JPH0345338A - Nickel-molybdenum composite material and manufacture thereof - Google Patents
Nickel-molybdenum composite material and manufacture thereofInfo
- Publication number
- JPH0345338A JPH0345338A JP17901189A JP17901189A JPH0345338A JP H0345338 A JPH0345338 A JP H0345338A JP 17901189 A JP17901189 A JP 17901189A JP 17901189 A JP17901189 A JP 17901189A JP H0345338 A JPH0345338 A JP H0345338A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- molybdenum
- composite material
- substrate
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Pressure Welding/Diffusion-Bonding (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、ニッケル−モリブデンの複合材、特に、半導
体の基板に用いられるニッケル−モリブデン合金の複合
材に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a nickel-molybdenum composite, particularly a nickel-molybdenum alloy composite used for semiconductor substrates.
[従来の技術]
従来、集積回路(IC)、大規模集積回路(LSI)等
に用いられている半導体は、一般にはシリコンが主流で
あるが、この半導体は、機械的強度が非常に小さく、し
かも、半導体チップの発熱から放散された放熱による変
形を防止することが必要なため、半導体の半導体チップ
をロー付は接合する基板には、半導体チップと近似した
熱膨張係数を有する飼料が用いられていた。例えば、タ
ングステン、モリブデン、銅−モリブデンー銅の複合材
が用いられていた。[Prior Art] Conventionally, silicon has been the mainstream semiconductor used in integrated circuits (ICs), large-scale integrated circuits (LSIs), etc., but this semiconductor has very low mechanical strength and Moreover, it is necessary to prevent deformation due to heat dissipated from the heat generated by the semiconductor chip, so feed having a coefficient of thermal expansion similar to that of the semiconductor chip is used for the substrate to which the semiconductor chip is soldered or bonded. was. For example, tungsten, molybdenum, and copper-molybdenum-copper composites have been used.
[発明が解決しようとする課題]
しかしながら、上述した従来の半導体の半導体チップの
接合に用いられる基板は、半導体としてシリコンが主流
を占めらいる関係上、タングステン、モリブデンが使用
されているが、近年、IC。[Problems to be Solved by the Invention] However, since silicon is the mainstream semiconductor, tungsten and molybdenum are used for the substrates used for bonding the conventional semiconductor chips mentioned above. , I.C.
LSI等の小型化、軽量化が進展し、半導体の材料とし
て、シリコンの他にゲルマニウム(Ge)、m−v族化
合物(AiSb、GaP、GaAs。As LSIs and other devices become smaller and lighter, semiconductor materials such as germanium (Ge), m-v group compounds (AiSb, GaP, GaAs) are being used in addition to silicon.
GaSb等)、II−IV族化合物(Z n S、
Z n Se、ZnTe、CdS等)、及びその他の化
合物(SiC,B1Te5)等が使用されて来ている。GaSb, etc.), II-IV group compounds (ZnS,
ZnSe, ZnTe, CdS, etc.) and other compounds (SiC, B1Te5), etc. have been used.
これらの半導体は、熱膨張係数がタングステン、モリブ
デンを使用している基板と相違するため、半導体の割れ
、亀裂、接合不良等の重大な欠陥を発生させる恐れがあ
った。Since these semiconductors have different thermal expansion coefficients from substrates using tungsten or molybdenum, there is a risk that serious defects such as cracks, cracks, and poor bonding may occur in the semiconductor.
そこで1本発明の技術的課題は、半導体を接合する基板
として、ニッケル−モリブデンを積層したものを用いる
ことによって、各種半導体の有する熱膨張係数に近似し
た膨張係数を有する基板を得ることである。Therefore, one technical problem of the present invention is to obtain a substrate having a thermal expansion coefficient close to that of various semiconductors by using a nickel-molybdenum stack as a substrate to which semiconductors are bonded.
[課題を解決するための手段]
本発明によれば、ニッケルとモリブデンとを積層したこ
とを特徴とするニッケル−モリブデンの複合が得られる
。[Means for Solving the Problems] According to the present invention, a nickel-molybdenum composite characterized by laminating nickel and molybdenum is obtained.
また1本発明によれば、ニッケル板とモリブデン板とを
重合した後、熱間圧延してニッケル−モリブデンの複合
材を製造する方性が得られる。Further, according to the present invention, a nickel-molybdenum composite material can be produced by hot rolling a nickel plate and a molybdenum plate after polymerizing them.
[作用]
ニッケルとモリブデンを圧着法で接合し、ニッケル−モ
リブデンの積層した複合材による基板を製造し、その基
板上に半導体チップをロー付は等の手段により接合する
。[Operation] Nickel and molybdenum are bonded by a pressure bonding method to produce a substrate made of a nickel-molybdenum laminated composite material, and a semiconductor chip is bonded onto the substrate by means such as brazing.
[実施例コ 以下、本発明の一実施例を図面に基づいて詳述する。[Example code] Hereinafter, one embodiment of the present invention will be described in detail based on the drawings.
第1図は、(A)は、2層のニッケル1の間にモリブデ
ン2を挾み、圧着法で接合して製造した積層された複合
材3の断面を示したもので、(B)は、ニッケル1とモ
リブデン2を圧着法で積層して得た複合材3を示したも
のである。In Figure 1, (A) shows a cross-section of a laminated composite material 3 manufactured by sandwiching molybdenum 2 between two layers of nickel 1 and joining them by pressure bonding, and (B) , shows a composite material 3 obtained by laminating nickel 1 and molybdenum 2 by a pressure bonding method.
第2図は、ニッケル板10とモリブデン板20とを以下
の工程により、熱間圧着法によって圧着してニッケル1
0−モリブデン20−ニッケル10の重合された複合材
30を製造したものである。FIG. 2 shows a nickel plate 10 and a molybdenum plate 20 that are bonded together using the hot press method in the following steps.
A composite material 30 was prepared by polymerizing 0-molybdenum 20-nickel 10.
第1に、厚さ1.0關×幅100+nmX長さ150關
のモリブデン板20と厚さ1.0nonX幅110 m
m×長さ170+nmのニッケル板20を2枚用意し、
第2図のように、重合する。First, a molybdenum plate 20 with a thickness of 1.0 mm x width of 100 nm x length of 150 nm and a thickness of 1.0 mm x width of 110 m.
Prepare two nickel plates 20 of m x length 170+nm,
Polymerization occurs as shown in Figure 2.
この重合した部材を水素ガス雰囲気中で750度乃至1
000度に加熱して、圧延率10乃至50%で1回目の
圧延を行う。この圧延でニッケル板10とモリブデン板
20とは完全に密着する。This polymerized member was heated at 750° to 1°C in a hydrogen gas atmosphere.
000 degrees Celsius and perform the first rolling at a rolling ratio of 10 to 50%. By this rolling, the nickel plate 10 and the molybdenum plate 20 are completely brought into close contact with each other.
次に、再度加熱し、圧延率5乃至30%で2回目の圧延
を行う。この2回目以降の圧延は、最終の複合材による
基板の厚さによって任意の回数が繰り返される。ここで
は、最終的に厚さ1゜O+nmX幅110mmX長さ4
90■の熱間圧材30を製造した。Next, it is heated again and rolled a second time at a rolling ratio of 5 to 30%. This second and subsequent rolling is repeated an arbitrary number of times depending on the thickness of the final composite substrate. Here, the final thickness is 1°O+nm x width 110mm x length 4
90 cm of hot pressed material 30 was manufactured.
この圧延材30を厚さ1,0關×幅1.00 mm X
長さ400關に切断し、水素ガスの雰囲気中で900度
に加熱し、表面の酸化物を還元した。This rolled material 30 is 1.0mm thick x 1.00mm wide x
It was cut into lengths of 400 mm and heated to 900 degrees in a hydrogen gas atmosphere to reduce oxides on the surface.
この製造方法で得られた複合材の物理的特性は下記の通
りである。The physical properties of the composite material obtained by this manufacturing method are as follows.
以下余白
[発明の効果]
」二連したように、本発明は、ニッケル−モリブデンを
積層或は重合して得た複合材で半導体を接合する基板を
製造することができる。しかも、その複合材のニッケル
−モリブデンの板厚を比較的自由に変えることによって
、各種の半導体の持つ固有の熱膨張係数に近似した熱膨
張係数を有する複合材を得ることが比較的容易にてき、
従って、この複合材による基板を使用することにより、
半導体と基板との接合時に、半導体の割れ、亀裂、接合
不良等が生じる恐れが少ない。DESCRIPTION OF THE PREFERRED EMBODIMENTS [Effects of the Invention] As stated above, the present invention can manufacture a substrate to which semiconductors are bonded using a composite material obtained by laminating or polymerizing nickel-molybdenum. Furthermore, by relatively freely changing the thickness of the nickel-molybdenum composite material, it is relatively easy to obtain a composite material with a coefficient of thermal expansion that approximates the coefficient of thermal expansion inherent to various semiconductors. ,
Therefore, by using a substrate made of this composite material,
When the semiconductor and the substrate are bonded, there is less risk of cracks, cracks, poor bonding, etc. occurring in the semiconductor.
第コー図は、本発明の積層された複合材の断面図であり
、イは、ニッケル−モリブデン−ニッケルの三層の複合
材を示し、口は、ニッケル−モリブデンの二層の複合材
を示した断面図、第2図は、ニッケル板とモリブデン板
を重合して製造された複合材を示した断面図である。
]・・・ニッケル、2・・・モリブデン、3・・・積層
された複合材、
・・ニッケル板、
0・・・モリブデン
板、
0・・・重合された複合材。Fig. 1 is a cross-sectional view of a laminated composite material of the present invention, where A shows a three-layer composite of nickel-molybdenum-nickel, and a shows a two-layer composite of nickel-molybdenum. FIG. 2 is a cross-sectional view showing a composite material manufactured by polymerizing a nickel plate and a molybdenum plate. ]...Nickel, 2...Molybdenum, 3...Laminated composite material,...Nickel plate, 0...Molybdenum plate, 0...Polymerized composite material.
Claims (1)
るニッケル−モリブデンの複合材。 2、ニッケル板とモリブデン板とを重合した後、熱間圧
延してなることを特徴とするニッケル−モリブデンの複
合材の製造方法。[Claims] 1. A nickel-molybdenum composite material characterized by laminating nickel and molybdenum. 2. A method for producing a nickel-molybdenum composite material, which comprises hot rolling a nickel plate and a molybdenum plate after polymerizing them.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17901189A JPH0345338A (en) | 1989-07-13 | 1989-07-13 | Nickel-molybdenum composite material and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17901189A JPH0345338A (en) | 1989-07-13 | 1989-07-13 | Nickel-molybdenum composite material and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0345338A true JPH0345338A (en) | 1991-02-26 |
Family
ID=16058558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17901189A Pending JPH0345338A (en) | 1989-07-13 | 1989-07-13 | Nickel-molybdenum composite material and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0345338A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61154778A (en) * | 1984-12-27 | 1986-07-14 | Toshiba Corp | Production of composite material |
-
1989
- 1989-07-13 JP JP17901189A patent/JPH0345338A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61154778A (en) * | 1984-12-27 | 1986-07-14 | Toshiba Corp | Production of composite material |
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