JPH03253558A - Product with coating film and production thereof - Google Patents
Product with coating film and production thereofInfo
- Publication number
- JPH03253558A JPH03253558A JP5300790A JP5300790A JPH03253558A JP H03253558 A JPH03253558 A JP H03253558A JP 5300790 A JP5300790 A JP 5300790A JP 5300790 A JP5300790 A JP 5300790A JP H03253558 A JPH03253558 A JP H03253558A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- cathodes
- nitride
- periodic table
- elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011248 coating agent Substances 0.000 title abstract description 9
- 238000000576 coating method Methods 0.000 title abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 18
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 14
- 239000000956 alloy Substances 0.000 claims abstract description 14
- 230000000737 periodic effect Effects 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 5
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 5
- 239000010959 steel Substances 0.000 claims abstract description 5
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 4
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 abstract 1
- 239000012299 nitrogen atmosphere Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000005255 carburizing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、摺動部材２部品等の耐摩耗性を向上するよう
にした被膜製品及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a coated product that improves the wear resistance of two sliding parts, etc., and a method for manufacturing the same.
従来、油圧ピストン、ピストンリング等の摺動部材及び
工具、金型等の製品は、浸炭、窒化等の表面硬化熱処理
及び湿式の硬質クロムやＮ１−Ｐめっき或いはＣＶＤ法
、ＰＶＤ法等により、ＴｉＮ 。Conventionally, sliding parts such as hydraulic pistons and piston rings, as well as products such as tools and molds, have been made of TiN by surface hardening heat treatment such as carburizing and nitriding, wet hard chromium or N1-P plating, CVD method, PVD method, etc. .
ＴｉＣ等の硬質被膜が被覆されている。It is coated with a hard film such as TiC.
従来の浸炭焼入れの場合の硬度は約８００ ＦＦＩＨＶ
。The hardness of conventional carburizing and quenching is approximately 800 FFIHV
.
ガス軟窒化では約１０００ ＦＦＩＨＶ 、硬’ｉｉＣ
，めっきでは約９００ ｍ Ｈｖであり、ＴｉＮ膜でも
１８００〜２２００ ｍＨｖであり、最近の摺動装置の
高性能化或いは過酷化に応じ切れない場合がある。Approximately 1000 FFIHV in gas nitrocarburizing, hard 'iiC
, for plating, it is about 900 mHv, and for TiN film, it is 1800 to 2200 mHv, which may not be able to meet the recent high performance or harsh conditions of sliding devices.
本発明は、前記の点に留意し、橢単に高硬度の被膜を有
する被膜製品及びその製造方法を提供することを目的と
する。The present invention has been made with the above-mentioned points in mind, and an object of the present invention is to provide a coated product having a coat with high hardness in a simple manner, and a method for manufacturing the same.
前記課題を解決するために、本発明の被膜製品は、鉄鋼
材料，Ａｌ合金、 Ｃｕ合金或いは超硬合金を基体とし
、該基体の表面にＴｉとＴｉ以外の元素周期律表ＩＶａ
、 Ｖａ、 ＶＬ族或いはＡ１との窒化物力・らなる合
金窒化４乞被覆し７たものである。In order to solve the above-mentioned problems, the coated product of the present invention uses a steel material, an Al alloy, a Cu alloy, or a cemented carbide as a base, and on the surface of the base, Ti and elements other than Ti and elements of the periodic table IVa are added.
, Va, VL group or A1 alloy nitride coating.
筐た、合金窒化膜は、窒素を１としたとき、Ｔｓと、Ｔ
ｉ以外の元素周期律表ＩＶａ、 Ｖａ、 ＶＩａ族或い
はＡＪの金属（以下これら乞Ｍと呼ぶことにする）との
和Ｔｉ＋ＭがＯ２８〜１．２に訃いて、Ｍ／Ｔ ｉが０
．２５〜４であることが望！しい。In the alloy nitride film, when nitrogen is 1, Ts and T
The sum Ti+M of the elements other than i in Group IVa, Va, VIa or AJ of the periodic table (hereinafter referred to as "M") is O28~1.2, and M/Ti is 0.
．． I hope it's 25-4! Yes.
そして、合金窒化膜の製造方法は、Ｔ、とＴ、以外の元
素周期律表ＩＶａ、 Ｖａ、 ＶＩａ族或いはｌ’−１
ｆカソードとし、前記両カソードを独立し少なくとも各
１個全対向或いは隣接させて配置し、前記各カソードを
アーク熱で蒸発させて基体にＴｉ合金窒化物を蒸着させ
るものである。The method for manufacturing the alloy nitride film is based on elements other than T and T in groups IVa, Va, and VIa of the periodic table, or l'-1.
f cathodes, at least one of each of the cathodes is disposed independently and facing each other or adjacent to each other, and each of the cathodes is evaporated by arc heat to deposit Ti alloy nitride on the substrate.
前記のように構成された本光明の被膜製品及びその製造
方法は、高硬度の被膜が形成され、耐摩耗性が改善され
る。In the coating product of Komei and its manufacturing method configured as described above, a coating with high hardness is formed and wear resistance is improved.
実施例について図面を参照して説明する。 Examples will be described with reference to the drawings.
第１図において、（ＩＨ’ｊ基体であり、鉄鋼材料。In FIG. 1, (IH'j is the base and is made of steel material.
Ｍ合金、 Ｃｕ合金、超硬合金等からなり、（２）は基
体（１）の表面に被覆された合金窒化膜であり、Ｔｊと
Ｔｉ以外（Ｄ元素周期律表ＩＶａ、 Ｖａ、 ＶＩａ族
即ち、Ｚｙ。It is made of M alloy, Cu alloy, cemented carbide, etc., and (2) is an alloy nitride film coated on the surface of base (1). ,Zy.
Ｈｆ、 Ｖ、 Ｎｂ、 Ｔａ、 Ｃｒ、 Ｍｏ、 Ｗ或
いはＡ１の金属Ａｌとの窒化物からなる。It consists of Hf, V, Nb, Ta, Cr, Mo, W, or a nitride of A1 with metal Al.
これら合金窒化膜の硬さの測定結果を表１に示す。Table 1 shows the measurement results of the hardness of these alloy nitride films.
表１
つぎに、合金窒化膜の組成比を変えた場合の摩耗試験結
果を表２に示す。Table 1 Next, Table 2 shows the wear test results when the composition ratio of the alloy nitride film was changed.
この試験は、窒素を１とし、Ｔｉと、 Ｔｉ以外の元素
周期律表ＩＶａ、 Ｖａ、 ＶＬ族或いはＭの金属Ａｌ
との和Ｔｉ ＋Ｍが１で、ＴｉとＡｌとの割合を変えた
場合である。In this test, nitrogen is set as 1, and Ti and Al, a metal of group IVa, Va, VL or M of the periodic table of elements other than Ti, are used.
This is a case where the sum Ti +M is 1 and the ratio of Ti and Al is changed.
そして、摩耗試験は、ビン−ディスク型でピンＶＣＪＩ
Ｓ ＳＣＭ４３５ｖ／４を用い、ディスク５ＫＤ１１に
合金窒化物を蒸着して行った。The wear test was conducted using a pin VCJI with a bottle-disk type.
Alloy nitride was deposited on disk 5KD11 using SSCM435v/4.
筐た、摩耗量は、４導１１に摩擦痕深さを表面粗さ計で
測定した。単位はμｍである。The amount of wear on the casing was determined by measuring the depth of friction marks on the 4th conductor 11 using a surface roughness meter. The unit is μm.
な釦、雰囲気は非潤滑状態である。button, the atmosphere is non-lubricated.
そして、同一条件における比較材の摩耗量は、非処理材
で４２μ、ガス軟窒化材で１６μｍ、硬質クロムめっき
材で１４μｍであった。The wear amount of the comparative materials under the same conditions was 42 μm for the untreated material, 16 μm for the gas nitrocarburized material, and 14 μm for the hard chromium-plated material.
表２
表２より明らからように、表２の両側の組戚即ちＴｉ：
Ｍが０．１ ： ０．９と０．９ ： ０．１の場合に
摩耗量が大であり、表２の中間部の組戚即ちＭ ／Ｔ７
が０２５〜４に訃いて摩耗量がきわめて小である。Table 2 As is clear from Table 2, the combinations on both sides of Table 2, namely Ti:
When M is 0.1:0.9 and 0.9:0.1, the amount of wear is large, and the middle part of Table 2, that is, M/T7
025-4, and the amount of wear is extremely small.
つぎに、製造方法の実施例について第２図ないし第４図
を参照して説明する。Next, an example of the manufacturing method will be described with reference to FIGS. 2 to 4.
それらの図面は真空アーク蒸＠装置を示し、（３）は真
空槽、（４）は真空槽（３）のほぼ中央に配設された基
板、（５）はＴｉからなる第１のカソード、（６）は第
２のカソードであり、第２図及び第３図の第２のカソー
ド（６）はＭからなり、第４図の第２のカソード（６）
はＮｂ力）らなる。These drawings show a vacuum arc evaporation apparatus, in which (3) is a vacuum chamber, (4) is a substrate disposed approximately in the center of the vacuum chamber (3), (5) is a first cathode made of Ti, (6) is a second cathode, the second cathode (6) in FIGS. 2 and 3 is made of M, and the second cathode (6) in FIG.
is Nb force).
そして、第２図の場合、両カソード（５１，（６１７）
Ｅ真空槽（３）の両側に独立して配置され、第３図の場
合、両カソード（５）が側部と上部□配置され、第４図
の場合、両カソード（５）、 （６１が隣接し、その隣
接した両カソード（５１，（６１が真空槽（３）の両側
に配置されている。In the case of Fig. 2, both cathodes (51, (617)
E They are arranged independently on both sides of the vacuum chamber (3), in the case of Fig. 3, both cathodes (5) are arranged on the sides and the top □, and in the case of Fig. 4, both cathodes (5), (61 are Both adjacent cathodes (51, (61) are arranged on both sides of the vacuum chamber (3).
筐た、第２図及び第４図の場合、基板（４）が回転し、
第３図の場合、基板（４）が約４５度傾斜して配直され
ている。In the case of Figures 2 and 4, the board (4) rotates,
In the case of FIG. 3, the substrate (4) is rearranged at an angle of about 45 degrees.
そして、真空槽（３）にＮ１が４人され、真空槽（３）
がｌＸｌ０−５〜３ Ｘ １０”−２Ｔｏｒｒに維持さ
れる。Then, four N1 people were placed in the vacuum chamber (3), and
is maintained at lXl0-5~3 x 10"-2 Torr.
そして被膜の組成比は、両カソードｆ５１． （６）の
電流イ直によシ制御される。The composition ratio of both cathodes is f51. The current in (6) is directly controlled.
なお、第４図は両カソード（５１，（６１が２基ずつの
場合である刀５．３基以上を配置してもよいのは勿論で
ある。Incidentally, FIG. 4 shows the case where two cathodes (51, (61) are provided).It goes without saying that three or more cathodes may be arranged.
つぎに、底膜プロセスを第５図とともに説明する。Next, the bottom film process will be explained with reference to FIG.
試料を膜層洗浄した後真空槽内に搬入し、１Ｏ−６Ｔｏ
ｒｒ以下の高真空状態筐で排気し、試料表面の汚染物質
をスパッタするため、金属イオンボンバード処理を行う
。After cleaning the membrane layer, the sample was carried into a vacuum chamber and 1O-6To
The chamber is evacuated to a high vacuum below rr, and metal ion bombardment is performed to sputter contaminants on the surface of the sample.
つぎにアーク放電を起させた後、Ｎ２の反応ガスを真空
偕内に導入してコーティング作業を所定時間行い、その
後試料を取り出す。Next, after causing an arc discharge, a reactive gas of N2 is introduced into the vacuum chamber to perform a coating operation for a predetermined period of time, and then the sample is taken out.
本発明は、以上説明したように構成されているので、以
下に記載する効果を奏する。Since the present invention is configured as described above, it produces the effects described below.
鉄鋼材料，Ａｌ合金、 Ｃｕ合金或いは超硬合金の基体
の表面に、Ｔｔ′と、１゛ｓ以外の元素周期律表ＩＶａ
。On the surface of the base material of steel material, Al alloy, Cu alloy or cemented carbide, Tt' and IVa of the periodic table of elements other than 1゛s are applied.
.
Ｖａ、 ＶＬ族或いはＡｌ１の金Ｊ％Ａｌとの窒化物か
らなる合金窒化ｄｉ被模したことにより、被膜製品の被
膜の硬度が高く耐摩耗性が向上する。By coating the di-nitride alloy consisting of Va, VL group or Al1 nitride with gold J% Al, the hardness of the coating of the coated product is high and the wear resistance is improved.
筐た、合金窒化膜の窒素を１とし、Ｔｉと前記金属Ａｌ
との和Ｔｉ ＋ Ｍが０８〜１２において、Ｍ／Ｔｌ′
を０．２５〜４にすることによシ、硬度がより痛くなる
。In the case, nitrogen in the alloy nitride film is set to 1, and Ti and the metal Al
When the sum Ti + M is 08 to 12, M/Tl'
By setting the value to 0.25 to 4, the hardness becomes more painful.
さらに、Ｔｉと前記金属Ｍ？］ｌ−カンードとしてそれ
ぞれを独立して配置することにより、両金属の混合物を
カソードとする場合に比し、コーティングコストが安価
になる。Furthermore, Ti and the metal M? ] By arranging each as an L-cando independently, the coating cost becomes cheaper than when a mixture of both metals is used as the cathode.
図面は本発明の被膜製品及びその製造方法の実施例金石
し、第１図ばＭ摸製品の断面図、第２図ないし第４図は
それぞれ真空アーク蒸着装置の構成図、第５図は５５．
膜プロセス図である。
（＋）・・・基体、（２）・・・合金窒化膜、（３）−
・真空槽、（４）・・基体、（５１，（６）・・・カソ
ード。The drawings show an example of the coated product and its manufacturing method of the present invention, FIG. 1 is a cross-sectional view of a M model product, FIGS. 2 to 4 are block diagrams of a vacuum arc evaporation apparatus, and FIG. 5 is a 55 ．．
It is a membrane process diagram. (+)...Substrate, (2)...Alloy nitride film, (3)-
- Vacuum chamber, (4)...substrate, (51, (6)... cathode.
Claims (1)
基体とし、該基体の表面にＴｉと，Ｔｉ以外の元素周期
律表ＩＶａ，Ｖａ，ＶＩａ族或いはＡｌとの窒化物から
なる合金窒化膜を被覆した被膜製品。 ［２］合金窒化膜の窒素を１としたとき、Ｔｉと，Ｔｉ
以外の元素周期律表ＩＶａ，Ｖａ，ＶＩａ族或いはＡｌ
の金属Ｍとの和Ｔｉ＋Ｍが０．８〜１．２において、Ｍ
／Ｔｉが０．２５〜４である請求項［１］記載の被膜製
品。 ［３］ＴｉとＴｉ以外の元素周期律表ＩＶａ，Ｖａ，Ｖ
Ｉａ族或いはＡｌをカソードとし、前記両カソードを独
立し少なくとも各１個を対向或いは隣接させて配置し、
前記各カソードをアーク熱で蒸発させて基体にＴｉ合金
窒化物を蒸看させる被膜製品製造方法。[Scope of Claims] [1] A steel material, an Al alloy, a Cu alloy, or a cemented carbide as a base material, and on the surface of the base body, Ti and elements other than Ti, such as those in groups IVa, Va, and VIa of the periodic table, or Al. A coated product coated with an alloy nitride film made of nitride. [2] When nitrogen in the alloy nitride film is 1, Ti and Ti
Elements other than Groups IVa, Va, and VIa of the periodic table or Al
When the sum Ti+M of metal M is 0.8 to 1.2, M
The coated product according to claim [1], wherein /Ti is 0.25 to 4. [3] Periodic table of elements other than Ti and Ti IVa, Va, V
Group Ia or Al is used as a cathode, and both of the cathodes are arranged independently, with at least one each facing or adjacent to each other,
A method for producing a coated product, in which each of the cathodes is evaporated with arc heat to vaporize Ti alloy nitride on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5300790A JPH03253558A (en) | 1990-03-05 | 1990-03-05 | Product with coating film and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5300790A JPH03253558A (en) | 1990-03-05 | 1990-03-05 | Product with coating film and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03253558A true JPH03253558A (en) | 1991-11-12 |
Family
ID=12930855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5300790A Pending JPH03253558A (en) | 1990-03-05 | 1990-03-05 | Product with coating film and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03253558A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0616774U (en) * | 1992-08-05 | 1994-03-04 | 日本バルカー工業株式会社 | Ball valve |
| JPH06261990A (en) * | 1993-03-12 | 1994-09-20 | Hirose Mfg Co Ltd | Parts of sewing machine |
| JP2008266747A (en) * | 2007-04-24 | 2008-11-06 | Ulvac Japan Ltd | Alloy nanoparticle preparation method, alloy thin film preparation method, and coaxial vacuum arc deposition apparatus |
-
1990
- 1990-03-05 JP JP5300790A patent/JPH03253558A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0616774U (en) * | 1992-08-05 | 1994-03-04 | 日本バルカー工業株式会社 | Ball valve |
| JPH06261990A (en) * | 1993-03-12 | 1994-09-20 | Hirose Mfg Co Ltd | Parts of sewing machine |
| JP2008266747A (en) * | 2007-04-24 | 2008-11-06 | Ulvac Japan Ltd | Alloy nanoparticle preparation method, alloy thin film preparation method, and coaxial vacuum arc deposition apparatus |
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