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JPH03237112A - Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them - Google Patents

Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them

Info

Publication number
JPH03237112A
JPH03237112A JP2032515A JP3251590A JPH03237112A JP H03237112 A JPH03237112 A JP H03237112A JP 2032515 A JP2032515 A JP 2032515A JP 3251590 A JP3251590 A JP 3251590A JP H03237112 A JPH03237112 A JP H03237112A
Authority
JP
Japan
Prior art keywords
resin
acid
resin composition
unsaturated group
polycarboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2032515A
Other languages
Japanese (ja)
Inventor
Minoru Yokoshima
実 横島
Kazumitsu Nawata
縄田 一允
Tetsuo Okubo
大久保 哲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP2032515A priority Critical patent/JPH03237112A/en
Publication of JPH03237112A publication Critical patent/JPH03237112A/en
Pending legal-status Critical Current

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  • Macromonomer-Based Addition Polymer (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Epoxy Resins (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

PURPOSE:To obtain the subject resin having excellent developing property capable of developing in an aqueous solution of alkali and giving cured material having excellent heat resistance, etc., by further reacting a reaction product of tris(epoxypropyl) isocyanulate and (meth)acrylic acid with a polybasic carboxylic acid, etc. CONSTITUTION:A reaction product of tris(2,3-epoxypropyl) isocyanulate and (math)acrylic acid is further reacted with a polybasic carboxylic acid (e.g. maleic acid, succinic acid or phthalic acid) or anhydride of said acid to afford the aimed resin.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、不飽和基含有ポリカルボン酸樹脂、及び該樹
脂を含有するプリント配線基板の永久保護膜として使用
される耐熱性、耐薬品性及び電気絶縁性に優れたソルダ
ーレジストに適する樹脂組成物及びこれらの硬化物に関
する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a polycarboxylic acid resin containing an unsaturated group, and a heat-resistant and chemical-resistant resin used as a permanent protective film for a printed wiring board containing the resin. The present invention also relates to resin compositions suitable for solder resists having excellent electrical insulation properties and cured products thereof.

(従来の技術) 近年、省資源、省エネルギー、作業性向上、生産性向上
などの理由により紫外線硬化型組成物か多用されてきて
いる。プリント配線基板加工分野においても同様の理由
によりソルダーレジストインキ、マーキングインクなど
種々のインキが従来の熱硬化型組成物から紫外線硬化型
組成物へと移行してきている。その中でもソルダーレジ
ストインキは、いち早く紫外線硬化型組成物へと移行し
た。
(Prior Art) In recent years, ultraviolet curable compositions have been widely used for reasons such as resource saving, energy saving, improved workability, and improved productivity. In the field of printed wiring board processing, various inks such as solder resist inks and marking inks have been shifting from conventional thermosetting compositions to ultraviolet curable compositions for the same reason. Among these, solder resist inks were the first to transition to UV-curable compositions.

(発明が解決しようとする課題) プリント配線基板のレジストパターン形成法には、スク
リーン印刷法が多く用いられてきたが、かかるスクリー
ン印刷法によるときには、多くの場合、印刷時のブリー
ド、にしみ、あるいは、ダレといった現象か発生し、こ
れかために従来の紫外線硬化型組成物では最近のプリン
ト配線基板の高密度化に対応しきれなくなっている。
(Problems to be Solved by the Invention) Screen printing methods have often been used to form resist patterns on printed wiring boards, but when such screen printing methods are used, bleeds, stains, and stains during printing often occur. Alternatively, a phenomenon such as sagging occurs, and for this reason, conventional ultraviolet curable compositions are no longer able to cope with the recent increase in the density of printed wiring boards.

こうした問題点を解決するために、トライフィルム型の
フォトレジストや、液状の現像可能なレジストインキも
あるが、ドライフィルム型のフォトレジストの場合、熱
圧着の際に気泡を生し易く、耐熱性や密着性にも不安か
あり、また高価格であるなとの問題かある。一方、液状
レジストで現在市販されているものは、有機溶剤を現像
液として使用しているため、大気汚染の問題や、溶剤か
高価なうえ、耐溶剤性、耐酸性にも問題かある。
To solve these problems, there are tri-film type photoresists and liquid developable resist inks, but dry-film type photoresists tend to produce air bubbles during thermocompression bonding and have poor heat resistance. There are also concerns about the adhesion and the high price. On the other hand, currently commercially available liquid resists use organic solvents as developing solutions, which pose problems of air pollution, expensive solvents, and problems with solvent resistance and acid resistance.

(課題を解決するための手段) 本発明者らは、7#記の問題を解決するため鋭意研究の
結果、その硬化物か耐熱性、密着性、耐薬品性、耐メツ
キ性および電気絶縁特性に優れた、希アルカリ水溶液で
現像か可能な、ソルダーレジストに適する樹脂組成物を
提供することに成功したた。
(Means for Solving the Problem) As a result of intensive research to solve the problem described in #7, the present inventors have found that the cured product has heat resistance, adhesion, chemical resistance, plating resistance, and electrical insulation properties. We have succeeded in providing a resin composition suitable for solder resist, which has excellent properties and can be developed with a dilute alkaline aqueous solution.

すなわち、本発明は、 (1)トリス(2,3−エポキシプロピル)イソシアヌ
レート(メタ)アクリル酸との反応物を更に多塩基性カ
ルボン酸又はその無水物と反応させてなる不飽和基含有
ポリカルボン酸樹脂 (2)上記(1)記載の不飽和基含有ポリカルボン酸樹
脂を含有する樹脂組成物 (3)上記(1)記載の不飽和基含有ポリカルボン酸樹
脂を含有するソルダーレジスト樹脂組成物(4)上記(
1)記載の不飽和基含有ポリカルボン酸樹脂の硬化物 (5)上記(2)又は上記(3)記載の樹脂組成物の硬
化物に関する。
That is, the present invention provides: (1) An unsaturated group-containing polyurethane obtained by further reacting a reaction product of tris(2,3-epoxypropyl)isocyanurate (meth)acrylic acid with a polybasic carboxylic acid or its anhydride. Carboxylic acid resin (2) Resin composition containing the unsaturated group-containing polycarboxylic acid resin described in (1) above (3) Solder resist resin composition containing the unsaturated group-containing polycarboxylic acid resin described in (1) above Thing (4) Above (
Cured product of the unsaturated group-containing polycarboxylic acid resin described in 1) (5) Pertains to a cured product of the resin composition described in (2) or (3) above.

ここで(メタ)アクリル酸とは、アクリル酸又はメタク
リル酸又はそれらの混合物を表わす。本発明の不飽和基
含有ポリカルボン酸樹脂は、トリス(2,3−エポキシ
プロピル)イソシアヌレートと(メタ)アクリル酸とを
反応させ、エポキシ(メタ)アクリレートを得、次いて
、多塩基性カルボン酸又はその無水物を反応させること
によって得ることかできる。トリス(2,3−エポキシ
プロピル)イソシアヌレートと(メタ)アクリル酸との
反応において、トリス(2,3−エポキシプロピル)イ
ソシアヌレートのエポキシ基のl化学当量に対して(メ
タ)アクリル酸を好ましくは約0.8〜1.5化学当量
、特に好ましくは、約0.9〜1.1化学当量となる比
で反応させる。反応時に希釈剤(例えば、メチルエチル
ケトン、メチルイソブチルケトン、酢酸ブチル、エチル
セロソルブアセテート、ブチルセロソルブアセテート、
カルピトールアセテート、ベンセン、トルエン、石油エ
ーテル等の溶剤類、又はカルピトール(メタ)アクリレ
ート、フェノキシエチル(メタ)アクリレート、ペンタ
エリスリトールトリ(メタ)アクリレート、トリス(ヒ
ドロキシエチル)イソシアヌレートトリ(メタ)アクリ
レート、アクリロイルモルホリン、トリメチロールプロ
パントリ(メタ)アクリレート、ジペンタエリスリトー
ルポリ(メタ)アクリレート等の反応性単量体等)を使
用するのか好ましく、更に反応を促進させるために触媒
(例えば、トリエチルアミン、ベンジルジメチルアミン
、メチルトリエチルアンモニウムクロライド、トリフェ
ニルスチビン等)を使用することか好ましく、該触媒の
使用量は反応混合物に対して好ましくは0.1〜10重
量%、特に好ましくは1〜5重量%である。反応中の重
合を防止するために重合防止剤(例えば、メトキノン、
ハイドロキノン、フェノチアジン等)を使用するのか好
ましく、その使用量は反応混合物に対して好ましくは0
.01〜1重量%、特に好ましくは0.05〜0.5重
量%である。反応温度は60〜150°C1特に好まし
くは80〜120℃である。反応時間は好ましくは5〜
50時間程度である。また、前記多塩基性カルボン酸又
はその無水物の具体的な例としては、マレイン酸、コハ
ク酸、フタル酸、テトラクロロフタル酸、テトラブロモ
フタル酸、エンドメチレンテトラヒドロフタル酸、テト
ラヒドロフタル酸、ヘキサヒドロフタル酸、トリメリッ
ト酸、ピロメリット酸等及びこれらの酸の無水物等が挙
げられる。
Here, (meth)acrylic acid refers to acrylic acid, methacrylic acid, or a mixture thereof. The unsaturated group-containing polycarboxylic acid resin of the present invention is produced by reacting tris (2,3-epoxypropyl) isocyanurate and (meth)acrylic acid to obtain epoxy (meth)acrylate, and then It can be obtained by reacting acids or their anhydrides. In the reaction between tris(2,3-epoxypropyl)isocyanurate and (meth)acrylic acid, (meth)acrylic acid is preferably used for 1 chemical equivalent of the epoxy group of tris(2,3-epoxypropyl)isocyanurate. are reacted in a ratio of about 0.8 to 1.5 chemical equivalents, particularly preferably about 0.9 to 1.1 chemical equivalents. A diluent (e.g., methyl ethyl ketone, methyl isobutyl ketone, butyl acetate, ethyl cellosolve acetate, butyl cellosolve acetate,
Solvents such as carpitol acetate, benzene, toluene, petroleum ether, or carpitol (meth)acrylate, phenoxyethyl (meth)acrylate, pentaerythritol tri(meth)acrylate, tris(hydroxyethyl)isocyanurate tri(meth)acrylate, Reactive monomers such as acryloylmorpholine, trimethylolpropane tri(meth)acrylate, dipentaerythritol poly(meth)acrylate, etc.) are preferably used, and catalysts (such as triethylamine, benzyl dimethyl amine, methyltriethylammonium chloride, triphenylstibine, etc.), and the amount of the catalyst used is preferably 0.1 to 10% by weight, particularly preferably 1 to 5% by weight, based on the reaction mixture. . Polymerization inhibitors (e.g., methoquinone,
Hydroquinone, phenothiazine, etc.) is preferably used, and the amount used is preferably 0 based on the reaction mixture.
.. 01 to 1% by weight, particularly preferably 0.05 to 0.5% by weight. The reaction temperature is 60-150°C, particularly preferably 80-120°C. The reaction time is preferably 5~
It takes about 50 hours. Further, specific examples of the polybasic carboxylic acid or its anhydride include maleic acid, succinic acid, phthalic acid, tetrachlorophthalic acid, tetrabromophthalic acid, endomethylenetetrahydrophthalic acid, tetrahydrophthalic acid, and hexachlorophthalic acid. Examples include hydrophthalic acid, trimellitic acid, pyromellitic acid, and anhydrides of these acids.

前記の方法で得たトリス(2,3−エポキシプロピル)
イソシアヌレートと(メタ)アクリル酸との反応生成物
(これは市場より容易に入手することかできる。例えば
、8産化学(株)製、TEPIC−TA等)と多塩基性
カルボン酸又はその無水物との反応はトリス(2,3−
エポキシプロピル)イソシアヌレート(メタ)アクリル
酸との反応生成物〔エポキシ(メタ)アクリレート〕中
の水酸基と前記の酸又はその無水物のエステル化反応で
ある。反応温度は60〜150°Cか好ましく、特に8
0〜120℃か好ましい。反応時間は好ましくは1〜5
0時間程度である。反応を行う際希釈剤を使用すること
か出来、希釈剤としては例えば前述の希釈剤のうちOH
基を有しないものか使用できる。又、反応中の重合を防
止するために前記のような重合防止剤を使用することか
でき、その使用量は反応混合物に対して好ましくは0.
01−1重量%、より好ましくは0.05〜0.5重量
%である。
Tris(2,3-epoxypropyl) obtained by the above method
A reaction product of isocyanurate and (meth)acrylic acid (this can be easily obtained from the market, for example, TEPIC-TA manufactured by Yassan Kagaku Co., Ltd.) and a polybasic carboxylic acid or its anhydride. The reaction with tris(2,3-
This is an esterification reaction between the hydroxyl group in the reaction product [epoxy(meth)acrylate] of epoxypropyl)isocyanurate with (meth)acrylic acid and the above acid or its anhydride. The reaction temperature is preferably 60 to 150°C, especially 8
0 to 120°C is preferable. The reaction time is preferably 1 to 5
It takes about 0 hours. A diluent can be used when carrying out the reaction, such as OH among the diluents mentioned above.
Those without groups can be used. In addition, in order to prevent polymerization during the reaction, a polymerization inhibitor as described above can be used, and the amount used is preferably 0.00% relative to the reaction mixture.
01-1% by weight, more preferably 0.05-0.5% by weight.

このようにして得られる本発明の不飽和基含有ポリカル
ボン酸樹脂の酸価(mgKOH/g)は20〜150程
度であることが好ましい。
The acid value (mgKOH/g) of the unsaturated group-containing polycarboxylic acid resin of the present invention thus obtained is preferably about 20 to 150.

本発明の組成物に使用される不飽和基含有ポリカルボン
酸樹脂の使用量は10−100重量%、特に20〜90
重量%か好ましい。
The amount of the unsaturated group-containing polycarboxylic acid resin used in the composition of the present invention is 10-100% by weight, especially 20-90% by weight.
% by weight is preferred.

本発明の組成物には、更に、フェノール・ノボラック型
エポキシ樹脂、クレゾール・ノボラック型エポキシ樹脂
、ビスフェノール型エポキシ樹脂等のエポキシ化合物、
これらのエポキシ化合物と(メタ)アクリル酸の反応物
であるエポキシアクリレート、前記した反応性単量体等
を含有させることかできる。これらの使用量は、組成物
の0〜90重量%、特に10〜80重量%か好ましい。
The composition of the present invention further includes epoxy compounds such as phenol/novolac type epoxy resin, cresol/novolac type epoxy resin, bisphenol type epoxy resin,
Epoxy acrylate, which is a reaction product of these epoxy compounds and (meth)acrylic acid, the above-mentioned reactive monomers, etc. can be included. The amount of these used is preferably 0 to 90% by weight, particularly 10 to 80% by weight of the composition.

本発明の組成物を硬化する方法としては、電子線、紫外
線及び熱による硬化法かあるか、紫外線又は熱で硬化す
るのか好ましい。
Preferred methods for curing the composition of the present invention include curing with electron beams, ultraviolet rays, and heat, or curing with ultraviolet rays or heat.

紫外線で硬化する場合には、光重合開始剤を使用する。When curing with ultraviolet light, a photoinitiator is used.

光重合開始剤としては、公知のとのような光重合開始剤
でも使用することかできるが、配合後の貯蔵安定性の良
いものか望ましい。この様な光重合開始剤としては、例
えば2−クロロチオキサントン、2.4−ジエチルチオ
キサントン、2−イソプロピルチオキサントン、ベンジ
ルジメチルケタール、2−エチルアントラキノン、N、
 N−ジメチアミノ安息香酸イソアミルエステル、N、
 N−ジメチルアミノ安息香酸エチルエステル、2−メ
チル−〔4−(メチルチオ)フェニル〕−2−モルフす
ソノ−1−プロパノン、2−ヒドロキシ−2−メチルプ
ロピオフェノン、4′−イソプロピル−2−ヒドロキシ
−2−メチルプロピオフェノン等か挙げられる。これら
光重合開始剤は、種または二種以上を任意の割合で混合
して使用することかできる。好ましい光重合開始剤とし
ては、2.4−ジエチルチオキサントン、2−イソプロ
ピルチオキサントン、2−メチル〔4−(メチルチオ)
フェニル〕−2−モルフォリノ−1−プロパノン等が挙
げられる。光重合開始剤の使用量は組成物の0.1〜2
0重量%、特に1〜10重量%であることか好ましい。
As the photopolymerization initiator, any known photopolymerization initiator can be used, but it is preferable to use one that has good storage stability after blending. Examples of such photopolymerization initiators include 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2-isopropylthioxanthone, benzyl dimethyl ketal, 2-ethylanthraquinone, N,
N-dimethiaminobenzoic acid isoamyl ester, N,
N-dimethylaminobenzoic acid ethyl ester, 2-methyl-[4-(methylthio)phenyl]-2-morphsono-1-propanone, 2-hydroxy-2-methylpropiophenone, 4'-isopropyl-2- Examples include hydroxy-2-methylpropiophenone. These photopolymerization initiators can be used in one species or in a mixture of two or more in any proportion. Preferred photoinitiators include 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2-methyl[4-(methylthio)
phenyl]-2-morpholino-1-propanone and the like. The amount of photopolymerization initiator used is 0.1 to 2 of the composition.
It is preferably 0% by weight, particularly 1 to 10% by weight.

本発明の組成物に、エポキシ基含有化合物を使用する場
合には、その硬化剤として、ジシアンジアミド、イミダ
ゾール化合物、芳香族アミン化合物、光カチオン重合触
媒を使用することか好ましい。本発明の組成物には、更
に、必要に応して、ヘキサメトキシメラミン、ヘキサブ
トキシメラミン等のメラミン樹脂、MB−3000(三
菱油化(株)製) 、MP−256(三菱油化(株)製
)等のポリイミド樹脂、タルク、シリカ、アルミナ、硫
酸バリウム、酸化マグネシウム等の無機充填剤、シアニ
ングリーン、シアニンブルー等の着色顔料、アエロジル
等のチキソトロピー剤、シリコン系フッ素系、アクリル
共重合物等のレベリング剤、シランカップリング剤、消
泡剤、酸化防止剤、重合禁止剤等を使用することもでき
る。本発明の組成物を、プリント配線板に、スクリーン
印刷法、スプレー法、ロールコート法、静電塗装法、カ
ーテンフローコート法等の方法で10−100μmの膜
厚て塗布した後、塗膜を60〜80℃で乾燥し、次いで
ネガフィルムを塗膜に直接接触させ又は、接触させずに
、ネガフィルムを通して紫外線を照射し、次いで、1〜
2%5zcos水溶液等のアルカリ水溶液で、塗膜の未
照射部分を溶解除去した後、必要に応じて、120〜1
70℃で加熱硬化すると本発明の硬化物か得られる。本
発明の組成物は、特にソルダーレジスト樹脂組成物とし
て有用であるか、その他にも絶縁材料、含浸材、表面被
覆材、塗料、カラーフィルター用オーバコート剤、接着
剤等としても使用できる。
When an epoxy group-containing compound is used in the composition of the present invention, it is preferable to use dicyandiamide, an imidazole compound, an aromatic amine compound, or a photocationic polymerization catalyst as the curing agent. The composition of the present invention may further contain melamine resins such as hexamethoxymelamine and hexabutoxymelamine, MB-3000 (manufactured by Mitsubishi Yuka Co., Ltd.), and MP-256 (manufactured by Mitsubishi Yuka Co., Ltd.), if necessary. ), inorganic fillers such as talc, silica, alumina, barium sulfate, and magnesium oxide, coloring pigments such as cyanine green and cyanine blue, thixotropic agents such as Aerosil, silicone, fluorine, and acrylic copolymers. It is also possible to use leveling agents such as, silane coupling agents, antifoaming agents, antioxidants, polymerization inhibitors, etc. The composition of the present invention is applied to a printed wiring board to a thickness of 10 to 100 μm by a screen printing method, a spray method, a roll coating method, an electrostatic coating method, a curtain flow coating method, etc., and then a coating film is formed. The negative film is dried at 60 to 80°C, then UV rays are irradiated through the negative film with or without direct contact with the coating film, and then 1 to
After dissolving and removing the unirradiated parts of the coating film with an alkaline aqueous solution such as a 2% 5zcos aqueous solution, if necessary, add 120 to 1
The cured product of the present invention can be obtained by heating and curing at 70°C. The composition of the present invention is particularly useful as a solder resist resin composition, and can also be used as an insulating material, an impregnating material, a surface coating material, a paint, an overcoat agent for color filters, an adhesive, and the like.

(実施例) 以下、本発明を実施例により具体的に説明する。(Example) Hereinafter, the present invention will be specifically explained with reference to Examples.

なお実施例中の部は、重量部である。Note that parts in the examples are parts by weight.

〔不飽和基含有ポリカルボン酸樹脂の実施例1〜7〕 実施例1 トリス(2,3−エポキシプロピル)イソシアヌレート
とアクリル酸の反応物(日産化学(株)製、TEPIC
−TA100O1半固体)300部、ブチルセロソルブ
アセテート165.5部、無水テトラヒドロフタル酸8
5.9部及びメトキノン0.2部を仕込み、90℃まで
昇温させ、15時間反応させ、粘度345ポイズ(25
℃)、酸価(溶剤をのぞいた成分) 82mgKOH/
gの生成物(本発明の不飽和基含有ポリカルボン酸樹脂
)を得た。
[Examples 1 to 7 of unsaturated group-containing polycarboxylic acid resin] Example 1 Reaction product of tris (2,3-epoxypropyl) isocyanurate and acrylic acid (manufactured by Nissan Chemical Co., Ltd., TEPIC)
-TA100O1 semi-solid) 300 parts, butyl cellosolve acetate 165.5 parts, tetrahydrophthalic anhydride 8
5.9 parts and 0.2 parts of methoquinone were added, the temperature was raised to 90°C, and the reaction was carried out for 15 hours until the viscosity was 345 poise (25
°C), acid value (components excluding solvent) 82mgKOH/
The product g (unsaturated group-containing polycarboxylic acid resin of the present invention) was obtained.

実施例2 実施例1の中で無水テトラヒドロフタル酸に代えて無水
マレイン酸55.3部を用い、ブチロセロソルブアセテ
ートの部数を152.4部に変えた以外は、実施例1と
同様に反応させ、粘度310ポイズ(25°C)、酸価
(溶剤をのそいた成分) 89mgKOH/gの生成物
を得た。
Example 2 The reaction was carried out in the same manner as in Example 1, except that 55.3 parts of maleic anhydride was used instead of tetrahydrophthalic anhydride and the number of parts of butyrocellosolve acetate was changed to 152.4 parts. A product with a viscosity of 310 poise (25°C) and an acid value (component excluding the solvent) of 89 mgKOH/g was obtained.

実施例3 実施例1の中で、無水テトラヒドロフタル酸に代えて無
水フタル酸125.5部を用い、ブチルセロソルブアセ
テートの部数を182.6部に変えた以外は、実施例1
と同様に反応させ、粘度450ポイズ(25°C)、酸
価(溶剤をのぞいた成分) 112mgKOH/gの生
成物を得た。
Example 3 Example 1 except that 125.5 parts of phthalic anhydride was used instead of tetrahydrophthalic anhydride and the number of parts of butyl cellosolve acetate was changed to 182.6 parts.
The reaction was carried out in the same manner as above to obtain a product having a viscosity of 450 poise (at 25°C) and an acid value (components excluding the solvent) of 112 mgKOH/g.

実施例4 実施例1の中で、無水テトラヒドロフクル酸に代えて、
無水へキサヒドロフタル酸43.5部を用い、ブチルセ
ロソルブアセテートに代えて、カルピトールアセテート
147部を用いた以外は、実施例1と同様に反応させ、
粘度250ボイズ(25°C)、酸価(溶剤をのぞいた
成分) 46mgKOH/gの生成物を得た。
Example 4 In Example 1, instead of tetrahydrofucric anhydride,
The reaction was carried out in the same manner as in Example 1, except that 43.5 parts of hexahydrophthalic anhydride was used and 147 parts of carpitol acetate was used instead of butyl cellosolve acetate.
A product with a viscosity of 250 boids (25°C) and an acid value (components excluding the solvent) of 46 mgKOH/g was obtained.

実施例5 トリス(2,3−エポキシプロピル)イソシアヌレート
(日産化学(株)製、TEPIC−P 、エポキシ当量
105)315部、メタクリル酸245部、メチルハイ
ドロキノン0.56部、メチルトリエチルアンモニウム
クロライド2.0部及びエチルセロソルブアセテ−) 
282.2部を加え、95℃まで昇温させ、35時間反
応させた後、更に無水マレイン酸98部を加えて、90
″Cで15時間反応させた。粘度250ポイズ(25°
C)、酸価(溶剤をのぞいた成分) 85mgKOH/
Hの生成物を得た。
Example 5 Tris (2,3-epoxypropyl) isocyanurate (manufactured by Nissan Chemical Co., Ltd., TEPIC-P, epoxy equivalent weight 105) 315 parts, methacrylic acid 245 parts, methylhydroquinone 0.56 parts, methyltriethylammonium chloride 2 .0 parts and ethyl cellosolve acetate)
After adding 282.2 parts of maleic anhydride and raising the temperature to 95°C and reacting for 35 hours, 98 parts of maleic anhydride was added and 90 parts of maleic anhydride was added.
The reaction was carried out for 15 hours at
C), acid value (components excluding solvent) 85mgKOH/
H product was obtained.

実施例6 実施例1の中で、無水テトラヒドロフタル酸に代えて、
無水コハク酸56.4部を用い、ブチルセロソルブアセ
テートの部数を152.7部に変えた以外は、実施例1
と同様に反応させ、粘度320ポイズ(25°C)、酸
価(溶剤をのぞいた成分) 88mgKOH/gの生成
物を得た。
Example 6 In Example 1, instead of tetrahydrophthalic anhydride,
Example 1 except that 56.4 parts of succinic anhydride was used and the number of parts of butyl cellosolve acetate was changed to 152.7 parts.
The reaction was carried out in the same manner as above to obtain a product having a viscosity of 320 poise (at 25°C) and an acid value (components excluding the solvent) of 88 mgKOH/g.

実施例7 実施例1の中で無水テトラヒドロフタル酸に代えて、無
水トリメリット酸54.1部を用い、ブチルセロソルブ
アセテートの部数を151.7部に変えた以外は、実施
例1と同様に反応させ、粘度290ポイズ(25℃)、
酸価(溶剤をのぞいた成分)89.3mgKOH/Hの
生成物を得た。
Example 7 The reaction was carried out in the same manner as in Example 1, except that 54.1 parts of trimellitic anhydride was used in place of tetrahydrophthalic anhydride in Example 1, and the number of parts of butyl cellosolve acetate was changed to 151.7 parts. Viscosity: 290 poise (25℃)
A product with an acid value (components excluding the solvent) of 89.3 mgKOH/H was obtained.

実施例8〜12 第1表に示す配合組成に従ってソルダーレジスト樹脂組
成物を配合し、次のとおり各種の性能試験を行った。そ
れらの結果を第1表に示す。
Examples 8 to 12 Solder resist resin compositions were blended according to the blending compositions shown in Table 1, and various performance tests were conducted as follows. The results are shown in Table 1.

A、(溶解性及び現像性〕 各配合物(ソルダーレジスト樹脂組成物)を、銅スルホ
ールプリント配線板にスクリーン印刷法にて20μmの
膜厚で塗布した後、塗膜を70℃で60分間乾燥した後
、ネガフィルムを塗膜に直接接触又は接触させない様に
して当てる。次いで、5KW超高圧水銀灯を使用して紫
外線を照射し、次いで、30℃の1.5%NazCOs
水溶液で、スプレー圧2.5kg/dで塗膜の未照射部
分を溶解除去し溶解性について判定し、又、現像に必要
な秒数(現像性)を測定した。
A. (Solubility and developability) After applying each formulation (solder resist resin composition) to a copper through-hole printed wiring board with a film thickness of 20 μm by screen printing method, the coating film was dried at 70°C for 60 minutes. After that, a negative film is applied to the paint film in direct contact or without contact.Then, it is irradiated with ultraviolet light using a 5KW ultra-high pressure mercury lamp, and then exposed to 1.5% NazCOs at 30°C.
The unirradiated portion of the coating film was dissolved and removed using an aqueous solution at a spray pressure of 2.5 kg/d to determine solubility, and the number of seconds required for development (developability) was measured.

溶解性の判定 ○・−・・−・・溶解速度か速い。Determination of solubility ○・−・・−・Dissolution rate is fast.

X −−一・−溶解しないか又は極めて遅い。X--1.- Does not dissolve or dissolves extremely slowly.

B1次いで、〔溶解性及び現像性〕の項で得られたもの
を、その後、熱風乾燥器で150°C130分間加熱硬
化し、得られたそれぞれの供試体を用いて以下の試験を
行った。
B1 Next, the material obtained in the [Solubility and Developability] section was heated and cured in a hot air dryer at 150° C. for 130 minutes, and the following tests were conducted using each of the obtained specimens.

〔耐ハンダ性〕[Solder resistance]

供試体を260℃の溶融ハンダに30秒、3回浸漬した
後の塗膜の状態を判定した。
The state of the coating film was determined after the specimen was immersed in molten solder at 260° C. for 30 seconds three times.

○−−−−−・−−−−一塗膜の外観異常なし。○−−−−−・−−−−No abnormality in the appearance of the coating film.

×・・−−−−−一一ふくれ、溶融、剥離。×・・−−−−−Blistering, melting, and peeling.

〔密着性〕[Adhesion]

耐ハンダ性試験前後の供試体の塗膜にlX1mmの大き
さのゴバン目を100個刻み−セロハンテープで剥離し
た後の密着性を評価した。
The coating film of the specimen before and after the solder resistance test was cut with 100 goblets of 1×1 mm in size and peeled off with cellophane tape, and then the adhesion was evaluated.

〔絶縁性抵抗〕[Insulating resistance]

供試体を80°C195%RHの雰囲気中に240時間
放置し、その塗膜の絶縁抵抗を測定した。
The specimen was left in an atmosphere of 80° C. and 195% RH for 240 hours, and the insulation resistance of the coating film was measured.

*■エポキシアクリレート EPPN−201(日本化
薬(株)製、フェノールノボラック 型エポキシ樹脂)のエポシキ基l化 学当量あたりアクリル酸0.5化学当 量を反応させたもので、ブチルセロ ソルブアセテート30%で希釈したも の。
*■Epoxy acrylate EPPN-201 (manufactured by Nippon Kayaku Co., Ltd., phenol novolac type epoxy resin) is reacted with 0.5 chemical equivalent of acrylic acid per 1 chemical equivalent of epoxy group, and diluted with 30% butyl cellosolve acetate. thing.

*■EPPN−201:フェノールノボラック型エポキ
シ樹脂(日本化薬(株)製)。
*EPPN-201: Phenol novolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd.).

*■KAYARAD DP)IA  日本化薬(株)製
、ジペンタエリスリトールペンタ及びヘキサアク リレートの混合物。
*■KAYARAD DP)IA Manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol penta and hexaacrylate.

*■KAYACtJRE DETX : B本化薬(株
)製、光重合剤開始剤、2,4−ジエチルチオキサント
ン。
*KAYACtJRE DETX: manufactured by Bhonkayaku Co., Ltd., photopolymerization initiator, 2,4-diethylthioxanthone.

*■IRGACURE 907  チバ・ガイギー社製
、光重合開始剤、2−メチル〔4−(メチルチ オ)フェニル〕−2−モルフォリノ− 1−プロパノン 〔発明の効果〕 本発明の不飽和基含有ポリカルボン酸樹脂を使用する組
成物は、アルカリ水溶液で現像か可能で、現像性に優れ
、その硬化物は耐熱性、耐溶剤性、密着性、電気絶縁性
が良好であり、ソルダーレジスト樹脂組成物に適する。
*■ IRGACURE 907 manufactured by Ciba Geigy, photopolymerization initiator, 2-methyl[4-(methylthio)phenyl]-2-morpholino-1-propanone [Effects of the invention] Unsaturated group-containing polycarboxylic acid resin of the present invention The composition using the compound can be developed with an alkaline aqueous solution and has excellent developability, and the cured product thereof has good heat resistance, solvent resistance, adhesion, and electrical insulation, and is suitable for a solder resist resin composition.

Claims (1)

【特許請求の範囲】 1、トリス(2,3−エポキシプロピル)イソシアヌレ
ートと(メタ)アクリル酸との反応物を更に多塩基性カ
ルボン酸又はその無水物と反応させてなる不飽和基含有
ポリカルボン酸樹脂。 2、請求項1記載の不飽和基含有ポリカルボン酸樹脂を
含有する樹脂組成物。 3、請求項1記載の不飽和基含有ポリカルボン酸樹脂を
含有するソルダーレジスト樹脂組成物。 4、請求項1記載の不飽和基含有ポリカルボン酸樹脂の
硬化物。 5、請求項2又は請求項3項記載の樹脂組成物の硬化物
[Claims] 1. An unsaturated group-containing polyurethane obtained by further reacting a reaction product of tris(2,3-epoxypropyl)isocyanurate and (meth)acrylic acid with a polybasic carboxylic acid or its anhydride. Carboxylic acid resin. 2. A resin composition containing the unsaturated group-containing polycarboxylic acid resin according to claim 1. 3. A solder resist resin composition containing the unsaturated group-containing polycarboxylic acid resin according to claim 1. 4. A cured product of the unsaturated group-containing polycarboxylic acid resin according to claim 1. 5. A cured product of the resin composition according to claim 2 or 3.
JP2032515A 1990-02-15 1990-02-15 Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them Pending JPH03237112A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2032515A JPH03237112A (en) 1990-02-15 1990-02-15 Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2032515A JPH03237112A (en) 1990-02-15 1990-02-15 Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them

Publications (1)

Publication Number Publication Date
JPH03237112A true JPH03237112A (en) 1991-10-23

Family

ID=12361108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2032515A Pending JPH03237112A (en) 1990-02-15 1990-02-15 Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them

Country Status (1)

Country Link
JP (1) JPH03237112A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425542A (en) * 2014-09-12 2016-03-23 奇美实业股份有限公司 Photosensitive resin composition for color filter and application thereof
JP2016098377A (en) * 2014-11-18 2016-05-30 奇美實業股▲分▼有限公司 Alkali-soluble resin, photosensitive resin composition comprising the same, and use of the composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425542A (en) * 2014-09-12 2016-03-23 奇美实业股份有限公司 Photosensitive resin composition for color filter and application thereof
JP2016098377A (en) * 2014-11-18 2016-05-30 奇美實業股▲分▼有限公司 Alkali-soluble resin, photosensitive resin composition comprising the same, and use of the composition
US10088612B2 (en) 2014-11-18 2018-10-02 Chi Mei Corporation Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof

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