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JPH0342602A - Production of multicolor display device - Google Patents

Production of multicolor display device

Info

Publication number
JPH0342602A
JPH0342602A JP1178818A JP17881889A JPH0342602A JP H0342602 A JPH0342602 A JP H0342602A JP 1178818 A JP1178818 A JP 1178818A JP 17881889 A JP17881889 A JP 17881889A JP H0342602 A JPH0342602 A JP H0342602A
Authority
JP
Japan
Prior art keywords
light
color filters
display device
photosensitive material
multicolor display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1178818A
Other languages
Japanese (ja)
Inventor
Mitsuru Suginoya
充 杉野谷
Takakazu Fukuchi
高和 福地
Hitoshi Kamamori
均 釜森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP1178818A priority Critical patent/JPH0342602A/en
Publication of JPH0342602A publication Critical patent/JPH0342602A/en
Pending legal-status Critical Current

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  • Optical Filters (AREA)

Abstract

PURPOSE:To form light shielding films only in the spacings between color filters by exposing a photosensitive material from the rear surface of the color filters and developing the material so that the photosensitive material remains only in the spacings between the color filters. CONSTITUTION:The photosensitive material 24 is applied on the front surface of the color filters 13. The photosensitive material 24 is exposed by <= 400nm light from the rear surface of the color filters 13, by which only the photosensitive material 24 in the spacing parts between the color filters 13 is exposed and developed. An optical filter for transmission of UV rays which has spectral characteristics and shuts off >= 400nm light is, therefore, added and the color filters as a mask are exposed by the light past this optical filter in self- alignment. The patterns of the light shielding firms having the high accuracy are formed by the self-alignment only in the spacings between the color filters 13 with the color filters as the photomask in this way.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、カラーフィルターを比、用した多色表示装置
の製造方法に関し、特にコントラスト−にするために光
のもれを防く遮光膜をカラーフィルター間隙部分に形成
した多色表示装置の製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a multicolor display device using a color filter, and in particular to a light shielding film that prevents light leakage in order to improve contrast. The present invention relates to a method of manufacturing a multicolor display device in which a color filter is formed in a gap portion of a color filter.

〔発明の(既要〕[Invention (already required)]

本発明はカラーフィルター」−に感光+’F. +A料
を全面に塗布した後、カラーフィルターをフォトマスク
として400nm以下の光でカラーフィルターの背面よ
り感光性材料を露光し、現像して、カラーフィルター間
隙のみに感光性材料を残存させ遮光膜とする事により、
非常に簡便な方法ながら精度良くカラーフィルター間隙
のみに遮光膜を形成できるものである。
The present invention is a color filter "-" sensitive to +'F. After applying the +A material to the entire surface, the photosensitive material is exposed from the back side of the color filter with light of 400 nm or less using the color filter as a photomask, and developed, leaving the photosensitive material only in the gaps between the color filters and forming a light-shielding film. By doing,
Although it is a very simple method, it is possible to form a light-shielding film only in the gaps between color filters with high precision.

〔従来の技術〕[Conventional technology]

近年、液晶表示装置シよりラーフィルターとのχ■め合
わせにより多色化が進んてきている。それに伴い、:フ
ントラストに代表される画質の向上も著しく、コントラ
スト比を一I−げるため乙こカラーフィルター間隙に遮
光膜を設ill、少しでも光のもれを防く技術が開発さ
れつつある。
In recent years, liquid crystal display devices have become increasingly multicolored due to the combination of color filters. Along with this, there has been a remarkable improvement in image quality, as exemplified by Hunlast, and in order to increase the contrast ratio, a light-shielding film has been installed in the gap between the color filters, and technology has been developed to prevent even the slightest amount of light from leaking. It's coming.

第5図に、カラーフィルターを用いた多色液晶表示装置
の一例を示す。第5図において51はガラスより成る透
明基板、52は透明導電膜より成る電極、53はカラー
フィルターで電着法,染色法,印刷法等により形成され
る。54はカラーフィルターの間隙部分のめに形成され
た遮光膜であり第6図に示す工程にて形成される。第6
図fa)において61は透明基板で62は透明電極、6
3はカラーフィルターで電着性高分子と色素を含む溶液
から電着法により形成される。この基板全面に不ガレソ
ス)・にカーホン等の遮光性物質を混合した感光性材料
64が全面塗布される。第6図(b)においてフォトマ
スク65をカラーフィルターパターンに一致させるよう
にアラインメントし、光66により感光性材料を露光す
る。第6図(clにおいて感光性材料を現像し、カラー
フィルター間隙部分のみを残存させ遮光膜67とする。
FIG. 5 shows an example of a multicolor liquid crystal display device using color filters. In FIG. 5, 51 is a transparent substrate made of glass, 52 is an electrode made of a transparent conductive film, and 53 is a color filter formed by electrodeposition, dyeing, printing, or the like. Reference numeral 54 denotes a light-shielding film formed in the gap between the color filters, and is formed in the process shown in FIG. 6th
In figure fa), 61 is a transparent substrate, 62 is a transparent electrode, and 6
Reference numeral 3 denotes a color filter, which is formed by electrodeposition from a solution containing an electrodepositable polymer and a dye. A photosensitive material 64 made of a mixture of light-shielding material such as carbon fiber and carphone is applied to the entire surface of the substrate. In FIG. 6(b), a photomask 65 is aligned to match the color filter pattern, and the photosensitive material is exposed to light 66. In FIG. In FIG. 6 (cl), the photosensitive material is developed to leave only the gap between the color filters, forming a light-shielding film 67.

第5図に戻り多色1夜品表示装置の製造方法を説明する
と、このようにして形成された遮光膜54を設けた基板
51と透明電極55を設けた基板56を相幻向さセ液晶
57を挾持する事によって多色液晶表示装置が構成され
る。このように構成された多色液晶表示装置はカラーフ
ィルター間隙からの光のもれがなく、コントラストが1
h]」−するものである。
Returning to FIG. 5, to explain the manufacturing method of the multi-color one-night display device, the substrate 51 provided with the light-shielding film 54 formed in this way and the substrate 56 provided with the transparent electrode 55 are placed side by side to form a liquid crystal display device. 57, a multicolor liquid crystal display device is constructed. A multicolor liquid crystal display device configured in this way has no light leakage from the gaps between the color filters and has a contrast of 1.
h]”-.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

第5図および第6図にて説明した多色液晶表示装置の製
造方法においては、カラーフィルター間隙に遮光膜を形
成する際、カラーフィルターのパターンと同しパターン
を有する高い精度のフォI・マスクを必要とする。フォ
トマスクはカラーフィルターパターンが高精細になるに
つれ、欠陥なく作るのが勃しく、それだけ高価なものと
なる。また露光の際もカラーフィルターとフォトマスク
のアラインメントが必要であり、パターンが桔細になれ
ばなるほど技術的に困難となり、装置」二も]−捏上も
複雑になり不良となる確率も高い。
In the manufacturing method of the multicolor liquid crystal display device explained in FIG. 5 and FIG. Requires. As color filter patterns become more precise, it becomes more difficult to make photomasks without defects, which makes them more expensive. Also, alignment of the color filter and photomask is required during exposure, and the finer the pattern, the more technically difficult it becomes, and the more complicated the equipment and fabrication become, the higher the probability of failure.

〔課題を解決するための手段〕[Means to solve the problem]

そこで、本発明は簡便な工程でカラーフィルター間隙の
みに精度良く遮光膜を形成する事を目的とし、カラーフ
ィルレター自イ本をフォトマスクとして、遮光膜をセル
フアラインメントでバターニングする手段として、カラ
ーフィルターに感光性材料を全面塗布し、カラーフィル
ター背面より400nm以下の光で感光性材料を露光す
る事により、カラーフィルター間隙部分の感光性材料の
みが感光され、現像する事により、精度良くカラーフィ
ルター間隙のみに遮光膜が形成されるものである。
Therefore, the purpose of the present invention is to form a light-shielding film with high accuracy only in the gaps between color filters using a simple process. By coating the entire surface of the filter with a photosensitive material and exposing the photosensitive material to light of 400 nm or less from the back of the color filter, only the photosensitive material in the gap between the color filters is exposed and developed, allowing the color filter to be formed with high precision. A light shielding film is formed only in the gap.

〔作用〕[Effect]

現在、多色表示装置用のカラーフィルターとしては加法
混色における3原色、つまり赤,緑,青を使用する事が
多く、その分光特性は第4図に示すように400nm以
下では透過率はほぼ0となっている。すなわら400n
m以下の光に対してはフォトマスクとして用いる事がで
き、セルフアラインメントが可能である事を示している
。しかし、−船釣にレジストの露光に用いる光源は40
0nm以下の光のみを発生ずるものは少ない。光源とし
ては水銀ランプもしくはメタルハライドランプ等が一般
的であるが、例えば高圧水銀ランプの発光スペクトルは
第4図中に示したようにg線(435nm) 、hvA
(405nm) 、i線(365nm)の3種が主なも
のであり、種類によって多少の強弱や広がりを持つ、メ
タルハライドランプの場合は明確な線スペクトルではな
くブロードな広がりを持ったものが多い。もし、光源と
して400nm以下であるi線(365nm)のみで4
00nm以上の光がほとんど発生しない光源が存在すれ
ば、その光源を用いる事で本発明の目的ば遠戚される。
Currently, color filters for multicolor display devices often use the three primary colors of additive color mixture, that is, red, green, and blue, and their spectral characteristics are as shown in Figure 4, with transmittance of almost 0 below 400 nm. It becomes. That's 400n
It can be used as a photomask for light of m or less, indicating that self-alignment is possible. However, - the light source used to expose the resist for boat fishing is 40
There are few that generate only light of 0 nm or less. A mercury lamp or a metal halide lamp is commonly used as a light source. For example, the emission spectrum of a high-pressure mercury lamp is g-line (435 nm), hvA, etc., as shown in Figure 4.
There are three main types: (405 nm) and i-line (365 nm), and they vary in strength and spread depending on the type.In the case of metal halide lamps, they often have a broad spread rather than a clear line spectrum. If only i-line (365 nm), which is 400 nm or less, is used as a light source, 4
If there is a light source that hardly emits light of 00 nm or more, the purpose of the present invention can be achieved by using that light source.

しかし、現実の光源でカラーフィルターをフ第1・マス
クとしてレジストを露光するとg線(435nm)、h
線(405nm)も発生ずるため、特に青のフィルター
は450nm付近を透過するので光のもれが生し、本来
、露光したくないカラーフィルター上の感光性飼料が露
光されてしまい、現像によりカラーフィルター上にも遮
光膜が形成されてしまう。
However, when exposing the resist using a color filter as the first mask using a real light source, G-line (435 nm), H-line
Lines (405nm) are also generated, so blue filters in particular transmit around 450nm, causing light leakage, and the photosensitive material on the color filter, which should not be exposed, is exposed, and the color cannot be removed by development. A light shielding film is also formed on the filter.

そこで、本発明者らは従来の光源に第4図中に示した分
光特性を持つ400nm以上の光を遮断する紫外線透過
光学フィルターを付加し、この光学フィルターを通った
光でカラーフィルターをフォトマスクとしてセルフアラ
インメントで露光する事により、カラーフィルターを通
る光のもれを完全になくす事ができ、高い解像度を得ら
れる事を見出した。この方法によれば、ただ単に紫外線
透過光学フィルターを従来の露光用光源に付加するだけ
で、非常に簡便にカラーフィルター間隙のみに精度良く
遮光膜を形成する事ができ、実用上極めて有用なもので
ある。
Therefore, the present inventors added an ultraviolet transmitting optical filter that blocks light of 400 nm or more and has the spectral characteristics shown in Figure 4 to the conventional light source, and used the light that passed through this optical filter to cover the color filter with a photo mask. We have discovered that by exposing with self-alignment, it is possible to completely eliminate the leakage of light that passes through the color filter, and it is possible to obtain high resolution. According to this method, by simply adding an ultraviolet-transmitting optical filter to a conventional exposure light source, it is possible to form a light-shielding film very easily and accurately only in the gaps between color filters, making it extremely useful in practice. It is.

なお、カラーフィルター間隙に残存した感光性材料に遮
光性を持たせる方法としてはネガ型フォトレジストにカ
ーボン等の遮光性物質を混合したものを感光性材料とし
て塗布する方法や、ネガ型可染性レジストを塗布、露光
、現像した後、黒色染料で染色して遮光性を持たせる方
法等があるが本発明では特に限定されるものではない。
In addition, methods for imparting light-shielding properties to the photosensitive material remaining in the gaps between the color filters include coating a negative photoresist mixed with a light-shielding substance such as carbon as a photosensitive material, or applying a negative-tone dyeable material. There are methods such as applying a resist, exposing it to light, developing it, and then dyeing it with a black dye to impart light-shielding properties, but the present invention is not particularly limited thereto.

〔実施例〕〔Example〕

以下、実施例と比較例を用いて本発明を具体的に説明す
る。
The present invention will be specifically described below using Examples and Comparative Examples.

〔実施例1〕 第1図に本発明による多色液晶表示装置の実施例の断面
図を示す。11はガラスより成る基板、j2はITOか
ら成る透明電極、13ばカラーフィルターで電着性高分
子と色素を含む溶液中で透明電極12に電圧を印加し、
電着さセて形成する。14はカラーフィルター間隙に形
成させた遮光膜で第2図に示す工程にて作製する。第2
図(a)において21はガラス基板で上にITOi3明
電極22とカラーフィルター23が形成されている。そ
の上にカーボンをネガレジストに混合させた感光性材料
24が全面塗布される。第2図(b)において、基板背
面から高圧水銀ランプを光源とし、紫外線透過光学フィ
ルター25を介して光26でカラーフィルターをフォト
マスクとして感光性材料を露光させる。この際、紫外線
透過光学フィルターは薄膜干渉タイプでもガラス中に可
視光吸収物質を混合したタイプでもどららでも良い。第
2図FC)において感光性材料を現像し、カラーフィル
ター間隙部分のみ残存させ遮光膜27を形成する。この
工程の中には精密なフォトマスクも正確なアラインメン
トも不用であり、簡便ながら不良率を大幅に改善できた
。以下、第1図に戻り説明を続けると、このようにして
形成された遮光膜14を持つ基板11と透明電極15を
形成した基板16を相対向させ液晶17を挟持して多色
液晶表示装置を作製した。この多色液晶表示装置は簡便
な方法で作られたにもかかわらず、欠陥による不良もな
く、光のもれが抑えられたコントラストの高いものであ
った。
[Embodiment 1] FIG. 1 shows a sectional view of an embodiment of a multicolor liquid crystal display device according to the present invention. 11 is a substrate made of glass, j2 is a transparent electrode made of ITO, 13 is a color filter, and a voltage is applied to the transparent electrode 12 in a solution containing an electrodepositable polymer and a dye.
Formed by electrodeposition. Reference numeral 14 denotes a light-shielding film formed in the gap between the color filters, which is manufactured by the process shown in FIG. Second
In Figure (a), 21 is a glass substrate on which an ITOi3 bright electrode 22 and a color filter 23 are formed. A photosensitive material 24 in which carbon is mixed with a negative resist is applied over the entire surface. In FIG. 2(b), a high-pressure mercury lamp is used as a light source from the back side of the substrate, and the photosensitive material is exposed to light 26 through an ultraviolet-transmitting optical filter 25 using a color filter as a photomask. In this case, the ultraviolet transmitting optical filter may be of a thin film interference type, a type in which a visible light absorbing substance is mixed into glass, or any other type. In FIG. 2 (FC), the photosensitive material is developed to form a light-shielding film 27, leaving only the gap between the color filters. This process does not require a precise photomask or precise alignment, making it simple and significantly reducing the defective rate. Hereinafter, returning to FIG. 1 and continuing the explanation, the substrate 11 having the light-shielding film 14 formed in this way and the substrate 16 having the transparent electrode 15 formed thereon are opposed to each other and the liquid crystal 17 is sandwiched between them to form a multicolor liquid crystal display. was created. Although this multicolor liquid crystal display device was manufactured using a simple method, it had no defects due to defects, and had high contrast with suppressed light leakage.

〔実施例2〕 実施例1の第1図における遮光膜14を第3図に示す方
法で作製した。第3図(a)において31はガラス基板
で上にITOI明電極32とカラーフィルター33が形
成されている。その上にゼラチン溶液に重クロム酸塩を
混合した可染性の感光性材料34が全面塗布される。第
3図(blにおいて、基板背面からメタルハライドラン
プを光源とし、紫外線透過光学フィルター35を介して
光36でカラーフィルタをフォトマスクとして感光性)
rA I+を緑光させる。
[Example 2] The light shielding film 14 shown in FIG. 1 of Example 1 was produced by the method shown in FIG. 3. In FIG. 3(a), reference numeral 31 denotes a glass substrate on which an ITOI bright electrode 32 and a color filter 33 are formed. A dyeable photosensitive material 34 made of gelatin solution mixed with dichromate is applied over the entire surface. Fig. 3 (In BL, a metal halide lamp is used as a light source from the back of the substrate, and a color filter is used as a photomask for photosensitization using light 36 through an ultraviolet transmitting optical filter 35)
Make rA I+ green.

第3図FC)において感光性飼料を現像し、カラーフィ
ルター間隙部分のみ残在さセる。第3[q(dlにおい
て感光性月1′」を黒色酸性染!4水溶液乙こ浸潤して
黒色に染色して遮光膜37とする。以下、実施例1と同
様に多色液晶表示装置を作製したところ、実施例1と同
様の効果が得られた。
In FIG. 3 (FC), the photosensitive feed is developed, leaving only the gap between the color filters. The third [q (photosensitive 1′ in dl)” is infiltrated with a black acid dye! When produced, the same effects as in Example 1 were obtained.

〔実施例3〕 実施例1の第1図におけるカラーフィルター13を感光
性ゼラチンをパターニングして染料により染色して形成
する染色法により作製した。以下、実施例1と同様に多
色液晶表示装置を作製したところ、実施例1と同様の効
果が得られた。
[Example 3] The color filter 13 shown in FIG. 1 of Example 1 was produced by a dyeing method in which photosensitive gelatin was patterned and dyed with a dye. Hereinafter, a multicolor liquid crystal display device was manufactured in the same manner as in Example 1, and the same effects as in Example 1 were obtained.

〔比較例1〕 実施例1の第2図における紫外線透過光学フィルター2
6なしで直接、光源の光をカラーフィルター背面から当
てて、カラーフィルター間隙のみに遮光膜を形成しよう
としたところ、青のフィルター」二は400nm以上の
光がもれて感光性刊料が商光してしまい、カラーフィル
ター Lにも遮光膜が形成されてしまった。
[Comparative Example 1] Ultraviolet transmitting optical filter 2 in FIG. 2 of Example 1
When I tried to form a light-shielding film only in the gaps between the color filters by shining the light from the light source directly from the back of the color filter without using the blue filter, light of 400 nm or more leaked through the blue filter, causing the photosensitive material to become unusable. A light-shielding film was also formed on the color filter L.

〔発明の効果] 以L、実施例と比較側番こて具体的に説明したように、
本発明による多色表示装置の製造方法は、従来のように
精密なフォトマスクや正確なアラインメンI・を必要と
せず、カラーフィルターをフォトマスクとしてセルフア
ラインメントで精度の高い遮光膜パターンをカラーフィ
ルター間隙のめに形成できる。また、必要とするのは4
00nm以下の光を作り出すための光学フィルターのみ
であるため従来の製造設備を複雑化させる事なく、非常
に簡便に、不良のない、光のもれが防がれた高コンI・
ラスI・の多色表示装置を大量に製造できるものである
[Effects of the Invention] As specifically explained in the following examples and comparative side trowels,
The method for manufacturing a multicolor display device according to the present invention does not require a precise photomask or an accurate alignment member I as in the past, and uses a color filter as a photomask to self-align a highly accurate light-shielding film pattern between the color filter gaps. It can be formed into Also, you need 4
Since it is only an optical filter for producing light of 00nm or less, it does not complicate conventional manufacturing equipment, and is very simple, defect-free, and has high condensation that prevents light leakage.
It is possible to mass-produce multicolor display devices of Las I.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による多色表示装置の断面図、第2図、
第3図は本発明の遮光膜製造工程を示す断面図、第4図
は各フィルターの分光特性と光源の輝度スペクトルを示
す図、第5図は従来の多色表示装置の断面図、第6図は
従来の遮光膜製造工程を示す断面図である。 16、2]、、 31.51.56.61・・・基板1
.5.22.32.52.55.62  ・・透明電極
23、33.53.63・・・カラーフィルター27、
37.54.67・・・遮光膜 57・・・ン夜晶 34、64・・・感光性材料 35・・・紫外線透過光学フィルタ 36、66・・・光 ツメI・マスク 以り
FIG. 1 is a sectional view of a multicolor display device according to the present invention, FIG.
FIG. 3 is a cross-sectional view showing the manufacturing process of the light shielding film of the present invention, FIG. 4 is a view showing the spectral characteristics of each filter and the brightness spectrum of the light source, FIG. 5 is a cross-sectional view of a conventional multicolor display device, and FIG. The figure is a cross-sectional view showing a conventional light-shielding film manufacturing process. 16, 2], 31.51.56.61...Substrate 1
.. 5.22.32.52.55.62...Transparent electrode 23, 33.53.63...Color filter 27,
37.54.67...Light shielding film 57...Night crystals 34, 64...Photosensitive material 35...Ultraviolet transmission optical filters 36, 66...Light claw I mask

Claims (1)

【特許請求の範囲】 [1]カラーフィルターを用いた多色表示装置の製造方
法において、 (1)透明基板上に複数のカラーフィルターを形成する
工程 (2)該カラーフィルター上に感光性材料を全面塗布す
る工程 (3)該カラーフィルターをフォトマスクとして基板の
背面の光源より400nm以下の光で該感光性材料を露
光する工程 (4)現像する事により該感光性材料をカラーフィルタ
ー間隙部分のみに残存させ、遮光膜とする工程 を含む事を特徴とする多色表示装置の製造方法。 [2]前記感光性材料がネガ型フォトレジストに遮光性
物質を混合させたものである事を特徴とする請求項1記
載の多色表示装置の製造方法。 [3]前記感光性材料がネガ型の可染性フォトレジスト
であり、カラーフィルター間隙部分のみに残存させた後
、黒色染料にて染色して遮光膜とする事を特徴とする請
求項1記載の多色表示装置の製造方法。 [4]前記400nm以下の光が光源に400nm以上
の光を遮断し、400nm以下の光を透過する光学フィ
ルターを付加する事によって作り出される事を特徴とす
る請求項1記載の多色表示装置の製造方法。 [5]前記光源が水銀ランプもしくはメタルハライドラ
ンプである事を特徴とする請求項1記載の多色表示装置
の製造方法。 [6]前記カラーフィルターが基板上に互いに絶縁され
て配置された複数の導電層を形成し、次にそれらの導電
層上に、電着性高分子と色素を分散された溶液より、電
着により選択的に形成される事を特徴とする請求項1記
載の多色表示装置の製造方法。
[Claims] [1] A method for manufacturing a multicolor display device using color filters, including the steps of: (1) forming a plurality of color filters on a transparent substrate; (2) applying a photosensitive material on the color filters; (3) Using the color filter as a photomask, the photosensitive material is exposed to light of 400 nm or less from a light source on the back of the substrate. (4) By developing, the photosensitive material is applied only to the gap between the color filters. 1. A method for manufacturing a multicolor display device, comprising the step of leaving a light-shielding film on the screen and forming a light-shielding film. [2] The method for manufacturing a multicolor display device according to claim 1, wherein the photosensitive material is a negative photoresist mixed with a light-shielding substance. [3] The photosensitive material is a negative dyeable photoresist, and after being left only in the gap between the color filters, it is dyed with a black dye to form a light-shielding film. A method for manufacturing a multicolor display device. [4] The multicolor display device according to claim 1, wherein the light of 400 nm or less is produced by adding an optical filter to the light source that blocks light of 400 nm or more and transmits light of 400 nm or less. Production method. [5] The method for manufacturing a multicolor display device according to claim 1, wherein the light source is a mercury lamp or a metal halide lamp. [6] The color filter forms a plurality of conductive layers arranged insulated from each other on a substrate, and then electrodeposition is performed on the conductive layers from a solution in which an electrodepositable polymer and a dye are dispersed. 2. The method of manufacturing a multicolor display device according to claim 1, wherein the multicolor display device is selectively formed by.
JP1178818A 1989-07-10 1989-07-10 Production of multicolor display device Pending JPH0342602A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1178818A JPH0342602A (en) 1989-07-10 1989-07-10 Production of multicolor display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1178818A JPH0342602A (en) 1989-07-10 1989-07-10 Production of multicolor display device

Publications (1)

Publication Number Publication Date
JPH0342602A true JPH0342602A (en) 1991-02-22

Family

ID=16055197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1178818A Pending JPH0342602A (en) 1989-07-10 1989-07-10 Production of multicolor display device

Country Status (1)

Country Link
JP (1) JPH0342602A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7631585B2 (en) 2004-08-31 2009-12-15 Makita Corporation Kickback-inhibiting devices for cutting devices
US7698978B2 (en) 2005-09-15 2010-04-20 Makita Corporation Cutting devices
JP2016540900A (en) * 2013-11-18 2016-12-28 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH Multifunctional layer manufacturing method, electrophoresis substrate, use of electrophoresis substrate, conversion plate and optoelectronic device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629301A (en) * 1985-07-05 1987-01-17 Kyodo Printing Co Ltd Production of color filter
JPS6214103A (en) * 1985-07-11 1987-01-22 Seikosha Co Ltd Production of color filter
JPS63159807A (en) * 1986-12-24 1988-07-02 Seikosha Co Ltd Production of color filter
JPH01145626A (en) * 1987-12-01 1989-06-07 Seiko Instr & Electron Ltd Multicolor display device and production thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629301A (en) * 1985-07-05 1987-01-17 Kyodo Printing Co Ltd Production of color filter
JPS6214103A (en) * 1985-07-11 1987-01-22 Seikosha Co Ltd Production of color filter
JPS63159807A (en) * 1986-12-24 1988-07-02 Seikosha Co Ltd Production of color filter
JPH01145626A (en) * 1987-12-01 1989-06-07 Seiko Instr & Electron Ltd Multicolor display device and production thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7631585B2 (en) 2004-08-31 2009-12-15 Makita Corporation Kickback-inhibiting devices for cutting devices
US7698978B2 (en) 2005-09-15 2010-04-20 Makita Corporation Cutting devices
JP2016540900A (en) * 2013-11-18 2016-12-28 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH Multifunctional layer manufacturing method, electrophoresis substrate, use of electrophoresis substrate, conversion plate and optoelectronic device

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