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JPH0344142B2 - - Google Patents

Info

Publication number
JPH0344142B2
JPH0344142B2 JP59119369A JP11936984A JPH0344142B2 JP H0344142 B2 JPH0344142 B2 JP H0344142B2 JP 59119369 A JP59119369 A JP 59119369A JP 11936984 A JP11936984 A JP 11936984A JP H0344142 B2 JPH0344142 B2 JP H0344142B2
Authority
JP
Japan
Prior art keywords
film
metal vapor
layer
corrosion
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59119369A
Other languages
Japanese (ja)
Other versions
JPS60262960A (en
Inventor
Hiroshi Narui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oike and Co Ltd
Original Assignee
Oike and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oike and Co Ltd filed Critical Oike and Co Ltd
Priority to JP11936984A priority Critical patent/JPS60262960A/en
Publication of JPS60262960A publication Critical patent/JPS60262960A/en
Publication of JPH0344142B2 publication Critical patent/JPH0344142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Wrappers (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Description

【発明の詳細な説明】 [技術分野] 本発明は電子レンジ用金属蒸着フイルムの製法
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for producing a metal-deposited film for microwave ovens.

[従来技術] 生鮮食品、調理食品、半調理食品などの食品類
のパツク包装容器、駅弁、仕出しの使い捨て弁当
箱、簡易食器などに金属蒸着フイルムを使用して
商品価値を高めることが行なわれている。
[Prior art] Metal-deposited films have been used for food packaging containers such as fresh foods, cooked foods, and semi-cooked foods, station lunches, disposable lunch boxes for caterers, and simple tableware to increase product value. There is.

一方電子レンジにより前記のごとき包装食品を
加熱調理することが普及している。
On the other hand, it has become popular to heat and cook packaged foods such as those described above using a microwave oven.

しかし金属蒸着フイルム製の容器などを電子レ
ンジに入れて加熱するとスパークを生じるという
問題がある。
However, there is a problem in that when a container made of metallized film is heated in a microwave oven, sparks are generated.

そのため金属蒸着フイルムを軟化状態で縦横に
延伸して金属蒸着層を微小な領域に分割してスパ
ークを防止することが提案されている。
Therefore, it has been proposed to stretch the metal-deposited film in a softened state vertically and horizontally to divide the metal-deposited layer into minute regions to prevent sparks.

しかしながら、この延伸法によるときは金属蒸
着層が白化して金属光沢が損なわれ、またフイル
ムと金属蒸着層との界面でスベリが生じるため密
着性が極度にわるくなるなどの問題がある。
However, when using this stretching method, there are problems such as whitening of the metal vapor deposited layer, which impairs the metallic luster, and slippage occurring at the interface between the film and the metal vapor deposited layer, resulting in extremely poor adhesion.

[発明の目的] 本発明の目的は前記の点に鑑みて、金属蒸着フ
イルムの金属光沢、耐久性などを損ねることなく
電子レンジでの使用に適した金属蒸着フイルムの
製法を提供せんとするものである。
[Object of the Invention] In view of the above-mentioned points, the object of the present invention is to provide a method for manufacturing a metallized film suitable for use in a microwave oven without impairing the metallic luster, durability, etc. of the metallized film. It is.

[発明の構成] 本発明は、耐食性の印刷模様を形成した合成樹
脂フイルムの該印刷模様の側に全面に金属蒸着層
を形成し、該金属蒸着層の面上に耐食膜を該耐食
膜が微小な間隙でもつて隔てられた相互に不連続
な小領域に分割されるように形成し、ついでエツ
チング液で処理して耐食膜の存在しない部分の金
属蒸着層を除去することによつて、前記フイルム
面上に相互に不連続な小領域に規則的に分割さ
れ、かつ該各小領域の面積が0.01〜25mm2であり、
隣接する小領域間の間隙が0.1〜2mmである金属
蒸着層を形成することを特徴とする電子レンジ用
金属蒸着フイルムの製法に関する。
[Structure of the Invention] The present invention involves forming a metal vapor deposited layer on the entire surface of a synthetic resin film on which a corrosion resistant printed pattern is formed, and forming a corrosion resistant film on the surface of the metal vapor deposited layer. The metal vapor deposition layer is formed so as to be divided into mutually discontinuous small regions separated by minute gaps, and then treated with an etching solution to remove the metal vapor deposited layer in the areas where no corrosion resistant film is present. The film surface is regularly divided into mutually discontinuous small regions, and each small region has an area of 0.01 to 25 mm2 ,
The present invention relates to a method for producing a metal-deposited film for microwave ovens, characterized in that a metal-deposited layer is formed with a gap between adjacent small regions of 0.1 to 2 mm.

[発明の効果] 本発明においては前記のごとくエツチング法に
より小領域に分割された金属蒸着層を形成してい
るから、従来例におけるごとき延伸による白化、
フイルムと金属蒸着層との界面におけるスベリが
生じる余地がなく、金属光沢および耐久性がすぐ
れしかもスパークが防止された電子レンジ用金属
蒸着フイルムがえられる。
[Effects of the Invention] In the present invention, the metal vapor deposited layer divided into small regions is formed by the etching method as described above, so that whitening due to stretching as in the conventional example,
A metal-deposited film for microwave ovens which has no possibility of slippage at the interface between the film and the metal-deposited layer, has excellent metallic luster and durability, and is prevented from sparking can be obtained.

さらに本発明においてはつぎのごとき特有な効
果が奏される。すなわち従来例ではフイルム面上
に金属蒸着層を設け、これを延伸して金属蒸着層
に亀裂を発生させることによつて金属蒸着層を小
領域に分割するものであるから、金属蒸着層を任
意の模様(文字、図形、記号などを含む、以下同
様)状に形成したり、容器などにしたばあいに内
部が透視できるように金属蒸着層を設けない窓部
分を形成することが困難であるか実質上不可能で
ある。
Furthermore, the present invention provides the following unique effects. In other words, in the conventional method, a metal vapor deposited layer is provided on the film surface, and the metal vapor deposited layer is divided into small regions by stretching and creating cracks in the metal vapor deposited layer. It is difficult to form a pattern (including letters, figures, symbols, etc., the same shall apply hereinafter), or to form a window part without a metal vapor deposition layer so that the inside can be seen through when used as a container. or virtually impossible.

これに対して本発明では小領域に分割されてい
る金属蒸着層を模様状に形成したいばあいは模様
の部分を予め耐食膜(前記のごとく小領域に分割
されているもの)で被覆しておけばよく、窓部分
を形成したばあいにはその部分を耐食膜で被覆し
ないでおけばよく、任意に金属蒸着層の模様や窓
部分を形成することができる。
On the other hand, in the present invention, when it is desired to form a metal vapor deposited layer divided into small regions into a pattern, the patterned portions are covered in advance with a corrosion-resistant film (divided into small regions as described above). If a window portion is formed, it is sufficient that the portion is not covered with a corrosion-resistant film, and the pattern of the metal vapor deposited layer and the window portion can be formed as desired.

さらに本発明では合成樹脂フイルムとして耐食
性の印刷模様を設けたものを使用することによつ
て、この印刷模様と前記金属蒸着模様との組合せ
模様をうることができる。しかし従来例では前記
のごとく金属蒸着模様をうることが困難で、しか
も延伸により印刷模様にゆがみが生じるから、本
発明におけるごとき印刷模様と金属蒸着模様との
組合せをうることは非常に困難である。
Further, in the present invention, by using a synthetic resin film provided with a corrosion-resistant printed pattern, it is possible to obtain a combination pattern of this printed pattern and the metal vapor deposition pattern. However, in the conventional example, it is difficult to obtain a metal vapor deposition pattern as described above, and furthermore, the printed pattern is distorted due to stretching, so it is extremely difficult to obtain a combination of a printed pattern and a metal vapor deposition pattern as in the present invention. .

このように本発明によるときは装飾効果のきわ
めてすぐれた電子レンジ用金属蒸着フイルムをう
ることができる。
As described above, according to the present invention, it is possible to obtain a metal-deposited film for microwave ovens which has an extremely excellent decorative effect.

[実施態様] つぎに図面にもとづいて本発明の方法を説明す
る。
[Embodiment] Next, the method of the present invention will be explained based on the drawings.

第1A図および第1B図、ならびに第2A図お
よび第2B図は本発明の方法の一実施例を工程順
に示す説明図であり、第1A図および第2A図は
各工程でえられるフイルム状物の拡大部分平面
図、第1B図および第2B図はそれぞれ対応する
拡大部分断面図である。なお第1A〜1B図およ
び第2A〜2B図は小領域に分割された金属蒸着
層を説明するものであるため、これら図面におい
ては耐食性印刷模様は省略している。
FIGS. 1A and 1B, and FIGS. 2A and 2B are explanatory diagrams showing an embodiment of the method of the present invention in the order of steps, and FIGS. 1A and 2A show film-like products obtained in each step. FIGS. 1B and 2B are enlarged partial cross-sectional views, respectively. Note that since FIGS. 1A to 1B and 2A to 2B illustrate the metal vapor deposited layer divided into small regions, the corrosion-resistant printed pattern is omitted in these drawings.

まず第1A図および第1B図に示されるごと
く、合成樹脂フイルム1の片面上の全面に金属蒸
着層2を形成し、そのうえに耐食膜3をそれぞれ
微小な間隙Wでもつて隔てられた相互に不連続な
多数の小領域3aに分割されるように形成する。
第1A図では耐食膜3の存在しない部分が格子状
のパターンを形成しており、その部分では金属蒸
着層2が露出している。なお後述するごとく、前
記のように小領域3aに分割されている耐食膜3
はそれ全体として模様状に形成してもよい。
First, as shown in FIGS. 1A and 1B, a metal vapor deposited layer 2 is formed on the entire surface of one side of a synthetic resin film 1, and then a corrosion-resistant film 3 is formed discontinuously and separated from each other by a minute gap W. It is formed so as to be divided into a large number of small regions 3a.
In FIG. 1A, the portions where the corrosion-resistant film 3 is not present form a lattice-like pattern, and the metal vapor deposited layer 2 is exposed in those portions. As will be described later, the corrosion-resistant film 3 is divided into small regions 3a as described above.
may be formed into a pattern as a whole.

ついで第2A図および第2B図に示されるごと
く、前記でえられたフイルム状物をエツチング処
理に付すと、耐食膜で被覆されていない小領域3
aの間の間隙Mの部分の金属蒸着層2が溶解除去
され、その結果前記間隙Wでもつて隔てられた相
互に不連続な多数の小領域4aが集合したところ
の金属蒸着層4が形成され、本発明の電子レンジ
用金属蒸着フイルムがえられる。
Next, as shown in FIGS. 2A and 2B, when the film-like material obtained above is subjected to an etching process, small areas 3 not covered with the corrosion-resistant film are formed.
The metal vapor deposited layer 2 in the gap M between a is dissolved and removed, and as a result, a metal vapor deposit layer 4 is formed in which a large number of mutually discontinuous small regions 4a separated by the gap W are aggregated. , the metal-deposited film for microwave ovens of the present invention can be obtained.

金属蒸着層4の分割された小領域4aの大きさ
はスパークを防止する点からは25mm2以下、なかん
づく1mm2以下とするものが好ましい。小領域4a
の面積の下限値はとくに制限されないが、良好な
金属光沢をうるためおよび小領域4aの形成のし
やすさの点から0.01mm2以上とするのが好ましい。
小領域4aの平面形状はすべて同じにするのが製
造上は有利であるが、異なつていてもよい。隣接
する小領域4a間の間隙Wは0.1〜2mm、なかん
づく0.1〜0.2mmの範囲の範囲…とするのが好まし
い。間隙Wが0.1mmより小さいとスパークを充分
に防止することができず、また製造時に間隙部分
の蒸着金属を完全に除去することができない。間
隙Wが2mmより大きいと金属光沢が充分でなくな
る。
The size of the divided small regions 4a of the metal vapor deposited layer 4 is preferably 25 mm 2 or less, particularly 1 mm 2 or less, from the viewpoint of preventing sparks. Small area 4a
Although the lower limit of the area is not particularly limited, it is preferably 0.01 mm 2 or more in order to obtain good metallic luster and to facilitate the formation of the small area 4a.
Although it is advantageous in manufacturing that the planar shapes of the small regions 4a are all the same, they may be different. The gap W between adjacent small areas 4a is preferably in the range of 0.1 to 2 mm, particularly in the range of 0.1 to 0.2 mm. If the gap W is smaller than 0.1 mm, sparks cannot be sufficiently prevented, and the deposited metal in the gap cannot be completely removed during manufacturing. If the gap W is larger than 2 mm, the metallic luster will not be sufficient.

金属蒸着は常法によつて行なえばよく、真空蒸
着法、スパツタリング法、イオンプレーテイング
法などがいずれも採用される。蒸着金属の種類も
とくに制限されず、たとえばアルミニウム、亜
鉛、スズ、銅、ニツケル、クロム、金、銀、白
金、これらの2種以上の合金などが適宜用いられ
る。金属蒸着層2の厚さは0.02〜0.2μm程度であ
る。
Metal vapor deposition may be carried out by a conventional method, and vacuum vapor deposition, sputtering, ion plating, etc. are all employed. The type of metal to be deposited is not particularly limited, and for example, aluminum, zinc, tin, copper, nickel, chromium, gold, silver, platinum, alloys of two or more of these metals, and the like can be used as appropriate. The thickness of the metal vapor deposition layer 2 is approximately 0.02 to 0.2 μm.

耐食膜3の形成は通常耐食性の印刷インクを用
いて行なえばよいが、感光性樹脂塗料を用いて形
成してもよい。耐食膜3のコーテイング方法はと
くに限定されず、シルクスクリーン、ロール捺
染、グラビア印刷などの適宜の方法によつて行な
えばよい。耐食膜3のパターンは第1A図および
第1B図に示されるごときパターンに限定される
ものではなく、最終製品における金属蒸着層4の
分割パターンを考慮して適宜きめればよい。
The corrosion-resistant film 3 may normally be formed using a corrosion-resistant printing ink, but it may also be formed using a photosensitive resin paint. The coating method for the corrosion-resistant film 3 is not particularly limited, and may be carried out by an appropriate method such as silk screen, roll printing, or gravure printing. The pattern of the corrosion-resistant film 3 is not limited to the patterns shown in FIGS. 1A and 1B, but may be appropriately determined in consideration of the division pattern of the metal vapor deposited layer 4 in the final product.

耐食膜3の厚さは通常0.5〜3μm、好ましくは
0.5〜1.5μmとされる。耐食膜3の厚さを0.5μm未
満にするときは均一な厚さのコーテイング層がえ
られず、耐食性の不充分なところが生じる惧れが
あり、一方耐食膜3の厚さを3μmより大きくにす
るときは耐食膜3を微細なパターンで形成するの
が困難となる。
The thickness of the corrosion-resistant film 3 is usually 0.5 to 3 μm, preferably
It is considered to be 0.5 to 1.5 μm. If the thickness of the corrosion-resistant film 3 is less than 0.5 μm, a coating layer with a uniform thickness may not be obtained, and there is a risk that some areas may have insufficient corrosion resistance; In this case, it becomes difficult to form the corrosion-resistant film 3 in a fine pattern.

エツチング液としては通常のものが用いられ、
たとえばフツ化水素酸、硫酸などの酸類、水酸化
ナトリウム、水酸化カリウムなどのアルカリ類の
水溶液が蒸着金属の種類に応じて適宜使用され
る。
A normal etching solution is used,
For example, aqueous solutions of acids such as hydrofluoric acid and sulfuric acid, and alkalis such as sodium hydroxide and potassium hydroxide are used as appropriate depending on the type of metal to be deposited.

エツチング処理は浸漬法、シヤワリング法のい
ずれによつても行なうことができ、要すれば加温
して行なつてもよい。
The etching treatment can be carried out by either a dipping method or a showering method, and may be carried out by heating if necessary.

合成樹脂フイルム1としては、電子レンジにお
ける加熱時に容易に変形しない程度の耐熱性を有
する耐食性のものであればとくに制限されず用い
られ、たとえばポリエステル、ポリプロピレン、
ポリカーボネートなどがあげられる。フイルム1
の厚さは製品の用途により6μ〜3mm程度の範囲
から適宜選択される。本発明におけるフイルムと
はかかる厚いシート状物をも含む概念である。フ
イルム1は透明でもよく、不透明であつてもよ
い。フイルム1を通して金属蒸着層4を見るよう
な使用形態で用いるばあいは透明にする。
The synthetic resin film 1 can be used without particular limitation as long as it has heat resistance and corrosion resistance to the extent that it does not easily deform when heated in a microwave oven, such as polyester, polypropylene,
Examples include polycarbonate. film 1
The thickness is appropriately selected from a range of approximately 6 μm to 3 mm depending on the intended use of the product. The term "film" in the present invention includes such thick sheet-like materials. The film 1 may be transparent or opaque. When used in a manner in which the metal vapor deposited layer 4 is viewed through the film 1, it is made transparent.

金属蒸着層4の側には通常トツプコート層を設
けるのが好ましい。
It is usually preferable to provide a top coat layer on the metal vapor deposited layer 4 side.

つぎに金属蒸着模様と印刷模様との組合せにつ
いて説明する。
Next, a combination of a metal vapor deposition pattern and a printed pattern will be explained.

第3図は前記実施態様の一実施例を示す平面図
であり、第4図は第3図のX−X線拡大断面図、
第5図は第3図のY−Y線拡大断面図である。第
3図は第4〜5図におけるフイルムを上から見た
図に相当する。第3〜5図に示されるフイルムは
銀色部10、赤色金属光沢部11、青色金属光沢
部12、青色部13および無色透明部14からな
つている。
FIG. 3 is a plan view showing an example of the embodiment, and FIG. 4 is an enlarged sectional view taken along the line X-X of FIG.
FIG. 5 is an enlarged sectional view taken along the line Y--Y in FIG. 3. FIG. 3 corresponds to the top view of the film in FIGS. 4 and 5. The film shown in FIGS. 3 to 5 consists of a silver part 10, a red metallic luster part 11, a blue metallic luster part 12, a blue part 13, and a colorless transparent part 14.

銀色部10は銀色を呈する金属蒸着層4のみが
設けられている。赤色金属光沢部11は赤色イン
ク層20と金属蒸着層4とが設けられている。青
色金属光沢部12は青色インク層21と金属蒸着
層4とが設けられている。青色部13は青色イン
ク層21のみが設けられている。無色透明部14
は何らの層も設られていない部分である。なお前
記各金属蒸着層4の裏面には耐食膜3が設けられ
ている。図示されていないが、金属蒸着層4はす
べて第2A図および第2B図に示されるごとく小
領域4aに分割されている。
The silver portion 10 is provided with only the metal vapor deposited layer 4 exhibiting a silver color. The red metallic gloss portion 11 is provided with a red ink layer 20 and a metal vapor deposition layer 4. The blue metallic gloss portion 12 is provided with a blue ink layer 21 and a metal vapor deposition layer 4. In the blue portion 13, only the blue ink layer 21 is provided. Colorless transparent part 14
is a part without any layer. Note that a corrosion-resistant film 3 is provided on the back surface of each of the metal vapor deposited layers 4. Although not shown, all of the metal vapor deposited layer 4 is divided into small regions 4a as shown in FIGS. 2A and 2B.

前記フイルムは第6〜8図に示されるごとき工
程を経て製造される。なお第6〜8図はそれぞれ
第3図のX−X線拡大断面図に相当するものであ
る。
The film is manufactured through the steps shown in FIGS. 6-8. Note that FIGS. 6 to 8 each correspond to an enlarged sectional view taken along the line X--X in FIG. 3.

まず第6図に示されるごとく、透明なフイルム
1上に赤色インク層20および青色インク層21
を形成する。これらインク層の形成は耐食性の印
刷インクを用いる。
First, as shown in FIG. 6, a red ink layer 20 and a blue ink layer 21 are placed on a transparent film 1.
form. Corrosion-resistant printing ink is used to form these ink layers.

つぎに第7図に示されるごとく、前記インク層
を設けたフイルム面上に全面に金属蒸着層2を形
成する。
Next, as shown in FIG. 7, a metal vapor deposition layer 2 is formed on the entire surface of the film on which the ink layer is provided.

つぎに第8図に示されるごとく、残したい部分
の金属蒸着層2のうえにのみ耐食膜3を形成す
る。この耐食膜3は第1A図および第1B図に示
されるごとき微細なパターンに形成されているも
のである。ついでエツチング処理すると耐食膜3
で被覆されていない部分の金属蒸着層2は完全に
溶解除去されると共に、耐食膜3で被覆されてい
る部分の金属蒸着層2も耐食膜3の分割パターン
に対応する部分が溶解除去されて第2A図および
第2B図に示されるごとき不連続な小領域4aに
分割されている金属蒸着層4となる。かくして第
3〜5図に示される金属蒸着フイルムがえられ
る。
Next, as shown in FIG. 8, a corrosion-resistant film 3 is formed only on the portions of the metal vapor deposited layer 2 that are to be left. This corrosion-resistant film 3 is formed into a fine pattern as shown in FIGS. 1A and 1B. Then, when etching treatment is performed, corrosion resistant film 3 is formed.
The parts of the metal vapor deposited layer 2 that are not covered with the corrosion resistant film 3 are completely dissolved and removed, and the parts of the metal vapor deposited layer 2 that are covered with the corrosion resistant film 3 corresponding to the division pattern of the corrosion resistant film 3 are also dissolved and removed. The metal vapor deposited layer 4 is divided into discontinuous small regions 4a as shown in FIGS. 2A and 2B. In this way, the metallized film shown in FIGS. 3 to 5 is obtained.

このようにして電子レンジで加熱してもスパー
クが発生せず、しかも装飾効果のきわめてすぐれ
たフイルムがえられる。このフイルムにも用途に
より金属蒸着層4のある側にトツプコート層を設
ける。
In this way, it is possible to obtain a film that does not generate sparks even when heated in a microwave oven and has an excellent decorative effect. This film is also provided with a top coat layer on the side where the metal vapor deposited layer 4 is located, depending on the purpose.

本発明の金属蒸着フイルムはそれ自体であるい
は他のフイルム類とラミネートして電子レンジ用
の各種包装、容器の材料として好適に用いられ
る。
The metallized film of the present invention can be suitably used as a material for various packages and containers for microwave ovens, either by itself or by laminating with other films.

[実施例] つぎに実施例をあげて本発明を説明する。[Example] Next, the present invention will be explained with reference to Examples.

実施例 1 第3〜5図に示される金属蒸着フイルムを製造
した。
Example 1 A metallized film shown in FIGS. 3 to 5 was manufactured.

まず第6図に示されるごとく厚さ12μのポリエ
ステルフイルムの片面上に耐食性のグラビアイン
クを用いてグラビア印刷して赤色インク層20と
青色インク層21を形成した。
First, as shown in FIG. 6, a red ink layer 20 and a blue ink layer 21 were formed by gravure printing on one side of a polyester film having a thickness of 12 μm using a corrosion-resistant gravure ink.

つぎに第7図に示されるごとくインク層を形成
したフイルム面の全面にアルミニウムを真空蒸着
して厚さ0.50μmのアルミニウム蒸着層2を形成
した。
Next, as shown in FIG. 7, aluminum was vacuum-deposited on the entire surface of the film on which the ink layer had been formed, to form an aluminum-deposited layer 2 having a thickness of 0.50 μm.

つぎに第8図に示されるごとく、後に溶解除去
しない部分のアルミニウム蒸着層2上に耐食性の
グラビアインクを印刷して第1A図および第1B
図に示されるごときパターンの耐食膜3を形成し
た。耐食膜3の小領域3aは1mm×1mmの大きさ
の正方形とし、隣接する小領域3aの間隙Wは
0.2mm、厚さは1μmとした。
Next, as shown in FIG. 8, a corrosion-resistant gravure ink is printed on the portions of the aluminum vapor deposited layer 2 that will not be dissolved and removed later, as shown in FIGS. 1A and 1B.
A corrosion-resistant film 3 having a pattern as shown in the figure was formed. The small area 3a of the corrosion-resistant film 3 is a square with a size of 1 mm x 1 mm, and the gap W between adjacent small areas 3a is
The thickness was 0.2 mm and the thickness was 1 μm.

ついで前記のフイルム状物をフツ化水素酸の1
重量%溶液中に浸漬してエツチング処理し、その
のち充分に水洗いしたのち乾燥した。このエツチ
ング処理により、耐食膜3で被覆していない部分
のアルミニウム蒸着層2が完全に溶解除去される
とともに、耐食膜3で被覆されている部分のアル
ミニウム蒸着層2も耐食膜3の分割パターンに対
応する部分が溶解除去されて不連続な小領域4a
に分割されたアルミニウム蒸着層4が形成され
た。
Then, the above film-like material was diluted with hydrofluoric acid.
It was etched by immersing it in a wt% solution, then thoroughly washed with water, and then dried. Through this etching process, the parts of the aluminum vapor deposited layer 2 that are not covered with the corrosion resistant film 3 are completely dissolved and removed, and the parts of the aluminum vapor deposited layer 2 that are covered with the corrosion resistant film 3 are also formed into the divided pattern of the corrosion resistant film 3. A discontinuous small region 4a where the corresponding portion is dissolved and removed
An aluminum vapor deposited layer 4 divided into two parts was formed.

ついでアルミニウム蒸着層4のある側にメラミ
ン−アルキド樹脂塗料を用いて厚さ3μmのトツプ
コート層を形成した。
Next, a 3 μm thick top coat layer was formed on the side of the aluminum vapor deposited layer 4 using a melamine-alkyd resin paint.

かくしてえられたフイルムを電子レンジ(高周
波出力600W、発振周波数2450MHz)に入れてマ
イクロ波を作用させたところ、スパークはまつた
く発生しなかつた。
When the film thus obtained was placed in a microwave oven (high-frequency output 600W, oscillation frequency 2450MHz) and microwaves were applied, no sparks were generated.

実施例 2 実施例1において、耐食膜3の厚さを0.5μm、
小領域3aの大きさを0.2mm×0.2mm、間隙Wを0.1
mmとしたほかは実施例1と同様にして金属蒸着フ
イルムを作製した。
Example 2 In Example 1, the thickness of the corrosion-resistant film 3 was set to 0.5 μm,
The size of the small area 3a is 0.2 mm x 0.2 mm, and the gap W is 0.1
A metal-deposited film was produced in the same manner as in Example 1 except that the thickness was set to mm.

このフイルムも電子レンジでまつたくスパーク
を発生しなかつた。
This film also did not generate any sparks in the microwave.

【図面の簡単な説明】[Brief explanation of drawings]

第1A図および第1B図、ならびに第2A図お
よび第2B図は本発明の方法の一実施例を工程順
に示す説明図であつて、第1A図および第2A図
は各工程でえられるフイルム状物の拡大部分平面
図、第1B図および第2B図はそれぞれ対応する
拡大部分断面図、第3図は本発明の方法の他の一
実施例でえられる金属蒸着フイルムの平面図、第
4図は第3図のX−X線拡大断面図、第5図は第
3図のY−Y線拡大断面図、第6図〜8図は第3
〜5図に示されるフイルムをうるための各工程で
えられるフイルム状物の拡大断面図である。 (図面の主要符号)、1…合成樹脂フイルム、
2…金属蒸着層、3…小領域に分割されている耐
食膜、3a…耐食膜の小領域、4…小領域に分割
されている金属蒸着層、4a…金属蒸着層の小領
域。
FIGS. 1A and 1B, and FIGS. 2A and 2B are explanatory diagrams showing an embodiment of the method of the present invention in the order of steps, and FIGS. FIG. 1B and FIG. 2B are respectively enlarged partial cross-sectional views of the object; FIG. 3 is a plan view of a metal-deposited film obtained by another embodiment of the method of the present invention; FIG. 4; is an enlarged sectional view taken along the line X-X of Fig. 3, Fig. 5 is an enlarged sectional view taken along the line Y-Y of Fig. 3, and Figs.
FIG. 5 is an enlarged cross-sectional view of a film-like material obtained in each process for obtaining the film shown in FIGS. (Main symbols in the drawing), 1...Synthetic resin film,
2... Metal vapor deposition layer, 3... Corrosion resistant film divided into small regions, 3a... Small region of corrosion resistant film, 4... Metal vapor deposition layer divided into small regions, 4a... Small region of metal vapor deposition layer.

Claims (1)

【特許請求の範囲】 1 耐食性の印刷模様を形成した合成樹脂フイル
ムの該印刷模様の側に全面に金属蒸着層を形成
し、該金属蒸着層の面上に耐食膜を該耐食膜が微
小な間隙でもつて隔てられた相互に不連続な小領
域に分割されるように形成し、ついでエツチング
液で処理して耐食膜の存在しない部分の金属蒸着
層を除去することによつて、前記フイルム面上に
相互に不連続な小領域に規則的に分割され、かつ
該各小領域の面積が0.01〜25mm2であり、隣接する
小領域間の間隙が0.1〜2mmである金属蒸着層を
形成することを特徴とする電子レンジ用金属蒸着
フイルムの製造。 2 前記各小領域の面積が0.01〜1mm2であり、隣
接する小領域間の間隙が0.1〜0.2mmである特許請
求の範囲第1項記載の方法。
[Scope of Claims] 1. A metal vapor deposited layer is formed on the entire surface of a synthetic resin film on which a corrosion resistant printed pattern is formed on the side of the printed pattern, and a corrosion resistant film is formed on the surface of the metal vapor deposited layer so that the corrosion resistant film has minute particles. The film surface is divided into discontinuous small regions separated by gaps, and then treated with an etching solution to remove the metal vapor deposited layer in the areas where no corrosion resistant film is present. forming a metal vapor deposition layer on top of the metal evaporation layer, which is regularly divided into mutually discontinuous small regions, each of which has an area of 0.01 to 25 mm 2 , and a gap between adjacent small regions of 0.1 to 2 mm; Manufacture of a metal-deposited film for microwave ovens characterized by the following. 2. The method according to claim 1, wherein each of the small regions has an area of 0.01 to 1 mm 2 and a gap between adjacent small regions is 0.1 to 0.2 mm.
JP11936984A 1984-06-11 1984-06-11 Manufacture of vapor-deposited metallic film for electronic oven Granted JPS60262960A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11936984A JPS60262960A (en) 1984-06-11 1984-06-11 Manufacture of vapor-deposited metallic film for electronic oven

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11936984A JPS60262960A (en) 1984-06-11 1984-06-11 Manufacture of vapor-deposited metallic film for electronic oven

Publications (2)

Publication Number Publication Date
JPS60262960A JPS60262960A (en) 1985-12-26
JPH0344142B2 true JPH0344142B2 (en) 1991-07-05

Family

ID=14759793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11936984A Granted JPS60262960A (en) 1984-06-11 1984-06-11 Manufacture of vapor-deposited metallic film for electronic oven

Country Status (1)

Country Link
JP (1) JPS60262960A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02142087A (en) * 1988-11-24 1990-05-31 Toyo Metaraijingu Kk Structure for microwave heating
JP6001297B2 (en) * 2012-03-29 2016-10-05 大和製罐株式会社 Container for microwave oven

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754268A (en) * 1980-09-18 1982-03-31 Dainippon Printing Co Ltd Forming method of picture pattern on metal

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5876170U (en) * 1981-11-17 1983-05-23 セイコーインスツルメンツ株式会社 watch dial

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754268A (en) * 1980-09-18 1982-03-31 Dainippon Printing Co Ltd Forming method of picture pattern on metal

Also Published As

Publication number Publication date
JPS60262960A (en) 1985-12-26

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