JPH03258380A - Cleaning device using organic solvent - Google Patents
Cleaning device using organic solventInfo
- Publication number
- JPH03258380A JPH03258380A JP5589790A JP5589790A JPH03258380A JP H03258380 A JPH03258380 A JP H03258380A JP 5589790 A JP5589790 A JP 5589790A JP 5589790 A JP5589790 A JP 5589790A JP H03258380 A JPH03258380 A JP H03258380A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- cleaning
- liquid management
- circuit
- shower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 111
- 239000003960 organic solvent Substances 0.000 title claims description 8
- 238000004821 distillation Methods 0.000 claims abstract description 14
- 238000011084 recovery Methods 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 claims description 53
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 7
- 239000000498 cooling water Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 25
- 238000010586 diagram Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、例えば、プリント基板、電子部品、セラミッ
クス製品、光学ガラス製品、機械加工品等の洗浄に使用
される有機溶剤を使用した洗浄装置に関するものである
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a cleaning device using an organic solvent, which is used for cleaning printed circuit boards, electronic components, ceramic products, optical glass products, machined products, etc. It is related to.
従来のこの種洗浄装置ｌの概略構造は、第１２図に図示
したように、縦長の洗浄槽ｊを備えた装置本体を用い、
垂直方向に上下移動するエレベータｆにバスケラ）ｅを
乗せて洗浄槽ｊ下部で洗浄ａした後、中間位置でペーパ
ー洗浄すを行い、更に上方の乾燥部Ｃで乾燥を行った後
に前記バスケラ）ｅを上昇させて回収する構成にされて
いる。As shown in FIG. 12, the general structure of a conventional cleaning device l of this type uses a device main body equipped with a vertically long cleaning tank j.
The Vasquera) e is placed on an elevator f that moves up and down in the vertical direction, and after washing a in the lower part of the cleaning tank j, it is washed with paper at an intermediate position, and then dried in the drying section C above. It is configured to raise and collect.
なお、洗浄槽ｊ上部には冷却管ｄ１側方にはヒーターｈ
を備えた蒸留槽ｇが配設されている。In addition, there is a heater h on the side of the cooling pipe d1 at the top of the cleaning tank j.
A distillation tank g is provided.
しかし、前記従来の技術の洗浄装置では、次のような問
題点がある。However, the conventional cleaning device has the following problems.
■洗浄槽の上部を開放としであるたぬ、全ての洗浄溶液
を回収することができない構造である。■Since the top of the cleaning tank is open, it is not possible to collect all the cleaning solution.
従って、蒸発と搬送の際の持ち出しが多く、大気対流に
よる放散が大きいため、溶液の消耗が大きい。Therefore, a large amount of solution is taken out during evaporation and transportation, and a large amount of solution is dissipated by atmospheric convection, resulting in large consumption of the solution.
また、溶液の持ち出し、放散によって環境を汚染してい
る。In addition, the environment is polluted by taking the solution out and dissipating it.
■洗浄装置には排気回収処理装置が内蔵されていないた
め、溶液の臭気が激しく、人体に悪影響を与える。■Since the cleaning equipment does not have a built-in exhaust gas recovery treatment device, the odor of the solution is strong and has a negative impact on the human body.
■洗浄から回収までをエレベータ−で垂直方向に行って
いるため、大型化し、処理能力にも限界がある。■Since the process from cleaning to collection is carried out vertically using an elevator, it is large and has a limited processing capacity.
■従来の装置は機構が複雑であり、装置全体の大きさも
太きいた約摸作面で困難があり、故障時のメンテナンス
でも不具合がある。■Conventional devices have complex mechanisms, are difficult to model due to the large size of the device, and have problems with maintenance in the event of a breakdown.
■価格面においても、大型であるため、例えば排気処理
タンクだけで現在３〜４．０００万円し高価なものであ
る。(2) In terms of price, because it is large, the exhaust treatment tank alone currently costs 30,000 to 40,000,000 yen, making it expensive.
■作業工程でフロン等の溶液を使用しているため危険性
の回避が困難である。■Due to the use of solutions such as fluorocarbons in the work process, it is difficult to avoid risks.
等の問題点がある。There are other problems.
そこで、本発明は、上記従来の技術の問題点に鑑み案出
されたもので、洗浄装置からのロス、洗浄液の持ち出し
ロス廃液ロスがなく、排気回収処理も行うように改善し
た有機溶剤を使用した洗浄装置の提供を目的としている
ものである。Therefore, the present invention has been devised in view of the above-mentioned problems of the conventional technology, and uses an improved organic solvent that eliminates loss from the cleaning equipment, removal of cleaning liquid, and waste liquid loss, and also performs exhaust gas recovery treatment. The purpose of this invention is to provide a cleaning device with
上記目的を達成するた約に、本発明における有機溶剤を
使用した洗浄装置においては、槽上部に冷却水Ｗを循環
させる洗浄槽用冷却管１７とシャワーノズル１８を配設
し、槽内には上限フロートＦＳＩを配置すると共に低部
に液管理バルブＭＶ２を備え、ジェット回路遮断バルブ
ＭＶ７と洗浄用ジェットポンプ９とジェット回路遮断バ
ルブＭＶ８を直列に配設した洗浄回路Ｙが設けられ、蓋
１６で完全密閉される構造とされた洗浄槽１０の周囲に
、前記洗浄槽用冷却管ＩＴと連結させて配置された蒸留
槽冷却管２を槽上部に配設し、槽内にはベーパー管理バ
ルブＭＶＩを備えて洗浄槽１０に溶液を供給可能に連結
され、かつ水分分離器３に接続された蒸留槽５と、
蒸留槽５の溶液を受け、水と溶液に分離し、水をシャワ
ータンク４に送る蒸留槽５に接続された水分分離器３と
、
シャワーポンプ１１とシャワー液遮断バルブＭＶ６の直
列回路でシャワーノズル１８に接続され、槽内に下限フ
ロートＰＳ３が配置されたシャワータンク４と、
シャワータンク４に接続され、洗浄槽１０とは液管理回
路Ｘを介して連結された予備タンク１４と、洗浄槽１０
の液管理バルブＭＶ２に液センサーＦＳ２を配置した液
管理サブタンク１９と液管理バルブＭＶ３と三方弁の液
管理バルブＭＶ４を直列に配置すると共に、予備タンク
に三方弁の液管理バルブＭＶ５を接続し、前記液管理バ
ルブＭＶ３ 、ＭＶ４の切替えにより洗浄液管理ポンプ
６を駆動させ、洗浄槽１０又は予備タンク１４へ洗浄液
が供給されるバイパス回路とされた前記液管理回路Ｘと
、
洗浄槽１０に空気Ｓを送る回路と、洗浄槽１０の排気を
水槽１３ａ中に送り、排気処理用ジェットポンプ１２で
排気Ｓ１を処理する回路を有する排気処理タンク１３を
設置した排気回収処理装置とから構成にされている。In order to achieve the above object, in the cleaning device using an organic solvent according to the present invention, a cleaning tank cooling pipe 17 for circulating cooling water W and a shower nozzle 18 are provided in the upper part of the tank, and a shower nozzle 18 is provided in the tank. A cleaning circuit Y is provided in which an upper limit float FSI is arranged, a liquid management valve MV2 is provided at the lower part, and a jet circuit cutoff valve MV7, a cleaning jet pump 9, and a jet circuit cutoff valve MV8 are arranged in series. A distillation tank cooling pipe 2 connected to the cleaning tank cooling pipe IT is arranged at the top of the tank around the cleaning tank 10 which has a completely sealed structure, and a vapor management valve MVI is installed in the tank. a distillation tank 5 which is connected to the cleaning tank 10 so as to be able to supply the solution and is connected to the water separator 3; A water separator 3 connected to a distillation tank 5 to be sent, a shower tank 4 connected to a shower nozzle 18 through a series circuit of a shower pump 11 and a shower liquid cutoff valve MV6, and a lower limit float PS3 disposed in the tank; A reserve tank 14 connected to the tank 4 and connected to the cleaning tank 10 via a liquid management circuit
A liquid management sub-tank 19 with a liquid sensor FS2 arranged in the liquid management valve MV2, a liquid management valve MV3, and a three-way liquid management valve MV4 are arranged in series, and a three-way liquid management valve MV5 is connected to the reserve tank, The cleaning liquid management pump 6 is driven by switching the liquid management valves MV3 and MV4, and the liquid management circuit It is composed of an exhaust gas recovery treatment device equipped with an exhaust treatment tank 13 having a circuit for sending exhaust gas from the cleaning tank 10 into a water tank 13a and treating the exhaust gas S1 with an exhaust treatment jet pump 12.
なお、蒸留槽５にはヒーター８が設置されている。Note that a heater 8 is installed in the distillation tank 5.
本装置で使用される洗浄溶液は、有機溶剤のフロン、１
．１．１ ）リフロールエタン、トリクレン等が使用
されている。The cleaning solution used in this device is an organic solvent called Freon, 1
．． 1.1) Rifluorethane, trichlene, etc. are used.
各作業工程は第２図〜第７図に図示した通りであり、第
１図ａは本装置の作動前、第２図は溶液の供給時（溶液
注入時）、第３図はジェット洗浄時、第４図は洗浄液回
収時（溶液排出時）、第５図シャワー洗浄時、第６図は
ベーパー洗浄時、第７図は乾燥・排気処理時の各作動状
態を表している。Each work process is as shown in Figures 2 to 7. Figure 1a is before operation of this device, Figure 2 is during solution supply (during solution injection), and Figure 3 is during jet cleaning. , Fig. 4 shows the operating states during cleaning liquid recovery (during solution discharge), Fig. 5 during shower washing, Fig. 6 during vapor washing, and Fig. 7 during drying and exhaust processing.
なお、前記各図の太線部分が各作業工程の作動部分を表
している。It should be noted that the thick line portions in each of the above figures represent the operating portions of each work process.
また、第１０図は本装置の電動バルブチャートであり、
第１１図は同じく動作チャートである。In addition, Fig. 10 is an electric valve chart of this device,
FIG. 11 is also an operation chart.
次に、各作業工程を説明する。Next, each work process will be explained.
（１）洗浄物のセラテングー第１図ａを参照。(1) Ceratengu of cleaning items See Figure 1a.
■蓋１６を開け、バスケラ）Ｂを洗浄槽１０内のステー
ジ上にセットし、スタートスイッチＳ１を押す。■ Open the lid 16, set Basquera) B on the stage inside the cleaning tank 10, and press the start switch S1.
（２）溶液の供給時（溶液注入時）−第２図参照。(2) When supplying the solution (when injecting the solution) - see Figure 2.
■液管理バルブＭＶ２〜５が開かれ、洗浄液管理ポンプ
６により予備タンク１４から洗浄槽１０に供給する。(2) The liquid management valves MV2 to MV5 are opened, and the cleaning liquid management pump 6 supplies the cleaning liquid from the reserve tank 14 to the cleaning tank 10.
■上限フロートスイッチＦＳＩの作動により洗浄液管理
ポンプ６停止される。■The cleaning liquid management pump 6 is stopped by the operation of the upper limit float switch FSI.
（３）ジェット洗浄時−第３図参照。(3) During jet cleaning - see Figure 3.
■タイマーＴＩを作動させる。■Activate timer TI.
■ジェット管理遮断バルブＭＶ７．８が開かれ、洗浄用
ジェットポンプ９が作動し、洗浄槽１０内にジェット気
泡を噴出させる。(2) The jet management cutoff valve MV7.8 is opened, the cleaning jet pump 9 is activated, and jet bubbles are spouted into the cleaning tank 10.
■タイムアツプにより洗浄用ジェットポンプ９が停止さ
れる。(2) The cleaning jet pump 9 is stopped due to time-up.
（４）洗浄液回収時（溶液排出時）−第４図参照。(4) When collecting cleaning solution (when discharging solution) - See Figure 4.
■洗浄液管理ポンプ６が作動し、洗浄槽１０内の溶液が
予備タンク１４に戻される。(2) The cleaning liquid management pump 6 operates, and the solution in the cleaning tank 10 is returned to the reserve tank 14.
■フロートスイッチＰＳ２の作動により洗浄液管理ポン
プ６を停止させる。(2) Stop the cleaning liquid management pump 6 by operating the float switch PS2.
（５）シャワー洗浄時−第５図参照。(5) When washing the shower - see Figure 5.
■タイマーＴ２を作動させる。■Activate timer T2.
■シャワータンク４よりシャワーポンプ１１にて洗浄槽
１０内ノズル１８より噴射させる。(2) Spray from the shower tank 4 through the nozzle 18 in the cleaning tank 10 using the shower pump 11.
■タイムアツプにてシャワーポンプ１１を停止させる。■Stop the shower pump 11 at time-up.
（６）ベーパー洗浄時−第６図参照。(6) Vapor cleaning - see Figure 6.
■タイマーＴ３を作動させる。■Activate timer T3.
■電磁バルブのベーパー管理バルブＭＶＩが開き蒸留槽
５内のベーパーが洗浄槽１０内に吐露される。(2) The vapor management valve MVI, which is an electromagnetic valve, opens and the vapor in the distillation tank 5 is discharged into the cleaning tank 10.
■タイムアツプにてベーパー管理バルブＭＶＩが閉じら
れる。■The vapor management valve MVI is closed at time up.
（７）乾燥・排気処理時−第７図参照。(7) During drying and exhaust treatment - see Figure 7.
■タイマーＴ４を作動させる。■Activate timer T4.
■排気処理用ジェットポンプ１２が作動し、洗浄槽１０
内の空気を吸引し排気処理タンク１３の水槽１３ａ内の
水中に回収する。■The jet pump 12 for exhaust treatment operates, and the cleaning tank 10
The air inside is sucked and collected into the water in the water tank 13a of the exhaust treatment tank 13.
■タイムアツプにて排気処理用ジェットポンプ１２が停
止される。(2) The exhaust treatment jet pump 12 is stopped due to time-up.
（８）洗浄終了 ■表示灯・アラームにより終了を報知する。(8) Cleaning completed ■Notify completion with indicator light and alarm.
（９）洗浄物回収
■蓋１６を開はバスケット１５を取り出し、被洗浄物を
取り出す。(9) Collection of cleaning items - Open the lid 16, take out the basket 15, and take out the items to be cleaned.
実施例について図面を参照して説明する。 Examples will be described with reference to the drawings.
第１図から第１１図において、本発明における有機溶剤
を使用した洗浄装置の概略構成は、洗浄回路Ｙを有する
一個の洗浄槽１ｏを中心にしてその周囲に、該洗浄槽１
０と連結される蒸留槽５と、蒸留槽５に接続される水分
分離器３と、シャワーノズル１８に接続するシャワータ
ンク４と、洗浄槽１ｏと液管理回路Ｘを介して接続され
る予備タンク４と、排気処理タンク１３を有する排気回
収処理装置とから構成にされている。1 to 11, the schematic structure of the cleaning apparatus using an organic solvent according to the present invention is centered around one cleaning tank 1o having a cleaning circuit Y, and surrounding the cleaning tank 1o.
0, a water separator 3 connected to the distillation tank 5, a shower tank 4 connected to the shower nozzle 18, and a reserve tank connected to the cleaning tank 1o via the liquid management circuit X. 4 and an exhaust gas recovery treatment device having an exhaust treatment tank 13.
洗浄槽１０は、上縁が人間の胸部程度の高さ位置に配置
されるもので、この槽ｌｏ上部には冷却水Ｗを循環させ
る洗浄槽用冷却管１７とシャワーノズルｌ８とが配設さ
れている。The cleaning tank 10 has an upper edge placed at a height similar to that of a human's chest, and a cleaning tank cooling pipe 17 for circulating cooling water W and a shower nozzle l8 are disposed at the top of the tank lo. ing.
また、前記槽１０内には上限フロー） ＦＳＩが配置さ
れ、低部には液管理バルブＭＶ２が備えられている。Further, an upper limit flow (FSI) is arranged in the tank 10, and a liquid management valve MV2 is provided at the lower part.
更に、洗浄槽１０には、ジェット回路遮断バルブＭＶ７
と洗浄用ジェットポンプ９とジェット回路遮断バルブＭ
Ｖ８を直列に配設した洗浄回路Ｙが設けられている。Furthermore, the cleaning tank 10 is equipped with a jet circuit cutoff valve MV7.
and cleaning jet pump 9 and jet circuit cutoff valve M
A cleaning circuit Y is provided in which V8s are arranged in series.
また、この洗浄槽１０には、臭気や溶液の持ち出しを防
止のため完全密閉された構造とする蓋１６が設けである
。Further, the cleaning tank 10 is provided with a lid 16 having a completely sealed structure to prevent odor and solution from being taken out.
蒸留槽５には、前記洗浄槽用冷却管１７と連結させて配
置された蒸留槽冷却管２が槽上部に配設されてきる。The distillation tank 5 is provided with a distillation tank cooling pipe 2 connected to the cleaning tank cooling pipe 17 at the top of the tank.
また、該槽内にはベーパー管理バルブＭＶＩを備えてい
て、洗浄槽１０に溶液を供給可能に連結され、また水分
分離器３に接続されている。Further, a vapor management valve MVI is provided in the tank, and is connected to the cleaning tank 10 so as to be able to supply a solution, and is also connected to the water separator 3.
水分分離器３は、蒸留槽５の溶液を受け、水と溶液に分
離し、水をシャワータンク４に送水可能に接続されてい
る。The water separator 3 receives the solution in the distillation tank 5, separates it into water and solution, and is connected to the shower tank 4 so as to be able to send the water.
シャワータンク４は、シャワーポンプ１１とシャワー液
遮断バルブＭＶ６の直列回路でシャワーノズル１８に接
続され、槽内に下限フロー） ＦＳ３が配置されている
。The shower tank 4 is connected to the shower nozzle 18 through a series circuit of a shower pump 11 and a shower liquid cutoff valve MV6, and a lower limit flow FS3 is disposed in the tank.
なお、シャワーポンプ１１にはフィルター７が設置され
ている。Note that a filter 7 is installed in the shower pump 11.
予備タンク１４は、シャワータンク４に接続され、また
、洗浄槽１０とは液管理回路Ｘを介して連結されている
。The reserve tank 14 is connected to the shower tank 4, and is also connected to the cleaning tank 10 via a liquid management circuit X.
前記液管理回路Ｘは、洗浄槽１０の液管理バルブＭＶ２
に液センサーＦＳ２を配置した液管理サブタンク１９と
液管理バルブＭＶ３と三方弁の液管理バルブＭＶ４を直
列に配置されている。The liquid management circuit X is a liquid management valve MV2 of the cleaning tank 10.
A liquid management sub-tank 19 in which a liquid sensor FS2 is disposed, a liquid management valve MV3, and a three-way liquid management valve MV4 are arranged in series.
また、予備タンクに三方弁の液管理バルブＭＶ５を接続
してあり、前記液管理バルブＭＶ３ 、ＭＶ４の切替え
により洗浄液管理ポンプ６を駆動させ、洗浄槽１０又は
予備タンク１４へ洗浄液が供給されるＡ回路及び８回路
からなるバイパス回路とされている。A three-way liquid management valve MV5 is connected to the reserve tank, and the cleaning liquid management pump 6 is driven by switching the liquid management valves MV3 and MV4, and the cleaning liquid is supplied to the cleaning tank 10 or the reserve tank 14. It is a bypass circuit consisting of a circuit and eight circuits.
なお、洗浄液管理ポンプ６にはフィルター７が設置され
ている。Note that a filter 7 is installed in the cleaning liquid management pump 6.
排気回収処理装置は、洗浄槽１０に空気を送る回路Ｓと
、洗浄槽１０の排気を水１１１を収容する水槽１３ａ中
に送り、排気処理用ジェットポンプ１２で排気Ｓ１を処
理する回路を有する排気処理タンク１３から構成されて
いる。The exhaust gas recovery processing device includes a circuit S that sends air to the cleaning tank 10, a circuit that sends the exhaust air from the cleaning tank 10 into a water tank 13a containing water 111, and processes the exhaust gas S1 with an exhaust treatment jet pump 12. It is composed of a processing tank 13.
また、この排気処理タンク１３には界面検知フロートＳ
Ｗが設置されている。In addition, an interface detection float S is installed in this exhaust treatment tank 13.
W is installed.
バスケット１５は、洗浄槽１０にすっぽり収まる大きさ
で、籠状に形成されている。The basket 15 is sized to fit completely into the cleaning tank 10 and is shaped like a cage.
また、操作盤２０には、電源Ｓ３、スタートスイッチＳ
Ｌジェット洗浄のタイマーＴ１、シャワー洗浄のタイマ
ーＴ２、ベーパー洗浄のタイマー１３、乾燥・排気処理
のタイマーＴ４、表示灯Ｓ２、アラム音発声装置（図示
省略）が設置されている。The operation panel 20 also includes a power source S3 and a start switch S.
A timer T1 for L-jet cleaning, a timer T2 for shower cleaning, a timer 13 for vapor cleaning, a timer T4 for drying/exhaust processing, an indicator light S2, and an alarm sound device (not shown) are installed.
［発明の効果］
本発明は、上述の通り構成されているので、次に記載す
る効果を奏する。[Effects of the Invention] Since the present invention is configured as described above, it produces the following effects.
■ −個の洗浄槽で全ての洗浄、シャワー洗浄、ベーパ
ー洗浄、乾燥・排気処理の各工程作業ができるため、各
工程では全ての液が回収される。- All cleaning, shower cleaning, vapor cleaning, drying and exhaust processing can be carried out in a single cleaning tank, so all liquid is recovered in each process.
また、蒸発、液の持ち出しがないから溶液の消耗も殆ど
ない。In addition, since there is no evaporation or removal of liquid, there is almost no consumption of the solution.
従って、溶液の大気中への放散がないから安全性が高く
、環境を汚染することがない。Therefore, since the solution does not diffuse into the atmosphere, it is highly safe and does not pollute the environment.
■溶液を一旦液体に戻す排気回収処理装置が内蔵されて
いるため溶液の臭気が皆無となった。■There is no odor from the solution due to the built-in exhaust gas recovery processing device that once returns the solution to liquid form.
■−個の洗浄槽で全ての作業が行われ、洗浄槽の周囲に
各機器が配置されているので、小型化と全自動化が可能
となり、さらに全自動洗濯機と同様な原理で、作業性を
効率化出来るものである。■- All work is done in a single washing tank, and each device is placed around the washing tank, making it possible to downsize and fully automate. This is something that can be made more efficient.
■−個の洗浄槽で各工程が行われるため、搬送工程は不
要となり処理能力が大きくなった。(2) Since each process is carried out in - cleaning tanks, there is no need for a conveyance process, resulting in increased processing capacity.
■低い位置に洗浄槽を配置可能であり、又洗浄槽−個で
全処理可能であるため操作が簡単であり、メンテナンス
が非常に楽である。(1) The cleaning tank can be placed at a low location, and all the processing can be done with just one cleaning tank, so operation is simple and maintenance is very easy.
■排気処理タンクだけで現在３〜４．０００万円するの
に対し、本発明の製品ではその半分以下で制作が可能な
ため、低価格での全自動化が可能となった。■Currently, an exhaust treatment tank alone costs 30 to 40 million yen, but the product of the present invention can be produced for less than half that amount, making full automation possible at a low cost.
第１図ａは、本発明に係る有機溶剤を使用した洗浄装置
の回路図、第１図すは本洗浄装置の正面方向からの構造
説明図、第１図Ｃは本洗浄装置の平面図、第１図ｄは本
洗浄装置の側面方向からの構造説明図、第２図は液注入
時の回路図、第３図はジェット洗浄時の回路図、第４図
液排出時の回路図、第５図はシャワー洗浄時の回路図、
第６図はベーパー洗浄時の回路図、第７図は排気処理時
の回路図、第８図は本発明の洗浄槽に収容されるバスケ
ットの斜視図、第９図は本装置の操作盤、第１０図は本
装置の電動バルブチャート、第１１図は同じく動作チャ
ート、第１２図は従来の洗浄装置の概略構造の説明図で
ある。FIG. 1a is a circuit diagram of a cleaning device using an organic solvent according to the present invention, FIG. 1 is a structural explanatory view of the cleaning device from the front, and FIG. 1C is a plan view of the cleaning device Fig. 1 d is a structural explanatory diagram of this cleaning device from the side direction, Fig. 2 is a circuit diagram during liquid injection, Fig. 3 is a circuit diagram during jet cleaning, Fig. 4 is a circuit diagram during liquid discharge, Figure 5 is the circuit diagram for shower cleaning.
FIG. 6 is a circuit diagram during vapor cleaning, FIG. 7 is a circuit diagram during exhaust treatment, FIG. 8 is a perspective view of the basket accommodated in the cleaning tank of the present invention, and FIG. 9 is the operation panel of the device. FIG. 10 is an electric valve chart of the present device, FIG. 11 is an operation chart of the same, and FIG. 12 is an explanatory diagram of a schematic structure of a conventional cleaning device.
Claims (1)
シャワーノズル１８を配設し、槽内には上限フロートＦ
Ｓ１を配置すると共に低部に液管理バルブＭＶ２を備え
、ジェット回路遮断バルブＭＶ７と洗浄用ジェットポン
プ９とジェット回路遮断バルブＭＶ８を直列に配設した
洗浄回路Ｙが設けられ、蓋１６で完全密閉される構造と
された洗浄槽１０の周囲に、前記洗浄槽用冷却管１７と
連結させて配置された蒸留槽冷却管２を槽上部に配設し
、槽内にはベーパー管理バルブＭＶ１を備えて洗浄槽１
０に溶液を供給可能に連結され、かつ水分分離器３に接
続された蒸留槽５と、 蒸留槽５の溶液を受け、水と溶液に分離し、水をシャワ
ータンク４に送る蒸留槽５に接続された水分分離器３と
、 シャワーポンプ１１とシャワー液遮断バルブＭＶ６の直
列回路でシャワーノズル１８に接続され、槽内に下限フ
ロートＦＳ３が配置されたシャワータンク４と、 シャワータンク４に接続され、洗浄槽１０とは液管理回
路Ｘを介して連結された予備タンク１４と、洗浄槽１０
の液管理バルブＭＶ２に液センサーＦＳ２を配置した液
管理サブタンク１９と液管理バルブＭＶ３と三方弁の液
管理バルブＭＶ４を直列に配置すると共に、予備タンク
に三方弁の液管理バルブＭＶ５を接続し、前記液管理バ
ルブＭＶ３、ＭＶ４の切替えにより洗浄液管理ポンプ６
を駆動させ、洗浄槽１０又は予備タンク１４へ洗浄液が
供給されるバイパス回路とされた前記液管理回路Ｘと、 洗浄槽１０に空気Ｓを送る回路と、洗浄槽１０の排気を
水槽１３ａ中に送り、排気処理用ジェットポンプ１２で
排気Ｓ１を処理する回路を有する排気処理タンク１３を
設置した排気回収処理装置とから構成されている有機溶
剤を使用した洗浄装置。[Claims] A cleaning tank cooling pipe 17 for circulating cooling water W and a shower nozzle 18 are arranged in the upper part of the tank, and an upper limit float F is provided in the tank.
A cleaning circuit Y is provided in which a liquid management valve MV2 is disposed at the bottom, a jet circuit cutoff valve MV7, a cleaning jet pump 9, and a jet circuit cutoff valve MV8 are arranged in series, and the lid 16 completely seals it. A distillation tank cooling pipe 2 connected to the cleaning tank cooling pipe 17 is disposed in the upper part of the tank around the cleaning tank 10, and a vapor management valve MV1 is provided in the tank. Washing tank 1
a distillation tank 5 connected to the water separator 3 so as to be able to supply a solution to the water separator 3; The water separator 3 is connected to the shower tank 4, which is connected to the shower nozzle 18 through a series circuit of the shower pump 11 and the shower liquid cutoff valve MV6, and in which the lower limit float FS3 is disposed in the tank. , the cleaning tank 10 is a preliminary tank 14 connected via the liquid management circuit X, and the cleaning tank 10.
A liquid management sub-tank 19 with a liquid sensor FS2 arranged in the liquid management valve MV2, a liquid management valve MV3, and a three-way liquid management valve MV4 are arranged in series, and a three-way liquid management valve MV5 is connected to the reserve tank, The cleaning liquid management pump 6 is activated by switching the liquid management valves MV3 and MV4.
The liquid management circuit A cleaning device using an organic solvent, which is comprised of an exhaust gas recovery treatment device equipped with an exhaust treatment tank 13 having a circuit for treating exhaust gas S1 with a jet pump 12 for exhaust treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5589790A JPH03258380A (en) | 1990-03-07 | 1990-03-07 | Cleaning device using organic solvent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5589790A JPH03258380A (en) | 1990-03-07 | 1990-03-07 | Cleaning device using organic solvent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03258380A true JPH03258380A (en) | 1991-11-18 |
Family
ID=13011911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5589790A Pending JPH03258380A (en) | 1990-03-07 | 1990-03-07 | Cleaning device using organic solvent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03258380A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0426081U (en) * | 1990-06-21 | 1992-03-02 | ||
| US6244282B1 (en) | 1996-11-04 | 2001-06-12 | Steag Microtech Gmbh | Substrate treatment device |
| JP2009202052A (en) * | 2008-02-26 | 2009-09-10 | Nec Access Technica Ltd | Automatic cleaning system for portable terminal unit |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49122159A (en) * | 1973-03-28 | 1974-11-21 | ||
| JPS52101867A (en) * | 1975-10-27 | 1977-08-26 | Organo Kk | Apparatus for detecting and separating organic solvent contained in washing exhaust water |
| JPS5392560A (en) * | 1977-01-25 | 1978-08-14 | Ishikawajima Harima Heavy Ind Co Ltd | Method of collecting washing water used in wool washing device |
| JPS58139705A (en) * | 1982-02-16 | 1983-08-19 | Nec Corp | Device and method for recovering organic solvent |
-
1990
- 1990-03-07 JP JP5589790A patent/JPH03258380A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49122159A (en) * | 1973-03-28 | 1974-11-21 | ||
| JPS52101867A (en) * | 1975-10-27 | 1977-08-26 | Organo Kk | Apparatus for detecting and separating organic solvent contained in washing exhaust water |
| JPS5392560A (en) * | 1977-01-25 | 1978-08-14 | Ishikawajima Harima Heavy Ind Co Ltd | Method of collecting washing water used in wool washing device |
| JPS58139705A (en) * | 1982-02-16 | 1983-08-19 | Nec Corp | Device and method for recovering organic solvent |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0426081U (en) * | 1990-06-21 | 1992-03-02 | ||
| US6244282B1 (en) | 1996-11-04 | 2001-06-12 | Steag Microtech Gmbh | Substrate treatment device |
| JP2009202052A (en) * | 2008-02-26 | 2009-09-10 | Nec Access Technica Ltd | Automatic cleaning system for portable terminal unit |
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