JPH03285325A - Film forming device using laser annealing process - Google Patents

Abstract

PURPOSE:To enable an optical window to be shielded efficiently for avoiding any pollution while enhancing the precision in the film formation process by a method wherein a work is irradiated with laser beams passing through an opening of a window shutter comprising ring type shielding blades overlapped with one another making an angle and specific gaps while the laser beams are scanned by controlling the movement of an X-Y stage. CONSTITUTION:Within a window shutter 70, a multitude of almost ring type shielding blades 72 making vertical gaps concentrically with the central point of an optical window 50 are overlapped with one another making an angle from the larger diameter on the chamber 10 side gradually turning to the small diameter toward the front side while a small size opening 72b letting the laser beams pass therethrough is made on the central point of the shielding blase 72a on the lowermost end. A film is formed, after setting up a work 14 on an X-Y stage 12, by led-in gas i.e., irradiating the work 14 with the laser beam from the optical window 50 through the window shutter 70. Through these procedures, the film formation can be controlled by specifying the irradiating position of the beams and moving the work 14 so that the optical window 50 may be perfectly protected by the window shutter 70 in no danger of any pollution without any fluctuation in the transmittivity at all thereby enabling the film formation process to be performed with high precision.

Description

[Detailed Description of the Invention] (Industrial Application! 1If) The present invention uses a laser annealing method to form a film! A1ν1"
Regarding.

(Conventional technology) Laser annealing technology is used for processing silicon wafers and for liquid crystal displays.
1m 'I'rans 1stor) It is used for manufacturing etc.

This laser annealing applies energy to the surface of the workpiece by irradiating the workpiece with laser light! However, this is used to stabilize the crystallization and physical properties of the surface of the workpiece, and is also used to achieve predetermined film formation conditions by using it simultaneously with film formation in a thin film process.

Film formation using a thin film process has conventionally been performed by placing a substrate in a chamber, using a gas CVI method, a sputtering method, or the like. In this case, when forming a film while applying laser annealing, an optical window is installed in the chamber, and the process is performed while irradiating the laser beam through the optical window, which prevents dirt from adhering to the optical window during film formation. The problem is that it cannot be done.

For this reason, with conventional film deposition equipment that uses laser annealing,
Install a shutter on the optical window to prevent dirt, close the shutter during film formation, open the shutter after film formation, and apply laser annealing, or if laser annealing cannot be performed at the same time, prevent the optical window from becoming dirty. I use it interchangeably.

(Problems to be Solved by the Invention) If the window shutter is not used and laser annealing is unsuccessful as described in item 1, the optical window will become dirty as it is used, so the optical window must be replaced as appropriate. First, there are problems in that the optical window is expensive, which increases costs, and that the laser annealing conditions change because the light transmission conditions of the optical window change during use.

Therefore, the present invention has been made to solve the above-mentioned problems, and its purpose is to provide a laser annealing method that allows film formation to be easily performed at the same time as laser annealing without contaminating the optical window. The purpose is to provide the film-forming equipment used.

(Means for solving problem i!!1) The present invention has the following configuration in order to achieve object 1 above.

That is, a workpiece is placed in a chamber equipped with an optical window, a film is formed in the chamber, and at the same time, a laser beam is irradiated onto the workpiece through the optical window. In a film deposition system using a laser annealing method that performs a simulated process,
Inside the chamber, a plurality of shielding blades formed in a ring shape are arranged in a chevron shape with a predetermined interval between each shielding blade around the optical window! An X-Y stage for supporting a workpiece is installed in the chamber, and an optical system is provided to enter a laser beam perpendicularly into the optical window. The laser beam is characterized by being provided with a control unit that allows the laser beam to pass through the open III section and irradiate the workpiece, and controls the movement of the X-Y stage to scan the laser beam on the workpiece.

(Function) Laser light enters the optical window perpendicularly, passes through the opening of the window shutter, and is irradiated onto the workpiece.

By driving the X-Y stage, the workpiece is moved and the laser beam is scanned over the workpiece. The window shutter protects the optical window from contamination due to adhesion of gas molecules during laser annealing by scattering gas molecules scattered during film formation using shielding blades overlapped with a gap between them.

(Embodiments) Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

FIG. 1 shows the first stage of the process using the laser annealing method according to the present invention.
FIG. 2 is a block diagram showing one embodiment of a return device.

In the figure, 10 is a chamber for accommodating a workpiece, 12 is an X-Y stage installed in the chamber 10, and 13 is a chuck portion for supporting a workpiece 14. J6 is X-Y
A driver 1 drives the stage 12, and a controller 18 controls the driver 16.

The X-Y stage 12 is supported by magnetic levitation and is pulse-controlled by controller rollers 18. Note that a heater is provided in the chuck portions 1 and 3 to preheat the substrate or the like that is the workpiece.

15 is a heating section for preheating.

The first fluid system of the chamber 10 includes a rotary pump 20, a turbo molecular pump 22. It consists of a conductance valve 24, an opening/closing valve 28, and a leak valve 30.

Conductance valve 2/1 is λ°1; empty! l 3
] and be servo controlled.

; 32 is a workpiece] In order to clean the surface of the dish body I4 in advance, a workpiece 1/1 is housed in the workpiece and processed (vacuum the child side to draw it into the sky); 34 is a wave force This is a transport unit 1- for transporting a body 4.

The chamber 10 also includes a plurality of gas lines 40 for film formation.
is connected. 42 is a gas flow meter, and 44 is a mass flow controller 1-roller for adjusting the gas flow.

Note that the set arrangement for film formation in the chamber 10 is such that a S frequency electrode and the like are appropriately arranged according to the CVD method, plasma (:Vl) rr, and shade.

The laser beam is irradiated onto the workpiece 14 inside the chamber 10 through an optical window 50 provided at the top of the chamber 10 .

52 is a continuous wave Ar laser; 54 is a power supply unit for the Ar laser; 56 is an optical system for making the laser beam enter the optical window 50 perpendicularly and focusing it on the workpiece 14; and 58 is an optical system for adjusting the laser beam intensity. A power meter 60 for monitoring is a signal processing system. 62 is a half mirror placed in the optical path of the laser beam.

Laser light emitted from the Ar laser 52 by these optical systems enters the optical window 50 perpendicularly as shown in the figure.

Here, 70 is a window shutter provided in the chamber 10 to protect the optical window 50 from adhesion of gas molecules during film formation. The window shutter 70 is formed by attaching ring-shaped shielding blades to the optical window 50 so as to overlap them.

FIG. 2 shows an enlarged sectional view of the window shutter 70. The window shutter 70 has a plurality of shielding blades 7 formed in a ring shape.
2 concentrically with the center of the optical window 50.

They are stacked in a chevron shape with a gap between the top and bottom.

The shielding blade 72 is attached to the chamber 10 by using a blade having a large diameter on one side and gradually decreasing in diameter as it tapers. The laser beam is shielded by the shielding blade 7.
6. The shielding blade 72a provided at the lowest end has an open I" portion 72b with a small diameter at the center of the shielding blade 72a provided at the lowermost end. 6 The vertically adjacent shielding blades 72 are as shown in the figure. As shown, the shield portions are overlapped and fixed using the studs 74.

FIG. 3 is a view of the window shutter 70 viewed from the bottom side. When the window shutter 7o is viewed from below as shown in the figure, the optical window is completely shielded except for the portion through which the laser beam passes.

Note that the reason for providing a gap between the shielding blades 72 is to maintain a constant high vacuum inside the chamber 10 so that the inside of the window shutter 70 is also exposed to the vacuum. Therefore, it is necessary for the shielding blade 72 to easily create a vacuum inside the window shutter 70 and to prevent gas molecules from jumping into the window shutter 70 during film formation. In the embodiment, the shield portion is set obliquely so that gas molecules flying from the object to be processed toward the optical window 50 are scattered outward. The width of the shielding part of the shielding blade 72, the overlap width of the shielding part, the interval between the shielding blades 72, etc. are determined by calculating the scattering direction of gas molecules by computer H1, and at least within the vicinity of the optical window 50 through which the laser beam passes. can be designed to prevent gas molecules from entering.

During film formation, the laser beam passes through the open part 72F) provided at the center of the shielding blade 72.1, so the gas molecules are scattered by the laser light, and the gas molecules do not jump in from the opening [1 part 72T). Prevented.

In addition, in the case of film forming method V, which is performed by bringing an electrode such as a high-frequency electrode into the chamber 10, such as plasma CVD method, the window shutter 70 is lowered to the ground potential to prevent gas molecules from scattering to the window shutter 70 side. so that the optical window 50
Prevent gas molecules from entering. In addition, the shielding blade 7
The shielding blades 72 are cooled in order to trap the gas molecules colliding with the shielding blades 72. This makes it possible to more effectively suppress gas molecules from entering the window shutter 70.

When forming a film by the laser annealing method using the film forming apparatus of the above embodiment, after placing the workpiece 14 such as a substrate on the X-Y stage 12'', gas is introduced from the gas line 40. At the same time, the laser beam is passed through the optical window 5.
This is done by irradiating the workpiece 14 from 0 through the opening 1'' in the center of the window shutter 70.

In the case of this embodiment, the workpiece 14 is moved to the X-Y stage 12.
Since the object 14 to be processed is moved by supporting it on the second side, the irradiation position of the laser beam is kept constant and the object 14 to be processed is moved.
By moving /l, the laser beam can be irradiated onto any position on the workpiece 14 to form a film while controlling the film formation. Since the optical window 50 is completely protected by the window shutter 70, there is no need to worry about the window becoming dirty.Therefore, since the transmittance of the laser beam may fluctuate, it is possible to perform a film forming process using highly accurate laser annealing. can.

In addition, in the film forming apparatus described in 1., the laser light intensity is constantly monitored by the power meter 58 to compensate for fluctuations in the laser light intensity, and if the laser light intensity decreases, the moving speed of the X-Y stage 12 is adjusted. If the laser beam intensity increases, the X-Y stage 12 is moved at a higher speed.
A control section for controlling the speed of the Y stage 12 is attached.

The intensity of the laser beam may decrease due to the deterioration of the light source section such as the Ar laser 52 with use, or may fluctuate due to other causes. In such a case, a method of compensating by changing the moving speed of the X-Y stage 12 is extremely effective in that it can quickly follow fluctuations in laser light intensity.

Furthermore, according to the method of supporting the workpiece 14 on the X-Y stage 12 and performing laser annealing, the laser light source is The structure of the light source system can be simplified by keeping the system stationary, and since the laser beam enters from a fixed position, the window shutter can be fixed as described above, which prevents the optical window from becoming dirty. It is extremely effective in that it can be done.

Note that in the above example, a spot beam laser beam is used, but if the target is a large workpiece of several tens of centimeters or more, it is also possible to form a film using the Linebee 11. be. In this case, the same effect as in the above example can be achieved by forming the shielding blade into an oval shape and making the portion through which the laser beam passes into an elongated slit shape.

Further, although the above example describes a film forming apparatus using laser annealing, the structure of the window shutter is not limited to a laser annealing apparatus, but can be generally used as a structure of a chamber having an optical window.

The present invention has been variously explained above using preferred embodiments, but the present invention is not limited to these embodiments.
Of course, many modifications can be made without departing from the spirit of the invention.

(Effects of the Invention) According to the film forming apparatus using laser annealing according to the present invention, even when film formation is performed simultaneously with laser annealing, the optical window can be effectively shielded, dirt on the optical window can be prevented, and the optical window can be prevented from becoming dirty. There is no need to replace the laser beam, and the laser beam is always irradiated under constant conditions, making it possible to perform film formation with higher precision.

[Brief explanation of drawings]

FIG. 1 is a block diagram showing an embodiment of a film forming apparatus using laser annealing according to the present invention, FIG. 2 is a sectional view of a window shutter, and FIG. 3 is a bottom view of the window shutter. 10...Chamber, 12...χ-Y stage,
14... Workpiece, 20... Rotary pump, 22... Turbomolecular pump, 32...
Preparatory vacuum chamber, 34...Transportation unit, 40...Gas line, 50...Optical window, 52...Ar laser,
54... Power supply section, 56... Optical system, 58.
...Power meter, 70...Window shutter, 72.
72a... Shielding blade, 72b... Opening, 74
...Stat. 1st 1・' 1371

Claims (1)

[Claims] 1. A workpiece is set in a chamber equipped with an optical window,
In a film forming apparatus using a laser annealing method in which a film is formed in a chamber and a film is formed by irradiating a workpiece with laser light through the optical window at the same time, a film is formed in the chamber facing the optical window. A window shutter is provided in which a plurality of ring-shaped shielding blades are stacked in a chevron shape with a predetermined interval between each shielding blade, and an X-Y stage that supports a workpiece is installed in the chamber. An optical system is provided to make a laser beam enter the optical window perpendicularly, and the laser beam passes through the opening of the window shutter and irradiates the workpiece, and an X-Y stage is controlled to move on the workpiece. A film forming apparatus using a laser annealing method characterized by being provided with a control section that scans laser light.