPH041051 A JP H041051A
- Authority
- JP
- Japan
- Prior art keywords
- beam member
- recording
- nozzle
- cantilever
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- 238000005452 bending Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 abstract description 7
- 239000002356 single layer Substances 0.000 abstract description 4
- 238000006073 displacement reaction Methods 0.000 abstract description 3
- 239000000110 cooling liquid Substances 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 230000035939 shock Effects 0.000 abstract description 2
- 230000008646 thermal stress Effects 0.000 abstract description 2
- 230000005611 electricity Effects 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010902 straw Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14427—Structure of ink jet print heads with thermal bend detached actuators
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
【発明の詳細な説明】
肢生分互
本発明は、インクジェット記録装置に関し、例えば、プ
リンター、プロッター、複写機等に適用されるものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an inkjet recording device, and is applied to, for example, printers, plotters, copying machines, and the like.
従」q【4
本発明に係る従来技術として、特公昭60−8953号
公報や特開昭62−94347号公報がある。特公昭6
0−8953号公報は1片側又は両側支持の圧電変換器
を、液体中へ配置して圧電変換器の曲げ振動により、液
滴をノズルより吐出させるものであり、また、特開昭6
2−94347号公報は、片持梁(2層構造)ヒーター
の曲げによる運動エネルギーとヒーター加熱による気泡
発生とにより、その体積排除との相乗効果によって液滴
をノズルより吐出させるものである。Prior art related to the present invention includes Japanese Patent Publication No. 60-8953 and Japanese Patent Application Laid-Open No. 62-94347. Tokuko Showa 6
No. 0-8953 discloses a method in which a piezoelectric transducer supported on one side or both sides is disposed in a liquid, and liquid droplets are ejected from a nozzle by bending vibration of the piezoelectric transducer.
No. 2-94347 uses kinetic energy due to bending of a cantilever beam (two-layer structure) heater and generation of bubbles due to heating of the heater to cause droplets to be ejected from a nozzle due to the synergistic effect of the volume displacement.
しかしながら、特公昭60−8953号公報のものは1
次のような欠点がある。すなわち、■非導電性インクの
使用が必要である。一般に非導性インク(油性インク)
には溶剤が使われるため、接着剤の劣化を招いたり、記
録紙上の画像に滲みやボケが出やすい。■導電性インク
を使用するためには絶縁処理が必要であり、立性を悪く
したりコスト高となる。02層構造(圧電変換器と金属
の組合せ)では接着工程か必要で、組立性を損うと同時
に振動変位のバラツキの原因となる。■圧電変換器と金
属との切断工程が必要であり、組立工程のバラツキが発
生し易く、集積度の向上が期待できない。However, the one published in Japanese Patent Publication No. 60-8953 is 1
It has the following drawbacks: That is, (1) it is necessary to use non-conductive ink. Generally non-conductive ink (oil-based ink)
Because solvents are used, the adhesive deteriorates and the image on the recording paper tends to smudge or blur. ■Using conductive ink requires insulation treatment, which impairs standing properties and increases costs. The 2-layer structure (a combination of a piezoelectric transducer and metal) requires a bonding process, which impairs assemblage and causes variations in vibration displacement. ■A cutting process between the piezoelectric transducer and the metal is required, and variations in the assembly process are likely to occur, making it difficult to expect an improvement in the degree of integration.
また、特開昭62−94347号公報のものは。Also, the one published in Japanese Patent Application Laid-Open No. 62-94347.
次のような欠点がある。すなわち、■液中で作用させる
ため(液中にもヒータ一部がある)保護膜を必要とする
。■インクが加熱するためインク設計に特別の配慮が必
要である。■梁部が加熱されるため、いわゆるバブルジ
ェット等で知られている耐キヤビテーシヨン層等を必要
とし、製造工程が複雑である。■金属と酸化膜等の少く
とも2層構造であり、製造工程が複雑となる。It has the following drawbacks: That is, (1) it requires a protective film because it works in a liquid (there is also a part of the heater in the liquid); ■Special consideration is required in ink design because the ink heats up. ■Since the beam portion is heated, an anti-cavitation layer, such as that known from so-called bubble jets, is required, and the manufacturing process is complicated. ■It has at least a two-layer structure of metal and oxide film, making the manufacturing process complicated.
また、先に出願したものとして特願平1−42512号
があるが、これはノズルと梁部材が屈曲してインク吐出
する状態での梁部材の角度が平行よりずれているため、
インク吐出効率が悪い。In addition, there is Japanese Patent Application No. 1-42512, which was filed earlier, but this is because the angle of the beam member is deviated from parallel when the nozzle and the beam member are bent and eject ink.
Ink ejection efficiency is poor.
■−−匁
本発明は、上述のごとき欠点を解決するためになされた
もので、梁部材を発熱体の熱エネルギーで変位させるこ
と、あるいは、発熱体を設けることなく電磁波エネルギ
ーを利用することにより記録ヘッド構成を簡単化したイ
ンクジェット記録装置を提供することを目的としてなさ
れたものである。■--Momme The present invention was made to solve the above-mentioned drawbacks, and by displacing the beam member by the thermal energy of a heating element, or by utilizing electromagnetic wave energy without providing a heating element. This was done for the purpose of providing an inkjet recording apparatus with a simplified recording head configuration.
碧−−」父
本発明は、上記目的を達成するために、(1)ノズルと
、該ノズルに近接して対向し、記録液中に配置されて少
なくとも一端が支持された梁部材とから成り、該梁部材
の屈曲運動により、記録液滴をノズルより吐出させて記
録するインクジェット記録装置において、前記梁部材の
支持部に記録液と分離して発熱体を設け、該発熱体の熱
エネルギーにより前記梁部材を屈曲運動させること、或
いは、(2)ノズルと、該ノズルに近接して対向し、記
録液中に配置されて少なくとも一端が支持された梁部材
とから成り、該梁部材の屈曲運動により、記録液滴をノ
ズルより吐出させて記録するインクジェット記録装置に
おいて、前記梁部材の支持部の少くとも一部に電磁波エ
ネルギーを吸収させて、該梁部材を屈曲運動させること
、更には。In order to achieve the above object, the present invention comprises (1) a nozzle, and a beam member that faces the nozzle in close proximity, is disposed in the recording liquid, and has at least one end supported. In an inkjet recording apparatus that records by ejecting recording liquid droplets from a nozzle by bending the beam member, a heating element is provided at the support portion of the beam member, separate from the recording liquid, and the thermal energy of the heating element is used to generate the recording liquid. bending the beam member; or (2) comprising a nozzle and a beam member that faces the nozzle in close proximity and is disposed in the recording liquid and has at least one end supported; In an inkjet recording apparatus that performs recording by ejecting recording droplets from a nozzle through motion, at least a portion of a support portion of the beam member absorbs electromagnetic wave energy to cause the beam member to perform a bending motion.
(3)前記梁部材が単一層よりなること、更には、(4
)梁部材がSi又はSiC2よりなること、或いは、(
5)ノズルと、ノズルに近接して対向し、記録液中に配
置されて少くとも一端が支持された梁部材からなり、該
梁部材の屈曲運動により、記録液滴をノズルより吐出さ
せて記録するインクジェット記録装置において、前記梁
部材の屈曲時のノズルに対向する部分が、ノズル構成部
材に対して略平行に配置されること、更には、(6)前
記梁部材が静止状態でノズル構成部材に対してあらかじ
め所定の角度θの関係で対向配置されていること、更に
は、(7)前記梁部材が静止状態でノズル構成部材に対
して平行に配置され、前記梁部材の屈曲時のノズルに対
向する部分をテーパー形状とすることを特徴とするもの
である。以下、本発明の実施例に基づいて説明する。(3) The beam member is made of a single layer, and further, (4
) The beam member is made of Si or SiC2, or (
5) Consisting of a nozzle and a beam member that faces the nozzle in close proximity and is disposed in the recording liquid and has at least one end supported, recording is performed by ejecting recording droplets from the nozzle by bending the beam member. In the inkjet recording apparatus, a portion of the beam member that faces the nozzle when bent is arranged approximately parallel to the nozzle component, and further, (6) the beam member is in a stationary state and the nozzle component is disposed substantially parallel to the nozzle component. (7) the beam member is placed parallel to the nozzle component in a stationary state, and when the beam member is bent, the nozzle The feature is that the portion facing the is tapered. Hereinafter, the present invention will be explained based on examples.
まず、第3図及び第4図により本発明に必要な梁の製造
方法の一例を説明する。第3図は片持梁の場合、第4図
は両持梁の場合の製造方法を示す図で、図中、1はSi
ウェハー、2はSi09層、3はヒーター位置、4は5
102がら成る片持梁、5は空洞、6はSiから成る両
持梁である。First, an example of a method for manufacturing a beam necessary for the present invention will be explained with reference to FIGS. 3 and 4. Figure 3 shows the manufacturing method for a cantilever beam, and Figure 4 shows the manufacturing method for a double-sided beam.
Wafer, 2 is Si09 layer, 3 is heater position, 4 is 5
102 is a cantilever beam, 5 is a cavity, and 6 is a double-sided beam made of Si.
片持梁の場合は、(100)Siウェハー1上にSin
、層2を形成して第3図(a)のような層構成とし、S
in、層2を第3図(b)の様にパターン形成する。そ
の後、エッチャントとしてFDPやKOHを用いると異
方性エツチングによる断面が第3図(c)で示されるS
iC2がら成る片持梁4が製作される。In the case of a cantilever beam, a (100) Si wafer 1 is
, layer 2 is formed to have a layer structure as shown in FIG. 3(a), and S
In, layer 2 is patterned as shown in FIG. 3(b). After that, when FDP or KOH is used as an etchant, the cross section obtained by anisotropic etching is shown in Fig. 3(c).
A cantilever beam 4 consisting of iC2 is fabricated.
両持梁の場合は、(100)Siウェハー1上にSin
、層2を形成して第4図(a)のような層構成とし、S
in、層2を第4図(b)の様にパターン形成する。こ
れに異方性エツチングを行ない両持梁を加工後にSin
2層2をHF等で除去すると第4図(c)で示されるS
iの両持梁6が製作される。第4図(d)は、第4図(
C)のA−A’断面図である。これらの例の様にSiや
SiO2より成る単層の片持梁又は両持梁は、Siの異
方性エツチングにより比較的容易に得られると共にフォ
トリソグラフィー技術で製作されるため、加工精度は非
常に良い。In the case of a double-supported beam, Si
, layer 2 is formed to have a layer structure as shown in FIG. 4(a), and S
In, layer 2 is patterned as shown in FIG. 4(b). Anisotropic etching is applied to this, and after machining the double-supported beam, the
When the second layer 2 is removed using HF etc., S shown in FIG. 4(c) is formed.
A double support beam 6 of i is manufactured. Figure 4(d) is the same as Figure 4(d).
It is AA' sectional view of C). As shown in these examples, single-layer cantilevered or double-sided beams made of Si or SiO2 can be obtained relatively easily by anisotropic etching of Si and are manufactured using photolithography technology, so the processing accuracy is extremely high. good for
第1図(a)、(b)は1本発明によるインクジェット
記録装置の一実施例を説明するための構成図で、第1図
(、)は片持梁の場合、第1図(b)は両持梁の場合の
記録ヘッドの構成を示す。図中、7はヒーター、8はイ
ンク液室、9は上板(Sl)10は片持梁部、11はノ
ズルプレート(Si)、12はインク滴、13は両持梁
部(Si)、14はスペーサ(Si)である。FIGS. 1(a) and 1(b) are configuration diagrams for explaining one embodiment of an inkjet recording apparatus according to the present invention. FIGS. shows the configuration of the recording head in the case of a double-supported beam. In the figure, 7 is a heater, 8 is an ink chamber, 9 is an upper plate (Sl), 10 is a cantilever part, 11 is a nozzle plate (Si), 12 is an ink droplet, 13 is a double support part (Si), 14 is a spacer (Si).
(1)片持梁の場合
第1図(a)は、第3図で製作された片持梁による記録
ヘッドの構成を示す。上板aは第3図と同様にSiの異
方性エツチングを利用して、またノズルプレート11も
Siで構成し、同じくエツチングによりノズル加工する
のが好適である。ヒーター7は、第3図で示される片持
梁の製作方法以前にサーマルヘッドやバブルジェット等
で周知のヒーター製造方法により第3図(b)の3で示
す位置に形成されているのが望ましいが、上板(Si)
aにヒーター7を形成後、片持梁部10と接合すること
も可能である。なおこの時ヒーター7は直接液体に触れ
ることはなく、例えばバブルジェット等で問題となるコ
ゲ−ジョンの問題はなく、更に耐キヤビテーシヨン層等
は不要となる。(1) In the case of a cantilever beam FIG. 1(a) shows the configuration of a recording head using a cantilever beam manufactured as shown in FIG. It is preferable that the upper plate a is formed by anisotropic etching of Si as in FIG. 3, and that the nozzle plate 11 is also formed of Si and that the nozzle is formed by etching. It is preferable that the heater 7 is formed at the position indicated by 3 in FIG. 3(b) by a well-known heater manufacturing method for thermal heads, bubble jets, etc. before the cantilever manufacturing method shown in FIG. However, the upper plate (Si)
It is also possible to connect the heater 7 to the cantilever section 10 after forming the heater 7 on the section a. At this time, the heater 7 does not come into direct contact with the liquid, so there is no problem of kogation, which is a problem with bubble jets, for example, and there is no need for an anti-cavitation layer.
また、溶融又は昇華型の熱転写記録に用いられるサーマ
ルヘッドでは、耐摩耗層が不可欠であるが、本方式では
必要でない。この様にヒーターの構成は非常に簡単とな
る。片持梁支持部10のヒーター7に通電することによ
り、梁は膨張に伴い発生する曲げモーメントにより、第
1図(a)に示す静止状態■より矢印方向に急激に変位
状態■に変化する。この時の梁の運動に伴い、インク液
室8中のインクは、ノズルプレート11のノズルよりイ
ンク?1112として吐出され、記録紙上へ記録する。Further, a wear-resistant layer is essential in a thermal head used for melting or sublimation type thermal transfer recording, but this method does not require it. In this way, the configuration of the heater becomes very simple. By energizing the heater 7 of the cantilever support part 10, the beam changes rapidly from the static state (2) shown in FIG. 1(a) to the displaced state (2) in the direction of the arrow due to the bending moment generated as the beam expands. Due to the movement of the beam at this time, the ink in the ink liquid chamber 8 is more ink than the nozzle of the nozzle plate 11. 1112 is ejected and recorded onto the recording paper.
従来は、この様な梁構酸として、バイメタル構成や圧電
素子を利用したバイモルフなど、2つの眉間の膨張率の
差や歪量の差に基く曲げを利用していたが、ここでは、
単一層でありながら表層部のみ加熱する(熱衝撃)こと
により、熱応力を利用した曲げを利用することが特徴で
ある。Conventionally, such beam structures have been made using a bimetal structure or a bimorph using a piezoelectric element, which uses bending based on the difference in expansion rate or strain between the two glabellar spaces, but here,
Although it is a single layer, only the surface layer is heated (thermal shock), which makes it possible to bend using thermal stress.
片持梁部の周波数応答性は、梁部の寸法や速度ず決まる
流体抵抗の他に、ヒータ一部周辺の伝熱特性によって決
まる。従って、記録周波数を向上するためには、放熱特
性を良くする事が必要であり、第1図に示すヒーター7
をインク液室8と分離した絶縁性冷却用液体を含む液室
内に配置したり、ファン等により空冷することが好まし
い。更に加熱部をペルチェ素子で構成することにより。The frequency response of the cantilever section is determined not only by the fluid resistance determined by the dimensions and speed of the beam section, but also by the heat transfer characteristics around a portion of the heater. Therefore, in order to improve the recording frequency, it is necessary to improve the heat dissipation characteristics.
It is preferable that the ink liquid chamber 8 be placed in a liquid chamber containing an insulating cooling liquid that is separate from the ink liquid chamber 8, or that it be air-cooled by a fan or the like. Furthermore, by configuring the heating section with a Peltier element.
加熱後の急冷却が可能となり、液滴吐出の周波数が著し
く向上する。Rapid cooling after heating is possible, and the frequency of droplet ejection is significantly improved.
(2)両持梁の場合
第1図(b)は、第4図で製作された両持梁による記録
ヘッドの構成を示す。動作原理は第1図(a)と同様で
あるが、両持梁の両端の支持部にヒーター7が配置され
ている。(2) In the case of a double-supported beam FIG. 1(b) shows the configuration of a recording head using a double-supported beam manufactured as shown in FIG. The operating principle is the same as that shown in FIG. 1(a), but heaters 7 are arranged at the support portions at both ends of the support beam.
第2図は、本発明の他の実施例を示すもので、図中、1
5は上板(ガラス)、16は片持梁部(Si+5iOz
)、17は半導体レーザー18はカップリングレンズ、
19は対物レンズである。第3図で示された片持梁部と
Si異方性エツチングを用いてノズル加工されたノズル
プレート11と凹所の設けられたガラスからなる上板1
5とで構成される。FIG. 2 shows another embodiment of the present invention, in which 1
5 is the upper plate (glass), 16 is the cantilever part (Si+5iOz
), 17 is a semiconductor laser 18 is a coupling lens,
19 is an objective lens. A nozzle plate 11 processed into a nozzle using a cantilever beam and Si anisotropic etching shown in FIG. 3, and an upper plate 1 made of glass with a recess provided therein.
It consists of 5.
半導体レーザー光はカップリングレンズ18と対物レン
ズ19により片持梁支持部に焦点を結ばれる。この時、
レーザー光の加熱効率低下を防止するための上板15は
、レーザー光吸収の少ないガラスを用いるのが良い、
レーザー光の加熱による梁部材の運動とインク滴吐出は
、前述の通りであるが、光出力の小さい半導体レーザー
の使用を可能にするには、レーザー光の波長に吸収スペ
クトルを持つ吸収層をレーザー照射部に設ける方がよい
。このため梁部又は上板に吸収層を設ける方が好適であ
る。この実施例では発熱体を設ける必要がなく記録ヘッ
ド構成が著しく簡単となる。The semiconductor laser beam is focused on the cantilever support by a coupling lens 18 and an objective lens 19. At this time,
For the upper plate 15 to prevent the heating efficiency of the laser beam from decreasing, it is preferable to use glass that absorbs little laser light.The movement of the beam member and the ejection of ink droplets due to the heating of the laser beam are as described above. In order to enable the use of a semiconductor laser with a low optical output, it is better to provide an absorption layer having an absorption spectrum at the wavelength of the laser light in the laser irradiation section. For this reason, it is preferable to provide an absorbing layer on the beam portion or the upper plate. In this embodiment, there is no need to provide a heating element, and the configuration of the recording head is significantly simplified.
次に、第5図及び第6図(a)、(b)に基づいて。Next, based on FIGS. 5 and 6 (a) and (b).
本発明のさらに他の実施例について説明する。図中、2
0はヒーター、21は温室、22は記録液、23は梁部
材、24は上板、25は下板、26はノズルプレート、
27はノズル、28はインク滴である。Still other embodiments of the present invention will be described. In the figure, 2
0 is a heater, 21 is a greenhouse, 22 is a recording liquid, 23 is a beam member, 24 is an upper plate, 25 is a lower plate, 26 is a nozzle plate,
27 is a nozzle, and 28 is an ink droplet.
第6図(a)によれば、梁部材23とノズルプレート2
6は平行となっている。ヒーター通電により梁部材23
が屈曲して停止した位置を点線で示す。■、■、■は屈
曲時の記録液の流れの方向を示す。屈曲により効率良く
記録液を吐出するためには■、■、■間の流体の抵抗が
問題となる。図では屈曲時のノズル上部の部分がノズル
プレートと角度θとなるため■方向の流体抵抗がかさく
■方向に記録液は流れ易くノズル方向の流れ■は阻止さ
れ、従って吐出効率は悪い。According to FIG. 6(a), the beam member 23 and the nozzle plate 2
6 is parallel. The beam member 23 is turned on by energizing the heater.
The dotted line shows the position where the curved and stopped position. ■, ■, ■ indicate the direction of flow of the recording liquid during bending. In order to eject the recording liquid efficiently by bending, the resistance of the fluid between (1), (2), and (2) becomes a problem. In the figure, since the upper part of the nozzle when bent forms an angle θ with the nozzle plate, the fluid resistance in the direction (2) is high, the recording liquid tends to flow in the (2) direction, and the flow (3) in the nozzle direction is blocked, resulting in poor ejection efficiency.
第6図(b)によれば、屈曲時の梁部材20とノズルプ
レート26は略平行となるように梁部材23か屈曲する
。この時梁部材23とノズルプレート26との間隔dと
ノズル径rを適当な関係にすると■、■、■方向の流体
抵抗は略同等となり、第6図(a)にくらへて著しい記
録液吐出効率の向上か見られる。According to FIG. 6(b), the beam member 23 is bent so that the beam member 20 and the nozzle plate 26 are substantially parallel when bent. At this time, if the distance d between the beam member 23 and the nozzle plate 26 and the nozzle diameter r are set in an appropriate relationship, the fluid resistances in the directions ■, ■, and ■ become approximately equal, and the recording liquid It can be seen that the discharge efficiency has improved.
具体的な実施例を第7図及び第8図に示す。第7図にお
いて、梁部材は屈曲時にノズルプレートと略平行となる
ようにあらかじめ角度θでノズルプレートと対向配置さ
れている。屈曲時の効果は第6図(b)と同じである。Specific examples are shown in FIGS. 7 and 8. In FIG. 7, the beam member is arranged in advance to face the nozzle plate at an angle θ so as to be substantially parallel to the nozzle plate when bent. The effect upon bending is the same as in FIG. 6(b).
第8図において、梁部材は静止時にノズルプレートと平
行に対向配置される。但し屈曲時に梁部材のノズルに対
向する部分が、ノズルプレートと平行になるように梁部
材先端はテーパー状になっている。In FIG. 8, the beam member is arranged parallel to and opposite the nozzle plate when it is stationary. However, the tip of the beam member is tapered so that the portion of the beam member facing the nozzle becomes parallel to the nozzle plate when bent.
勿−−ユ敦
以上の説明から明らかなように、本発明によると、液体
に接することなく梁部材を発熱体の熱エネルギーで変位
させることができる。また、発熱体構成が簡単となる。As is clear from the above description, according to the present invention, the beam member can be displaced by the thermal energy of the heating element without coming into contact with liquid. Furthermore, the configuration of the heating element becomes simple.
また、発熱体を設ける必要がなく記録ヘット構成が簡単
となる。Furthermore, there is no need to provide a heating element, and the recording head configuration is simplified.
第1図は、本発明によるインクジェット記録装置の一実
施例を説明するための記録ヘッドの構成図で、第1図(
a)は片持梁の場合、第1図(b)は両持梁の場合を示
す図、第2図は、他の実施例を示す図、第3図(a)〜
(C)は、片持梁の製造方法を示す図、第4図(、)〜
(d)は、両持梁の製造方法を示す図、第5図及び第6
図は1本発明のさらに他の実施例を説明するための図、
第7図及び第8図はその具体例を示す図である。
1・・・Siウェハー 2・・・5i01層、4・・・
片持梁、5・・・空洞、6・・・両持梁、7・・・ヒー
ター、8・・・インク液室、9・・・上板、1o・・・
片持梁部、11・・・ノズルプレート、12・・・イン
ク滴、13・・・両持梁部。
14・・・スペーサ。
蔦 1 図
+(])
くb)
藁2図
へ
第
図
第
図
(a)
(b)
埴
第
図FIG. 1 is a configuration diagram of a recording head for explaining an embodiment of an inkjet recording apparatus according to the present invention.
a) is a case of a cantilever beam, FIG. 1(b) is a diagram showing a case of a double-sided beam, FIG. 2 is a diagram showing another embodiment, and FIGS. 3(a)-
(C) is a diagram showing the method for manufacturing a cantilever beam, Figure 4 (, ) ~
(d) is a diagram showing the manufacturing method of the double-supported beam, Figures 5 and 6.
The figures are 1 diagrams for explaining still another embodiment of the present invention,
FIGS. 7 and 8 are diagrams showing specific examples thereof. 1...Si wafer 2...5i01 layer, 4...
Cantilever beam, 5...Cavity, 6...Both support beam, 7...Heater, 8...Ink liquid chamber, 9...Top plate, 1o...
Cantilevered beam portion, 11... Nozzle plate, 12... Ink droplet, 13... Both supported beam portion. 14...Spacer. Ivy 1 Figure + (]) Ku b) Straw 2 Figure Figure Figure (a) (b) Hane Figure
Claims (1)
配置されて少なくとも一端が支持された梁部材とから成
り、該梁部材の屈曲運動により、記録液滴をノズルより
吐出させて記録するインクジェット記録装置において、
前記梁部材の支持部に記録液と分離して発熱体を設け、
該発熱体の熱エネルギーにより前記梁部材を屈曲運動さ
せることを特徴とするインクジェット記録装置。 2、ノズルと、該ノズルに近接して対向し、記録液中に
配置されて少なくとも一端が支持された梁部材とから成
り、該梁部材の屈曲運動により、記録液滴をノズルより
吐出させて記録するインクジェット記録装置において、
前記梁部材の支持部の少くとも一部に電磁波エネルギー
を吸収させて、該梁部材を屈曲運動させることを特徴と
するインクジェット記録装置。[Scope of Claims] 1. Consisting of a nozzle and a beam member that faces the nozzle in close proximity and is disposed in the recording liquid and has at least one end supported, the bending movement of the beam member causes recording liquid droplets to be generated. In an inkjet recording device that records by ejecting it from a nozzle,
a heating element is provided on the support portion of the beam member, separated from the recording liquid;
An inkjet recording apparatus characterized in that the beam member is caused to bend by the thermal energy of the heating element. 2. Consisting of a nozzle and a beam member that faces the nozzle in close proximity and is disposed in the recording liquid and has at least one end supported, recording droplets are ejected from the nozzle by bending movement of the beam member. In an inkjet recording device that records,
An inkjet recording apparatus characterized in that the beam member is caused to bend by absorbing electromagnetic wave energy in at least a portion of a support portion of the beam member.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4251289 | 1989-02-22 | ||
JP1-42512 | 1989-02-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH041051A true JPH041051A (en) | 1992-01-06 |
Family
ID=12638122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10136989A Pending JPH041051A (en) | 1989-02-22 | 1989-04-20 | Ink-jet recording device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH041051A (en) |
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