JPH0383966A - Production of aromatic carboxylic acid having sulfonyl group - Google Patents
Production of aromatic carboxylic acid having sulfonyl groupInfo
- Publication number
- JPH0383966A JPH0383966A JP1219297A JP21929789A JPH0383966A JP H0383966 A JPH0383966 A JP H0383966A JP 1219297 A JP1219297 A JP 1219297A JP 21929789 A JP21929789 A JP 21929789A JP H0383966 A JPH0383966 A JP H0383966A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- carboxylic acid
- solvent
- manganese
- cobalt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 title claims description 13
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002904 solvent Substances 0.000 claims abstract description 18
- 239000003054 catalyst Substances 0.000 claims abstract description 12
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 12
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 10
- 230000003647 oxidation Effects 0.000 claims abstract description 10
- 239000007791 liquid phase Substances 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- -1 bromine compound Chemical class 0.000 claims description 16
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 10
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052794 bromium Inorganic materials 0.000 claims description 9
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims description 8
- 229910017052 cobalt Inorganic materials 0.000 claims description 8
- 239000010941 cobalt Substances 0.000 claims description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 8
- ZBICJTQZVYWJPB-UHFFFAOYSA-N [Mn].[Co].[Br] Chemical compound [Mn].[Co].[Br] ZBICJTQZVYWJPB-UHFFFAOYSA-N 0.000 claims description 7
- 150000001869 cobalt compounds Chemical class 0.000 claims description 6
- 150000002697 manganese compounds Chemical class 0.000 claims description 6
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 1
- 150000001491 aromatic compounds Chemical class 0.000 abstract description 15
- 239000002994 raw material Substances 0.000 abstract description 12
- 229920000642 polymer Polymers 0.000 abstract description 7
- 125000000217 alkyl group Chemical group 0.000 abstract description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract description 5
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 abstract description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 2
- 125000001246 bromo group Chemical group Br* 0.000 abstract 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 6
- 239000004952 Polyamide Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229920002647 polyamide Polymers 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 229940011182 cobalt acetate Drugs 0.000 description 2
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 2
- BZRRQSJJPUGBAA-UHFFFAOYSA-L cobalt(ii) bromide Chemical compound Br[Co]Br BZRRQSJJPUGBAA-UHFFFAOYSA-L 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RJYMRRJVDRJMJW-UHFFFAOYSA-L dibromomanganese Chemical compound Br[Mn]Br RJYMRRJVDRJMJW-UHFFFAOYSA-L 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- 229940071125 manganese acetate Drugs 0.000 description 2
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000012209 synthetic fiber Substances 0.000 description 2
- 229920002994 synthetic fiber Polymers 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RVHSTXJKKZWWDQ-UHFFFAOYSA-N 1,1,1,2-tetrabromoethane Chemical compound BrCC(Br)(Br)Br RVHSTXJKKZWWDQ-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 150000005526 organic bromine compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
発明の技術分野
本発明は、スルホニル基を有する芳香族カルボン酸の製
造方法に関し、さらに詳しくは、ポリエステル、ポリア
ミドあるいはポリイミドなどの有用な重合体を製造する
際に用いられる、スルホニル基を有する芳香族カルボン
酸の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a method for producing an aromatic carboxylic acid having a sulfonyl group, and more specifically, it is used in producing useful polymers such as polyester, polyamide, or polyimide. , relates to a method for producing an aromatic carboxylic acid having a sulfonyl group.
発明の技術的背景
耐熱性高分子の原料として、カルボキシル基、イミド基
などの官能基を有する芳香族化合物が多く知られている
。Technical Background of the Invention Many aromatic compounds having functional groups such as carboxyl groups and imide groups are known as raw materials for heat-resistant polymers.
たとえば、カプトン■に代表されるポリイミドの原料と
してのピロメリット酸(無水物)、あるいは特開昭50
−24242号公報に開示されているようなポリエーテ
ルイミドの原料としての芳香族ビス(エーテル酸無水物
)等が公知である。For example, pyromellitic acid (anhydride) is used as a raw material for polyimide such as Kapton ■, or
Aromatic bis(ether acid anhydride) and the like are known as raw materials for polyetherimide as disclosed in Japanese Patent No. 24242.
ところが、ピロメリット酸(無水物)を原料として得ら
れるポリイミドは、耐熱性に優れるものの成形性が劣り
、また芳香族ビス(エーテル酸無水物)を原料として得
られるポリエーテルイミドは耐熱性が劣るという問題点
があった。However, polyimide obtained using pyromellitic acid (anhydride) as a raw material has excellent heat resistance but poor moldability, and polyetherimide obtained using aromatic bis(ether acid anhydride) as a raw material has poor heat resistance. There was a problem.
このため耐熱性と成形性とのバランスに優れたポリイミ
ドの原料となる新たな芳香族カルボン酸の出現が望まれ
ていた。For this reason, there has been a desire for the emergence of a new aromatic carboxylic acid that can be used as a raw material for polyimide that has an excellent balance between heat resistance and moldability.
一方、また、二塩基酸と二価アルコールとの重縮合によ
り、主鎖がエステル結合で連結されてなるポリエステル
は、合成繊維用高分子材料として、またフィルム用高分
子材料として広く用いられている。さらに、二塩基酸と
ジアミン類とからは、合成繊維用高分子材料として有用
なポリアミド類が製造されうろことは周知である。On the other hand, polyester, whose main chains are linked by ester bonds through polycondensation of dibasic acid and dihydric alcohol, is widely used as a polymer material for synthetic fibers and films. . Furthermore, it is well known that polyamides useful as polymeric materials for synthetic fibers can be produced from dibasic acids and diamines.
このように二塩基酸は、ポリエステル類あるいはポリア
ミド類などを製造する際の出発原料として極めて有用な
化合物であるが、上記のようなポリマー原料としての二
塩基酸としては、p−キシレンの酸化反応により得られ
るテレフタル酸、あるいはm−キシレンの酸化により得
られるイソフタル酸が広く知られている。In this way, dibasic acids are extremely useful compounds as starting materials when producing polyesters or polyamides, etc. However, dibasic acids as raw materials for polymers such as those mentioned above are used in the oxidation reaction of p-xylene. Terephthalic acid obtained by oxidation of m-xylene or isophthalic acid obtained by oxidation of m-xylene is widely known.
ところがテレフタル酸あるいはイソフタル酸を出発原料
としてポリエステルあるいはポリアミドなどのポリマー
を製造する技術は、ある意味で研究しつくされており、
得られるポリマーは、たとえば耐熱性に劣ったり、ある
いは加工性に劣るなどの問題点があることが指摘されて
いる。However, the technology for producing polymers such as polyester or polyamide using terephthalic acid or isophthalic acid as a starting material has been thoroughly researched in a sense.
It has been pointed out that the resulting polymers have problems, such as poor heat resistance or processability.
このため、全く新しいポリエステルあるいはポリアミド
の原料となりうる新たな芳香族カルボン酸の出現が望ま
れている。For this reason, there is a desire for the emergence of new aromatic carboxylic acids that can be used as raw materials for completely new polyesters or polyamides.
このような従来技術に鑑みて、たとえば特開昭63−8
3653号明細書には、コバルト−マンガン−臭素系触
媒の存在下に、スルホニル基を有する芳香族化合物を分
子状酸素によって液相酸化することを特徴とする下記一
般式[II]で示されるスルホニル基を有する芳香族カ
ルボン酸の製造方法が開示されている。In view of such prior art, for example, Japanese Patent Application Laid-Open No. 63-8
No. 3653 discloses that sulfonyl group-containing aromatic compounds represented by the following general formula [II] are subjected to liquid phase oxidation with molecular oxygen in the presence of a cobalt-manganese-bromine catalyst. A method for producing aromatic carboxylic acids having groups is disclosed.
(式中、RおよびR5はそれぞれ同一であっても異なっ
ていてもよく、水素またはカルボキシル基てあり、Rお
よびR7はそれぞれ同一でありでも異なっていてもよく
、水素、低級アルキル基またはカルボキシル基であり、
nは水素以外の置換基の数であって、0〜4の整数であ
る。)本発明者らは、上記のような従来技術に鑑みてさ
らに鋭意検討したところ、特定の芳香族化合物を分子状
酸素によって液相酸化するに際して、特定量のコバルト
化合物とマンガン化合物と臭素化合物とを特定量で用い
れば、スルホニル基を有する芳香族カルボン酸が高純度
ですなわち高選択率て効率よく製造しうろことを見出し
て本発明を完成するに至った。(In the formula, R and R5 may each be the same or different and represent hydrogen or a carboxyl group, and R and R7 may each be the same or different and represent hydrogen, a lower alkyl group or a carboxyl group. and
n is the number of substituents other than hydrogen, and is an integer of 0 to 4. ) The present inventors further investigated in light of the above-mentioned prior art, and found that when a specific aromatic compound is subjected to liquid phase oxidation with molecular oxygen, specific amounts of cobalt compounds, manganese compounds, and bromine compounds are combined. The inventors have now completed the present invention by discovering that aromatic carboxylic acids having sulfonyl groups can be efficiently produced with high purity, ie, high selectivity, by using a specific amount of sulfonyl group-containing aromatic carboxylic acids.
発明の目的
本発明は、上記のような点に鑑みて完成されたものであ
って、ポリエステル、ポリアミドあるいはポリイミドな
どの重合体を製造するのに有用なスルホニル基を含有す
る芳香族カルボン酸を高選択率でかつ高収率で一般反応
によって製造しうるようなスルホニル基を含有する芳香
族カルボン酸の製造方法を提供することを目的としてい
る。Purpose of the Invention The present invention was completed in view of the above-mentioned points, and is a method for producing highly aromatic carboxylic acids containing sulfonyl groups, which are useful for producing polymers such as polyesters, polyamides, and polyimides. It is an object of the present invention to provide a method for producing an aromatic carboxylic acid containing a sulfonyl group, which can be produced by a general reaction with high selectivity and high yield.
発明の概要
本発明に係る芳香族カルボン酸の製造方法は、下記一般
式[I]で示される化合物を、脂肪族カルボン酸溶媒中
で、コバルト−マンガン−臭素系触媒の存在下に、分子
状酸素によって液相酸化するに際して、溶媒100重量
部に対して、コバルト化合物をコバルト金属として0.
10〜0.17重量部の量で用い、マンガン化合物をマ
ンガン金属として0.0007〜0.0018重量部の
量で用い、臭素化合物を臭素原子として少なくとも0.
0465重量部以上の量で用いることを特徴としている
。Summary of the Invention The method for producing an aromatic carboxylic acid according to the present invention is to prepare a compound represented by the following general formula [I] in a molecular form in an aliphatic carboxylic acid solvent in the presence of a cobalt-manganese-bromine catalyst. When carrying out liquid phase oxidation with oxygen, 0.0% cobalt compound is added as cobalt metal to 100 parts by weight of solvent.
The manganese compound is used in an amount of 0.0007 to 0.0018 parts by weight as manganese metal, and the bromine compound is used as a bromine atom in an amount of at least 0.0007 to 0.0018 parts by weight.
It is characterized in that it is used in an amount of 0,465 parts by weight or more.
[Iコ
(式中、RおよびR2はそれぞれ同一であってl
も異なっていてもよく、水素または低級アルキル基であ
り、nは水素以外の置換基の数であって、0〜4の整数
である。)
本発明によれば、上記一般式[I]で示されるような化
合物を、脂肪族カルボン酸溶媒中で、特定量のコバルト
−マンガン−臭素系触媒の存在下に分子状酸素によって
液相酸化すると、下記一般式[n]で示される芳香族カ
ルボン酸を高純度で効率よく製造することができる。[In the formula, R and R2 are each the same and may be different, and are hydrogen or a lower alkyl group, and n is the number of substituents other than hydrogen, and is an integer of 0 to 4. According to the present invention, a compound represented by the above general formula [I] is reacted with molecular oxygen in the presence of a specific amount of a cobalt-manganese-bromine catalyst in an aliphatic carboxylic acid solvent. By liquid phase oxidation, the aromatic carboxylic acid represented by the following general formula [n] can be efficiently produced with high purity.
・・・ [II]
(式中、RおよびR7はそれぞれ同一であっても異なっ
ていてもよく、水素、低級アルキル基またはカルボキシ
ル基であり、nは水素以外の置換基の数であって、0〜
4の整数である。)発明の詳細な説明
以下本発明に係るスルホニル基を有する芳香族カルボン
酸の製造方法について具体的に説明する。... [II] (wherein R and R7 may be the same or different, and are hydrogen, a lower alkyl group, or a carboxyl group, and n is the number of substituents other than hydrogen, 0~
It is an integer of 4. ) Detailed Description of the Invention The method for producing an aromatic carboxylic acid having a sulfonyl group according to the present invention will be specifically described below.
原料となる芳香族化合物は、下記一般式[1]%式%
[]
(式中、RおよびRはそれぞれ同一であって2
もよく異なっていてもよく、水素または低級アルキル基
であり、nは水素以外の置換基の数であって、O〜4の
整数である。)
上記一般式[I]で示される芳香族化合物は、たとえば
以下のようにして製造することができる。The aromatic compound used as a raw material has the following general formula [1]% formula% [] (wherein R and R are each the same and may be different, are hydrogen or a lower alkyl group, and n is the number of substituents other than hydrogen, and is an integer of O to 4.) The aromatic compound represented by the above general formula [I] can be produced, for example, as follows.
すなわち、下記一般式[m]で示されるp−t−ルエン
スルホニルクロリド類と、下記一般式[IV]で示され
るジフェニルエーテル類とを、たとえば三塩化アルミニ
ウムなどのルイス酸の存在下に反応させることによって
、上記一般式[1]で示される芳香族化合物を得ること
ができる。That is, a pt-luenesulfonyl chloride represented by the following general formula [m] and a diphenyl ether represented by the following general formula [IV] are reacted, for example, in the presence of a Lewis acid such as aluminum trichloride. By this, an aromatic compound represented by the above general formula [1] can be obtained.
[III]
[IV]
[I]
本発明では、一般式[I]で示される芳香族化合物を、
脂肪族カルボン酸溶媒中で、特定量のコバルト−マンガ
ン−臭素系触媒の存在下に分子状酸素たとえば空気によ
って液相酸化して、前記−般式[・■]で示される芳香
族カルボン酸を製造している。[III] [IV] [I] In the present invention, the aromatic compound represented by the general formula [I] is
In an aliphatic carboxylic acid solvent, in the presence of a specific amount of a cobalt-manganese-bromine catalyst, the aromatic carboxylic acid represented by the general formula [・■] is oxidized in a liquid phase using molecular oxygen, such as air. Manufactured.
反応溶媒としての脂肪族カルボン酸としては、酢酸、フ
ロピオン酸、酪酸、吉草酸などが用いられるが、このう
ち特に酢酸が好ましい。このような脂肪族カルボン酸は
少量の水を含んでいてもよく、また場合によっては、こ
の脂肪族カルボン酸にアルデヒド類、ケトン類、アルコ
ール類などの有機溶媒を混合して用いることもできる。As the aliphatic carboxylic acid used as the reaction solvent, acetic acid, flopionic acid, butyric acid, valeric acid, etc. are used, and among these, acetic acid is particularly preferred. Such aliphatic carboxylic acids may contain a small amount of water, and in some cases, organic solvents such as aldehydes, ketones, and alcohols may be mixed with the aliphatic carboxylic acids.
このような溶媒は、通常、反応原料である芳香族化合物
1重量部に対して、5〜50iR量部の量で用いられる
ことが好ましい。It is usually preferable to use such a solvent in an amount of 5 to 50 iR parts per 1 part by weight of the aromatic compound as a reaction raw material.
上記の反応に対する触媒としては、コバルト−マンガン
−臭素系触媒が用いられる。コバルトおよびマンガンは
、通常、反応溶媒に可溶な金属塩たとえば無機塩、酢酸
塩、ナフテン酸塩などとして用いられるが、具体的には
、酢酸コバルト、臭化コバルト、ナフテン酸コバルト、
酢酸マンガン、臭化マンガン、ナフテン酸マンガンなど
として用いられる。また臭素は、反応系に、臭化水素、
臭化ナトリウム、臭化カリウムなどの無機臭素化合物ま
たはテトラブロムエタンなどの有機臭素化合物として、
あるいは臭化コバルト、臭化マンガンなどの形態で添加
される。As a catalyst for the above reaction, a cobalt-manganese-bromine catalyst is used. Cobalt and manganese are usually used as metal salts soluble in the reaction solvent, such as inorganic salts, acetates, naphthenates, etc., but specifically, cobalt acetate, cobalt bromide, cobalt naphthenate,
It is used as manganese acetate, manganese bromide, manganese naphthenate, etc. In addition, bromine is added to the reaction system by hydrogen bromide,
As inorganic bromine compounds such as sodium bromide and potassium bromide or organic bromine compounds such as tetrabromoethane,
Alternatively, it is added in the form of cobalt bromide, manganese bromide, etc.
コバルト化合物は、溶媒100重量部に対してコバルト
金属として0.10〜0.17重量部の量で、そしてマ
ンガン化合物は溶媒100f[fffi部に対してマン
ガン金属として0.0007〜0.0018重量部の量
で用いられることが好ましい。また臭素化合物は、溶媒
1oo重量部に対して臭素原子として少なくとも0.0
465重量部以上好ましくは0.0465〜2.8重量
部の量で用いられることが好ましい。The cobalt compound is used in an amount of 0.10 to 0.17 parts by weight as cobalt metal per 100 parts by weight of solvent, and the manganese compound is added in an amount of 0.0007 to 0.0018 parts by weight as manganese metal per 100 parts by weight of solvent. Preferably, it is used in an amount of 1 part. In addition, the bromine compound is at least 0.0 bromine atom per 10 parts by weight of the solvent.
It is preferably used in an amount of 465 parts by weight or more, preferably 0.0465 to 2.8 parts by weight.
このような特定量でコバルト化合物と、マンガン化合物
と、臭素化合物とを触媒として用いて、前記一般式[N
で示される芳香族化合物を酸化すると、前記一般式[1
1]で示される芳香族カルボン酸化合物を、高純度でか
つ一段で製造することができる。Using such specific amounts of a cobalt compound, a manganese compound, and a bromine compound as catalysts, the formula [N
When the aromatic compound represented by the formula [1] is oxidized, the aromatic compound represented by the formula [1
The aromatic carboxylic acid compound shown in [1] can be produced with high purity in one step.
上記の範囲をはずれた量でコバルト化合物と、マンガン
化合物と、臭素化合物とを用いて前記−般式[I]で示
される芳香族化合物を酸化すると、前記一般式[1]で
示される芳香族カルボン酸化合物を高選択率かつ高収率
で得ることは困難となる。これは、前記一般式[I]で
示される芳香族化合物は分子中にスルホニル基をはじめ
エーテル結合、数多くの芳香核を有しており、選択的に
芳香族側鎖メチル基を酸化することが難しいためである
と考えられる。When the aromatic compound represented by the general formula [I] is oxidized using a cobalt compound, a manganese compound, and a bromine compound in amounts outside the above range, the aromatic compound represented by the general formula [1] It becomes difficult to obtain carboxylic acid compounds with high selectivity and high yield. This is because the aromatic compound represented by the general formula [I] has a sulfonyl group, ether bonds, and numerous aromatic nuclei in the molecule, and it is possible to selectively oxidize the aromatic side chain methyl group. This is probably because it is difficult.
酸化反応に際しては、酸素源として分子状酸素が用いら
れるが、分子状酸素としては純酸素あるいは空気が用い
られる。In the oxidation reaction, molecular oxygen is used as an oxygen source, and pure oxygen or air is used as the molecular oxygen.
反応温度は、50〜350℃好ましくは180〜220
℃であることが望ましい。また反応は常圧下または30
気圧程度までの加圧下のいずれの条件下でも行なうこと
ができる。反応は液相で行なうことが好ましく、反応を
溶媒の沸点以上の温度で行なう場合には、加圧下に行な
うことが好ましい。The reaction temperature is 50-350°C, preferably 180-220°C.
It is desirable that the temperature is ℃. The reaction can be carried out under normal pressure or at 30°C.
It can be carried out under any conditions under pressure up to about atmospheric pressure. The reaction is preferably carried out in a liquid phase, and when the reaction is carried out at a temperature higher than the boiling point of the solvent, it is preferably carried out under pressure.
反応生成物である芳香族カルボン酸は、たとえば反応混
合物を冷却した後、反応混合物に水を添加し、析出する
固体をアルカリ水溶液に溶解させ、次いでこの溶液を酸
性とすることにより固体を析出させて得ることができる
。Aromatic carboxylic acid, which is a reaction product, can be produced by, for example, cooling the reaction mixture, adding water to the reaction mixture, dissolving the precipitated solid in an alkaline aqueous solution, and then making the solution acidic to precipitate the solid. You can get it.
得られた反応生成物は、 H−NMR分析、IR分析、
元素分析などによって構造が決定され、一般式[11で
示されるような芳香族カルボン酸であることが確認され
る。The obtained reaction product was analyzed by H-NMR analysis, IR analysis,
The structure is determined by elemental analysis, etc., and it is confirmed that it is an aromatic carboxylic acid as shown by the general formula [11].
発明の効果
本発明によれば、前記一般式[I]で示されるような化
合物を、脂肪族カルボン酸溶媒中で、特定量のコバルト
−マンガン−臭素系触媒の存在下に分子状酸素によって
液相酸化して、前記一般式[II]で示される芳香族カ
ルボン酸を高純度ですなわち高選択的にかつ一段反応で
経済的に製造することができる。Effects of the Invention According to the present invention, a compound represented by the general formula [I] is liquefied with molecular oxygen in an aliphatic carboxylic acid solvent in the presence of a specific amount of a cobalt-manganese-bromine catalyst. By phase oxidation, the aromatic carboxylic acid represented by the general formula [II] can be produced with high purity, that is, with high selectivity, and economically by a one-step reaction.
以下本発明を実施例により説明するが、本発明はこれら
実施例に限定されるものではない。EXAMPLES The present invention will be explained below with reference to Examples, but the present invention is not limited to these Examples.
実施例1
還流冷却装置、攪拌装置、加熱装置および原料送入口、
ガス導入口、反応物排出口を有するチタン製耐圧反応器
に、酢酸800g、ビス[4−(4−メ。Example 1 Reflux cooling device, stirring device, heating device and raw material inlet,
800 g of acetic acid and bis[4-(4-method) were placed in a titanium pressure-resistant reactor having a gas inlet and a reactant outlet.
チルフェニルスルホニル)フェニル]エーテル80g1
酢酸コバルト3.922g、酢酸マンガン0.0357
g、臭化水素酸0.802gを仕込み、ガス導入口から
窒素を圧入し、圧力を15kg / c−にした後、1
90℃まで昇温した。190℃になったら空気を導入し
、90分反応を行なった。Tylphenylsulfonyl)phenyl]ether 80g1
Cobalt acetate 3.922g, manganese acetate 0.0357
After charging 0.802 g of hydrobromic acid and pressurizing nitrogen from the gas inlet to bring the pressure to 15 kg/c-,
The temperature was raised to 90°C. When the temperature reached 190°C, air was introduced and the reaction was carried out for 90 minutes.
反応終了後、反応混合物を反応器から抜き出して、溶媒
を減圧蒸留により留去した。次いで蒸留残漬に少量の5
%塩酸水溶液を加えてかきまぜながら加熱した後−昼夜
放置した。After the reaction was completed, the reaction mixture was taken out from the reactor, and the solvent was distilled off under reduced pressure. Next, add a small amount of 5 to the distillation residue.
% aqueous hydrochloric acid solution was added and heated while stirring, and then left to stand day and night.
この固形物を固液分離して減圧乾燥したところ、111
.1gの白色結晶が得られた。これを結晶に対して約1
0倍量のアセトンで1回再結晶を行なった。When this solid was separated into solid and liquid and dried under reduced pressure, 111
.. 1 g of white crystals was obtained. This is about 1 for the crystal.
Recrystallization was performed once with 0 times the amount of acetone.
得られた結晶を、液体クロマトグラフィーによ、って分
析して、目的物質てである4、4°−ビス(3,4−ジ
カルボキシフェニルスルホニル)ジフェニルエーテル(
BO2[;)およびその他の不純物(反応中間体および
反応副生成物)を定量した。The obtained crystals were analyzed by liquid chromatography to identify the target substance, 4,4°-bis(3,4-dicarboxyphenylsulfonyl)diphenyl ether (
BO2 [;) and other impurities (reaction intermediates and reaction by-products) were quantified.
また、生成物の色の評価法として、結晶の一部をイソオ
クタンに溶解して280 nmにおける可視吸収スペク
トルを測定して分子吸光係数を求めた。In addition, as a method for evaluating the color of the product, a portion of the crystal was dissolved in isooctane and the visible absorption spectrum at 280 nm was measured to determine the molecular extinction coefficient.
この分子吸光係数の値は低い方が色の良好なことを表わ
し、高いと着色していることを示す。The lower the value of the molecular extinction coefficient, the better the color, and the higher the value, the better the color.
なお、液体クロマトグラフィーの測定条件は次の通りで
ある。Note that the measurement conditions for liquid chromatography are as follows.
カラム:東洋ソーダ■製TSK−ODS−80ゲル4.
6mmX15cm
溶M液:メタノール10.05モル、リン酸−カリウム
(pH4,00)比70/30流 速:0.6ml/分
検出器:UV 245nm
得られた生成物の分析結果は次の通りであった。Column: TSK-ODS-80 gel manufactured by Toyo Soda 4.
6 mm x 15 cm Solution M: 10.05 mol of methanol, phosphate-potassium (pH 4,00) ratio 70/30 Flow rate: 0.6 ml/min Detector: UV 245 nm The analysis results of the obtained product are as follows. there were.
純 度 99.0%
不純物合計 1.0%
分子吸光係数 0゜001
実施例2〜7
実施例1と同一の装置を用いて、コバルト、マンガンお
よび臭素成分の使用量を表1に示したとおりに代えて、
実施例1と同様にして反応を行なった。Purity: 99.0% Total impurities: 1.0% Molecular extinction coefficient: 0°001 Examples 2 to 7 Using the same equipment as in Example 1, the amounts of cobalt, manganese, and bromine components used were as shown in Table 1. Instead of
The reaction was carried out in the same manner as in Example 1.
得られた結果を表1に示す。The results obtained are shown in Table 1.
なお表1には実施例1の結果も併せて示す。Note that Table 1 also shows the results of Example 1.
表1において、コバルト、マンガン、臭素の量は、それ
ぞれ、溶媒100重量部に対するコバルト金属、マンガ
ン金属、臭素原子の重量部を示す。In Table 1, the amounts of cobalt, manganese, and bromine indicate parts by weight of cobalt metal, manganese metal, and bromine atom, respectively, based on 100 parts by weight of the solvent.
比較例1〜6
実施例1と同一の装置を用いて、コバルト、マンガンお
よび臭素成分を1つの成分に注目して実施例1〜7以外
の範囲(いずれも溶媒100重量部に対する重量部)で
反応を行なった。Comparative Examples 1 to 6 Using the same equipment as in Example 1, cobalt, manganese, and bromine components were concentrated in a range other than Examples 1 to 7 (all parts by weight based on 100 parts by weight of the solvent), focusing on one component. The reaction was carried out.
得られた結果をまとめて表2に示した。The obtained results are summarized in Table 2.
Claims (1)
ン酸溶媒中で、コバルト−マンガン−臭素系触媒の存在
下に、分子状酸素によって液相酸化するに際して、溶媒
100重量部に対して、コバルト化合物をコバルト金属
として0.10〜0.17重量部の量で用い、マンガン
化合物をマンガン金属として0.0007〜0.001
8重量部の量で用い、臭素化合物を臭素原子として少な
くとも0.0465重量部以上の量で用いることを特徴
とする、スルホニル基を有する芳香族カルボン酸の製造
方法: ▲数式、化学式、表等があります▼[ I ] (式中、R_1およびR_2はそれぞれ同一であっても
異なっていてもよく、水素または低級アルキル基であり
、nは水素以外の置換基の数であって、0〜4の整数で
ある。)[Claims] 1) When a compound represented by the following formula [I] is subjected to liquid phase oxidation with molecular oxygen in an aliphatic carboxylic acid solvent in the presence of a cobalt-manganese-bromine catalyst, the solvent With respect to 100 parts by weight, the cobalt compound is used in an amount of 0.10 to 0.17 parts by weight as cobalt metal, and the manganese compound is used in an amount of 0.0007 to 0.001 as manganese metal.
A method for producing an aromatic carboxylic acid having a sulfonyl group, which is used in an amount of 8 parts by weight, and a bromine compound is used in an amount of at least 0.0465 parts by weight as a bromine atom: ▲ Numerical formula, chemical formula, table, etc. There is a ).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1219297A JPH0383966A (en) | 1989-08-25 | 1989-08-25 | Production of aromatic carboxylic acid having sulfonyl group |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1219297A JPH0383966A (en) | 1989-08-25 | 1989-08-25 | Production of aromatic carboxylic acid having sulfonyl group |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0383966A true JPH0383966A (en) | 1991-04-09 |
Family
ID=16733290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1219297A Pending JPH0383966A (en) | 1989-08-25 | 1989-08-25 | Production of aromatic carboxylic acid having sulfonyl group |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0383966A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103074032A (en) * | 2011-10-26 | 2013-05-01 | 湖北天马研磨材料有限公司 | Rare earth corundum composite abrasive |
-
1989
- 1989-08-25 JP JP1219297A patent/JPH0383966A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103074032A (en) * | 2011-10-26 | 2013-05-01 | 湖北天马研磨材料有限公司 | Rare earth corundum composite abrasive |
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