[go: up one dir, main page]

JPH0330361A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0330361A
JPH0330361A JP1164742A JP16474289A JPH0330361A JP H0330361 A JPH0330361 A JP H0330361A JP 1164742 A JP1164742 A JP 1164742A JP 16474289 A JP16474289 A JP 16474289A JP H0330361 A JPH0330361 A JP H0330361A
Authority
JP
Japan
Prior art keywords
single chip
package
phs
solder
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1164742A
Other languages
Japanese (ja)
Inventor
Iwao Hayase
早瀬 巌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1164742A priority Critical patent/JPH0330361A/en
Publication of JPH0330361A publication Critical patent/JPH0330361A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PURPOSE:To incorporate a semiconductor device properly into a package without deformation even thorugh heating while holding a bonding surface in constant height by forming the plated-heat sink(PHS) of the rear of the single chip of a via hole type high-output GaAs field-effect transistor in a pectinate shape. CONSTITUTION:A single chip 1 is fixed and incorporated into a package 4 by solder 3, but the single chip 1 and a PHS 5 are heated up to approximately the melting point of solder 3 together with the package 4 is that time. The single chip 1, the PHS 5 and the package 4 are expanded through the heating, but the PHS 5 is formed in a pectinate shape even when each thermal expansion coefficient differs, thus absorbing stress due to the difference of thermal expansion by stress-absorbing opening sections 6. The single chip 1 is fixed into the package 4 through solder 3 without bending. Accordingly, the height of a bonding surface is held uniformly.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明はバイアホール型高出力GaAs ft界効果
トランジスタ(以下、VH−H/P  FETと起す)
裏面のプレーテッド・ヒートシンク(以下、PH8と記
す)構造に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] This invention relates to a via-hole type high-power GaAs ft field effect transistor (hereinafter referred to as VH-H/P FET).
This relates to the plated heat sink (hereinafter referred to as PH8) structure on the back surface.

〔従来の技術〕[Conventional technology]

第3図は従来のV)i、)i/P FETのチップ裏面
のPH3構造を示す平面図、第4図は第3図の■と・H
/P FETのチップをパッケージに組込んだ状態を示
す断面図である。
Figure 3 is a plan view showing the PH3 structure on the back side of the chip of the conventional V)i,)i/P FET, and Figure 4 is the ■ and H in Figure 3.
FIG. 3 is a cross-sectional view showing a state in which a /P FET chip is assembled into a package.

図において、(1)はVH−H/P FETの単一チッ
プで、単一チップ(1)はGaAs基板の裏面にPH3
(2)が板状に一体として形成されている。また、単一
チップ(1)はそのソース抵抗及び熱抵抗を低域するた
めに、厚さを50〜60μm程度にし、そのうちの約1
/2の厚さをめっきによって、板状のP HS (2)
を形成している。(3)は半田で、単一チップ(1)の
裏面に形成されたP HS (2)がこの半田(3)を
介してパッケージ(4)に固着され、チップ(1)がパ
ッケージ(4)内に組込まれている。
In the figure, (1) is a single chip of VH-H/P FET, and the single chip (1) has PH3 on the back side of the GaAs substrate.
(2) is integrally formed into a plate shape. In addition, in order to lower the source resistance and thermal resistance of the single chip (1), the thickness is approximately 50 to 60 μm, and approximately 1
/2 thickness by plating, plate-shaped PHS (2)
is formed. (3) is solder, and the PHS (2) formed on the back side of the single chip (1) is fixed to the package (4) via this solder (3), and the chip (1) is attached to the package (4). incorporated within.

次に動作について説明する。単一チップ(1)がパッケ
ージ(4)内に組込まれる際、単一チップ(1)とPH
8(20よパッケージ(4)と共に半田(3)の儀点程
度まで加熱されて、チップ(1)とPH3(2)は熱膨
張する。この熱膨張した単一チップ(1)とP HS 
(2)は半田(3)及びパッケージ(4)と共(こ冷却
される。冷却されると半田(3)はP)[5(2)とパ
ッケージ(4)に固着して、単一チップ(1)をパッケ
ージ(4)に固定する。
Next, the operation will be explained. When the single chip (1) is assembled into the package (4), the single chip (1) and the PH
The chip (1) and PH3 (2) are heated together with the package (4) to the temperature of the solder (3), and the chip (1) and PH3 (2) thermally expand.
(2) is cooled together with solder (3) and package (4). Once cooled, solder (3) sticks to P)[5 (2) and package (4), forming a single chip. (1) is fixed to the package (4).

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体装置は以上のように構成されていたので、
単一チップはパッケージ内に組込まれる際、単一チップ
とPH8がパッケージと共に半田の融点程度まで高温に
加熱されるが、単一チップを構成するGaAs基板とP
H5との熱膨張係数に差異があるので、パッケージ内に
冷却して固着した単一チップは、第4図に示すように熱
膨張によるストレスによって湾曲され、ボンディング面
の高さが変形し、Vl(−H/P FE1’の性能と組
立性を低下させるという問題点があった。
Since conventional semiconductor devices were configured as described above,
When a single chip is assembled into a package, the single chip and PH8 are heated together with the package to a high temperature close to the melting point of solder.
Since there is a difference in the coefficient of thermal expansion from H5, a single chip cooled and fixed in the package is bent by stress due to thermal expansion, as shown in Figure 4, and the height of the bonding surface is deformed, causing Vl (-H/P There was a problem that the performance and assemblability of FE1' were degraded.

この発明は上記のような問題点を解決するためになされ
たもので、V)i・H/)’ FETを加熱しても変形
しないで適正にパッケージに組込むことができると共に
、ボンディング面を一定の高さに保持できる半導体装置
を得ることを目的とする。
This invention was made to solve the above-mentioned problems, and it is possible to properly incorporate a V)iH/)' FET into a package without deforming it even when heated, and to keep the bonding surface constant. The purpose is to obtain a semiconductor device that can be held at a height of .

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体装置は、VH,)i/PFETの
単一チップにおいて、単一チップの裏面のPH8構造が
くし歯状に構成され、このくし歯状の歯部が単一チップ
のGaAs基板の裏面に接合して構成したものである。
In the semiconductor device according to the present invention, in a single chip of VH, It is constructed by joining it to the back side.

〔作用〕[Effect]

この発明におけるVH、H/P FETの単一チップの
GaAs基板の裏面が、くし歯状に構成されたPH5の
歯部のみで接合されて形成され、この山部によってGa
As基板とPH3が一定間隔に分能接合されるため、チ
ップが高温に加熱されても、熱膨張係数の差異によるス
トレスは吸収されて、単一チップの変形は抑制される。
In this invention, the back surface of the single-chip GaAs substrate of the VH, H/P FET is bonded only with the comb-shaped PH5 teeth, and these peaks allow the GaAs substrate to
Since the As substrate and PH3 are bonded at regular intervals, even if the chip is heated to a high temperature, the stress due to the difference in thermal expansion coefficients is absorbed, and deformation of a single chip is suppressed.

〔実施例〕〔Example〕

以下、この発明の一実施例を図に基づいて説明する。第
1図(a)及び(b)はこの発明の一実施例である半導
体装置を示す平面図及び断面図、第2図は第1図の半導
体装置をパッケージ内に組込んだ状態を示す断面図であ
る。
Hereinafter, one embodiment of the present invention will be described based on the drawings. 1(a) and 1(b) are a plan view and a sectional view showing a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a sectional view showing the semiconductor device of FIG. 1 incorporated into a package. It is a diagram.

図において、符号(1ン、(3)及び(4)は従来のも
のと同一または相当部分を示し説明は省略する。
In the drawings, reference numerals (1, 3) and (4) indicate the same or corresponding parts as in the conventional one, and the explanation thereof will be omitted.

(5)はVH・)i/PFETの単一チップ(1)の裏
面に形成されたくし歯状P H51(sa)はくし歯状
PI−1s(5)の歯部で、単一チップ(1)のGaA
s基板の裏面に接合されている。(6)はVH−H/P
 FET単一チップのGaAs基板とくし歯状P HS
 (5)の歯部(5a)が接合してできるストレス吸収
関口部である。
(5) is a comb-shaped PH formed on the back side of the single chip (1) of VH・)i/PFET. H51 (sa) is the toothed part of the comb-shaped PI-1s (5). GaA of
It is bonded to the back surface of the s-substrate. (6) is VH-H/P
FET single chip GaAs substrate and comb-like PHS
This is a stress absorbing gateway formed by joining the teeth (5a) of (5).

以上の様に構成されたP )i S (5)が単一チッ
プ(1)の裏面を形成しており、半田(3)はP HS
 (5)の裏面とパッケージ(4)を固着している。
The P )i S (5) configured as above forms the back side of the single chip (1), and the solder (3)
(5) and the package (4) are firmly attached.

次に動作について説明する。Next, the operation will be explained.

第2図に示されるように単一チップ(1)は半田(3)
でパッケージ(4)内に固着して組込まれるが、その際
単一チツブ(1)とP HS (5)はパッケージ(4
)と共に半田(3)の融点程度まで加熱される。この加
熱によって、単一チップ(1)、P )i S (5)
及びパッケージ(4)は膨張するが、それぞれの膨張係
数に差異があってもPH5(5)はくし歯状に構成され
ているために、ストレス吸収開口部(6)によって熱膨
張の差異によるストレスが吸収される。そして、単一チ
ップ(1)は湾曲せずにパッケージ(4)内に半田(3
)を介して固着され、ボンディング面の高さは均一に保
持される。
A single chip (1) is soldered (3) as shown in Figure 2.
The single chip (1) and the PHS (5) are fixedly assembled into the package (4) in the package (4).
) to about the melting point of solder (3). This heating results in a single chip (1), P )i S (5)
and the package (4) expand, but even if there is a difference in their expansion coefficients, the PH5 (5) has a comb-like structure, so the stress due to the difference in thermal expansion is absorbed by the stress absorbing opening (6). Absorbed. Then, the single chip (1) is soldered (3) in the package (4) without bending.
), and the height of the bonding surface is maintained uniformly.

尚、くし歯状P HS (5)の歯部(5a)の形状は
熱拡散効率が良好なように、単一チップ(1)のGaA
s基板の裏面から左右45度方向に拡がる形状にするこ
とが望ましい。
Note that the shape of the teeth (5a) of the comb-like PHS (5) is such that the GaA of the single chip (1) has a good heat diffusion efficiency.
It is desirable to have a shape that extends in the left and right directions at 45 degrees from the back surface of the s-substrate.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、VH−)1/PFET
の単一チップの裏面のPH5をくし歯状に形成すること
によって、パッケージに組込まれるチップは熱膨張によ
る変形が抑制されて、半導体装置の性能と組立性の向上
に寄与する効果がある。
As described above, according to the present invention, VH-)1/PFET
By forming the PH5 on the back surface of a single chip in a comb-like shape, the chip incorporated in the package is prevented from being deformed due to thermal expansion, which has the effect of contributing to improving the performance and assemblability of the semiconductor device.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)・(b)はこの発明の一実施例に係る半導
体装置を示す平面図及び断面図、第2図は第1図の半導
体装置を組込んだ状態を示す断面図、第3図は従来の半
導体装置を示す平面図、第4図は第3図の半導体装置を
組込んだ状態を示す断面図である。 図において、(1)は単一チップ、(3)は半田、(4
)はパッケージ、(5ンはくシ歯状プレーテッド・ヒー
トシンク、  (5a)はくし歯状プレーテッド・ヒー
トシンクの歯部、(6)はストレス吸収開口部を示す。 なお、 図中、 同一符号は同一、 または相当部分 を示す。 代 理 人 大 岩 増 雄 第1図 イし歯状PH5 第2図 J3田 4 ハ1ツケバン
1(a) and 1(b) are a plan view and a sectional view showing a semiconductor device according to an embodiment of the present invention, FIG. 2 is a sectional view showing a state in which the semiconductor device of FIG. 3 is a plan view showing a conventional semiconductor device, and FIG. 4 is a sectional view showing a state in which the semiconductor device of FIG. 3 is incorporated. In the figure, (1) is a single chip, (3) is solder, (4
) indicates the package, (5-inch comb-tooth plated heat sink, (5a) the teeth of the comb-tooth plated heat sink, and (6) the stress absorption opening. In the figures, the same symbols are Indicates the same or equivalent part. Agent Masuo Oiwa Figure 1 Ishitoto PH5 Figure 2 J3 Field 4 H1 Tsukeban

Claims (1)

【特許請求の範囲】[Claims] バイアホール型高出力GaAs電界効果トランジスタの
単一チップにおいて、前記単一チップの裏面のプレーテ
ッド・ヒートシンク構造が、くし歯状に構成され、この
くし歯状の歯部が前記単一チップのGaAs基板の裏面
に接合して構成された事を特徴とする半導体装置。
In a single chip of a via-hole type high-power GaAs field effect transistor, a plated heat sink structure on the back surface of the single chip is configured in a comb-like shape, and the comb-like teeth are formed on the GaAs field effect transistor of the single chip. A semiconductor device characterized by being configured by being bonded to the back surface of a substrate.
JP1164742A 1989-06-27 1989-06-27 Semiconductor device Pending JPH0330361A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1164742A JPH0330361A (en) 1989-06-27 1989-06-27 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1164742A JPH0330361A (en) 1989-06-27 1989-06-27 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0330361A true JPH0330361A (en) 1991-02-08

Family

ID=15799046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1164742A Pending JPH0330361A (en) 1989-06-27 1989-06-27 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0330361A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5601458A (en) * 1993-08-31 1997-02-11 Yazaki Corporation Electric terminal
US5628652A (en) * 1994-03-22 1997-05-13 Yazaki Corporation Terminal retaining structure for connector
US5783860A (en) * 1996-01-31 1998-07-21 Industrial Technology Research Institute Heat sink bonded to a die paddle having at least one aperture

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5601458A (en) * 1993-08-31 1997-02-11 Yazaki Corporation Electric terminal
US5628652A (en) * 1994-03-22 1997-05-13 Yazaki Corporation Terminal retaining structure for connector
US5664326A (en) * 1994-03-22 1997-09-09 Yazaki Corporation Method of manufacturing metal terminal
US5783860A (en) * 1996-01-31 1998-07-21 Industrial Technology Research Institute Heat sink bonded to a die paddle having at least one aperture

Similar Documents

Publication Publication Date Title
EP0853358A3 (en) Semiconductor laser module having improved metal substrate on peltier element
JP2000150739A (en) Heat sink for electric device and/or electronic device
JPH0330361A (en) Semiconductor device
JPH0541471A (en) Semiconductor integrated circuit device
JP2000349207A (en) Method and device for mounting semiconductor device
JPH104217A (en) Peltier element
JPH11121662A (en) Cooling structure of semiconductor device
JPH01293551A (en) Semiconductor device
JPS59177951A (en) Semiconductor device
JPH0448656U (en)
JPH02187058A (en) Semiconductor device package
JPH02163943A (en) Semiconductor device
JP2004128265A (en) Semiconductor module and plate-like lead
JPS636864A (en) Transistor device
JPH1065072A (en) Heat radiating electrode structure
JP2000349351A (en) Thermoelectric module
JPS6331398Y2 (en)
JPH0846248A (en) Thermoelectric element and its manufacture
JPS63181333A (en) Semiconductor device
JP3982947B2 (en) Heat sink fixing structure
JPS63228650A (en) Cooling device for heating element
JPS63198363A (en) Semiconductor device
JP2944377B2 (en) Heat radiation fin and semiconductor device provided with heat radiation fin
JPH09186281A (en) Lead frame
JPH01187991A (en) Semiconductor laser device